JPH10165769A - Denitrification device - Google Patents

Denitrification device

Info

Publication number
JPH10165769A
JPH10165769A JP8330822A JP33082296A JPH10165769A JP H10165769 A JPH10165769 A JP H10165769A JP 8330822 A JP8330822 A JP 8330822A JP 33082296 A JP33082296 A JP 33082296A JP H10165769 A JPH10165769 A JP H10165769A
Authority
JP
Japan
Prior art keywords
gas
reducing agent
rectifying
injection device
denitration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8330822A
Other languages
Japanese (ja)
Inventor
Tomoyuki Konishi
智之 小西
Toshimichi Wada
敏通 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Power Ltd
Original Assignee
Babcock Hitachi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Babcock Hitachi KK filed Critical Babcock Hitachi KK
Priority to JP8330822A priority Critical patent/JPH10165769A/en
Publication of JPH10165769A publication Critical patent/JPH10165769A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Chimneys And Flues (AREA)
  • Treating Waste Gases (AREA)

Abstract

PROBLEM TO BE SOLVED: To shorten the mixing distance and the rectifying distance, provide the compactness and prevent the lowering of denitrification performance. SOLUTION: A reducing agent injection device 2 is disposed on the upstream of a denitrification reactor 4 with a built-in catalyst layer 5, and a reducing agent injected from the reducer injection device 2 is reacted with nitrogen oxide in exhaust gas in a denitration device, and rectifying lattices 3 and 30 for dividing the gas flow direction are disposed between the reducing agent injection device 2 and the catalyst layer 5, and gas mixing accelerators 9 and 10 for mixing gas with the reducing agent are provided in at least one division 3A of the rectifying lattices 3 and 30.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、排ガスと還元剤と
の混合に係り、特に整流格子の各区域内にガス混合促進
体を設けた脱硝装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the mixing of exhaust gas and a reducing agent, and more particularly to a denitration apparatus provided with a gas mixing accelerator in each section of a rectifying grid.

【0002】[0002]

【従来の技術】最近の火力発電プラントにおいては、立
地条件等の制約から限られたスペース内に可能な限り大
出力の火力発電プラントを設置する傾向があるため、プ
ラントもコンパクトな配置にすることが要求されてい
る。そして脱硝装置は、一例として図6に示すように、
触媒層5を内蔵した脱硝反応器4の上流に還元剤注入装
置2を配置し、還元剤注入装置2より注入した還元剤を
排ガス中の窒素酸化物と反応させる構成である。前記の
ようなニーズに対して、排煙脱硝装置の配置設計上考慮
すべき事項は、第1点として脱硝性能確保のため、還元
剤として注入されたアンモニアガスが触媒層までの間で
排ガスと十分混合することが要求され、必要に応じて混
合距離を設ける必要がある。第2点として触媒層でのガ
ス流速は、通風損失を低くおさえること、またばいじん
を含む排ガスの場合、ダストによる触媒層の摩耗防止を
図る必要があること等から、通常煙道内ガス流速の1/
2〜1/3程度に低くした設計としている。
2. Description of the Related Art In recent thermal power plants, there is a tendency to install a thermal power plant with the highest possible output in a limited space due to restrictions on location conditions and the like. Is required. Then, the denitration device is, as shown in FIG. 6 as an example,
The configuration is such that a reducing agent injection device 2 is disposed upstream of a denitration reactor 4 having a built-in catalyst layer 5, and the reducing agent injected from the reducing agent injection device 2 reacts with nitrogen oxides in exhaust gas. In order to meet the above-mentioned needs, the matter to be considered in the layout design of the flue gas denitration equipment is that, as the first point, in order to secure the denitration performance, the ammonia gas injected as the reducing agent is mixed with the exhaust gas up to the catalyst layer. Sufficient mixing is required, and it is necessary to provide a mixing distance as needed. The second point is that the gas flow velocity in the catalyst layer is usually 1% of the gas flow velocity in the flue because it is necessary to reduce ventilation loss and, in the case of exhaust gas containing dust, it is necessary to prevent the catalyst layer from being worn by dust. /
The design is reduced to about 2/3.

