JPH07238240A - Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part - Google Patents

Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part

Info

Publication number
JPH07238240A
JPH07238240A JP2852694A JP2852694A JPH07238240A JP H07238240 A JPH07238240 A JP H07238240A JP 2852694 A JP2852694 A JP 2852694A JP 2852694 A JP2852694 A JP 2852694A JP H07238240 A JPH07238240 A JP H07238240A
Authority
JP
Japan
Prior art keywords
moisture
proof
photo
electronic part
setting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2852694A
Other languages
Japanese (ja)
Inventor
Masakatsu Obara
正且 小原
Tatsushi Goto
達士 後藤
Toshiichi Okawara
敏一 大川原
Eiji Omori
英二 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2852694A priority Critical patent/JPH07238240A/en
Publication of JPH07238240A publication Critical patent/JPH07238240A/en
Pending legal-status Critical Current

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  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To obtain a photo-setting moisture-proof insulation coating material having excellent curability and moisture resistance, causing little loss of flexibility even after thermal deterioration and suitable for electronic part having excellent heat resistance and improved reliability. CONSTITUTION:This photo-setting moisture-proof insulation coating material contains (A) a photo-setting acryloxy-terminated polybutadiene or methacryloxy- terminated polybutadiene having a number-average molecular weight of 300-10,000 and a hydrogenation ratio of >=90%, (B) a wax and (C) tetra-t- butylperoxycarbonylbenzophenone. This process for the production of a moisture- proof insulated electronic part comprises the coating and curing of the coating material on an electronic part.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子部品の防湿、絶縁
等に適した光硬化性防湿絶縁塗料およびこれを用いて処
理された電子部品の製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocurable moisture-proof insulating coating suitable for moisture-proofing and insulating electronic parts and a method for producing electronic parts treated with the same.

【0002】[0002]

【従来の技術】従来、実装回路板およびハイブリッドI
C(integrated circuit)等の電子部品には、ガラスエ
ポキシ、紙フェノール、アルミナセラミック等の基板に
配線図が印刷されてマイコン、抵抗体、コンデンサなど
の各種部品が搭載されており、それらを湿気、ほこりな
どから保護する目的で絶縁処理が行われている。この絶
縁処理方法には、アクリル樹脂、シリコーン樹脂、フェ
ノール樹脂、エポキシ樹脂などの塗料による保護コーテ
ィング処理が広く採用されている。このような実装回路
板およびハイブリッドICは、過酷な環境下、特に高湿
度下で使用され、例えば自動車、洗濯機などの機器に搭
載されて使用されている。
2. Description of the Related Art Conventionally, a mounting circuit board and a hybrid I
Electronic components such as C (integrated circuit) are printed with a wiring diagram on a substrate such as glass epoxy, paper phenol, and alumina ceramic, and various components such as a microcomputer, a resistor, and a capacitor are mounted. Insulation is performed to protect it from dust. For this insulation treatment method, a protective coating treatment using a paint such as acrylic resin, silicone resin, phenol resin, or epoxy resin is widely adopted. Such a mounting circuit board and a hybrid IC are used in a harsh environment, particularly under high humidity, and are mounted and used in equipment such as an automobile and a washing machine.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、前記塗
料は加熱硬化性であるため、塗料を完全に硬化させて絶
縁効果を得るためには高温度処理、また長時間処理が必
要であった。一方、短時間処理、例えば数秒〜数分での
硬化が可能な紫外線硬化性樹脂塗料が開発されている
が、まだ充分な可とう性および耐湿性を有するものが得
られていない。また、搭載部品の下部など紫外線が照射
されない所は液状で未硬化の状態となり、電子部品の信
頼性が低下するおそれがあった。本発明は、このような
従来技術の問題点を解決し、短時間処理が可能で、可と
う性および耐湿性に優れた塗膜を生成する光硬化性防湿
絶縁塗料およびこれを塗布、硬化する防湿絶縁された電
子部品の製造法を提供することにある。
However, since the coating material is heat-curable, high temperature treatment and long-time treatment are required to completely cure the coating material and obtain an insulating effect. On the other hand, an ultraviolet curable resin coating composition that can be cured in a short time, for example, in a few seconds to a few minutes has been developed, but a coating material having sufficient flexibility and moisture resistance has not yet been obtained. In addition, a portion such as a lower portion of the mounted component which is not irradiated with ultraviolet rays is in a liquid state and is in an uncured state, and there is a possibility that reliability of the electronic component is deteriorated. The present invention solves the above-mentioned problems of the prior art, can be treated for a short time, and produces a coating film excellent in flexibility and moisture resistance. It is an object of the present invention to provide a method of manufacturing a moisture-proof insulated electronic component.

