JPH09127184A - Thermal characteristic measuring method and measuring device for semiconductor element - Google Patents

Thermal characteristic measuring method and measuring device for semiconductor element

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Publication number
JPH09127184A
JPH09127184A JP28712395A JP28712395A JPH09127184A JP H09127184 A JPH09127184 A JP H09127184A JP 28712395 A JP28712395 A JP 28712395A JP 28712395 A JP28712395 A JP 28712395A JP H09127184 A JPH09127184 A JP H09127184A
Authority
JP
Japan
Prior art keywords
semiconductor element
junction voltage
thermal characteristic
junction
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28712395A
Other languages
Japanese (ja)
Inventor
Kouji Hidaka
耕慈 日高
Akira Yamazaki
晃 山崎
Shigeki Inui
茂樹 乾
Masakazu Nakao
政和 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP28712395A priority Critical patent/JPH09127184A/en
Publication of JPH09127184A publication Critical patent/JPH09127184A/en
Pending legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To correctly measure the thermal characteristic of a semiconductor element in a short time and to enable measurement of thermal characteristic similar to that in the mounted state. SOLUTION: The measuring device comprises a driving voltage source 1 and an applied current source 2 for supplying electric power to a transistor 10 which is a semiconductor element, a junction voltage detecting part 3 for detecting the junction voltage of the transistor 10, and a supply power control part 20 for regulating the supply power to the transistor 10 so that the junction voltage detected by the junction voltage detecting part 3 is constant. The supply power control part 3 thus regulates the supply power of the driving voltage source 1 and the applied current source 2 to make the junction voltage detected by the junction voltage detecting part 3 constant, thereby, the virtual junction temperature of the transistor 10 can be kept constant in a short time and thermal characteristic can be measured correctly in a short measuring time. Furthermore, a pulse control part 30 is provided, whereby the applied current source 2 is pulse-controlled to intermittently supply power so as to measure the thermal characteristic similar to that in the mounting state.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、トランジスタ等
の半導体素子の熱特性測定方法および測定装置に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for measuring thermal characteristics of semiconductor elements such as transistors.

【0002】[0002]

【従来の技術】従来より半導体装置の設計では、半導体
素子の発熱とパッケージの放熱性の関係が重要な課題で
ある。したがって、半導体素子の熱特性の測定は重要な
評価方法の1つである。以下、従来の半導体素子の熱特
性測定装置について説明する。
2. Description of the Related Art Conventionally, in designing a semiconductor device, the relationship between heat generation of a semiconductor element and heat dissipation of a package has been an important issue. Therefore, the measurement of the thermal characteristics of semiconductor devices is one of the important evaluation methods. Hereinafter, a conventional thermal characteristic measuring device for a semiconductor element will be described.

【0003】図5は従来の半導体素子の熱特性測定装置
の構成を示すブロック図である。図5において、1は駆
動電圧源、2は印加電流源、3は接合電圧検出部、10
は測定対象としての半導体素子の一例のトランジスタで
ある。この従来の半導体素子の熱特性測定装置は、測定
対象であるトランジスタ10のコレクタ端子に駆動電圧
源1を接続し、エミッタ端子に印加電流源2を接続し、
ベース端子に接合電圧検出部3を接続している。そし
て、接合電圧検出部3で、トランジスタ10のベース・
エミッタ間電圧を検出するようになっている。
FIG. 5 is a block diagram showing the structure of a conventional semiconductor element thermal characteristic measuring apparatus. In FIG. 5, 1 is a drive voltage source, 2 is an applied current source, 3 is a junction voltage detection unit, and 10 is a junction voltage detection unit.
Is a transistor as an example of a semiconductor element as a measurement target. In this conventional semiconductor element thermal characteristic measuring apparatus, a driving voltage source 1 is connected to a collector terminal of a transistor 10 to be measured, and an applied current source 2 is connected to an emitter terminal,
The junction voltage detector 3 is connected to the base terminal. Then, in the junction voltage detection unit 3, the base of the transistor 10
It is designed to detect the voltage between the emitters.