【0003】そのため人口ダクトと脱硝反応器の流路断
面積が異なることから入口ダクトで形状変化することが
必要となる。この入口ダクトの形状変化のため脱硝反応
器に流入するガス流れに偏流が生じると、脱硝性能の低
下あるいは偏流に起因する触媒層へのダストの堆積等が
問題となる。通常、この偏流を防止するため整流機構を
設けるほか、入口ダクトの配置上からもある程度整流化
するための直線部を設けるダクト配置にする必要があ
る。第3点として、ダクト内に偏流がある場所でアンモ
ニアガスを注入すると、注入後のアンモニアガスと排ガ
スとの混合割合にばらつきを生じて脱硝率が低下するた
め、アンモニアガス注入は整流された場所で行う必要が
ある。以上を考慮して配置すると、プラントのコンパク
ト配置として要求される前記事項に相反することにな
る。しかし実際の装置設計に対してはこれらの課題をク
リアした設備とすることが強く求められる。
[0003] Therefore, since the artificial duct and the denitration reactor have different flow passage cross-sectional areas, it is necessary to change the shape at the inlet duct. If the gas flow flowing into the denitration reactor is deviated due to the change in the shape of the inlet duct, denitration performance is reduced, or dust accumulates on the catalyst layer due to the deviated flow. Usually, in addition to providing a rectifying mechanism to prevent this drift, it is necessary to adopt a duct arrangement in which a straight portion for rectifying to some extent is provided from the arrangement of the inlet duct. Third, if ammonia gas is injected in a place where there is a drift in the duct, the mixing ratio between the injected ammonia gas and the exhaust gas will vary and the denitration rate will decrease. Must be done in When the arrangement is made in consideration of the above, the above-mentioned matter required for the compact arrangement of the plant is contradictory. However, it is strongly required that equipment that meets these issues be designed for actual equipment design.

【0004】次に従来の脱硝装置の設計概要について説
明する。図6に上流機器1と下流機器11との間の設置
スペースHに脱硝装置を設置する配置を示している。脱
硝剤注入装置(アンモニア注入装置)2より必要な混合
距離L2を経た位置に触媒層5を設置する配置を示して
いる。従って脱硝装置として必要なスペースは混合距離
2により事実上決定されることになる。図7は上流機
器1と脱硝反応器4との間に入口ダクト13に形状変化
がある場合を示す。この配置に対しては脱硝反応器4に
できるだけ均一に排ガスが流入するように整流板7を内
設することが必要となる。さらに整流板7を内設したこ
とによる局部的なガス流れの乱れが、触媒層5に影響を
与えないようにするため、整流板7の下流側に整流部h
を設ける必要がある。このようなことから上流機器1と
脱硝反応器4との間に必要な混合距離L2と整流部hと
を考慮した配置が必要となる。
Next, an outline of the design of a conventional denitration apparatus will be described. FIG. 6 shows an arrangement in which a denitration device is installed in an installation space H between the upstream device 1 and the downstream device 11. Shows an arrangement for installing the catalyst layer 5 in the denitration agent injection device (ammonia injection unit) position through the mixing distance L 2 required than 2. Thus the required space as denitration apparatus will be effectively determined by the mixing distance L 2. FIG. 7 shows a case where the inlet duct 13 has a shape change between the upstream device 1 and the denitration reactor 4. For this arrangement, it is necessary to install the flow straightening plate 7 so that the exhaust gas flows into the denitration reactor 4 as uniformly as possible. Further, in order to prevent a local gas flow turbulence due to the provision of the rectifying plate 7 from affecting the catalyst layer 5, a rectifying portion h is provided downstream of the rectifying plate 7.
It is necessary to provide. It is necessary to place in consideration of the mixing distance L 2 and rectifier h required between the upstream equipment 1 and the denitration reactor 4 from this.

【0005】図8及び図9は、アンモニア注入装置2の
上流側の入口ダクト14に中心間距離Wの曲がり部があ
る場合を示す。この場合は内部に整流板8を設置し、さ
らにその整流板8の下流に整流板8によって生じた局部
的なガス乱れを整流するための整流距離L1を確保し排
ガスの整流を行っている。このように排ガスが整流され
た場所にアンモニア注入装置2を設けることにより、ア
ンモニアガス注入後の排ガス中のアンモニア濃度のばら
つきを極力小さくしている。さらにアンモニア注入装置
2と触媒層5との間に必要な混合距離L2を確保し、排
ガス中のアンモニア濃度のばらつきに起因する脱硝率の
低下防止を図った配置が必要となる。さらに脱硝反応器
4に流入する排ガスの偏流による脱硝性能の低下及び排
ガスの偏流に起因するダスト堆積を防止するため、図8
では円弧型整流板12を設けて脱硝反応器4内に流入す
るガス流れを整流するようにしている。
FIGS. 8 and 9 show a case where the inlet duct 14 on the upstream side of the ammonia injector 2 has a bent portion having a center-to-center distance W. FIG. In this case, installing the rectifying plate 8 in the interior, is further subjected to rectification to ensure rectifying distance L 1 for rectifying a localized gas turbulence generated by the rectifying plate 8 downstream of the rectifying plate 8 gas . By providing the ammonia injection device 2 in a place where the exhaust gas is rectified in this way, variations in the ammonia concentration in the exhaust gas after the injection of the ammonia gas are minimized. Further to secure the mixing distance L 2 required between the ammonia injection apparatus 2 and the catalyst layer 5, is disposed which aimed at preventing deterioration of the denitration rate due to variations in the concentration of ammonia in the exhaust gas is required. Further, in order to prevent the denitration performance from deteriorating due to the drift of the exhaust gas flowing into the denitration reactor 4 and to prevent dust accumulation due to the drift of the exhaust gas, FIG.
In the above, an arc-shaped rectifying plate 12 is provided to rectify the gas flow flowing into the denitration reactor 4.

