JPH11154612A - Electronic component - Google Patents

Electronic component

Info

Publication number
JPH11154612A
JPH11154612A JP9338145A JP33814597A JPH11154612A JP H11154612 A JPH11154612 A JP H11154612A JP 9338145 A JP9338145 A JP 9338145A JP 33814597 A JP33814597 A JP 33814597A JP H11154612 A JPH11154612 A JP H11154612A
Authority
JP
Japan
Prior art keywords
electronic component
insulating
conductor pattern
insulating layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9338145A
Other languages
Japanese (ja)
Inventor
Kenji Sato
健治 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP9338145A priority Critical patent/JPH11154612A/en
Publication of JPH11154612A publication Critical patent/JPH11154612A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/115Via connections; Lands around holes or via connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof

Landscapes

  • Coils Or Transformers For Communication (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an electronic component in high conformability and reliability easy to be manufactured at low cost. SOLUTION: In an electronic component, thickness of a topmost insulating layer 12d among the insulating layers comprising a circuit element wherein conductor pattern layers 13a, 13b, 13c, 13d and insulating layers 12a, 12b, 12c and 12d are laminated on an insulating substrate 11 is specified to exceed two times of the maximum thickness of the conductor pattern layers. The insulating layer 12a in the thickness exceeding five times of the surface roughness Ra (mean roughness of central line) is provided.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品に関し、
特に、表面実装基板に用いて好適なインダクタ(L)、
キャパシタ(C)、抵抗素子(R)などの単一素子部
品、EMIフィルタ、コモンモードチョークコイル、カ
レントセンサ、信号トランスなどの複合素子部品に関す
る。
TECHNICAL FIELD The present invention relates to an electronic component,
In particular, an inductor (L) suitable for use on a surface mount board,
The present invention relates to a single element component such as a capacitor (C) and a resistance element (R), and a composite element component such as an EMI filter, a common mode choke coil, a current sensor, and a signal transformer.

【0002】[0002]

【従来の技術】従来の電子部品の一例の部分断面図を、
図4に示す。図4に示すように、従来の電子部品は、絶
縁基板101上に、スパッタ法等によって形成させたT
i、Ti−Ag、あるいはAgからなる導体パターン1
03とポリイミド樹脂等からなる絶縁層102を交互に
積層させて回路素子100を形成している。尚、回路素
子100は、通常、絶縁基板からなる一枚基板の上に複
数個を縦横に配列して形成し、切断して分割することで
チップ化した回路素子を得ている。
2. Description of the Related Art A partial cross-sectional view of an example of a conventional electronic component is shown in FIG.
As shown in FIG. As shown in FIG. 4, a conventional electronic component is formed on a substrate 101 by sputtering or the like.
Conductor pattern 1 made of i, Ti-Ag, or Ag
03 and insulating layers 102 made of polyimide resin or the like are alternately laminated to form the circuit element 100. In general, a plurality of circuit elements 100 are formed on a single substrate made of an insulating substrate by arranging them vertically and horizontally, and then cut and divided to obtain circuit elements formed into chips.

【0003】また、前記導体パターン103の端部に、
チップ上面端部からチップ側面を介し、チップ下面端部
に至る下地電極14を形成し、かつ外部電極15を形成
して、電子部品としている。
Further, at the end of the conductor pattern 103,
An electronic component is formed by forming a base electrode 14 extending from the upper end of the chip to the lower end of the chip via the side surface of the chip and forming the external electrode 15.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、外部か
らの機械的応力により回路素子の破損が発生するため
に、前記回路素子をチップ化した後の工程における良品
率は低い。
However, since the circuit element is damaged by external mechanical stress, the non-defective rate in the process after the circuit element is formed into a chip is low.

【0005】また、電子部品を高湿度の雰囲気中におい
て使用する場合には、絶縁(樹脂)層の吸湿により導体
パターンにマイグレーションが発生して、前記電子部品
の絶縁耐圧が劣化し、機器の信頼性を低下させていた。
また、最上層の絶縁層の一部が、工程内で剥離して、導
体パターンの一部が露出してしまうものがあり、外観異
常品が発生することがあった。
When an electronic component is used in an atmosphere of high humidity, migration occurs in a conductor pattern due to moisture absorption of an insulating (resin) layer, thereby deteriorating the dielectric strength of the electronic component and reducing the reliability of equipment. Sex was reduced.
In addition, a part of the uppermost insulating layer may be peeled off in the process, and a part of the conductor pattern may be exposed.

