JPH1180596A - Masking agent and formation of patterned film - Google Patents

Masking agent and formation of patterned film

Info

Publication number
JPH1180596A
JPH1180596A JP23948097A JP23948097A JPH1180596A JP H1180596 A JPH1180596 A JP H1180596A JP 23948097 A JP23948097 A JP 23948097A JP 23948097 A JP23948097 A JP 23948097A JP H1180596 A JPH1180596 A JP H1180596A
Authority
JP
Japan
Prior art keywords
film
masking agent
forming
substrate
masking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23948097A
Other languages
Japanese (ja)
Inventor
Katsuto Tanaka
勝人 田中
Hiroaki Arai
宏明 荒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP23948097A priority Critical patent/JPH1180596A/en
Publication of JPH1180596A publication Critical patent/JPH1180596A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a masking agent, used when forming a functional thin film and useful for forming a patterned film of a prescribed shape on a substrate by compounding an inorganic fine powder with a cellulosic resin for thickening and an organic solvent in a specific proportion. SOLUTION: This masking agent is used for forming a patterned film of a prescribed shape on a substrate and obtained by compounding (A) an inorganic fine powder which is any one or more of fine powdery silica, barium silicate and cerium oxide with (B) a cellulosic resin composed of a nitrocellulose for thickening or the like and (C) an organic solvent which is any one or more of ethyl carbitol, butyl carbitol and 3-methoxybutyl acetate at 0.15-2.30 weight ratio of the components A/B. The amounts of the compounded components is 5-50 wt.% solute concentration of the total components A and B. The resultant composition is useful for forming a functional thin film such as a wavelength selective film, e.g. an ultraviolet ray shielding film, an infrared ray shielding film or a visible ray reflection film, an electromagnetic wave shielding film, a decorative film or the like on a substrate such as glass or ceramics.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ガラスあるいはセ
ラミックスなどの基体上に紫外線遮蔽膜、赤外線遮断
膜、可視光反射膜、可視光低反射膜などの波長選択膜、
電磁波遮蔽膜、装飾膜、あるいはそれらの複合膜などの
機能性薄膜を形成する際に用いるマスキング剤及びその
パターン膜形成法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wavelength selective film such as an ultraviolet shielding film, an infrared shielding film, a visible light reflecting film, a visible light low reflecting film, etc. on a substrate such as glass or ceramics.
The present invention relates to a masking agent used for forming a functional thin film such as an electromagnetic wave shielding film, a decorative film, or a composite film thereof, and a method of forming a pattern film thereof.

【0002】[0002]

【従来技術】従来、予め基体上に水溶性マスキング剤を
塗布してマスキング層を形成し、次いで該マスキング層
を含む基体表面全体を非水溶性の塗料により被覆し、そ
の後水洗してマスキング層およびマスキング層上の塗膜
を除去するパターン膜の形成法が、例えば特開平7−3
31180号及び特開平3−56170号等で知られて
いる。また、非水溶性のものとしては、例えばポリウレ
タン樹脂を必須成分とする有機溶剤溶液をマスキング剤
として用いるものが特開昭62−213879号等で知
られている。
2. Description of the Related Art Conventionally, a water-soluble masking agent is applied on a substrate in advance to form a masking layer, and then the entire surface of the substrate including the masking layer is coated with a water-insoluble paint, and then washed with water to form a masking layer and a masking layer. A method of forming a pattern film for removing a coating film on a masking layer is disclosed in, for example, JP-A-7-3.
No. 31,180 and JP-A-3-56170. Further, as a water-insoluble material, for example, a solution using an organic solvent solution containing a polyurethane resin as an essential component as a masking agent is known in JP-A-62-213879.

【0003】[0003]

【発明が解決しようとする課題】上記従来の水溶性マス
キング剤を塗布する方法は、マスキング剤の溶媒として
水を使用しているため、比較的簡易なパターニングには
非常に好適に用いることが出来るものの、精密で複雑な
パターンをマスキング剤を長時間直接外気に触れさせな
がら連続して形成するような場合には、マスキング剤が
乾燥し易く、印刷作業性が損なわれ、またマスキング剤
のスクリーン流動性が低いため、印刷性にも欠けるとい
う欠点があった。
The above-mentioned conventional method of applying a water-soluble masking agent can be very suitably used for relatively simple patterning since water is used as a solvent for the masking agent. However, when a precise and complicated pattern is continuously formed while the masking agent is directly exposed to the outside air for a long time, the masking agent is easily dried, the printing workability is impaired, and the screen flow of the masking agent is reduced. There is a drawback that the printability is lacking due to the low printability.

