JPH0912991A - Tacky agent of sheet for fixing semiconductor wafer - Google Patents

Tacky agent of sheet for fixing semiconductor wafer

Info

Publication number
JPH0912991A
JPH0912991A JP8049484A JP4948496A JPH0912991A JP H0912991 A JPH0912991 A JP H0912991A JP 8049484 A JP8049484 A JP 8049484A JP 4948496 A JP4948496 A JP 4948496A JP H0912991 A JPH0912991 A JP H0912991A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
sheet
adhesive
fixing
examples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8049484A
Other languages
Japanese (ja)
Other versions
JP4040706B2 (en
Inventor
Kishio Niwayama
喜司雄 庭山
Seiji Saida
誠二 齋田
Shigeru Wada
和田  茂
Hiroyuki Uchida
弘之 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Kagaku Co Ltd
Original Assignee
Toyo Kagaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Kagaku Co Ltd filed Critical Toyo Kagaku Co Ltd
Priority to JP04948496A priority Critical patent/JP4040706B2/en
Publication of JPH0912991A publication Critical patent/JPH0912991A/en
Application granted granted Critical
Publication of JP4040706B2 publication Critical patent/JP4040706B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Adhesive Tapes (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a tacky agent, comprising an elastomer, a tackifying resin and a curing agent in a specific proportion, excellent in chip holding and nonfouling properties, capable of performing the full dicing into minimal chips and useful as a sheet for fixing a semiconductor wafer. SOLUTION: This tacky agent of a sheet for fixing a semiconductor wafer comprises (A) 100 pts.wt. elastomer such as a natural rubber, (B) 5-200 pts.wt. tackifying resin such as a rosin-based resin and (C) 0.05-30 pts.wt. curing agent such as tolylene diisocyanate. Furthermore, the tacky agent of the sheet for fixing the semiconductor wafer preferably has 3.0×10<5> to 5.9×10<6> dyn/cm<2> storage elastic modulus and 20-300gf/20mm peel strength from a semiconductor wafer at 180 deg. (at 300mm/min peeling rate).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は半導体ウエハからチ
ップ小片に切断・分離する際に該半導体ウエハを固定す
るシートの粘着剤に係り、特にチップ保持性及び非汚染
性が高く、極小の半導体チップの切断に適した半導体ウ
エハ固定用シートの粘着剤に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive agent for a sheet for fixing a semiconductor wafer when the semiconductor wafer is cut and separated into chip pieces, and in particular, it has a very small chip holding property and a non-contaminating property, and is a very small semiconductor chip. The present invention relates to a pressure-sensitive adhesive for a semiconductor wafer fixing sheet, which is suitable for cutting.

【0002】[0002]

【従来の技術】従来、半導体ウエハ固定用シートの粘着
剤は、形成すべきチップ形状に切断される際の半導体ウ
エハを固定するシート(例えば特開昭60−19695
6号公報参照)に積層される。半導体ウエハの切断・分
離手段としては、半導体ウエハを回転丸刃で切断するフ
ルダイシング方法と、形成すべきチップ小片に合わせて
半導体ウエハ表面に浅く楔状溝を入れた後に外力を加え
て分割するハーフダイシング方法がある。
2. Description of the Related Art Conventionally, a pressure-sensitive adhesive for a semiconductor wafer fixing sheet is used as a sheet for fixing a semiconductor wafer when it is cut into a chip shape to be formed (for example, JP-A-60-19695).
No. 6 publication). The semiconductor wafer cutting / separating means includes a full dicing method of cutting the semiconductor wafer with a rotary round blade, and a half dicing method in which a shallow wedge-shaped groove is formed on the surface of the semiconductor wafer according to the chip pieces to be formed and then external force is applied. There is a dicing method.

【0003】該シートをフルダイシング方法に対応させ
るためにはフルダイシング時の衝撃だけでなく分離後の
水洗時に受ける水圧に耐え得るようにチップ保持性(粘
着力)を設定しなければならない。特に、極小チップと
呼ばれる0.3〜1.0mm角のチップの場合には小さ
い接触面積での上記性質を発現させなければならない。
In order to make the sheet compatible with the full dicing method, the chip holding property (adhesive strength) must be set so that it can withstand not only the impact at the time of full dicing but also the water pressure received at the time of washing after separation. In particular, in the case of a chip of 0.3 to 1.0 mm square called a very small chip, it is necessary to exhibit the above properties with a small contact area.

