JPH11160727A - Liquid crystal display device - Google Patents
Liquid crystal display deviceInfo
- Publication number
- JPH11160727A JPH11160727A JP33017497A JP33017497A JPH11160727A JP H11160727 A JPH11160727 A JP H11160727A JP 33017497 A JP33017497 A JP 33017497A JP 33017497 A JP33017497 A JP 33017497A JP H11160727 A JPH11160727 A JP H11160727A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal display
- transparent substrate
- conductive film
- transparent conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Liquid Crystal (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、液晶表示装置など
の平面型表示装置用のアクティブマトリクス型装置の駆
動回路やバックライトなどで発生した電磁波により生じ
るＥＭＩ（electro magnetic interference)に対する対
策を施した液晶表示装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention takes measures against EMI (electromagnetic interference) generated by electromagnetic waves generated by a driving circuit of an active matrix type device for a flat display device such as a liquid crystal display device or a backlight. The present invention relates to a liquid crystal display device.
【０００２】[0002]
【従来の技術】従来の液晶表示装置（以下、「ＬＣＤ」
ともいう）は、液晶表示パネルと、該液晶表示パネルを
挟持する２枚の偏光板と、該偏光板を介して液晶表示パ
ネルに光を放射するバックライトと、前記液晶表示パネ
ルに電気信号を供給する駆動回路とからなる。2. Description of the Related Art Conventional liquid crystal display devices (hereinafter referred to as "LCD").
), A liquid crystal display panel, two polarizing plates sandwiching the liquid crystal display panel, a backlight that emits light to the liquid crystal display panel via the polarizing plate, and an electric signal transmitted to the liquid crystal display panel. And a driving circuit for supplying.
【０００３】前記液晶表示パネルは、第１の透明基板と
第２の透明基板と液晶材料とを含んでなる。前記液晶表
示パネルは、第１の透明基板を第２の透明基板に一定の
間隙を保持しつつ対向させた状態にし、第１の透明基板
の周縁部を第２の透明基板の周縁部に貼着したのち、前
記間隙に液晶材料に注入することにより形成される。従
来のＬＣＤの一例であるアクティブマトリクス型ＬＣＤ
の液晶表示パネルの表示部はマトリクス状に形成された
画素からなる。各画素には、液晶材料を駆動するための
電界を発生するための透明電極と、薄膜トランジスタ
（以下、「ＴＦＴ」という）などのスイッチング素子と
が設けられる。駆動回路から出力された電気信号は、ス
イッチング素子を介して各画素の透明電極に印加され
る。前記駆動回路は、走査信号を出力する駆動回路（以
下、「走査駆動回路」という）とデータ信号を出力する
駆動回路（以下、「データ駆動回路」という）とからな
る。走査信号およびデータ信号は、それぞれゲート配線
およびソース配線を介してスイッチング素子に印加され
る。[0003] The liquid crystal display panel includes a first transparent substrate, a second transparent substrate, and a liquid crystal material. In the liquid crystal display panel, the first transparent substrate is opposed to the second transparent substrate while maintaining a certain gap, and the peripheral portion of the first transparent substrate is attached to the peripheral portion of the second transparent substrate. After being attached, it is formed by injecting a liquid crystal material into the gap. Active matrix type LCD which is an example of conventional LCD
The display section of the liquid crystal display panel is composed of pixels formed in a matrix. Each pixel is provided with a transparent electrode for generating an electric field for driving a liquid crystal material, and a switching element such as a thin film transistor (hereinafter, referred to as “TFT”). The electric signal output from the driving circuit is applied to the transparent electrode of each pixel via the switching element. The driving circuit includes a driving circuit that outputs a scanning signal (hereinafter, referred to as a “scan driving circuit”) and a driving circuit that outputs a data signal (hereinafter, referred to as a “data driving circuit”). The scanning signal and the data signal are applied to the switching element via the gate wiring and the source wiring, respectively.
【０００４】一般に、アクティブマトリクス型ＬＣＤ
は、高視野角および高コントラストなどの特徴を有し、
ＡＶ（audio-visual）およびＯＡ（office automation)
用のＬＣＤに広く用いられている。Generally, an active matrix type LCD
Has features such as high viewing angle and high contrast,
AV (audio-visual) and OA (office automation)
Widely used for LCDs.
【０００５】前記アクティブマトリクス型ＬＣＤの構造
や製法は、特開平８−６０６９号公報に開示されてい
る。この種のアクティブマトリクス型ＬＣＤにおける電
磁干渉（electro magnetic interference （ＥＭＩ））
対策としては、駆動回路から出力される電気信号の立ち
上がり部分または立ち下がり部分を鈍らせるようにし、
高調波の発生を抑制したり、最近では、液晶表示パネル
の表示面に透光性の電磁波シールド板などを設け、表示
面から射出される電磁波が前記シールド板にて遮断され
るようにしたりして、電磁波を低減している。なお、シ
ールド板による遮断を行ったＬＣＤの一例は、特開昭６
２−２２９１７９号公報に開示されている。The structure and manufacturing method of the active matrix type LCD are disclosed in Japanese Patent Application Laid-Open No. Hei 8-6069. Electromagnetic interference (EMI) in this type of active matrix LCD
As a countermeasure, the rising or falling part of the electric signal output from the drive circuit should be blunted,
The generation of harmonics has been suppressed, and recently, a translucent electromagnetic wave shield plate or the like has been provided on the display surface of a liquid crystal display panel so that electromagnetic waves emitted from the display surface are blocked by the shield plate. And reduce electromagnetic waves. An example of an LCD in which the shielding is performed by a shield plate is disclosed in
It is disclosed in JP-A-2-229179.
【０００６】前述のように、従来のＥＭＩ対策が施され
たＬＣＤでは、シールド板を固定するための構成を液晶
表示パネルに設けることが必要で、しかも、この構成が
複雑になったり、シールド板の固定取り付け作業が、煩
雑になったり、シールド板による干渉縞で画面が見づら
くなるという問題があった。As described above, in the LCD in which the conventional EMI countermeasures are taken, it is necessary to provide a structure for fixing the shield plate in the liquid crystal display panel. However, there is a problem that the fixing and attaching work becomes complicated and the screen becomes difficult to see due to interference fringes caused by the shield plate.
【０００７】また、第１の透明基板表面にＴＦＴ、透明
電極、ゲート配線およびソース配線などが設けられてな
る基板（以下、「アクティブマトリクス基板」という）
自体には、これといったＥＭＩ対策は施されていない。A substrate having a TFT, a transparent electrode, a gate wiring, a source wiring and the like provided on the surface of a first transparent substrate (hereinafter referred to as an "active matrix substrate")
No EMI countermeasures have been taken on itself.