【0004】[0004]

【課題を解決するための手段】本発明は、従来のかかる
課題に鑑みてなしたものであって、長時間の作業におい
てもマスキング剤が乾燥し印刷性を損ねることがないよ
うに、マスキング剤に被膜の主形成材である無機質微粉
を、この無機質微粉と相溶性のない高沸点の有機溶剤中
に分散し、さらにマスキング剤に印刷時に好適な粘性を
与えて印刷性を高めるために、前記有機溶剤と反応せず
かつ焼成時に燃焼して飛散し易いニトロセルロースなど
のセルロース系樹脂を混合することによって前述の問題
を解決することが出来ることを見出した。
SUMMARY OF THE INVENTION The present invention has been made in consideration of the above-mentioned problems, and has been made in consideration of the above circumstances. In order to improve the printability by dispersing an inorganic fine powder, which is a main forming material of the coating, in a high-boiling organic solvent that is incompatible with the inorganic fine powder and further imparting a suitable viscosity to the masking agent during printing, It has been found that the above-mentioned problem can be solved by mixing a cellulose-based resin such as nitrocellulose which does not react with the organic solvent and is easily scattered by burning during firing.

【0005】本発明は、基体上に所定形状のパターン膜
を形成するために用いるマスキング剤であって、無機質
微粉、増粘用のセルロース系樹脂および有機溶剤からな
り、(無機質微粉)/(セルロース系樹脂)の重量比率
が0.15〜2.30で、かつを無機質微粉及びセルロ
ース系樹脂を合わせた溶質濃度が5〜50重量%である
マスキング剤であって、マスキング層を例えば、スクリ
ーン印刷などの孔版印刷、フレキソ印刷あるいはスタン
ピング法などで形成する際に、長時間の作業においても
マスキング剤が乾燥して印刷性を阻ねることがなく、か
つ印刷性に好適な流動性をも兼ね備えるものである。
The present invention relates to a masking agent used for forming a pattern film of a predetermined shape on a substrate, comprising a fine inorganic powder, a cellulose resin for thickening, and an organic solvent. A weight ratio of 0.15 to 2.30, and a solute concentration of the inorganic fine powder and the cellulose resin of 5 to 50% by weight. When forming by stencil printing, flexographic printing, stamping method, etc., the masking agent does not dry out even in long-time work and does not hinder printability, and also has fluidity suitable for printability It is.

【0006】なお、無機質微粉は、微粉シリカ、硫酸バ
リウム、酸化セリウムのいずれか1種類以上を用いるこ
とが好ましい。さらに、セルロース系樹脂は、ニトロセ
ルロースであって重合度がJIS K6703に指定す
るH7、H 20、H60、H80、H120のうちの
いずれか1種類以上のものを用いることが適する。
As the inorganic fine powder, it is preferable to use one or more of fine powder silica, barium sulfate and cerium oxide. Further, the cellulose resin is preferably nitrocellulose having a degree of polymerization of at least one of H7, H20, H60, H80, and H120 specified in JIS K6703.

【0007】さらに、有機溶剤は、エチルカルビトー
ル、ブチルカルビトール、酢酸3−メトキシブチルのう
ちのいずれか1種類以上のものを用いることが好まし
い。なお、スクリーン印刷するマスキング剤の粘度は、
7〜300Pであることが好ましい。
Further, as the organic solvent, it is preferable to use one or more of ethyl carbitol, butyl carbitol and 3-methoxybutyl acetate. The viscosity of the masking agent for screen printing is
It is preferably from 7 to 300P.

