JPH06238124A - Removing method of harmful gas - Google Patents
Removing method of harmful gasInfo
- Publication number
- JPH06238124A JPH06238124A JP5026767A JP2676793A JPH06238124A JP H06238124 A JPH06238124 A JP H06238124A JP 5026767 A JP5026767 A JP 5026767A JP 2676793 A JP2676793 A JP 2676793A JP H06238124 A JPH06238124 A JP H06238124A
- Authority
- JP
- Japan
- Prior art keywords
- harmful gas
- soln
- hydrides
- metal
- arsenic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 17
- 150000004678 hydrides Chemical class 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 9
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 9
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052785 arsenic Inorganic materials 0.000 claims abstract description 8
- 229910052796 boron Inorganic materials 0.000 claims abstract description 8
- 239000011777 magnesium Substances 0.000 claims abstract description 7
- 239000010949 copper Substances 0.000 claims abstract description 6
- 229910052709 silver Inorganic materials 0.000 claims abstract description 6
- 239000004332 silver Substances 0.000 claims abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052802 copper Inorganic materials 0.000 claims abstract description 5
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 5
- 239000000843 powder Substances 0.000 claims abstract description 4
- 150000003839 salts Chemical class 0.000 claims abstract description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 8
- 239000011574 phosphorus Substances 0.000 claims description 8
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 7
- 229910052698 phosphorus Inorganic materials 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- 239000011669 selenium Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052711 selenium Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 239000011135 tin Substances 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000007800 oxidant agent Substances 0.000 abstract description 14
- 230000001590 oxidative effect Effects 0.000 abstract description 11
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 abstract description 6
- -1 etc. Substances 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 19
- 239000007864 aqueous solution Substances 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000012286 potassium permanganate Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 3
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 239000002316 fumigant Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 239000012047 saturated solution Substances 0.000 description 2
- PFUVRDFDKPNGAV-UHFFFAOYSA-N sodium peroxide Chemical compound [Na+].[Na+].[O-][O-] PFUVRDFDKPNGAV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 229910000070 arsenic hydride Inorganic materials 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 229910010277 boron hydride Inorganic materials 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000058 selane Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は有害気体の除害方法に関
する。更に詳しくは、ヒ素、ホウ素、リン、セレン、ゲ
ルマニウムの水素化物の一種以上を含有する有害気体を
極めて効率的に且つ経済的に除害する方法に関する。FIELD OF THE INVENTION The present invention relates to a method for removing harmful gases. More specifically, it relates to a method for extremely efficiently and economically removing harmful gas containing one or more hydrides of arsenic, boron, phosphorus, selenium and germanium.
【０００２】[0002]
【従来の技術】ヒ素、ホウ素、リン、セレン、ゲルマニ
ウムの水素化物は半導体の製造に、リンの水素化物は燻
蒸剤等に多量に使用されているが、これらは微量でも人
体に有害である。従って、気体中に混入したこれら水素
化物を効率よく除去することが必要である。特に燻蒸剤
として使用したリンの水素化物は、極めて高濃度に混入
した気体から極短時間に除去する必要から、より効率的
に除去する除害方法が強く望まれている。2. Description of the Related Art A large amount of hydrides of arsenic, boron, phosphorus, selenium, and germanium are used in the production of semiconductors, and hydrides of phosphorus are used as fumigants. Therefore, it is necessary to efficiently remove these hydrides mixed in the gas. In particular, since phosphorus hydride used as a fumigant needs to be removed from a gas mixed with an extremely high concentration in an extremely short time, a more efficient removal method is strongly desired.