【０００８】図１１は、従来のアクティブマトリクス基
板の一例を示す説明図である。図１１において、１は、
第１の透明基板であるガラス基板、２ａはソース配線、
２ｂは、ゲート絶縁膜（図示せず）を介してソース配線
に直交するゲート配線、２ｃは、ゲート絶縁膜を介して
ソース配線２ａに直交し、かつ、補助容量を形成するた
めのコモン信号が印加されるＣｓ配線、３ａはソース配
線２ａに接続された外部接続端子（以下、「ソース外部
接続端子」という）、３ｂはゲート配線２ｂに接続され
た外部接続端子（以下、「ゲート外部接続端子」とい
う）、３ｃはＣｓ配線２ｃに接続された外部接続端子
（以下、「Ｃｓ外部接続端子」という）、４はテーパ配
線部、９は、ガラス基板１の表示部、１１ａは透明電
極、１１ｂは、走査信号が所定の電圧値になっていると
きのみデータ信号を透明電極１１ａに印加するＴＦＴ
（等価的に示されている）、１１ｃは、光リーク電流や
フィールドスルーによる影響を防止する補助容量、１２
は周辺端子部を示す。前記ソース外部接続端子３ａ、ゲ
ート外部接続端子３ｂは、データ駆動回路および走査駆
動回路の出力端子をソース配線２ａおよびゲート配線２
ｂに接続するための端子であり、前記周辺端子部１２と
はガラス基板１の表示部９の外周部のうち、ソース配線
２ａ、ゲート配線２ｂおよびＣｓ配線２ｃの一端部と、
前記ソース外部接続端子３ａ、ゲート外部接続端子３ｂ
およびＣｓ外部接続端子３ｃとが形成される部分をい
う。なお、Ｃｓ配線２ｃのうちゲート配線２ｂと交差す
る箇所は、絶縁膜を介してゲート配線２ｂと交差する。
したがって、コモン信号はＣｓ外部接続端子３ｃを介し
てＣｓ配線２ｃのみに印加される。また、テーパ配線部
４は、ソース配線２ａおよびゲート配線２ｂのうち、デ
ータ駆動回路および走査駆動回路を形成する際にパッケ
ージとしてＴＣＰ（tape carrier package）を使用して
いることに対応してテーパ状に形成されている部分であ
る。なお、図１１には、ソース配線２ａが８本のみ、ゲ
ート配線２ｂが４本のみ、Ｃｓ配線２ｃが２本のみ示さ
れており、透明電極１１ａ、ＴＦＴ１１ｂおよび補助容
量１１ｃは一画素分のみ示されているが、それぞれの数
はこれに限られない。また、２本のソース配線２ａおよ
び２本のゲート配線２ｂによって区切られる１つの領域
が１つの画素である。FIG. 11 is an explanatory view showing an example of a conventional active matrix substrate. In FIG. 11, 1 is
A glass substrate as a first transparent substrate, 2a a source wiring,
2b is a gate wiring orthogonal to the source wiring via a gate insulating film (not shown), 2c is orthogonal to the source wiring 2a via the gate insulating film, and a common signal for forming an auxiliary capacitance is provided. The applied Cs wiring, 3a is an external connection terminal connected to the source wiring 2a (hereinafter, referred to as “source external connection terminal”), and 3b is an external connection terminal connected to the gate wiring 2b (hereinafter, “gate external connection terminal”). 3c is an external connection terminal connected to the Cs wiring 2c (hereinafter, referred to as "Cs external connection terminal"), 4 is a tapered wiring portion, 9 is a display portion of the glass substrate 1, 11a is a transparent electrode, 11b Is a TFT that applies a data signal to the transparent electrode 11a only when the scanning signal has a predetermined voltage value.
(Equivalently shown), 11c is an auxiliary capacitor for preventing the effects of light leakage current and field through, 12c
Indicates a peripheral terminal portion. The source external connection terminal 3a and the gate external connection terminal 3b are connected to the output terminals of the data drive circuit and the scan drive circuit by the source wiring 2a and the gate wiring 2 respectively.
b, a terminal for connecting to the source terminal 2a, one end of the gate line 2b, and one end of the Cs line 2c in the outer peripheral portion of the display unit 9 of the glass substrate 1.
Source external connection terminal 3a, gate external connection terminal 3b
And Cs external connection terminal 3c. The portion of the Cs wiring 2c that intersects with the gate wiring 2b intersects with the gate wiring 2b via the insulating film.
Therefore, the common signal is applied only to the Cs wiring 2c via the Cs external connection terminal 3c. In addition, the tapered wiring portion 4 has a tapered shape corresponding to the use of a TCP (tape carrier package) as a package when forming the data driving circuit and the scanning driving circuit among the source wiring 2a and the gate wiring 2b. It is a part formed in. Note that FIG. 11 shows only eight source wirings 2a, only four gate wirings 2b, and two Cs wirings 2c. The transparent electrode 11a, the TFT 11b, and the auxiliary capacitor 11c are shown for only one pixel. However, each number is not limited to this. One region divided by two source lines 2a and two gate lines 2b is one pixel.
【０００９】従来のアクティブマトリクス基板の周辺端
子部に設けられたゲート配線およびソース配線の上層に
はゲート絶縁膜やＤＣ（直流電流）カット用の絶縁膜
（以下、単に「ＤＣカット絶縁膜」という）が形成され
ているだけであり、駆動回路などの周辺回路やバックラ
イトなどからの電磁波により生じるＥＭＩへの影響が大
きい。A gate insulating film and a DC (direct current) cut insulating film (hereinafter simply referred to as a “DC cut insulating film”) are formed on a gate wiring and a source wiring provided on peripheral terminals of a conventional active matrix substrate. ) Is formed, and the EMI caused by electromagnetic waves from peripheral circuits such as a driving circuit and a backlight is greatly affected.
【００１０】[0010]
【発明が解決しようとする課題】前述のように、従来の
ＬＣＤによれば、周辺回路やバックライトからの電磁波
によりＥＭＩが悪化したり、ＥＭＩを低減するためにＬ
ＣＤの構造が複雑化するという問題が生じる本発明はか
かる問題を解決するためになされたもので、周辺回路や
バックライトなどから液晶表示パネルへの電磁波を大幅
に低減し、ＥＭＩ対策のためにＬＣＤの構造を複雑化す
ることがなく、容易に電磁波を低減し、ＥＭＩを改善す
ることができるアクティブマトリクス基板を用いた液晶
表示装置を提供することを目的とする。As described above, according to the conventional LCD, EMI is deteriorated by electromagnetic waves from peripheral circuits and a backlight, or the EMI is reduced to reduce EMI.
The present invention, which has a problem that the structure of a CD is complicated, has been made to solve such a problem, and it is intended to significantly reduce electromagnetic waves from a peripheral circuit, a backlight, etc. to a liquid crystal display panel, and to reduce EMI. An object of the present invention is to provide a liquid crystal display device using an active matrix substrate that can easily reduce electromagnetic waves and improve EMI without complicating the structure of the LCD.
【００１１】[0011]
【課題を解決するための手段】本発明の液晶表示装置
は、第１の透明基板、該第１の透明基板に対向する第２
の透明基板、および前記第１の透明基板と第２の透明基
板とのあいだに挟持される液晶材料を含んでなる液晶表
示パネルと、該液晶表示パネル表面に配置され、液晶表
示パネルに光を放射するバックライトとを含んでなり、
前記第１の透明基板表面のうち液晶材料に接する側の面
上に、スイッチング素子がマトリクス状に形成され、か
つ、該スイッチング素子に電気信号を供給する２種類の
配線が互いに直交するように設けられてなる液晶表示装
置であって、前記２種類の配線のうち第１の透明基板の
表示部の外周部に設けられる部分の上方に透明導電膜が
形成されてなるものである。A liquid crystal display device according to the present invention comprises a first transparent substrate and a second transparent substrate opposed to the first transparent substrate.
