JPH07133181A - Method and device for hydrothermal synthesis - Google Patents

Method and device for hydrothermal synthesis

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Publication number
JPH07133181A
JPH07133181A JP27444993A JP27444993A JPH07133181A JP H07133181 A JPH07133181 A JP H07133181A JP 27444993 A JP27444993 A JP 27444993A JP 27444993 A JP27444993 A JP 27444993A JP H07133181 A JPH07133181 A JP H07133181A
Authority
JP
Japan
Prior art keywords
container
hydrothermal synthesis
pressure
growing
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP27444993A
Other languages
Japanese (ja)
Inventor
Yuji Asai
裕次 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP27444993A priority Critical patent/JPH07133181A/en
Publication of JPH07133181A publication Critical patent/JPH07133181A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To provide a hydrothermal synthesis and a device therefor capable of improving a growing efficiency and making the characteristics of an objective substance uniform. CONSTITUTION:This hydrothermally synthetic device 1 is provided with a growing vessel 10 and a pressure vessel 20, and the growing vessel 10 is housed in the pressure vessel 20. A hydraulic medium 40 is filled the pressure vessel 20, and the growing vessel 10 is surrounded with the hydraulic medium 40. A baffle plate 30 is arranged in the growing vessel 10. A flange 16 is disposed at an outer peripheral wall part, and this flange part 16 is located at the almost same height with the baffle plate 30.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、水熱合成方法及び水熱
合成法に用いる装置に係り、更に詳細には、育成容器内
の低温部と高温部をそれぞれ温度勾配なく均一な温度に
することができる水熱合成方法及び水熱合成用装置に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hydrothermal synthesis method and an apparatus used for the hydrothermal synthesis method. More specifically, the low temperature part and the high temperature part in a growing container are made uniform in temperature without a temperature gradient. The present invention relates to a hydrothermal synthesis method and a hydrothermal synthesis apparatus that can perform the same.

【0002】[0002]

【従来の技術】従来から、新規物質の合成、不完全結晶
からの不純物除去、鉱物の改質、及び種々の物質の単結
晶を育成する方法の一つとして、水熱合成法が知られて
いる。例えば、この水熱合成法による単結晶の育成にお
いては、育成容器の低温部に種結晶を吊下げ、高温部に
は原料を充填し、所定のアルカリ又は塩類等の希薄溶液
を注入し、温度差による溶解度の差を利用して種結晶上
に所定物質(培養物)を析出させることにより、単結晶
が育成される。
2. Description of the Related Art Conventionally, hydrothermal synthesis has been known as one of methods for synthesizing new substances, removing impurities from incomplete crystals, modifying minerals, and growing single crystals of various substances. There is. For example, in growing a single crystal by this hydrothermal synthesis method, a seed crystal is hung in a low temperature part of a growth container, a high temperature part is filled with a raw material, and a dilute solution of a predetermined alkali or salt is injected, and the temperature is increased. A single crystal is grown by precipitating a predetermined substance (culture) on the seed crystal by utilizing the difference in solubility due to the difference.

