JPH08299951A - Ultraviolet ray irradiating device - Google Patents
Ultraviolet ray irradiating deviceInfo
- Publication number
- JPH08299951A JPH08299951A JP7105746A JP10574695A JPH08299951A JP H08299951 A JPH08299951 A JP H08299951A JP 7105746 A JP7105746 A JP 7105746A JP 10574695 A JP10574695 A JP 10574695A JP H08299951 A JPH08299951 A JP H08299951A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- laser
- gas
- ultraviolet rays
- discharged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Landscapes
- Physical Water Treatments (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、紫外線を用いて超純水
装置や排水処理回収装置や原子力発電所一次冷却水等の
中の有機物質（ＴＯＣ）を分解するのに好適な紫外線照
射装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet irradiation device suitable for decomposing organic substances (TOC) in ultrapure water devices, wastewater treatment and recovery devices, nuclear power plant primary cooling water, etc. using ultraviolet rays. Regarding
【０００２】[0002]
【従来の技術、背景および発明が解決しようとする課
題】紫外線の一般的な光源としては、水素、希ガス、水
銀などの放電管が用いられており、例えば水素放電管で
は５６０ｎｍから１６８ｎｍの範囲の範囲の強い連続ス
ペクトルと１００ｎｍ付近の多数の線スペクトルが得ら
れ、希ガスとしてＸｅガスを用いた場合、１７２ｎｍの
単一波長の紫外線が発生する。2. Description of the Related Art Discharge tubes of hydrogen, rare gas, mercury, etc. are used as a general light source of ultraviolet rays. For example, in the case of hydrogen discharge tubes, the range of 560 nm to 168 nm is used. A strong continuous spectrum in the range of 1 and many line spectra around 100 nm are obtained, and when Xe gas is used as a rare gas, ultraviolet rays having a single wavelength of 172 nm are generated.
【０００３】ところで、誘電体である媒質中に電流が流
れる現象である放電を起こすためには、絶縁破壊を起こ
すために一定の電場を生成する必要がある。例えば、空
気中で放電を起こすためには、平等電界では１cm当たり
およそ３０ｋＶの電位差が必要であると言われている。
しかし、そのためには高電圧を発生させるための大規模
な交流電源設備が必要であり、かかる電極による放電方
式のみではエネルギー密度が低いため、効率もあまり高
くない。By the way, in order to cause discharge, which is a phenomenon in which a current flows in a medium which is a dielectric, it is necessary to generate a constant electric field in order to cause dielectric breakdown. For example, it is said that a potential difference of about 30 kV per cm is required in a uniform electric field to cause a discharge in air.
However, for that purpose, a large-scale AC power supply facility for generating a high voltage is required, and since the energy density is low only by the discharge method using such electrodes, the efficiency is not so high.
【０００４】この点に関してレーザ光は、「単色光で
ある。指向性がよい。集光性がよい。エネルギー
密度が高い。干渉性がよい。光エネルギーを短時間
に集中できる。」等の自然光では得られない特性を有す
るため、計測・レーダー用として、あるいは切断・溶接
・表面処理用として多方面に応用されており、このよう
に優れた特性を有するレーザ光の高密度エネルギーを放
電に利用すれば、極めて高効率で放電を行いうることが
期待できる。In this respect, the laser light is natural light such as "monochromatic light. Good directivity. Good condensing property. High energy density. Good coherence. Light energy can be concentrated in a short time." Since it has characteristics that cannot be obtained by various methods, it has been applied in various fields for measurement / radar, cutting / welding / surface treatment, etc. If so, it can be expected that discharge can be performed with extremely high efficiency.