A liquid crystal display panel comprising a liquid crystal material sandwiched between the first transparent substrate and the second transparent substrate; and a liquid crystal display panel disposed on the surface of the liquid crystal display panel and transmitting light to the liquid crystal display panel. Radiating backlight and
Switching elements are formed in a matrix on a surface of the first transparent substrate surface which is in contact with the liquid crystal material, and two types of wirings for supplying an electric signal to the switching elements are provided so as to be orthogonal to each other. A liquid crystal display device comprising: a transparent conductive film formed above a portion of the two kinds of wirings provided on an outer peripheral portion of a display portion of a first transparent substrate.
【００１２】また、前記透明導電膜の材料がＩＴＯであ
る。Further, the material of the transparent conductive film is ITO.
【００１３】また、前記透明導電膜が前記２種類の配線
の一端部に接続されることにより外部接続端子として機
能するものである。Further, the transparent conductive film functions as an external connection terminal by being connected to one end of the two kinds of wirings.
【００１４】本発明の液晶表示装置は、第１の透明基
板、該第１の透明基板に対向する第２の透明基板、およ
び前記第１の透明基板と第２の透明基板とのあいだに挟
持される液晶材料を含んでなる液晶表示パネルと、該液
晶表示パネル表面に配置され、液晶表示パネルに光を放
射するバックライトとを含んでなる液晶表示装置であっ
て、前記第１の透明基板表面のうち液晶材料に接する側
の面上に透明導電膜が形成され、該透明導電膜の上方に
スイッチング素子がマトリクス状に形成され、かつ、該
スイッチング素子に電気信号を供給する２種類の配線が
互いに直交するように設けられてなるものである。According to the liquid crystal display device of the present invention, there is provided a first transparent substrate, a second transparent substrate facing the first transparent substrate, and a sandwich between the first transparent substrate and the second transparent substrate. A liquid crystal display device, comprising: a liquid crystal display panel including a liquid crystal material to be formed; and a backlight disposed on the surface of the liquid crystal display panel and emitting light to the liquid crystal display panel. A transparent conductive film is formed on a surface of the surface in contact with the liquid crystal material, and switching elements are formed in a matrix above the transparent conductive film, and two kinds of wirings for supplying an electric signal to the switching elements. Are provided so as to be orthogonal to each other.
【００１５】また、前記透明導電膜の材料がＩＴＯであ
る。The material of the transparent conductive film is ITO.
【００１６】本発明の液晶表示装置は、第１の透明基
板、該第１の透明基板に対向する第２の透明基板、およ
び前記第１の透明基板と第２の透明基板とのあいだに挟
持される液晶材料を含んでなる液晶表示パネルと、該液
晶表示パネル表面に配置され、液晶表示パネルに光を放
射するバックライトとを含んでなる液晶表示装置であっ
て、前記第１の透明基板表面のうち液晶材料に接する側
の面上に第１の透明導電膜が形成され、該第１の透明導
電膜の上方にスイッチング素子がマトリクス状に形成さ
れ、かつ、該スイッチング素子に電気信号を供給する２
種類の配線が互いに直交するように設けられ、さらに前
記２種類の配線のうち第１の透明基板の表示部の外周部
に設けられる部分の上方に第２の透明導電膜が形成され
てなるものである。According to the liquid crystal display device of the present invention, a first transparent substrate, a second transparent substrate facing the first transparent substrate, and a first transparent substrate sandwiched between the first transparent substrate and the second transparent substrate. A liquid crystal display device, comprising: a liquid crystal display panel including a liquid crystal material to be formed; and a backlight disposed on the surface of the liquid crystal display panel and emitting light to the liquid crystal display panel. A first transparent conductive film is formed on a surface of the surface which is in contact with the liquid crystal material, switching elements are formed in a matrix above the first transparent conductive film, and an electric signal is applied to the switching elements. Supply 2
Wherein two kinds of wirings are provided so as to be orthogonal to each other, and a second transparent conductive film is formed above a part of the two kinds of wirings provided on an outer peripheral portion of a display portion of the first transparent substrate. It is.
【００１７】また、前記第１の透明導電膜および第２の
透明導電膜の材料がＩＴＯである。The material of the first transparent conductive film and the second transparent conductive film is ITO.
【００１８】また、前記第１の透明導電膜が前記２種類
の配線の一端部に接続されることにより外部接続端子と
して機能するものである。Further, the first transparent conductive film functions as an external connection terminal by being connected to one end of the two types of wirings.
【００１９】[0019]
【発明の実施の形態】つぎに、本発明の液晶表示装置の
実施の形態について説明する。Next, an embodiment of the liquid crystal display device of the present invention will be described.
【００２０】本発明の液晶表示装置の実施の形態におい
ては、アクティブマトリクス基板が、ゲート配線および
ソース配線のうち第１の透明基板の表示部の外周部に設
けられる部分（すなわち、テーパ配線部）の上方に形成
される透明導電膜、および／または第１の透明基板表面
のうち液晶材料に接する側の面上に形成される透明導電
膜を含んでなる。２つの透明導電膜は、いずれも液晶表
示パネルから電磁波を遮断するために設けられる。In the embodiment of the liquid crystal display device according to the present invention, the active matrix substrate is provided at a portion of the gate wiring and the source wiring provided on the outer peripheral portion of the display portion of the first transparent substrate (that is, a tapered wiring portion). And / or a transparent conductive film formed on the surface of the first transparent substrate surface that is in contact with the liquid crystal material. Both of the two transparent conductive films are provided to block electromagnetic waves from the liquid crystal display panel.
【００２１】透明導電膜をテーパ配線部の上方に形成す
るばあい、透明導電膜とゲート配線およびソース配線と
のあいだには絶縁膜が形成される。なお、該絶縁膜は、
透明導電膜と、絶縁膜の下方に形成されるものとのあい
だで導通をとる箇所を除いて透明導電膜の全表面に形成
される。このばあい、前記絶縁膜を形成したのち、透明
導電膜となる膜をガラス基板の上方全体に成膜し、当該
膜を従来からのパターンエッチング法を用いてエッチン
グし、テーパ配線部の上方に透明導電膜を形成する。な
お、前記エッチングの際に、透明導電膜となる膜をゲー
ト配線の端部、ソース配線の端部およびＣｓ配線の端部
の上方にも残すことにより、ゲート外部接続端子、ソー
ス外部接続端子およびＣｓ外部接続端子が形成される。
該ゲート外部接続端子、ソース外部接続端子およびＣｓ
外部接続端子が形成される箇所の絶縁膜はあらかじめ除
去されている。When the transparent conductive film is formed above the tapered wiring portion, an insulating film is formed between the transparent conductive film and the gate wiring and the source wiring. The insulating film is
The transparent conductive film is formed on the entire surface of the transparent conductive film except for portions where conduction is established between the transparent conductive film and the one formed below the insulating film. In this case, after forming the insulating film, a film to be a transparent conductive film is formed over the entire glass substrate, and the film is etched using a conventional pattern etching method, and the film is formed above the tapered wiring portion. A transparent conductive film is formed. Note that, at the time of the etching, a film to be a transparent conductive film is left above the end of the gate wiring, the end of the source wiring, and the end of the Cs wiring, so that the gate external connection terminal, the source external connection terminal, A Cs external connection terminal is formed.
