JPH11213329A - Thin film magnetic head and its production - Google Patents
Thin film magnetic head and its productionInfo
- Publication number
- JPH11213329A JPH11213329A JP872198A JP872198A JPH11213329A JP H11213329 A JPH11213329 A JP H11213329A JP 872198 A JP872198 A JP 872198A JP 872198 A JP872198 A JP 872198A JP H11213329 A JPH11213329 A JP H11213329A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- magnetic film
- gap
- lower magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、磁気ディスク装置
等の磁気記憶装置のヘッド・ディスク・アッセンブリ
（ＨＤＡ）に使用される薄膜磁気ヘッド、特に、トラッ
ク幅の高精度化及び狭小化を図った高密度記録対応の薄
膜磁気ヘッド及びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-film magnetic head used for a head disk assembly (HDA) of a magnetic storage device such as a magnetic disk device, and more particularly to a high precision and narrow track width. The present invention relates to a thin film magnetic head compatible with high density recording and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】近年、コンピュータの処理能力の増大に
伴って磁気ディスク装置の記憶容量は、ますます大容量
化される傾向にある。このため、磁気ディスク装置に搭
載する薄膜磁気ヘッドの磁気コアのトラック幅も小さく
なる傾向にあり、またその製造上の精度も高い水準が要
求されてきている。2. Description of the Related Art In recent years, the storage capacity of a magnetic disk device tends to be further increased with the increase in computer processing capacity. For this reason, the track width of the magnetic core of the thin-film magnetic head mounted on the magnetic disk drive tends to be small, and a high level of manufacturing precision is required.
【０００３】図５は従来の薄膜磁気ヘッドの要部を示す
断面図、図６は同じく斜視図である。これら図５，図６
に示すように、従来の薄膜磁気ヘッドは、アルミナ系セ
ラミックスからなる基板１１上に磁性膜を被着して下部
磁性膜１２を形成し、後述上部磁性膜１７とで磁気回路
を形成する磁気コアを構成する。次に、ＳｉＯ2やＡｌ2
Ｏ3等の非磁性の金属酸化膜による磁気ギャップ膜１４
を上記下部磁性膜１２上に形成する。これにより、先端
部１０には上部磁性膜１７及び後述下部磁性膜１２間に
磁気ギャップが形成される。その後、上記磁気コアの中
央部、磁気ギャップ膜１４上に、第１絶縁層１３及び導
体コイル層１５を順次積層形成し、続いて、それらの上
部に第２絶縁層１６を積層し、最後に、先端部１０側の
磁気ギャップ膜１４上から磁気コア中央部の第２絶縁層
１６上にわたって上部磁性膜１７を被着してなる。な
お、上記導体コイル層１５は、上部，下部両磁性膜１
７，１２間を通り磁気回路と交差する。このような薄膜
磁気ヘッドでは、上部磁性膜１７、下部磁性膜１２及び
磁気ギャップ（磁気ギャップ膜１４）で磁気ディスク
（図示せず）に対して情報の読書きを行う。FIG. 5 is a sectional view showing a main part of a conventional thin film magnetic head, and FIG. 6 is a perspective view of the same. These FIGS. 5 and 6
As shown in FIG. 1, a conventional thin-film magnetic head has a magnetic core in which a lower magnetic film 12 is formed by coating a magnetic film on a substrate 11 made of alumina ceramics, and a magnetic circuit is formed with an upper magnetic film 17 to be described later. Is configured. Next, SiO 2 or Al 2
Magnetic gap film 14 made of a non-magnetic metal oxide film such as O 3
Is formed on the lower magnetic film 12. As a result, a magnetic gap is formed at the tip 10 between the upper magnetic film 17 and a lower magnetic film 12 to be described later. Thereafter, a first insulating layer 13 and a conductor coil layer 15 are sequentially formed on the center of the magnetic core and the magnetic gap film 14, and then a second insulating layer 16 is formed thereon, and finally, An upper magnetic film 17 is applied over the magnetic gap film 14 on the tip end 10 side and on the second insulating layer 16 at the center of the magnetic core. The conductor coil layer 15 is formed of the upper and lower magnetic films 1.
It passes between 7 and 12 and crosses the magnetic circuit. In such a thin-film magnetic head, information is read from and written to a magnetic disk (not shown) using the upper magnetic film 17, the lower magnetic film 12, and the magnetic gap (magnetic gap film 14).
【０００４】このような従来の薄膜磁気ヘッドの記録密
度は、主として上部磁性膜１７の形状によって決まり、
特にトラック幅を決める上部磁性膜１７の幅ｄ及びオー
バーライトや分解能を決めるポール長ｔ（下部磁性膜１
２と上部磁性膜１７との厚さの和）は高精度に形成しな
ければならない。このうち、トラック幅を決める上部磁
性膜１７の幅ｄを高精度に形成するためには、約１０μ
ｍの高さの絶縁膜（第１絶縁層１３、導体層１５及び第
２絶縁層１６のトータル高さの積層部分）の段差下部５
１において、上部磁性膜１７のパターンを高精度に形成
する必要がある。しかし、このような高段差部に感光性
樹脂を塗布形成すると、段差下部５１においては感光性
樹脂は厚くなってしまうため高精度なパターンが形成で
きないという問題があった。The recording density of such a conventional thin film magnetic head is mainly determined by the shape of the upper magnetic film 17,
In particular, the width d of the upper magnetic film 17 that determines the track width and the pole length t (the lower magnetic film 1 that determines overwriting and resolution)
2 and the thickness of the upper magnetic film 17) must be formed with high precision. In order to form the width d of the upper magnetic film 17 that determines the track width with high precision, it is necessary to use about 10 μm.
m lower portion of the insulating film having a height of m (the laminated portion of the total height of the first insulating layer 13, the conductor layer 15, and the second insulating layer 16)
1, it is necessary to form the pattern of the upper magnetic film 17 with high precision. However, when a photosensitive resin is applied to such a high step portion, there is a problem that the photosensitive resin becomes thick at the step lower portion 51, so that a highly accurate pattern cannot be formed.
【０００５】そこで、従来から段差の低い状態で上部磁
性膜１７の幅ｄを決める方法について多くの検討がなさ
れている。例えば、特開昭６０−１０４０９号公報にお
いては、絶縁膜を形成する前に上部磁性膜の先端部のみ
を形成し、その後、絶縁膜及び上部磁性膜の後部を形成
する方法が開示されている。この方法によれば、ほとん
ど段差がない状態で上部磁性膜の幅が決められるため、
トラック幅が高精度化できると記載されている。Therefore, many studies have conventionally been made on a method of determining the width d of the upper magnetic film 17 with a low step. For example, Japanese Patent Application Laid-Open No. 60-10409 discloses a method in which only the top portion of an upper magnetic film is formed before forming an insulating film, and then the rear portions of the insulating film and the upper magnetic film are formed. . According to this method, since the width of the upper magnetic film is determined in a state where there is almost no step,
It is described that the track width can be increased in accuracy.