【0003】この際、高温部に充填され原料より溶解し
た溶質は、この高温部と低温部との温度差により上記希
薄溶液に生ずる熱対流により、低温部の種結晶近傍に輸
送され析出するため、高温部と低温部との温度差を一定
に保持しつつ、それぞれの領域内における温度分布をも
均一に保つことが、単結晶の育成効率を向上する上にお
いて重要である。このため、一般に、育成容器内にバッ
フル板を配置して、育成容器内を高温部と低温部とに区
画することが行われる。
At this time, the solute filled in the high temperature part and dissolved from the raw material is transported and deposited near the seed crystal in the low temperature part by thermal convection generated in the dilute solution due to the temperature difference between the high temperature part and the low temperature part. In order to improve the growth efficiency of the single crystal, it is important to keep the temperature difference between the high temperature portion and the low temperature portion constant and also keep the temperature distribution in each region uniform. Therefore, in general, a baffle plate is arranged in the growth container to divide the growth container into a high temperature part and a low temperature part.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、このよ
うな従来の水熱合成においては、高温・高圧下で反応が
行われるため、通常、育成容器を圧力容器内に収容し、
この圧力容器と育成容器との間に適当な圧力媒体(以
下、「圧媒」という。)を充填して育成容器を保護する
ことが行われ、この場合、水熱合成に供される熱は圧媒
を介して育成容器に伝達されることになる。従って、水
熱合成に際し、育成容器の低温部と高温部とに温度差を
付与しようとすると、育成容器を包囲する圧媒のうち、
低温部を包囲する圧媒と高温部を包囲する圧媒との間に
も温度差が付与されるが、圧媒にはこの温度差に起因す
る熱対流が発生する。
However, in such conventional hydrothermal synthesis, since the reaction is carried out under high temperature and high pressure, the growth container is usually housed in a pressure container,
An appropriate pressure medium (hereinafter referred to as "pressure medium") is filled between the pressure vessel and the growth vessel to protect the growth vessel, and in this case, the heat supplied for hydrothermal synthesis is It will be transmitted to the growth container via a pressure medium. Therefore, in hydrothermal synthesis, if an attempt is made to provide a temperature difference between the low temperature part and the high temperature part of the growth container, of the pressure medium surrounding the growth container,
A temperature difference is also given between the pressure medium surrounding the low temperature part and the pressure medium surrounding the high temperature part, but thermal convection occurs in the pressure medium due to this temperature difference.

【0005】この圧媒の熱対流は、高温部(育成容器下
部)から低温部(育成容器上部)に向かって起こるた
め、特に、低温部(単結晶が育成される部分)において
温度勾配が生じ易く、種結晶間で育成速度の差異が生
じ、育成された単結晶の大きさが不揃いになる外、単結
晶間で結晶性が異なる等の特性の不均一を招くという課
題があった。本発明は、このような従来技術の有する課
題に鑑みてなされたものであり、その目的とするところ
は、育成効率を向上させ、目的物質の特性を均一化でき
る水熱合成方法及び水熱合成用装置を提供することにあ
る。
Since the thermal convection of the pressure medium occurs from the high temperature part (lower part of the growth container) toward the low temperature part (upper part of the growth container), a temperature gradient is generated particularly in the low temperature part (part where the single crystal is grown). However, there is a problem in that the growth rate is different between seed crystals, the grown single crystals are not uniform in size, and the crystallinity is different between the single crystals. The present invention has been made in view of the above problems of the prior art, and an object thereof is to improve a growth efficiency and to homogenize the characteristics of a target substance, and a hydrothermal synthesis method. It is to provide a device for use.

【0006】[0006]

【課題を解決するための手段】本発明者は、上記課題を
解決すべく鋭意研究した結果、育成容器及び/又は圧力
容器に圧媒の熱対流を抑制する部材を設けることによ
り、上記課題が解決できることを見出し本発明を完成す
るに至った。従って、本発明の水熱合成方法は、圧力容
器内に育成容器を収容して水熱合成する方法において、
圧力容器と育成容器との空隙部に充填された水が、上下
方向に対流するのを防止し且つ上下方向の圧力を伝搬す
る対流防止手段を上記空隙部に設けて、育成容器内の上
下方向に温度差をつけることを特徴とするまた、本発明
の水熱合成用装置は、育成容器及びこれを収容する圧力
容器を備えた水熱合成に用いる装置において、上記育成
容器の外周部及び/又は圧力容器の内周部には、フラン
ジ部が設けられており、このフランジ部が、上記育成容
器内に配設されたバッフル板とほぼ同じ高さに位置する
ことを特徴とする。
Means for Solving the Problems As a result of intensive studies to solve the above problems, the present inventor has achieved the above problems by providing a member for suppressing heat convection of a pressure medium in a growth container and / or a pressure container. The inventors have found that they can be solved and completed the present invention. Therefore, the hydrothermal synthesis method of the present invention is a method for accommodating a growth vessel in a pressure vessel and performing hydrothermal synthesis,
The water filled in the gap between the pressure vessel and the growth vessel is provided with convection prevention means for preventing convection in the vertical direction and propagating the pressure in the vertical direction, and the vertical direction in the growth vessel. Further, the apparatus for hydrothermal synthesis of the present invention is a device used for hydrothermal synthesis provided with a growth vessel and a pressure vessel for accommodating the same, in the outer peripheral part of the growth vessel and / Alternatively, a flange portion is provided on the inner peripheral portion of the pressure vessel, and the flange portion is positioned at substantially the same height as the baffle plate disposed in the growing vessel.