【0004】[0004]

【発明が解決しようとする課題】かかる特殊な用途に用
いられる粘着剤として、エマルジヨン型アクリル系粘着
剤が知られているが、水に溶けやすく且つ形状が直径約
0.3μmの球形であり粘着剤面と半導体ウエハ界面に
水が侵入しやすいため、ダイシング時に供給される冷却
水を含み粘着力を低下させ半導体ウエハをダイシングす
るとむやみに飛散してしまうという課題(チップ保持性
が低いという課題)がある。また、エマルジョン型アク
リル系粘着剤には界面活性剤が添加されているため、該
界面活性剤がウエハチップに付着しチップを汚染してし
まうだけでなくチップの電気特性を悪化させるという課
題(非汚染性が高いという課題)を有する。
An emulsion type acrylic pressure-sensitive adhesive is known as a pressure-sensitive adhesive used for such a special purpose, but it is easily soluble in water and has a spherical shape with a diameter of about 0.3 μm. Since water easily enters the interface between the agent surface and the semiconductor wafer, cooling water supplied during dicing reduces the adhesive strength and the semiconductor wafer is splattered unnecessarily when it is diced (the problem of low chip retention). There is. Further, since a surfactant is added to the emulsion type acrylic pressure-sensitive adhesive, the problem that the surfactant adheres to the wafer chip and contaminates the chip and also deteriorates the electrical characteristics of the chip (non- It has a problem of high pollution).

【0005】また、特開昭60−196956号公報に
は光透過性の支持体と、この支持体上に設けられた光照
射により硬化する粘着剤層とを備えた半導体ウエハを固
定するための薄板が開示されている。半導体ウエハを切
断・分離する際には半導体ウエハを粘着剤層に強固に固
定し、切断後には紫外線を照射して該粘着剤層を硬化さ
せ粘着力を減少させて切断・分離させたチップ素子を容
易にピックアップさせることができる。しかしながら、
かかる方法では高価な紫外線照射装置が必須であり高価
な製品になってしまうという新たな課題があった。
Further, Japanese Patent Application Laid-Open No. 60-196956 discloses a semiconductor wafer having a light-transmissive support and an adhesive layer provided on the support and cured by light irradiation. A thin plate is disclosed. A chip element in which a semiconductor wafer is firmly fixed to an adhesive layer when the semiconductor wafer is cut and separated, and after cutting the semiconductor wafer is irradiated with ultraviolet rays to cure the adhesive layer to reduce the adhesive force and cut and separated. Can be picked up easily. However,
This method has a new problem that an expensive ultraviolet irradiation device is indispensable and an expensive product is obtained.

【0006】したがって、本発明の目的は、半導体ウエ
ハを切断・分離する際には半導体ウエハをシート上に強
固に固定する一方、切断・分離された小片の半導体素子
をピックアップする際には粘着剤が該素子に付着するこ
となく容易にピックアップでき、さらには特別な装置を
必要とせずに安価に製造できる半導体ウエハ固定用シー
トの粘着剤を提供することにある。
Therefore, an object of the present invention is to firmly fix a semiconductor wafer on a sheet when cutting and separating the semiconductor wafer, and to use an adhesive when picking up the cut and separated small pieces of semiconductor elements. It is an object of the present invention to provide a pressure-sensitive adhesive for a semiconductor wafer fixing sheet, which can be easily picked up without adhering to the element and can be manufactured at low cost without requiring a special device.

【0007】[0007]

【課題を解決するための手段】本発明者は、上記に鑑み
鋭意検討を行った結果、半導体ウエハ固定用シートに使
用される粘着剤の主剤をエラストマ、粘着付与樹脂およ
び硬化剤とすると共に所定比率で作製することにより上
記課題を解決できることを見出だし、本発明を完成し
た。
Means for Solving the Problems As a result of intensive investigations in view of the above, the present inventor has determined that the main components of the adhesive used in the sheet for fixing a semiconductor wafer are an elastomer, a tackifying resin and a curing agent, and a predetermined amount. It has been found that the above problems can be solved by manufacturing in a ratio, and the present invention has been completed.

【0008】すなわち、本発明にかかる半導体ウエハ固
定用シートの粘着剤は、エラストマ100重量部、粘着
付与樹脂5〜200重量部および硬化剤0.05〜30
重量部を主要部としたことを特徴とするものである。
That is, the adhesive of the semiconductor wafer fixing sheet according to the present invention comprises 100 parts by weight of the elastomer, 5 to 200 parts by weight of the tackifying resin, and 0.05 to 30 of the curing agent.
It is characterized in that the weight part is the main part.

【0009】上記エラストマを採用したのはエラストマ
の分子骨格が軟らかいため、半導体ウエハにしっかりと
貼り付き、ダイシング時にチップがむやみに飛散せず安
定してダイシングできるためである。また、チップ飛散
によるブレードの破損がなくなりブレードの耐久性が向
上し、生産性向上につながるためである。
The elastomer is adopted because the elastomer has a soft molecular skeleton, so that it adheres firmly to the semiconductor wafer and the chips do not scatter unnecessarily during dicing and can be stably diced. Further, the blade is not damaged due to scattering of chips, the durability of the blade is improved, and the productivity is improved.