【０００６】また、上部及び下部磁性膜を先端部と後部
との２箇所に分割して形成する方法については、特開昭
６０−１０４１０号公報において開示されている。この
方法によれば、磁性膜先端部を高飽和磁化合金で形成
し、磁性膜後部を高透磁率材料で形成することができる
ため、優れた記録特性を有する薄膜磁気ヘッドが実現で
きると記載されている。A method of forming the upper and lower magnetic films separately at two positions, that is, a front end portion and a rear end portion is disclosed in Japanese Patent Application Laid-Open No. 60-10410. According to this method, it is described that a thin film magnetic head having excellent recording characteristics can be realized because the front end of the magnetic film can be formed of a high saturation magnetization alloy and the rear portion of the magnetic film can be formed of a high magnetic permeability material. ing.
【０００７】また、特開平２−２４７８０９号公報にお
いては、第１絶縁膜を形成後、上部磁性膜の先端部のみ
を形成し、その後、先端部の保護膜を形成した後、絶縁
膜及び上部磁性膜の後部を形成する方法が開示されてい
る。この方法によれば、段差が低い状態で上部磁性膜の
幅が決められるため、トラック幅が高精度化でき、かつ
保護膜を設けているため、ポール長の変動もないと記載
されている。In Japanese Patent Application Laid-Open No. 2-247809, after forming a first insulating film, only a tip portion of an upper magnetic film is formed, and then a protective film at the tip portion is formed. A method for forming a rear portion of a magnetic film is disclosed. According to this method, it is described that the width of the upper magnetic film is determined in a state where the step is low, so that the track width can be made more accurate, and the pole length does not change because the protective film is provided.
【０００８】[0008]
【発明が解決しようとする課題】上記従来技術のうち、
特開昭６０−１０４０９号公報に記載されている方法に
よれば、トラック幅の高精度化については実現可能であ
る。しかしもう１つの重要な要素であるポール長に関し
ては何ら開示されていない。SUMMARY OF THE INVENTION Among the above prior arts,
According to the method described in Japanese Patent Application Laid-Open No. 60-10409, it is feasible to increase the accuracy of the track width. However, there is no disclosure about another important factor, the pole length.
【０００９】また、特開昭６０−１０４１０号公報に記
載されている従来技術においては、上部磁性膜を２分割
して後部を形成した後で先端部を形成する方法が開示さ
れており、この方法によれば、上部磁性膜先端部の表面
が、製造工程中にエッチングされることがなく、ポール
長の変動を小さくできる。しかしこの場合、約１０μｍ
の高さの段差下部５１において、トラック幅を決定する
上部磁性膜の先端部のパターンを形成しなければならな
いため、トラック幅を高精度化できないという問題点が
あった。The prior art described in Japanese Patent Application Laid-Open No. 60-10410 discloses a method in which an upper magnetic film is divided into two parts to form a rear part, and then a tip part is formed. According to the method, the surface of the tip of the upper magnetic film is not etched during the manufacturing process, and the variation in the pole length can be reduced. However, in this case, about 10 μm
In the lower part 51 of the step having the height, the pattern of the tip of the upper magnetic film for determining the track width must be formed, so that there is a problem that the track width cannot be made precise.
【００１０】また、特開平２−２４７８０９号公報に記
載されている従来技術によれば、トラック幅の高精度化
及びポール長の変動もない薄膜磁気ヘッドの製造は実現
可能である。しかしこの場合、第１絶縁膜上に上部磁性
膜の先端部を形成するため、従来の誘導型薄膜磁気ヘッ
ドでは問題はないが、磁気抵抗効果型ヘッドで用いられ
る記録用ヘッドの狭トラック幅では高感度の感光性樹脂
を使用すると斜面部からの光の散乱によりトラック幅の
高精度化及び狭小化ができないという問題点があった。Further, according to the prior art described in Japanese Patent Application Laid-Open No. 2-247809, it is possible to realize a high-precision track width and manufacture of a thin-film magnetic head without fluctuation in pole length. However, in this case, since the tip of the upper magnetic film is formed on the first insulating film, there is no problem with the conventional inductive type thin film magnetic head, but with the narrow track width of the recording head used in the magnetoresistive head. When a photosensitive resin having high sensitivity is used, there is a problem that the precision and narrowing of the track width cannot be reduced due to scattering of light from the slope.
【００１１】本発明の目的は、トラック幅の高精度化及
び狭小化が可能で、例えば１平方インチ当たり３ギガビ
ット以上の高記録密度が達成できる磁気記憶装置を実現
可能な薄膜磁気ヘッド及びその製造方法を提供すること
にある。An object of the present invention is to provide a thin film magnetic head capable of realizing a magnetic storage device capable of achieving a high recording density of, for example, 3 gigabits per square inch or more, which can achieve a high precision and narrow track width and a manufacturing method thereof. It is to provide a method.
【００１２】[0012]
【課題を解決するための手段】上記目的を達成するため
本発明は、下部磁性膜と、この下部磁性膜上方に形成さ
れ先端部下面が下部磁性膜の先端部上面に磁気ギャップ
を介して対向し、これによって下部磁性膜とで先端部に
磁気ギャップを有する磁気回路を形成する上部磁性膜
と、上部，下部両磁性膜間を通って前記磁気回路と交差
する導体コイル層とを、基板上に備えてなる薄膜磁気ヘ
ッドにおいて、上部磁性膜を、先端側の上部第１磁性膜
と前記導体コイル層が位置する中央部から後端側に延出
する上部第２磁性膜とに分割した。そして、下部磁性膜
には、先端側部分を残して下方へ落込む降下面部を形成
し、その降下面部上に形成された絶縁層上面と前記下部
磁性膜先端側部分上面とを連続する平坦面とし、その平
坦面上方の前記磁気ギャップを形成する磁気ギャップ膜
上の平坦面上に前記上部第１磁性膜を形成し、その上部
第１磁性膜後端側の上面に前記上部第２磁性膜の先端部
を接合する。更に、上部第１磁性膜の先端側部分上面に
は、前記上部第２磁性膜の表面加工に対する保護膜を形
成したものである。In order to achieve the above object, the present invention is directed to a lower magnetic film and a lower surface of a tip formed above the lower magnetic film opposed to an upper surface of a tip of the lower magnetic film via a magnetic gap. The upper magnetic film, which forms a magnetic circuit having a magnetic gap at the tip with the lower magnetic film, and a conductor coil layer passing between the upper and lower magnetic films and intersecting the magnetic circuit, are formed on the substrate. The upper magnetic film is divided into an upper first magnetic film on the front end side and an upper second magnetic film extending from the center where the conductor coil layer is located to the rear end side. A lower surface is formed on the lower magnetic film, and a lower surface portion is formed to fall downward while leaving a front end portion, and a flat surface that connects the upper surface of the insulating layer formed on the lower surface portion and the upper surface of the lower magnetic film front side portion. The upper first magnetic film is formed on a flat surface above the magnetic gap film that forms the magnetic gap above the flat surface, and the upper second magnetic film is formed on the upper surface on the rear end side of the upper first magnetic film. Join the tip of Further, a protective film for the surface processing of the upper second magnetic film is formed on the upper surface of the tip side portion of the upper first magnetic film.
