JPH07182989A - Electron beam display device and metal film transferring sheet - Google Patents

Abstract

PURPOSE:To heighten the contrast in a display screen and improve the reliability of the display device by forming a phosphor layer and an electron transmissive metal layer and a specified carbon layer on the inner face of a face glass. CONSTITUTION:A release layer 13 of fluoro-silicone, etc., is formed on a supporting body 14 such as polyethylepe terephthalate having flexibility. A black resin layer 12, a metal film 11, and an adhesive layer 16 are successively formed on the layer 13 to give a metal film transfering sheet 15, wherein the resin layer 12 contains fine particles of graphite or carbon and to the layer silicon-containing resin or a silicon-containing organic compound is added. After the sheet 15 is pressed to a glass substrate 19 having a black matrix layer 18 and a phosphor layer 17 while the layer 16 being put on the substrate, the supporting body 14 is peeled by the layer 13 and the layer 12 is fired to form a carbon-based film on an anode. The graphite particles are gathered together by the additive even after firing and thus the reliability is improved.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device using an electron beam, and more particularly to a phosphor screen of a display device and a metal film transfer sheet for forming the phosphor screen. is there.

[0002]

2. Description of the Related Art A display device using an electron beam is widely used as a display device in video information equipment and is in a very important position. Various means have been set up to improve the image quality of a display device using this electron beam.

As an example thereof, an attempt to form a layer of carbon atoms or boron atoms on the surface of the anode electrode in order to suppress backscattered electrons at the anode electrode is a CRT as a means for solving the problem of image quality deterioration. It is done in the development process. In this attempt, it was confirmed that the carbon atomic layer is effective in suppressing backscattered electrons (US Pat. No. 2,878,
No. 411).

As a method for forming the carbon atomic layer on the anode electrode, an acrylic emulsion is applied on the metal back layer by spraying or the like to form a barrier layer, and then graphite slurry is applied by spraying on the barrier layer. A method of forming a graphite dispersion film, a metal film previously formed on a sheet and a black resin layer containing graphite,
Conventionally known is a method of pressing a fluorescent substance layer on a glass substrate via an adhesive, peeling it from a sheet, and transferring and forming it.

On the other hand, as one of the thin electron beam display devices that have recently appeared, one having a structure as shown in FIG. 2 has appeared. This structure and operation will be described in some detail.

In FIG. 2, reference numeral 4 denotes a cathode line of an electron beam generation source, and an electron beam 6 emitted from the heated cathode line is focused and deflected by the action of the back electrode 5 and the plate electrode lens group 3 The fluorescent substance 2 of the anode electrode is made to emit light by being incident on the anode electrode on the face glass of.

The electron beams emitted from the respective holes of the flat plate electrode group each form a small CRT, and a set of these forms a single screen. This thin type electron beam display device has a problem to be solved in terms of image quality, performance, and the like since it is still in its infancy.

In the structure of the thin electron beam display device described above, the effect of trapping backscattered electrons cannot be expected even if the side surface of the electron beam display tube is at the same high voltage as the anode, and a shadow mask is provided immediately before the anode electrode. Therefore, it is considerably difficult in terms of structure and manufacturing process to use the method of trapping the reflected electrons from the surface of the anode electrode.

Therefore, it is necessary to introduce a method of forming a layer of carbon atoms or boron atoms on the surface of the anode electrode to suppress backscattered electrons. Of these, the most practical one is to form a black resin layer in which particles of graphite or the like described above are dispersed, and fire this to obtain a carbon atom layer.

[0010]

However, in the thin electron beam display device, since the distance between the anode electrode and the low potential electrode is much smaller than that of the CRT, the electric field near the anode electrode is considerably large. However, when the carbon atomic layer is formed of particles, a large Coulomb force is applied to the particles, and there is a problem that reliability is greatly reduced due to scattering and falling of the carbon particles.

In view of the above problems, it is an object of the present invention to provide a highly reliable display device while realizing a high contrast display screen of a display device using an electron beam.

