JPH10197715A - Production of color filter for liquid crystal, color filter for liquid crystal and liquid crystal panel produced by the same method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter satisfying ink jet aptitude inexpensively in addition to heat resistance, solvent resistance and resolusion by forming a photosensitive compound layer containing a specified water-repellant/oil- repellant compound through photolithography and arranging a coloring agent at a light transmissive section by discharging ink. SOLUTION: The photosensitive compound layer containing the water- repellant/oil-repellant compound having surface tension or critical surface tension lower than 2.5×10<-2> [N/m] is formed at a light shielding section on a light transmissive substrate, for which the light shielding section is formed, by photolithography and afterwards, the coloring agent is arranged at the light transmissive section by discharging the ink while using an ink jet recorder. In this case, both dye ink and pigment ink can be used as ink to be used for coloring. Besides, in order to improve the fixing property of ink, an ink absorptive resin layer can be previously provided at a coloring section as well.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color filter for a color liquid crystal display used in a color television, a personal computer, and the like, and more particularly to a method of manufacturing a color filter for a liquid crystal using an ink jet recording technique. In addition, the present invention relates to a liquid crystal color filter manufactured by using an inkjet recording technique and a liquid crystal panel including the color filter.

[0002]

2. Description of the Related Art In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, has been increasing. However, cost reduction is required for further widespread use. In particular, there is an increasing demand for cost reduction of color filters having a high cost.

Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required performance of the color filter, but a method satisfying all the required characteristics has not yet been established. The respective methods will be described below.

The first method most frequently used is a dyeing method. In the dyeing method, first, a water-soluble polymer material, which is a material for dyeing, is formed on a glass substrate, and is patterned into a desired shape by photolithography to obtain a monochromatic pattern. By repeating this three times, R, G, and B color filter layers are formed.

[0005] The second method is a pigment dispersion method, which has recently been replaced by a dyeing method. In this method, first, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. This is 3
This process is repeated twice to form R, G, B color filter layers.

A third method is an electrodeposition method. In this method, first, a transparent electrode is patterned on a substrate, and a pigment,
The first color is electrodeposited by dipping in an electrodeposition coating solution containing a resin, an electrolytic solution or the like. By repeating this three times, R, G,
After forming the color filter layer of B, firing is performed last.

As a fourth method, a pigment is dispersed in a thermosetting resin, and printing is repeated three times to obtain R, G,
After separately applying B, the resin is cured to form a colored layer.

In each of the above methods, a protective layer is generally formed on the colored layer. What is common to these methods is that the same process needs to be repeated three times in order to color the three colors R, G, and B, which increases the cost. There is also a problem that the yield decreases as the number of steps increases. Furthermore, in the electrodeposition method, since the pattern shape that can be formed is limited, it is difficult to apply the current technology for TFT. Further, the printing method is not suitable for forming a fine pitch pattern because of poor resolution.

To make up for these drawbacks, Japanese Patent Application Laid-Open No.
9-75205, JP-A-63-235901, JP-A-1
There are proposals such as -217320, but they are still insufficient.

[0010]

SUMMARY OF THE INVENTION It is an object of the present invention to provide an inexpensive and high-yield solution that satisfies the required properties of the conventional method, such as heat resistance, solvent resistance, resolution, etc., and also satisfies ink jet suitability. An object of the present invention is to provide a color filter manufacturing method and a highly reliable color filter manufactured by the method. In particular, it is an object of the present invention to provide a method for manufacturing a highly reliable liquid crystal color filter which prevents color mixing when a colorant is arranged by discharging ink using an ink jet.

[0011]

The above object is achieved by the following means.