【００１３】また本発明は、下部磁性膜と、この下部磁
性膜上方に形成され先端部下面が下部磁性膜の先端部上
面に磁気ギャップを介して対向し、これによって下部磁
性膜とで先端部に磁気ギャップを有する磁気回路を形成
する上部磁性膜と、上部，下部両磁性膜間を通って前記
磁気回路と交差する導体コイル層とを、基板上に備えて
なる薄膜磁気ヘッドの製造方法において、前記基板上に
下部磁性膜を形成した後、その下部磁性膜にその先端側
部分を残して下方へ落込む降下面部を形成すると共にそ
の降下面部上に絶縁層を形成する。その後、その絶縁層
上面と前記下部磁性膜先端側部分上面とを連続する平坦
面に形成し、その平坦面上方に前記磁気ギャップを形成
する磁気ギャップ膜を形成した後、その磁気ギャップ膜
上の平坦面上に前記上部磁性膜の先端側部分をなす上部
第１磁性膜を形成し、その後に形成される、上部第１磁
性膜とで前記上部磁性膜を構成する上部第２磁性膜の先
端部を前記上部第１磁性膜後端側の上面で接合させる。
また、少なくともその上部第２磁性膜の表面加工前まで
に、前記上部第１磁性膜の先端側部分上面に前記表面加
工に対する保護膜を形成したものである。Further, according to the present invention, the lower magnetic film and the lower surface of the front end formed above the lower magnetic film face the upper surface of the front end of the lower magnetic film via a magnetic gap. A method for manufacturing a thin-film magnetic head, comprising: a substrate having an upper magnetic film for forming a magnetic circuit having a magnetic gap therein and a conductor coil layer passing between the upper and lower magnetic films and intersecting the magnetic circuit. After the lower magnetic film is formed on the substrate, a lower surface is formed on the lower magnetic film, leaving a lower end portion thereof, and an insulating layer is formed on the lower surface. Thereafter, the upper surface of the insulating layer and the upper surface of the lower magnetic film tip side portion are formed on a continuous flat surface, and a magnetic gap film for forming the magnetic gap is formed above the flat surface. An upper first magnetic film that forms a front end portion of the upper magnetic film is formed on the flat surface, and a front end of an upper second magnetic film that is formed thereafter and forms the upper magnetic film with the upper first magnetic film. The portion is joined on the upper surface on the rear end side of the upper first magnetic film.
Further, at least before the surface processing of the upper second magnetic film, a protective film for the surface processing is formed on the upper surface of the tip side portion of the upper first magnetic film.
【００１４】上記のように本発明では、上部磁性膜を、
先端側の上部第１磁性膜と導体コイル層が位置する中央
部から後端側に延出する上部第２磁性膜とに分割し、そ
のうちの上部第１磁性膜を、上部第２磁性膜の形成に先
立って、しかも平坦面上に形成する。したがって、露光
光の散乱も生じなく、上部第１磁性膜のパターン形成が
高精度に可能となる。また、平坦面上に設けられた磁気
ギャップ膜上の平坦面に上部第１磁性膜を形成するので
平坦化プロセスにおける磁気ギャップ長の変化を防ぐこ
とができる。更に、上部第１磁性膜上に上部第２磁性膜
の表面加工に対する保護膜を形成してあるのでポール長
の変動も生じない。As described above, in the present invention, the upper magnetic film is
The upper first magnetic film is divided into an upper first magnetic film on the front end side and an upper second magnetic film extending from the center where the conductor coil layer is located to the rear end side. Prior to formation, it is formed on a flat surface. Therefore, the scattering of the exposure light does not occur, and the pattern formation of the upper first magnetic film can be performed with high precision. Further, since the upper first magnetic film is formed on the flat surface on the magnetic gap film provided on the flat surface, a change in the magnetic gap length in the flattening process can be prevented. Further, since the protective film for the surface processing of the upper second magnetic film is formed on the upper first magnetic film, the pole length does not change.
【００１５】以上により、トラック幅の高精度化及び狭
小化が可能である。例えば、トラック幅を１．５μｍ以
下と狭小化でき、またトラック幅精度が６σ＝０．５μ
ｍ以下と高精度化できる。これにより、媒体ノイズの少
ない、かつ高保磁力の電磁変換特性に優れた極めて高い
面記録密度が記録可能な薄膜磁気記録媒体を用い、本発
明磁気ヘッドを高精度に位置決めする手段を用いること
で、１平方インチ当たり３ギガビット以上の高記録密度
を達成する磁気記憶装置が実現可能となる。As described above, the track width can be made more precise and narrower. For example, the track width can be reduced to 1.5 μm or less, and the track width accuracy is 6σ = 0.5 μm.
m or less. Thereby, by using a thin film magnetic recording medium capable of recording an extremely high areal recording density excellent in electromagnetic conversion characteristics with low medium noise and high coercive force, and by using means for positioning the magnetic head of the present invention with high accuracy, A magnetic storage device that achieves a high recording density of 3 gigabits or more per square inch can be realized.
【００１６】更に本発明は、上述磁気ヘッドにおいて、
上部第１磁性膜と上部第２磁性膜とが接合される部分の
下方に、下部磁性膜の降下面部上に形成された絶縁層の
先端側部分を位置させた。すなわち、スロートハイト＝
０の位置が下部磁性膜に形成された降下面部への落込み
位置で決められ、かつその上部に形成された平坦面上方
に上部第１磁性膜と上部第２磁性膜との２つに分割され
た上部磁性膜を有する構造とした。これによれば、より
一層、トラック幅の高精度化及び狭小化が可能となる。Further, the present invention provides the above-mentioned magnetic head,
The front end portion of the insulating layer formed on the descending surface of the lower magnetic film was positioned below the portion where the upper first magnetic film and the upper second magnetic film were joined. That is, throat height =
The position of 0 is determined by the position of drop into the descending surface formed on the lower magnetic film, and is divided into two parts, an upper first magnetic film and an upper second magnetic film, above a flat surface formed on the lower surface. And a structure having an upper magnetic film. According to this, it is possible to further increase the precision and narrow the track width.
