JPH0668430A - Magneto-resistance effect type read converter - Google Patents

Magneto-resistance effect type read converter

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Publication number
JPH0668430A
JPH0668430A JP22109992A JP22109992A JPH0668430A JP H0668430 A JPH0668430 A JP H0668430A JP 22109992 A JP22109992 A JP 22109992A JP 22109992 A JP22109992 A JP 22109992A JP H0668430 A JPH0668430 A JP H0668430A
Authority
JP
Japan
Prior art keywords
bias layer
conductor
converter
magnetoresistive
magnetoresistive effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP22109992A
Other languages
Japanese (ja)
Inventor
Kiyokazu Nagahara
聖万 永原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP22109992A priority Critical patent/JPH0668430A/en
Publication of JPH0668430A publication Critical patent/JPH0668430A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To obtain a magneto-resistance effect type read converter capable of accurately regulating the effective width of an MR element without deteriorating the characteristic of the MR element and adaptive for the realization of a narrow track and high recording density. CONSTITUTION:This converter is provided with the MR element 1, a switching bias layer 2 provided on the MR element in which the film thickness of the first part coming in contact with the active area 5 of the MR element functioning for the detection of a magnetic field is formed thinner than that of the second part of the switching bias layer 2 coming into contact with the passive area at both sides of the active area 5 and in the film thickness less than a prescribed value decided in advance, and a pair of separated conductors 3 whose edge parts are arranged on the second part of the switching bias layer 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は磁気抵抗効果型読み取り
変換器に関し、特に強磁性薄膜を用いた磁気抵抗効果型
読み取り変換器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive read converter, and more particularly to a magnetoresistive read converter using a ferromagnetic thin film.

【0002】[0002]

【従来の技術】磁気抵抗効果型読み取り変換器、すなわ
ち、MR変換器もしくはセンサは(以後MR変換器で代
表する)、高記録密度で磁気記録媒体に記録されている
情報信号を読み取ることのできる磁気変換器として従来
から知られている。MR変換器は、磁気抵抗効果を示す
材料で作られたMR素子の抵抗が磁束の量および方向の
関数として変化するのを利用して磁界信号を検出するも
のである。
2. Description of the Related Art A magnetoresistive read transducer, that is, an MR transducer or a sensor (hereinafter represented by an MR transducer) can read an information signal recorded on a magnetic recording medium at a high recording density. Conventionally known as a magnetic transducer. MR transducers use the fact that the resistance of an MR element made of a material exhibiting a magnetoresistive effect changes as a function of the amount and direction of magnetic flux to detect magnetic field signals.

【0003】種々のMR素子が開発されており、これら
は従来設定された要件を満たしていた。しかしながら、
さらに高い記録密度のために、記録トラックの幅がます
ます狭くされ、かつ、トラックに沿う線記録密度がます
ます高められている状況において、従来技術では、狭い
トラック幅や高い記録密度に適合したMR変換器を形成
することは困難になってきている。
Various MR elements have been developed and these have met the requirements set in the past. However,
In the situation where the recording track width is becoming narrower and the linear recording density along the track is becoming higher due to the higher recording density, the conventional technology is suitable for a narrow track width and a high recording density. Forming MR transducers has become difficult.

【0004】特開昭57−198528号公報には、絶
縁層によってMR素子をバイアス層から隔離した型のM
Rヘッドが開示されている。これでは、トラック幅はヘ
ッドの信号検出のために設けられた一対の導体パターン
間の距離によって定められている。
Japanese Patent Laid-Open No. 57-198528 discloses an M type in which an MR element is separated from a bias layer by an insulating layer.
An R head is disclosed. In this case, the track width is determined by the distance between the pair of conductor patterns provided for detecting the signal of the head.

【0005】図3および図4を参照して従来のMR変換
器について説明する。図3は一対の導電体の間隔によっ
てMR素子有効幅、すなわち能動領域を規定している典
型的なMR変換器の平面図、図4はそのA−A断面図で
ある。
A conventional MR converter will be described with reference to FIGS. 3 and 4. FIG. 3 is a plan view of a typical MR converter in which the effective width of the MR element, that is, the active region is defined by the distance between a pair of conductors, and FIG. 4 is a sectional view taken along line AA.

