JPS52115161A - Electron gun for electron beam exposing device - Google Patents

Electron gun for electron beam exposing device

Info

Publication number
JPS52115161A
JPS52115161A JP3136376A JP3136376A JPS52115161A JP S52115161 A JPS52115161 A JP S52115161A JP 3136376 A JP3136376 A JP 3136376A JP 3136376 A JP3136376 A JP 3136376A JP S52115161 A JPS52115161 A JP S52115161A
Authority
JP
Japan
Prior art keywords
electron
exposing device
beam exposing
electron beam
gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3136376A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3136376A priority Critical patent/JPS52115161A/en
Publication of JPS52115161A publication Critical patent/JPS52115161A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To increase the current density and promote the brightness, by means of making a electron radiating plane of cathode a concave shape or a plane.
COPYRIGHT: (C)1977,JPO&Japio
JP3136376A 1976-03-24 1976-03-24 Electron gun for electron beam exposing device Pending JPS52115161A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3136376A JPS52115161A (en) 1976-03-24 1976-03-24 Electron gun for electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3136376A JPS52115161A (en) 1976-03-24 1976-03-24 Electron gun for electron beam exposing device

Publications (1)

Publication Number Publication Date
JPS52115161A true JPS52115161A (en) 1977-09-27

Family

ID=12329149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3136376A Pending JPS52115161A (en) 1976-03-24 1976-03-24 Electron gun for electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS52115161A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7297949B2 (en) 2000-06-27 2007-11-20 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7601972B2 (en) 2000-06-27 2009-10-13 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7417236B2 (en) 2000-07-27 2008-08-26 Ebara Corporation Sheet beam-type testing apparatus
US7829871B2 (en) 2000-07-27 2010-11-09 Ebara Corporation Sheet beam-type testing apparatus

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