【0004】[0004]

【課題を解決するための手段】本発明は、(A)数平均
分子量が300〜10,000で、水素添加率が90%
以上である光硬化性末端アクリロキシポリブタジエンま
たは末端メタアクリロキシポリブタジエン、(B)ワッ
クスおよび(C)テトラターシャリブチルペルオキシル
カルボニルベンゾフェノンを含有してなる光硬化性防湿
絶縁塗料およびこの塗料を電子部品に塗布、硬化する防
湿絶縁された電子部品の製造法に関する。
The present invention provides (A) a number average molecular weight of 300 to 10,000 and a hydrogenation rate of 90%.
The above photocurable moisture-proof insulating coating material containing photocurable terminal acryloxypolybutadiene or methacryloxypolybutadiene terminal, (B) wax and (C) tetratertiarybutylperoxylcarbonylbenzophenone, and this coating material for electronic parts The present invention relates to a method for manufacturing a moisture-proof insulated electronic component which is applied and cured on a substrate.

【0005】本発明に用いられる水素添加率が90%以
上である光硬化性末端アクリロキシポリブタジエンまた
は末端メタアクリロキシポリブタジエン(A)は、水素
添加率が90%以上の末端ヒドロキシポリブタジエン
を、ポリイソシアネートと反応させ、その後にヒドロキ
シエチルアクリレートまたはヒドロキシエチルメタクリ
レートを反応させて得られる数平均分子量が300〜1
0,000のアクリル変性水素添加ポリブタジエン樹脂
である。この樹脂の数平均分子量は300〜10,00
0、好ましくは500〜5,000、水素添加率は90
%以上、好ましくは95%以上とされる。数平均分子量
が300未満では造膜性が悪くなり、10,000を超
えると粘度が高く、作業性に劣る。また水素添加率が9
0%未満では得られる塗膜の加熱劣化後の可とう性が低
下し、耐熱性に劣る。このアクリル変性水素添加ポリブ
タジエン樹脂の市販品としては、日本曹達社製の商品名
TEAI−1000、TEAI−3000等が挙げられ
る。これらは単独でまたは2種以上を組み合わせて使用
できる。
The photocurable terminal acryloxy polybutadiene or methacryloxy polybutadiene (A) having a hydrogenation rate of 90% or more used in the present invention is obtained by converting a terminal hydroxypolybutadiene having a hydrogenation rate of 90% or more into a polyisocyanate. With a number average molecular weight of 300 to 1 obtained by reacting with hydroxyethyl acrylate or hydroxyethyl methacrylate.
It is 20,000 acrylic modified hydrogenated polybutadiene resin. The number average molecular weight of this resin is 300 to 10,000.
0, preferably 500 to 5,000, the hydrogenation rate is 90
% Or more, preferably 95% or more. When the number average molecular weight is less than 300, the film-forming property is poor, and when it exceeds 10,000, the viscosity is high and the workability is poor. The hydrogenation rate is 9
If it is less than 0%, the flexibility of the coating film obtained after heating is deteriorated and the heat resistance is poor. Commercially available products of this acryl-modified hydrogenated polybutadiene resin include trade names TEAI-1000 and TEAI-3000 manufactured by Nippon Soda Co., Ltd. These can be used alone or in combination of two or more.