The gate external connection terminal, the source external connection terminal and Cs
The insulating film where the external connection terminals are to be formed is removed in advance.
【００２２】また、透明導電膜を第１の透明基板表面に
形成するばあい、当該透明導電膜表面に絶縁膜が形成さ
れたのちＴＦＴ、ゲート配線およびソース配線などから
なるＴＦＴアレイが形成される。なお、前記透明導電膜
表面に形成される絶縁膜は透明導電膜の全表面に形成さ
れる。When a transparent conductive film is formed on the surface of the first transparent substrate, an insulating film is formed on the surface of the transparent conductive film, and then a TFT array including TFTs, gate wirings and source wirings is formed. . The insulating film formed on the surface of the transparent conductive film is formed on the entire surface of the transparent conductive film.
【００２３】さらに、５枚マスク構造のアクティブマト
リクス基板を形成するばあい、表示用の透明電極をパタ
ーニングする際、同時に電磁波遮断用の透明導電膜をテ
ーパ配線部の上方にパターニングする。なお、前記５枚
マスク構造のアクティブマトリクス基板は、ガラス基板
上に、ゲート配線と、ゲート絶縁膜と、ＴＦＴの一部を
構成するシリコンと、ソース配線およびドレイン配線
と、保護絶縁膜と、該保護絶縁膜に形成されたコンタク
トホールを介して前記ソース配線およびドレイン配線に
電気的に接続される外部接続端子としてのＩＴＯ膜とを
順次設けることにより形成される。さらに、アクティブ
マトリクス基板の他の例としては、６枚マスク構造のア
クティブマトリクス基板がある。該６枚マスク構造のア
クティブマトリクス基板は、ガラス基板上に、ゲート配
線と、ゲート絶縁膜と、ＴＦＴの一部を構成するシリコ
ンと、前記ソース配線およびドレイン配線に電気的に接
続される外部接続端子としてのＩＴＯ膜と、保護絶縁膜
と、該保護絶縁膜に形成されたコンタクトホールを介し
て外部接続端子に電気的に接続されるソース配線および
ドレイン配線と、ＤＣカット絶縁膜とを設けることによ
り形成される。ＬＣＤおよび該ＬＣＤの基本的な製法な
どについては、特開平８−６０６９号公報に開示されて
いる。Further, when forming an active matrix substrate having a five-mask structure, a transparent conductive film for shielding electromagnetic waves is simultaneously patterned above the tapered wiring portion when patterning the transparent electrode for display. Note that the active matrix substrate having the five-mask structure includes a gate wiring, a gate insulating film, silicon constituting a part of a TFT, a source wiring and a drain wiring, a protective insulating film, It is formed by sequentially providing an ITO film as an external connection terminal electrically connected to the source wiring and the drain wiring via a contact hole formed in the protective insulating film. Another example of the active matrix substrate is an active matrix substrate having a six-mask structure. The active matrix substrate having the six-mask structure includes a glass substrate, a gate wiring, a gate insulating film, silicon constituting a part of a TFT, and an external connection electrically connected to the source wiring and the drain wiring. Providing an ITO film as a terminal, a protective insulating film, a source wiring and a drain wiring electrically connected to an external connection terminal via a contact hole formed in the protective insulating film, and a DC cut insulating film. Formed by An LCD and a basic manufacturing method of the LCD are disclosed in JP-A-8-6069.
【００２４】[0024]
【実施例】つぎに、本発明の液晶表示装置の実施例につ
いて図面を参照しつつ説明する。Next, an embodiment of the liquid crystal display device of the present invention will be described with reference to the drawings.
【００２５】実施例１．図面を参照しつつ、本発明の液
晶表示装置の実施例１について説明する。Embodiment 1 Example 1 of the liquid crystal display device of the present invention will be described with reference to the drawings.
【００２６】図１は、本発明の液晶表示装置の実施例１
にかかわるアクティブマトリクス基板の一例を示す説明
図である。図１において、図１１と同一の箇所は同じ符
号を用いて示す。さらに、５は、ＩＴＯ（indium tin o
xide）などからなる透明導電膜を示す。FIG. 1 shows a first embodiment of the liquid crystal display device of the present invention.
FIG. 4 is an explanatory diagram showing an example of an active matrix substrate according to the present invention. 1, the same parts as those in FIG. 11 are denoted by the same reference numerals. 5 is ITO (indium tin o)
xide).
【００２７】透明導電膜５は電磁波を遮断するために形
成される。さらに、透明導電膜５は、ソース配線２ａお
よびゲート配線２ｂのテーパ配線部の上方に形成され
る。図示されていないが、ソース配線２ａおよびゲート
配線２ｂと透明導電膜５とのあいだには、ゲート絶縁膜
などの絶縁膜が形成されている。該絶縁膜は、透明導電
膜５と、絶縁膜下部に形成されるものとのあいだで導通
をとる箇所を除いて、ガラス基板１の全面に形成され
る。なお、前記導通をとる箇所の例としては、透明導電
膜５のうちソース外部接続端子、ゲート外部接続端子ま
たはＣｓ外部接続端子として利用される部分の下部に位
置する箇所がある。The transparent conductive film 5 is formed to block electromagnetic waves. Further, the transparent conductive film 5 is formed above the tapered wiring portions of the source wiring 2a and the gate wiring 2b. Although not shown, an insulating film such as a gate insulating film is formed between the source wiring 2 a and the gate wiring 2 b and the transparent conductive film 5. The insulating film is formed on the entire surface of the glass substrate 1 except for portions where conduction is established between the transparent conductive film 5 and the one formed below the insulating film. As an example of the conductive portion, there is a portion of the transparent conductive film 5 located below a portion used as a source external connection terminal, a gate external connection terminal, or a Cs external connection terminal.
【００２８】図２は、図１のアクティブマトリクス基板
のうちテーパ配線部および該テーパ配線部の周辺部を示
す拡大断面説明図である。図２において、図１と同一の
箇所は同じ符号を用いて示す。さらに、６は、ゲート絶
縁膜などの絶縁膜を示す。なお、図２には、ソース配線
２ａのテーパ配線部および該テーパ配線部の周辺部が示
されている。FIG. 2 is an enlarged sectional explanatory view showing a tapered wiring portion and a peripheral portion of the tapered wiring portion in the active matrix substrate of FIG. 2, the same parts as those in FIG. 1 are denoted by the same reference numerals. Further, reference numeral 6 denotes an insulating film such as a gate insulating film. FIG. 2 shows a tapered wiring portion of the source wiring 2a and a peripheral portion of the tapered wiring portion.
