JPH10270974A - Surface acoustic wave element - Google Patents

Surface acoustic wave element

Info

Publication number
JPH10270974A
JPH10270974A JP9090307A JP9030797A JPH10270974A JP H10270974 A JPH10270974 A JP H10270974A JP 9090307 A JP9090307 A JP 9090307A JP 9030797 A JP9030797 A JP 9030797A JP H10270974 A JPH10270974 A JP H10270974A
Authority
JP
Japan
Prior art keywords
electrode
acoustic wave
surface acoustic
reduced
idt electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9090307A
Other languages
Japanese (ja)
Inventor
Kazuto Kishida
和人 岸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kenwood KK
Original Assignee
Kenwood KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kenwood KK filed Critical Kenwood KK
Priority to JP9090307A priority Critical patent/JPH10270974A/en
Publication of JPH10270974A publication Critical patent/JPH10270974A/en
Pending legal-status Critical Current

Links

Landscapes

  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce a chip dimension without deteriorating the frequency characteristic by etching/working the surface of a substrate between IDT electrodes in a surface acoustic wave element, providing a groove and reducing apparent propagation speed. SOLUTION: At the time of etching a piezoelectric substrate material, a part where normal IDT electrode, an apodization IDT electrode and a shielding electrode are not formed, a part between the normal IDT electrodes 2a and a part between the apodiation IDT electrodes are etched and the groove A6 is formed. The apparent transmission speed of the surface acoustic wave(SAW) shown by a code A7 becomes small for the piezoelectric substrate on which the groove is worked, and the electrode pitches of the respective IDT electrodes can be reduced. Thus, the whole dimension of the chip can be reduced. Thus, the chip dimension can be made small without deteriorating the frequency characteristic without changing the basic design of an SAW filter. The IDT electrodes are formed by materials whose specific gravity is larger than aluminum.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面弾性波素子に
係り、特にチップ寸法の小型化が可能な表面弾性波素子
に関する。
The present invention relates to a surface acoustic wave device, and more particularly to a surface acoustic wave device capable of reducing the size of a chip.

【0002】[0002]

【従来の技術】従来の表面弾性波(SAW)フィルタ
は、例えば、中心周波数が数十MHz、帯域が4MH
z、帯域内リップル1dB以内、帯域外減衰量35dB
以下のものは、チップ寸法の大きいトランスバーサル型
SAWフィルタが用いられている。
2. Description of the Related Art A conventional surface acoustic wave (SAW) filter has, for example, a center frequency of several tens of MHz and a band of 4 MHz.
z, in-band ripple within 1 dB, out-of-band attenuation 35 dB
In the following, a transversal type SAW filter having a large chip size is used.

【0003】従来のトランスバーサル型SAWフィルタ
は、図4及び図5に示すようなデバイス構造になってお
り、圧電基板B1上に正規型IDT電極B2とシールド
電極B4及びアポダイズ型IDT電極B3がフォトリソ
技術を用いてアルミニューム薄膜で形成される。なお、
図中、B5はダンパー剤を示している。
A conventional transversal type SAW filter has a device structure as shown in FIGS. 4 and 5, and a regular type IDT electrode B2, a shield electrode B4 and an apodized type IDT electrode B3 are formed on a piezoelectric substrate B1 by photolithography. It is formed of an aluminum thin film using technology. In addition,
In the figure, B5 indicates a damper agent.

【0004】この場合、正規型IDT電極B2及びアポ
ダイズ型IDT電極B3の電極ピッチpは、目的の中心
周波数f0 と圧電基板B1のSAW伝播方向の伝播速度
vで規制される。即ち、電極ピッチpは、p=1/2・
v/f0 として求めることができる。つまり、圧電基板
B1のSAW伝播方向の伝播速度vは素材の固有値であ
るから、電極ピッチpは変えようがない。
In this case, the electrode pitch p between the regular IDT electrode B2 and the apodized IDT electrode B3 is regulated by the target center frequency f0 and the propagation speed v of the piezoelectric substrate B1 in the SAW propagation direction. That is, the electrode pitch p is p = 1 / ·
v / f0. That is, since the propagation speed v of the piezoelectric substrate B1 in the SAW propagation direction is a characteristic value of the material, the electrode pitch p cannot be changed.

【0005】次に、所望の周波数特性のスペックにより
チップサイズが自ずと決定されるから、この所望の周波
数特性のスペックを落とさない限り、チップ自身のサイ
ズダウンは不可能であり、小型化するためには現状の周
波数特性を劣化させないと実現できない。
[0005] Next, since the chip size is naturally determined by the specifications of the desired frequency characteristics, it is impossible to reduce the size of the chip itself unless the specifications of the desired frequency characteristics are reduced. Cannot be realized without deteriorating the current frequency characteristics.