【0006】しかし、この円弧型整流板12による局部
的なガス乱れを考慮し、その下流側に整流部hを確保す
る必要があるため、図9に示すように円弧型整流板12
に変えて格子23を設け整流部hを小さくする等の対策
を行っている。いずれにしても整流距離 L1、混合距
離L2及び整流部h等を考慮した設計とする必要があ
る。
However, in consideration of local gas turbulence due to the arc-type current plate 12, it is necessary to secure a rectification portion h downstream of the gas-type current plate. Therefore, as shown in FIG.
In place of this, measures such as providing a lattice 23 to reduce the rectifying portion h are taken. Rectification Anyway distance L 1, is required to be taken into consideration designed mixing distance L 2 and the rectifying section h, etc..

【0007】[0007]

【発明が解決しようとする課題】従来の脱硝装置にあっ
ては、上流側で注入された還元剤と排ガスとの混合及び
脱硝反応器に流入する排ガスの整流について考慮するた
め、脱硝剤注入装置と脱硝反応器との間の距離を長くす
る必要があり、コンパクトな配置設計が困難という問題
があった。仮に脱硝剤注入装置より脱硝反応器までの間
に十分な距離を確保できない場合、ガス偏流あるいは還
元剤と排ガスの混合不十分等に起因する脱硝性能の低下
を招くという問題があった。
In a conventional denitration device, a denitration agent injection device is used in order to consider mixing of a reducing agent and exhaust gas injected upstream and rectification of exhaust gas flowing into a denitration reactor. There is a problem that it is necessary to increase the distance between the reactor and the denitration reactor, and it is difficult to design a compact arrangement. If a sufficient distance cannot be ensured from the denitration agent injection device to the denitration reactor, there is a problem that the denitration performance is reduced due to gas drift or insufficient mixing of the reducing agent and the exhaust gas.

【0008】本発明の課題は、混合距離と整流距離とを
短くし、コンパクトでかつ脱硝性能の低下を防止するこ
とのできる脱硝装置を提供することにある。
An object of the present invention is to provide a denitration apparatus which can shorten the mixing distance and the rectification distance, is compact, and can prevent a decrease in denitration performance.

【0009】[0009]

【課題を解決するための手段】前記の課題を達成するた
め、本発明に係る脱硝装置は、触媒層を内蔵した脱硝反
応器の上流に還元剤注入装置を配置し、還元剤注入装置
より注入した還元剤を排ガス中の窒素酸化物と反応させ
る脱硝装置において、還元剤注入装置と触媒層との間に
ガス流れ方向を仕切る整流格子を配置し、整流格子の少
なくとも一つの区域内に排ガスと還元剤とのガス混合促
進体を設けた構成とする。
In order to achieve the above-mentioned object, a denitration apparatus according to the present invention has a reducing agent injection device arranged upstream of a denitration reactor having a built-in catalyst layer, and is injected from the reducing agent injection device. In a denitration device that reacts the reduced agent with nitrogen oxides in the exhaust gas, a rectifying grid that partitions the gas flow direction is arranged between the reducing agent injection device and the catalyst layer, and the exhaust gas and at least one section of the rectifying grid are disposed with the exhaust gas. A configuration is provided in which a gas mixing accelerator with a reducing agent is provided.

【0010】そして還元剤注入装置と触媒層との間に、
ガス流れ方向を仕切る整流格子を配置するとともに、整
流格子と還元剤注入装置との間に少なくとも一つの整流
板を設け、整流格子の少なくとも一つの区域内に排ガス
と還元剤とのガス混合促進体を設けた構成でもよい。
Then, between the reducing agent injection device and the catalyst layer,
A rectifying grid for partitioning the gas flow direction is provided, and at least one rectifying plate is provided between the rectifying grid and the reducing agent injection device, and a gas mixing promoter of the exhaust gas and the reducing agent is provided in at least one area of the rectifying grid. May be provided.

【0011】またガス混合促進体は、それぞれの区域を
仕切るそれぞれの仕切板に一端を固着されかつ他端をガ
ス流れ方向に傾けて交互に対向するように突設したガス
旋回体、又はそれぞれの区域のほぼ中央にガス流れと対
向するようにへ字状に屈設したガス撹拌体である構成で
もよい。
Further, the gas mixing promoting body has one end fixed to each partition plate for partitioning each section, and the other end is inclined in the gas flow direction and protrudes so as to be alternately opposed to each other. The gas agitating body may be bent substantially in the shape of a letter at substantially the center of the area so as to face the gas flow.