【００１７】[0017]
【発明の実施の形態】以下、図面を参照して本発明の実
施形態を説明する。図１は、本発明による薄膜磁気ヘッ
ドの一実施形態の要部を示す断面図である。この図１に
示すように、本発明磁気ヘッドは、下部磁性膜１２と、
この下部磁性膜１２上方に形成され先端部下面が下部磁
性膜１２の先端部上面に磁気ギャップを介して対向し、
これによって下部磁性膜１２とで先端部１０に磁気ギャ
ップを有する磁気回路を形成する上部磁性膜１７と、上
部，下部両磁性膜１２，１７間を通って前記磁気回路と
交差する導体コイル層１５とを、基板１１上に備えてな
る。なお、上記導体コイル層１５は後述保護膜１８上に
形成され、その周囲は上部，下部磁性膜１２，１７との
間に介在する第２絶縁層１８で覆われている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing a main part of one embodiment of a thin-film magnetic head according to the present invention. As shown in FIG. 1, the magnetic head of the present invention comprises a lower magnetic film 12 and
The lower surface of the tip formed above the lower magnetic film 12 faces the upper surface of the tip of the lower magnetic film 12 via a magnetic gap,
Thus, an upper magnetic film 17 that forms a magnetic circuit having a magnetic gap at the tip 10 with the lower magnetic film 12 and a conductor coil layer 15 that passes between the upper and lower magnetic films 12 and 17 and intersects the magnetic circuit. Are provided on the substrate 11. The conductor coil layer 15 is formed on a protective film 18 described later, and its periphery is covered with a second insulating layer 18 interposed between the upper and lower magnetic films 12 and 17.
【００１８】ここで、上記上部磁性膜１７は、先端側の
上部第１磁性膜１７１と上記導体コイル層１５が位置す
る中央部から後端側に延出する上部第２磁性膜１７２と
に分割されてなる。また、上記下部磁性膜１２には、先
端側部分を残して下方へ落込む降下面部１２ａが形成さ
れ、その降下面部１２ａ上に形成された第１絶縁層１３
上面と下部磁性膜１２先端側部分上面とが連続する平坦
面とされ、その平坦面上方の上記磁気ギャップを形成す
る磁気ギャップ膜１４上の平坦面上に上記上部第１磁性
膜１７１が形成される。そして、その上部第１磁性膜１
７１後端側の上面に上記上部第２磁性膜１７２の先端部
が接合され、上部第１磁性膜１７１の先端側部分上面に
は、上部第２磁性膜１７２の表面加工、ここではエッチ
ング加工に対する保護膜１８が形成されている。Here, the upper magnetic film 17 is divided into an upper first magnetic film 171 on the front end side and an upper second magnetic film 172 extending from the center where the conductor coil layer 15 is located to the rear end side. Be done. The lower magnetic film 12 is provided with a descending surface portion 12a which falls downward leaving a tip side portion, and a first insulating layer 13 formed on the descending surface portion 12a.
The upper surface and the upper surface of the front end portion of the lower magnetic film 12 are continuous flat surfaces, and the upper first magnetic film 171 is formed on the flat surface on the magnetic gap film 14 forming the magnetic gap above the flat surface. You. Then, the upper first magnetic film 1
The top end of the upper second magnetic film 172 is joined to the upper surface on the rear end side of the upper 71, and the upper second magnetic film 171 is provided with the surface processing, here etching, on the upper surface of the front end portion of the upper first magnetic film 171. A protective film 18 is formed.
【００１９】なお、図示するように、上部第１磁性膜１
７１と上部第２磁性膜１７２とが接合される部分の下方
に、下部磁性膜１２の降下面部１２ａ上に形成された第
１絶縁層１３の先端側部分が位置している。すなわち、
スロートハイト＝０の位置イが下部磁性膜１２に形成さ
れた降下面部１２ａへの落込み位置１２ｂで決められ、
かつその上部に形成された平坦面上方に上部第１磁性膜
１７１と上部第２磁性膜１７２との２つに分割された上
部磁性膜１７を有する構造とされている。As shown, the upper first magnetic film 1
Below the portion where the first magnetic film 71 and the upper second magnetic film 172 are joined, the tip side portion of the first insulating layer 13 formed on the descending surface portion 12a of the lower magnetic film 12 is located. That is,
The position A of the throat height = 0 is determined by the drop position 12b into the descending surface portion 12a formed on the lower magnetic film 12,
The upper magnetic film 17 is divided into two, an upper first magnetic film 171 and an upper second magnetic film 172, above a flat surface formed on the upper surface.
【００２０】図２は本発明による薄膜磁気ヘッドの製造
方法の一実施形態を示す断面図である。この図２（ａ）
〜（ｉ）に示すように、本発明磁気ヘッドは、まず、ア
ルミナ系セラミックスからなる基板１１上にＣｏ系アモ
ルファスやＦｅ系等の磁性膜をスパッタ法又はめっき法
で被着し、ウェッチエッチング法、イオンミリング法又
はリフトオフ法等を用いて下部磁性膜１２を形成する
（図２（ａ））。次に、この下部磁性膜１２と後述上部
第１磁性膜１７１との間での磁界の漏れを防止するため
に、下部磁性膜１２の中央部から後端側にわたってウェ
ットエッチング法、イオンミリング法等を用いてエッチ
ングし、降下面部１２ａを形成する（図２（ｂ））。そ
して、その降下面部１２ａを平坦化するように、樹脂系
材による、又はＳｉＯ2やＡｌ2Ｏ3等の非磁性の金属酸
化膜による第１絶縁層１３を降下面部１２ａに被着形成
する（図２（ｃ））。第１絶縁層１３及びこの第１絶縁
層１３に隣接して露出する上記下部磁性膜１２上全面の
最終的な平坦化は、イオンビームを用いたエッチバック
法又は化学的機械研磨法を用いることが望ましい。FIG. 2 is a sectional view showing one embodiment of a method of manufacturing a thin film magnetic head according to the present invention. This FIG. 2 (a)
As shown in (i) to (i), in the magnetic head of the present invention, first, a Co-based amorphous or Fe-based magnetic film is deposited on a substrate 11 made of alumina-based ceramics by a sputtering method or a plating method, and is etched by wet etching. The lower magnetic film 12 is formed by using a method, an ion milling method or a lift-off method (FIG. 2A). Next, in order to prevent a magnetic field from leaking between the lower magnetic film 12 and an upper first magnetic film 171 to be described later, a wet etching method, an ion milling method, etc. Is used to form a descending surface portion 12a (FIG. 2B). Then, the first insulating layer 13 made of a resin material or a non-magnetic metal oxide film such as SiO 2 or Al 2 O 3 is formed on the falling surface portion 12a so as to flatten the falling surface portion 12a ( (FIG. 2 (c)). The final flattening of the entire surface of the first insulating layer 13 and the lower magnetic film 12 exposed adjacent to the first insulating layer 13 is performed by using an etch-back method using an ion beam or a chemical mechanical polishing method. Is desirable.