【００２９】図２に示されるように、テーパ配線部の上
方には、ＩＴＯ、Ｉｎ2 Ｏ3 またはＳｎＯ2 などの透明
導電材料を用いて電磁波遮断用の透明導電膜５が形成さ
れる。前記透明導電膜５により、バックライトや周辺回
路から送出される方形波などが原因となって、ＬＣＤを
構成するあらゆる回路および配線などから放出される電
磁波が透明導電膜５により遮断される。したがって、バ
ックライトや周辺回路から液晶表示パネルへの電磁波を
低減することができる。As shown in FIG. 2, a transparent conductive film 5 for blocking electromagnetic waves is formed using a transparent conductive material such as ITO, In 2 O 3 or SnO 2 above the tapered wiring portion. The transparent conductive film 5 blocks electromagnetic waves emitted from all circuits and wiring constituting the LCD due to a square wave transmitted from a backlight or a peripheral circuit. Therefore, electromagnetic waves from the backlight and peripheral circuits to the liquid crystal display panel can be reduced.
【００３０】また、電磁波を透明導電膜５を介してグラ
ンド（接地面）へ落としてもよい。図３は、本発明の液
晶表示装置の実施例１にかかわる液晶表示パネルおよび
該液晶表示パネルの周辺部の一例を示す説明図である。
図３において、図１および図２と同一の箇所は同じ符号
を用いて示す。さらに、１０は、液晶表示パネルを支持
する金属フレーム、１１は金属製導線、２１はアクティ
ブマトリクス基板、２２は第２の透明基板、２３は液晶
材料、２４は、第１の透明基板の周縁部を第２の透明基
板の周縁部に貼着する際に使用されるシール材を示す。
金属製導線１１は、透明導電膜５と金属フレーム１０と
を電気的に接続するために設けられる。なお、実際は液
晶表示パネルを挟持するように２枚の偏光板が設けられ
るが、図３では省略されており図示されていない。Further, the electromagnetic wave may be dropped to the ground (ground plane) via the transparent conductive film 5. FIG. 3 is an explanatory diagram illustrating an example of a liquid crystal display panel and a peripheral portion of the liquid crystal display panel according to the first embodiment of the liquid crystal display device of the present invention.
3, the same parts as those in FIGS. 1 and 2 are denoted by the same reference numerals. Further, reference numeral 10 denotes a metal frame supporting the liquid crystal display panel, 11 denotes a metal conductive wire, 21 denotes an active matrix substrate, 22 denotes a second transparent substrate, 23 denotes a liquid crystal material, and 24 denotes a peripheral portion of the first transparent substrate. Shows a sealing material used when is adhered to the peripheral portion of the second transparent substrate.
The metal conductive wire 11 is provided for electrically connecting the transparent conductive film 5 and the metal frame 10. Although two polarizing plates are actually provided so as to sandwich the liquid crystal display panel, they are omitted in FIG. 3 and are not shown.
【００３１】図３に示される構造においては、バックラ
イトや周辺回路から発生している電磁波は、透明導電膜
５から、金属製導線１１および金属フレーム１０を経て
グランドへ落とされる。したがって、バックライトや周
辺回路から液晶表示パネルへの電磁波を大幅に低減し、
ＥＭＩを改善することができる。さらに、図３に示され
る構造を採用することで、ＥＭＩ対策のためにＬＣＤの
構造が複雑化することを抑制できる。In the structure shown in FIG. 3, the electromagnetic wave generated from the backlight and the peripheral circuit is dropped from the transparent conductive film 5 to the ground via the metal conductive wire 11 and the metal frame 10. Therefore, electromagnetic waves from the backlight and peripheral circuits to the LCD panel are significantly reduced,
EMI can be improved. Further, by adopting the structure shown in FIG. 3, it is possible to suppress the structure of the LCD from becoming complicated for EMI measures.
【００３２】実施例２．つぎに、本発明の液晶表示装置
の実施例２について図面を参照しつつ説明する。Embodiment 2 FIG. Next, a liquid crystal display device according to a second embodiment of the present invention will be described with reference to the drawings.
【００３３】図４は、本発明の液晶表示装置の実施例２
にかかわるアクティブマトリクス基板の一例を示す説明
図である。図４において、図１と同一の箇所は同じ符号
を用いて示す。図４に示されるように、ガラス基板の全
面に透明導電膜５が設けられる。図示されていないが、
ソース配線２ａおよびゲート配線２ｂと透明導電膜５と
のあいだには、ゲート絶縁膜などの絶縁膜が形成されて
いる。該絶縁膜は透明導電膜５の全面に形成される。FIG. 4 shows a second embodiment of the liquid crystal display device of the present invention.
FIG. 4 is an explanatory diagram showing an example of an active matrix substrate according to the present invention. 4, the same parts as those in FIG. 1 are denoted by the same reference numerals. As shown in FIG. 4, a transparent conductive film 5 is provided on the entire surface of the glass substrate. Although not shown,
An insulating film such as a gate insulating film is formed between the source wiring 2 a and the gate wiring 2 b and the transparent conductive film 5. The insulating film is formed on the entire surface of the transparent conductive film 5.
【００３４】図５は、図４のアクティブマトリクス基板
のうちテーパ配線部および該テーパ配線部の周辺部を示
す拡大断面説明図である。図５において、図４と同一の
箇所は同じ符号を用いて示す。さらに、６は、ゲート絶
縁膜などの絶縁膜、７は、ゲート配線、ソース配線、Ｔ
ＦＴおよび透明電極を含んでなるＴＦＴアレイを示す。
なお、図５には、ガラス基板のうちゲート配線およびソ
ース配線が形成されていない箇所が示されている。FIG. 5 is an enlarged sectional explanatory view showing the tapered wiring portion and the peripheral portion of the tapered wiring portion in the active matrix substrate of FIG. 5, the same parts as those in FIG. 4 are denoted by the same reference numerals. Further, 6 is an insulating film such as a gate insulating film, 7 is a gate wiring, a source wiring, T
3 shows a TFT array comprising an FT and a transparent electrode.
FIG. 5 shows a portion of the glass substrate where the gate wiring and the source wiring are not formed.
【００３５】本実施例においては、透明導電膜５は、Ｌ
ＣＤを製造する工程のうち、アクティブマトリクス基板
のＴＦＴアレイを形成する工程（以下、「アレイ工程」
という）の第１番目の工程において形成される。In this embodiment, the transparent conductive film 5 is
Among the steps of manufacturing a CD, a step of forming a TFT array on an active matrix substrate (hereinafter referred to as an “array step”)
) In the first step.