【0006】[0006]

【発明が解決しようとする課題】SAWフィルタを組み
込んだ回路、例えば、RF回路等を小型化する意味にお
いても、或は、SAWウェハーからチップを取る数を増
やす意味においても、チップ寸法の小型化が望ましいも
のである。
In order to reduce the size of a circuit incorporating a SAW filter, for example, an RF circuit, or to increase the number of chips to be taken from a SAW wafer, the chip size can be reduced. Is desirable.

【0007】ところが、前述のように、従来のSAWフ
ィルタは、ある一定のフィルタスペックを満たすには、
圧電材料固有の伝播速度や電気機械結合係数によりチッ
プ寸法が規定されていたから、チップ寸法を小さくする
にはフィルタのスペックをある程度犠牲(スペックダウ
ン)にする方法しかないため、前記のようなSAWフィ
ルタを組み込むRF回路等の設計負担が増加したり、R
F回路自身の性能劣化が余儀なくされる等の欠点があっ
た。また、フィルタ性能を落とさなければ、SAWフィ
ルタ自身を小さくすることができないから、セットとし
ての小型化に限界が生じていた。
However, as described above, the conventional SAW filter needs to satisfy a certain filter specification.
Since the chip size is defined by the propagation speed and the electromechanical coupling coefficient inherent to the piezoelectric material, the only way to reduce the chip size is to sacrifice the filter specifications to some extent (spec down). The design burden of the RF circuit to be incorporated increases,
There is a disadvantage that the performance of the F circuit itself must be deteriorated. Further, unless the filter performance is reduced, the SAW filter itself cannot be reduced in size, thus limiting the miniaturization as a set.

【0008】そこで、本発明の目的は、SAWフィルタ
の基本設計を変更することなく、しかも周波数特性を劣
化させることなくチップ寸法を小型化することができる
表面弾性波素子を提供することにある。
An object of the present invention is to provide a surface acoustic wave device that can reduce the chip size without changing the basic design of the SAW filter and without deteriorating the frequency characteristics.

【0009】[0009]

【課題を解決するための手段】本発明の表面弾性は素子
は、請求項1記載のものにおいては、表面弾性波素子に
おけるIDT電極の電極間の基板表面をエッチング加工
することにより溝を設けて見かけ上伝播速度を小さくす
ることによりチップ寸法を小型化したことを特徴とす
る。
According to the first aspect of the present invention, there is provided a surface acoustic wave device in which a groove is provided by etching a substrate surface between IDT electrodes in a surface acoustic wave device. The chip size is reduced by apparently reducing the propagation speed.

【0010】圧電基板のSAWの伝播速度vは、カット
面の伝播方向に対して一定であるが、上記の構成とする
ことにより、見かけ上伝播速度を小さくすることがで
き、結果的にSAWフィルタの特性を劣化させないでチ
ップ寸法を小型化することができる。
The propagation speed v of the SAW of the piezoelectric substrate is constant with respect to the propagation direction of the cut surface. However, by adopting the above structure, the propagation speed can be apparently reduced, and as a result, the SAW filter Chip size can be reduced without deteriorating the characteristics of the chip.

【0011】請求項2記載のものにおいては、請求項1
記載の表面弾性波素子において、IDT電極をアルミニ
ュームよりも比重の大きい材料で形成したことを特徴と
する。
According to the second aspect, the first aspect is provided.
In the surface acoustic wave device described above, the IDT electrode is formed of a material having a higher specific gravity than aluminum.

【0012】これにより、見かけ上伝播速度vが小さく
なり、チップ寸法の小型化が可能となる。
As a result, the propagation speed v apparently decreases, and the chip size can be reduced.

【0013】[0013]

【発明の実施の形態】図1は、本発明に係る表面弾性波
素子の実施例を示す平面図、図2は同上断面図、図3は
溝部を示すための図2におけるa部の拡大図である。例
えば、トランスバーサル型SAWフィルタの場合、圧電
基板A1上に、正規型IDT電極A2、それに対向する
所望の重み付けをおこなったアポダイズIDT電極A
3、正規型IDT電極A2とアポダイズIDT電極A3
の間にシールド電極A4をアルミニュームより比重の大
きい純金属又は合金等でそれぞれ形成する。図中、A5
はダンパー材である。
FIG. 1 is a plan view showing an embodiment of a surface acoustic wave device according to the present invention, FIG. 2 is a sectional view of the same, and FIG. 3 is an enlarged view of a portion a in FIG. It is. For example, in the case of a transversal-type SAW filter, a regular-type IDT electrode A2 and an apodized IDT electrode A with a desired weight opposed thereto are provided on a piezoelectric substrate A1.
3. Regular type IDT electrode A2 and apodized IDT electrode A3
In between, the shield electrode A4 is formed of a pure metal or alloy having a specific gravity higher than that of aluminum. In the figure, A5
Is a damper material.