【0007】[0007]

【作用】本発明の水熱合成装置においては、育成容器の
外周部及び/又は圧力容器の内周部にフランジ部を設
け、その配設位置を育成容器内に設置したバッフル板と
ほぼ同じ高さになるように調整した。従って、水熱合成
下において、圧力容器に注入され育成容器を包囲する圧
媒に発生する熱対流は、上記フランジ部により抑制さ
れ、このフランジ部の上側と下側とにおいて圧媒の温度
差が保たれる。
In the hydrothermal synthesis apparatus of the present invention, the outer peripheral portion of the growing container and / or the inner peripheral portion of the pressure container is provided with a flange portion, and the mounting position thereof is substantially the same as that of the baffle plate installed in the growing container. I adjusted it to be Therefore, under hydrothermal synthesis, the thermal convection generated in the pressure medium that is injected into the pressure vessel and surrounds the growth vessel is suppressed by the flange portion, and the temperature difference of the pressure medium between the upper side and the lower side of the flange portion is small. To be kept.

【0008】そして、上記フランジ部は、育成容器内に
設置したバッフル板とほぼ同じ高さに位置するため、育
成容器内ではバッフル板の上下において適切な温度差が
保たれ続けることになる。よって、水熱合成の反応効率
を向上させ、単結晶の育成においては、得られる単結晶
の大きさを均一にでき、且つその結晶性等の特性をも均
一にすることができる。
Since the flange portion is located at substantially the same height as the baffle plate installed in the growing container, an appropriate temperature difference is maintained above and below the baffle plate in the growing container. Therefore, the reaction efficiency of hydrothermal synthesis can be improved, and in growing a single crystal, the size of the obtained single crystal can be made uniform, and the characteristics such as its crystallinity can also be made uniform.

【0009】以下、本発明の水熱合成用装置について詳
細に説明する。本発明の水熱合成用装置は、反応物質を
充填する育成容器と、この育成容器をその内部に収容し
保護する圧力容器とを備える。育成容器自体の形状は、
特に限定されず、立方体、直方体、3角柱、多角柱等種
々の形状をとり得るが、育成容器内の圧力の均一性、育
成容器外から加わる圧力の均一性及び容器内への熱伝達
の均一性を考慮すれば、円柱状が好ましい。
The hydrothermal synthesis apparatus of the present invention will be described in detail below. The apparatus for hydrothermal synthesis of the present invention comprises a growth container filled with a reaction material, and a pressure container for accommodating and protecting the growth container therein. The shape of the growth container itself is
The shape is not particularly limited, and may have various shapes such as a cube, a rectangular parallelepiped, a triangular prism, and a polygonal prism, but the uniformity of pressure inside the growth container, the uniformity of pressure applied from outside the growth container, and the uniform heat transfer into the container. In consideration of the property, the columnar shape is preferable.

【0010】育成容器の材質も、特に限定されるもので
はないが、水熱合成により得ようとする物質の種類、育
成に用いる原料及び溶媒等に応じた耐蝕性、耐熱性及び
耐圧性等を備えた材料を選定する必要がある。例えば、
ZnO単結晶の育成については、Ag又はPt製とする
のが好ましい。
The material of the growth container is not particularly limited, but the corrosion resistance, heat resistance, pressure resistance and the like depending on the kind of substance to be obtained by hydrothermal synthesis, the raw material used for growth, the solvent, etc. It is necessary to select the provided materials. For example,
For growing a ZnO single crystal, it is preferable to use Ag or Pt.