【0006】また、表面粗さRaが、ほぼ1μmレベル
の絶縁基板を用いて導体パターンを積層すると、形成さ
れる導体パターン層には、表面粗さの影響により凹凸が
発生し、写植用(PR)マスクの劣化と導体パターン層
の外観異常品の発生を惹起していた。
Further, when a conductor pattern is laminated using an insulating substrate having a surface roughness Ra of about 1 μm, irregularities are generated in the formed conductor pattern layer due to the influence of the surface roughness. ) Deterioration of the mask and occurrence of an abnormal appearance product of the conductor pattern layer were caused.

【0007】また、形状をモニタする際に前記絶縁基板
の表面粗さの影響による凹凸のために形状が明確に判別
できず、工程内における品質の判定に不安があった。そ
れゆえに、使用する絶縁基板に、コストアップとはなる
が、鏡面加工を施して、絶縁基板の表面粗さRaを0.
1μm以下にする必要があった。
Further, when monitoring the shape, the shape cannot be clearly distinguished due to the unevenness due to the surface roughness of the insulating substrate, and there is a concern about the quality judgment in the process. Therefore, although the cost of the insulating substrate to be used is increased, mirror processing is performed to reduce the surface roughness Ra of the insulating substrate to 0.1.
It was necessary to be 1 μm or less.

【0008】そこで、本発明の課題は、製造が容易で安
価な、良品率の高い、かつ、信頼性の高い電子部品を提
供することにある。
It is an object of the present invention to provide an electronic component which is easy to manufacture, inexpensive, has a high yield rate, and has high reliability.

【0009】[0009]

【課題を解決するための手段】本発明は、1層以上の導
体パターン層と1層以上の絶縁層とを、絶縁基板上に積
層して回路素子を構成してなる電子部品であって、(絶
縁層の内)最上層の絶縁層の厚さを、導体パターン層の
最大厚さの2倍以上にする電子部品である。
The present invention relates to an electronic component comprising a circuit element formed by laminating at least one conductive pattern layer and at least one insulating layer on an insulating substrate. An electronic component in which the thickness of the uppermost insulating layer (of the insulating layers) is at least twice the maximum thickness of the conductor pattern layer.

【0010】また、本発明は、絶縁基板に接する絶縁層
は、前記絶縁基板の表面粗さRa(中心線平均粗さ)の
5倍以上の厚さを有する上記の電子部品である。
Further, the present invention is the above electronic component, wherein the insulating layer in contact with the insulating substrate has a thickness of at least five times the surface roughness Ra (center line average roughness) of the insulating substrate.

【0011】すなわち、本発明は、絶縁基板上に薄膜プ
ロセスを用いて、少なくとも1層以上の導体パターン層
と1層以上の絶縁層を積層して回路素子を形成し、前記
回路素子に外部電極を備えた電子部品であって、最上層
となる絶縁層の厚さを、スピンコート条件の低回転化、
層の複数化により回路素子の導体パターン層の最大厚さ
の2倍以上にする電子部品である。
That is, according to the present invention, a circuit element is formed by laminating at least one or more conductor pattern layers and one or more insulating layers on an insulating substrate by using a thin film process. An electronic component provided with, the thickness of the insulating layer to be the uppermost layer, the spin coating conditions lower rotation,
An electronic component in which the number of layers is increased to more than twice the maximum thickness of the conductor pattern layer of the circuit element.

【0012】また、薄膜積層プロセスの安定化とコスト
ダウンを図るため、使用する基板は鏡面加工を実施しな
い基板粗さRaが1μmレベルの絶縁基板を用いて、薄
膜積層プロセスの最下層を絶縁層とし、かつ絶縁層の厚
さを絶縁基板の表面粗さRaの5倍以上にする電子部品
である。
Further, in order to stabilize the thin film laminating process and reduce the cost, the substrate to be used is an insulative substrate having a substrate roughness Ra of 1 μm level, which is not mirror-finished, and the lowermost layer of the thin film laminating process is formed of an insulating layer. And an electronic component in which the thickness of the insulating layer is at least five times the surface roughness Ra of the insulating substrate.

【0013】[0013]

【発明の実施の形態】以下に、本発明の電子部品の一例
として、EMIフィルタを用いて、本発明の実施の形態
を説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below using an EMI filter as an example of an electronic component of the present invention.

【0014】図1は、本発明の電子部品の部分断面図で
あり、図2は、図1の電子部品を示す斜視図であり、図
3は、回路素子の構成を模式的に示した分解斜視図であ
る。
FIG. 1 is a partial sectional view of the electronic component of the present invention, FIG. 2 is a perspective view showing the electronic component of FIG. 1, and FIG. 3 is an exploded view schematically showing the structure of the circuit element. It is a perspective view.