【0008】また、本発明は、基体上に所定形状のパタ
ーン膜を形成する方法において、該所定形状のパターン
以外の部分に請求項1よりなるマスキング剤を用いて成
膜し、マスキング層を形成し、50〜250℃で乾燥し
た後、該基体全面に金属有機化合物、金属無機化合物ま
たはこれらの混合物に溶媒を加えた溶液を用いて機能性
膜を成膜し、200℃以上の温度で焼成後、該マスキン
グ層の部分をその上部の機能性膜ごと除去するパターン
膜の形成法に関する。
According to the present invention, in a method of forming a pattern film of a predetermined shape on a substrate, a film is formed on a portion other than the pattern of the predetermined shape by using the masking agent according to claim 1 to form a masking layer. After drying at 50 to 250 ° C., a functional film is formed on the entire surface of the substrate using a solution obtained by adding a solvent to a metal organic compound, a metal inorganic compound, or a mixture thereof, and fired at a temperature of 200 ° C. or more. Thereafter, the present invention relates to a method of forming a pattern film for removing a portion of the masking layer together with a functional film thereon.

【0009】[0009]

【発明の実施の形態】本発明で用いる基体は、ガラス、
セラミックス、金属等であり、その組成、形状、大き
さ、色調等を限定するものではない。、無機質微粉は、
有機溶媒に溶解せず、かつマスキング膜を除去する際に
分解した残さが機能性膜に触れて傷などがつかないよう
に微細な柔らかい粒子を用いるのが望ましく、このよう
な条件を有するものであれば何でも良いが、例えば微粉
シリカ、、硫酸バリウム、酸化セリウムなどが好適なも
のとして挙げられる。好ましい平均粒径は、0.1〜
1.5μmである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The substrate used in the present invention is glass,
Ceramics, metals, etc., and their composition, shape, size, color tone, etc. are not limited. , Inorganic fine powder,
It is desirable to use fine soft particles that do not dissolve in the organic solvent, and that are decomposed when the masking film is removed so that the functional film does not scratch the functional film. Any material may be used as long as it is fine, but examples thereof include finely divided silica, barium sulfate, and cerium oxide. Preferred average particle size is 0.1 to
1.5 μm.

【0010】増粘剤は、セルロース系樹脂が用いられ、
特にニトロセルロースが好ましい。ニトロセルロースを
用いた場合、、金属有機化合物、金属無機化合物または
これらの混合物を含む溶液を用いて機能性膜を成膜する
際に、希釈溶媒として、エタノール、イソプロピルアル
コール、ブタノールその他比較的低級のアルコールもし
くはメトキシプロパノール、エトキシエタノールあるい
はエチルセロソルブなどのアルコール誘導体が一般に用
いられるが、これらのアルコール系有機溶剤を主成分と
する塗布液中にマスキング層を形成した基体を浸漬した
場合にも、マスキング膜が容易に溶けださないためであ
る。
As the thickener, a cellulosic resin is used,
Particularly, nitrocellulose is preferred. When using nitrocellulose, when forming a functional film using a solution containing a metal organic compound, a metal inorganic compound or a mixture thereof, as a diluting solvent, ethanol, isopropyl alcohol, butanol and other relatively low-grade Alcohol or an alcohol derivative such as methoxypropanol, ethoxyethanol or ethyl cellosolve is generally used, but the masking layer is also immersed in a coating liquid containing these alcoholic organic solvents as a main component. Is not easily melted.

【0011】なお、ニトロセルロースを用いる場合に
は、特に重合度H7,H20,H60,H80,H12
0のいずれか1種類以上のものを用いることが好まし
い。これらの種類のニトロセルロースを用いた場合に
は、印刷時にスキージなどがマスキング剤(印刷用イン
キ)に与えるせん断応力に対応してインキの粘度が低下
し、いわゆるせん断減粘性が大きくなり、該ニトロセル
ロースを10重量部以上と多く添加して調製したマスキ
ング剤の粘度が200P以上のインキであっても、印刷
時にはせん断減粘性によってみかけ粘度が1〜10P程
度まで下がるようになり、このためマスキング剤の粘度
が300Pまでは印刷性が損なわれることなく好適に用
いられるためである。この場合、ニトロセルロースの重
合度が、H7未満であるH2,H1,H1/2,H1/
4,H1/8,H1/16などを用いるとこのせん断減
粘性が小さく、また粘度を高くするためには添加量を多
くする必要があり、そうすることによって印刷性が大き
く損なわれることになる。
When nitrocellulose is used, the degree of polymerization is preferably H7, H20, H60, H80, H12.
It is preferable to use any one or more of zero. When these types of nitrocellulose are used, the viscosity of the ink decreases in response to the shear stress applied to the masking agent (printing ink) by a squeegee or the like during printing, and the so-called shear thinning viscosity increases. Even if the viscosity of a masking agent prepared by adding cellulose as much as 10 parts by weight or more is 200 P or more, the apparent viscosity decreases to about 1 to 10 P due to shear thinning during printing. This is because up to 300P can be suitably used without impairing printability. In this case, the degree of polymerization of nitrocellulose is H2, H1, H1 / 2, H1 /
When 4, H1 / 8, H1 / 16, etc. are used, the shear thinning viscosity is small, and in order to increase the viscosity, it is necessary to increase the amount of addition, and thereby the printability is greatly impaired. .