【0006】本発明に用いられるワックス(B)は、常
温で固体であり、溶融時に揮発性が極めて小さいカルナ
ウバワックス、ライスワックス、みつろう、パラフィン
ワックス、マイクロクリスタリンワックス等の天然ワツ
クスあるいは合成ワックスである。これらは単独でまた
は2種以上組み合わせて使用できる。ワックス(B)の
配合割合は、べたつきの防止および塗膜の可とう性から
前記(A)成分100重量部に対して5〜100重量部
の範囲が好ましく、10〜50重量部の範囲がより好ま
しい。
The wax (B) used in the present invention is a natural wax or a synthetic wax such as carnauba wax, rice wax, beeswax, paraffin wax and microcrystalline wax which is solid at room temperature and has extremely low volatility when melted. is there. These can be used alone or in combination of two or more. The blending ratio of the wax (B) is preferably from 5 to 100 parts by weight, more preferably from 10 to 50 parts by weight based on 100 parts by weight of the component (A) from the viewpoint of preventing stickiness and flexibility of the coating film. preferable.

【0007】本発明に用いられるテトラターシャリブチ
ルペルオキシルカルボニルベンゾフェノン(C)は、同
一分子内に紫外線吸収基であるベンゾフェノン基とラジ
カル解裂しやすいペルオキシ基を有する光重合開始剤で
ある。この(C)成分の配合割合は、硬化速度と造膜性
の点から前記(A)成分100重量部に対して0.01
〜10重量部の範囲が好ましく、0.1〜7重量部の範
囲がより好ましい。
The tetratertiarybutylperoxylcarbonylbenzophenone (C) used in the present invention is a photopolymerization initiator having a benzophenone group which is an ultraviolet absorbing group and a peroxy group which is easily radically cleaved in the same molecule. The blending ratio of the component (C) is 0.01 with respect to 100 parts by weight of the component (A) from the viewpoint of curing rate and film-forming property.
The range of 10 to 10 parts by weight is preferable, and the range of 0.1 to 7 parts by weight is more preferable.

【0008】本発明の光硬化性防湿絶縁塗料は、前記
(A)、(B)および(C)成分を配合し、加熱溶解す
ることによって得られる。また、本発明になる光硬化性
防湿絶縁塗料には、必要に応じて架橋性単量体、シラン
カップリング剤、重合禁止剤などを添加することができ
る。
The photocurable moisture-proof insulating coating material of the present invention is obtained by blending the components (A), (B) and (C) described above and heating and dissolving them. In addition, a crosslinkable monomer, a silane coupling agent, a polymerization inhibitor, etc. can be added to the photocurable moisture-proof insulating coating material of the present invention, if necessary.