【0010】該エラストマとしては、天然ゴム、合成イ
ソプレンゴム、SBR(スチレンブタジエンゴム)、ス
チレン・ブタジエンブロック共重合体、ブチルゴム、ポ
リイソブチレン・シリコンゴム、ポリビニルイソブチル
エーテル・クロロプレン、ニトリルゴム、クラフトゴ
ム、スチレン・エチレン・ブチレンブロックコポリマ、
スチレン・プロピレン・ブチレンブロックコポリマ、ス
チレン・イソプレンブロックコポリマ、アクリロニトリ
ル・ブタジエン共重合体、メチル・メタアクリレート・
ブタジエン共重合体、ポリイソブチレン・エチレン・プ
ロピレン共重合体、エチレン酢酸ビニル共重合体、ポリ
ブタジエン、アクリロニトリル・アクリルエステル共重
合体、ポリビニルエーテル等があり、これらの単独物の
みならず混合物であってもよい。また、これらの再生ゴ
ムであってもよい。
As the elastomer, natural rubber, synthetic isoprene rubber, SBR (styrene butadiene rubber), styrene / butadiene block copolymer, butyl rubber, polyisobutylene / silicon rubber, polyvinyl isobutyl ether / chloroprene, nitrile rubber, kraft rubber, Styrene / ethylene / butylene block copolymer,
Styrene / propylene / butylene block copolymer, styrene / isoprene block copolymer, acrylonitrile / butadiene copolymer, methyl methacrylate /
There are butadiene copolymers, polyisobutylene / ethylene / propylene copolymers, ethylene vinyl acetate copolymers, polybutadiene, acrylonitrile / acrylic ester copolymers, polyvinyl ethers, etc., and not only these but also mixtures thereof. Good. Further, these recycled rubbers may be used.

【0011】上記粘着付与樹脂を採用したのは上記目的
を達成しつつ従来の粘着力を持たせるためであり、該粘
着付与樹脂の添加量はあまりに少ないと粘着効果が出ず
あまりに多いと軟らかくなりすぎて非汚染性が低くなっ
てしまうため、5〜200重量部、好ましくは10〜1
00重量部がよい。
The reason why the tackifying resin is adopted is to impart the conventional tackiness while achieving the above object. If the amount of the tackifying resin added is too small, the tackifying effect does not appear and the tackifying resin becomes soft. 5 to 200 parts by weight, preferably 10 to 1 since the non-contaminating property becomes too low.
00 parts by weight is good.

【0012】本発明の粘着剤に含まれる上記粘着付与樹
脂の具体例としては、ロジン系樹脂、テルペン系樹脂、
脂肪族石油樹脂、芳香族石油樹脂、水添石油樹脂があ
り、これらの単独物のみならず混合物であってもよい。
上記ロジン系樹脂としては、ロジン、重合ロジン、水添
ロジン、ロジンエステル、水添ロジンエステル、ロジン
フェノール樹脂等があり、上記テルペン系樹脂として
は、テルペン、テルペンフェノール樹脂、芳香族変成テ
ルペン樹脂等がある。また、上記水添石油樹脂として
は、芳香族系のもの、ジシクロペンンタジエン系のも
の、脂肪族系のもの等がある。
Specific examples of the tackifying resin contained in the pressure-sensitive adhesive of the present invention include rosin-based resins, terpene-based resins,
There are aliphatic petroleum resins, aromatic petroleum resins and hydrogenated petroleum resins, and these may be used alone or as a mixture.
Examples of the rosin-based resin include rosin, polymerized rosin, hydrogenated rosin, rosin ester, hydrogenated rosin ester, and rosin phenol resin, and examples of the terpene-based resin include terpene, terpene phenol resin, and aromatic modified terpene resin. There is. Examples of the hydrogenated petroleum resin include aromatic ones, dicyclopentadiene-based ones, and aliphatic ones.

【0013】本発明に係る粘着剤に上記硬化剤を採用し
たのは、粘着剤として凝集力を高めつつ非汚染性を高め
るためであるが、あまりに多く混合すると粘着剤全体と
しての物性が不安定になりあまりに少ないと非汚染性が
低くなるため0.05〜30重量部、好ましくは1.0
〜5.0重量部混合するのがよい。
The reason why the above-mentioned curing agent is adopted as the pressure-sensitive adhesive according to the present invention is to increase the cohesive force as a pressure-sensitive adhesive while enhancing the non-contaminating property, but if too much is mixed, the physical properties of the pressure-sensitive adhesive as a whole are unstable. If it is too small, the non-staining property will be low, so 0.05 to 30 parts by weight, preferably 1.0
It is preferable to mix the mixture in an amount of up to 5.0 parts by weight.