【0014】その後、圧電基板材料と前記純金属又は合
金材料との選択性をもったエッチング液により、圧電基
板材料をエッチングする。このとき、正規型IDT電極
A2とアポダイズIDT電極A3及びシールド電極A4
が形成されていない個所と正規型IDT電極A2の電極
2a,2a間及びアポダイズIDT電極A3の電極3
a,3a間がエッチングされて溝A6が形成される。ま
た、このエッチング加工は、選択性をもったエッチング
ガスを用いてリアクティブイオンエッチング加工するこ
とも可能である。
Thereafter, the piezoelectric substrate material is etched with an etchant having a selectivity between the piezoelectric substrate material and the pure metal or alloy material. At this time, the regular type IDT electrode A2, the apodized IDT electrode A3, and the shield electrode A4
Is not formed, between the electrodes 2a, 2a of the normal type IDT electrode A2, and the electrode 3 of the apodized IDT electrode A3.
The groove A6 is formed by etching between the portions a and 3a. This etching can also be performed by reactive ion etching using an etching gas having selectivity.

【0015】このように溝加工を施した圧電基板A1
は、見かけ上、符号7Aで示すSAWの伝播速度vが小
さくなり、IDT電極A2,A3のそれぞれの電極ピッ
チを小さくとることができるから、チップ全体の寸法を
小さくすることが可能となる。また、アルミニュームよ
り比重の大きい純金金属又は合金等で各IDT電極A
2,A3及びシールド電極A4を形成しているから、更
にIDT電極の電極ピッチを小さくとることができ、チ
ップ全体の寸法をより小さくとることができる。
The piezoelectric substrate A1 thus grooved is provided.
In the above, apparently, the propagation speed v of the SAW indicated by reference numeral 7A is reduced, and the electrode pitch of each of the IDT electrodes A2 and A3 can be reduced, so that the size of the entire chip can be reduced. In addition, each IDT electrode A is made of a pure gold metal or alloy having a higher specific gravity than aluminum.
Since the electrodes A2 and A3 and the shield electrode A4 are formed, the electrode pitch of the IDT electrodes can be further reduced, and the overall size of the chip can be reduced.

【0016】[0016]

【発明の効果】本発明によれば、SAWフィルタの基本
設計を変更せず、また、周波数特性を劣化させることな
くチップ寸法を小さくすることができる。
According to the present invention, the chip size can be reduced without changing the basic design of the SAW filter and without deteriorating the frequency characteristics.

【0017】また、これにより設計コストを大幅に削減
でき、しかも、SAWフィルタを用いた回路の設計の負
担も軽減することができる。更に、本発明により、SA
Wウェハーからのチップの取り数が増えるから材料費削
減にもつながり、また、SAWフィルタ寸法が小さくで
きることにより、RF回路等の小型化も可能となる。
In addition, the design cost can be greatly reduced, and the burden of designing a circuit using a SAW filter can be reduced. Further, according to the present invention, SA
An increase in the number of chips taken from the W wafer leads to a reduction in material cost, and a reduction in the size of the SAW filter also enables a reduction in the size of the RF circuit and the like.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る表面弾性波素子の概要図。FIG. 1 is a schematic diagram of a surface acoustic wave device according to the present invention.

【図2】本発明に係る表面弾性波素子の断面図。FIG. 2 is a sectional view of a surface acoustic wave device according to the present invention.

【図3】図2におけるa部の拡大図。FIG. 3 is an enlarged view of a part “a” in FIG. 2;

【図4】従来のSAWフィルタの概要図。FIG. 4 is a schematic diagram of a conventional SAW filter.

【図5】従来のSAWフィルタの断面図。FIG. 5 is a cross-sectional view of a conventional SAW filter.