【0009】架橋性単量体としては、スチレン、ビニル
トルエン、α−メチルスチレン、p−ターシャリーブチ
ルスチレン、クロルスチレン、ジビニルベンゼン、ジア
リルフタレート、2−ヒドロオキシエチルメタクリレー
ト、2−ヒドロオキシプロピルメタクリレート、メチル
メタクリレート、エチルメタクリレート、ラウリルメタ
クリレート、メタクリル酸とカージュラE−10(シェ
ル化学社製、高級脂肪酸のグリシジルエステルの商品
名)の反応物などの1官能性のメタクリル酸エステル、
エチレングリコールジメタクリレート、ジエチレングリ
コールジメタクリレート、1,6−ヘキサンジオールジ
メタクリレートなどの2官能性のメタクリル酸エステ
ル、トリメチロールプロパントリメタクリレートなどの
3官能性のメタクリル酸エステル、メチルアクリレー
ト、エチルアクリレート、ラウリルアクリレート、2−
ヒドロオキシエチルアクリレート、2−ヒドロオキシプ
ロピルアクリレート、アクリル酸とカージュラE−10
の反応物などの1官能性のアクリル酸エステル、エチレ
ングリコールジアクリレート、ジエチレングリコールジ
アクリレート、1,6−ヘキサンジオールジアクレート
などの2官能のアクリル酸エステル、トリメチロールプ
ロパントリアクリレートなどの3官能性のアクリル酸エ
ステルなどが用いられ、これらは単独でまたは2種以上
を組み合わせて使用できる。
Examples of the crosslinkable monomer include styrene, vinyltoluene, α-methylstyrene, p-tert-butylstyrene, chlorostyrene, divinylbenzene, diallylphthalate, 2-hydroxyoxymethacrylate and 2-hydroxypropylmethacrylate. , A monofunctional methacrylic acid ester such as a reaction product of methyl methacrylate, ethyl methacrylate, lauryl methacrylate, methacrylic acid and Cardura E-10 (trade name of glycidyl ester of higher fatty acid, manufactured by Shell Chemical Co., Ltd.),
Bifunctional methacrylic acid esters such as ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, and 1,6-hexanediol dimethacrylate, trifunctional methacrylic acid esters such as trimethylolpropane trimethacrylate, methyl acrylate, ethyl acrylate, and lauryl acrylate. , 2-
Hydroxyethyl acrylate, 2-hydroxypropyl acrylate, acrylic acid and Cardura E-10
Reaction products such as monofunctional acrylic acid esters, ethylene glycol diacrylate, diethylene glycol diacrylate, difunctional acrylic acid esters such as 1,6-hexanediol diacrylate, trifunctional compounds such as trimethylolpropane triacrylate. Acrylic acid esters and the like are used, and these can be used alone or in combination of two or more kinds.

【0010】シランカップリング剤としては、γ−メタ
アクリロキシプロピルトリメトキシシラン、γ−メタア
クリロキシプロピルトリエトキシシラン、γ−アクリロ
キシプロピルトリメトキシシラン、ビニルトリメトキシ
シラン、ビニルトリエトキシシランなどが挙げられる。
これらは単独でまたは2種以上を組み合わせて使用でき
る。
Examples of the silane coupling agent include γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, vinyltrimethoxysilane and vinyltriethoxysilane. Can be mentioned.
These can be used alone or in combination of two or more.

【0011】重合禁止剤としては、ハイドロキノン、パ
ラターシャリーブチルカテコール、ピロガロール等のキ
ノン類、その他一般に使用されているものが用いられ
る。
As the polymerization inhibitor, quinones such as hydroquinone, paratertiary butyl catechol and pyrogallol, and other commonly used ones can be used.

【0012】本発明になる光硬化性防湿絶縁塗料を用い
て防湿絶縁された実装回路板、ハイブリッドIC等の電
子部品が製造されるが、その製法としては、一般に知ら
れているハケ塗り法、浸漬法(ディップ法)、スプレー
法などによってこの塗料を電子部品に塗布、硬化すれば
よい。塗布後の塗膜の硬化は紫外線照射によって行われ
る。
Electronic components such as mounted circuit boards and hybrid ICs, which are moisture-proof insulated using the photocurable moisture-proof insulating coating material according to the present invention, are manufactured by a generally known brush coating method. The coating material may be applied to the electronic component and cured by a dipping method (dip method), a spray method, or the like. Curing of the coating film after coating is performed by ultraviolet irradiation.

【0013】[0013]

【実施例】次に本発明を実施例および比較例により説明
するが、本発明は以下の実施例に限定されるものではな
い。「部」として表わしたものは重量部を示す。 実施例1 TEAI−1000(日本曹達株式会社製、アクリル変
性水素添加ポリブタジエン樹脂、数平均分子量:約1,
000、水素添加率:97%)100部、カルナウバワ
ックス30部およびテトラターシャリブチルペルオキシ
ルカルボニルベンゾフェノン5部を温度80℃の条件で
混合撹拌して塗料Aを得た。
EXAMPLES The present invention will now be described with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples. Those expressed as "parts" indicate parts by weight. Example 1 TEAI-1000 (manufactured by Nippon Soda Co., Ltd., acrylic modified hydrogenated polybutadiene resin, number average molecular weight: about 1,
000, hydrogenation rate: 97%) 100 parts, carnauba wax 30 parts and tetratertiarybutylperoxylcarbonylbenzophenone 5 parts were mixed and stirred at a temperature of 80 ° C. to obtain a paint A.