[0012]

In order to solve the above problems, in the electron beam display device of the present invention, a phosphor layer, a metal layer and a carbon layer are laminated in this order on the inner surface of the face glass, and the carbon The layer is formed by firing a black resin layer containing at least one of graphite and carbon and containing silicon oxide fine powder.

Alternatively, the carbon layer is formed by firing a black resin layer containing at least one of graphite and carbon and containing a silicon-containing resin.

Alternatively, the carbon layer is formed by firing a black resin layer containing at least one of graphite and carbon and having a silicon-containing organic compound added thereto.

The metal film transfer sheet used when the method of transferring from the metal film transfer sheet is used as a means for forming the black resin layer is a flexible sheet and graphite and carbon formed on the sheet. A black resin layer containing at least one of the above, and a metal film formed on the surface of the black resin layer, wherein the black resin layer contains three types of silicon oxide fine powder, silicon-containing resin, and silicon-containing organic compound. One or more of the above are added to the metal film transfer sheet.

[0016]

In the conventional anode, the resin component, which plays a role of fixing the black resin layer when the anode is fired, is decomposed or oxidized to gasify and disappear. As a result, there is nothing to fix the graphite particles, and the graphite particles are easily scattered and fallen off.

According to the constitution of the present invention, after the resin disappears, the silicon oxide fine powder added to the composition, the silicon-containing resin or the silicon-containing organic compound binds between the graphite particles and between the metal layer and the graphite particles. _{(2) Since the} composition is formed, the adhesion strength is improved and the reliability can be improved.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An electron beam display device of the present invention will be described below with reference to the drawings and tables.

With regard to the embodiments, an outline and then details will be described. FIG. 1A shows a cross section of a metal film transfer sheet according to an embodiment of the present invention. In FIG. 1A, 14 is a flexible sheet which is a support having excellent mechanical strength and solvent resistance. Various resin films such as polyethylene terephthalate, polyimide and polyamide can be applied to this sheet, and the thickness of the film is 3 to 10
The range of 0 μm, preferably 5 to 50 μm is suitable.

Numeral 13 is a releasing layer, which is made of a material having excellent releasing property such as silicone, fluorine, acryl and wax in a thin layer. A metal film 11 is formed by a method such as vacuum deposition and sputtering.

Reference numeral 12 is a black resin layer containing fine particles of graphite (or carbon). As a binder for the black resin layer, an acrylic resin having good thermal decomposability is suitable. In the examples, silicon oxide fine powder, a silicon-containing resin, or a silicon-containing organic compound is added to this black resin layer.

In FIG. 1B, the metal film transfer sheet 15 shown in FIG. 1A is pressed against the glass substrate 19 having the black matrix layer 18 and the phosphor layer 17 via the adhesive layer 16 and then released. The black resin layer 12 on the metal film transfer sheet 15 is peeled off so that the support sheet 14 having the mold layer 13 is peeled off.
And the metal film 11 is transferred onto the phosphor layer 17.

As will be described later in detail, the black resin layer 12 has such a structure that it has good adhesiveness to the metal film 11 and extremely weak adhesiveness to the release layer 13.
Also, the metal film 11 is easily peeled off from the release layer 13 and transferred onto the phosphor layer 17. Thus, the metal back layer having the target black resin layer 12 is formed on the phosphor layer 17.

The embodiment will be described in more detail below. In this embodiment, a polyethylene terephthalate sheet having a thickness of 25 μm was used as the support sheet 14.

Table 1 shows the additives, the amount of addition in the black resin layer of each example, the particle scattering withstand voltage and the adhesion strength when the black resin layer is used.

[0026]

[Table 1]

The samples of Examples 1 to 3 shown in Table 1 were used as the black resin layer 12 with 40 parts by weight of graphite having an average particle size of 1 μm and 100 parts by weight of an acrylic resin as a base material, and a hydrophobic material. Of 0.5 to 2 parts by weight of fine silica powder and 1000 parts by weight of toluene as a solvent, and kneading with a homomixer for 20 minutes to obtain a coating material with a wire bar.
It was applied on the sheet to a thickness of 2 μm.