【符号の説明】[Explanation of symbols]

A1 圧電基板 A2 正規型IDT電極 2a 電極 A3 アポダイズ型IDT電極 3a 電極 A4 シールド電極 A5 ダンパー剤 A6 溝 A7 SAW A1 Piezoelectric substrate A2 Regular type IDT electrode 2a electrode A3 Apodized type IDT electrode 3a electrode A4 Shield electrode A5 Damper agent A6 Groove A7 SAW

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 表面弾性波素子におけるIDT電極の電
極間の基板表面をエッチング加工することにより溝を設
けて見かけ上伝播速度を小さくすることによりチップ寸
法を小型化したことを特徴とする表面弾性波素子。
A surface elasticity characterized in that a chip size is reduced by providing a groove by etching a surface of a substrate between IDT electrodes in a surface acoustic wave element to reduce an apparent propagation speed. Wave element.
【請求項2】 請求項1記載の表面弾性波素子におい
て、IDT電極をアルミニュームよりも比重の大きい材
料で形成したことを特徴とする表面弾性波素子。
2. The surface acoustic wave device according to claim 1, wherein the IDT electrode is formed of a material having a higher specific gravity than aluminum.
JP9090307A 1997-03-25 1997-03-25 Surface acoustic wave element Pending JPH10270974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9090307A JPH10270974A (en) 1997-03-25 1997-03-25 Surface acoustic wave element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9090307A JPH10270974A (en) 1997-03-25 1997-03-25 Surface acoustic wave element

Publications (1)

Publication Number Publication Date
JPH10270974A true JPH10270974A (en) 1998-10-09

Family

ID=13994894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9090307A Pending JPH10270974A (en) 1997-03-25 1997-03-25 Surface acoustic wave element

Country Status (1)

Country Link
JP (1) JPH10270974A (en)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100451080B1 (en) * 2002-01-23 2004-10-02 엘지이노텍 주식회사 Resonator Type Surface Acoustic Wave Filter
JP2009147917A (en) * 2007-10-22 2009-07-02 Centre Natl De La Recherche Scientifique Lamb wave resonator
KR100912553B1 (en) 2008-03-07 2009-08-19 오영주 Piezoelectric substrate and surface acoustic wave filter using the same
JP2009225420A (en) * 2008-02-20 2009-10-01 Epson Toyocom Corp Surface acoustic wave device and surface acoustic wave oscillator
US7626313B2 (en) * 2006-07-05 2009-12-01 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JP2010088141A (en) * 2008-02-20 2010-04-15 Epson Toyocom Corp Surface acoustic wave device and surface acoustic wave oscillator
US8305162B2 (en) 2009-02-27 2012-11-06 Seiko Epson Corporation Surface acoustic wave resonator and surface acoustic wave oscillator
US8471434B2 (en) 2010-08-26 2013-06-25 Seiko Epson Corporation Surface acoustic wave device, surface acoustic wave oscillator, and electronic apparatus
US8476984B2 (en) 2010-12-07 2013-07-02 Seiko Epson Corporation Vibration device, oscillator, and electronic apparatus
US8598766B2 (en) 2010-12-03 2013-12-03 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US8692439B2 (en) 2010-08-26 2014-04-08 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic device
US8723394B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723396B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723393B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723395B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
JP2014112949A (en) * 2009-02-27 2014-06-19 Seiko Epson Corp Surface acoustic wave resonator and surface acoustic wave oscillator
US8816567B2 (en) 2011-07-19 2014-08-26 Qualcomm Mems Technologies, Inc. Piezoelectric laterally vibrating resonator structure geometries for spurious frequency suppression
US8928432B2 (en) 2010-08-26 2015-01-06 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US9048806B2 (en) 2010-09-09 2015-06-02 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US9088263B2 (en) 2010-06-17 2015-07-21 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100451080B1 (en) * 2002-01-23 2004-10-02 엘지이노텍 주식회사 Resonator Type Surface Acoustic Wave Filter
US7626313B2 (en) * 2006-07-05 2009-12-01 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JP2009147917A (en) * 2007-10-22 2009-07-02 Centre Natl De La Recherche Scientifique Lamb wave resonator
JP2009225420A (en) * 2008-02-20 2009-10-01 Epson Toyocom Corp Surface acoustic wave device and surface acoustic wave oscillator
JP2010088141A (en) * 2008-02-20 2010-04-15 Epson Toyocom Corp Surface acoustic wave device and surface acoustic wave oscillator
JP4591800B2 (en) * 2008-02-20 2010-12-01 エプソントヨコム株式会社 Surface acoustic wave device and surface acoustic wave oscillator
US8063534B2 (en) 2008-02-20 2011-11-22 Seiko Epson Corporation Surface acoustic wave device and surface acoustic wave oscillator
US8084918B2 (en) 2008-02-20 2011-12-27 Seiko Epson Corporation Surface acoustic wave device and surface acoustic wave oscillator
US8237326B2 (en) 2008-02-20 2012-08-07 Seiko Epson Corporation Surface acoustic wave device and surface acoustic wave oscillator
CN102176664B (en) * 2008-02-20 2014-05-14 精工爱普生株式会社 Surface acoustic wave device and surface acoustic wave oscillator
CN102882487A (en) * 2008-02-20 2013-01-16 精工爱普生株式会社 Surface acoustic wave device and surface acoustic wave oscillator
KR100912553B1 (en) 2008-03-07 2009-08-19 오영주 Piezoelectric substrate and surface acoustic wave filter using the same
US8305162B2 (en) 2009-02-27 2012-11-06 Seiko Epson Corporation Surface acoustic wave resonator and surface acoustic wave oscillator
US8502625B2 (en) 2009-02-27 2013-08-06 Seiko Epson Corporation Surface acoustic wave resonator and surface acoustic wave oscillator
US9762207B2 (en) 2009-02-27 2017-09-12 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic instrument
US8952596B2 (en) 2009-02-27 2015-02-10 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic instrument
US8933612B2 (en) 2009-02-27 2015-01-13 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic instrument
JP2014112949A (en) * 2009-02-27 2014-06-19 Seiko Epson Corp Surface acoustic wave resonator and surface acoustic wave oscillator
US9537464B2 (en) 2010-06-17 2017-01-03 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US9088263B2 (en) 2010-06-17 2015-07-21 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US8692439B2 (en) 2010-08-26 2014-04-08 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic device
US8928432B2 (en) 2010-08-26 2015-01-06 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US8471434B2 (en) 2010-08-26 2013-06-25 Seiko Epson Corporation Surface acoustic wave device, surface acoustic wave oscillator, and electronic apparatus
US8723395B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723393B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723396B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8723394B2 (en) 2010-09-09 2014-05-13 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US9048806B2 (en) 2010-09-09 2015-06-02 Seiko Epson Corporation Surface acoustic wave device, electronic apparatus, and sensor apparatus
US8791621B2 (en) 2010-12-03 2014-07-29 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US8598766B2 (en) 2010-12-03 2013-12-03 Seiko Epson Corporation Surface acoustic wave resonator, surface acoustic wave oscillator, and electronic apparatus
US8476984B2 (en) 2010-12-07 2013-07-02 Seiko Epson Corporation Vibration device, oscillator, and electronic apparatus
US8816567B2 (en) 2011-07-19 2014-08-26 Qualcomm Mems Technologies, Inc. Piezoelectric laterally vibrating resonator structure geometries for spurious frequency suppression