【0011】この育成容器の内部には、バッフル板が設
置されており、育成容器内を低温部と高温部とに区画し
ている。このバッフル板は、育成容器に注入する溶媒の
熱対流を抑制して低温部と高温部との間の温度差を保つ
ために設置するものであり、貫通孔を有する。その開孔
率は、育成する物質の種類に応じて適宜変更し得るもの
であるが、ZnO単結晶を育成する場合には、3〜10
%程度にするのが好ましい。また、バッフル板の材質
は、特に限定されるものではなく、上記育成容器と同様
に、得ようとする物質の種類等に応じて耐熱性、耐蝕性
等を考慮して適宜選定すればよい。
A baffle plate is installed inside the growing container to divide the growing container into a low temperature part and a high temperature part. This baffle plate is installed to suppress the thermal convection of the solvent injected into the growth container and maintain the temperature difference between the low temperature part and the high temperature part, and has a through hole. The porosity can be appropriately changed depending on the kind of the material to be grown, but in the case of growing a ZnO single crystal, it is 3 to 10.
% Is preferable. Further, the material of the baffle plate is not particularly limited and may be appropriately selected in consideration of heat resistance, corrosion resistance and the like depending on the kind of the substance to be obtained and the like as in the above-mentioned growth container.

【0012】次に、上記圧力容器としては、育成容器を
収容し、育成容器内部に発生する圧力を相殺し育成容器
を保護できるものであればよいが、代表的にオートクレ
ーブを例示できる。
Next, the pressure vessel may be any one capable of accommodating a growth vessel and canceling the pressure generated inside the growth vessel to protect the growth vessel, and an autoclave is representatively exemplified.

【0013】次に、本発明の水熱合成装置の特徴をなす
フランジ部について説明する。このフランジ部は、上記
育成容器の外周壁部又は圧力容器の内周壁部に設けられ
るが、この外周壁部及び内周壁部の双方に設けてもよ
い。そして、このフランジ部は、育成容器の内部に設置
したバッフル板とほぼ同じ高さ、即ち、育成容器内の低
温部と高温部との境界近傍に配設される。
Next, the flange portion which characterizes the hydrothermal synthesizing apparatus of the present invention will be described. The flange portion is provided on the outer peripheral wall portion of the growth container or the inner peripheral wall portion of the pressure container, but may be provided on both the outer peripheral wall portion and the inner peripheral wall portion. The flange portion is arranged at substantially the same height as the baffle plate installed inside the growing container, that is, near the boundary between the low temperature part and the high temperature part in the growing container.

【0014】このフランジ部により、育成容器の外周壁
部と圧力容器の内周壁部との間に介在する圧媒に水熱条
件下で発生する熱対流が抑制され、このフランジ部の上
側と下側とにおいて圧媒の温度差が保たれる。そして、
フランジ部は、育成容器内に設置したバッフル板とほぼ
同じ高さに位置するため、育成容器内ではバッフル板の
上下において適切な温度差(低温部と高温部との温度
差)が保たれ続けることになる。
The flange portion suppresses heat convection generated under hydrothermal conditions in the pressure medium interposed between the outer peripheral wall portion of the growth container and the inner peripheral wall portion of the pressure container, and the upper and lower sides of the flange portion are suppressed. The temperature difference between the pressure medium and the side is maintained. And
Since the flange part is located at almost the same height as the baffle plate installed in the growing container, an appropriate temperature difference (temperature difference between the low temperature part and the high temperature part) is maintained above and below the baffle plate in the growing container. It will be.

【0015】[0015]

【実施例】以下、本発明を図面を参照して実施例により
説明する。図1に、本発明の水熱合成用装置の一実施例
を示す。同図において、この水熱合成用装置1は、育成
容器10と圧力容器20とを備え、育成容器10は、圧
力容器20に収容されている。また、圧力容器20内に
は、圧媒40が充填されており、育成容器10は圧媒4
0により包囲されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the accompanying drawings. FIG. 1 shows an embodiment of the apparatus for hydrothermal synthesis of the present invention. In FIG. 1, the hydrothermal synthesis apparatus 1 includes a growing container 10 and a pressure container 20, and the growing container 10 is housed in the pressure container 20. Further, the pressure vessel 20 is filled with the pressure medium 40, and the growth vessel 10 has the pressure medium 4
Surrounded by 0s.

【0016】上記育成容器10の内部には、バッフル板
30が配置されており、このバッフル板30により、育
成容器10内が低温部12と高温部14とに区画されて
いる。なお、高温部14と低温部12との温度差は、水
熱合成用装置1を包囲する少なくとも2つの加熱帯域を
有する電気炉(図示せず。)により付与することができ
る。
A baffle plate 30 is arranged inside the growing container 10, and the baffle plate 30 divides the inside of the growing container 10 into a low temperature part 12 and a high temperature part 14. The temperature difference between the high temperature section 14 and the low temperature section 12 can be provided by an electric furnace (not shown) having at least two heating zones surrounding the hydrothermal synthesis apparatus 1.