That is, according to the present invention, the surface tension or the critical surface tension is provided on the light-shielding portion on the light-transmitting substrate on which the light-shielding portion is formed on the light-transmitting substrate on which the light-shielding portion is formed. After forming a photosensitive compound layer containing a water-repellent / oil-repellent compound of 2.5 × 10 ⁻² [N / m] or less by photolithography, the ink is ejected using an ink jet recording apparatus to the light transmitting portion. A method for producing a liquid crystal color filter characterized by arranging a colorant, wherein the water- and oil-repellent compound is a perfluoroalkyl group or a fluorosurfactant containing a polyfluoroalkyl group. Or the fluorine-containing polymer compound, the content of the water-repellent / oil-repellent compound is 0.001 wt% or more and less than 2.0 wt%, and the photosensitive compound Using a positive photosensitive compound and a light-shielding site as a mask, exposure was performed from the back surface of the substrate, and development was performed so that a relief image of a photosensitive compound containing a water-repellent and oil-repellent compound was left only in the light-shielded site. A colorant is arranged in a light-transmitting portion by discharging ink using an ink jet recording device later, the photosensitive compound,
After forming the photosensitive compound layer, applying a thermal energy to cause the water-repellent / oil-repellent compound to be freed on the surface, and then performing a coloring step using an inkjet recording apparatus. Washing and removing the water / oil repellent compound after the arrangement of the colorant.

Further, the present invention has a structure in which a liquid crystal color filter and a substrate facing the color filter are produced by the above method, and a liquid crystal compound is sealed between the two substrates. A liquid crystal panel characterized by the above is proposed.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

FIG. 1 shows a method of manufacturing a color filter for a liquid crystal according to the present invention, and shows an example of a configuration of the color filter for a liquid crystal according to the present invention.

In the present invention, a glass substrate is generally used as the substrate, but the substrate is not limited to a glass substrate as long as it has necessary characteristics such as transparency and mechanical strength as a color filter for liquid crystal.

FIG. 1A shows a view in which a light-shielding portion is formed on a glass substrate. First, a photosensitive compound containing a water-repellent / oil-repellent compound is applied to a substrate on which a light-shielding portion is formed, and prebaked to obtain a water-repellent / oil-repellent photosensitive compound layer (FIG. 1B). ). When the photosensitive compound is a negative type, exposure is performed using a photomask (FIG. 1C), and then development is performed to form a water-repellent and oil-repellent relief image only on the light-shielding portion. (Figure 1
(D).

When the photosensitive compound is of a positive type, a photomaskless self-alignment exposure can be performed by exposing from the back surface of the substrate using a light-shielding portion on the substrate as a mask (FIG. 1 (c2)). ), More preferable in view of manufacturing cost. However, both negative and positive photosensitive compounds can be used in the present invention.

The negative photosensitive compound includes a cinnamic acid-based resist, a cyclized rubber-based resist containing bisazide as a photosensitive group, a photoradical polymerization initiator such as benzophenone and thioxanthone, and an ethylenically unsaturated bond. Photo-radical polymerization type resist or composition containing a monomer,
Various negative photosensitive materials such as a cationic photopolymerization type composition in which a photocationic polymerization initiator such as an aromatic onium salt and an epoxy resin are blended can be used.

As the positive photosensitive compound, an NQD type resist obtained by adding naphthoquinonediazite as a photosensitive group to an alkali-soluble novolak resin, a dissolution inhibitor, a photoacid generator and the like added to an alkali-soluble novolak resin.
A positive resist of a main chain decomposition type such as a component type positive resist, PMMA, PMIPK (polymethyl isopropyl ketone) or the like can be used. More specifically, as the photosensitive compound used in the present invention, those commercially available under the following trade names are used, but are not limited thereto.

Negative type cinnamic acid-based resist KPR (manufactured by Kodak) TPR (manufactured by Tokyo Ohka) Cyclic rubber-based resist KMR (manufactured by Kodak) OMR, EPPR (manufactured by Tokyo Ohka) Photo-radical polymerization resist BMR, OSPR (manufactured by Tokyo Ohka) Made) Liston (made by DuPont) (dry film)

Positive NQD resist OFPR (Tokyo Ohka) AZ (Hoechst)

The water-repellent / oil-repellent compound for obtaining water / oil repellency has a surface tension of 2.5 × 10 ^-2 [N / m] or less when the compound is a liquid. In the case of,
A compound having a critical surface tension of 2.5 × 10 ⁻² [N / m] or less is preferably used. More specifically, a fluorine-based surfactant having a perfluoroalkyl group or a polyfluoroalkyl group in the molecule, or a fluorine-containing polymer compound is suitably used.