【００２１】その後、平坦化された第１絶縁層１３及び
第１絶縁層１３に隣接して露出する上記下部磁性膜１２
上全面に、スパッタ法、イオンミリング法又はリフトオ
フ法等を用いてＳｉＯ2やＡｌ2Ｏ3等の非磁性の金属酸
化膜による磁気ギャップ膜１４を積層形成する（図２
（ｄ））。この磁気ギャップ膜１４と第１絶縁層１３と
は逆の位置，順番で形成してもよい。Thereafter, the planarized first insulating layer 13 and the lower magnetic film 12 exposed adjacent to the first insulating layer 13 are exposed.
A magnetic gap film 14 made of a nonmagnetic metal oxide film such as SiO 2 or Al 2 O 3 is formed on the entire upper surface by sputtering, ion milling, lift-off, or the like (FIG. 2).
(D)). The magnetic gap film 14 and the first insulating layer 13 may be formed in the opposite positions and order.
【００２２】次に、Ｃｏ系アモルファスやＦｅ系等の磁
性膜をスパッタ法又はめっき法で被着し、続いてウェッ
チエッチング法、イオンミリング法又はリフトオフ法等
を用いて磁気ギャップ膜１４上の前方側に上部第１磁性
膜１７１を積層形成する（図２（ｅ））。その後、上部
第１磁性膜１７１上に、スパッタ法、イオンミリング法
又はリフトオフ法等を用いてＳｉＯ2やＡｌ2Ｏ3等の非
磁性の金属酸化膜による、上部第１磁性膜１７１を保護
する保護膜１８を形成する（図２（ｆ））。この時、磁
気ギャップ膜１４上の中央部から後方側にかけても保護
膜１８が形成されるが、少なくとも上記上部第１磁性膜
１７１と後述上部第２磁性膜１７２とを磁気的に接続
（接合）するためのコンタクトホールＣＨも形成され
る。Next, a magnetic film of Co-based amorphous or Fe-based is deposited by a sputtering method or a plating method, and subsequently, on the magnetic gap film 14 by a wet etching method, an ion milling method or a lift-off method. An upper first magnetic film 171 is stacked and formed on the front side (FIG. 2E). Thereafter, the upper first magnetic film 171 is protected on the upper first magnetic film 171 by a non-magnetic metal oxide film such as SiO 2 or Al 2 O 3 using a sputtering method, an ion milling method, a lift-off method, or the like. The protection film 18 is formed (FIG. 2F). At this time, the protective film 18 is also formed from the central portion to the rear side on the magnetic gap film 14, but at least the upper first magnetic film 171 and the later-described upper second magnetic film 172 are magnetically connected (bonded). A contact hole CH is also formed.
【００２３】その後、磁場を誘導するＣｕやＡｕ等から
なる導体膜をスパッタ法又はめっき法で被着し、続いて
ウェッチエッチング法、イオンミリング法又はリフトオ
フ法等を用いて後方側の保護膜１８上に導体コイル層１
５を形成する（図２（ｇ））。更に、この導体コイル層
１５と後述上部第２磁性膜１７２との絶縁をとるため、
必要箇所に樹脂系材による、又はＳｉＯ2やＡｌ2Ｏ3等
の非磁性の金属酸化膜による第２絶縁層１６を被着形成
する（図２（ｈ））。Thereafter, a conductive film made of Cu, Au, or the like for inducing a magnetic field is deposited by a sputtering method or a plating method, and subsequently, a protective film on the rear side is formed by a wet etching method, an ion milling method, a lift-off method, or the like. 18 on the conductor coil layer 1
5 is formed (FIG. 2G). Further, in order to insulate the conductor coil layer 15 from an upper second magnetic film 172 described later,
A second insulating layer 16 made of a resin-based material or a non-magnetic metal oxide film such as SiO 2 or Al 2 O 3 is formed on necessary portions (FIG. 2H).
【００２４】最後に、Ｃｏ系アモルファスやＦｅ系等の
磁性膜をスパッタ法又はめっき法で被着し、続いてウェ
ッチエッチング法、イオンミリング法又はリフトオフ法
等を用いてコンタクトホールＣＨを含めた後方側に上部
第２磁性膜１７２を形成し（図２（ｉ））、薄膜磁気ヘ
ッドを得る。Finally, a magnetic film of Co-based amorphous or Fe-based is deposited by a sputtering method or a plating method. An upper second magnetic film 172 is formed on the rear side (FIG. 2I) to obtain a thin-film magnetic head.
【００２５】図３に本発明磁気ヘッド及び従来磁気ヘッ
ドのトラック幅精度を示す。（ａ）が本発明磁気ヘッド
のトラック幅精度を示し、（ｂ）が従来磁気ヘッドのト
ラック幅精度を示す。両図から、上部磁性膜１７の先端
側（上部第１磁性膜１７１）のパターンを平坦化した面
で形成する本発明磁気ヘッドの方が従来磁気ヘッドに比
べ、トラック幅精度が６σ＝０．５μｍ以下と高精度化
できることが分かる。また、本発明磁気ヘッドの製造方
法によれば、露光光の散乱による上記パターンの寸法シ
フトも抑止することができ、従来のそれに比べ狭トラッ
ク幅を形成できることが分かる。FIG. 3 shows the track width accuracy of the magnetic head of the present invention and the conventional magnetic head. (A) shows the track width accuracy of the magnetic head of the present invention, and (b) shows the track width accuracy of the conventional magnetic head. From both figures, the magnetic head of the present invention, in which the pattern on the tip side (upper first magnetic film 171) of the upper magnetic film 17 is formed on a flattened surface, has a track width accuracy of 6σ = 0. It can be seen that the precision can be improved to 5 μm or less. In addition, according to the method of manufacturing the magnetic head of the present invention, it can be seen that the dimensional shift of the pattern due to scattering of the exposure light can be suppressed, and a narrower track width can be formed as compared with the conventional one.