【0012】さらに、マスキング剤用有機溶剤は、ニト
ロセルロースを容易に溶解し、かつ高沸点で室温で乾燥
し難い、エチルカルビトール、ブチルカルビトール、酢
酸3−メトキシブチルのうちのいずれか1種類以上のも
のが好ましい。
Further, the organic solvent for the masking agent is any one of ethyl carbitol, butyl carbitol, and 3-methoxybutyl acetate, which easily dissolves nitrocellulose, has a high boiling point, and is hardly dried at room temperature. The above are preferred.

【0013】マスキング剤においては、(無機質微粉)
/(セルロース系樹脂)の重量比率が0.15〜2.30
であることが望ましい。0.15以下では機能性膜を形
成した後に200℃以上の温度で乾燥すると、マスキン
グ剤が基板に強固に焼き付いて水洗払拭を行ってもマス
キング膜が剥離しにくく作業性が悪くなる傾向にあり、
特に300〜500℃の高温ではこの傾向が顕著にな
る。一方2.30以上では、セルロース系樹脂と無機質
微粉とが均一に混合し難くなり、マスキング膜が形成で
きても、塗布液中に浸漬した際に液中に粉状に離脱して
しまう傾向にある。
In the masking agent, (inorganic fine powder)
/ (Cellulose resin) weight ratio of 0.15 to 2.30
It is desirable that When the thickness is less than 0.15, if the masking agent is firmly baked on the substrate after drying at 200 ° C. or higher after forming the functional film, the masking film tends to be hardly peeled off even with wiping and the workability tends to deteriorate. ,
In particular, this tendency becomes remarkable at a high temperature of 300 to 500 ° C. On the other hand, if it is 2.30 or more, it becomes difficult to uniformly mix the cellulosic resin and the inorganic fine powder, and even if a masking film can be formed, it tends to separate into a powder form when immersed in the coating liquid. is there.

【0014】さらに、マスキング剤中の無機質微粉とセ
ルロース系樹脂を合わせた溶質濃度は5〜50重量部で
あることが望ましい。5重量部以下では調製したマスキ
ング剤の粘度が低くなり過ぎて成膜性、印刷性が悪くな
り、またマスキング剤の厚さが薄くなり過ぎてマスキン
グ機能が低下することになる。一方、50重量部以上で
は逆に粘度が高過ぎて、マスキング剤調製時に混合のた
めの撹拌などの作業性が悪くなるばかりでなく、調製し
たマスキング剤の成膜性、印刷性も著しく劣るものであ
る。
Further, the solute concentration of the inorganic fine powder and the cellulosic resin in the masking agent is preferably 5 to 50 parts by weight. If the amount is less than 5 parts by weight, the viscosity of the prepared masking agent becomes too low, resulting in poor film formability and printability, and the thickness of the masking agent becomes too thin, resulting in a reduced masking function. On the other hand, when the amount is more than 50 parts by weight, the viscosity is conversely too high, so that not only the workability such as stirring for mixing at the time of preparing the masking agent is deteriorated, but also the film forming property and printability of the prepared masking agent are remarkably inferior. It is.

