JPH11334088A - Manufacture of ink jet recording head - Google Patents

Manufacture of ink jet recording head

Info

Publication number
JPH11334088A
JPH11334088A JP16301898A JP16301898A JPH11334088A JP H11334088 A JPH11334088 A JP H11334088A JP 16301898 A JP16301898 A JP 16301898A JP 16301898 A JP16301898 A JP 16301898A JP H11334088 A JPH11334088 A JP H11334088A
Authority
JP
Japan
Prior art keywords
piezoelectric element
jet recording
ink jet
subdivided
recording head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16301898A
Other languages
Japanese (ja)
Inventor
Takeshi Matsubara
健 松原
Yujiro Kitade
雄二郎 北出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP16301898A priority Critical patent/JPH11334088A/en
Publication of JPH11334088A publication Critical patent/JPH11334088A/en
Pending legal-status Critical Current

Links

Landscapes

  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PROBLEM TO BE SOLVED: To remove residual stress or microcrack incident to subdividing process from a piezoelectric element in an ink jet recording head where a wide piezoelectric element is bonded to a diaphragm and then subdivided in accordance with pressurization chambers. SOLUTION: After being bonded to a diaphragm 5 (A), a piezoelectric element 6 is placed in grooves 9 and subdivided together with a pressurization chamber 3 by dicing (B). Subsequently, the piezoelectric element 6 is ground to a specified thickness (C) and an electrode 8 is formed on the upper surface of the piezoelectric element 6 through a mask 10 (D). Since the piezoelectric element 6 is ground after being subdivided, residual stress or microcrack incident to dicing can be removed from the piezoelectric element 6 in subsequent grinding process and the lifetime of the piezoelectric element 6 can be prolonged.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、プリンタに用い
られるインクジェット記録ヘッドに関し、特にアクチュ
エータとしての圧電素子の加工工程に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ink jet recording head used in a printer, and more particularly to a process for processing a piezoelectric element as an actuator.

【0002】[0002]

【従来の技術】図3はインクジェット記録ヘッドの構成
の一例を示すもので、(A)は横断面図、(B)は平面
図、(C)は縦断面図である。図3において、基板1の
上面に絞り部2、加圧室3、ノズル部4からなる溝状の
インク流路が互いに平行に複数列形成され、この基板1
にはインク流路を覆うように振動板5が接合されてい
る。そして、図示しないが導電被膜が施された振動板5
の上面には、各加圧室3に対応して圧電素子6が接着層
7を介して接合され、また圧電素子6の上面には電極8
が形成されている。
2. Description of the Related Art FIGS. 3A and 3B show an example of the configuration of an ink jet recording head, wherein FIG. 3A is a cross-sectional view, FIG. 3B is a plan view, and FIG. In FIG. 3, a plurality of rows of groove-shaped ink flow paths formed of a throttle unit 2, a pressure chamber 3, and a nozzle unit 4 are formed on the upper surface of a substrate 1 in parallel with each other.
The diaphragm 5 is joined so as to cover the ink flow path. Although not shown, diaphragm 5 provided with a conductive coating
A piezoelectric element 6 is bonded to the upper surface of the piezoelectric element 6 via an adhesive layer 7 in correspondence with each of the pressure chambers 3.
Are formed.

【0003】このようなインクジェット記録ヘッドは、
絞り部2が図示しないチューブを介してインク供給源に
接続され、圧電素子6の上下面間に図4に示すような電
圧信号が印加されることにより、圧電素子6の収縮で振
動板5が加圧室3の内側に変位し、それによる加圧室3
の容積減少でノズル部4からインクを液滴状に噴射す
る。圧電素子6の変形量は電界強度に比例するため、圧
電素子6を薄くするほど、より低電圧で駆動することが
可能になる。
[0003] Such an ink jet recording head is
The diaphragm unit 2 is connected to an ink supply source via a tube (not shown), and a voltage signal as shown in FIG. 4 is applied between the upper and lower surfaces of the piezoelectric element 6. Displaced inside the pressurizing chamber 3, thereby causing the pressurizing chamber 3
The ink is ejected in the form of droplets from the nozzle unit 4 due to the decrease in the volume of the ink. Since the amount of deformation of the piezoelectric element 6 is proportional to the electric field strength, the thinner the piezoelectric element 6, the lower the voltage at which it can be driven.