【００２６】したがって本発明によれば、寸法精度に優
れ、かつ狭トラック幅の形成が可能であり、高密度記録
に適した薄膜磁気ヘッドが実現できる。なお、上部第１
磁性膜１７１に飽和磁束密度の大きい磁性材料を用い、
上部第２磁性膜１７２に透磁率の大きい磁性材料を用い
れば、書き込み特性に優れた薄膜磁気ヘッドが実現でき
る。Therefore, according to the present invention, a thin-film magnetic head which is excellent in dimensional accuracy and can be formed with a narrow track width and is suitable for high-density recording can be realized. The upper first
Using a magnetic material having a high saturation magnetic flux density for the magnetic film 171,
If a magnetic material having a high magnetic permeability is used for the upper second magnetic film 172, a thin-film magnetic head having excellent writing characteristics can be realized.
【００２７】図４は本発明による薄膜磁気ヘッドが適用
された磁気記憶装置の一例を示す斜視図である。この磁
気記憶装置は、媒体ノイズの少ない、かつ高保磁力の電
磁変換特性に優れた極めて高い面記録密度で情報記録可
能な薄膜磁気記録媒体２０３と、これを記録方向に駆動
するスピンドルモータ２０２と、記録部及び再生部から
なる本発明の薄膜磁気ヘッド２０４と、この薄膜磁気ヘ
ッド２０４を上記磁気記録媒体２０３に対して相対運動
をさせるガイドアーム２０５と、上記薄膜磁気ヘッド２
０４への信号入力と薄膜磁気ヘッド２０４からの出力信
号再生を行うための記録再生信号処理回路２０１とを備
えてなり、これにより本発明磁気ヘッド２０４の特性確
認がされた。FIG. 4 is a perspective view showing an example of a magnetic storage device to which the thin film magnetic head according to the present invention is applied. This magnetic storage device has a medium noise, a thin film magnetic recording medium 203 capable of recording information at an extremely high areal recording density excellent in electromagnetic conversion characteristics of a high coercive force, a spindle motor 202 for driving this in a recording direction, A thin-film magnetic head 204 of the present invention comprising a recording unit and a reproducing unit; a guide arm 205 for moving the thin-film magnetic head 204 relative to the magnetic recording medium 203;
A recording / reproducing signal processing circuit 201 for inputting a signal to the magnetic head 04 and reproducing an output signal from the thin-film magnetic head 204 was provided, whereby the characteristics of the magnetic head 204 of the present invention were confirmed.
【００２８】ここで、上述磁気記憶装置は、複数の磁気
記録媒体２０３を有し、ガイドアーム２０５が複数の本
発明磁気ヘッド２０４を有した構成でもよいことはいう
までもない。また、本発明磁気ヘッド２０４は、異方性
磁気抵抗効果（ＡＭＲ）を用いたＭＲヘッドだけでな
く、巨大磁気抵抗効果（ＧＭＲ）を利用したスピンバル
ブ型ＭＲヘッドにも適用できる。なお本発明磁気ヘッド
２０４は、記録再生兼用型磁気ヘッドのみならず、磁気
抵抗効果型再生ヘッドと組合せ使用する記録再生分離型
磁気ヘッドの記録ヘッドに適用してもよく、この場合
も、記録再生兼用型磁気ヘッドの場合と同様に書き込み
特性に優れる。Here, it goes without saying that the magnetic storage device described above may have a configuration having a plurality of magnetic recording media 203 and a guide arm 205 having a plurality of magnetic heads 204 of the present invention. Further, the magnetic head 204 of the present invention can be applied not only to an MR head using the anisotropic magnetoresistance effect (AMR) but also to a spin valve MR head using a giant magnetoresistance effect (GMR). The magnetic head 204 of the present invention may be applied not only to a recording / reproducing type magnetic head but also to a recording / reproducing separation type magnetic head used in combination with a magnetoresistive effect type reproducing head. It has excellent writing characteristics as in the case of the dual-purpose magnetic head.
【００２９】[0029]
【発明の効果】以上説明したように本発明によれば、ト
ラック幅の高精度化及び狭小化が可能で、例えば１平方
インチ当たり３ギガビット以上の高記録密度が達成でき
る磁気記憶装置を実現可能な薄膜磁気ヘッド及びその製
造方法を提供することができる。As described above, according to the present invention, it is possible to realize a magnetic storage device capable of increasing the precision and narrowing of the track width and achieving a high recording density of, for example, 3 gigabits per square inch or more. A thin film magnetic head and a method of manufacturing the same can be provided.
【図１】本発明磁気ヘッドの一実施形態の要部を示す断
面図である。FIG. 1 is a sectional view showing a main part of an embodiment of a magnetic head of the present invention.
【図２】本発明磁気ヘッドの製造方法の一実施形態を示
す断面図である。FIG. 2 is a sectional view showing one embodiment of a method for manufacturing a magnetic head according to the present invention.
【図３】本発明磁気ヘッド及び従来磁気ヘッドのトラッ
ク幅精度を示すグラフである。FIG. 3 is a graph showing track width accuracy of the magnetic head of the present invention and a conventional magnetic head.
【図４】本発明磁気ヘッドが適用された磁気記憶装置の
一例を示す斜視図である。FIG. 4 is a perspective view showing an example of a magnetic storage device to which the magnetic head of the present invention is applied.
【図５】従来磁気ヘッドの要部を示す断面図である。FIG. 5 is a cross-sectional view showing a main part of a conventional magnetic head.
【図６】従来磁気ヘッドの要部を示す斜視図である。FIG. 6 is a perspective view showing a main part of a conventional magnetic head.
１０…磁気ヘッド先端部、１１…基板、１２…下部磁性
膜、１２ａ…降下面部、１２ｂ…落込み位置、１３…第
１絶縁層、１４…磁気ギャップ膜、１５…導体コイル
層、１６…第２絶縁層、１７…上部磁性膜、１７１…上
部第１磁性膜、１７２…上部第２磁性膜、１８…保護
膜、ＣＨ…コンタクトホール、２０１…記録再生信号処
理回路、２０２…スピンドルモータ、２０３…薄膜磁気
記録媒体、２０４…薄膜磁気ヘッド（本発明磁気ヘッ
ド）、２０５…ガイドアーム。DESCRIPTION OF SYMBOLS 10 ... magnetic head front-end | tip, 11 ... board | substrate, 12 ... lower magnetic film, 12a ... falling surface part, 12b ... drop position, 13 ... 1st insulating layer, 14 ... magnetic gap film, 15 ... conductor coil layer, 16 ... 2 insulating layer, 17 upper magnetic film, 171 upper first magnetic film, 172 upper second magnetic film, 18 protective film, CH contact hole, 201 read / write signal processing circuit, 202 spindle motor, 203 ... thin-film magnetic recording medium, 204 ... thin-film magnetic head (the magnetic head of the present invention), 205 ... guide arm.