Next, a metal film of aluminum having a thickness of about 1200 angstrom was formed on the black resin layer by vacuum vapor deposition.

After that, a vinyl acetate adhesive 16 is applied on the phosphor layer 17 on the face glass substrate 19, and the structure shown in FIG.
As shown in (b), the black resin layer 12 and the metal film 11 formed on the release layer 13 are pressure-transferred, and the black resin layer 12 and the metal back layer 11 are formed on the face glass substrate 19.
To form an anode.

For comparison with the examples, as a comparative example, an anode to which an aluminum vapor deposition film formed on a black resin layer containing no hydrophobic silica fine particles was transferred was similarly formed on a face glass substrate.

In the samples of the fourth to sixth embodiments described in (Table 1), as the black resin layer 12, the base acrylic resin 95 to
For 80 parts by weight, 40 parts by weight of graphite having an average particle size of 1 μm, silicon-containing acrylic resin (silicon content of about 5
5 to 20 parts by weight, and toluene 10 as a solvent.
00 parts by weight was added, and the coating material obtained by kneading with a homomixer for 20 minutes was applied to the above sheet with a wire bar at 2 μm.
It was applied to a thickness of m.

Next, a metal film of aluminum having a thickness of about 1200 angstrom was formed on the black resin layer by vacuum vapor deposition.

After that, a vinyl acetate adhesive 16 is applied on the phosphor layer 17 on the face glass substrate, and as shown in FIG.
As shown in (b), the black resin layer 12 and the metal film 11 formed on the release layer 13 are pressure-transferred, and the black resin layer 12 and the metal back layer 11 are formed on the face glass substrate 19.
To form an anode.

The samples of the seventh to ninth examples shown in (Table 1) are the black resin layer 12 and the acrylic resin 100 as the base material.
40 parts by weight of graphite with an average particle size of 1 μm is used per part by weight.
Parts by weight, 1 to 7 parts by weight of tetraethoxysilane, 1000 parts by weight of toluene as a solvent, and kneaded with a homomixer for 20 minutes to obtain a coating material with a wire bar.
A thickness of 2 μm was applied on the substrate sheet.

Next, a metal film of aluminum having a thickness of about 1200 angstrom was formed on the black resin layer by vacuum vapor deposition.

After that, a vinyl acetate adhesive 16 is applied on the phosphor layer 17 on the face glass substrate, and as shown in FIG.
As shown in (b), the black resin layer 12 and the metal film 11 formed on the release layer 13 are pressure-transferred, and the black resin layer 12 and the metal back layer 11 are formed on the face glass substrate 19.
To form an anode.

The face glass substrates with anodes of Examples 1 to 9 and Comparative Example described above (Table 1) were fired at 450 ° C. for 1 hour.

Each of the prepared face glass substrates with an anode was incorporated into the thin electron beam display device shown in FIG. 2, and a high voltage power supply voltage of the anode electrode was gradually increased while applying a current to the cathode line to display the electron beam irradiation. The voltage at which the graphite particles on the electrode surface were scattered and dropped was examined.

Table 1 shows the anode high voltage value (scattering withstand voltage) of the samples of each Example and Comparative Example in which the scattering and dropping phenomenon of graphite particles occurs. Normally, in a thin electron beam display device, an anode voltage of about 9 to 15 kV is applied.

The results shown in Table 1 show that the comparative examples in which nothing was added showed a low withstand voltage of 9 to 10 kV. On the other hand, in Examples 1 to 9, the scattering withstand voltage is obviously higher than that of the comparative example. That is, it can be said that the adhesion strength is strong.

In Examples 1 to 3 in which the hydrophobic silica was added, the withstand voltage also increased as the amount of the hydrophobic silica added increased.
Sufficient adhesion strength of V or more.

