JPS5260279A - Substrate cooling apparatus in vacuum evaporation machine, etc. - Google Patents
Substrate cooling apparatus in vacuum evaporation machine, etc.Info
- Publication number
- JPS5260279A JPS5260279A JP13683175A JP13683175A JPS5260279A JP S5260279 A JPS5260279 A JP S5260279A JP 13683175 A JP13683175 A JP 13683175A JP 13683175 A JP13683175 A JP 13683175A JP S5260279 A JPS5260279 A JP S5260279A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum evaporation
- cooling apparatus
- substrate cooling
- evaporation machine
- machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To rapidly and uniformly cool a substrate of a vacuum evaporation machine, etc. in order to make the machine, etc. shorter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13683175A JPS5260279A (en) | 1975-11-13 | 1975-11-13 | Substrate cooling apparatus in vacuum evaporation machine, etc. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13683175A JPS5260279A (en) | 1975-11-13 | 1975-11-13 | Substrate cooling apparatus in vacuum evaporation machine, etc. |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5260279A true JPS5260279A (en) | 1977-05-18 |
Family
ID=15184512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13683175A Pending JPS5260279A (en) | 1975-11-13 | 1975-11-13 | Substrate cooling apparatus in vacuum evaporation machine, etc. |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5260279A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2420588A1 (en) * | 2010-08-16 | 2012-02-22 | Applied Materials, Inc. | Thermal management of film deposition processes |
-
1975
- 1975-11-13 JP JP13683175A patent/JPS5260279A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2420588A1 (en) * | 2010-08-16 | 2012-02-22 | Applied Materials, Inc. | Thermal management of film deposition processes |
US8709158B2 (en) | 2010-08-16 | 2014-04-29 | Applied Materials, Inc. | Thermal management of film deposition processes |
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