【００３６】また、電磁波を透明導電膜５を介してグラ
ンド（接地面）へ落としてもよい。図６は、本発明の液
晶表示装置の実施例２にかかわる液晶表示パネルおよび
該液晶表示パネルの周辺部の一例を示す説明図である。
図６において、図４および図５と同一の箇所は同じ符号
を用いて示す。さらに、１０は、液晶表示パネルを支持
する金属フレーム、１１は金属製導線、２２は第２の透
明基板、２３は液晶材料、２４は、第１の透明基板の周
縁部を第２の透明基板の周縁部に貼着する際に使用され
るシール材を示す。金属製導線１１は、透明導電膜５と
金属フレーム１０とを電気的に接続するために設けられ
る。なお、実際は液晶表示パネルを挟持するように２枚
の偏光板が設けられるが、図６では省略されており図示
されていない。The electromagnetic wave may be dropped to ground (ground plane) via the transparent conductive film 5. FIG. 6 is an explanatory diagram illustrating an example of a liquid crystal display panel and a peripheral portion of the liquid crystal display panel according to Embodiment 2 of the liquid crystal display device of the present invention.
6, the same parts as those in FIGS. 4 and 5 are denoted by the same reference numerals. Further, 10 is a metal frame for supporting the liquid crystal display panel, 11 is a metal conductive wire, 22 is a second transparent substrate, 23 is a liquid crystal material, and 24 is a second transparent substrate 2 shows a sealing material used when affixing to a peripheral portion of the sealing material. The metal conductive wire 11 is provided for electrically connecting the transparent conductive film 5 and the metal frame 10. Although two polarizing plates are actually provided so as to sandwich the liquid crystal display panel, they are omitted in FIG. 6 and are not shown.
【００３７】図６に示される構造においては、透明導電
膜５と金属製導線１１とを電気的に接続するために、絶
縁膜６に少なくとも１つの開口部を設ける。その結果、
バックライトや周辺回路から発生している電磁波は、透
明導電膜５から、金属製導線１１および金属フレーム１
０を経てグランドへ落とされる。したがって、バックラ
イトや周辺回路から液晶表示パネルへの電磁波を大幅に
低減し、ＥＭＩを改善することができる。さらに、図６
に示される構造を採用することで、ＥＭＩ対策のために
ＬＣＤの構造が複雑化することを抑制できる。In the structure shown in FIG. 6, at least one opening is provided in the insulating film 6 in order to electrically connect the transparent conductive film 5 and the metal conductive wire 11. as a result,
Electromagnetic waves generated from the backlight and peripheral circuits are transmitted from the transparent conductive film 5 to the metal conductive wire 11 and the metal frame 1.
It is dropped to ground via 0. Therefore, electromagnetic waves from the backlight and peripheral circuits to the liquid crystal display panel can be significantly reduced, and EMI can be improved. Further, FIG.
By adopting the structure shown in (1), it is possible to suppress the structure of the LCD from becoming complicated for EMI measures.
【００３８】実施例３．つぎに、本発明の液晶表示装置
の実施例３について図面を参照しつつ説明する。Embodiment 3 FIG. Next, a third embodiment of the liquid crystal display device of the present invention will be described with reference to the drawings.
【００３９】図７は、本発明の液晶表示装置の実施例３
にかかわるアクティブマトリクス基板の一例を示す説明
図である。図８は、図７のアクティブマトリクス基板の
うち周辺端子部を示す部分拡大説明図である。図８
（ａ）は周辺端子部を示す平面説明図であり、図８
（ｂ）は図８（ａ）のＡ−Ａ線断面説明図である。図７
および図８において、図１および図２と同一の箇所は同
じ符号を用いて示す。さらに、１３は、絶縁膜６（図８
（ｂ）にのみ示される）に設けられた開口部である。図
８には、周辺端子部のうちソース配線が形成される部分
が示されている。なお、図８（ａ）に示される電位Ｖｘ
は、ソース外部接続端子として形成された透明導電膜５
に所定の電位Ｖｘが印加できることを示し、電位Ｖ
ｘは、通常、ソース外部接続端子に印加される電位を示
す。さらに、矢印Ｂで示される方向には表示部があり、
矢印Ｃで示される方向には、液晶表示パネルを製造する
あいだ、ソース外部接続端子とゲート外部接続端子との
あいだの電位差をなくし、静電気によるＴＦＴ素子など
の破壊を防ぐために設けられたショートリングがある。FIG. 7 shows a third embodiment of the liquid crystal display device of the present invention.
FIG. 4 is an explanatory diagram showing an example of an active matrix substrate according to the present invention. FIG. 8 is a partially enlarged explanatory view showing a peripheral terminal portion of the active matrix substrate of FIG. FIG.
8A is an explanatory plan view showing a peripheral terminal portion, and FIG.
FIG. 9B is an explanatory sectional view taken along line AA of FIG. FIG.
8 and FIG. 8, the same parts as those in FIG. 1 and FIG. Further, 13 is an insulating film 6 (FIG. 8).
(Shown only in (b)). FIG. 8 shows a portion of the peripheral terminal portion where the source wiring is formed. Note that the potential V x shown in FIG.
Is a transparent conductive film 5 formed as a source external connection terminal
To indicate that the predetermined potential V x can be applied, the potential V
x generally indicates a potential applied to the source external connection terminal. Further, there is a display section in the direction indicated by arrow B,
In the direction shown by the arrow C, a short ring provided to eliminate a potential difference between the source external connection terminal and the gate external connection terminal and to prevent a TFT element or the like from being damaged by static electricity during manufacturing of the liquid crystal display panel. is there.
【００４０】図７および図８に示されるように、透明導
電膜５は、テーパ配線部の上部に設けられるとともに、
さらにソース外部接続端子を形成する箇所にも形成さ
れ、ソース外部接続端子として機能する。図８に示され
るように、透明導電膜５は開口部１３においてソース配
線２ａと電気的に接続される。開口部１３は、絶縁膜６
の所定の箇所をたとえばドライエッチング法によりエッ
チングすることにより形成される。As shown in FIGS. 7 and 8, the transparent conductive film 5 is provided above the tapered wiring portion.
Further, it is also formed at a portion where a source external connection terminal is formed, and functions as a source external connection terminal. As shown in FIG. 8, the transparent conductive film 5 is electrically connected to the source line 2a at the opening 13. The opening 13 is provided with the insulating film 6.
Is formed by, for example, etching a predetermined portion by a dry etching method.
【００４１】実施例３によれば、電磁波を透明導電膜５
により遮断してバックライトや周辺回路から液晶表示パ
ネルへの電磁波を低減することができる。According to the third embodiment, the electromagnetic wave is applied to the transparent conductive film 5.
The electromagnetic wave from the backlight and the peripheral circuit to the liquid crystal display panel can be reduced.
【００４２】実施例４．つぎに、本発明の液晶表示装置
の実施例４について図面を参照しつつ説明する。Embodiment 4 FIG. Next, a fourth embodiment of the liquid crystal display device of the present invention will be described with reference to the drawings.