【０００５】本発明はこのような現況に鑑みてなされた
ものであって、その目的は、従来の大規模交流電源設備
に代えてレーザ装置で励起・発振させたレーザ光の高密
度エネルギーを放電のための主たるエネルギーとして利
用した高放電効率の紫外線照射装置を提供することにあ
る。The present invention has been made in view of the above circumstances, and its object is to discharge high-density energy of laser light excited and oscillated by a laser device in place of conventional large-scale AC power supply equipment. It is an object of the present invention to provide an ultraviolet irradiation device having high discharge efficiency, which is used as a main energy for
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に本発明の要旨は、レーザ装置から放出されるレーザ光
の経路中に、ガスを封入した紫外線透過材料からなる容
器を配置したことを特徴とする紫外線照射装置を第一の
発明とし、上記第一の発明において、容器内に一対のグ
ラスライニング電極を配置したことを特徴とする紫外線
照射装置を第二の発明とする。In order to achieve the above object, the gist of the present invention is to arrange a container made of an ultraviolet-transparent material in which a gas is enclosed in the path of laser light emitted from a laser device. A characteristic ultraviolet ray irradiation device is a first invention, and in the above first invention, an ultraviolet ray irradiation device characterized in that a pair of glass lining electrodes is arranged in a container is a second invention.
【０００７】封入ガスとしては、Ｎ2 、Ｈ2 、Ｄ2 （重
水素）、Ｈｅ、Ｎｅ、Ａｒ、Ｋｒ、Ｘｅ、Ｆ2 、Ｃ
ｌ2 、Ｂｒ2 、ＨＣｌ、ＳＦ6 等の単独のものまたは複
数を混合したものを使用することができる。好ましく
は、希ガスまたは希ガスとハロゲンガスとの混合ガスを
封入するのがよい。The enclosed gas is N 2 , H 2 , D 2 (deuterium), He, Ne, Ar, Kr, Xe, F 2 , C
Any one of l 2 , Br 2 , HCl, SF 6 and the like or a mixture of a plurality thereof may be used. It is preferable to fill a rare gas or a mixed gas of a rare gas and a halogen gas.
【０００８】紫外線透過材料としては、例えば、石英ガ
ラスまたはＣａＦ2 を使用することができる。As the ultraviolet transmitting material, for example, quartz glass or CaF 2 can be used.
【０００９】[0009]
【作用】レーザ装置から放出されるレーザ光により紫外
線透過材料からなる容器内のガスはいわゆるプラズマ状
態となる。そのエネルギーにより、封入ガスとして希ガ
スまたは希ガスとハロゲンガスとの混合ガスを用いた場
合、これらのガスが励起されて２量体（いわゆる「エキ
シマ」）が生成し、そのエキシマが分解するとき、単一
波長の紫外線が発生する。この場合、容器内に一対のグ
ラスライニング電極を配置し、容器内にレーザ光を照射
するとともにグラスライニング電極による放電エネルギ
ーを補助的に利用すれば、より強力な紫外線照射装置と
なる。このようにして発生した紫外線は、有機物の分解
等に利用することができる。The laser light emitted from the laser device causes the gas in the container made of the ultraviolet transparent material to be in a so-called plasma state. When a rare gas or a mixed gas of a rare gas and a halogen gas is used as a sealed gas due to the energy, when these gases are excited to form a dimer (so-called “excimer”) and the excimer decomposes. , Ultraviolet rays with a single wavelength are generated. In this case, by arranging a pair of glass lining electrodes in the container, irradiating the inside of the container with a laser beam and supplementarily utilizing discharge energy from the glass lining electrodes, a more powerful ultraviolet irradiation device can be obtained. The ultraviolet rays thus generated can be used for decomposition of organic substances and the like.
