JPH09189801A - Optical parts with heat resistant antireflection film - Google Patents
Optical parts with heat resistant antireflection filmInfo
- Publication number
- JPH09189801A JPH09189801A JP8001566A JP156696A JPH09189801A JP H09189801 A JPH09189801 A JP H09189801A JP 8001566 A JP8001566 A JP 8001566A JP 156696 A JP156696 A JP 156696A JP H09189801 A JPH09189801 A JP H09189801A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- antireflection film
- refractive index
- optical component
- heat resistant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Surface Treatment Of Optical Elements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Surface Treatment Of Glass (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、２５０℃以上の高温下
で使用可能な耐熱性反射防止膜が形成された光学部品に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical component having a heat resistant antireflection film which can be used at a high temperature of 250 ° C. or higher.
【０００２】[0002]
【従来の技術】光学ガラス、単結晶体、光学プラスチッ
クなどの光学部品は、一般に表面反射を減らすために反
射防止膜が設けられて使用される。反射防止膜は用途に
応じて単層または多層構造からなる。単層の場合は例え
ばＴｉＯ2、Ｔａ2Ｏ5またはＺｒＯ2を原料とした薄膜層
で形成される。多層構造の場合は前記薄膜層の上にＳｉ
Ｏ2を原料とした低屈折な薄膜層が積層された構造にさ
れることが多い。反射防止膜は、真空蒸着法、イオンプ
レーティング法、スパッタリング法などによって光学部
品に形成される。2. Description of the Related Art Optical parts such as optical glass, single crystal and optical plastic are generally provided with an antireflection film to reduce surface reflection. The antireflection film has a single-layer or multi-layer structure depending on the application. In the case of a single layer, for example, it is formed of a thin film layer using TiO 2 , Ta 2 O 5 or ZrO 2 as a raw material. In the case of a multilayer structure, Si is formed on the thin film layer.
In many cases, a low refractive index thin film layer made of O 2 is laminated. The antireflection film is formed on the optical component by a vacuum vapor deposition method, an ion plating method, a sputtering method, or the like.
【０００３】反射防止膜の反射率は、光源波長、光線入
射角、各層の光学膜厚（屈折率と膜厚の積）および積層
構造によって決定される。高屈折率の反射防止膜として
酸化チタン、例えばＴｉＯ2が使用される。酸化チタン
としては、ＴｉＯ、ＴｉＯ2、Ｔｉ3Ｏ5などがあり、光
学部品に形成されるＴｉＯXの組成（Ｘの値）は成膜技
術、成膜条件、原料組成に大きく依存する。ＴｉＯXか
らなる膜を形成する方法として、例えばK.Narasimha Ra
o,at.el,J.Vac.Sci.Technol.A11,394-397,(1993)には、
酸素イオンを基板に照射しながら２５０℃でＴｉＯを基
板に蒸着させることによりＴｉＯ2膜を形成する方法が
記載されており、H.Demiryont,J.R.Sites,J.Vac.Sci.Te
chnol.A2,1457-1460,(1984)には、アルゴン−酸素混合
物のイオンビームを基板に照射しながらＴｉＯ2を蒸着
させる方法が記載されている。The reflectance of the antireflection film is determined by the wavelength of the light source, the incident angle of the light beam, the optical film thickness (product of the refractive index and film thickness) of each layer, and the laminated structure. Titanium oxide, such as TiO 2, is used as the antireflection film having a high refractive index. Examples of titanium oxide include TiO, TiO 2 , and Ti 3 O 5, and the composition (value of X) of TiO x formed in the optical component largely depends on the film forming technique, the film forming conditions, and the raw material composition. As a method for forming a film made of TiO x , for example, K. Narasimha Ra
o, at.el, J.Vac.Sci.Technol.A11,394-397, (1993),
A method for forming a TiO 2 film by depositing TiO 2 on a substrate at 250 ° C. while irradiating the substrate with oxygen ions is described. H. Demiryont, JR Sites, J. Vac. Sci. Te
Chnol.A2,1457-1460, the (1984), argon - the method of depositing TiO 2 while an ion beam of oxygen mixture is irradiated to the substrate is described.