【0012】さらに還元剤注入装置は、複数の注入ノズ
ルを備え、それぞれの注入ノズルは、整流格子のそれぞ
れの区域に対向するように配設されている構成でもよ
い。
Further, the reducing agent injection device may include a plurality of injection nozzles, and each injection nozzle may be disposed so as to face each area of the rectifying grid.

【0013】本発明によれば、適切な位置にガス流れを
仕切るように仕切板の集合体である整流格子を設け、そ
の各区域内にガス混合促進体を設けたため、混合効果と
触媒層に流入するガスの整流効果とが兼ね備えられ、還
元剤と排ガスとの混合距離が短くなる。
According to the present invention, a rectifying grid, which is an aggregate of partition plates, is provided at an appropriate position to partition a gas flow, and a gas mixing promoting body is provided in each area thereof. The rectifying effect of the inflowing gas is also provided, and the mixing distance between the reducing agent and the exhaust gas is shortened.

【0014】さらに還元剤注入を整流格子の各区域内に
所定量行うことにより、整流格子後では広いダクト内の
空間全域に渡って還元剤と排ガスとの混合比率がより均
一になる。また混合機能を有するガス旋回体又はガス撹
拌体を内蔵した整流格子は、通風抵抗が大きくなる分、
各区域に流入する排ガスの偏流が抑制される。
Further, by injecting a predetermined amount of the reducing agent into each area of the rectifying grid, after the rectifying grid, the mixing ratio of the reducing agent and the exhaust gas becomes more uniform over the entire space in the wide duct. In addition, the rectifying grid having a built-in gas swirling body or gas stirring body having a mixing function, the ventilation resistance increases,
The drift of the exhaust gas flowing into each section is suppressed.

【0015】[0015]

【発明の実施の形態】本発明の実施の形態を図1〜図3
を参照しながら説明する。図1〜図3に示すように、触
媒層5を内蔵した脱硝反応器4の上流に還元剤注入装置
2を配置し、還元剤注入装置(アンモニア注入装置)2
より注入した還元剤を排ガス中の窒素酸化物と反応させ
る脱硝装置であって、還元剤注入装置2と触媒層5との
間にガス流れ方向を仕切る整流格子3,30を配置し、
整流格子3,30の少なくとも一つの区域3A内に排ガ
スと還元剤とのガス混合促進体9,10を設けた構成と
する。
1 to 3 show an embodiment of the present invention.
This will be described with reference to FIG. As shown in FIGS. 1 to 3, a reducing agent injection device 2 is disposed upstream of a denitration reactor 4 containing a catalyst layer 5, and a reducing agent injection device (ammonia injection device) 2
A denitration device for reacting the more injected reducing agent with nitrogen oxides in the exhaust gas, wherein rectifying grids 3, 30 for dividing a gas flow direction are arranged between the reducing agent injection device 2 and the catalyst layer 5,
A structure is provided in which at least one section 3A of the rectifying grids 3, 30 is provided with a gas mixing accelerator 9, 10 of exhaust gas and a reducing agent.

【0016】そしてガス混合促進体9,10は、それぞ
れの区域3Aを仕切るそれぞれの仕切板3Bに一端を固
着されかつ他端をガス流れ方向に傾けて交互に対向する
ように突設されたガス旋回体(ガス旋回板)9、又はそ
れぞれの区域3Aのほぼ中央にガス流れと対向するよう
にへ字状に屈設されたガス撹拌体(ガス撹拌板)10で
あるものとし、還元剤注入装置2は、複数の注入ノズル
2Aを備え、それぞれの注入ノズル2Aは、整流格子3
のそれぞれの区域3Aに対向するように配設されてい
る。
The gas mixing accelerators 9 and 10 have one end fixed to each partition plate 3B for partitioning the respective sections 3A, and the other end is inclined in the gas flow direction so as to protrude alternately. A revolving body (gas revolving plate) 9 or a gas agitating body (gas agitating plate) 10 which is bent approximately in the center of each of the sections 3A so as to face the gas flow, and is injected with a reducing agent The apparatus 2 includes a plurality of injection nozzles 2A, and each injection nozzle 2A is provided with a rectifying grid 3A.
Are disposed so as to face the respective sections 3A.

