JPS5055406A - - Google Patents
Info
- Publication number
- JPS5055406A JPS5055406A JP10595073A JP10595073A JPS5055406A JP S5055406 A JPS5055406 A JP S5055406A JP 10595073 A JP10595073 A JP 10595073A JP 10595073 A JP10595073 A JP 10595073A JP S5055406 A JPS5055406 A JP S5055406A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10595073A JPS5228401B2 (en) | 1973-09-21 | 1973-09-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10595073A JPS5228401B2 (en) | 1973-09-21 | 1973-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5055406A true JPS5055406A (en) | 1975-05-15 |
JPS5228401B2 JPS5228401B2 (en) | 1977-07-26 |
Family
ID=14421105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10595073A Expired JPS5228401B2 (en) | 1973-09-21 | 1973-09-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5228401B2 (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6389864A (en) * | 1986-10-03 | 1988-04-20 | Mitsubishi Kasei Corp | Photosensitive lithographic printing plate |
JPS63183441A (en) * | 1987-01-26 | 1988-07-28 | Konica Corp | Photosensitive composition having excellent chemical resistance and inking property |
JPS63214747A (en) * | 1987-03-03 | 1988-09-07 | Konica Corp | Photosensitive composition |
JPS63223637A (en) * | 1987-03-12 | 1988-09-19 | Mitsubishi Kasei Corp | Photosensitive planographic printing plate |
JPS63276048A (en) * | 1987-05-07 | 1988-11-14 | Konica Corp | Photosensitive composition and photosensitive planographic printing plate |
JPS63303343A (en) * | 1987-06-03 | 1988-12-09 | Konica Corp | Photosensitive composition and photosensitive planographic plate |
JPS63311247A (en) * | 1987-06-12 | 1988-12-20 | Konica Corp | Photosensitive composition |
JPS6421440A (en) * | 1987-07-17 | 1989-01-24 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435558A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435434A (en) * | 1987-07-30 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435557A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
JPH0252349A (en) * | 1988-06-18 | 1990-02-21 | Hoechst Ag | Positive type radiosensitive mixture and radiosensitive copying material containing said compound |
JPH0269749A (en) * | 1988-09-06 | 1990-03-08 | Konica Corp | Transferred image forming method |
JPH0277746A (en) * | 1988-09-13 | 1990-03-16 | Mitsubishi Kasei Corp | Image forming material and image forming method |
US5338643A (en) * | 1991-12-25 | 1994-08-16 | Mitsubishi Kasei Corporation | O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye |
US6190825B1 (en) | 1998-01-30 | 2001-02-20 | Agfa-Gevaert N.V. | Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4291638B2 (en) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | Alkali-soluble polymer and planographic printing plate precursor using the same |
JP5288268B2 (en) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | Dampening solution composition for lithographic printing and heat set-off ring printing method |
JP5281130B2 (en) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | Dampening solution composition for lithographic printing |
-
1973
- 1973-09-21 JP JP10595073A patent/JPS5228401B2/ja not_active Expired
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6389864A (en) * | 1986-10-03 | 1988-04-20 | Mitsubishi Kasei Corp | Photosensitive lithographic printing plate |
JPS63183441A (en) * | 1987-01-26 | 1988-07-28 | Konica Corp | Photosensitive composition having excellent chemical resistance and inking property |
JPS63214747A (en) * | 1987-03-03 | 1988-09-07 | Konica Corp | Photosensitive composition |
JPS63223637A (en) * | 1987-03-12 | 1988-09-19 | Mitsubishi Kasei Corp | Photosensitive planographic printing plate |
JPS63276048A (en) * | 1987-05-07 | 1988-11-14 | Konica Corp | Photosensitive composition and photosensitive planographic printing plate |
JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
JPS63303343A (en) * | 1987-06-03 | 1988-12-09 | Konica Corp | Photosensitive composition and photosensitive planographic plate |
JPS63311247A (en) * | 1987-06-12 | 1988-12-20 | Konica Corp | Photosensitive composition |
JPS6421440A (en) * | 1987-07-17 | 1989-01-24 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435434A (en) * | 1987-07-30 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435558A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6435557A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPH0252349A (en) * | 1988-06-18 | 1990-02-21 | Hoechst Ag | Positive type radiosensitive mixture and radiosensitive copying material containing said compound |
JPH0269749A (en) * | 1988-09-06 | 1990-03-08 | Konica Corp | Transferred image forming method |
JPH0277746A (en) * | 1988-09-13 | 1990-03-16 | Mitsubishi Kasei Corp | Image forming material and image forming method |
US5338643A (en) * | 1991-12-25 | 1994-08-16 | Mitsubishi Kasei Corporation | O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye |
US6190825B1 (en) | 1998-01-30 | 2001-02-20 | Agfa-Gevaert N.V. | Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures |
Also Published As
Publication number | Publication date |
---|---|
JPS5228401B2 (en) | 1977-07-26 |