【０００４】一方、光学部品は、他の光学部品や匡体と
接合固定する際に、はんだ、低融点ガラス等の金属、無
機物を用いて接合されることがある。はんだ、低融点ガ
ラスを用いて接合する場合には、それらの融点、ガラス
軟化点になるまでの加熱を必要とする。例えばＡｕ−Ｓ
ｎはんだの場合には２８０℃以上の加熱を必要とする。On the other hand, an optical component may be joined using a solder, a metal such as low melting point glass or the like, or an inorganic substance when being joined and fixed to another optical component or an enclosure. In the case of joining using solder or low melting glass, it is necessary to heat them until their melting points and glass softening points are reached. For example Au-S
In the case of n solder, heating at 280 ° C. or higher is required.
【０００５】[0005]
【発明が解決しようとする課題】この加熱によって光学
部品に形成された反射防止膜の光学膜厚が変化してしま
うため、ＴｉＯ2の反射防止膜付き光学部品を２８０℃
程度以上に加熱してはんだ等で接合固定すると、接合後
の反射防止膜の反射率が増加してしまうという問題があ
った。上記文献でも、ＴｉＯ2膜が２５０℃以上に加熱
されることは想定されていない。Since the optical film thickness of the antireflection film formed on the optical component is changed by this heating, the optical component with the antireflection film of TiO 2 is heated to 280 ° C.
There is a problem in that the reflectance of the antireflection film after joining increases if it is heated to a certain degree or higher and joined and fixed with solder or the like. Also in the above document, it is not assumed that the TiO 2 film is heated to 250 ° C. or higher.
【０００６】本発明は前記の課題を解決するためなされ
たもので、２５０℃以上に加熱して接合したり、高温下
で使用しても反射率が増加することがなく、安定した光
学特性が得られる耐熱性反射防止膜付き光学部品を提供
することを目的とする。The present invention has been made to solve the above-mentioned problems, and the reflectance does not increase even when heated to 250 ° C. or higher for bonding or used at high temperature, and stable optical characteristics are obtained. It is an object of the present invention to provide an optical component having a heat-resistant antireflection film obtained.
【０００７】[0007]
【課題を解決するための手段】前記の目的を達成するた
めになされた本発明の耐熱性反射防止膜付き光学部品
は、図１に示すように、２５０℃以上に加熱される光学
部品の少なくとも片面に、ＴｉＯX（Ｘは１．９〜２．
２）薄膜２からなる反射防止膜が形成されている。As shown in FIG. 1, an optical component with a heat-resistant antireflection film of the present invention made to achieve the above-mentioned object is at least the optical component heated to 250 ° C. or higher. On one surface, TiO x (X is 1.9 to 2.
2) An antireflection film composed of the thin film 2 is formed.
【０００８】ＴｉＯX薄膜２にＳｉＯ2薄膜３が積層され
ていることが好ましい。光学部品１は、例えば光学ガラ
ス、単結晶体または光学プラスチックが挙げられる。A SiO 2 thin film 3 is preferably laminated on the TiO x thin film 2. The optical component 1 includes, for example, optical glass, single crystal or optical plastic.
【０００９】[0009]
【作用】本発明の耐熱性反射防止膜付き光学部品は、Ｔ
ｉＯXの酸素の組成量がＸ＝１．９〜２．２からなる反
射防止膜が形成されているため、２５０℃以上の高温に
加熱しても、ＴｉＯXの組成が変化することがないため
光学膜厚が変化することがなく、反射防止膜の反射率が
増加してしまうことがない。The optical component with the heat-resistant antireflection film of the present invention is
Since the antireflection film having the oxygen composition amount of iO X of X = 1.9 to 2.2 is formed, the composition of TiO X does not change even when heated to a high temperature of 250 ° C. or higher. Therefore, the optical film thickness does not change, and the reflectance of the antireflection film does not increase.
【００１０】[0010]
【実施例】図１は、本発明を適用する耐熱性反射防止膜
付き光学部品の実施例を示す断面図である。同図に示す
ように、耐熱性反射防止膜付き光学部品は、光学部品１
の両面に高屈折率層２および低屈折率層３からなる耐熱
性反射防止膜４が形成されている。この耐熱性反射防止
膜付き光学部品は、他の光学部品と接合される際、はん
だや低融点ガラスを使用して、２５０℃以上に加熱して
接合される。FIG. 1 is a sectional view showing an embodiment of an optical component with a heat resistant antireflection film to which the present invention is applied. As shown in the figure, the optical component with the heat-resistant antireflection film is the optical component 1
A heat resistant antireflection film 4 composed of a high refractive index layer 2 and a low refractive index layer 3 is formed on both surfaces of. When this optical component with a heat-resistant antireflection film is bonded to another optical component, solder or low melting point glass is used and heated to 250 ° C. or higher for bonding.