【0014】該硬化剤としては、イソシアネート、硫黄
と加流促進剤の混合物、ポリアルキルフェノール、有機
過酸化物等があり、これらの単独物のみならず混合物で
あってもよい。上記イソシアネートとしては、フェニレ
ンジイソシアネート、トリレンジイソシアネート、ジフ
ェニルメタジイソシアネート、ヘキサメチレンジイソシ
アネート、シクロヘキサンジイソシアネート等があり、
上記硫黄と加流促進剤としてはチアゾール系加流促進
剤、スルフェンアミド系加流促進剤、チウラム系加流促
進剤、ジチオ酸塩系加流促進剤等がある。上記ポリアル
キルフェノールとしては、ブチルフェノール、オクチル
フェノール、ノニルフェノール等があり、上記有機過酸
化物としては、ベンゾイルパーオキサイド、ジクロミル
パーオキサイド、ケトンパーオキサイド、パーオキシケ
タール、ハイドロパーオキサイド、ジアルキルパーオキ
サイド、パーオキシエステル、パーオキシジカーボネー
ト等がある。
Examples of the curing agent include isocyanate, a mixture of sulfur and a fluxing accelerator, polyalkylphenol, organic peroxide and the like, and these may be used alone or as a mixture. Examples of the isocyanate include phenylene diisocyanate, tolylene diisocyanate, diphenyl metadiisocyanate, hexamethylene diisocyanate, cyclohexane diisocyanate, and the like.
Examples of the sulfur and the fluxing accelerator include a thiazole fluxing accelerator, a sulfenamide fluxing accelerator, a thiuram fluxing accelerator and a dithioate salt fluxing accelerator. Examples of the polyalkylphenol include butylphenol, octylphenol, and nonylphenol, and examples of the organic peroxide include benzoyl peroxide, dichromyl peroxide, ketone peroxide, peroxyketal, hydroperoxide, dialkyl peroxide, and peroxy. Examples include esters and peroxydicarbonates.

【0015】なお、本発明にかかる粘着剤には従来公知
の充填剤、老化防止剤、軟化剤、安定剤若しくは着色剤
などを適宜選択して添加することができる。
Incidentally, conventionally known fillers, antioxidants, softeners, stabilizers or colorants can be appropriately selected and added to the pressure-sensitive adhesive according to the present invention.

【0016】また、本出願に係る他の発明の特徴は、上
記主要成分を上記の所定量の範囲内において調整配合す
ることにより得られる粘着剤の貯蔵弾性率を、3.0×
105〜5.9×106dyn/cm2の範囲内に設定す
るものである。この貯蔵弾性率は、あまりに小さいと表
面張力エネルギーが大きくなりすぎ軟化しすぎ切断・分
離された素子に粘着剤が付着するという非汚染性が低下
してしまい、あまりに大きいと表面張力エネルギーが不
足し硬化してしまい切断・分離の際に切断された素子が
むやみに飛散してしまうため、上記範囲内に設定するの
が好ましい。なお、貯蔵弾性率は30℃において粘着剤
を粘弾性測定装置にて測定した際の値である。
Further, another feature of the present invention according to the present application is that the storage elastic modulus of the pressure-sensitive adhesive obtained by adjusting and blending the above-mentioned main components within the above-mentioned predetermined amount range is 3.0 ×.
It is set within the range of 10 5 to 5.9 × 10 6 dyn / cm 2 . If this storage elastic modulus is too small, the surface tension energy will be too large and softened, and the non-contaminating property that the adhesive will adhere to the cut / separated element will decrease.If it is too large, the surface tension energy will be insufficient. It is preferable to set it within the above range, because it is hardened and the cut elements are undesirably scattered during cutting and separation. The storage elastic modulus is a value when the pressure-sensitive adhesive is measured with a viscoelasticity measuring device at 30 ° C.

【0017】また、本出願に係る他の発明の特徴は、上
記主要成分を上記の所定量の範囲内において調整配合す
ることにより得られる粘着剤の有する粘着剤の180度
剥離接着力(剥離速度300mm/分)が20〜300
gf/20mm、好ましくは60〜100gf/20m
mであることである。なお、この値はJIS Z 02
37に準拠したものである。
Another feature of the present invention of the present application is that the adhesive obtained by adjusting and blending the above-mentioned main components within the range of the above-mentioned predetermined amount has a 180-degree peeling adhesive force (peeling speed). 300 mm / min) is 20 to 300
gf / 20mm, preferably 60-100gf / 20m
m. In addition, this value is JIS Z 02.
It is based on 37.