【0004】図5は上記圧電素子1の従来の加工工程を
示すものである。図5において、振動板5の上面に厚さ
が 100〜200 μm程度で、横幅が各加圧室3に渡る幅広
の圧電素子6を接合した後〔図5(A)〕、研磨により
圧電素子1を20〜30μmに薄くする〔図5(B)〕。次
いで、圧電素子6の上面に電極8を形成した後〔図5
(C)〕、圧電素子6を隣接する加圧室3間にダイシン
グソーで溝9を入れることにより、各加圧室3ごとに細
分化する〔図5(D)〕。
FIG. 5 shows a conventional processing step of the piezoelectric element 1. In FIG. 5, a wide piezoelectric element 6 having a thickness of about 100 to 200 μm and a width across each pressurizing chamber 3 is joined to the upper surface of the diaphragm 5 (FIG. 5A), and the piezoelectric element is polished. 1 is reduced to 20 to 30 μm (FIG. 5B). Next, after forming the electrode 8 on the upper surface of the piezoelectric element 6 [FIG.
(C)], the piezoelectric element 6 is subdivided into each pressurizing chamber 3 by forming a groove 9 between the adjacent pressurizing chambers 3 with a dicing saw [FIG. 5 (D)].

【0005】上述したように、従来は振動板に接合した
幅広の圧電素子を研磨により薄く加工し、その後にダイ
シングソーにより細分化している。ところが、このよう
な従来方法はダイシング時に残留応力や目に見えないマ
イクロクラックが圧電素子に発生し、このような圧電素
子は変形を繰り返すうちに割れや欠損を生じるなど駆動
寿命の上で問題があった。そこで、この発明の課題は、
加工工程に工夫を講じ、圧電素子の寿命信頼性を高める
ことにある。
As described above, conventionally, a wide piezoelectric element bonded to a vibration plate is thinned by polishing, and then finely divided by a dicing saw. However, in such a conventional method, residual stress and invisible microcracks are generated in the piezoelectric element during dicing, and such a piezoelectric element has a problem in terms of driving life, such as cracking and chipping during repeated deformation. there were. Therefore, an object of the present invention is to
It is to improve the life reliability of the piezoelectric element by devising a processing step.

【0006】[0006]

【課題を解決するための手段】従来は圧電素子を薄く研
磨加工した後、ダイシングにより細分化していたのに対
し、この発明は、圧電素子を細分化した後に薄く加工す
るものである。すなわち、この発明は、加圧室を有する
インク流路を複数列形成した基板上に振動板を接合した
後、この振動板の上面に前記各加圧室に渡る圧電素子を
接着し、次いでこの圧電素子を隣接する前記加圧室間に
ダイシングやレーザ加工により溝を入れて細分化し、そ
の後、前記圧電素子を研磨あるいはエッチングして所定
の厚さに形成するものとする。
Means for Solving the Problems Conventionally, a piezoelectric element is thinly polished and then subdivided by dicing. In contrast, according to the present invention, the piezoelectric element is subdivided and processed to be thin. That is, according to the present invention, after a vibration plate is joined to a substrate on which a plurality of rows of ink channels having pressure chambers are formed, a piezoelectric element extending to each of the pressure chambers is bonded to the upper surface of the vibration plate. The piezoelectric element is divided into small grooves by dicing or laser processing between the adjacent pressure chambers, and then the piezoelectric element is formed to a predetermined thickness by polishing or etching.

【0007】本発明者らは、溝を入れて細分化した圧電
素子について、残留応力やマイクロクラックの発生状況
を微細に観察したところ、これらの欠陥はほとんどが溝
に隣接する圧電素子の上部のエッジ部分、つまり図5
(D)にP部として示す部分に生じていることが判明し
た。従って、細分化後に圧電素子を薄くすればこの部分
が取り除かれ、細分化後の圧電素子に欠陥部が残らなく
なる。
The inventors of the present invention have observed minutely the residual stress and the state of occurrence of microcracks in the piezoelectric element subdivided by forming grooves, and found that most of these defects were in the upper part of the piezoelectric element adjacent to the grooves. Edge part, that is, FIG.
(D) was found to have occurred at the portion indicated as the P portion. Therefore, if the piezoelectric element is thinned after the subdivision, this portion is removed, and no defective portion remains in the subdivided piezoelectric element.