On the other hand, if the water-repellent / oil-repellent compound is added in too large an amount, it will not be easily mixed with the photosensitive compound and will not only be incompatible, but will also extremely reduce the adhesion to the substrate. Developing becomes impossible. Conversely, if the addition amount is too small, the effect of water repellency and oil repellency is so small that differentiation by wettability cannot be achieved. Therefore, the amount of the water / oil repellent compound added to the photosensitive compound is 0.001 wt.
% To 2.0 wt% is preferably used. Examples of the water- and oil-repellent compounds of the present invention are described in more detail below, but are not limited thereto.

Fluorosurfactant Fluorard FC-430 (γ _L = 1.93 × 10 ^-2 N / m) FC-171 (γ _L = 2.00 × 10 ^-2 N / m) FC-170C (γ _L = 1.91 × 10 ⁻² N / m) (all manufactured by Sumitomo 3M) F-Top EF-122B (γ _L = 2.06 × 10 ⁻² N / m) EF-802 (γ _L = 2.06 × 10 ^-2 N / m) (Mitsubishi Metals)

Fluorine-containing polymer compound Modiva F-110 (γ _C = 1.32 × 10 ^-2 N / m) F-210 (γ _C = 1.34 × 10 ^-2 N / m) (all manufactured by NOF Corporation) ) Fluorard FC-725 (γ _C = 1.38 × 10 ^-2 N / m) (Sumitomo 3M)

For forming the photosensitive compound layer containing the water / oil repellent compound described above, it is possible to use a coating method such as spin coating, roll coating, bar coating, spray coating, dip coating and the like. However, there is no particular limitation.

Next, the water-repellent and
In order to obtain a greater contrast between the oil-repellent relief image and the wettability on the light transmitting portion, heat energy is applied to cause the water-repellent / oil-repellent compound in the relief image to bleed to the surface (FIG. 1 (e)). ).

Next, R, G, B using ink jet
Are colored (FIG. 1 (f)), and the ink is dried if necessary. As the ink used for coloring, both dye-based ink and pigment-based ink can be used. Also,
For the purpose of improving the fixing property of the ink, an ink-absorbing resin layer may be provided in advance at the colored portion. As the ink-absorbing resin, polyvinyl alcohol, polyvinylpyrrolidone, cellulose derivatives such as hydroxypropylcellulose, water-soluble acrylic resins and the like are preferably used,
It can be formed in a matrix at the colored portion or on the entire surface of the substrate. Further, as the ink jet, a bubble jet type using an electrothermal converter as an energy generating element, a piezo jet type using a power generating element, or the like can be used, and a coloring area and a coloring pattern can be arbitrarily set.

In order to improve the adhesion between the protective layer and the transparent electrode layer which are further laminated after the coloring of the ink, the presence of the water-repellent / oil-repellent compound hinders the removal. FIG. 1 (g1)). Further, the entire relief image remaining on the light-shielding portion may be peeled and washed (FIG. 1 (g)).
2)). Examples of the cleaning method include dry cleaning such as UV / O ₃ cleaning and plasma ashing, and wet cleaning in which the substrate is immersed in an organic solvent or alkali and peeled off or dissolved and removed using an external force such as ultrasonic waves or a shower as necessary. However, it is possible to wash and remove the water-repellent / oil-repellent compound by any of the methods.

Next, a protective layer is formed as needed (FIGS. 1 (h1) and (h2)). As the protective layer, an organic polymer material such as a photo-curing type, a thermosetting type, and a photo-thermosetting resin, an inorganic film formed by vapor deposition, sputtering or the like can be used. Any material can be used as long as it has an optical transparency and can withstand the subsequent transparent electrode forming process, alignment film forming process, and the like.

FIG. 2 shows a cross section of a TFT color liquid crystal panel incorporating a color filter according to the present invention. The mode is not limited to this example.