【0014】比較例1 TE−2000(日本曹達株式会社製、末端メタクリロ
イル基ポリブタジエン樹脂、数平均分子量:約2,00
0)100部、ベンジルジメチルケタール5部およびト
ルエン100部を温度50℃の条件で混合撹拌して塗料
Bを得た。 比較例2 TEAI−1000(日本曹達株式会社製、アクリル変
性水素添加ポリブタジエン樹脂、数平均分子量:約1,
000、水素添加率:97%)100部およびテトラタ
ーシャリブチルペルオキシルカルボニルベンゾフェノン
5部を温度100℃の条件で混合撹拌して塗料Cを得
た。
COMPARATIVE EXAMPLE 1 TE-2000 (manufactured by Nippon Soda Co., Ltd., terminal methacryloyl group polybutadiene resin, number average molecular weight: about 2,000)
0) 100 parts, 5 parts of benzyl dimethyl ketal and 100 parts of toluene were mixed and stirred at a temperature of 50 ° C. to obtain a coating material B. Comparative Example 2 TEAI-1000 (manufactured by Nippon Soda Co., Ltd., acrylic modified hydrogenated polybutadiene resin, number average molecular weight: about 1,
000, hydrogenation ratio: 97%) and 5 parts of tetratert-butylperoxylcarbonylbenzophenone were mixed and stirred at a temperature of 100 ° C. to obtain coating C.

【0015】以上で得た塗料A〜Cをガラスエポキシ銅
張積層板に配線が印刷され、ICおよび抵抗が搭載され
た実装回路板に、浸漬法により塗布し、ウシオ電気株式
会社製の照射出力が50W/cmの水銀ランプで照射距離
10cmから120秒間紫外線照射を行い、硬化性評価用
試験片を作製し硬化性を試験した。またこれらの塗料を
ガラスエポキシ銅張積層板製のくし型電極(電極間隔
0.3mm)に、浸漬法により塗布し、前記の硬化条件で
硬化させ、耐湿性試験用試験片を作製し、耐湿性を試験
した。さらにこれらの試験片について、JIS C 21
03に準じて屈曲性試験用の試験片を作製して前記の硬
化条件で硬化させ、80℃で100時間放置し、屈曲性
を試験した。その結果を表1に示す。なお、塗料Aおよ
びCを浸漬法で塗布する際、塗料AおよびCを80℃に
加熱して用いた。また、耐湿性は耐湿性試験用試験片に
DC14Vを印加しながら85℃、85%RHの恒温恒
湿槽内に放置し、表1に示す放置時間ごとに恒温恒湿槽
から取り出し、2時間後23℃でDC500Vを印加し
て絶縁抵抗を測定して評価した。
The coating materials A to C obtained as described above are applied by dipping onto a mounting circuit board on which wiring is printed on a glass epoxy copper clad laminate and ICs and resistors are mounted. Irradiation output manufactured by USHIO INC. Was irradiated with ultraviolet rays from a mercury lamp of 50 W / cm for 10 seconds from an irradiation distance of 10 cm to prepare a test piece for evaluation of curability, and the curability was tested. In addition, these paints were applied to a glass epoxy copper clad laminate comb-type electrode (electrode spacing 0.3 mm) by the dipping method and cured under the above curing conditions to prepare a test piece for a moisture resistance test, and a moisture resistance test piece was prepared. Tested for sex. Furthermore, regarding these test pieces, JIS C 21
A test piece for bending test was prepared in accordance with No. 03, cured under the above curing conditions, and allowed to stand at 80 ° C. for 100 hours to test the flexibility. The results are shown in Table 1. When the coating materials A and C were applied by the dipping method, the coating materials A and C were heated to 80 ° C. before use. Further, the humidity resistance is such that the test piece for humidity resistance test is left to stand in a constant temperature and humidity tank at 85 ° C. and 85% RH while applying DC14V, and taken out from the constant temperature and humidity tank for each standing time shown in Table 1 for 2 hours. Then, DC500V was applied at 23 ° C., and the insulation resistance was measured and evaluated.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【発明の効果】表1にも示されるように、本発明になる
光硬化性防湿絶縁塗料は、硬化性、耐湿性に優れ、加熱
劣化しても可とう性がほとんど損われない耐熱性に優れ
た塗料であり、この塗料によって信頼性の向上された電
子部品を製造することができる。
As shown in Table 1, the photocurable moisture-proof insulating coating material according to the present invention is excellent in curability and moisture resistance, and has heat resistance that hardly deteriorates flexibility even when deteriorated by heating. It is an excellent paint, and it is possible to manufacture electronic parts with improved reliability.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/31 H05K 3/28 D // C08F 2/50 MDQ 299/00 MRN (72)発明者 大森 英二 茨城県日立市東町四丁目13番1号 日立化 成工業株式会社山崎工場内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location H01L 23/31 H05K 3/28 D // C08F 2/50 MDQ 299/00 MRN (72) Inventor Eiji Omori 4-13-1, Higashi-cho, Hitachi-shi, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Yamazaki factory