【００１０】[0010]
【実施例】以下に本発明の実施例を説明する。図１は、
レーザ装置として、気体レーザ装置の１種であるエキシ
マレーザ装置を使用した場合の一例を示す概略構成図で
ある。エキシマレーザ装置には電子ビーム励起方式と放
電励起方式があり、本実施例では電子ビーム励起方式の
構造例を示す。図１において、エキシマレーザ装置１は
カソード２から放出される熱電子を加速電極３で加速
し、偏向コイル４、集束コイル５および偏向コイル６に
よって作られる磁界で収束して電子ビームを作り、これ
を装置内のガスに照射（電子衝突）してエキシマ状態を
作るものである。８は反射側ミラー、９は出力側ミラー
である。電子ビームを使っての励起の特徴は、通常の放
電状態では得ることのできないハイパワーな励起が可能
で、励起効率がよいことである。もちろん、エキシマレ
ーザ装置以外の他の気体レーザ装置、例えばＨｅ−Ｎｅ
レーザ装置やＡｒレーザ装置やＣＯ2 レーザ装置を使用
することも可能であり、さらに、固体レーザ装置であ
る、ルビーレーザ装置やＮｄ−ＹＡＧレーザ装置やＮｄ
−ガラスレーザ装置等を使用することも可能であり、さ
らには半導体レーザ素子や液体レーザ装置を使用するこ
とも可能である。Embodiments of the present invention will be described below. Figure 1
It is a schematic block diagram which shows an example at the time of using the excimer laser apparatus which is 1 type of a gas laser apparatus as a laser apparatus. The excimer laser device has an electron beam excitation method and a discharge excitation method, and this embodiment shows an example of the structure of the electron beam excitation method. In FIG. 1, an excimer laser device 1 accelerates thermoelectrons emitted from a cathode 2 with an accelerating electrode 3 and converges them with a magnetic field created by a deflection coil 4, a focusing coil 5 and a deflection coil 6 to form an electron beam. The gas inside the device is irradiated (electron collision) to create an excimer state. Reference numeral 8 is a reflection side mirror, and 9 is an output side mirror. A characteristic of excitation using an electron beam is that high-power excitation, which cannot be obtained in a normal discharge state, is possible and the excitation efficiency is good. Of course, a gas laser device other than the excimer laser device, for example, He-Ne
It is also possible to use a laser device, an Ar laser device, or a CO 2 laser device, and further, a solid-state laser device such as a ruby laser device, an Nd-YAG laser device, or an Nd laser device.
-A glass laser device or the like can be used, and further, a semiconductor laser element or a liquid laser device can also be used.
【００１１】図１において、１０は出力側ミラー９から
放出されるレーザ光を反射する反射ミラー、１１は石英
ガラス製容器、１２は石英ガラス製レンズである。石英
ガラス製容器１１内には管路１３を経てガスが封入さ
れ、管路１４を経て封入ガスは排出される。１５は被処
理水を貯留する水槽である。In FIG. 1, 10 is a reflection mirror for reflecting the laser beam emitted from the output side mirror 9, 11 is a quartz glass container, and 12 is a quartz glass lens. Gas is enclosed in the quartz glass container 11 via a pipe 13, and the enclosed gas is discharged via a pipe 14. Reference numeral 15 is a water tank for storing water to be treated.
【００１２】以上のように構成される紫外線照射装置を
用いて紫外線照射実験を行ったので、以下に説明する。
管路１３よりＸｅガスを石英ガラス製容器１１内に封入
し、水槽１５内には管路１６から約２００ｐｐｂ濃度の
有機物を含有する原水を通入した。そして、エキシマレ
ーザ装置１において所定条件の下で励起・発振させ、出
力側ミラー９を経て放出されたレーザ光を反射ミラー１
０で反射し、経路１８および石英ガラス製レンズ１２を
経て石英ガラス製容器１１内に入射させた。その結果、
容器１１内のＸｅガスは励起されてエキシマが生成する
とともに速やかに分解して、１７２ｎｍの単一波長の紫
外線が発生した。この紫外線は石英ガラス製容器１１を
透過して水槽１５内の被処理水に照射され、有機物の化
学変化が効率的に行われた結果、管路１７から取り出し
た水の中の有機物濃度を調べると、約１０ｐｐｂとなっ
ていた。An ultraviolet irradiation experiment was carried out using the ultraviolet irradiation device constructed as described above, and will be described below.
Xe gas was sealed in the quartz glass container 11 through the pipe line 13, and raw water containing an organic substance having a concentration of about 200 ppb was introduced into the water tank 15 through the pipe line 16. Then, the excimer laser device 1 is excited and oscillated under a predetermined condition, and the laser light emitted through the output side mirror 9 is reflected by the reflection mirror 1.