【０００３】気体中に混入したこれらの水素化物を除去
する方法として、乾式法による塩化第二鉄や過マンガン
酸カリウム等の酸化剤を主剤とする吸着剤に吸収させる
吸着法、湿式法による次亜塩素酸ナトリウムや過マンガ
ン酸カリウム、塩化第二鉄等の酸化性溶液を用いる薬液
吸収法等が実用化されている。しかしながら、次亜塩素
酸ナトリウムによる方法は吸収速度が遅いため除去効率
が悪く、過マンガン酸カリウム、塩化第二鉄等による吸
収は気体の処理能が小さく、又過マンガン酸カリウムは
不溶のスラッジが生成し、装置の目詰まりを起こし易い
等の問題点がある。As a method for removing these hydrides mixed in a gas, an adsorption method in which an adsorbent mainly containing an oxidant such as ferric chloride or potassium permanganate is absorbed by a dry method, and a wet method is described below. A chemical solution absorption method using an oxidizing solution such as sodium chlorite, potassium permanganate, and ferric chloride has been put into practical use. However, the method using sodium hypochlorite has a low absorption rate and thus the removal efficiency is poor, and absorption by potassium permanganate, ferric chloride, etc. has a small gas treatment capacity, and potassium permanganate produces insoluble sludge. However, there is a problem in that it is easily generated, and the device is easily clogged.
【０００４】[0004]
【発明が解決しようとする課題】本発明の目的は、気体
中に混入したヒ素、ホウ素、リン、セレン、ゲルマニウ
ムの水素化物を効率的に且つ経済的に除去できる有害気
体の除害方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for removing harmful gases, which can remove hydrides of arsenic, boron, phosphorus, selenium and germanium mixed in the gas efficiently and economically. To do.
【０００５】[0005]
【課題を解決するための手段】本発明は、銅、銀、マグ
ネシウム、亜鉛、アルミニウム、錫、マンガン、鉄、コ
バルト、白金の粉体、塩及び酸化物より選ばれた少くと
も一種の金属及び／又は金属化合物を０．０１重量％以
上配合した水溶液状態で酸化力を有する酸化剤の水溶液
にヒ素、ホウ素、リン、セレン、ゲルマニウムの水素化
物の一種以上を含有する気体を接触させることを特徴と
する有害気体の除害方法である。The present invention is directed to at least one metal selected from copper, silver, magnesium, zinc, aluminum, tin, manganese, iron, cobalt, platinum powders, salts and oxides. Characterized in that a gas containing at least one of hydrides of arsenic, boron, phosphorus, selenium, and germanium is brought into contact with an aqueous solution of an oxidizing agent having an oxidizing power in an aqueous state containing 0.01% by weight or more of a metal compound. It is a method of removing harmful gases.
【０００６】本発明の除害の対象とする有害気体はヒ
素、ホウ素、リン、セレン、ゲルマニウムの水素化物、
例えばＡｓＨ3 、Ｂ2 Ｈ6 、ＰＨ3 、ＳｅＨ2 、ＧｅＨ
4 等の一種以上を含有する気体であり、かかる有害気体
の濃度は、通常０．１〜１０，０００ppm であり、好ま
しくは０．３〜３，０００ppm である。The harmful gases to be removed according to the present invention are arsenic, boron, phosphorus, selenium and germanium hydride,
For example, AsH 3 , B 2 H 6 , PH 3 , SeH 2 , GeH
It is a gas containing at least one of 4 and the like, and the concentration of such harmful gas is usually 0.1 to 10,000 ppm, preferably 0.3 to 3,000 ppm.
【０００７】本発明で使用する酸化剤は水溶液状態で酸
化力を有するものであり、例えば次亜塩素酸塩、塩素酸
塩、過塩素酸塩、過マンガン酸塩、過酸化水素、過酸化
ナトリウム、臭素酸塩、ヨウ素酸塩、クロム酸塩、重ク
ロム酸塩等があげられ、例えば次亜塩素酸ナトリウムや
さらし粉等の次亜塩素酸塩、過酸化水素、過酸化ソーダ
等が好ましい。かかる酸化剤は水溶液として使用され、
その濃度は通常０．１重量％〜飽和溶液であり、好まし
くは１重量％〜飽和溶液である。The oxidizing agent used in the present invention has an oxidizing power in an aqueous solution state, and is, for example, hypochlorite, chlorate, perchlorate, permanganate, hydrogen peroxide, sodium peroxide. , Bromate, iodate, chromate, dichromate, etc., such as hypochlorite such as sodium hypochlorite and bleaching powder, hydrogen peroxide, sodium peroxide and the like are preferable. Such an oxidant is used as an aqueous solution,
The concentration is usually 0.1% by weight to saturated solution, preferably 1% by weight to saturated solution.