【００１１】図２は、光学部品に耐熱性反射防止膜を形
成する真空蒸着装置を示す概略図である。同図に示すよ
うに、チャンバー６には、酸素導入口７および排気口８
が設けられ不図示の弁を開閉して密閉できるようになっ
ている。チャンバー６内の底部には電子銃９およびイオ
ン銃１１が配置されており、電子銃９の上には耐熱性反
射防止膜の蒸着原料１０を入れるためのるつぼ１２が配
置されている。チャンバー６内の上部には光学部品１を
保持するための保持具１３が配置され、保持具１３には
チャンバー６外部から貫通して光学膜厚計１４が取り付
けられている。尚、光学膜厚とは屈折率と膜厚の積であ
る。FIG. 2 is a schematic view showing a vacuum vapor deposition apparatus for forming a heat resistant antireflection film on an optical component. As shown in the figure, the chamber 6 has an oxygen introduction port 7 and an exhaust port 8.
Is provided so that a valve (not shown) can be opened and closed for sealing. An electron gun 9 and an ion gun 11 are arranged at the bottom of the chamber 6, and a crucible 12 for containing the vapor deposition material 10 of the heat resistant antireflection film is arranged on the electron gun 9. A holder 13 for holding the optical component 1 is arranged in the upper portion of the chamber 6, and an optical film thickness meter 14 is attached to the holder 13 so as to penetrate from the outside of the chamber 6. The optical film thickness is the product of the refractive index and the film thickness.
【００１２】この真空蒸着装置は、所定の圧力になるま
で排気口８から排気した後、酸素導入口７から酸素を導
入し、保持具１３に光学部品１を取り付け、光学部品１
を加熱しながら電子銃９でるつぼ１２内の蒸着原料１０
を蒸発させ光学部品１に蒸着させ高屈折率層２を形成さ
せる。このとき、必要に応じてイオン銃１１を作動して
酸素イオンを光学部品１に照射しても良い。次に別にチ
ャンバー６内に用意した低屈折率層３の蒸着原料を蒸発
させ、高屈折率層２が蒸着された光学部品１に重ねて蒸
着させる。In this vacuum vapor deposition apparatus, after exhausting from the exhaust port 8 to a predetermined pressure, oxygen is introduced from the oxygen introducing port 7, the optical component 1 is attached to the holder 13, and the optical component 1
Evaporation source 10 in crucible 12 with electron gun 9 while heating
Is evaporated and deposited on the optical component 1 to form the high refractive index layer 2. At this time, if necessary, the ion gun 11 may be operated to irradiate the optical component 1 with oxygen ions. Next, the vapor deposition material for the low refractive index layer 3 separately prepared in the chamber 6 is vaporized, and the vapor deposition is carried out on the optical component 1 on which the high refractive index layer 2 is vapor deposited.
【００１３】上記した装置を使用して光学部品１に耐熱
性反射防止膜４を形成した。実施例１および２は本発明
を適用した方法で光学部品１に耐熱性反射防止膜４を形
成し、比較例１は本発明を適用外の方法で反射防止膜を
形成した。The heat resistant antireflection film 4 was formed on the optical component 1 by using the above-mentioned apparatus. In Examples 1 and 2, the heat-resistant antireflection film 4 was formed on the optical component 1 by the method applying the present invention, and in Comparative Example 1, the antireflection film was formed by the method not applying the present invention.
【００１４】実施例１ 光学部品１として厚さ０．５ｍｍの石英ガラス基板１
（波長１．３１μｍでの屈折率１．４４）、高屈折率層
２の蒸着原料１０としてＴｉ3Ｏ5を使用し、チャンバー
６内が３００℃を保つように加熱しながら１×１０-5To
rr以下の圧力に排気した後、チャンバー１１内に圧力が
２×１０-4Torrとなるように酸素ガスを導入した。電子
銃９を作動させてＴｉ3Ｏ5を蒸発させ蒸着速度０．３ｎ
ｍ／ｓで、光学膜厚計１４を観察しながら石英ガラス基
板１の両面に光学膜厚が８９ｎｍの高屈折率層２を形成
させた。次に酸素ガスの導入を停止し、低屈折率層３の
原料として粒状のＳｉＯ2を使用して、電子銃９を作動
させてＳｉＯ2を蒸発させ蒸着速度０．５ｎｍ／ｓで、
高屈折率層２の上に光学膜厚が４２７ｎｍの低屈折率層
３を形成させ、石英ガラス基板１に光源波長１．３１μ
ｍ用の２層の耐熱性反射防止膜４が形成された。Example 1 As an optical component 1, a quartz glass substrate 1 having a thickness of 0.5 mm
(Refractive index 1.44 at a wavelength of 1.31 μm), Ti 3 O 5 is used as a vapor deposition material 10 for the high refractive index layer 2, and heating is performed so that the temperature in the chamber 6 is maintained at 300 ° C., and 1 × 10 −5. To
After exhausting to a pressure of rr or less, oxygen gas was introduced into the chamber 11 so that the pressure became 2 × 10 −4 Torr. The electron gun 9 is operated to evaporate Ti 3 O 5 and vapor deposition rate 0.3 n.