【0004】以上のように構成された従来の半導体素子
の熱特性測定装置を用いた場合の測定方法を、以下に説
明する。駆動電圧源1および印加電流源2により、一定
電力をトランジスタ10に供給する。そして、接合電圧
検出部3では、トランジスタ10のベース・エミッタ間
の接合電圧を検出する。トランジスタ10等の半導体素
子の熱抵抗は、駆動電圧と、印加電流値と、電力供給前
の接合電圧値と電力供給後に半導体素子の発熱により変
動した接合電圧値との差とにより算出される。
A measuring method using the conventional thermal characteristic measuring apparatus for a semiconductor device having the above-mentioned structure will be described below. A constant power is supplied to the transistor 10 by the driving voltage source 1 and the applied current source 2. Then, the junction voltage detector 3 detects the junction voltage between the base and emitter of the transistor 10. The thermal resistance of the semiconductor element such as the transistor 10 is calculated by the drive voltage, the applied current value, and the difference between the junction voltage value before power supply and the junction voltage value that fluctuates due to heat generation of the semiconductor element after power supply.

【0005】図6は図5の半導体素子の熱特性測定装置
を用いた場合の熱特性測定結果を示す図であり、図6
(a),(b),(c)はそれぞれ熱抵抗,供給電力,
接合温度のタイムチャートである。なお、コレクタ・ベ
ース間の接合電圧をVCB,コレクタ電流をIC とする
と、コレクタ損失PC はPC =VCB×IC となり、熱抵
抗(Rth)は、コレクタ損失PC による接合温度上昇を
ΔTj とすると、Rth=ΔTj /PC で表される。ま
た、ベース・エミッタ間の接合電圧をVBE,半導体素子
の温度係数をKとすると、接合温度(Tj )は、Tj
BE/Kで表される。したがって、VCBとVBEを測定し
ている。
FIG. 6 is a diagram showing the thermal characteristic measurement results when the semiconductor element thermal characteristic measuring apparatus of FIG. 5 is used.
(A), (b), (c) are thermal resistance, supply power,
It is a time chart of joining temperature. If the junction voltage between the collector and the base is V CB and the collector current is I C , the collector loss P C is P C = V CB × I C , and the thermal resistance (R th ) is the junction due to the collector loss P C. If the temperature rise is ΔT j , then R th = ΔT j / P C. When the junction voltage between the base and the emitter is V BE and the temperature coefficient of the semiconductor element is K, the junction temperature (T j ) is T j =
It is represented by V BE / K. Therefore, V CB and V BE are measured.

【0006】[0006]

【発明が解決しようとする課題】上記従来の熱特性測定
装置では、所定の電力を供給することによって測定時間
が100秒を超えると、半導体素子の発熱が飽和し、正
確な熱測定が可能であった。しかし、測定時間が100
秒以下の短時間では、接合温度のばらつきにより発振が
起こりやすく、正確な熱特性の測定ができないという問
題があった。
In the above-mentioned conventional thermal characteristic measuring device, when the measuring time exceeds 100 seconds by supplying a predetermined electric power, the heat generation of the semiconductor element is saturated, and accurate thermal measurement is possible. there were. However, the measurement time is 100
In a short time of less than a second, there is a problem that oscillation is likely to occur due to the variation of the junction temperature and accurate thermal characteristics cannot be measured.

【0007】また、半導体素子が回路内に実装された場
合の供給電力は断続的に供給されるため、従来の熱特性
測定装置では実装状態での熱特性の測定はできないとい
う問題があった。この発明の目的は、短い測定時間でも
正確な熱特性の測定を行うことができる半導体素子の熱
特性測定方法および測定装置を提供することと、さらに
は実装状態と同様の熱特性の測定を行うことができる半
導体素子の熱特性測定方法および測定装置を提供するこ
とである。
Further, since the power supplied when the semiconductor element is mounted in the circuit is intermittently supplied, there is a problem that the conventional thermal characteristic measuring device cannot measure the thermal characteristic in the mounted state. An object of the present invention is to provide a thermal characteristic measuring method and a measuring device for a semiconductor element capable of accurately measuring a thermal characteristic even in a short measuring time, and further to measure a thermal characteristic similar to a mounted state. It is an object of the present invention to provide a method and an apparatus for measuring the thermal characteristics of a semiconductor device that can perform the measurement.

