JPS5289540A - Etching gaseous mixture - Google Patents

Etching gaseous mixture

Info

Publication number
JPS5289540A
JPS5289540A JP629476A JP629476A JPS5289540A JP S5289540 A JPS5289540 A JP S5289540A JP 629476 A JP629476 A JP 629476A JP 629476 A JP629476 A JP 629476A JP S5289540 A JPS5289540 A JP S5289540A
Authority
JP
Japan
Prior art keywords
gaseous mixture
etching gaseous
etching
mixture
gaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP629476A
Other languages
Japanese (ja)
Other versions
JPS5636704B2 (en
Inventor
Kazushi Nagata
Kazuto Suehiro
Shigeji Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP629476A priority Critical patent/JPS5289540A/en
Publication of JPS5289540A publication Critical patent/JPS5289540A/en
Publication of JPS5636704B2 publication Critical patent/JPS5636704B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP629476A 1976-01-21 1976-01-21 Etching gaseous mixture Granted JPS5289540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP629476A JPS5289540A (en) 1976-01-21 1976-01-21 Etching gaseous mixture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP629476A JPS5289540A (en) 1976-01-21 1976-01-21 Etching gaseous mixture

Publications (2)

Publication Number Publication Date
JPS5289540A true JPS5289540A (en) 1977-07-27
JPS5636704B2 JPS5636704B2 (en) 1981-08-26

Family

ID=11634347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP629476A Granted JPS5289540A (en) 1976-01-21 1976-01-21 Etching gaseous mixture

Country Status (1)

Country Link
JP (1) JPS5289540A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2486716A1 (en) * 1980-07-11 1982-01-15 Philips Nv METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
FR2486715A1 (en) * 1980-07-11 1982-01-15 Philips Nv METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
EP0123813A2 (en) * 1983-03-08 1984-11-07 Kabushiki Kaisha Toshiba Dry etching method for organic material layers

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2486716A1 (en) * 1980-07-11 1982-01-15 Philips Nv METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
FR2486715A1 (en) * 1980-07-11 1982-01-15 Philips Nv METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
JPS5752136A (en) * 1980-07-11 1982-03-27 Philips Nv Method of producing semiconductor device
JPH0237091B2 (en) * 1980-07-11 1990-08-22 Fuiritsupusu Furuuiranpenfuaburiken Nv
EP0123813A2 (en) * 1983-03-08 1984-11-07 Kabushiki Kaisha Toshiba Dry etching method for organic material layers

Also Published As

Publication number Publication date
JPS5636704B2 (en) 1981-08-26

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