While observing the optical film thickness meter 14 at m / s, the high refractive index layer 2 having an optical film thickness of 89 nm was formed on both surfaces of the quartz glass substrate 1. Then, the introduction of oxygen gas is stopped, and granular SiO 2 is used as a raw material for the low refractive index layer 3, and the electron gun 9 is operated to evaporate SiO 2 at a vapor deposition rate of 0.5 nm / s.
The low refractive index layer 3 having an optical film thickness of 427 nm is formed on the high refractive index layer 2, and the light source wavelength is 1.31 μm on the quartz glass substrate 1.
A two-layer heat-resistant antireflection film 4 for m was formed.
【００１５】実施例２ 光学部品１として厚さ０．５ｍｍの石英ガラス基板１
（波長１．３１μｍでの屈折率１．４４）、高屈折率層
２の蒸着原料１０としてＴｉＯ2を使用し、チャンバー
６内が１００℃を保つように加熱しながら１×１０-5To
rr以下の圧力に排気した後、チャンバー１１内に圧力が
１×１０-4Torrとなるように酸素ガスを導入した。イオ
ン銃１１を作動させてイオンエネルギー７５０ｅＶ、イ
オン電流密度１０μＡ／ｃｍ2の酸素イオンを石英ガラ
ス基板１に照射しながら、電子銃９を作動させてＴｉＯ
2を蒸発させ蒸着速度０．３ｎｍ／ｓで、光学膜厚計１
４を観察しながら石英ガラス基板１の両面に光学膜厚が
８９ｎｍの高屈折率層２を形成させた。次に酸素ガスの
導入を停止し、低屈折率層３の原料として粒状のＳｉＯ
2を使用して、電子銃９を作動させてＳｉＯ2を蒸発させ
蒸着速度０．５ｎｍ／ｓで、高屈折率層２の上に光学膜
厚が４２７ｎｍの低屈折率層３を形成させ、石英ガラス
基板１に光源波長１．３１μｍ用の２層の耐熱性反射防
止膜４が形成された。Example 2 As an optical component 1, a quartz glass substrate 1 having a thickness of 0.5 mm
(Refractive index 1.44 at wavelength 1.31 μm), TiO 2 is used as the deposition material 10 for the high refractive index layer 2, and 1 × 10 −5 To while heating the inside of the chamber 6 to maintain 100 ° C.
After exhausting to a pressure of rr or less, oxygen gas was introduced into the chamber 11 so that the pressure became 1 × 10 −4 Torr. While the ion gun 11 is operated to irradiate the quartz glass substrate 1 with oxygen ions having an ion energy of 750 eV and an ion current density of 10 μA / cm 2 , the electron gun 9 is operated to activate TiO 2.
Optical film thickness meter 1 with evaporation of 2 and evaporation rate of 0.3 nm / s
While observing No. 4, the high refractive index layer 2 having an optical film thickness of 89 nm was formed on both surfaces of the quartz glass substrate 1. Next, the introduction of oxygen gas is stopped, and granular SiO 2 is used as a raw material for the low refractive index layer 3.
2 is used to operate the electron gun 9 to evaporate SiO 2 and form a low refractive index layer 3 having an optical film thickness of 427 nm on the high refractive index layer 2 at a vapor deposition rate of 0.5 nm / s, Two layers of heat-resistant antireflection film 4 for a light source wavelength of 1.31 μm were formed on a quartz glass substrate 1.
【００１６】比較例１ 高屈折率層２の原料としてＴｉＯ2を使用したことを除
き、実施例１と同様にして石英ガラス基板１に光源波長
１．３１μｍ用の２層の反射防止膜を形成した。Comparative Example 1 A two-layer antireflection film for a light source wavelength of 1.31 μm was formed on a quartz glass substrate 1 in the same manner as in Example 1 except that TiO 2 was used as a raw material for the high refractive index layer 2. did.