【００４３】図９は、本発明の液晶表示装置の実施例４
にかかわるアクティブマトリクス基板の一例を示す説明
図である。図１０は、図９のアクティブマトリクス基板
のうちソース配線が形成されるテーパ配線部および該テ
ーパ配線部の周辺部を示す拡大断面説明図である。図９
および図１０において、図１および図２と同一の箇所は
同じ符号を用いて示す。さらに、図９および図１０にお
いて、５ａは、ガラス基板１全面に形成される第１の透
明導電膜、５ｂは、ソース配線２ａおよびゲート配線２
ｂの上方に形成される第２の透明導電膜、６ａは、第１
の透明導電膜５ａ上に形成される第１の絶縁膜、６ｂ
は、第２の透明導電膜５ｂとソース配線２ａおよびゲー
ト配線２ｂとのあいだに形成される第２の絶縁膜、１３
は、第２の絶縁膜６ｂに設けられた開口部を示す。第１
の絶縁膜６ａは、図５に示される絶縁膜６と同一のもの
であり、第２の絶縁膜６ｂは、図２に示される絶縁膜６
と同一のものである。FIG. 9 shows a fourth embodiment of the liquid crystal display device of the present invention.
FIG. 4 is an explanatory diagram showing an example of an active matrix substrate according to the present invention. FIG. 10 is an enlarged cross-sectional explanatory view showing a tapered wiring portion where a source wiring is formed and a peripheral portion of the tapered wiring portion in the active matrix substrate of FIG. FIG.
10 and FIG. 10, the same parts as those in FIG. 1 and FIG. 9 and 10, reference numeral 5a denotes a first transparent conductive film formed over the entire surface of the glass substrate 1, and 5b denotes a source wiring 2a and a gate wiring 2a.
b, a second transparent conductive film 6a formed above
First insulating film 6b formed on transparent conductive film 5a
A second insulating film 13 formed between the second transparent conductive film 5b and the source wiring 2a and the gate wiring 2b;
Indicates an opening provided in the second insulating film 6b. First
2 is the same as the insulating film 6 shown in FIG. 5, and the second insulating film 6b is the same as the insulating film 6 shown in FIG.
Is the same as
【００４４】実施例４においては、実施例２と同様に、
ガラス基板１の全面に第１の透明導電膜５ａ（図９には
図示されていない）が設けられる。さらに、実施例１と
同様に、テーパ配線部の上方に第２の透明導電膜５ｂが
設けられる。なお、実施例３と同様に、第２の透明導電
膜５ｂがソース外部接続端子を形成する箇所にも形成さ
れ、ソース外部接続端子として機能する。In the fourth embodiment, as in the second embodiment,
A first transparent conductive film 5a (not shown in FIG. 9) is provided on the entire surface of the glass substrate 1. Further, as in the first embodiment, a second transparent conductive film 5b is provided above the tapered wiring portion. Note that, similarly to the third embodiment, the second transparent conductive film 5b is also formed at a position where the source external connection terminal is formed, and functions as a source external connection terminal.
【００４５】図９および図１０に示される構造において
は、２層の透明導電膜（第１の透明導電膜５ａおよび第
２の透明導電膜５ｂ）を設けることにより、実施例１お
よび実施例２と比較してさらに電磁波を遮断することが
できる。In the structure shown in FIGS. 9 and 10, two transparent conductive films (a first transparent conductive film 5a and a second transparent conductive film 5b) are provided, whereby the first and second embodiments are provided. Can further block electromagnetic waves.
【００４６】また、図示されていないが、実施例１と同
様に、金属製導線１１（図３参照）を設けてもよい。金
属製導線を設けることにより、バックライトや周辺回路
から発生している電磁波を、第２の透明導電膜５ａか
ら、金属製導線１１および金属フレーム１０（図３参
照）を経てグランドへ落とすことができる。したがっ
て、バックライトや周辺回路から液晶表示パネルへの電
磁波を大幅に低減し、ＥＭＩを改善することできる。そ
の結果、ＥＭＩ対策のためにＬＣＤの構造が複雑化する
ことを抑制できる。Although not shown, a metal conducting wire 11 (see FIG. 3) may be provided as in the first embodiment. By providing the metal conductor, the electromagnetic wave generated from the backlight or the peripheral circuit can be dropped from the second transparent conductive film 5a to the ground via the metal conductor 11 and the metal frame 10 (see FIG. 3). it can. Therefore, electromagnetic waves from the backlight and peripheral circuits to the liquid crystal display panel can be significantly reduced, and EMI can be improved. As a result, it is possible to suppress the structure of the LCD from becoming complicated for EMI measures.
【００４７】[0047]
【発明の効果】本発明によれば、透明導電膜を設けて電
磁波を遮断することにより、周辺回路やバックライトな
どから液晶表示パネルへの電磁波を大幅に低減すること
ができる。さらに、透明導電膜を金属製導線に電気的に
接続することにより電磁波を除去することができるの
で、ＥＭＩ対策のためにＬＣＤの構造を複雑化すること
なく、容易に電磁波を低減することができる。According to the present invention, electromagnetic waves from peripheral circuits, backlights, etc. to the liquid crystal display panel can be greatly reduced by providing a transparent conductive film to block electromagnetic waves. Further, since the electromagnetic wave can be removed by electrically connecting the transparent conductive film to the metal conductive wire, the electromagnetic wave can be easily reduced without complicating the structure of the LCD for EMI measures. .
【図１】本発明の液晶表示装置の実施例１にかかわるア
クティブマトリクス基板の一例を示す説明図である。FIG. 1 is an explanatory diagram illustrating an example of an active matrix substrate according to a first embodiment of a liquid crystal display device of the present invention.
【図２】図１のアクティブマトリクス基板のうちテーパ
配線部および該テーパ配線部の周辺部を示す拡大断面説
明図である。FIG. 2 is an enlarged cross-sectional explanatory view showing a tapered wiring portion and a peripheral portion of the tapered wiring portion in the active matrix substrate of FIG.
【図３】本発明の液晶表示装置の実施例１にかかわる液
晶表示パネルおよび該液晶表示パネルの周辺部の一例を
示す説明図である。FIG. 3 is an explanatory diagram illustrating an example of a liquid crystal display panel and a peripheral portion of the liquid crystal display panel according to the first embodiment of the liquid crystal display device of the present invention.
【図４】本発明の液晶表示装置の実施例２にかかわるア
クティブマトリクス基板の一例を示す説明図である。FIG. 4 is an explanatory diagram illustrating an example of an active matrix substrate according to a second embodiment of the liquid crystal display device of the present invention.
【図５】図４のアクティブマトリクス基板のうちテーパ
配線部および該テーパ配線部の周辺部を示す拡大断面説
明図である。FIG. 5 is an enlarged cross-sectional explanatory view showing a tapered wiring portion and a peripheral portion of the tapered wiring portion in the active matrix substrate of FIG. 4;
【図６】本発明の液晶表示装置の実施例２にかかわる液
晶表示パネルおよび該液晶表示パネルの周辺部の一例を
示す説明図である。図６において、図４および図５と同
一の箇所は同じ符号を用いて示す。FIG. 6 is an explanatory diagram illustrating an example of a liquid crystal display panel and a peripheral portion of the liquid crystal display panel according to Embodiment 2 of the liquid crystal display device of the present invention. 6, the same parts as those in FIGS. 4 and 5 are denoted by the same reference numerals.
【図７】本発明の液晶表示装置の実施例３にかかわるア
クティブマトリクス基板の一例を示す説明図である。FIG. 7 is an explanatory diagram illustrating an example of an active matrix substrate according to a third embodiment of the liquid crystal display device of the present invention.