【0018】このような値に限定するのは、かかる値は
粘着剤の組成や厚みによって異なるが、特定することに
よってチップ保持性がさらに向上するためである。かか
る180度剥離接着力(剥離速度300mm/分)があ
まりに大きいと非汚染性が低下しあまりに小さいとダイ
シング時に固定された筈のチップがみだりに飛んでしま
う。
The reason for limiting the value to such a value is that such a value varies depending on the composition and thickness of the pressure-sensitive adhesive, but the chip holding property is further improved by specifying the value. If the 180-degree peeling adhesive force (peeling speed 300 mm / min) is too large, the non-contaminating property is lowered, and if it is too small, the chips that should be fixed during dicing will fly unintentionally.

【0019】なお、本出願にかかる各発明としての粘着
剤を支持する支持体は、従来公知の支持体を適宜選択し
て使用でき、例えばポリ塩化ビニル、ポリエチレンテレ
フタレート、ポリエチレン、ポリプロピレン等のプラス
チックフイルムなどがある。該支持体としての厚みは適
宜変更して使用でき一般に10〜500μmの範囲内か
ら選択される。
As the support for supporting the pressure-sensitive adhesive according to each invention of the present application, a conventionally known support can be appropriately selected and used, and examples thereof include plastic films such as polyvinyl chloride, polyethylene terephthalate, polyethylene and polypropylene. and so on. The thickness of the support can be appropriately changed and used, and is generally selected from the range of 10 to 500 μm.

【0020】[0020]

【実施例】本発明にかかる半導体ウエハ固定用シートの
粘着剤の各実施例と比較例を、主要配合物とその特性値
を表1〜表4に開示しつつ詳細に説明する。なお、各表
における配合物の数値の単位は重量部である。
EXAMPLES Examples and comparative examples of the adhesive for a semiconductor wafer fixing sheet according to the present invention will be described in detail while disclosing main compounds and their characteristic values in Tables 1 to 4. The unit of the numerical value of the compound in each table is parts by weight.

【0021】[0021]

【表1】 [Table 1]

【0022】[0022]

【表2】 [Table 2]

【0023】[0023]

【表3】 [Table 3]

【0024】[0024]

【表4】 [Table 4]

【0025】エラストマとして可塑度(JIS K 6
300)30を有するマレーシア産天然ゴム、粘着付与
樹脂として荒川化学工業社製アルコンP−90(C5C9
水添石油樹脂)を表に示す割合にて配合し、表外の老化
防止剤としての川口化学社製のANTAGE W−50
0を2重量部、トルエン570重量部を添加して攪拌溶
解したものにイソシアネート系硬化剤としての日本ポリ
ウレタン工業社製のCORONATE2067を表に示
す割合にて添加して粘着剤を得た。なお、表3に開示し
た比較例3、比較例4では、粘着付与樹脂として、それ
ぞれテルペン樹脂(安原化学社製YSRESIN 12
50)、テルペンフェノール樹脂(同社YS RESI
N POLY STAR 100)を用いた。
As an elastomer, the plasticity (JIS K 6
300) 30 natural rubber from Malaysia, Arakawa Chemical Co., Ltd. Alcon P-90 (C5C9
Hydrogenated petroleum resin) is mixed in the ratio shown in the table, and ANTAGE W-50 manufactured by Kawaguchi Chemical Co., Ltd. is used as an antiaging agent outside the table.
2 parts by weight of 0 and 570 parts by weight of toluene were added and stirred and dissolved, and CORONATE 2067 manufactured by Nippon Polyurethane Industry Co., Ltd. as an isocyanate-based curing agent was added at a ratio shown in the table to obtain an adhesive. In Comparative Examples 3 and 4 disclosed in Table 3, the terpene resin (YSRESIN 12 manufactured by Yasuhara Chemical Co., Ltd.) was used as the tackifying resin.
50), terpene phenol resin (YS RESI of the same company)
N POLY STAR 100) was used.

【0026】特性値の測定にあっては、上記配合比で作
成した粘着剤を10μmの厚さでポリ塩化ビニルフイル
ムに塗布し100℃、1分間加熱乾燥してたもので行っ
た。
The characteristic values were measured by applying the pressure-sensitive adhesive prepared in the above mixing ratio to a polyvinyl chloride film having a thickness of 10 μm and heating and drying at 100 ° C. for 1 minute.

【0027】特性値における貯蔵弾性率は測定温度30
℃においてレオマトリックファーイースト社製の粘弾性
測定装置ダイナミックアナライザーRDA−11を用い
て測定したものであり、180度剥離接着力(剥離速度
300mm/分)はJISZ 0237に準拠したもの
であり単位はgf/20mmである。
The storage elastic modulus in the characteristic value is measured at a temperature of 30.
The temperature is measured by using a viscoelasticity measuring device Dynamic Analyzer RDA-11 manufactured by Rheomatric Far East Co. at 180 ° C., and the 180-degree peeling adhesive force (peeling speed 300 mm / min) is based on JISZ 0237, and the unit is It is gf / 20mm.