【００１７】性能試験 実施例１、２および比較例１において、それぞれ３個の
石英ガラス基板１を使用して、ＳｉＯ2を原料とした低
屈折率層３は形成させずに、高屈折率層２のみからなる
反射防止膜を形成させ、それぞれ試料１、試料２、試料
３とした。これらの試料について石英ガラス基板１に形
成された反射防止膜２のＴｉＯX組成を光電子分光法に
より分析し、その結果を表１に示す。Performance Test In Examples 1 and 2 and Comparative Example 1, three quartz glass substrates 1 were used, respectively, and the high refractive index layer 3 was formed without forming the low refractive index layer 3 made of SiO 2 as a raw material. An antireflection film consisting of only 2 was formed to obtain Sample 1, Sample 2, and Sample 3, respectively. For these samples, the TiO x composition of the antireflection film 2 formed on the quartz glass substrate 1 was analyzed by photoelectron spectroscopy, and the results are shown in Table 1.
【００１８】[0018]
【表１】 [Table 1]
【００１９】次に、実施例１、実施例２および比較例１
の方法で形成した２層の反射防止膜の試料を２４０℃か
ら３６０℃まで加熱しながら、波長１．３１μｍのレー
ザ光による透過率Ｔを測定し、反射率Ｒを次式（１）に
より算出した。Next, Example 1, Example 2 and Comparative Example 1
While heating the sample of the two-layer antireflection film formed by the method described in (1) above from 240 ° C. to 360 ° C., the transmittance T by the laser light having a wavelength of 1.31 μm is measured, and the reflectance R is calculated by the following equation (1). did.
【００２０】 １００−２Ｒ＝Ｔ ・・・（１） その結果を図３に示す。同図に示すように実施例１およ
び実施例２のように反射防止膜のＴｉＯX組成がＸ≦
２．２のときには、２５０℃を超えて加熱を行っても反
射率が増加することはなかった。これに対し、比較例１
のようにＴｉＯXの組成がＸ＞２．２のときには、２５
０℃を超えた加熱を行うと反射率が増大してしまった。100-2R = T (1) The results are shown in FIG. As shown in the figure, the TiO x composition of the antireflection film is X ≦
In the case of 2.2, the reflectance did not increase even if heating was performed at over 250 ° C. In contrast, Comparative Example 1
When the composition of TiO x is X> 2.2 as shown in
When the heating temperature was higher than 0 ° C, the reflectance increased.
【００２１】[0021]
【発明の効果】以上、詳細に説明したように本発明の耐
熱性反射防止膜付き光学部品は、はんだや低融点ガラス
を使用して２５０℃以上に加熱して接合したり、高温下
で使用しても反射率が増加することがなく、安定した光
学特性を得ることができる。As described above in detail, the optical component with a heat-resistant antireflection film of the present invention is used at high temperatures of 250.degree. Even if the reflectance is not increased, stable optical characteristics can be obtained.
【図面の簡単な説明】[Brief description of the drawings]
【図１】本発明を適用する耐熱性反射防止膜付き光学部
品の実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of an optical component with a heat resistant antireflection film to which the present invention is applied.
【図２】光学部品に耐熱性反射防止膜を形成する真空蒸
着装置を示す概略図である。FIG. 2 is a schematic view showing a vacuum vapor deposition apparatus for forming a heat resistant antireflection film on an optical component.
【図３】実施例および比較例における反射防止膜付き光
学部品の加熱温度と反射率の関係を示す図である。FIG. 3 is a graph showing the relationship between the heating temperature and the reflectance of optical components with an antireflection film in Examples and Comparative Examples.