【0017】そして、育成容器10の外周壁部には、フ
ランジ部16が設けられており、このフランジ部16は
バッフル板30とほぼ同じ高さに位置する。従って、水
熱合成を行っている最中に、圧媒40のうち、高温部1
2を包囲する(接する)圧媒42と、低温部14を包囲
する圧媒44との間に温度差を生じて熱対流を発生して
も、この熱対流はフランジ16により抑制され、圧媒4
2と44の温度は同一にはならない。よって、水熱合成
の途中で、圧媒42と44との温度差がほぼ一定に保た
れ、この結果、圧媒42及び44に接する低温部12と
高温部14との温度差も一定に保たれることになる。こ
のように、低温部12と高温部14との温度差が、水熱
合成育成中においてほぼ一定に保たれるので、水熱合成
反応の効率を向上することができる。
A flange portion 16 is provided on the outer peripheral wall portion of the growth container 10, and the flange portion 16 is located at substantially the same height as the baffle plate 30. Therefore, during hydrothermal synthesis, the high temperature part 1 of the pressure medium 40 is
Even if a thermal convection is generated due to a temperature difference between the pressure medium 42 surrounding (contacting) 2 and the pressure medium 44 surrounding the low temperature portion 14, this heat convection is suppressed by the flange 16 and the pressure medium Four
The temperatures of 2 and 44 are not the same. Therefore, during the hydrothermal synthesis, the temperature difference between the pressure media 42 and 44 is kept substantially constant, and as a result, the temperature difference between the low temperature part 12 and the high temperature part 14 in contact with the pressure media 42 and 44 is also kept constant. You will be drunk. In this way, the temperature difference between the low temperature portion 12 and the high temperature portion 14 is kept substantially constant during the hydrothermal synthesis and growth, so that the efficiency of the hydrothermal synthesis reaction can be improved.

【0018】(実施例1)上記水熱合成用装置1を用
い、ZnO単結晶を育成した。この際、低温部12に
は、白金製フレーム3に吊下げた種結晶5を配置し、高
温部14にはZnO焼結体7を配置した。また、育成容
器10内には3mol/lのKOHと1.5mol/l
のLiOHとから成るアルカリ溶媒を注入し、バッフル
板30の開孔率は5%とし、圧媒40としては、蒸留水
を用いた。なお、育成容器10の形状は、内径30mm
×高さ300mmのほぼ円柱状をなし、内容積は約25
0mlであり、圧力容器20の形状は、内径32mm×
高さ330mmであり、内容積は約320mlである。
また、フランジ部16と圧力容器20の内周壁部との隙
間は、約0.1mmである。更に、フレーム3の高さ
は、140mmである。
Example 1 A ZnO single crystal was grown using the hydrothermal synthesis apparatus 1 described above. At this time, the seed crystal 5 suspended on the platinum frame 3 was placed in the low temperature portion 12, and the ZnO sintered body 7 was placed in the high temperature portion 14. In addition, in the growth container 10, 3 mol / l KOH and 1.5 mol / l
Alkaline solvent composed of LiOH of No. 2 was injected, the porosity of the baffle plate 30 was set to 5%, and distilled water was used as the pressure medium 40. The shape of the growth container 10 has an inner diameter of 30 mm.
× Almost cylindrical with a height of 300 mm, the internal volume is about 25
0 ml, and the shape of the pressure vessel 20 is an inner diameter of 32 mm x
It has a height of 330 mm and an internal volume of about 320 ml.
The gap between the flange portion 16 and the inner peripheral wall portion of the pressure vessel 20 is about 0.1 mm. Furthermore, the height of the frame 3 is 140 mm.