【0028】チップ保持性は、半導体固定用シート上に
厚さ400μmのシリコン製半導体ウエハを貼り付けて
から20分後に0.5mm角チップへとフルカットした
際、チップがまったく飛ばないものを「5」、10%未
満のチップが飛んだものを「4」、10%以上20%未
満のチップが飛んだものを「3」、20%以上50%未
満のチップが飛んだものを「2」、50%以上のチップ
が飛んだものを「1」とした。
The chip-holding property is such that the chip does not fly at all when it is fully cut into 0.5 mm square chips 20 minutes after a silicon semiconductor wafer having a thickness of 400 μm is stuck on the semiconductor fixing sheet. 5 ”, 10% or less than 20% of the chips are skipped“ 4 ”, 10% or more and less than 20% of the chips are skipped“ 3 ”, 20% or more and less than 50% of the chips are skipped“ 2 ” , "1" means that more than 50% of the chips were blown.

【0029】非汚染性は、シリコン製半導体ウエハを粘
着剤に貼り付けてから65℃で7日保存した後に剥離さ
れた際のウエハ表面を顕微鏡200倍で観察したときに
粘着剤が見つけられなかったものを「4」、最大直径2
0μm以上100μm未満の糊の塊があったものを
「3」、最大直径1mm以上の糊の塊があったものを
「2」、ウエハ表面の全面に糊が残っていたものを
「1」とした。
The non-staining property means that no adhesive can be found when observing the surface of the wafer when it is peeled off after the silicon semiconductor wafer is attached to the adhesive and stored at 65 ° C. for 7 days under a microscope of 200 times. "4" for tatami, maximum diameter 2
If there was a glue lump with a diameter of 0 μm or more and less than 100 μm, it was “3”, if there was a glue lump with a maximum diameter of 1 mm or more, it was “2”, and if the glue remained on the entire surface of the wafer, it was “1”. did.

【0030】実施例1〜4では、貯蔵弾性率が3.0×
105〜5.9×106dyn/cm2の範囲で且つ18
0度剥離接着力(剥離速度300mm/分)が20〜3
00gf/20mmの範囲にあるため、チップ保持性に
優れ且つ非汚染性にも優れていた。
In Examples 1 to 4, the storage elastic modulus was 3.0 ×.
In the range of 10 5 to 5.9 × 10 6 dyn / cm 2 and 18
0 degree peeling adhesive strength (peeling speed 300 mm / min) is 20 to 3
Since it was in the range of 00 gf / 20 mm, the chip holding property was excellent and the non-contaminating property was also excellent.

【0031】実施例5〜8の粘着剤は、エラストマ10
0重量部、粘着付与樹脂5〜200重量部及び硬化剤
0.05〜30重量部の配合比で製造されたものである
が、貯蔵弾性率が3.0×105〜5.9×106dyn
/cm2の範囲外であり且つ180度剥離接着力(剥離
速度300mm/分)が20〜300gf/20mmの
範囲外であるため、製品としては本発明の目的を達成す
る範囲にあるがチップ保持性及び/又は非汚染性に若干
劣るものであった。
The pressure-sensitive adhesives of Examples 5 to 8 were the elastomers 10
It was produced at a compounding ratio of 0 parts by weight, 5 to 200 parts by weight of tackifying resin and 0.05 to 30 parts by weight of a curing agent, but the storage elastic modulus is 3.0 × 10 5 to 5.9 × 10. 6 dyn
/ Cm 2 and the 180 degree peeling adhesive strength (peeling speed 300 mm / min) is outside the range of 20 to 300 gf / 20 mm. It was a little inferior in the property and / or the non-staining property.

【0032】比較例1〜4の粘着剤は、主要成分の配合
比が本発明の範囲外であり、貯蔵弾性率及び180°剥
離接着力も上述の範囲外となり、粘着付与樹脂が含まれ
ないとチップ保持性が悪く(比較例1参照)、多いと非
汚染性が悪かった(比較例2参照)。また、硬化剤が多
いとチップ保持性が悪く(比較例3参照)、硬化剤が含
まれないと非汚染性が悪かった(比較例4参照)。
In the pressure-sensitive adhesives of Comparative Examples 1 to 4, the blending ratio of the main components was out of the range of the present invention, the storage elastic modulus and the 180 ° peeling adhesive force were also out of the ranges described above, and the tackifying resin was not included. The chip retention was poor (see Comparative Example 1), and the high number was poor in non-staining property (see Comparative Example 2). Further, when the amount of the curing agent was large, the chip retention was poor (see Comparative Example 3), and when the curing agent was not included, the non-staining property was poor (see Comparative Example 4).