Silicon-containing acrylic resin (silicon content of about 5
In Examples 4 to 6 in which the content of (wt%) is compounded, the pressure resistance increases as the content of the silicon-containing acrylic resin is increased. There is.

Example 7 with the addition of tetraethoxysilane
In Nos. 9 to 9, the withstand voltage increased as the total amount of tetraethoxysilane added increased, and when the amount added was 3 parts by weight or more, the adhesion strength was 17 kV or more, which was sufficient.

In addition to the above, it was confirmed by adding two or more kinds of silicon oxide fine particles, silicon-containing resin, and silicon-containing organic material. All of them showed high withstand voltage, and the adhesion strength could be increased. It was clear.

In addition to this, as a method for forming the black resin layer, there is a method such as spray coating on a metal back. Even when such a method is used, the effect of the present invention can be similarly obtained. is there.

[0046]

From the above results, the black resin layer for forming the carbon layer on the electron transmissive metal layer on the phosphor layer on the inner surface of the face glass, the silicon oxide fine powder, the silicon-containing resin Alternatively, by adding a silicon-containing organic compound, the adhesion strength of the graphite particles in the carbon layer after firing can be improved and the reliability can be improved.

[Brief description of drawings]

FIG. 1A is a cross-sectional view showing a structure of a metal film transfer sheet according to an embodiment of the present invention, and FIG. 1B is an explanatory view of forming an anode using the same embodiment sheet.

FIG. 2 is a perspective view showing the structure of a thin electron beam display device.

[Explanation of symbols]

 11 Metal Film 12 Black Resin Layer 13 Release Layer 14 Flexible Sheet 15 Metal Film Transfer Sheet 16 Adhesive Layer 17 Phosphor Layer 18 Black Matrix Layer 19 Glass Substrate

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masaki Aoki 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (7)

[Claims] 1. A display device in which a phosphor emits light when irradiated with an electron beam, wherein a phosphor layer is formed on an inner surface of a face glass, and an electron-transmissive metal layer is formed on the phosphor layer. On the electron-permeable metal layer, there is provided a carbon layer formed by firing a resin layer containing at least one of graphite and carbon and containing silicon oxide fine powder mixed therein. Beam display device. 2. A display device which emits a phosphor by irradiation of an electron beam, wherein a phosphor layer is formed on the inner surface of the face glass, and an electron-transmissive metal layer is formed on the phosphor layer. An electron beam display comprising a carbon layer formed by firing a resin layer containing at least one of graphite and carbon and containing a silicon-containing resin on the electron-permeable metal layer. apparatus. 3. A display device which emits a phosphor by irradiation of an electron beam, wherein a phosphor layer is formed on the inner surface of the face glass, and an electron-transmissive metal layer is formed on the phosphor layer. On the electron-permeable metal layer, there is provided a carbon layer formed by firing a resin layer containing at least one of graphite and carbon and containing a silicon-containing organic compound added thereto. Beam display device. 4. A display device which emits a phosphor by irradiation of an electron beam, wherein a phosphor layer is formed on the inner surface of the face glass, and an electron-transmissive metal layer is formed on the phosphor layer. A resin layer containing at least one of graphite and carbon and mixed with plural kinds of three kinds of silicon oxide fine powder, silicon-containing resin, and silicon-containing organic compound on the electron-permeable metal layer. An electron beam display device comprising a carbon layer formed by firing. 5. A resin sheet comprising a flexible sheet, a resin layer formed on the sheet and containing at least one of graphite and carbon, and a metal film formed on the surface of the resin layer. 1. A metal film transfer sheet, wherein one or more of three kinds of silicon oxide fine powder, silicon-containing resin, and silicon-containing organic compound are mixed in. 6. The metal film transfer sheet according to claim 5, wherein a release layer is interposed between the sheet and the resin layer. 7. The metal film transfer sheet according to claim 5, wherein an adhesive layer for transfer adhesion is formed on the surface of the metal film.