【0017】すなわち上流機器1の下流に還元剤注入装
置2を設け、その下流にガス旋回板9又はガス撹拌板1
0を内蔵した整流格子3,30を設けている。図2は整
流格子3内にガス旋回板9を設けて整流格子3内でガス
が蛇行して旋回流が発生するようにし、排ガスと還元剤
であるアンモニアガスとの混合を促進するようにしたも
のである。図3は整流格子30内にガス流路抵抗体であ
るへ字状に屈曲したガス撹拌板10を設け、ガス流路抵
抗体の下流で発生するカルマン渦により、排ガスとアン
モニアガスとの混合促進を図るようにしたものである。
つまりガス撹拌板10を内蔵した整流格子30内に、各
区域3Aの流路断面積に比例するようにアンモニアガス
量を調整し注入することにより、その出口ダクト6側に
おいては十分にガス混合された状態になるため、その下
流にある触媒層5で所定の脱硝性能を発揮できる状態と
なる。例えば、アンモニアガス注入後にガス混合のため
にパイプ等を設置した場合、パイプによるガス流れの乱
れにより混合効果が促進され同じ混合効果を得るのに必
要な混合距離は約1/2程度に大幅に短縮できる。
That is, the reducing agent injection device 2 is provided downstream of the upstream equipment 1, and the gas swirling plate 9 or the gas stirring plate 1 is provided downstream thereof.
Rectifying gratings 3 and 30 containing 0 are provided. In FIG. 2, a gas swirl plate 9 is provided in the rectifying grid 3 so that the gas meanders in the rectifying grid 3 to generate a swirling flow, thereby promoting the mixing of the exhaust gas and the ammonia gas as a reducing agent. Things. FIG. 3 shows a gas stirrer plate 10 which is a gas flow path resistor and is bent in the shape of a letter in a rectifying grid 30, and the mixing of exhaust gas and ammonia gas is promoted by Karman vortices generated downstream of the gas flow path resistor. It is intended to be.
That is, by adjusting and injecting the amount of ammonia gas into the rectifying grid 30 in which the gas stirring plate 10 is incorporated so as to be proportional to the cross-sectional area of each section 3A, the gas is sufficiently mixed at the outlet duct 6 side. As a result, the catalyst layer 5 located downstream thereof can exhibit a predetermined denitration performance. For example, if a pipe or the like is installed for gas mixing after ammonia gas injection, the mixing effect is promoted by the turbulence of the gas flow by the pipe, and the mixing distance required to obtain the same mixing effect is greatly reduced to about 1/2. Can be shortened.

【0018】さらに、アンモニア注入装置2のアンモニ
アガス吹き出し用の注入ノズル2Aの取付位置は、仕切
板3Bで仕切られた区域3Aに対向する位置に設けるよ
うにすることにより、区域3A内に注入されるアンモニ
ア量は、同じ区域3A内に流入する排ガス量と混合する
ことになる。
Further, the mounting position of the injection nozzle 2A for blowing out the ammonia gas of the ammonia injection device 2 is provided at a position opposed to the area 3A partitioned by the partition plate 3B, so that the ammonia gas is injected into the area 3A. The ammonia amount mixed with the exhaust gas amount flowing into the same area 3A.

【0019】また流入する排ガスの偏流抑制を図るた
め、区域3Aの占める断面積割合に見合った量が流入す
るようにガイドベーン等、例えば図4に示す整流板7で
調整されるため、ダクト内の全流路断面積に対して排ガ
ス量とアンモニア量との比率をほぼ一定に行うことが可
能となる。
In order to suppress the drifting of the inflowing exhaust gas, an amount corresponding to the cross-sectional area ratio occupied by the area 3A is adjusted by a guide vane or the like, for example, the rectifying plate 7 shown in FIG. It is possible to make the ratio between the amount of exhaust gas and the amount of ammonia almost constant with respect to the entire flow path cross-sectional area.

【0020】以上のように、ガス混合促進体を内蔵した
整流格子と、その整流格子の仕切板で仕切られた区域に
対向するように注入ノズルを配設することにより、従来
技術に比べて混合距離の短縮が図られ、ダクト内全域で
アンモニアガスと排ガスとの比率をより均一に、かつ十
分に混合した状態で排ガスを脱硝反応器に導入すること
ができる。
As described above, by arranging the rectifying grid including the gas mixing promoting body and the injection nozzle so as to face the area partitioned by the partition plate of the rectifying grid, the mixing is improved as compared with the prior art. The distance can be shortened, and the exhaust gas can be introduced into the denitration reactor in a state where the ratio of the ammonia gas and the exhaust gas is more uniformly and sufficiently mixed in the entire area of the duct.