Similar Documents

Publication Publication Date Title
JPH10270974A (en) Surface acoustic wave element
CN111200417B (en) Surface acoustic wave transducer with transverse mode suppression function and preparation method thereof
JP5300958B2 (en) Surface acoustic wave device and surface acoustic wave device
KR100312001B1 (en) Surface acoustic wave device
US7479855B2 (en) Longitudinally-coupled-resonator-type elastic wave filter device
US7804221B2 (en) Surface acoustic wave device
KR20040089131A (en) Surface Acoustic Wave Device Having Improved Performance and Method of Making the Device
WO2020204045A1 (en) High-order mode surface acoustic wave device
EP1184978B1 (en) Surface acoustic wave device and method of producing the same
JP2008078981A (en) Surface acoustic wave resonator, surface acoustic wave filter and antenna duplexer using the same
JP2008079275A (en) Surface acoustic wave element, and surface acoustic wave device
JP2008035220A (en) Surface acoustic wave device and communication equipment
JPH1188112A (en) Surface acoustic wave element
JP2001298346A (en) Surface acoustic wave device
JPH11205071A (en) Surface acoustic wave device
JP3991777B2 (en) SAW device
JP3316090B2 (en) Surface acoustic wave resonator, method of manufacturing the same, and surface acoustic wave filter
JP2007104481A (en) Surface acoustic wave filter
JP2006128775A (en) Surface acoustic wave device
JP2004207996A (en) Electronic component and electronic apparatus using the electronic component
JP2002026686A (en) Surface acoustic wave element and its manufacturing method
JP2000013179A (en) Surface acoustic wave element and its manufacture
JPS63314906A (en) Manufacture of surface acoustic wave device
JP2004207998A (en) Electronic component and electronic apparatus using this electronic component
JPH11195956A (en) Surface acoustic wave filter