【0019】低温部12の温度が高温部14の温度より
常に低くなるように昇温し、低温部12を380℃、高
温部14を395℃に昇温した。この際、育成容器10
内の圧力は850kg/cm2である。このままの状態
で14日間定常運転し、その後に室温にまで温度を下げ
てからZnO単結晶を取り出した。種結晶5のうち、フ
レーム3の最上部に配置した種結晶と、フレーム3の最
下部に配置した種結晶とに注目して育成の度合いを観察
し、得られた結果を表1に示す。なお、上記最上部の温
度と最下部との温度差を△θとし、この最上部と高温部
14との温度差を△Tとして付記する。
The temperature of the low temperature portion 12 was raised so that it was always lower than the temperature of the high temperature portion 14, and the temperature of the low temperature portion 12 was raised to 380 ° C and the temperature of the high temperature portion 14 was raised to 395 ° C. At this time, the growth container 10
The internal pressure is 850 kg / cm 2 . In this state, steady operation was carried out for 14 days, after which the temperature was lowered to room temperature and the ZnO single crystal was taken out. Of the seed crystals 5, the seed crystals arranged at the uppermost part of the frame 3 and the seed crystals arranged at the lowermost part of the frame 3 were observed for the degree of growth, and the obtained results are shown in Table 1. Note that the temperature difference between the uppermost temperature and the lowermost portion is Δθ, and the temperature difference between the uppermost portion and the high temperature portion 14 is ΔT.

【0020】(比較例1)フランジ部16が設けられて
いない育成容器を用いた以外は、実施例1と同様の操作
を繰り返し、得られた結果を表1に示した。 (実施例2)低温部12の温度を380℃とし、高温部
14温度を400℃とし、育成容器10内の圧力を88
0kg/cm2とした以外は、実施例1と同様の操作を
繰り返し、得られた結果を表1に示す。 (比較例2)フランジ部16が設けられていない育成容
器を用いた以外は、実施例2と同様の操作を繰り返し、
得られた結果を表1に示した。
(Comparative Example 1) The same operation as in Example 1 was repeated, except that a growth container having no flange portion 16 was used, and the results obtained are shown in Table 1. (Example 2) The temperature of the low temperature part 12 was 380 ° C, the temperature of the high temperature part 14 was 400 ° C, and the pressure in the growth container 10 was 88.
The same operation as in Example 1 was repeated except that the amount was 0 kg / cm 2, and the results obtained are shown in Table 1. (Comparative Example 2) The same operation as in Example 2 was repeated, except that a growing container in which the flange portion 16 was not provided was used.
The obtained results are shown in Table 1.

【0021】[0021]

【表1】 [Table 1]

【0022】表1から明らかなように、本発明の水熱合
成用容器を用いて育成を行うと、低温部には大きな温度
勾配が発生せず、得られたZnO単結晶の大きさもよく
揃っていることがわかる。
As is clear from Table 1, when the container for hydrothermal synthesis of the present invention was grown, a large temperature gradient was not generated in the low temperature part, and the obtained ZnO single crystals were well sized. You can see that

【0023】以上、本発明を実施例により説明したが、
本発明はこれに限定されるものではなく、本発明の要旨
の範囲内において種々の変形が可能である。例えば、本
発明の水熱合成用装置は、ZnO単結晶の育成のみなら
ず、水熱合成反応を利用する種々の処理に用いることが
できる。また、フランジ部16は、圧力容器20の内周
壁部に設けてもよく、また、育成容器10の外周壁部と
圧力容器20の内周壁部の双方に設けてもよい。更に、
フランジ部16と、圧力容器20の内周壁部等との隙間
は、目的とする水熱合成処理の種類や育成容器等の寸法
に応じて適宜変更することができる。
The present invention has been described above with reference to the embodiments.
The present invention is not limited to this, and various modifications can be made within the scope of the gist of the present invention. For example, the hydrothermal synthesis apparatus of the present invention can be used not only for growing a ZnO single crystal but also for various treatments utilizing a hydrothermal synthesis reaction. Further, the flange portion 16 may be provided on the inner peripheral wall portion of the pressure container 20, or may be provided on both the outer peripheral wall portion of the growth container 10 and the inner peripheral wall portion of the pressure container 20. Furthermore,
The gap between the flange portion 16 and the inner peripheral wall portion of the pressure vessel 20 and the like can be appropriately changed depending on the type of the target hydrothermal synthesis treatment and the dimensions of the growing vessel and the like.