【0008】この発明においては圧電素子の上面の電極
は圧電素子が細分化された状態で形成することになる
が、それは細分化された圧電素子の各々に対応する貫通
穴を有するマスクを前記振動板の上方に配置し、前記貫
通穴を介して前記圧電素子の上面に塗布又は蒸着により
電極を形成し、あるいは前記圧電素子を細分化した溝に
樹脂を埋め込んだ後、前記圧電素子の上面に蒸着又はめ
っきにより電極を形成し、次いで前記樹脂を除去するこ
とにより可能である。
In the present invention, the electrodes on the upper surface of the piezoelectric element are formed in a state in which the piezoelectric element is subdivided, and the mask having the through holes corresponding to each of the subdivided piezoelectric elements is vibrated. Arranged above the plate, forming an electrode on the upper surface of the piezoelectric element through the through hole by coating or vapor deposition, or embedding resin in a groove obtained by subdividing the piezoelectric element, and then forming an electrode on the upper surface of the piezoelectric element. This is possible by forming an electrode by vapor deposition or plating and then removing the resin.

【0009】[0009]

【発明の実施の形態】以下、図1及び図2に基づいてこ
の発明の実施の形態を説明する。なお、従来例と対応す
る部分には同一の符号を用い、特に同一構成部分につい
ては適宜説明を省略する。図1は第1の実施の形態の加
工工程を示すものである。図1(A)において、シリコ
ンからなる基板1に加圧室3などを有するインク流路を
フォトリソグラフィとエッチングとにより形成したら、
その上面にシリコンと熱膨張係数の近い硼珪酸ガラスの
振動板5を静電接合し、次いでその上面を研磨して 100
μm以下の所定の厚さとする。続いて、振動板5の上面
に金属酸化膜(Indium Tin Oxide)の導電性被膜を形成
した後、その上に厚さ 150μm程度の幅広の圧電素子6
を各加圧室3に渡るように接着する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. Note that the same reference numerals are used for the portions corresponding to the conventional example, and the description of the same components is omitted as appropriate. FIG. 1 shows the processing steps of the first embodiment. In FIG. 1A, when an ink flow path having a pressure chamber 3 and the like is formed in a substrate 1 made of silicon by photolithography and etching,
A vibrating plate 5 made of borosilicate glass having a thermal expansion coefficient close to that of silicon is electrostatically bonded to the upper surface, and then the upper surface is polished.
The thickness is not more than μm. Subsequently, after a conductive film of a metal oxide film (Indium Tin Oxide) is formed on the upper surface of the diaphragm 5, a wide piezoelectric element 6 having a thickness of about 150 μm is formed thereon.
Are bonded so as to pass over each pressure chamber 3.

【0010】次に、図1(B)に示すように、ダイシン
グソーあるいはレーザー加工機により隣接する加圧室3
間に溝9を入れて圧電素子6を加圧室3の幅に合わせて
細分化する。その後、図1(C)に示すように、圧電素
子3を研磨あるいはエッチングにより、 100μm以下の
所定の厚さにする。最後に、図1(D)に示すように、
細分化された圧電素子6の各々に対応する貫通穴10a
を有するマスク10を振動板5の上方に配置し、貫通穴
10aを介して圧電素子6の上面に塗布又は蒸着によ
り、Cr、Ni及びAuをそれぞれ 0.1μm、0.25μm
及び 0.2μmずつ順次成膜し、電極8を形成する。
Next, as shown in FIG. 1 (B), an adjacent pressurizing chamber 3 is formed by a dicing saw or a laser beam machine.
The piezoelectric element 6 is subdivided according to the width of the pressurizing chamber 3 by inserting a groove 9 therebetween. Thereafter, as shown in FIG. 1C, the piezoelectric element 3 is polished or etched to a predetermined thickness of 100 μm or less. Finally, as shown in FIG.
Through holes 10a corresponding to each of the subdivided piezoelectric elements 6
Is disposed above the vibration plate 5, and Cr, Ni and Au are coated on the upper surface of the piezoelectric element 6 through the through holes 10a by 0.1 μm or 0.25 μm, respectively.
Then, an electrode 8 is formed by sequentially forming a film of 0.2 μm each.