It was reflected at 0 and was made incident on the inside of the quartz glass container 11 through the path 18 and the quartz glass lens 12. as a result,
The Xe gas in the container 11 was excited to generate excimers and rapidly decomposed to generate ultraviolet rays having a single wavelength of 172 nm. The ultraviolet rays pass through the quartz glass container 11 and are irradiated to the water to be treated in the water tank 15, and as a result of the efficient chemical change of the organic substances, the concentration of the organic substances in the water taken out from the pipeline 17 is examined. It was about 10 ppb.
【００１３】図２は本発明の他の実施例を示し、図１の
装置との違いは石英ガラス製容器１１内に一対のグラス
ライニング電極１９を有する点であり、交流電源２０か
ら絶縁被覆電線２１を経て一対のグラスライニング電極
１９、１９間に所定電圧が印加される。グラスライニン
グ電極１９は金属板の全面にグラスライニングを施した
ものである。FIG. 2 shows another embodiment of the present invention, which is different from the apparatus of FIG. 1 in that a pair of glass lining electrodes 19 are provided in a quartz glass container 11 and an AC power source 20 to an insulation-coated electric wire. A predetermined voltage is applied between the pair of glass lining electrodes 19, 19 via 21. The glass lining electrode 19 is formed by subjecting the entire surface of a metal plate to glass lining.
【００１４】このように構成される紫外線照射装置を用
いて紫外線照射実験を行ったので、以下に説明する。管
路１３よりＸｅガスを石英ガラス製容器１１内に封入
し、水槽１５内には管路１６から原子力発電所一次冷却
水を通入した。そして、エキシマレーザ装置１において
所定条件の下で励起・発振させ、出力側ミラー９を経て
放出されたレーザ光を反射ミラー１０で反射し、経路１
８および石英ガラス製レンズ１２を経て石英ガラス製容
器１１内に入射させるとともに、交流電源２０により電
極１９、１９間に５ｋＶ、２０ｋＨｚの電圧を印加し
た。その結果、電極１９、１９間に放電が起こり、レー
ザ光の高密度エネルギーとの相乗効果により、容器１１
内のＸｅガスは励起されてエキシマが生成するとともに
速やかに分解して、１７２ｎｍの単一波長の強力な紫外
線が発生した。この紫外線は石英ガラス製容器１１を透
過して水槽１５内の被処理水に照射され、有機物の化学
変化が効率的に行われた結果、管路１７から取り出した
水を調べると、原水中の有機物は炭酸ガス等に完全に変
化したことが確認できた。An ultraviolet irradiation experiment was carried out using the ultraviolet irradiation device constructed as described above, and will be described below. Xe gas was sealed in the quartz glass container 11 from the pipe line 13, and the primary cooling water of the nuclear power plant was introduced into the water tank 15 from the pipe line 16. Then, the excimer laser device 1 is excited and oscillated under a predetermined condition, the laser light emitted through the output side mirror 9 is reflected by the reflection mirror 10, and the path 1
8 and the quartz glass lens 12 were made to enter the quartz glass container 11, and a voltage of 5 kV and 20 kHz was applied between the electrodes 19 by the AC power source 20. As a result, an electric discharge occurs between the electrodes 19 and 19, and the container 11 has a synergistic effect with the high-density energy of laser light.
The Xe gas in the inside was excited to generate excimers and rapidly decomposed to generate strong ultraviolet rays having a single wavelength of 172 nm. This ultraviolet light passes through the quartz glass container 11 and is applied to the water to be treated in the water tank 15, and as a result of the efficient chemical change of the organic substances, when the water taken out from the pipeline 17 is examined, It was confirmed that the organic matter was completely changed to carbon dioxide gas and the like.