【0033】実施例9〜12は、表4に開示したように
実施例1〜8と同様に調整した粘着剤であり、実施例9
では可塑度が20のマレーシア産天然ゴムを用い、実施
例10〜12では可塑度45のマレーシア産天然ゴムを
用いた。また、粘着付与樹脂として、実施例9及び10
では前述のARKON P−90を用い、実施例11及
び12では前述のYS RESIN 1250及びYS
RESIN POLY STAR 100を各々用い
たものである。なお、表4中の特性値は上述の方法と同
様な方法で行ったものである。
Examples 9 to 12 are pressure sensitive adhesives prepared in the same manner as in Examples 1 to 8 as disclosed in Table 4.
A Malaysian natural rubber having a plasticity of 20 was used, and in Examples 10 to 12, a Malaysian natural rubber having a plasticity of 45 was used. Further, as tackifying resins, Examples 9 and 10 were used.
The above-mentioned ARKON P-90 is used in Examples 11 and 12, and the above-mentioned YS RESIN 1250 and YS are used in Examples 11 and 12.
RESIN POLY STAR 100 was used for each. The characteristic values in Table 4 are obtained by the same method as described above.

【0034】該実施例から明らかなように、エラストマ
の可塑度や粘着付与樹脂自体を変えてもチップ保持性、
非汚染性に優れた粘着剤を得られることができた。
As is clear from the examples, the chip holding property, even when the plasticity of the elastomer or the tackifying resin itself is changed,
It was possible to obtain an adhesive having excellent non-staining properties.

【0035】[0035]

【発明の効果】本発明にかかる半導体ウエハ固定用シー
トの粘着剤は、エラストマ100重量部、粘着付与樹脂
5〜200重量部および硬化剤0.05〜30重量部を
含むことを特徴とし、これによりチップ保持性及び非汚
染性が高く、特に極小のチップへのフルダイシングがで
きるという効果を有する。
The adhesive of the semiconductor wafer fixing sheet according to the present invention is characterized by containing 100 parts by weight of elastomer, 5 to 200 parts by weight of tackifying resin, and 0.05 to 30 parts by weight of curing agent. Therefore, the chip holding property and the non-contaminating property are high, and in particular, there is an effect that full dicing into a very small chip can be performed.

【0036】上記配合比の粘着剤の貯蔵弾性率を3.0
×105〜5.9×106dyn/cm2に特定すること
によって、さらにチップ保持性及び非汚染性が高く、特
に極小のチップへのフルダイシングができるという効果
を有する。
The storage elastic modulus of the pressure-sensitive adhesive having the above compounding ratio is 3.0.
By specifying x10 5 to 5.9x10 6 dyn / cm 2 , the chip holding property and the non-contaminating property are further high, and in particular, there is an effect that full dicing into an extremely small chip can be performed.

【0037】また、他の発明にかかる半導体ウエハ固定
用シートの粘着剤は、上記配合比の粘着剤の半導体ウエ
ハに対する180度剥離接着力(剥離速度300mm/
分)を20〜300gf/20mmに限定し、これによ
りチップ保持性及び非汚染性がさらに高く、特に極小の
チップへのフルダイシングができるという効果を有す
る。
A pressure-sensitive adhesive for a semiconductor wafer fixing sheet according to another invention is a 180-degree peeling adhesive force (peeling speed 300 mm /
(Minute) is limited to 20 to 300 gf / 20 mm, whereby the chip retention and non-contamination are further enhanced, and there is an effect that full dicing into a very small chip can be performed.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 内田 弘之 神奈川県鎌倉市台2丁目13番1号 東洋化 学株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyuki Uchida 2-13-1, Tai, Kamakura City, Kanagawa Toyo Kagaku Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 エラストマ100重量部、粘着付与樹脂
5〜200重量部および硬化剤0.05〜30重量部を
含むことを特徴とする半導体ウエハ固定用シートの粘着
剤。
1. A pressure sensitive adhesive for a semiconductor wafer fixing sheet, comprising 100 parts by weight of an elastomer, 5 to 200 parts by weight of a tackifying resin and 0.05 to 30 parts by weight of a curing agent.
【請求項2】 3.0×105〜5.9×106dyn/
cm2の貯蔵弾性率を有することを特徴とする請求項1
記載の半導体ウエハ固定用シートの粘着剤。
2. 3.0 × 10 5 to 5.9 × 10 6 dyn /
A storage elastic modulus of cm 2 is provided.
An adhesive for a semiconductor wafer fixing sheet as described above.
【請求項3】 半導体ウエハに対する180度剥離接着
力(剥離速度300mm/分)が20〜300gf/2
0mmである請求項1記載の半導体ウエハ固定用シート
の粘着剤。
3. A 180-degree peeling adhesive force (peeling speed 300 mm / min) to a semiconductor wafer is 20 to 300 gf / 2.
The pressure-sensitive adhesive for a sheet for fixing a semiconductor wafer according to claim 1, which has a thickness of 0 mm.
JP04948496A 1995-02-14 1996-02-13 Adhesive for semiconductor wafer fixing sheet and semiconductor wafer fixing sheet Expired - Lifetime JP4040706B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04948496A JP4040706B2 (en) 1995-02-14 1996-02-13 Adhesive for semiconductor wafer fixing sheet and semiconductor wafer fixing sheet