【0006】MR変換器は、適当な基板(図示せず)の
上に形成されたMR素子1を有する。MR素子1の上に
は、磁気抵抗変換効率向上用バイアス磁界印加のために
反強磁性交換結合力を利用した反強磁性層(以下、交換
バイアス層と記す)2が設置されている。MR変換器に
は非磁性層も含まれているが、ここでは省略されてい
る。MR素子1の能動領域5は導電体3に覆われていな
い領域である。能動領域5は磁界に応じた出力信号を生
じるように機能する。導電体3に覆われているMR素子
1の受動領域4は、導電体3によって電気的に短絡され
ているので、磁気抵抗効果の観点からは役立たなくされ
ている。このMR変換器の場合、能動領域5の幅精度、
すなわち、MR変換器の有効幅の精度は、導電体3の配
置精度に依存している。導電体3の形成方法は、まず、
MR素子1全体を覆うように導電体を付着させてから、
図3および図4に示すように能動領域5に相当する幅を
有する部分のみを残すように、この部分の導電体3をエ
ッチングによって除去している。導電体のエッチング方
法としては、例えば図3および図4に示したMR変換器
の場合では、ケミカルエッチングをおこなっている。
The MR converter has an MR element 1 formed on a suitable substrate (not shown). An antiferromagnetic layer (hereinafter referred to as an exchange bias layer) 2 utilizing an antiferromagnetic exchange coupling force for applying a bias magnetic field for improving the magnetoresistive conversion efficiency is provided on the MR element 1. The MR converter also includes a non-magnetic layer, which is omitted here. The active region 5 of the MR element 1 is a region not covered with the conductor 3. The active area 5 functions to produce an output signal in response to the magnetic field. Since the passive region 4 of the MR element 1 covered with the conductor 3 is electrically short-circuited by the conductor 3, it is useless from the viewpoint of the magnetoresistive effect. In the case of this MR converter, the width accuracy of the active region 5,
That is, the precision of the effective width of the MR converter depends on the placement precision of the conductor 3. The method of forming the conductor 3 is as follows.
After attaching a conductor so as to cover the entire MR element 1,
As shown in FIGS. 3 and 4, the conductor 3 in this portion is removed by etching so as to leave only a portion having a width corresponding to the active region 5. As a method of etching the conductor, for example, in the case of the MR converter shown in FIGS. 3 and 4, chemical etching is performed.

【0007】[0007]

【発明が解決しようとする課題】上述した従来の磁気抵
抗効果型読み取り変換器は、能動領域に付着した導電体
3をケミカルエッチングにより除去している。ケミカル
エッチングでは、一般にエッチングパターン精度はドラ
イエッチングに比べて劣るので、ケミカルエッチングに
よって導電体間隔を規定した従来の磁気抵抗効果型読み
取り変換器では、狭トラック化、高記録密度化に適合さ
せることは困難であるという問題点がある。すなわち、
トラック幅が狭くなるにつれて、一対の導電体パターン
を所定の間隔で正確に配置することは困難になり、従っ
て、MR素子の有効幅を正確に規定することが困難にな
ってきている。
In the above-mentioned conventional magnetoresistive read transducer, the conductor 3 attached to the active region is removed by chemical etching. Since the etching pattern accuracy of chemical etching is generally inferior to that of dry etching, the conventional magnetoresistive effect reading converter in which the conductor spacing is defined by chemical etching is not suitable for narrower tracks and higher recording densities. There is a problem that it is difficult. That is,
As the track width becomes narrower, it becomes difficult to accurately arrange the pair of conductor patterns at a predetermined interval, and thus it becomes difficult to accurately define the effective width of the MR element.

【0008】これを解決する方法としてドライエッチン
グによる導電体の加工が考えられるが、一般にドライエ
ッチングは選択性が小さいので、導電体のエッチングの
際、MR素子の能動領域までエッチングされ、それによ
ってMR変換効率が劣化する可能性が大きい。そのた
め、能動領域がエッチングされる前に導電体のエッチン
グを終了させる方法を試してみたが、導電体が能動領域
上に残ってしまいMR変換効率の低下を招いた。
As a method for solving this problem, it is conceivable to process the conductor by dry etching, but since dry etching generally has low selectivity, the active region of the MR element is etched during etching of the conductor. The conversion efficiency is likely to deteriorate. Therefore, a method of ending the etching of the conductor before the active region was etched was tried, but the conductor remained on the active region, resulting in a decrease in MR conversion efficiency.

【0009】本発明の目的は、MR素子の有効幅を、M
R素子特性を劣化させずに正確に規定でき狭トラック
化、高記録密度化に適合できる磁気抵抗効果型読み取り
変換器を提供することにある。
An object of the present invention is to determine the effective width of the MR element as M
It is an object of the present invention to provide a magnetoresistive effect read converter which can be accurately specified without deteriorating R element characteristics and can be adapted to narrower tracks and higher recording density.