【００１５】上記した図１および図２の実施例では、水
槽１５内に設置された石英ガラス製容器１１は１個であ
るが、水槽１５内に多数の石英ガラス製容器１１を設置
することもできる。この場合、エキシマレーザ装置１か
ら放出されるレーザ光を分岐させ、各容器の石英ガラス
製レンズ１２を経て石英ガラス製容器１１内に入射させ
ることにより、複数の石英ガラス製容器１１から紫外線
を発生させることができる。このような装置構成とする
ことで、より多量の被処理水を効率的に処理することが
可能となる。なお、レーザ光の分岐方法としては、『レ
ーザ光を１０％程度反射し、９０％程度透過する性質の
鏡を用いるビームスプリッタを各石英ガラス製容器１１
上に配置してエキシマレーザ装置１から放出された単一
のレーザ光を各石英ガラス製容器１１に向けて分岐させ
る方法』や『エキシマレーザは１０mm×２０mm程度の幅
を有するという性質を利用して、アパーチャー（多数の
小孔を有する板状体）を通してエキシマレーザ装置１か
ら放出された単一のレーザ光を複数に分割し、分割した
各レーザ光をミラーで反射して各石英ガラス製容器１１
内に入射させる方法』などを採用することができる。In the embodiment shown in FIGS. 1 and 2, the number of quartz glass containers 11 installed in the water tank 15 is one, but a large number of quartz glass containers 11 may be installed in the water tank 15. it can. In this case, the laser light emitted from the excimer laser device 1 is branched and is made to enter the quartz glass container 11 through the quartz glass lens 12 of each container to generate ultraviolet rays from the plurality of quartz glass containers 11. Can be made. With such a device configuration, it becomes possible to efficiently treat a large amount of water to be treated. As a method of branching laser light, “a beam splitter using a mirror having a property of reflecting about 10% of laser light and transmitting about 90% of laser light is used for each quartz glass container 11.
"A method of branching a single laser beam emitted from the excimer laser device 1 toward each quartz glass container 11" or "The excimer laser has a width of about 10 mm x 20 mm is used. , A single laser beam emitted from the excimer laser device 1 through an aperture (a plate having a large number of small holes) is divided into a plurality of laser beams, and each divided laser beam is reflected by a mirror to make a quartz glass container. 11
It is possible to adopt a method of making the light incident inside.
【００１６】[0016]
【発明の効果】本発明によれば、従来の大規模交流電源
設備に代えてレーザ装置で励起・発振させたレーザ光の
高密度エネルギーを放電のための主たるエネルギーとし
て利用した高放電効率の紫外線照射装置を提供すること
ができる。According to the present invention, ultraviolet rays of high discharge efficiency are used in which high density energy of laser light excited and oscillated by a laser device is used as a main energy for discharge in place of conventional large-scale AC power supply equipment. An irradiation device can be provided.
【図１】本発明の紫外線照射装置の一実施例の断面図で
ある。FIG. 1 is a cross-sectional view of an embodiment of an ultraviolet irradiation device of the present invention.
【図２】本発明の紫外線照射装置の別の実施例の断面図
である。FIG. 2 is a cross-sectional view of another embodiment of the ultraviolet irradiation device of the present invention.
１…エキシマレーザ装置 ８…反射側ミラー ９…出力側ミラー １１…石英ガラス製容器 １２…石英ガラス製レンズ １５…水槽 １９…グラスライニング電極 DESCRIPTION OF SYMBOLS 1 ... Excimer laser device 8 ... Reflection side mirror 9 ... Output side mirror 11 ... Quartz glass container 12 ... Quartz glass lens 15 ... Water tank 19 ... Glass lining electrode
Claims (2)
路中に、ガスを封入した紫外線透過材料からなる容器を
配置したことを特徴とする紫外線照射装置。1. An ultraviolet irradiating device, characterized in that a container made of an ultraviolet permeable material enclosing a gas is arranged in the path of laser light emitted from the laser device.