【0015】また、機能性膜を形成する溶液としては、
金属有機化合物、金属無機化合物もしくはこれらの混合
物を含む溶液を用いることができるが、金属有機化合物
の金属としては、格別特定するものではないが、Ti、
Si、Al、Zrまたはこれらの複合金属等を選択する
のが好ましく、具体的なものとしては、たとえばチタン
テトライソプロポキシド、テトラエトキシシラン、アル
ミニウムイソブトキシド、ジルコニウムテトラノルマル
ブトキシドである。金属無機化合物としては、硝酸コバ
ルト、硝酸マンガン、硝酸鉄、硝酸銅、硝酸クロム、四
塩化チタン、オキシ塩化アルミニウム等を用いることが
出来る。また、これら溶液中にヒュームドシリカ、マン
ガンー鉄ー銅系複合酸化物、銅ークロムーマンガン系複
合酸化物、コロイダルシリカ等の酸化物微粉を添加し分
散することも出来る。該微粉粒子の粒度としては、粒径
0.01〜0.2μm程度が好ましい。これらの金属酸
化物の微粒子のうちヒュームドシリカ、コロイダルシリ
カを除く他の金属酸化物は、着色剤として主に用いられ
る。また、溶媒としては、エタノール、イソプロパノー
ル、n−ブタノール等を用いることが出来る。
Further, the solution for forming the functional film includes:
A solution containing a metal-organic compound, a metal-inorganic compound or a mixture thereof can be used. As the metal of the metal-organic compound, although not particularly specified, Ti,
It is preferable to select Si, Al, Zr or a composite metal thereof, and specific examples include titanium tetraisopropoxide, tetraethoxysilane, aluminum isobutoxide, and zirconium tetranormal butoxide. As the metal inorganic compound, cobalt nitrate, manganese nitrate, iron nitrate, copper nitrate, chromium nitrate, titanium tetrachloride, aluminum oxychloride and the like can be used. Further, oxide fine powders such as fumed silica, manganese-iron-copper composite oxide, copper-chromium-manganese composite oxide, and colloidal silica can be added to these solutions and dispersed. The particle size of the fine powder particles is preferably about 0.01 to 0.2 μm. Of these metal oxide fine particles, other metal oxides except fumed silica and colloidal silica are mainly used as a coloring agent. Further, as the solvent, ethanol, isopropanol, n-butanol and the like can be used.

【0016】さらに、マスキング膜を除去する場合に
は、流水によりマスキング剤を除去することが好まし
い。基体上にマスキング層あるいは機能性膜を形成する
方法は、公知の塗布手段、例えば刷毛塗り法、ロールコ
ート法、スクリーン印刷法、スピンコート法、浸漬法、
等で行うことが出来る。
Further, when removing the masking film, it is preferable to remove the masking agent by flowing water. Methods for forming a masking layer or a functional film on a substrate include known coating means, for example, a brush coating method, a roll coating method, a screen printing method, a spin coating method, a dipping method,
And so on.

【0017】[0017]

【実施例】以下、実施例により本発明を具体的に説明す
る。ただし本発明はこれらの実施例に限定されるもので
はない。
The present invention will be described below in detail with reference to examples. However, the present invention is not limited to these examples.

【0018】[0018]

【実施例】まず、マスキング剤の原料として以下のもの
を使用した。 1)無機質微粉 : 堺 化 学 (株)製 沈降性硫酸バリウム 日本アエロジル(株)製 微粉シリカ「アエロジル」 三井金属鉱業 (株)製 酸化セリウム「ミレークA」 2) 増 粘 剤 : ダイセル化学 (株)製 ニトロセルロース「FQRSー 7」 3) 溶 媒 : キシダ化学 (株)製 エチルカルビトール 東京化成工業 (株)製 酢酸3ーメトキシブチル これらを表1に示すように混合・撹拌して、マスキング
剤を調合した。
EXAMPLES First, the following were used as raw materials for a masking agent. 1) Inorganic fine powder: Precipitable barium sulfate manufactured by Sakai Kagaku Co., Ltd. Finely divided silica "Aerosil" manufactured by Nippon Aerosil Co., Ltd. Cerium oxide "MIRAKE A" manufactured by Mitsui Mining & Smelting Co., Ltd. 2) Thickener: Daicel Chemical Co., Ltd. ) Nitrocellulose "FQRS-7" 3) Solvent: Ethyl carbitol manufactured by Kishida Chemical Co., Ltd. 3-methoxybutyl acetate manufactured by Tokyo Chemical Industry Co., Ltd. These are mixed and stirred as shown in Table 1 to prepare a masking agent. I mixed.