【0010】[0010]

【課題を解決するための手段】本発明の磁気抵抗効果型
読み取り変換器は、磁気抵抗効果素子と、前記磁気抵抗
効果素子上に設けた磁気抵抗変換効率向上用交換結合バ
イアス印加用反強磁性層と、磁界検出のため作用せしめ
る前記磁気抵抗効果素子の能動領域である第1の部分に
接する前記磁気抵抗変換効率向上用交換結合バイアス印
加用反強磁性層の第1の部分の膜厚は前記磁気抵抗効果
素子の第1の部分の両側にある受動領域である第2の部
分に接する前記磁気抵抗変換効率向上用交換結合バイア
ス印加用反強磁性層の第2の部分の膜厚より薄く予じめ
定めた一定値以下の膜厚を有し、前記磁気抵抗変換効率
向上用交換結合バイアス印加用反強磁性層の第2の部分
上に縁部が配置されている分離した一対の導電体とを有
して構成されている。
A magnetoresistive effect read converter according to the present invention comprises a magnetoresistive effect element and an antiferromagnetic element for providing an exchange coupling bias for improving the magnetoresistive conversion efficiency provided on the magnetoresistive effect element. The film thickness of the layer and the first portion of the antiferromagnetic layer for applying the exchange coupling bias for improving the magnetoresistive conversion efficiency, which is in contact with the first portion which is the active region of the magnetoresistive effect element to act for detecting the magnetic field, It is thinner than the film thickness of the second portion of the exchange-coupling bias applying antiferromagnetic layer for improving the magnetoresistance conversion efficiency, which is in contact with the second portions which are the passive regions on both sides of the first portion of the magnetoresistive effect element. A pair of separated conductive layers having a film thickness equal to or less than a predetermined fixed value and having an edge portion arranged on the second portion of the exchange-coupling bias applying antiferromagnetic layer for improving the magnetoresistance conversion efficiency. Is composed of having a body and .

【0011】[0011]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0012】図1は本発明の磁気抵抗効果型読み取り変
換器の一実施例を示す断面図、図2は導電体を設ける前
の本実施例の断面図を示す。
FIG. 1 is a sectional view showing an embodiment of the magnetoresistive reading converter of the present invention, and FIG. 2 is a sectional view of this embodiment before a conductor is provided.

【0013】本実施例の特徴は、導電体3の縁部が交換
バイアス層2上に接するように設けられていることにあ
る。従って、MR素子の能動領域5は導電体3の間隔で
はなく、交換バイアス層間隔によって規定される。磁界
の検出の際に、電流が導電体3に供給されるとき、磁界
に応じた能動領域5の抵抗変化だけが電流の変化をもた
らす。
The feature of this embodiment is that the edge of the conductor 3 is provided so as to be in contact with the exchange bias layer 2. Therefore, the active area 5 of the MR element is defined by the exchange bias layer spacing, not the conductor 3 spacing. During the detection of the magnetic field, when a current is supplied to the conductor 3, only a change in resistance of the active region 5 in response to the magnetic field causes a change in current.

【0014】交換バイアス層2としては、例えばFeM
nなどの反強磁性材料などを用いた。交換バイアス層間
隔を規定する方法としては、まずNiFeなどの強磁性
軟磁性薄膜を磁界印加中蒸着法で約400オングストロ
ーム程度成膜し、形成したMR素子1全体を覆うように
交換バイアス層をスパッタリングにより約500オング
ストロームの厚さまで付着させる。スパッタ条件として
は、Arガス圧:5mmtorr、RFパワー:600Wであ
る。
The exchange bias layer 2 is, for example, FeM.
An antiferromagnetic material such as n was used. As a method of defining the exchange bias layer interval, first, a ferromagnetic soft magnetic thin film such as NiFe is deposited by a vapor deposition method to a thickness of about 400 angstroms while a magnetic field is being applied, and the exchange bias layer is sputtered so as to cover the entire MR element 1 formed. To a thickness of about 500 Å. The sputtering conditions are Ar gas pressure: 5 mm torr and RF power: 600 W.