【0024】[0024]

【発明の効果】以上説明したように、本発明によれば、
育成容器及び/又は圧力容器に圧媒の熱対流を抑制する
部材を設けることとしたため、反応効率を向上させ、目
的物質の特性を均一化できる水熱合成方法及び水熱合成
用装置を提供することができる。
As described above, according to the present invention,
Since a member for suppressing thermal convection of the pressure medium is provided in the growth vessel and / or the pressure vessel, a hydrothermal synthesis method and a hydrothermal synthesis apparatus capable of improving reaction efficiency and homogenizing the characteristics of a target substance are provided. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の水熱合成用装置の一実施例を示す断面
図である。
FIG. 1 is a cross-sectional view showing an embodiment of the hydrothermal synthesis apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1 水熱合成用装置、3 フレーム、5 種結
晶、7 ZnO焼結体、10 育成容器、12
低温部、14 高温部、16 フランジ部、20
圧力容器、30 バッフル板、40 圧媒
1 hydrothermal synthesis device, 3 frames, 5 seed crystals, 7 ZnO sintered body, 10 growth container, 12
Low temperature part, 14 High temperature part, 16 Flange part, 20
Pressure vessel, 30 baffle plate, 40 pressure medium

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 圧力容器内に育成容器を収容して水熱合
成する方法において、 圧力容器と育成容器との空隙部に充填された水が、上下
方向に対流するのを防止し且つ上下方向の圧力を伝搬す
る対流防止手段を上記空隙部に設けて、育成容器内の上
下方向に温度差をつけることを特徴とする水熱合成方
法。
1. A method for hydrothermally synthesizing a growth container in a pressure container, wherein water filled in a space between the pressure container and the growth container is prevented from convection in the vertical direction and the vertical direction. A hydrothermal synthesis method, characterized in that a convection preventing means for propagating the pressure is provided in the void portion to make a temperature difference in the vertical direction in the growth container.
【請求項2】 育成容器及びこれを収容する圧力容器を
備えた水熱合成に用いる装置において、 上記育成容器の外周部及び/又は圧力容器の内周部に
は、フランジ部が設けられており、 このフランジ部が、上記育成容器内に配設されたバッフ
ル板とほぼ同じ高さに位置することを特徴とする水熱合
成用装置。
2. An apparatus used for hydrothermal synthesis comprising a growing container and a pressure container accommodating the growing container, wherein a flange portion is provided on an outer peripheral portion of the growing container and / or an inner peripheral portion of the pressure container. An apparatus for hydrothermal synthesis characterized in that the flange portion is located at substantially the same height as the baffle plate arranged in the growing container.
JP27444993A 1993-11-02 1993-11-02 Method and device for hydrothermal synthesis Withdrawn JPH07133181A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27444993A JPH07133181A (en) 1993-11-02 1993-11-02 Method and device for hydrothermal synthesis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27444993A JPH07133181A (en) 1993-11-02 1993-11-02 Method and device for hydrothermal synthesis

Publications (1)

Publication Number Publication Date
JPH07133181A true JPH07133181A (en) 1995-05-23

Family

ID=17541852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27444993A Withdrawn JPH07133181A (en) 1993-11-02 1993-11-02 Method and device for hydrothermal synthesis

Country Status (1)

Country Link
JP (1) JPH07133181A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006513122A (en) * 2002-12-27 2006-04-20 ゼネラル・エレクトリック・カンパニイ Gallium nitride crystal, device based on homoepitaxial gallium nitride, and manufacturing method thereof
US10975492B2 (en) 2002-12-27 2021-04-13 Slt Technologies, Inc. Method of forming a GaN single crystal comprising disposing a nucleation center in a first region, a GaN source material in a second region, and establishing a temperature distribution

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006513122A (en) * 2002-12-27 2006-04-20 ゼネラル・エレクトリック・カンパニイ Gallium nitride crystal, device based on homoepitaxial gallium nitride, and manufacturing method thereof
US10975492B2 (en) 2002-12-27 2021-04-13 Slt Technologies, Inc. Method of forming a GaN single crystal comprising disposing a nucleation center in a first region, a GaN source material in a second region, and establishing a temperature distribution

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