【0011】図2は電極形成方法が第1の実施の形態と
異なる第2の実施の形態の加工工程を示すもので、図2
(A)〜(C)は第1の実施の形態と同じである。すな
わち、電極形成を行う図2(D)において、溝9に後か
ら除去可能な樹脂、例えば水溶生の樹脂11を充填し、
紫外線照射により硬化させる。溝9以外にはみ出した樹
脂11は水洗あるいはエッチングにより除去する。次い
で、その上から全面に蒸着又はめっきにより、上記と同
様の電極8を形成する。その後、全体を水中で超音波洗
浄すると、溝9内の硬化樹脂11が溶解するとともに、
溝9を橋絡している電極形成用の金属膜も超音波の衝撃
により除去され、図2(E)に示すように圧電素子6の
上面のみに電極8が残る。
FIG. 2 shows a processing step of a second embodiment in which an electrode forming method is different from that of the first embodiment.
(A) to (C) are the same as in the first embodiment. That is, in FIG. 2D for forming electrodes, the groove 9 is filled with a resin that can be removed later, for example, a water-soluble resin 11,
Cured by UV irradiation. The resin 11 protruding out of the groove 9 is removed by washing or etching. Next, an electrode 8 similar to the above is formed by vapor deposition or plating over the entire surface. Then, when the whole is ultrasonically cleaned in water, the cured resin 11 in the groove 9 is dissolved,
The electrode-forming metal film bridging the groove 9 is also removed by the impact of the ultrasonic wave, and the electrode 8 remains only on the upper surface of the piezoelectric element 6 as shown in FIG.

【0012】[0012]

【発明の効果】以上の通り、この発明によれば、細分化
加工により残留応力やマイクロクラックが生じた圧電素
子のエッジ部分がその後の工程で取り除かれるので、圧
電素子を健全な素子材のみで構成でき、その寿命信頼性
が大幅に向上する。また、使用途中における割れや欠損
が生じにくくなることから、圧電素子の厚さを従来より
も薄くして、圧電素子に作用する電界強度をより高める
ことができるので、その分、加圧室を小形化して多ノズ
ルでコンパクトなインクジェット記録ヘッドを製作する
ことが可能になる。
As described above, according to the present invention, the edge portion of the piezoelectric element in which the residual stress or the micro-crack is generated by the subdivision processing is removed in a subsequent step, so that the piezoelectric element can be formed only by a sound element material. It can be configured, and its life reliability is greatly improved. Also, since cracks and breakage during use are less likely to occur, the thickness of the piezoelectric element can be made thinner than before, and the electric field strength acting on the piezoelectric element can be further increased. This makes it possible to manufacture a compact, multi-nozzle, compact inkjet recording head.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施の形態を示す圧電素子の加工工
程図で、(A)は接合工程、(B)は細分化工程、
(C)は研磨工程、(D)は電極形成工程である。
FIGS. 1A and 1B are views showing a processing step of a piezoelectric element according to an embodiment of the present invention, in which FIG. 1A is a joining step, FIG.
(C) is a polishing step, and (D) is an electrode forming step.

【図2】この発明の異なる実施の形態を示す圧電素子の
加工工程図で、(A)は接合工程、(B)は細分化工
程、(C)は研磨工程、(D)は樹脂の充填及び電極形
成工程、(E)は樹脂の除去工程である。
FIGS. 2A and 2B are process diagrams of a piezoelectric element showing different embodiments of the present invention, wherein FIG. 2A is a joining process, FIG. 2B is a fragmentation process, FIG. 2C is a polishing process, and FIG. And (E) is a resin removing step.

【図3】インクジェット記録ヘッドの構成の一例を示
し、(A)は横断面図、(B)は平面図図、(C)は横
断面図である。
3A and 3B show an example of the configuration of an ink jet recording head, where FIG. 3A is a cross-sectional view, FIG. 3B is a plan view, and FIG. 3C is a cross-sectional view.