【0015】本発明の電子部品は、図1に示すように、
絶縁基板11に接して、絶縁層12aを設け、絶縁層1
2aの上に導体パターン層13aを積層し、その上に、
絶縁層12bを積層し、絶縁層12bの上に導体パター
ン層13bを積層し、その上に、絶縁層12cを積層
し、絶縁層12cの上に導体パターン層13cを積層
し、さらにその上に、絶縁層12dを積層し、絶縁層1
2dの上に導体パターン層13dを積層してある。
As shown in FIG. 1, the electronic component of the present invention comprises:
An insulating layer 12a is provided in contact with the insulating substrate 11, and the insulating layer 1
2a, a conductor pattern layer 13a is laminated thereon, and
The insulating layer 12b is laminated, the conductor pattern layer 13b is laminated on the insulating layer 12b, the insulating layer 12c is laminated thereon, the conductor pattern layer 13c is laminated on the insulating layer 12c, and further thereon. , An insulating layer 12d and an insulating layer 1
A conductor pattern layer 13d is laminated on 2d.

【0016】また、導体パターン層13dに接して下地
電極14を設け、その上に外部電極膜15a、15bを
設けてある。外部電極膜15bは、絶縁基板11上の回
路素子21の両端面と側面の一部を覆うように形成して
いるので、電子部品(EMIフィルタ)10の外部電極
端子部22として機能する(図2)。なお、図2では、
本実施の形態で用いた絶縁層が透明性を有しているの
で、導体パターン層は絶縁層を通して見えている。
A base electrode 14 is provided in contact with the conductor pattern layer 13d, and external electrode films 15a and 15b are provided thereon. Since the external electrode film 15b is formed so as to cover both end surfaces and a part of the side surface of the circuit element 21 on the insulating substrate 11, it functions as the external electrode terminal portion 22 of the electronic component (EMI filter) 10 (FIG. 2). In FIG. 2,
Since the insulating layer used in the present embodiment has transparency, the conductor pattern layer can be seen through the insulating layer.

【0017】下地電極14の形成には、Ni等の金属粉
を含むエポキシ樹脂等からなる、製品の信頼性に有効な
導電ペーストを用いた。また、製造プロセス上、有効な
手段である電解バレルめっき法を用いて、外部電極膜1
5aはNi膜で、15bは半田膜で形成した。
For the formation of the base electrode 14, a conductive paste made of an epoxy resin or the like containing a metal powder such as Ni and effective for product reliability was used. The external electrode film 1 is formed using an electrolytic barrel plating method, which is an effective means in the manufacturing process.
5a is a Ni film, and 15b is a solder film.

【0018】そして、図3に示すように、EMIフィル
タの回路素子21は、絶縁基板11の上に、絶縁層12
a、12b、12c、12dと導体パターン層13a、
13b、13c、13dを積層して形成され、その回路
は、導体パターン層13aで1回路を構成し、導体パタ
ーン層13bと13cが絶縁層12cに設けられた穴
(図示せず)を介して接続され、1回路を構成し、全体
としては、絶縁層12bを挟んで対向する2回路(2コ
イル)で構成されている。また、導体パターン層13d
は、外部電極との接続を確実にするために設けてある。
Then, as shown in FIG. 3, the circuit element 21 of the EMI filter is
a, 12b, 12c, 12d and the conductor pattern layer 13a,
The circuit is formed by laminating 13b, 13c, 13d, and one circuit is constituted by the conductor pattern layer 13a, and the conductor pattern layers 13b and 13c are formed through holes (not shown) provided in the insulating layer 12c. Are connected to each other to form one circuit, and as a whole, are constituted by two circuits (two coils) opposed to each other with the insulating layer 12b interposed therebetween. The conductor pattern layer 13d
Is provided to ensure connection with external electrodes.

【0019】そして、絶縁基板11には、表面粗さRa
0.1μm以下の鏡面加工を施さない、表面粗さRaが
1μmレベルの安価な基板を用いた。そして、絶縁基板
11に接する絶縁層12aの厚さを、絶縁基板11の表
面粗さRa(1μm)の5倍にした。
The insulating substrate 11 has a surface roughness Ra.
An inexpensive substrate having a surface roughness Ra of the order of 1 μm, which was not subjected to mirror finishing of 0.1 μm or less, was used. Then, the thickness of the insulating layer 12a in contact with the insulating substrate 11 was set to five times the surface roughness Ra (1 μm) of the insulating substrate 11.