【0008】[0008]

【課題を解決するための手段】請求項1記載の半導体素
子の熱特性測定方法は、半導体素子に電力を供給して半
導体素子の接合電圧を検出しながら、接合電圧を一定に
するように半導体素子へ供給する電力を調整するように
している。このように、半導体素子への供給電力を調整
して接合電圧を一定にすることにより、短時間で半導体
素子の接合温度のばらつきを無くして一定に保つことが
でき、短い測定時間でも正確な熱特性の測定を行うこと
ができる。
According to a first aspect of the present invention, there is provided a semiconductor element thermal characteristic measuring method, wherein a semiconductor element is supplied with electric power to detect the junction voltage of the semiconductor element and to keep the junction voltage constant. The power supplied to the device is adjusted. In this way, by adjusting the power supply to the semiconductor element to keep the junction voltage constant, it is possible to keep the junction temperature of the semiconductor element constant in a short time and keep it constant. A property measurement can be performed.

【0009】請求項2記載の半導体素子の熱特性測定方
法は、請求項1記載の半導体素子の熱特性測定方法にお
いて、半導体素子への電力供給を断続的に行うことを特
徴とする。これにより、実装状態と同様の熱特性の測定
を行うことができる。請求項3記載の半導体素子の熱特
性測定装置は、半導体素子に電力を供給する電力供給部
と、半導体素子の接合電圧を検出する接合電圧検出部
と、接合電圧検出部により検出される接合電圧を一定に
するように電力供給部の半導体素子へ供給する電力を調
整する供給電力制御部とを備えている。このように、供
給電力制御部が、電力供給部の半導体素子へ供給する電
力を調整して接合電圧検出部により検出される接合電圧
を一定にすることにより、短時間で半導体素子の接合温
度のばらつきを無くして一定に保つことができ、短い測
定時間でも正確な熱特性の測定を行うことができる。
According to a second aspect of the present invention, there is provided a semiconductor element thermal characteristic measuring method according to the first aspect, wherein the semiconductor element thermal characteristic measuring method is characterized in that power is intermittently supplied to the semiconductor element. This makes it possible to measure thermal characteristics similar to those in the mounted state. The thermal characteristic measuring apparatus for a semiconductor element according to claim 3, wherein a power supply section that supplies power to the semiconductor element, a junction voltage detecting section that detects a junction voltage of the semiconductor element, and a junction voltage detected by the junction voltage detecting section. And a supply power control unit that adjusts the power supplied to the semiconductor element of the power supply unit so as to keep constant. In this way, the power supply control unit adjusts the power supplied to the semiconductor element of the power supply unit to keep the junction voltage detected by the junction voltage detection unit constant, so that the junction temperature of the semiconductor element can be reduced in a short time. It is possible to eliminate variations and keep constant, and it is possible to accurately measure thermal characteristics even in a short measurement time.

【0010】請求項4記載の半導体素子の熱特性測定装
置は、請求項3記載の半導体素子の熱特性測定装置にお
いて、半導体素子への電力供給を断続的に行うように電
力供給部をパルス制御するパルス制御部を設けたことを
特徴とする。このように、半導体素子への電力供給を断
続的に行うことにより、実装状態と同様の熱特性の測定
を行うことができる。
According to a fourth aspect of the present invention, there is provided a semiconductor element thermal characteristic measuring apparatus according to the third aspect, wherein the semiconductor element thermal characteristic measuring apparatus is pulse-controlled so as to intermittently supply electric power to the semiconductor element. It is characterized in that a pulse control unit is provided. In this way, by intermittently supplying power to the semiconductor element, it is possible to measure the thermal characteristics similar to the mounted state.

【0011】[0011]

【発明の実施の形態】以下、この発明の実施の形態につ
いて、図面を参照しながら説明する。図1はこの発明の
実施の形態における半導体素子の熱特性測定装置の構成
を示すブロック図である。図1において、1は駆動電圧
源(電力供給部)、2は印加電流源(電力供給部)、3
はトランジスタ10のベース・エミッタ間の接合電圧を
検出する接合電圧検出部、10は測定対象としての半導
体素子の一例であるトランジスタ、20は接合電圧検出
部3により検出される接合電圧を一定にするように駆動
電圧源1および印加電流源2のトランジスタ10へ供給
する電力を調整する供給電力制御部、30はトランジス
タ10への電力供給を断続的に行うように電力供給部を
パルス制御するパルス制御部である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a block diagram showing the configuration of a semiconductor element thermal characteristic measuring apparatus according to an embodiment of the present invention. In FIG. 1, 1 is a drive voltage source (power supply unit), 2 is an applied current source (power supply unit), 3
Is a junction voltage detection unit that detects the junction voltage between the base and emitter of the transistor 10, 10 is a transistor that is an example of a semiconductor element as a measurement target, and 20 is a constant junction voltage detected by the junction voltage detection unit 3. A power supply control unit that adjusts the power supplied to the transistor 10 of the driving voltage source 1 and the applied current source 2 as described above, and 30 is a pulse control that pulse-controls the power supply unit to intermittently supply the power to the transistor 10. It is a department.