【0021】本実施の形態によれば、適切な位置にガス
流れを仕切るように仕切板の集合体である整流格子を設
け、その整流格子内にガス混合促進体を設けたため、混
合効果と触媒層に流入するガスの整流効果とが兼ね備え
られ、還元剤と排ガスとの混合距離が短くなる。さらに
還元剤注入を整流格子の仕切られた各区域内に所定量行
うことにより、整流格子後では広い煙道内の空間全域に
渡ってアンモニアガスと排ガスとの混合比率をより均一
にできるため、従来の方法と比較し脱硝性能の向上を図
ることができる。また混合機能を有するガス混合促進体
を内蔵した整流格子は、通風抵抗が大きくなる分、各区
域に流入するガスの偏流抑制効果も期待できる。
According to the present embodiment, a rectifying grid, which is an aggregate of partition plates, is provided at an appropriate position to partition a gas flow, and a gas mixing promoting body is provided in the rectifying grid. The rectifying effect of the gas flowing into the bed is also provided, and the mixing distance between the reducing agent and the exhaust gas is shortened. In addition, by injecting a predetermined amount of reducing agent into each section of the rectifying grid, after mixing the rectifying grid, the mixing ratio of ammonia gas and exhaust gas can be made more uniform over the entire area of the wide flue, The denitration performance can be improved as compared with the above method. In addition, the rectifying grid having a built-in gas mixing accelerator having a mixing function can be expected to have an effect of suppressing the drift of the gas flowing into each area, since the ventilation resistance increases.

【0022】本発明の他の実施の形態を図4及び図5を
参照しながら図1〜図3に示す実施の形態と異なる点を
説明する。図4は上流機器1と脱硝反応器4との間のダ
クト13に形状変化がある場合を示す。この場合はダク
ト13内に整流板7を設け、整流板7の上流にアンモニ
ア注入装置2を配置するものとする。すなわちアンモニ
ア注入装置2と触媒層5との間に、ガス流れ方向を仕切
る整流格子3,30を配置するとともに、整流格子3,
30とアンモニア注入装置2との間に少なくとも一つの
整流板7を設け、整流格子3,30の一つ以上の区域3
A内に排ガスとアンモニアガスとのガス混合促進体を設
けた構成とする。
Another embodiment of the present invention will be described with reference to FIGS. 4 and 5 while referring to differences from the embodiment shown in FIGS. FIG. 4 shows a case where the duct 13 between the upstream device 1 and the denitration reactor 4 has a shape change. In this case, the current plate 7 is provided in the duct 13, and the ammonia injection device 2 is arranged upstream of the current plate 7. That is, between the ammonia injection device 2 and the catalyst layer 5, the rectifying grids 3, 30 that partition the gas flow direction are arranged, and the rectifying grids 3, 30 are arranged.
At least one rectifying plate 7 is provided between the rectifying grids 3 and 30 and at least one section 3 of the rectifying grid 3, 30.
A is provided with a gas mixing accelerator of exhaust gas and ammonia gas in A.

【0023】図5は入口のダクト14に90°ベンドが
ある場合である。整流格子3,30を設置することによ
り、混合距離L2の短縮を図ることができ、アンモニア
注入装置2を可能な限り脱硝反応器4に近い位置に設置
できるため、コンパクト配置が可能となる。これらの他
の実施の形態によっても前記とほぼ同様の作用、効果を
得ることができる。
FIG. 5 shows a case where the inlet duct 14 has a 90 ° bend. By installing the rectifying grating 3, 30, it is possible to shorten the mixing distance L 2, since that can be installed at a position close to unless denitration reactor 4 possible ammonia injection unit 2, it is possible to compact position. According to these other embodiments, substantially the same operation and effect as described above can be obtained.

【0024】[0024]

【発明の効果】本発明によれば、整流格子にガス混合促
進体を内蔵し、かつ整流格子の各区域に対向するように
還元剤の注入ノズルを配設したため、混合距離が短縮さ
れるとともに、ダクト内全域で還元剤と排ガスとの混合
比率がより均一になり、かつ十分に混合した状態で脱硝
反応器に導入されるため、脱硝効率が向上する効果があ
る。
According to the present invention, since the gas mixing promoting body is built in the rectifying grid and the reducing agent injection nozzle is disposed so as to face each section of the rectifying grid, the mixing distance is shortened. In addition, since the mixing ratio of the reducing agent and the exhaust gas becomes more uniform in the entire area in the duct and the mixture is introduced into the denitration reactor in a sufficiently mixed state, the denitration efficiency is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態を示す縦断面図である。FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention.

【図2】図1の整流格子を示す断面図である。FIG. 2 is a cross-sectional view illustrating the rectifying grating of FIG.

【図3】図1の他の整流格子を示す断面図である。FIG. 3 is a sectional view showing another rectifying grating of FIG. 1;

【図4】本発明の他の実施の形態を示す縦断面図であ
る。
FIG. 4 is a longitudinal sectional view showing another embodiment of the present invention.

【図5】本発明の他の実施の形態を示す縦断面図であ
る。
FIG. 5 is a longitudinal sectional view showing another embodiment of the present invention.

【図6】従来の技術を示す縦断面図である。FIG. 6 is a longitudinal sectional view showing a conventional technique.

【図7】従来の技術を示す縦断面図である。FIG. 7 is a longitudinal sectional view showing a conventional technique.