A color liquid crystal panel is generally formed by combining a color filter substrate and a counter substrate and sealing a liquid crystal compound. One substrate 2 of the liquid crystal panel
A TFT (not shown) and a transparent pixel electrode 22 are formed in a matrix inside 1. Also, the other substrate 2
A color filter in which RGB color materials are arranged at a position opposing the pixel electrode 22 is provided inside 1, and a transparent common electrode 21 (opposite electrode) is formed on one surface of the color filter. Further, an alignment film 25 is provided in the plane of both substrates 21.
25 are formed, and by rubbing this, liquid crystal molecules can be aligned in a certain direction.
A polarizing plate 24 is provided outside each glass substrate 21.
Is adhered, and the liquid crystal compound 26 fills the gap (about 2 to 5 μm) between the glass substrates 21. In addition, a combination of a fluorescent lamp (not shown) and a scattering plate (not shown) is generally used as the backlight, and the display is performed by making the liquid crystal compound function as an optical shutter that changes the transmittance of the backlight light. I do.

[0034]

【Example】

Example 1 On a glass substrate having a light-shielding portion formed thereon, a positive type water- and oil-repellent photosensitive compound prepared in the following composition ratio was formed to a film thickness of 1
It was spin-coated to a thickness of μm and prebaked on a hot plate at 100 ° C. for 90 seconds.

Positive type water / oil repellent photosensitive compound NQD type positive resist AZ6112 (manufactured by Hoechst) 20 g (internal solid content: 5.84 g) Fluorosurfactant Fluorard FC-430 (manufactured by Sumitomo 3M) 0.02 g ( (Solid content: 100%) Water / oil repellent addition rate during drying 0.02 * 100 (5.84 + 0.02) = 0.34 wt%

Subsequently, 120 mJ / cm ² (at 365 nm) from the back surface of the substrate using the light-shielding portion as a photomask.
Pattern exposure, followed by AZ300MIF (A
(Organic alkali developer for Z) to form a water-repellent and oil-repellent relief image on the light-shielding portion.

Thereafter, heat of 90 ° C. was further applied for 30 minutes to sufficiently bleed the fluorine-containing surfactant on the surface of the relief image.

Next, the R, G, and B matrix patterns were colored with a pigment ink using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. In order to further form a protective layer, the water-repellent and oil-repellent relief image is washed, peeled off using an AZ remover (an AZ remover).
Dried. As the protective layer, a two-component thermosetting resin SS-
7625 (manufactured by JSR) was spin-coated so as to have a film thickness of 1 μm, and thermally cured at 230 ° C. for 1 hour.

When the color filter for liquid crystal thus produced was observed with an optical microscope, the distance between pixels and
No color mixture was observed between the pixel and the light-shielding portion. The unevenness of the surface of the protective layer was measured to be 0.05 μm.

Example 2 A negative type water- and oil-repellent photosensitive compound having the following composition was prepared on a glass substrate having a light-shielding portion formed thereon.
It was spin-coated to a thickness of μm.

Negative water- and oil-repellent photosensitive compound alicyclic epoxy resin Celloxide 2021 (manufactured by Daicel) 20 g photocationic polymerization initiator Adeka Optomer SP150 (manufactured by Adeka) 0.8 g Fluorosurfactant Fluorard FC-430 (manufactured by Sumitomo 3M) 0.04 g (solid content 100%) Addition rate of water / oil repellent when dried 0.04 * 100 / (20 + 0. 04) = 0.20%

Subsequently, through a photomask having a light-transmitting portion slightly narrower than the width of the light-shielding portion, pattern exposure was performed from the surface side of the substrate at an exposure amount of 5000 mJ / cm ² (at 365 nm), followed by cyclohexanone. Development was performed to form a water-repellent and oil-repellent relief image on the light-shielding portion.
Thereafter, heat of 120 ° C. was further applied for 30 minutes to sufficiently bleed the fluorine-containing surfactant on the surface of the relief image.

Next, the R, G, and B matrix patterns were colored with a pigment ink using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. Further, in order to form a protective layer, the fluorine-containing surfactant in the water-repellent and oil-repellent relief image was removed and washed with UV / O ₃ . As the protective layer, a two-component thermosetting resin SS-762
5 (manufactured by JSR) was spin-coated so as to have a film thickness of 2 μm, and was thermally cured at 230 ° C. for 1 hour. Observation of the thus prepared liquid crystal color filter with an optical microscope showed that no color mixture was observed between the pixels or between the pixels and the light-shielding portion.