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7-49174 1995-02-14
JP4917495 1995-02-14
JP04948496A JP4040706B2 (en) 1995-02-14 1996-02-13 Adhesive for semiconductor wafer fixing sheet and semiconductor wafer fixing sheet

Publications (2)

Publication Number Publication Date
JPH0912991A true JPH0912991A (en) 1997-01-14
JP4040706B2 JP4040706B2 (en) 2008-01-30

Family

ID=12823703

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (3)

Country Link
JP (1) JP4040706B2 (en)
KR (1) KR100196455B1 (en)
TW (1) TW383332B (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990067950A (en) * 1998-01-19 1999-08-25 가마이 고로 Adhesive sheets for semiconductor device and face-mounting type semiconductor device
JP2001181596A (en) * 1999-12-27 2001-07-03 Nitto Denko Corp Solid-type, pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet thereof
WO2002042389A1 (en) * 2000-11-22 2002-05-30 Mitsui Chemicals,Inc. Wafer machining adhesive tape, and its manufacturing method and using method
JP2005277297A (en) * 2004-03-26 2005-10-06 Lintec Corp Manufacturing method of semiconductor device and dicing adhesive tape
JP2007126679A (en) * 2006-12-26 2007-05-24 Nitto Denko Corp Cross-linked solid type adhesive composition and its adhesive sheet and adhesive sheet for water-proof air-tightness
JP2008098669A (en) * 2007-12-21 2008-04-24 Denki Kagaku Kogyo Kk Method of dicing semiconductor wafer
JP2009529065A (en) * 2006-02-06 2009-08-13 ブルーワー サイエンス アイ エヌ シー. Heat and chemical resistant acid protective coating material and thermoplastic resin adhesive for spin coating
JP2012041552A (en) * 2011-11-14 2012-03-01 Nitto Denko Corp Crosslinked solid-type adhesive composition, adhesive sheet thereof, and method for producing adhesive sheet for water prevention and air tightness
JP7072735B1 (en) * 2021-03-31 2022-05-20 株式会社寺岡製作所 Adhesive composition and adhesive tape

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990067950A (en) * 1998-01-19 1999-08-25 가마이 고로 Adhesive sheets for semiconductor device and face-mounting type semiconductor device
JP2001181596A (en) * 1999-12-27 2001-07-03 Nitto Denko Corp Solid-type, pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet thereof
JP4651767B2 (en) * 1999-12-27 2011-03-16 日東電工株式会社 Solid-type adhesive composition and its adhesive sheet
WO2002042389A1 (en) * 2000-11-22 2002-05-30 Mitsui Chemicals,Inc. Wafer machining adhesive tape, and its manufacturing method and using method
US7358158B2 (en) 2000-11-22 2008-04-15 Mitsui Chemicals, Inc. Wafer machining adhesive tape, and its manufacturing method and using method
JP2005277297A (en) * 2004-03-26 2005-10-06 Lintec Corp Manufacturing method of semiconductor device and dicing adhesive tape
JP2009529065A (en) * 2006-02-06 2009-08-13 ブルーワー サイエンス アイ エヌ シー. Heat and chemical resistant acid protective coating material and thermoplastic resin adhesive for spin coating
JP2007126679A (en) * 2006-12-26 2007-05-24 Nitto Denko Corp Cross-linked solid type adhesive composition and its adhesive sheet and adhesive sheet for water-proof air-tightness
JP2008098669A (en) * 2007-12-21 2008-04-24 Denki Kagaku Kogyo Kk Method of dicing semiconductor wafer
JP2012041552A (en) * 2011-11-14 2012-03-01 Nitto Denko Corp Crosslinked solid-type adhesive composition, adhesive sheet thereof, and method for producing adhesive sheet for water prevention and air tightness
JP7072735B1 (en) * 2021-03-31 2022-05-20 株式会社寺岡製作所 Adhesive composition and adhesive tape
WO2022208814A1 (en) * 2021-03-31 2022-10-06 株式会社寺岡製作所 Pressure-sensitive adhesive composition and pressure-sensitive adhesive tape

Also Published As

Publication number Publication date
JP4040706B2 (en) 2008-01-30
KR960032689A (en) 1996-09-17
TW383332B (en) 2000-03-01
KR100196455B1 (en) 1999-06-15

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