【0012】この図1の半導体素子の熱特性測定装置
は、図5の構成に加え、駆動電圧源1,印加電流源2お
よび接合電圧検出部3に接続した供給電力制御部20
と、印加電流源2に接続したパルス制御部30とを設け
ている。以上のように構成される半導体素子の熱特性測
定装置を用いた場合の測定方法を、以下に説明する。
In addition to the configuration shown in FIG. 5, the semiconductor element thermal characteristic measuring apparatus of FIG. 1 has a supply power control section 20 connected to a driving voltage source 1, an applied current source 2 and a junction voltage detecting section 3.
And a pulse control unit 30 connected to the applied current source 2. A measuring method using the thermal characteristic measuring apparatus for a semiconductor element configured as described above will be described below.

【0013】まず、供給電力制御部20に接合温度設定
120℃、測定時間範囲設定0.1秒から100秒を入
力すると、供給電力制御部20が接合電圧検出部3から
接合電圧を読み取る。そして、接合電圧を一定に保つよ
うに、言い換えれば接合温度を一定に保つように、供給
電力制御部20が、駆動電圧源1および印加電流源2の
供給電力を調整する。例えば、測定時間1秒のときに供
給電力100W、測定時間10秒のときに供給電力10
Wというように、接合電圧の変化に応じて供給電力を調
整して、接合電圧を一定に保つようにする。
First, when a junction temperature setting of 120 ° C. and a measurement time range setting of 0.1 seconds to 100 seconds are input to the supply power control section 20, the supply power control section 20 reads the junction voltage from the junction voltage detection section 3. Then, the supplied power control unit 20 adjusts the supplied power of the driving voltage source 1 and the applied current source 2 so as to keep the junction voltage constant, in other words, keep the junction temperature constant. For example, when the measurement time is 1 second, the supplied power is 100 W, and when the measurement time is 10 seconds, the supplied power is 10 W.
Like W, the supplied power is adjusted according to the change of the junction voltage so that the junction voltage is kept constant.

【0014】図2は図1の半導体素子の熱特性測定装置
を用いた場合の熱特性測定結果を示す図であり、図2
(a),(b),(c)はそれぞれ熱抵抗,供給電力,
接合温度のタイムチャートである。以上のようにこの実
施の形態によれば、接合温度を一定に保つために、接合
電圧に応じて供給電力を調整することにより、発振の影
響を受けることもなく、短時間で半導体素子(トランジ
スタ10)の接合温度のばらつきを無くして一定に保つ
ことができ、短い測定時間でも正確な熱特性の測定を行
うことができる。
FIG. 2 is a diagram showing the thermal characteristic measurement results when the thermal characteristic measuring apparatus for semiconductor elements shown in FIG. 1 is used.
(A), (b), (c) are thermal resistance, supply power,
It is a time chart of joining temperature. As described above, according to this embodiment, in order to keep the junction temperature constant, the supply power is adjusted according to the junction voltage, so that the semiconductor element (transistor (transistor) It is possible to eliminate the variation in the bonding temperature of 10) and keep it constant, and it is possible to perform accurate measurement of the thermal characteristics even in a short measurement time.

【0015】さらに、パルス制御部30に、パルス幅設
定を10μ秒、周期設定を30μ秒、測定時間設定を
0.1秒から100秒と入力すると、パルス制御部30
は測定を行っている間は、印加電流源2を制御し、パル
ス幅10μ秒、周期30μ秒の断続電流をトランジスタ
10に印加して、熱抵抗の測定を行う。したがって、図
3に示すように、断続的に電力を供給することにより、
実装状態と同様の熱特性の測定を行うことができる。
Further, when the pulse width is set to 10 μs, the period is set to 30 μs, and the measurement time is set to 0.1 to 100 seconds, the pulse control unit 30 is input to the pulse control unit 30.
During the measurement, the applied current source 2 is controlled to apply the intermittent current having the pulse width of 10 μsec and the period of 30 μsec to the transistor 10 to measure the thermal resistance. Therefore, as shown in FIG. 3, by intermittently supplying electric power,
It is possible to measure the thermal characteristics similar to the mounted state.