【0020】また、前記の絶縁層12a、12b、12
c、12dには、ベンゾシクロブテン樹脂を用い、最上
層の絶縁層である12dの厚さを導体パターン層13
a、13b、13c、13dの最大厚さの2倍にしてあ
る。絶縁層の厚さを制御するために、層の複数化と、ス
ピンコート条件の制御を行った。
The insulating layers 12a, 12b, 12
For c and 12d, a benzocyclobutene resin is used, and the thickness of the uppermost insulating layer 12d is
The maximum thickness of a, 13b, 13c, and 13d is twice as large. In order to control the thickness of the insulating layer, the number of layers was increased and spin coating conditions were controlled.

【0021】また、導体パターン層13a、13b、1
3c、13dは、スパッタ等でTiおよびCuの下地膜
を形成し、かつ、レジストでパターンを形成して、電解
めっきでCu膜を電着して形成した。
The conductor pattern layers 13a, 13b, 1
3c and 13d were formed by forming a base film of Ti and Cu by sputtering or the like, forming a pattern with a resist, and electrodepositing a Cu film by electrolytic plating.

【0022】上記のようにして得られた、本発明の電子
部品であるEMIフィルタは、外部からの機械的応力に
よる回路素子の破損が少なく、良品率が向上し、また、
高湿度中での使用でも絶縁層の吸湿による導体パターン
層のマイグレーションの発生が著しく減少し、高品質、
高信頼性の電子部品となった。
The EMI filter, which is an electronic component of the present invention, obtained as described above, has less damage to circuit elements due to external mechanical stress, improves the non-defective rate, and
Even when used in high humidity, the occurrence of migration of the conductor pattern layer due to moisture absorption of the insulating layer is significantly reduced, and high quality,
It became a highly reliable electronic component.

【0023】また、表面粗さRaが、1μmレベルの基
板を使用しても、薄膜積層プロセスでのPRマスクの劣
化、導体パターン層の形状異常の発生が減少し、かつ工
程内における品質の判定が容易となり、安定で、安価な
電子部品が製造できた。
Further, even when a substrate having a surface roughness Ra of 1 μm level is used, the deterioration of the PR mask and the occurrence of abnormal shape of the conductor pattern layer in the thin film laminating process are reduced, and the quality is judged in the process. Thus, stable and inexpensive electronic components could be manufactured.

【0024】なお、最上層の絶縁層の厚さを、導体パタ
ーン層の最大厚さの2倍未満にしたときには、絶縁層の
一部が、工程内で剥離して、導体パターンの一部が露出
してしまうものもあり、外観異常品の発生を抑えきれな
かった。
When the thickness of the uppermost insulating layer is less than twice the maximum thickness of the conductor pattern layer, a part of the insulating layer is peeled off in the process, and a part of the conductor pattern is removed. Some of them were exposed, and the occurrence of abnormal appearance products could not be suppressed.

【0025】また、薄膜積層プロセスの最下層を絶縁層
とし、かつ絶縁層の厚さを絶縁基板の表面粗さRaの5
倍未満にしたときには、絶縁基板粗さRaの影響による
凹凸の発生を抑制しきれなかったために、写植用(P
R)マスクの劣化と導体パターン層の外観異常品の発生
を抑えきれなかった。
Further, the lowermost layer of the thin film laminating process is used as an insulating layer, and the thickness of the insulating layer is set to a value equal to the surface roughness Ra of the insulating substrate.
When it is less than twice, the occurrence of unevenness due to the effect of the roughness Ra of the insulating substrate could not be completely suppressed.
R) The deterioration of the mask and the occurrence of abnormal appearance products of the conductor pattern layer could not be suppressed.

【0026】また、本発明の実施の形態においては、電
子部品としてEMIフィルタを例示したが、インダクタ
(L)、キャパシタ(C)、抵抗素子(R)などの単一
素子部品、コモンモードチョークコイル、カレントセン
サ、信号トランスなどの複合素子部品等の電子部品(表
面実装部品、リード部品)、およびその回路素子に用い
ても、その効果に変わりはなかった。
In the embodiment of the present invention, an EMI filter has been exemplified as an electronic component. However, a single element component such as an inductor (L), a capacitor (C), a resistance element (R), a common mode choke coil, etc. Even when used for electronic components (surface-mounted components, lead components) such as composite device components such as current sensors and signal transformers, and their circuit elements, their effects remain unchanged.