【0015】次に、図2に示すように、MR素子1の能
動領域5の所定の幅を有する部分のみをエッチングによ
って除去する。このとき除去される領域の交換バイアス
層2は、完全にエッチングするのではなくMR素子能動
領域5がエッチングされないように交換バイアス層を最
大100オングストローム程度残すようにエッチングす
る。
Next, as shown in FIG. 2, only the portion of the active region 5 of the MR element 1 having a predetermined width is removed by etching. The exchange bias layer 2 in the region to be removed at this time is not completely etched but is etched so as to leave the exchange bias layer at a maximum of about 100 Å so that the MR element active region 5 is not etched.

【0016】エッチングの方法としては、現状の交換バ
イアス層2のエッチング方法として広く用いられている
Arガスによるイオンエッチングを用い、エッチング量
の制御は、エッチングレートとエッチング時間によって
行なった。エッチング条件は、Arガス圧:4X10-4
torr、加速電圧:500Vとした。この方法の場合、ケ
ミカルエッチングに比べて精度よくエッチングすること
が可能となり、MR変換器の能動領域5の幅規定精度が
向上した。
As the etching method, ion etching using Ar gas, which is widely used as the current etching method for the exchange bias layer 2, was used, and the etching amount was controlled by the etching rate and the etching time. Etching conditions are Ar gas pressure: 4 × 10 −4
Torr and acceleration voltage: 500V. In the case of this method, etching can be performed with higher accuracy than chemical etching, and the width defining accuracy of the active region 5 of the MR converter is improved.

【0017】図5に交換結合によるバイアス磁界HB
交換バイアス層膜厚依存性を示す。図5から交換バイア
ス層膜厚が100オングストローム以下ではバイアス磁
界がほとんどかかっておらず、実質的には交換バイアス
層2がないのと同じになる。この結果を踏まえて、交換
バイアス層2は、上記のように約100オングストロー
ム程度残すようにエッチングした場合のMR変換効率は
交換バイアス層が完全に除去されている場合と何等変わ
りないことがわかった。
FIG. 5 shows the dependence of the bias magnetic field H B due to exchange coupling on the thickness of the exchange bias layer. From FIG. 5, when the thickness of the exchange bias layer is 100 Å or less, the bias magnetic field is hardly applied, which is substantially the same as the case where the exchange bias layer 2 is not provided. Based on this result, it was found that the MR conversion efficiency when the exchange bias layer 2 is etched to leave about 100 angstroms as described above is no different from that when the exchange bias layer is completely removed. .

【0018】導電体3は、交換バイアス層2を形成した
後、交換バイアス層2およびMR素子1全体を覆うよう
に付着させ、導電体3縁部が交換バイアス層2上に形成
されるようにする。導電体3としては、例えばAuなど
を蒸着法により約2500オングストロームの厚さまで
付着させている。この際、導電体3のエッチングは、も
はやMR素子の能動領域を規定するものではないので、
従来のケミカルエッチング方法で十分である。導電体3
としてAuを用いている場合にはヨウ素およびヨウ化カ
リウムの水溶液にて容易にエッチングすることが可能で
ある。
After forming the exchange bias layer 2, the conductor 3 is attached so as to cover the exchange bias layer 2 and the entire MR element 1 so that the edges of the conductor 3 are formed on the exchange bias layer 2. To do. As the conductor 3, for example, Au or the like is deposited by a vapor deposition method to a thickness of about 2500 Å. At this time, the etching of the conductor 3 no longer defines the active region of the MR element.
Conventional chemical etching methods are sufficient. Conductor 3
When Au is used as the material, it can be easily etched with an aqueous solution of iodine and potassium iodide.

【0019】[0019]

【発明の効果】以上説明したように、本発明の磁気抵抗
効果型読み取り変換器は、従来の製造方法を用いつつM
R素子の能動領域の幅をMR素子特性を劣化させずに格
段に容易にかつ正確に規定することができ狭トラック
化、高記録密度化に適合できるという効果を有してい
る。
As described above, the magnetoresistive effect read converter of the present invention uses the conventional manufacturing method.
The width of the active region of the R element can be markedly easily and accurately defined without deteriorating the characteristics of the MR element, and has an effect that it can be adapted to a narrow track and a high recording density.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気抵抗効果型読み取り変換器の一実
施例を示す断面図である。
FIG. 1 is a sectional view showing an embodiment of a magnetoresistive effect read converter of the present invention.

【図2】導電体を設ける前の本実施例の断面図である。FIG. 2 is a cross-sectional view of this example before a conductor is provided.

【図3】従来の磁気抵抗効果型読み取り変換器を示す平
面図である。
FIG. 3 is a plan view showing a conventional magnetoresistive effect read transducer.

【図4】従来の磁気抵抗効果型読み取り変換器を示す断
面図である。
FIG. 4 is a cross-sectional view showing a conventional magnetoresistive effect read transducer.