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (A)数平均分子量が300〜10,0
00で、水素添加率が90%以上である光硬化性末端ア
クリロキシポリブタジエンまたは末端メタアクリロキシ
ポリブタジエン、(B)ワックスおよび(C)テトラタ
ーシャリブチルペルオキシルカルボニルベンゾフェノン
を含有してなる光硬化性防湿絶縁塗料。
1. (A) Number average molecular weight of 300 to 10,0
00, a photocurable resin containing a photocurable terminal acryloxypolybutadiene or methacryloxypolybutadiene having a hydrogenation rate of 90% or more, (B) wax and (C) tetratertiarybutylperoxylcarbonylbenzophenone. Moisture-proof insulating paint.
【請求項2】 請求項1記載の光硬化性防湿絶縁塗料を
電子部品に塗布、硬化する防湿絶縁された電子部品の製
造法。
2. A method for producing a moisture-proof insulated electronic component, which comprises applying the photocurable moisture-proof insulating coating composition according to claim 1 to an electronic component and curing it.
JP2852694A 1994-02-25 1994-02-25 Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part Pending JPH07238240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2852694A JPH07238240A (en) 1994-02-25 1994-02-25 Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2852694A JPH07238240A (en) 1994-02-25 1994-02-25 Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part

Publications (1)

Publication Number Publication Date
JPH07238240A true JPH07238240A (en) 1995-09-12

Family

ID=12251115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2852694A Pending JPH07238240A (en) 1994-02-25 1994-02-25 Photo-setting moisture-proof insulation coating and production of moisture-proof insulated electronic part

Country Status (1)

Country Link
JP (1) JPH07238240A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007308681A (en) * 2006-04-18 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo- curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP6346980B1 (en) * 2017-07-06 2018-06-20 アイカ工業株式会社 Photocurable moisture-proof insulation coating composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007308681A (en) * 2006-04-18 2007-11-29 Hitachi Chem Co Ltd Photo-curable resin composition, photo- curable moisture-preventing insulation coating for mounting circuit board, electronic part and method for producing the same
JP6346980B1 (en) * 2017-07-06 2018-06-20 アイカ工業株式会社 Photocurable moisture-proof insulation coating composition
JP2019014806A (en) * 2017-07-06 2019-01-31 アイカ工業株式会社 Photocurable moisture-proof insulation coating agent composition

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