【0016】なお、図1では、パルス制御部30を印加
電流源2に接続してパルス制御するようにしたが、図4
に示すように、パルス制御部30を駆動電圧源1に接続
してパルス制御するようにしても、図1と同様、断続的
に電力を供給し、実装状態と同様の熱特性の測定を行う
ことができる。なお、上記実施の形態において、測定対
象の半導体素子をトランジスタ10としたが、これに限
らず、他の半導体素子を測定対象としてもよい。
In FIG. 1, the pulse control unit 30 is connected to the applied current source 2 for pulse control.
Even if the pulse control unit 30 is connected to the driving voltage source 1 to perform pulse control as shown in FIG. 5, power is intermittently supplied, and thermal characteristics similar to those in the mounted state are measured, as in FIG. be able to. Although the semiconductor element to be measured is the transistor 10 in the above embodiment, the present invention is not limited to this, and another semiconductor element may be the target to be measured.

【0017】[0017]

【発明の効果】この発明の半導体素子の熱特性測定方法
は、半導体素子への供給電力を調整して接合電圧を一定
にすることにより、短時間で半導体素子の接合温度のば
らつきを無くして一定に保つことができ、短い測定時間
でも正確な熱特性の測定を行うことができる。さらに、
半導体素子への電力供給を断続的に行うことにより、実
装状態と同様の熱特性の測定を行うことができる。
According to the method for measuring the thermal characteristics of a semiconductor element of the present invention, the electric power supplied to the semiconductor element is adjusted to make the junction voltage constant, so that the junction temperature of the semiconductor element can be kept constant in a short time. Therefore, the thermal characteristics can be accurately measured even in a short measurement time. further,
By intermittently supplying electric power to the semiconductor element, it is possible to measure thermal characteristics similar to the mounted state.

【0018】また、この発明の半導体素子の熱特性測定
装置は、供給電力制御部が、電力供給部の半導体素子へ
供給する電力を調整して接合電圧検出部により検出され
る接合電圧を一定にすることにより、短時間で半導体素
子の接合温度のばらつきを無くして一定に保つことがで
き、短い測定時間でも正確な熱特性の測定を行うことが
できる。さらに、パルス制御部を設け、電力供給部をパ
ルス制御して半導体素子への電力供給を断続的に行うこ
とにより、実装状態と同様の熱特性の測定を行うことが
できる。
Further, in the semiconductor element thermal characteristic measuring apparatus according to the present invention, the supply power control section adjusts the power supplied to the semiconductor element of the power supply section to make the junction voltage detected by the junction voltage detection section constant. By doing so, it is possible to eliminate the variation in the junction temperature of the semiconductor element and keep it constant in a short time, and it is possible to accurately measure the thermal characteristics even in a short measurement time. Furthermore, by providing a pulse control unit and performing pulse control of the power supply unit to intermittently supply power to the semiconductor element, it is possible to measure thermal characteristics similar to the mounted state.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施の形態における半導体素子の熱
特性測定装置の構成を示すブロック図。
FIG. 1 is a block diagram showing the configuration of a semiconductor element thermal characteristic measuring apparatus according to an embodiment of the present invention.

【図2】この発明の実施の形態における半導体素子の熱
特性測定装置を用いた場合の熱特性測定結果を示す図。
FIG. 2 is a diagram showing a thermal characteristic measurement result when the thermal characteristic measuring apparatus for a semiconductor element according to the embodiment of the present invention is used.

【図3】この発明の実施の形態におけるパルス制御部の
動作を説明するための図。
FIG. 3 is a diagram for explaining the operation of the pulse control unit in the embodiment of the present invention.

【図4】この発明の実施の形態における他の半導体素子
の熱特性測定装置の構成を示すブロック図。
FIG. 4 is a block diagram showing a configuration of a thermal characteristic measuring apparatus for another semiconductor element according to the embodiment of the present invention.

【図5】従来の半導体素子の熱特性測定装置の構成を示
すブロック図。
FIG. 5 is a block diagram showing a configuration of a conventional semiconductor element thermal characteristic measuring apparatus.

【図6】従来の半導体素子の熱特性測定装置を用いた場
合の熱特性測定結果を示す図。
FIG. 6 is a diagram showing a thermal characteristic measurement result when a conventional semiconductor element thermal characteristic measuring apparatus is used.