Example 3 An ink-absorbing resin composition comprising hydroxypropylcellulose and methylolmelamine was spin-coated on a glass substrate having a light-shielding portion so as to have a thickness of 1 μm, and heated at 90 ° C. for 10 minutes. This was performed to form an ink absorbing layer. Subsequently, a negative water- and oil-repellent photosensitive compound prepared in the following composition ratio was spin-coated so as to have a film thickness of 15 μm, and prebaked at 80 ° C. for 30 minutes.

Negative resist BMR C-1000 (manufactured by Tokyo Ohka) 20 g (solid content: 40%) (solid content: 8.00 g) Fluorine-based surface treatment agent Modiper F-210 (manufactured by NOF Corporation) (solid content: 0.02 g) (The solvent component is pumped up.) Addition rate of water / oil repellent during drying 0.02 * 100 / (8 + 0.02) = 0.25 wt%

Subsequently, through a photomask having a light-transmitting portion slightly narrower than the width of the light-shielding portion, pattern exposure is performed from the surface side of the substrate at an exposure amount of 300 mJ / cm ² (at 365 nm), followed by a BMR developer. Development was performed using SK-4 to form a water-repellent and oil-repellent relief image on the light-shielding portion.

Next, the R, G, and B matrix patterns were colored with a pigment ink using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. Further, in order to form a protective layer, a water-repellent and oil-repellent relief image was peeled, washed and dried using a BMR peeling liquid EG. As the protective layer, a two-component thermosetting resin SS-762
5 (manufactured by JSR) was spin-coated so as to have a film thickness of 1 μm, and thermally cured at 230 ° C. for 1 hour. Observation of the thus prepared liquid crystal color filter with an optical microscope showed that no color mixture was observed between the pixels or between the pixels and the light-shielding portion.

Example 4 A positive type water-repellent / oil-repellent photosensitive compound prepared at the following composition ratio was coated on a glass substrate having a light-shielding portion formed thereon.
Spin coating was performed to a thickness of 0 μm, and prebaking was performed on a hot plate at 110 ° C. for 4 minutes.

Positive resist PMER P-AR900 (manufactured by Tokyo Ohka) 20 g (solid content 40%) (solid content 8.00 g) Fluorine-based surface treatment agent Modiper F-110 (manufactured by NOF Corporation) Solid content 0.01 g ( The solvent component is pumped up) Addition rate of water / oil repellent during drying 0.01 * 100 / (8 + 0.01) = 0.12 wt%

Subsequently, the light-shielding portion is used as a photomask.
500mJ / cm from the back of the substrate ^Two (At365n
m) pattern exposure at the exposure amount, followed by PMER developer P
Develop at -6G and apply water and oil repellent
A leaf image was formed.

Next, the R, G, and B matrix patterns were colored with a pigment ink using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. In order to further form a protective layer, the water-repellent and oil-repellent relief image was peeled, washed and dried using a PMER peeling liquid PS. As the protective layer, a two-component thermosetting resin SS-762
5 (manufactured by JSR) was spin-coated so as to have a film thickness of 1 μm, and thermally cured at 230 ° C. for 1 hour. Observation of the thus prepared liquid crystal color filter with an optical microscope showed that no color mixture was observed between the pixels or between the pixels and the light-shielding portion.

Comparative Example 1 An R, G, B matrix pattern was colored with a pigment ink on a glass substrate on which a light-shielding portion was formed using an ink jet recording apparatus, and the ink was dried at 90 ° C. for 5 minutes. Further, as a protective layer, a two-component thermosetting resin SS-7625 (manufactured by JSR) was spin-coated so as to have a film thickness of 1 μm, and was thermoset at 230 ° C. for 1 hour.
When the thus prepared color filter for liquid crystal was observed with an optical microscope, mixed colors were observed.