【図4】図3のインクジェット記録ヘッドに印加する電
気信号の一例を示す波形図である。
FIG. 4 is a waveform chart showing an example of an electric signal applied to the ink jet recording head of FIG.

【図5】従来方法を示す圧電素子の加工工程図で、
(A)は接合工程、(B)は研磨工程、(C)は細分化
工程、(D)は電極形成工程である。
FIG. 5 is a process chart of a piezoelectric element showing a conventional method,
(A) is a bonding step, (B) is a polishing step, (C) is a fragmentation step, and (D) is an electrode formation step.

【符号の説明】[Explanation of symbols]

1 基板 3 加圧室 5 振動板 6 圧電素子 8 電極 9 溝 10 マスク 10a 貫通穴 11 樹脂 DESCRIPTION OF SYMBOLS 1 Substrate 3 Pressurization room 5 Vibration plate 6 Piezoelectric element 8 Electrode 9 Groove 10 Mask 10a Through hole 11 Resin

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】加圧室を有するインク流路を複数列形成し
た基板上に振動板を接合した後、この振動板の上面に前
記各加圧室に渡る圧電素子を接着し、次いでこの圧電素
子を隣接する前記加圧室間に溝を入れて細分化し、その
後、前記圧電素子を所定の厚さに形成することを特徴と
するインクジェット記録ヘッドの製造方法。
1. A diaphragm is joined to a substrate on which a plurality of rows of ink channels having pressurizing chambers are formed, and a piezoelectric element extending to each of the pressurizing chambers is bonded to an upper surface of the vibrating plate. A method for manufacturing an ink jet recording head, comprising: subdividing an element by forming a groove between the adjacent pressure chambers; and forming the piezoelectric element to a predetermined thickness.
【請求項2】細分化された前記圧電素子の各々に対応す
る貫通穴を有するマスクを前記振動板の上方に配置し、
前記貫通穴を介して前記圧電素子の上面に電極を形成す
ることを特徴とする請求項1記載のインクジェット記録
ヘッドの製造方法。
2. A mask having a through hole corresponding to each of the subdivided piezoelectric elements is arranged above the diaphragm.
2. The method according to claim 1, wherein an electrode is formed on an upper surface of the piezoelectric element through the through hole.
【請求項3】前記圧電素子を細分化した前記溝に樹脂を
埋め込んだ後、前記圧電素子の上面に電極を形成し、次
いで前記樹脂を除去することを特徴とする請求項1記載
のインクジェット記録ヘッドの製造方法。
3. An ink jet recording method according to claim 1, wherein after the resin is buried in the groove obtained by subdividing the piezoelectric element, an electrode is formed on the upper surface of the piezoelectric element, and then the resin is removed. Head manufacturing method.
JP16301898A 1998-05-27 1998-05-27 Manufacture of ink jet recording head Pending JPH11334088A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16301898A JPH11334088A (en) 1998-05-27 1998-05-27 Manufacture of ink jet recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16301898A JPH11334088A (en) 1998-05-27 1998-05-27 Manufacture of ink jet recording head

Publications (1)

Publication Number Publication Date
JPH11334088A true JPH11334088A (en) 1999-12-07

Family

ID=15765637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16301898A Pending JPH11334088A (en) 1998-05-27 1998-05-27 Manufacture of ink jet recording head

Country Status (1)

Country Link
JP (1) JPH11334088A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005532199A (en) * 2002-07-03 2005-10-27 スペクトラ インコーポレイテッド Print head
JP2007275884A (en) * 2006-04-05 2007-10-25 Xerox Corp Drop generator
JP2010105383A (en) * 2008-10-30 2010-05-13 Samsung Electro-Mechanics Co Ltd Method for manufacturing ink-jet head
JP2010131977A (en) * 2008-12-04 2010-06-17 Samsung Electro-Mechanics Co Ltd Inkjet head and method of manufacturing the same
JP2010131978A (en) * 2008-12-03 2010-06-17 Samsung Electro-Mechanics Co Ltd Manufacturing method for ink-jet head
JP2010221696A (en) * 2009-03-19 2010-10-07 Samsung Electro-Mechanics Co Ltd Method for manufacturing inkjet head
KR101024009B1 (en) * 2008-11-10 2011-03-29 삼성전기주식회사 Method for Manufacturing Ink-Jet Head
KR101063450B1 (en) * 2009-01-21 2011-09-08 삼성전기주식회사 Inkjet Head Manufacturing Method
US9381740B2 (en) 2004-12-30 2016-07-05 Fujifilm Dimatix, Inc. Ink jet printing