【符号の説明】[Explanation of symbols]

1 駆動電圧源(電力供給部) 2 印加電流源(電力供給部) 3 接合電圧検出部 10 トランジスタ(半導体素子) 20 供給電力制御部 30 パルス制御部 1 Drive Voltage Source (Power Supply Unit) 2 Applied Current Source (Power Supply Unit) 3 Junction Voltage Detection Unit 10 Transistor (Semiconductor Element) 20 Supply Power Control Unit 30 Pulse Control Unit

フロントページの続き (72)発明者 中尾 政和 大阪府高槻市幸町1番1号 松下電子工業 株式会社内Front page continuation (72) Inventor Masakazu Nakao 1-1, Saiwaicho, Takatsuki City, Osaka Prefecture Matsushita Electronics Industrial Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半導体素子に電力を供給して前記半導体
素子の接合電圧を検出しながら、前記接合電圧を一定に
するように前記半導体素子へ供給する電力を調整する半
導体素子の熱特性測定方法。
1. A method for measuring thermal characteristics of a semiconductor device, which comprises supplying power to a semiconductor device to detect a junction voltage of the semiconductor device and adjusting power supplied to the semiconductor device so as to keep the junction voltage constant. .
【請求項2】 半導体素子への電力供給を断続的に行う
ことを特徴とする請求項1記載の半導体素子の熱特性測
定方法。
2. The method for measuring thermal characteristics of a semiconductor device according to claim 1, wherein power supply to the semiconductor device is intermittently performed.
【請求項3】 半導体素子に電力を供給する電力供給部
と、前記半導体素子の接合電圧を検出する接合電圧検出
部と、前記接合電圧検出部により検出される接合電圧を
一定にするように前記電力供給部の前記半導体素子へ供
給する電力を調整する供給電力制御部とを備えた半導体
素子の熱特性測定装置。
3. A power supply section for supplying power to a semiconductor element, a junction voltage detection section for detecting a junction voltage of the semiconductor element, and a junction voltage detected by the junction voltage detection section so as to be constant. An apparatus for measuring thermal characteristics of a semiconductor device, comprising: a power supply control unit that adjusts power supplied to the semiconductor device by a power supply unit.
【請求項4】 半導体素子への電力供給を断続的に行う
ように電力供給部をパルス制御するパルス制御部を設け
たことを特徴とする請求項3記載の半導体素子の熱特性
測定装置。
4. The thermal characteristic measuring apparatus for a semiconductor device according to claim 3, further comprising a pulse control unit for controlling the pulse of the power supply unit so as to intermittently supply the power to the semiconductor device.
JP28712395A 1995-11-06 1995-11-06 Thermal characteristic measuring method and measuring device for semiconductor element Pending JPH09127184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28712395A JPH09127184A (en) 1995-11-06 1995-11-06 Thermal characteristic measuring method and measuring device for semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28712395A JPH09127184A (en) 1995-11-06 1995-11-06 Thermal characteristic measuring method and measuring device for semiconductor element

Publications (1)

Publication Number Publication Date
JPH09127184A true JPH09127184A (en) 1997-05-16

Family

ID=17713376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28712395A Pending JPH09127184A (en) 1995-11-06 1995-11-06 Thermal characteristic measuring method and measuring device for semiconductor element

Country Status (1)

Country Link
JP (1) JPH09127184A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103616628A (en) * 2013-11-21 2014-03-05 北京工业大学 Method and device for measuring temperature rising and heat resistance of Schottky grid field effect transistor
CN106054051A (en) * 2016-06-09 2016-10-26 北京工业大学 Method for measuring junction temperature of semiconductor device under condition of surge current
CN106054052A (en) * 2016-06-09 2016-10-26 北京工业大学 Semiconductor device temperature-voltage-current three-dimensional temperature-adjusting curve surface establishment method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103616628A (en) * 2013-11-21 2014-03-05 北京工业大学 Method and device for measuring temperature rising and heat resistance of Schottky grid field effect transistor
CN106054051A (en) * 2016-06-09 2016-10-26 北京工业大学 Method for measuring junction temperature of semiconductor device under condition of surge current
CN106054052A (en) * 2016-06-09 2016-10-26 北京工业大学 Semiconductor device temperature-voltage-current three-dimensional temperature-adjusting curve surface establishment method

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