Claims (3)
成され先端部下面が下部磁性膜の先端部上面に磁気ギャ
ップを介して対向し、これによって下部磁性膜とで先端
部に磁気ギャップを有する磁気回路を形成する上部磁性
膜と、上部，下部両磁性膜間を通って前記磁気回路と交
差する導体コイル層とを、基板上に備えてなる薄膜磁気
ヘッドにおいて、 前記上部磁性膜は、先端側の上部第１磁性膜と前記導体
コイル層が位置する中央部から後端側に延出する上部第
２磁性膜とに分割され、 かつ前記下部磁性膜には、先端側部分を残して下方へ落
込む降下面部が形成され、その降下面部上に形成された
絶縁層上面と前記下部磁性膜先端側部分上面とが連続す
る平坦面とされ、その平坦面上方の前記磁気ギャップを
形成する磁気ギャップ膜上の平坦面上に前記上部第１磁
性膜が形成され、その上部第１磁性膜後端側の上面に前
記上部第２磁性膜の先端部が接合され、上部第１磁性膜
の先端側部分上面には、前記上部第２磁性膜の表面加工
に対する保護膜が形成されていることを特徴とする薄膜
磁気ヘッド。1. A lower magnetic film, and a lower surface of a tip portion formed above the lower magnetic film is opposed to an upper surface of a tip portion of the lower magnetic film via a magnetic gap. A thin film magnetic head comprising, on a substrate, an upper magnetic film forming a magnetic circuit having: a conductive coil layer passing between the upper and lower magnetic films and intersecting the magnetic circuit; An upper first magnetic film on the front end side and an upper second magnetic film extending from the center where the conductor coil layer is located to the rear end side, and the lower magnetic film has a front end portion. Is formed, and the upper surface of the insulating layer formed on the lower surface and the upper surface of the front end portion of the lower magnetic film are formed as a continuous flat surface, and the magnetic gap above the flat surface is formed. On magnetic gap film The upper first magnetic film is formed on the upper surface, the top end of the upper second magnetic film is joined to the upper surface on the rear end side of the upper first magnetic film, A thin film magnetic head, wherein a protective film for surface processing of the upper second magnetic film is formed.
成され先端部下面が下部磁性膜の先端部上面に磁気ギャ
ップを介して対向し、これによって下部磁性膜とで先端
部に磁気ギャップを有する磁気回路を形成する上部磁性
膜と、上部，下部両磁性膜間を通って前記磁気回路と交
差する導体コイル層とを、基板上に備えてなる薄膜磁気
ヘッドにおいて、 前記上部磁性膜は、先端側の上部第１磁性膜と前記導体
コイル層が位置する中央部から後端側に延出する上部第
２磁性膜とに分割され、 かつ前記下部磁性膜には、先端側部分を残して下方へ落
込む降下面部が形成され、その降下面部上に形成された
絶縁層上面と前記下部磁性膜先端側部分上面とが連続す
る平坦面とされ、その平坦面上方の前記磁気ギャップを
形成する磁気ギャップ膜上の平坦面上に前記上部第１磁
性膜が形成され、その上部第１磁性膜後端側の上面に前
記上部第２磁性膜の先端部が接合され、上部第１磁性膜
の先端側部分上面には、前記上部第２磁性膜の表面加工
に対する保護膜が形成され、 前記上部第１磁性膜と上部第２磁性膜とが接合される部
分の下方には、前記下部磁性膜の降下面部上に形成され
た前記絶縁層の先端側部分が位置されていることを特徴
とする薄膜磁気ヘッド。2. A lower magnetic film and a lower surface of a front end portion formed above the lower magnetic film opposes an upper surface of a front end portion of the lower magnetic film via a magnetic gap. A thin film magnetic head comprising, on a substrate, an upper magnetic film forming a magnetic circuit having: a conductive coil layer passing between the upper and lower magnetic films and intersecting the magnetic circuit; An upper first magnetic film on the front end side and an upper second magnetic film extending from the center where the conductor coil layer is located to the rear end side, and the lower magnetic film has a front end portion. Is formed, and the upper surface of the insulating layer formed on the lower surface and the upper surface of the front end portion of the lower magnetic film are formed as a continuous flat surface, and the magnetic gap above the flat surface is formed. On magnetic gap film The upper first magnetic film is formed on the upper surface, the top end of the upper second magnetic film is joined to the upper surface on the rear end side of the upper first magnetic film, Forming a protection film against surface processing of the upper second magnetic film; forming a protection film on a descending surface of the lower magnetic film below a portion where the upper first magnetic film and the upper second magnetic film are joined; A thin-film magnetic head, wherein a tip side portion of the insulating layer is located.