【0027】また、本実施の形態の説明では、ベンゾシ
クロブテン樹脂よりなる絶縁を用いたが、薄膜を形成し
得る絶縁材料を用いれば、如何なる絶縁材料であって
も、その効果に変わりはない。
Further, in the description of the present embodiment, the insulation made of benzocyclobutene resin is used. However, if an insulating material capable of forming a thin film is used, the effect is the same regardless of what kind of insulating material is used. .

【0028】[0028]

【発明の効果】本発明によれば、製造が容易で安価な、
良品率の高い、かつ、信頼性の高い電子部品が得られ
る。
According to the present invention, it is easy and inexpensive to manufacture,
An electronic component with a high non-defective rate and high reliability can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電子部品の部分断面図。FIG. 1 is a partial cross-sectional view of an electronic component according to the present invention.

【図2】本発明の電子部品を示す斜視図。FIG. 2 is a perspective view showing an electronic component of the present invention.

【図3】本発明の電子部品の回路素子の構成を模式的に
示す分解斜視図。
FIG. 3 is an exploded perspective view schematically showing a configuration of a circuit element of the electronic component of the present invention.

【図4】従来の電子部品の一例の部分断面図。FIG. 4 is a partial cross-sectional view of an example of a conventional electronic component.

【符号の説明】[Explanation of symbols]

10 (本発明の)電子部品 11 (本発明の電子部品に用いた)絶縁基板 12a、12b、12c、12d (本発明の電子部
品に用いた)絶縁層 13a、13b、13c、13d (本発明の電子部
品に用いた)導体パターン層 14 下地電極 15 外部電極 15a、15b 外部電極膜 21 回路素子 22 外部電極端子部 100 (従来の)電子部品 101 (従来の電子部品に用いた)絶縁基板 102 (従来の電子部品に用いた)絶縁層 103 (従来の電子部品に用いた)導体パターン
10 Electronic component (of the present invention) 11 Insulating substrate 12a, 12b, 12c, 12d (used for the electronic component of the present invention) Insulating layer 13a, 13b, 13c, 13d (used for the electronic component of the present invention) Pattern layer 14 base electrode 15 external electrode 15a, 15b external electrode film 21 circuit element 22 external electrode terminal part 100 (conventional) electronic component 101 (used for conventional electronic component) insulating substrate 102 Insulating layer 103 (used for conventional electronic components) Conductor pattern (used for conventional electronic components)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 1層以上の導体パターン層と1層以上の
絶縁層とを、絶縁基板上に積層して回路素子を構成して
なる電子部品であって、最上層の絶縁層の厚さを、導体
パターン層の最大厚さの2倍以上にすることを特徴とす
る電子部品。
An electronic component comprising a circuit element formed by laminating at least one conductive pattern layer and at least one insulating layer on an insulating substrate, wherein the thickness of the uppermost insulating layer is Electronic component, which is not less than twice the maximum thickness of the conductor pattern layer.
【請求項2】 1層以上の導体パターン層と1層以上の
絶縁層とを、絶縁基板上に積層して回路素子を構成して
なる電子部品であって、前記絶縁基板に接する絶縁層
は、前記絶縁基板の表面粗さRaの5倍以上の厚さを有
することを特徴とする電子部品。
2. An electronic component comprising a circuit element by laminating at least one conductor pattern layer and at least one insulating layer on an insulating substrate, wherein the insulating layer in contact with the insulating substrate is An electronic component having a thickness of at least five times the surface roughness Ra of the insulating substrate.
JP9338145A 1997-11-20 1997-11-20 Electronic component Pending JPH11154612A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9338145A JPH11154612A (en) 1997-11-20 1997-11-20 Electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9338145A JPH11154612A (en) 1997-11-20 1997-11-20 Electronic component

Publications (1)

Publication Number Publication Date
JPH11154612A true JPH11154612A (en) 1999-06-08

Family

ID=18315341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9338145A Pending JPH11154612A (en) 1997-11-20 1997-11-20 Electronic component

Country Status (1)

Country Link
JP (1) JPH11154612A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7855460B2 (en) 2007-04-25 2010-12-21 Tdk Corporation Electronic component to protect an interface between a conductor and an insulator and method for manufacturing the same
US8493744B2 (en) 2007-04-03 2013-07-23 Tdk Corporation Surface mount devices with minimum lead inductance and methods of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8493744B2 (en) 2007-04-03 2013-07-23 Tdk Corporation Surface mount devices with minimum lead inductance and methods of manufacturing the same
US7855460B2 (en) 2007-04-25 2010-12-21 Tdk Corporation Electronic component to protect an interface between a conductor and an insulator and method for manufacturing the same

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