Comparative Example 2 An ink-absorbing resin composition comprising hydroxypropylcellulose and methylolmelamine was spin-coated on a glass substrate having a light-shielding portion so as to have a thickness of 1 μm, and heated at 90 ° C. for 10 minutes. This was performed to form an ink absorbing layer. Subsequently, R, G, and B matrix patterns were colored on the glass substrate with a pigment ink using an ink jet recording apparatus, and then the ink was dried at 90 ° C. for 5 minutes. Further, a two-component thermosetting resin S is used as a protective layer.
S-7625 (manufactured by JSR) was spin-coated so as to have a film thickness of 1 μm, and thermally cured at 230 ° C. for 1 hour. When the thus prepared color filter for liquid crystal was observed with an optical microscope, mixed colors were observed.

[Evaluation] In addition to the above Examples and Comparative Examples, wettability on the surface of the water-repellent / oil-repellent photosensitive compound, the surface of the glass substrate, and the surface of the ink-absorbent resin composition used in Examples 1-4. Table 1 shows the results of the evaluation of the difference between the above and the contact angles of water and the pigment ink used in each example.

[0055]

[Table 1]

[0056]

By employing the method for manufacturing a color filter for liquid crystal according to the present invention, a highly reliable color filter for liquid crystal without color mixing can be manufactured at lower cost.

[Brief description of the drawings]

1 (a) to 1 (h2) are cross-sectional views showing steps of a method for manufacturing a color filter for liquid crystal according to the present invention.

FIG. 2 is a sectional view showing an example of the liquid crystal panel of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Light-shielding part (black matrix) 2 Substrate 3 Photosensitive compound layer 4 Photomask 5 Water- and oil-repellent photosensitive compound relief image 6 Water- and oil-repellent functional group (polyfluoroalkyl group or perfluoroalkyl group) 7 Ink jet Head 8 protective layer 21 glass substrate 22 pixel electrode 23 light-shielding portion (black matrix) 24 polarizing plate 25 alignment film 26 liquid crystal compound 27 common electrode 28 protective layer 29 ink

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kenichi Iwata 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc.

Claims (9)

[Claims] 1. A surface tension or a critical surface tension of 2.5 × on a light-shielding portion on a light-transmitting substrate on which a light-shielding portion is formed.
After forming a photosensitive compound layer containing a water-repellent / oil-repellent compound of 10 ^-2 [N / m] or less by photolithography, a colorant is arranged on a light-transmitting portion by discharging ink using an inkjet recording apparatus. A method for producing a color filter for liquid crystal, characterized by comprising: 2. The liquid crystal color filter according to claim 1, wherein the water-repellent / oil-repellent compound is a fluorosurfactant containing a perfluoroalkyl group or a polyfluoroalkyl group, or a fluorine-containing polymer compound. Manufacturing method. 3. The content of the water / oil repellent compound is as follows:
The amount is not less than 0.001 wt% and less than 2.0 wt%.
3. The method for producing a color filter for liquid crystal according to any one of Items 1 to 2. 4. The relief of a photosensitive compound, wherein the photosensitive compound is a positive-type photosensitive compound and is exposed from the back surface of the substrate using a light-shielding portion as a mask, and the water- and oil-repellent compound is contained only in the light-shielding portion. The color filter for a liquid crystal according to any one of claims 1 to 3, wherein development is performed so that an image remains, and thereafter, a colorant is arranged in a light transmitting portion by discharging ink using an ink jet recording apparatus. Production method. 5. The method for producing a color filter for liquid crystal according to claim 1, wherein the photosensitive compound is a negative photosensitive compound. 6. A coloring step using an ink jet recording apparatus after applying a heat energy to the photosensitive compound layer to form a water-repellent / oil-repellent compound on a surface thereof. Any one of 5
13. The method for producing a color filter for liquid crystal according to item 9. 7. The method for producing a color filter for a liquid crystal according to claim 1, wherein the water-repellent / oil-repellent compound is washed and removed after the arrangement of the colorant. 8. A color filter for a liquid crystal produced by the above method. 9. A liquid crystal panel having a substrate facing the color filter according to claim 8, and having a structure in which a liquid crystal compound is sealed between both substrates.