成され先端部下面が下部磁性膜の先端部上面に磁気ギャ
ップを介して対向し、これによって下部磁性膜とで先端
部に磁気ギャップを有する磁気回路を形成する上部磁性
膜と、上部，下部両磁性膜間を通って前記磁気回路と交
差する導体コイル層とを、基板上に備えてなる薄膜磁気
ヘッドの製造方法において、 前記基板上に下部磁性膜を形成した後、その下部磁性膜
にその先端側部分を残して下方へ落込む降下面部を形成
すると共にその降下面部上に絶縁層を形成し、 その後、その絶縁層上面と前記下部磁性膜先端側部分上
面とを連続する平坦面に形成し、 その平坦面上方に前記磁気ギャップを形成する磁気ギャ
ップ膜を形成した後、その磁気ギャップ膜上の平坦面上
に前記上部磁性膜の先端側部分をなす上部第１磁性膜を
形成し、 その後に形成される、上部第１磁性膜とで前記上部磁性
膜を構成する上部第２磁性膜の先端部を前記上部第１磁
性膜後端側の上面で接合させ、 少なくともその上部第２磁性膜の表面加工前までに、前
記上部第１磁性膜の先端側部分上面に前記表面加工に対
する保護膜を形成することを特徴とする薄膜磁気ヘッド
の製造方法。3. A lower magnetic film and a lower surface of a front end portion formed above the lower magnetic film opposes an upper surface of a front end portion of the lower magnetic film via a magnetic gap. A method for manufacturing a thin-film magnetic head, comprising: a substrate, comprising an upper magnetic film forming a magnetic circuit having a magnetic circuit, and a conductor coil layer passing between the upper and lower magnetic films and intersecting the magnetic circuit. After the lower magnetic film is formed on the lower magnetic film, the lower magnetic film forms a descending surface part which falls downward while leaving its tip side part, and an insulating layer is formed on the descending surface part. The upper surface of the lower magnetic film is formed on a flat surface that is continuous with the upper surface, and a magnetic gap film for forming the magnetic gap is formed above the flat surface. Membrane Forming an upper first magnetic film forming a front end side portion, and forming a front end portion of the upper second magnetic film, which is formed by the upper first magnetic film with the upper first magnetic film, after the upper first magnetic film; A thin film magnetic layer formed by bonding at the end upper surface and forming a protective film for the surface processing on at least a top surface of a tip side portion of the upper first magnetic film before the surface processing of the upper second magnetic film. Head manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP872198A JPH11213329A (en) | 1998-01-20 | 1998-01-20 | Thin film magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP872198A JPH11213329A (en) | 1998-01-20 | 1998-01-20 | Thin film magnetic head and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11213329A true JPH11213329A (en) | 1999-08-06 |
Family
ID=11700824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP872198A Pending JPH11213329A (en) | 1998-01-20 | 1998-01-20 | Thin film magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11213329A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1089259A2 (en) * | 1999-09-30 | 2001-04-04 | Fujitsu Limited | Thin film magnetic head with short lower magnetic pole piece |
| US6388845B1 (en) * | 1998-04-02 | 2002-05-14 | Tdk Corporation | Thin film magnetic head and method of manufacturing the same |
| WO2002056304A1 (en) * | 2001-01-15 | 2002-07-18 | Fujitsu Limited | Thin film magnetic head and production method therefor |
| US6597543B1 (en) | 1998-06-08 | 2003-07-22 | Tdk Corporation | Thin-film magnetic head and magnetic storage apparatus using the same |
| US6646828B1 (en) | 1999-09-17 | 2003-11-11 | Tdk Corporation | Thin film magnetic head and method of manufacture the same |
| EP1696424A1 (en) * | 2005-02-24 | 2006-08-30 | Fujitsu Limited | Magnetic head and method of manufacturing the same |
-
1998
- 1998-01-20 JP JP872198A patent/JPH11213329A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6388845B1 (en) * | 1998-04-02 | 2002-05-14 | Tdk Corporation | Thin film magnetic head and method of manufacturing the same |
| US6558561B2 (en) | 1998-04-02 | 2003-05-06 | Tdk Corporation | Thin film magnetic head and method of manufacturing the same |
| US7230794B2 (en) | 1998-06-08 | 2007-06-12 | Tdk Corporation | Thin-film magnetic head with nonmagnetic body filled concave portion formed on a pole layer and magnetic storage apparatus using the same |
| US6597543B1 (en) | 1998-06-08 | 2003-07-22 | Tdk Corporation | Thin-film magnetic head and magnetic storage apparatus using the same |
| US7054107B2 (en) | 1998-06-08 | 2006-05-30 | Tdk Corporation | Thin-film magnetic head with nonmagnetic body filled concave portion formed on a pole layer and magnetic storage apparatus using the same |
| US7239482B2 (en) | 1998-06-08 | 2007-07-03 | Tdk Corporation | Thin-film magnetic head and nonmagnetic body filled concave portion formed on a pole layer and magnetic storage apparatus using the same |
| US6646828B1 (en) | 1999-09-17 | 2003-11-11 | Tdk Corporation | Thin film magnetic head and method of manufacture the same |
| EP1089259A3 (en) * | 1999-09-30 | 2002-05-22 | Fujitsu Limited | Thin film magnetic head with short lower magnetic pole piece |
| EP1089259A2 (en) * | 1999-09-30 | 2001-04-04 | Fujitsu Limited | Thin film magnetic head with short lower magnetic pole piece |
| US6751052B1 (en) | 1999-09-30 | 2004-06-15 | Fujitsu Limited | Thin film magnetic head with short lower magnetic pole piece |
| KR100617277B1 (en) * | 1999-09-30 | 2006-08-30 | 후지쯔 가부시끼가이샤 | Thin film magnetic head and magnetic recording medium drive |
| WO2002056304A1 (en) * | 2001-01-15 | 2002-07-18 | Fujitsu Limited | Thin film magnetic head and production method therefor |
| US7167341B2 (en) | 2001-01-15 | 2007-01-23 | Fujitsu Limited | Thin film magnetic head having lower auxiliary magnetic pole on lower magnetic pole layer |
| EP1696424A1 (en) * | 2005-02-24 | 2006-08-30 | Fujitsu Limited | Magnetic head and method of manufacturing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7095585B2 (en) | Hard disk drive for perpendicular recording with transducer having submicron gap between pole tips | |
| US7154707B2 (en) | Thin film magnetic head and magnetic recording apparatus | |
| US6636390B2 (en) | Magnetic head and magnetic recording and reproducing system | |
| US20050168883A1 (en) | Magnetic tunnel effect type magnetic head, and method of producing same | |
| US7716812B2 (en) | Method of manufacturing a magnetic head | |
| US7319572B2 (en) | Thin film coil and method of forming the same, and thin film magnetic head and method of manufacturing the same | |
| JP2000105906A (en) | Production of thin film magnetic head | |
| US6728064B2 (en) | Thin-film magnetic head having two magnetic layers, one of which includes a pole portion layer and a yoke portion layer, and method of manufacturing same | |
| US7511928B2 (en) | Magnetic tunnel effect type magnetic head, and recorder/player | |
| JPH11339223A (en) | Etchig method of magnetic layer, formation of magnetic pole for thin-film magnetic head and manufacture of thin-film magnetic head | |
| JP3367877B2 (en) | Thin film magnetic head and method of manufacturing the same | |
| JPH11213329A (en) | Thin film magnetic head and its production | |
| US6989964B2 (en) | Magnetic head having a pole piece with a double pedestal structure | |
| JP2001331909A (en) | Thin film magnetic head and its manufacturing method | |
| JP2001167408A (en) | Thin-film magnetic head and method for manufacturing the same | |
| US7137191B2 (en) | Method for manufacturing magnetic head | |
| JP2727275B2 (en) | Manufacturing method of integrated magnetic head | |
| JP2003263705A (en) | Perpendicular recording magnetic head and magnetic disk drive on which head is mounted | |
| JP2000155914A (en) | Manufacture of thin film magnetic head | |
| JP2002008207A (en) | Thin film magnetic head and its manufacturing method | |
| JPS62114113A (en) | Thin film magnetic head | |
| JP4010702B2 (en) | Manufacturing method of thin film magnetic head | |
| JPH07153022A (en) | Thin-film magnetic head | |
| JP2004335095A (en) | Thin film magnetic head and its manufacturing method | |
| JPH11134612A (en) | Production of thin film magnetic head and recording-reproduction separation type head |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20040622 |