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005532199A (en) * 2002-07-03 2005-10-27 スペクトラ インコーポレイテッド Print head
JP2008044379A (en) * 2002-07-03 2008-02-28 Dimatix Inc Printhead
US9381740B2 (en) 2004-12-30 2016-07-05 Fujifilm Dimatix, Inc. Ink jet printing
JP2007275884A (en) * 2006-04-05 2007-10-25 Xerox Corp Drop generator
JP2010105383A (en) * 2008-10-30 2010-05-13 Samsung Electro-Mechanics Co Ltd Method for manufacturing ink-jet head
KR101024009B1 (en) * 2008-11-10 2011-03-29 삼성전기주식회사 Method for Manufacturing Ink-Jet Head
US8192640B2 (en) 2008-11-10 2012-06-05 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing ink-jet head
JP2010131978A (en) * 2008-12-03 2010-06-17 Samsung Electro-Mechanics Co Ltd Manufacturing method for ink-jet head
KR101024013B1 (en) * 2008-12-03 2011-03-29 삼성전기주식회사 manufacturing method for ink-jet head
JP2010131977A (en) * 2008-12-04 2010-06-17 Samsung Electro-Mechanics Co Ltd Inkjet head and method of manufacturing the same
KR101063450B1 (en) * 2009-01-21 2011-09-08 삼성전기주식회사 Inkjet Head Manufacturing Method
JP2010221696A (en) * 2009-03-19 2010-10-07 Samsung Electro-Mechanics Co Ltd Method for manufacturing inkjet head

Similar Documents

Publication Publication Date Title
JP4357600B2 (en) Fluid ejection device
KR101114143B1 (en) Actuator with reduced drive capacitance
US7637601B2 (en) Droplet discharging head, droplet discharging apparatus, method for manufacturing droplet discharging head and method for manufacturing droplet discharging apparatus
JPH11334088A (en) Manufacture of ink jet recording head
JP2007168344A (en) Manufacturing methods of nozzle substrate, liquid droplet discharge head, liquid droplet discharge apparatus, and device manufacturing process of device
EP3083486B1 (en) Mems chip and method of manufacturing a mems chip
JP4025998B2 (en) Method for manufacturing liquid jet head
JP2007190772A (en) Droplet ejection head, droplet ejector, process for manufacturing droplet ejection head, and process for manufacturing droplet ejector
JP2007112075A (en) Electrostatic actuator, liquid droplet discharging head, liquid droplet discharging device and methods for manufacturing various electrostatic devices
JPH1034922A (en) Piezoelectric type ink jet head and its production
JPH06188472A (en) Micro-actuator and ink jet head based on its application
JP4461783B2 (en) Method for manufacturing liquid jet head
JP3218664B2 (en) Inkjet print head
EP2327115B1 (en) Removing piezoelectric material using electromagnetic radiation
JP4798348B2 (en) Silicon wafer processing method and liquid jet head manufacturing method
JP2002120367A (en) Ink jet head and its manufacturing method
JP3850298B2 (en) Ink jet head and manufacturing method thereof
JP3622484B2 (en) Piezoelectric actuator and inkjet head using the same
JP2001054946A (en) Ink-jet head
JP2001171111A (en) Method for manufacturing ink jet head
JP3178231B2 (en) Recording head
KR100408272B1 (en) Manufacturing method of micro actuator for inkjet print head
JP4670378B2 (en) Inkjet head
JP2001284669A (en) Piezoelectric actuator and ink-jet print head equipped with it
KR20000076583A (en) Inkjet print head and method fabricating the inkjet print head