【0019】次に、マスキング剤を#180メッシュの
テトロンスクリ−ンでショア−硬度HS70のスキ−ジ
を用い、グリーン色板ガラス基板上に所定形状にスクリ
−ン印刷しマスキング層を形成し、引き続いてパネルヒ
ーターで、約1分間加熱しマスキング剤を乾燥させた。
なお、比較的小面積のパターン形成のため、低コストの
局部加熱を採用したので熱割れ等が起こらないように約
100℃で乾燥させた。
Next, a masking agent is screen-printed in a predetermined shape on a green plate glass substrate with a # 180 mesh tetron screen using a squeegee having a Shore hardness of HS70 to form a masking layer. The masking agent was dried by heating with a panel heater for about 1 minute.
In order to form a pattern having a relatively small area, low-cost local heating was employed. Therefore, the substrate was dried at about 100 ° C. so as not to cause thermal cracking or the like.

【0020】次に、チタニウムイソプロポキシドにイソ
プロパノールとnーブタノールを加えて十分撹拌し、ア
ルコキシド溶液を調整した。この溶液中に、前記マスキ
ング層を形成した板ガラス基板を浸漬した後、6mm/
secの一定速度で静かに引き上げ、450℃に保持し
た電気炉で6分間焼成し、板ガラス基板上にTiO2層
よりなる機能性膜を形成させた。
Next, isopropanol and n-butanol were added to titanium isopropoxide and sufficiently stirred to prepare an alkoxide solution. After immersing the glass plate substrate on which the masking layer was formed in this solution, 6 mm /
The film was gently pulled up at a constant speed of sec and baked in an electric furnace maintained at 450 ° C. for 6 minutes to form a functional film composed of a TiO 2 layer on a plate glass substrate.

【0021】マスキング層及びTiO2膜が成膜された
ガラス基板を、ネル布で水洗・払拭して、以下の項目に
ついて評価した。 〔乾燥、硬化性〕○=強固結着している。×=結着が弱
い。 〔マスキング剤の遮蔽性〕○=良好に遮蔽している。×
=成膜溶液が浸入し遮蔽性に劣る。
〔マスキング剤の除去性〕○=軽い払拭で除去可能。×
=かなりの強い払拭が必要で必要な膜に傷が付く。 〔パターンの鮮明性〕○=輪郭部のパターンが鮮明。×
=周辺部が滲む。
The glass substrate on which the masking layer and the TiO 2 film were formed was washed and wiped with a flannel cloth, and the following items were evaluated. [Drying, curability] == strongly bound. × = Weak binding. [Shielding Property of Masking Agent] ○ = Good shielding. ×
= The film-forming solution penetrates and is inferior in shielding properties.
[Removability of masking agent] ○ = Can be removed by light wiping. ×
= Requires considerable wiping and damages required membranes. [Pattern clarity] == The pattern at the outline is clear. ×
= Peripheral bleeding.

【0022】表1から明らかなように、本発明にかかる
実施例の範囲において良好な結果が得られた。一方、比
較例においては複数の項目において性能が劣り、マスキ
ング剤としては使用しにくい傾向を示した。
As is clear from Table 1, good results were obtained within the range of the examples according to the present invention. On the other hand, in the comparative examples, the performance was poor in a plurality of items, and it was difficult to use as a masking agent.