【図5】交換バイアス磁界HB の交換バイアス層膜厚依
存性を示す特性図である。
FIG. 5 is a characteristic diagram showing the dependence of the exchange bias magnetic field H B on the exchange bias layer thickness.

【符号の説明】[Explanation of symbols]

1 MR素子 2 交換バイアス層 3 導電体 4 受動領域 5 能動領域 1 MR element 2 Exchange bias layer 3 Conductor 4 Passive region 5 Active region

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 磁気抵抗効果素子と、前記磁気抵抗効果
素子上に設けた磁気抵抗変換効率向上用交換結合バイア
ス印加用反強磁性層と、磁界検出のため作用せしめる前
記磁気抵抗効果素子の能動領域である第1の部分に接す
る前記磁気抵抗変換効率向上用交換結合バイアス印加用
反強磁性層の第1の部分の膜厚は前記磁気抵抗効果素子
の第1の部分の両側にある受動領域である第2の部分に
接する前記磁気抵抗変換効率向上用交換結合バイアス印
加用反強磁性層の第2の部分の膜厚より薄く予じめ定め
た一定値以下の膜厚を有し、前記磁気抵抗変換効率向上
用交換結合バイアス印加用反強磁性層の第2の部分上に
縁部が配置されている分離した一対の導電体とを有する
ことを特徴とする磁気抵抗効果型読み取り変換器。
1. A magnetoresistive effect element, an anti-ferromagnetic layer for applying an exchange coupling bias for improving magnetoresistive conversion efficiency, which is provided on the magnetoresistive effect element, and an active part of the magnetoresistive effect element, which acts for detecting a magnetic field. The film thickness of the first portion of the exchange coupling bias applying antiferromagnetic layer for improving the magnetoresistive conversion efficiency that is in contact with the first portion, which is a region, is the passive region on both sides of the first portion of the magnetoresistive effect element. Which is thinner than the thickness of the second portion of the exchange-coupling bias applying antiferromagnetic layer for improving the magnetoresistive conversion efficiency which is in contact with the second portion of A magnetoresistive effect read converter comprising: a pair of separated conductors whose edges are arranged on a second portion of an exchange coupling bias applying antiferromagnetic layer for improving magnetoresistance conversion efficiency. .
JP22109992A 1992-08-20 1992-08-20 Magneto-resistance effect type read converter Withdrawn JPH0668430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22109992A JPH0668430A (en) 1992-08-20 1992-08-20 Magneto-resistance effect type read converter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22109992A JPH0668430A (en) 1992-08-20 1992-08-20 Magneto-resistance effect type read converter

Publications (1)

Publication Number Publication Date
JPH0668430A true JPH0668430A (en) 1994-03-11

Family

ID=16761480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22109992A Withdrawn JPH0668430A (en) 1992-08-20 1992-08-20 Magneto-resistance effect type read converter

Country Status (1)

Country Link
JP (1) JPH0668430A (en)

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US10278361B2 (en) 2010-10-11 2019-05-07 Innovive, Inc. Rodent containment cage monitoring apparatus and methods
US10448612B2 (en) 2004-12-13 2019-10-22 Innovive, Inc. Process for replacing a cage in a rodentcontainment system for animal husbandry
US10729098B2 (en) 2013-07-01 2020-08-04 Innovive, Inc. Cage rack monitoring apparatus and methods
US10842124B2 (en) 2014-07-25 2020-11-24 Innovive, Inc. Animal containment enrichment compositions and methods

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US10448612B2 (en) 2004-12-13 2019-10-22 Innovive, Inc. Process for replacing a cage in a rodentcontainment system for animal husbandry
US9706752B2 (en) 2005-06-14 2017-07-18 Innovive, Inc. Cage cover with filter, shield and nozzle receptacle
US9888667B2 (en) 2005-06-14 2018-02-13 Innovive, Inc. Cage cover with filter, shield and nozzle receptacle
US10314287B2 (en) 2005-06-14 2019-06-11 Innovive, Inc. Cage cover with filter, shield and nozzle receptacle
US10278361B2 (en) 2010-10-11 2019-05-07 Innovive, Inc. Rodent containment cage monitoring apparatus and methods
US10729098B2 (en) 2013-07-01 2020-08-04 Innovive, Inc. Cage rack monitoring apparatus and methods
US10842124B2 (en) 2014-07-25 2020-11-24 Innovive, Inc. Animal containment enrichment compositions and methods

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