【図８】図７のアクティブマトリクス基板のうち周辺端
子部を示す部分拡大説明図である。8 is a partially enlarged explanatory view showing a peripheral terminal portion of the active matrix substrate of FIG. 7;
【図９】本発明の液晶表示装置の実施例４にかかわるア
クティブマトリクス基板の一例を示す説明図である。FIG. 9 is an explanatory diagram illustrating an example of an active matrix substrate according to a fourth embodiment of the liquid crystal display device of the present invention.
【図１０】図９のアクティブマトリクス基板のうちテー
パ配線部および該テーパ配線部の周辺部を示す拡大断面
説明図である。10 is an enlarged sectional explanatory view showing a tapered wiring portion and a peripheral portion of the tapered wiring portion in the active matrix substrate of FIG. 9;
【図１１】従来のアクティブマトリクス基板の一例を示
す説明図である。FIG. 11 is an explanatory diagram illustrating an example of a conventional active matrix substrate.
１ ガラス基板 ２ａ ソース配線 ２ｂ ゲート配線 ２ｃ Ｃｓ配線 ３ａ ソース外部接続端子 ３ｂ ゲート外部接続端子 ３ｃ Ｃｓ外部接続端子 ４ テーパ配線部 ５ 透明導電膜 ９ 表示部 １２ 周辺端子部 DESCRIPTION OF SYMBOLS 1 Glass substrate 2a Source wiring 2b Gate wiring 2c Cs wiring 3a Source external connection terminal 3b Gate external connection terminal 3c Cs external connection terminal 4 Tapered wiring part 5 Transparent conductive film 9 Display part 12 Peripheral terminal part
Claims (8)
向する第２の透明基板、および前記第１の透明基板と第
２の透明基板とのあいだに挟持される液晶材料を含んで
なる液晶表示パネルと、該液晶表示パネル表面に配置さ
れ、液晶表示パネルに光を放射するバックライトとを含
んでなり、前記第１の透明基板表面のうち液晶材料に接
する側の面上に、スイッチング素子がマトリクス状に形
成され、かつ、該スイッチング素子に電気信号を供給す
る２種類の配線が互いに直交するように設けられてなる
液晶表示装置であって、前記２種類の配線のうち第１の
透明基板の表示部の外周部に設けられる部分の上方に透
明導電膜が形成されてなる液晶表示装置。A first transparent substrate, a second transparent substrate opposed to the first transparent substrate, and a liquid crystal material sandwiched between the first transparent substrate and the second transparent substrate. And a backlight disposed on the surface of the liquid crystal display panel and emitting light to the liquid crystal display panel, on the surface of the first transparent substrate surface that is in contact with the liquid crystal material. A liquid crystal display device in which switching elements are formed in a matrix and two types of wirings for supplying an electric signal to the switching elements are provided so as to be orthogonal to each other; A liquid crystal display device comprising: a transparent substrate; and a transparent conductive film formed above a portion provided on an outer peripheral portion of a display portion of the transparent substrate.
求項１記載の液晶表示装置。2. The liquid crystal display device according to claim 1, wherein the material of the transparent conductive film is ITO.
端部に接続されることにより外部接続端子として機能す
る請求項１記載の液晶表示装置。3. The liquid crystal display device according to claim 1, wherein the transparent conductive film functions as an external connection terminal by being connected to one end of the two kinds of wirings.
向する第２の透明基板、および前記第１の透明基板と第
２の透明基板とのあいだに挟持される液晶材料を含んで
なる液晶表示パネルと、該液晶表示パネル表面に配置さ
れ、液晶表示パネルに光を放射するバックライトとを含
んでなる液晶表示装置であって、前記第１の透明基板表
面のうち液晶材料に接する側の面上に透明導電膜が形成
され、該透明導電膜の上方にスイッチング素子がマトリ
クス状に形成され、かつ、該スイッチング素子に電気信
号を供給する２種類の配線が互いに直交するように設け
られてなる液晶表示装置。4. A semiconductor device comprising: a first transparent substrate; a second transparent substrate facing the first transparent substrate; and a liquid crystal material sandwiched between the first transparent substrate and the second transparent substrate. A liquid crystal display device comprising: a liquid crystal display panel comprising: and a backlight disposed on the surface of the liquid crystal display panel and emitting light to the liquid crystal display panel. A transparent conductive film is formed on the surface in contact with, the switching elements are formed in a matrix above the transparent conductive film, and two kinds of wirings for supplying an electric signal to the switching elements are orthogonal to each other. A liquid crystal display device provided.
求項４記載の液晶表示装置。5. The liquid crystal display device according to claim 4, wherein the material of the transparent conductive film is ITO.
向する第２の透明基板、および前記第１の透明基板と第
２の透明基板とのあいだに挟持される液晶材料を含んで
なる液晶表示パネルと、該液晶表示パネル表面に配置さ
れ、液晶表示パネルに光を放射するバックライトとを含
んでなる液晶表示装置であって、前記第１の透明基板表
面のうち液晶材料に接する側の面上に第１の透明導電膜
が形成され、該第１の透明導電膜の上方にスイッチング
素子がマトリクス状に形成され、かつ、該スイッチング
素子に電気信号を供給する２種類の配線が互いに直交す
るように設けられ、さらに前記２種類の配線のうち第１
の透明基板の表示部の外周部に設けられる部分の上方に
第２の透明導電膜が形成されてなる液晶表示装置。6. A semiconductor device comprising: a first transparent substrate; a second transparent substrate opposed to the first transparent substrate; and a liquid crystal material sandwiched between the first transparent substrate and the second transparent substrate. A liquid crystal display device comprising: a liquid crystal display panel comprising: and a backlight disposed on the surface of the liquid crystal display panel and emitting light to the liquid crystal display panel. A first transparent conductive film is formed on the surface in contact with, a switching element is formed in a matrix above the first transparent conductive film, and two types of wiring for supplying an electric signal to the switching element Are provided so as to be orthogonal to each other, and the first of the two types of wirings
A liquid crystal display device comprising: a transparent substrate; and a second transparent conductive film formed above a portion provided on an outer peripheral portion of the display unit.
導電膜の材料がＩＴＯである請求項６記載の液晶表示装
置。7. The liquid crystal display device according to claim 6, wherein the first transparent conductive film and the second transparent conductive film are made of ITO.
線の一端部に接続されることにより外部接続端子として
機能する請求項６記載の液晶表示装置。8. The liquid crystal display device according to claim 6, wherein said first transparent conductive film functions as an external connection terminal by being connected to one end of said two kinds of wirings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33017497A JPH11160727A (en) | 1997-12-01 | 1997-12-01 | Liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33017497A JPH11160727A (en) | 1997-12-01 | 1997-12-01 | Liquid crystal display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11160727A true JPH11160727A (en) | 1999-06-18 |
Family
ID=18229659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33017497A Pending JPH11160727A (en) | 1997-12-01 | 1997-12-01 | Liquid crystal display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11160727A (en) |
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-
1997
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