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【発明の効果】本発明は、長時間の作業においてもマス
キング剤が乾燥し印刷性を損ねることがなく、基体上に
スクリーン印刷などの簡便な方法で、マスキング剤を塗
布した場合に、境界輪郭部の鮮明な所望のパターン膜を
形成することが可能であり、紫外線遮蔽膜、赤外線遮断
膜などの波長選択膜、電磁遮蔽膜、彩色装飾膜、それら
の多岐にわたる複合機能性膜を得るためのマスキング剤
として好適である。
According to the present invention, the masking agent does not dry out even in long-time work and does not impair the printability, and when the masking agent is applied to the substrate by a simple method such as screen printing, the boundary contour is reduced. It is possible to form a desired pattern film with a clear part, and to obtain a wavelength-selective film such as an ultraviolet shielding film, an infrared shielding film, an electromagnetic shielding film, a coloring decoration film, and a multifunctional film having a wide variety thereof. It is suitable as a masking agent.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】基体上に所定形状のパターン膜を形成する
ために用いるマスキング剤であって、無機質微粉、増粘
用のセルロース系樹脂および有機溶剤からなり、(無機
質微粉)/(セルロース系樹脂)の重量比率が0.15
〜2.30で、かつ無機質微粉及びセルロース系樹脂を
合わせた溶質濃度が5〜50重量%であることを特徴と
するマスキング剤。
1. A masking agent used for forming a pattern film having a predetermined shape on a substrate, comprising a fine inorganic powder, a cellulose resin for thickening and an organic solvent, wherein (inorganic fine powder) / (cellulose resin) ) Is 0.15
A masking agent characterized by having a solute concentration of from 5 to 2.30 and a combined solute concentration of the inorganic fine powder and the cellulosic resin of from 5 to 50% by weight.
【請求項2】無機質微粉が、微粉シリカ、硫酸バリウ
ム、酸化セリウムのいずれか1種類以上である請求項1
記載のマスキング剤。
2. The inorganic fine powder is at least one of finely divided silica, barium sulfate and cerium oxide.
The masking agent according to the above.
【請求項3】セルロース系樹脂が、ニトロセルロースで
あって、重合度がJIS K6703に指定するH7、
H 20、H60、H80、H120のうちのいずれか
1種類以上である請求項1記載のマスキング剤。
3. The cellulose-based resin is nitrocellulose and has a polymerization degree of H7 specified in JIS K6703,
The masking agent according to claim 1, which is at least one of H20, H60, H80, and H120.
【請求項4】有機溶剤が、エチルカルビトール、ブチル
カルビトール、酢酸3−メトキシブチルのうちのいずれ
か1種類以上である請求項1記載のマスキング剤。
4. The masking agent according to claim 1, wherein the organic solvent is at least one of ethyl carbitol, butyl carbitol, and 3-methoxybutyl acetate.
【請求項5】マスキング剤の粘度が、7〜300P(ポ
アズ)である請求項1記載のマスキング剤。
5. The masking agent according to claim 1, wherein the viscosity of the masking agent is 7 to 300 P (poise).
【請求項6】基体上に所定形状のパターン膜を形成する
方法において、該所定形状のパターン以外の部分に請求
項1よりなるマスキング剤を用いて成膜し、マスキング
層を形成し、50〜250℃で乾燥した後、該基体全面
に金属有機化合物、金属無機化合物またはこれらの混合
物に溶媒を加えた溶液を用いて機能性膜を成膜し、20
0℃以上の温度で焼成後、該マスキング層の部分をその
上部の機能性膜ごと除去することを特徴とするパターン
膜の形成法。
6. A method for forming a pattern film having a predetermined shape on a substrate, wherein a film is formed on a portion other than the pattern having the predetermined shape by using the masking agent according to claim 1 to form a masking layer. After drying at 250 ° C., a functional film is formed on the entire surface of the substrate by using a solution obtained by adding a solvent to a metal organic compound, a metal inorganic compound, or a mixture thereof.
A method for forming a patterned film, comprising, after firing at a temperature of 0 ° C. or more, removing the masking layer together with the functional film thereon.
JP23948097A 1997-09-04 1997-09-04 Masking agent and formation of patterned film Pending JPH1180596A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23948097A JPH1180596A (en) 1997-09-04 1997-09-04 Masking agent and formation of patterned film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23948097A JPH1180596A (en) 1997-09-04 1997-09-04 Masking agent and formation of patterned film

Publications (1)

Publication Number Publication Date
JPH1180596A true JPH1180596A (en) 1999-03-26

Family

ID=17045409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23948097A Pending JPH1180596A (en) 1997-09-04 1997-09-04 Masking agent and formation of patterned film

Country Status (1)

Country Link
JP (1) JPH1180596A (en)

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