【図8】従来の技術を示す縦断面図である。FIG. 8 is a longitudinal sectional view showing a conventional technique.

【図9】従来の技術を示す縦断面図である。FIG. 9 is a vertical sectional view showing a conventional technique.

【符号の説明】[Explanation of symbols]

1 上流機器 2 還元剤注入装置 2A 注入ノズル 3,30 整流格子 3A 区域 3B 仕切板 4 脱硝反応器 5 触媒層 6 出口ダクト 7 整流板 8 整流板 9 ガス旋回板 10 ガス撹拌板 11 下流機器 13,14 入口ダクト DESCRIPTION OF SYMBOLS 1 Upstream apparatus 2 Reducing agent injection device 2A Injection nozzle 3, 30 Rectifier grid 3A area 3B Partition plate 4 Denitration reactor 5 Catalyst layer 6 Outlet duct 7 Rectifier plate 8 Rectifier plate 9 Gas swirl plate 10 Gas stirring plate 11 Downstream device 13, 14 Inlet duct

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 触媒層を内蔵した脱硝反応器の上流に還
元剤注入装置を配置し、該還元剤注入装置より注入した
還元剤を排ガス中の窒素酸化物と反応させる脱硝装置に
おいて、前記還元剤注入装置と前記触媒層との間にガス
流れ方向を仕切る整流格子を配置し、該整流格子の少な
くとも一つの区域内に前記排ガスと前記還元剤とのガス
混合促進体を設けたことを特徴とする脱硝装置。
1. A denitration apparatus in which a reducing agent injection device is arranged upstream of a denitration reactor having a built-in catalyst layer, and wherein a reducing agent injected from the reducing agent injection device reacts with nitrogen oxides in exhaust gas. A rectifying grid for partitioning a gas flow direction is disposed between an agent injection device and the catalyst layer, and a gas mixing accelerator of the exhaust gas and the reducing agent is provided in at least one area of the rectifying grid. Denitration equipment.
【請求項2】 還元剤注入装置と触媒層との間に、ガス
流れ方向を仕切る整流格子を配置するとともに、該整流
格子と前記還元剤注入装置との間に少なくとも一つの整
流板を設け、前記整流格子の少なくとも一つの区域内に
前記排ガスと前記還元剤とのガス混合促進体を設けたこ
とを特徴とする請求項1記載の脱硝装置。
2. A rectifying grid for partitioning a gas flow direction is disposed between the reducing agent injection device and the catalyst layer, and at least one rectifying plate is provided between the rectifying grid and the reducing agent injection device. The denitration apparatus according to claim 1, wherein a gas mixing accelerator of the exhaust gas and the reducing agent is provided in at least one section of the rectifying grid.
【請求項3】 ガス混合促進体は、それぞれの区域を仕
切るそれぞれの仕切板に一端を固着されかつ他端をガス
流れ方向に傾けて交互に対向するように突設したガス旋
回体、又はそれぞれの区域のほぼ中央にガス流れと対向
するようにへ字状に屈設したガス撹拌体であることを特
徴とする請求項1又は2記載の脱硝装置。
3. A gas swirling body having one end fixed to each partition plate for partitioning each section and having the other end projected in such a manner as to alternately face each other with the other end inclined in a gas flow direction. 3. A denitration apparatus according to claim 1, wherein the gas agitator is bent substantially in the shape of a letter so as to face the gas flow substantially at the center of the section.
【請求項4】 還元剤注入装置は、複数の注入ノズルを
備え、それぞれの注入ノズルは、整流格子のそれぞれの
区域に対向するように配設されていることを特徴とする
請求項1、2又は3記載の脱硝装置。
4. The reducing agent injection device according to claim 1, further comprising a plurality of injection nozzles, each injection nozzle being disposed so as to oppose each area of the rectifying grid. Or the denitration apparatus according to 3.
JP8330822A 1996-12-11 1996-12-11 Denitrification device Pending JPH10165769A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8330822A JPH10165769A (en) 1996-12-11 1996-12-11 Denitrification device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8330822A JPH10165769A (en) 1996-12-11 1996-12-11 Denitrification device

Publications (1)

Publication Number Publication Date
JPH10165769A true JPH10165769A (en) 1998-06-23

Family

ID=18236941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8330822A Pending JPH10165769A (en) 1996-12-11 1996-12-11 Denitrification device

Country Status (1)