１は石英ガラス基板、２は高屈折率層、３は低屈折率
層、４は耐熱性反射防止膜、６はチャンバー、７は酸素
導入口、８は排気口、９は電子銃、１０は蒸着原料、１
１はイオン銃、１２はるつぼ、１３は保持具、１４は光
学膜厚計である。1 is a quartz glass substrate, 2 is a high refractive index layer, 3 is a low refractive index layer, 4 is a heat resistant antireflection film, 6 is a chamber, 7 is an oxygen inlet, 8 is an exhaust port, 9 is an electron gun, 10 is Evaporation material, 1
1 is an ion gun, 12 is a crucible, 13 is a holder, and 14 is an optical film thickness meter.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｇ０２Ｂ 1/10 Ｇ０２Ｂ 1/10 Ｚ (72)発明者 流王 俊彦 群馬県安中市磯部２丁目13番１号 信越化 学工業株式会社精密機能材料研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location G02B 1/10 G02B 1/10 Z (72) Inventor Toshihiko Nagao 2 Isobu, Annaka-shi, Gunma Prefecture No. 13-1 Shin-Etsu Chemical Co., Ltd., Precision Materials Research Laboratory
Claims (3)
なくとも片面に、ＴｉＯX（Ｘは１．９〜２．２）薄膜
からなる反射防止膜が形成されていることを特徴とする
耐熱性反射防止膜付き光学部品。1. A heat resistance characterized in that an antireflection film made of a TiO x (X is 1.9 to 2.2) thin film is formed on at least one surface of an optical component heated to 250 ° C. or higher. Optical parts with anti-reflection film.
れていることを特徴とする請求項１に記載の耐熱性反射
防止膜付き光学部品。2. The optical component with a heat-resistant antireflection film according to claim 1, wherein a SiO 2 thin film is laminated on the TiO x thin film.
または光学プラスチックであることを特徴とする請求項
１に記載の耐熱性反射防止膜付き光学部品。3. The optical component with a heat-resistant antireflection film according to claim 1, wherein the optical component is an optical glass, a single crystal, or an optical plastic.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8001566A JPH09189801A (en) | 1996-01-09 | 1996-01-09 | Optical parts with heat resistant antireflection film |
| US08/768,292 US5872652A (en) | 1995-12-18 | 1996-12-17 | Optical isolator and optical part having heat-resistant anti-reflection coating |
| DE69631495T DE69631495D1 (en) | 1995-12-18 | 1996-12-17 | Optical element with a heat-resistant anti-reflection layer |
| DE69616957T DE69616957T2 (en) | 1995-12-18 | 1996-12-17 | Optical isolator and optical component with a heat-resistant anti-reflective coating |
| EP00113469A EP1072925B1 (en) | 1995-12-18 | 1996-12-17 | Optical element having heat-resistant anti-reflection coating |
| EP96309199A EP0780717B1 (en) | 1995-12-18 | 1996-12-17 | Optical isolator and optical part having heat-resistant anti-reflection coating |
| US09/193,128 US6163404A (en) | 1995-12-18 | 1998-11-17 | Optical isolator and optical part having heat-resistant anti-reflection coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8001566A JPH09189801A (en) | 1996-01-09 | 1996-01-09 | Optical parts with heat resistant antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09189801A true JPH09189801A (en) | 1997-07-22 |
Family
ID=11505078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8001566A Pending JPH09189801A (en) | 1995-12-18 | 1996-01-09 | Optical parts with heat resistant antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09189801A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6468402B1 (en) | 1996-01-05 | 2002-10-22 | Bekaert Vds | Process for coating a substrate with titanium dioxide |
| JP2009244583A (en) * | 2008-03-31 | 2009-10-22 | Konica Minolta Opto Inc | Method for manufacturing optical element, optical element unit, and imaging unit |
| JPWO2010004879A1 (en) * | 2008-07-11 | 2012-01-05 | コニカミノルタオプト株式会社 | OPTICAL ELEMENT, OPTICAL ELEMENT MANUFACTURING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD |
| USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
| US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
-
1996
- 1996-01-09 JP JP8001566A patent/JPH09189801A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6468402B1 (en) | 1996-01-05 | 2002-10-22 | Bekaert Vds | Process for coating a substrate with titanium dioxide |
| USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
| USRE44155E1 (en) | 2004-07-12 | 2013-04-16 | Cardinal Cg Company | Low-maintenance coatings |
| US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
| JP2009244583A (en) * | 2008-03-31 | 2009-10-22 | Konica Minolta Opto Inc | Method for manufacturing optical element, optical element unit, and imaging unit |
| JPWO2010004879A1 (en) * | 2008-07-11 | 2012-01-05 | コニカミノルタオプト株式会社 | OPTICAL ELEMENT, OPTICAL ELEMENT MANUFACTURING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD |
| JP5488464B2 (en) * | 2008-07-11 | 2014-05-14 | コニカミノルタ株式会社 | OPTICAL ELEMENT, OPTICAL ELEMENT MANUFACTURING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
| US11325859B2 (en) | 2016-11-17 | 2022-05-10 | Cardinal Cg Company | Static-dissipative coating technology |
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