配置したことを特徴とする請求項１記載の紫外線照射装
置。2. The ultraviolet irradiation device according to claim 1, wherein a pair of glass lining electrodes are arranged in the container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7105746A JPH08299951A (en) | 1995-04-28 | 1995-04-28 | Ultraviolet ray irradiating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7105746A JPH08299951A (en) | 1995-04-28 | 1995-04-28 | Ultraviolet ray irradiating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08299951A true JPH08299951A (en) | 1996-11-19 |
Family
ID=14415827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7105746A Pending JPH08299951A (en) | 1995-04-28 | 1995-04-28 | Ultraviolet ray irradiating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08299951A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009532829A (en) * | 2006-03-31 | 2009-09-10 | エナジェティック・テクノロジー・インコーポレーテッド | Laser-driven light source |
| US8525138B2 (en) | 2006-03-31 | 2013-09-03 | Energetiq Technology, Inc. | Laser-driven light source |
| US9576785B2 (en) | 2015-05-14 | 2017-02-21 | Excelitas Technologies Corp. | Electrodeless single CW laser driven xenon lamp |
| US9678262B2 (en) | 2013-09-20 | 2017-06-13 | Qloptiq Photonics GmbH & Co. KG | Laser-operated light source |
| US9741553B2 (en) | 2014-05-15 | 2017-08-22 | Excelitas Technologies Corp. | Elliptical and dual parabolic laser driven sealed beam lamps |
| US9748086B2 (en) | 2014-05-15 | 2017-08-29 | Excelitas Technologies Corp. | Laser driven sealed beam lamp |
| US9984865B2 (en) | 2013-12-06 | 2018-05-29 | Hamamatsu Photonics K.K. | Light-emitting sealed body |
| US10008378B2 (en) | 2015-05-14 | 2018-06-26 | Excelitas Technologies Corp. | Laser driven sealed beam lamp with improved stability |
| US10057973B2 (en) | 2015-05-14 | 2018-08-21 | Excelitas Technologies Corp. | Electrodeless single low power CW laser driven plasma lamp |
| US10078167B2 (en) | 2013-09-20 | 2018-09-18 | Asml Netherlands B.V. | Laser-operated light source |
| US10109473B1 (en) | 2018-01-26 | 2018-10-23 | Excelitas Technologies Corp. | Mechanically sealed tube for laser sustained plasma lamp and production method for same |
| US10186416B2 (en) | 2014-05-15 | 2019-01-22 | Excelitas Technologies Corp. | Apparatus and a method for operating a variable pressure sealed beam lamp |
-
1995
- 1995-04-28 JP JP7105746A patent/JPH08299951A/en active Pending
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9048000B2 (en) | 2006-03-31 | 2015-06-02 | Energetiq Technology, Inc. | High brightness laser-driven light source |
| JP2012230924A (en) * | 2006-03-31 | 2012-11-22 | Energetic Technology Inc | Laser-driven light source and method |
| US8525138B2 (en) | 2006-03-31 | 2013-09-03 | Energetiq Technology, Inc. | Laser-driven light source |
| KR20130135393A (en) * | 2006-03-31 | 2013-12-10 | 에너제틱 테크놀로지 아이엔씨. | Laser-driven light source |
| US8969841B2 (en) | 2006-03-31 | 2015-03-03 | Energetiq Technology, Inc. | Light source for generating light from a laser sustained plasma in a above-atmospheric pressure chamber |
| KR101507617B1 (en) * | 2006-03-31 | 2015-03-31 | 에너제틱 테크놀로지 아이엔씨. | Laser-driven light source |
| US9185786B2 (en) | 2006-03-31 | 2015-11-10 | Energetiq Technology, Inc. | Laser-driven light source |
| US9609732B2 (en) | 2006-03-31 | 2017-03-28 | Energetiq Technology, Inc. | Laser-driven light source for generating light from a plasma in an pressurized chamber |
| JP2009532829A (en) * | 2006-03-31 | 2009-09-10 | エナジェティック・テクノロジー・インコーポレーテッド | Laser-driven light source |
| US10845523B2 (en) | 2013-09-20 | 2020-11-24 | Asml Netherlands B.V. | Laser-operated light source |
| US9678262B2 (en) | 2013-09-20 | 2017-06-13 | Qloptiq Photonics GmbH & Co. KG | Laser-operated light source |
| US10078167B2 (en) | 2013-09-20 | 2018-09-18 | Asml Netherlands B.V. | Laser-operated light source |