Country Link
JP (1) JPH10165769A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003503172A (en) * 1999-06-29 2003-01-28 シーメンス アクチエンゲゼルシヤフト Flue gas purifier
JP2006524560A (en) * 2003-04-28 2006-11-02 インディゴ テクノロジーズ グループ プロプライアタリー リミテッド Fluid mixing method and apparatus for particle agglomeration
JP2007237059A (en) * 2006-03-07 2007-09-20 Nippon Steel Engineering Co Ltd Device and method for treating exhaust gas
DE102008042536A1 (en) 2007-10-02 2009-04-16 Toyota Jidosha Kabushiki Kaisha, Toyota-shi Additive agent diffusion plate assembly in an exhaust passage
WO2011055528A1 (en) * 2009-11-09 2011-05-12 株式会社Ihi Oxygen mixing apparatus for oxygen combustion boiler
US8209965B2 (en) 2007-09-14 2012-07-03 Toyota Jidosha Kabushiki Kaisha Additive-agent diffusion plate structure in exhaust passage, and additive-agent diffusion plate in exhaust passage
JP2013006148A (en) * 2011-06-24 2013-01-10 Mitsubishi Heavy Ind Ltd Exhaust gas duct and denitration device having the same
US8443595B2 (en) 2007-09-07 2013-05-21 Toyota Jidosha Kabushiki Kaisha Additive-agent diffusion plate in exhaust passage, structure of additive-agent diffusion plate, and exhaust system including additive-agent diffusion plate
US8939638B2 (en) 2008-04-21 2015-01-27 Tenneco Automotive Operating Company Inc. Method for mixing an exhaust gas flow
US9095827B2 (en) 2008-04-21 2015-08-04 Tenneco Automotive Operating Company Inc. Exhaust gas flow mixer
US9534525B2 (en) 2015-05-27 2017-01-03 Tenneco Automotive Operating Company Inc. Mixer assembly for exhaust aftertreatment system
WO2017110292A1 (en) * 2015-12-25 2017-06-29 三菱重工業株式会社 Denitrator
CN110487695A (en) * 2019-07-08 2019-11-22 佛山市顺德区阿波罗环保器材有限公司 Strainability detection system of fume filtering element
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Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003503172A (en) * 1999-06-29 2003-01-28 シーメンス アクチエンゲゼルシヤフト Flue gas purifier
JP2006524560A (en) * 2003-04-28 2006-11-02 インディゴ テクノロジーズ グループ プロプライアタリー リミテッド Fluid mixing method and apparatus for particle agglomeration
JP2007237059A (en) * 2006-03-07 2007-09-20 Nippon Steel Engineering Co Ltd Device and method for treating exhaust gas
US8443595B2 (en) 2007-09-07 2013-05-21 Toyota Jidosha Kabushiki Kaisha Additive-agent diffusion plate in exhaust passage, structure of additive-agent diffusion plate, and exhaust system including additive-agent diffusion plate
US8209965B2 (en) 2007-09-14 2012-07-03 Toyota Jidosha Kabushiki Kaisha Additive-agent diffusion plate structure in exhaust passage, and additive-agent diffusion plate in exhaust passage
DE102008042536A1 (en) 2007-10-02 2009-04-16 Toyota Jidosha Kabushiki Kaisha, Toyota-shi Additive agent diffusion plate assembly in an exhaust passage
DE102008042536B4 (en) * 2007-10-02 2013-07-04 Toyota Jidosha Kabushiki Kaisha Additive agent diffusion plate assembly in an exhaust passage
US9095827B2 (en) 2008-04-21 2015-08-04 Tenneco Automotive Operating Company Inc. Exhaust gas flow mixer
US8939638B2 (en) 2008-04-21 2015-01-27 Tenneco Automotive Operating Company Inc. Method for mixing an exhaust gas flow
US9440204B2 (en) 2008-04-21 2016-09-13 Tenneco Automotive Operating Company Inc. Method for mixing an exhaust gas flow
US9975093B2 (en) 2008-04-21 2018-05-22 Tenneco Automotive Operation Company Inc. Exhaust gas flow mixer
JP5459318B2 (en) * 2009-11-09 2014-04-02 株式会社Ihi Oxygen mixing equipment for oxyfuel boilers
US8789479B2 (en) 2009-11-09 2014-07-29 Ihi Corporation Oxygen mixer for oxygen combustion boiler
WO2011055528A1 (en) * 2009-11-09 2011-05-12 株式会社Ihi Oxygen mixing apparatus for oxygen combustion boiler
JP2013006148A (en) * 2011-06-24 2013-01-10 Mitsubishi Heavy Ind Ltd Exhaust gas duct and denitration device having the same
US9534525B2 (en) 2015-05-27 2017-01-03 Tenneco Automotive Operating Company Inc. Mixer assembly for exhaust aftertreatment system
WO2017110292A1 (en) * 2015-12-25 2017-06-29 三菱重工業株式会社 Denitrator
CN110487695A (en) * 2019-07-08 2019-11-22 佛山市顺德区阿波罗环保器材有限公司 Strainability detection system of fume filtering element
WO2023228495A1 (en) * 2022-05-26 2023-11-30 三菱重工業株式会社 Denitration device

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