JPS52115161A - Electron gun for electron beam exposing device - Google Patents
Electron gun for electron beam exposing deviceInfo
- Publication number
- JPS52115161A JPS52115161A JP3136376A JP3136376A JPS52115161A JP S52115161 A JPS52115161 A JP S52115161A JP 3136376 A JP3136376 A JP 3136376A JP 3136376 A JP3136376 A JP 3136376A JP S52115161 A JPS52115161 A JP S52115161A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- exposing device
- beam exposing
- electron beam
- gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To increase the current density and promote the brightness, by means of making a electron radiating plane of cathode a concave shape or a plane.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3136376A JPS52115161A (en) | 1976-03-24 | 1976-03-24 | Electron gun for electron beam exposing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3136376A JPS52115161A (en) | 1976-03-24 | 1976-03-24 | Electron gun for electron beam exposing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52115161A true JPS52115161A (en) | 1977-09-27 |
Family
ID=12329149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3136376A Pending JPS52115161A (en) | 1976-03-24 | 1976-03-24 | Electron gun for electron beam exposing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52115161A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7109484B2 (en) | 2000-07-27 | 2006-09-19 | Ebara Corporation | Sheet beam-type inspection apparatus |
US7135676B2 (en) | 2000-06-27 | 2006-11-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
-
1976
- 1976-03-24 JP JP3136376A patent/JPS52115161A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7135676B2 (en) | 2000-06-27 | 2006-11-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7297949B2 (en) | 2000-06-27 | 2007-11-20 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7411191B2 (en) | 2000-06-27 | 2008-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7601972B2 (en) | 2000-06-27 | 2009-10-13 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8053726B2 (en) | 2000-06-27 | 2011-11-08 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8368031B2 (en) | 2000-06-27 | 2013-02-05 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US8803103B2 (en) | 2000-06-27 | 2014-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US9368314B2 (en) | 2000-06-27 | 2016-06-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
US7109484B2 (en) | 2000-07-27 | 2006-09-19 | Ebara Corporation | Sheet beam-type inspection apparatus |
US7417236B2 (en) | 2000-07-27 | 2008-08-26 | Ebara Corporation | Sheet beam-type testing apparatus |
US7829871B2 (en) | 2000-07-27 | 2010-11-09 | Ebara Corporation | Sheet beam-type testing apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52119178A (en) | Electron beam exposure device | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5231653A (en) | Production of hexaboride cathode | |
JPS52115161A (en) | Electron gun for electron beam exposing device | |
JPS5299792A (en) | Production of semiconductor light emitting device | |
JPS53145562A (en) | Electronic gun | |
JPS52129394A (en) | X-ray generator | |
JPS5362477A (en) | Electron beam drawing device | |
JPS52110565A (en) | Anode structure of magnetron | |
JPS5335363A (en) | Field radiation type cathode | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS5322368A (en) | Pattern inspection method | |
JPS53144676A (en) | Electron beam mask and production of the same | |
JPS5230150A (en) | Manufacturing system of electron radiation cathode rod | |
JPS52119184A (en) | Electron beam exposing method | |
JPS5370756A (en) | Electronic gun for microwave tube | |
JPS5329612A (en) | Pick up tube | |
JPS5376739A (en) | Manufacture of cathode-ray tube | |
JPS5350978A (en) | Electron beam exposure method | |
JPS53132269A (en) | Electron beam pattern projector | |
JPS53397A (en) | Metalic ion source | |
JPS535563A (en) | Electronic gun | |
JPS5376668A (en) | X-ray exposure method | |
JPS53131893A (en) | Ion source | |
JPS5362978A (en) | Electron microscope |