| US9984865B2 (en) | 2013-12-06 | 2018-05-29 | Hamamatsu Photonics K.K. | Light-emitting sealed body |
| US9748086B2 (en) | 2014-05-15 | 2017-08-29 | Excelitas Technologies Corp. | Laser driven sealed beam lamp |
| US9922814B2 (en) | 2014-05-15 | 2018-03-20 | Excelitas Technologies Corp. | Apparatus and a method for operating a sealed beam lamp containing an ionizable medium |
| US9741553B2 (en) | 2014-05-15 | 2017-08-22 | Excelitas Technologies Corp. | Elliptical and dual parabolic laser driven sealed beam lamps |
| US10186414B2 (en) | 2014-05-15 | 2019-01-22 | Excelitas Technologies Corp. | Dual parabolic laser driven sealed beam lamps |
| US10186416B2 (en) | 2014-05-15 | 2019-01-22 | Excelitas Technologies Corp. | Apparatus and a method for operating a variable pressure sealed beam lamp |
| US10504714B2 (en) | 2014-05-15 | 2019-12-10 | Excelitas Technologies Corp. | Dual parabolic laser driven sealed beam lamp |
| US10008378B2 (en) | 2015-05-14 | 2018-06-26 | Excelitas Technologies Corp. | Laser driven sealed beam lamp with improved stability |
| US10057973B2 (en) | 2015-05-14 | 2018-08-21 | Excelitas Technologies Corp. | Electrodeless single low power CW laser driven plasma lamp |
| US10497555B2 (en) | 2015-05-14 | 2019-12-03 | Excelitas Technologies Corp. | Laser driven sealed beam lamp with improved stability |
| US9576785B2 (en) | 2015-05-14 | 2017-02-21 | Excelitas Technologies Corp. | Electrodeless single CW laser driven xenon lamp |
| US10109473B1 (en) | 2018-01-26 | 2018-10-23 | Excelitas Technologies Corp. | Mechanically sealed tube for laser sustained plasma lamp and production method for same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Arai et al. | Two‐photon processes in defect formation by excimer lasers in synthetic silica glass | |
| Couairon et al. | Light filaments in air for ultraviolet and infrared wavelengths | |
| Eliasson et al. | Modeling and applications of silent discharge plasmas | |
| JPH08299951A (en) | Ultraviolet ray irradiating device | |
| Sosnin et al. | A bactericidal barrier-discharge KrBr excilamp | |
| Bollanti et al. | Development and characterisation of an XeCl excimer laser-generated soft-X-ray plasma source and its applications | |
| Gerasimov et al. | UV emission from excited inert-gas molecules | |
| JPH0716584B2 (en) | Laser isotope separation device | |
| US4201955A (en) | Method of producing population inversion and lasing at short wavelengths by charge transfer | |
| JP4481687B2 (en) | Method and apparatus for simultaneously generating spin-polarized electrons and spin-polarized ions | |
| Hasson | Review of design concepts and diagnostics for 100-KW-class repetitively pulsed CO2 lasers | |
| JPH0760654B2 (en) | Ion beam generation method and device | |
| JPH08266889A (en) | Electric discharge chemical reactor | |
| JPH08124540A (en) | Xenon irradiation device and object surface reforming device using the irradiation device | |
| JPH07288109A (en) | Xenon radiation device and object surface quality improving device using it | |
| USH66H (en) | Pulsed plasma generation of extreme ultraviolet radiation | |
| JPH08248199A (en) | Ultraviolet irradiation device | |
| Miley | Nuclear pumping of the iodine laser revisited | |
| JPH1145684A (en) | Discharge lamp and treating device | |
| JP2003243200A (en) | Dc discharge generator by irradiation of laser beam and treatment method of environmentally contaminated gas | |
| Eder et al. | The optical-field and inner-shell ionization schemes for X-ray lasing | |
| MIZUSHIMA et al. | A Newly Developed Method of Direct Hydrogen Production from Seawater Using Femtosecond Pulse Laser | |
| Grechukhin et al. | Optical excitation and ionization of fast hydrogen atoms | |
| JPH08243553A (en) | Water treating process using ultraviolet ray irradiation device | |
| JPH0648892A (en) | Method for controlling lattice defect of diamond |