【０００８】本発明で使用する金属の種類は銅(Cu)、銀
(Ag)、マグネシウム(Mg)、亜鉛(Zn)、アルミニウム(A
l)、錫(Sn)、マンガン(Mn)、鉄(Fe)、コバルト(Co)及び
白金(Pt)であり、特に銀(Ag)、マグネシウム(Mg)、アル
ミニウム(Al)、鉄(Fe)が好ましい。かかる金属は金属粉
体、塩又は酸化物の状態で使用され、その使用量は酸化
剤水溶液に０．０１重量％以上、好ましくは０．１重量
％以上含ませればその効果を十分示す。０．０１重量％
未満では十分な効果を示さない。その上限は特に定める
必要はなく、多量使用しても差支えないが、特に１重量
％以上加えても効果に差は認められない。The types of metals used in the present invention are copper (Cu) and silver.
(Ag), magnesium (Mg), zinc (Zn), aluminum (A
l), tin (Sn), manganese (Mn), iron (Fe), cobalt (Co) and platinum (Pt), especially silver (Ag), magnesium (Mg), aluminum (Al), iron (Fe) Is preferred. Such a metal is used in the form of metal powder, salt or oxide, and the effect is sufficiently exhibited when the amount of the metal used is 0.01% by weight or more, preferably 0.1% by weight or more in the oxidant aqueous solution. 0.01% by weight
If it is less than the above, a sufficient effect is not exhibited. It is not necessary to set the upper limit in particular, and there is no problem even if it is used in a large amount, but there is no difference in the effect even if 1% by weight or more is added.
【０００９】所定の金属及び／又は金属化合物を配合し
た上記酸化剤の水溶液に有害気体を接触させる方式とし
ては、例えば酸化剤水溶液に有害気体を吹込むバブリン
グ方式、ジェットスクラバー、充填用スクラバー、多孔
板式スクラバー、スプレー式スクラバー、ロータリーア
トマイザー等のスクラバー方式等があげられる。有害気
体を酸化剤水溶液に接触させる温度は通常１００℃以
下、好しくは０〜６０℃であり、接触圧力は通常１０at
m 以下、好しくは０．００１〜５atm である。空間速度
（SV値，単位はVol/Vol/hr）は、０℃１atm 換算で通常
１００，０００以下、好しくは１０，０００以下であ
る。Examples of the method for bringing the harmful gas into contact with the aqueous solution of the oxidizer containing a predetermined metal and / or metal compound include, for example, a bubbling method in which the harmful gas is blown into the aqueous oxidant solution, a jet scrubber, a filling scrubber, and a porous material. Plate type scrubbers, spray type scrubbers, rotary atomizers and other scrubber systems are available. The temperature at which the harmful gas is brought into contact with the aqueous oxidant solution is usually 100 ° C. or lower, preferably 0 to 60 ° C., and the contact pressure is usually 10 at.
m or less, preferably 0.001 to 5 atm. The space velocity (SV value, unit is Vol / Vol / hr) is usually 100,000 or less, preferably 10,000 or less in terms of 0 ° C. and 1 atm.
【００１０】[0010]
【実施例】以下に実施例を記載して本発明をより具体的
に説明する。なお、実施例中の％は重量％であり、有害
ガスの濃度は定電位電解式の測定器で測定した。EXAMPLES The present invention will be described in more detail with reference to the following examples. Incidentally,% in the examples is% by weight, and the concentration of harmful gas was measured by a potentiostatic electrolysis type measuring instrument.
【００１１】[0011]
【実施例１〜８６及び比較例１〜２】水に酸化剤として
表１記載量のＮａＣｌＯ及び表１記載の金属及び／又は
金属化合物（以下金属化合物と記す）を表記載の量配合
して得た除害剤１００mlを直径２．５cm、長さ３０cmの
ガラス管に入れ、これにＡｓＨ3 濃度が１０ppm と１０
０ppm の大気、及びＰＨ3 濃度が１０ppm と１，０００
ppm の大気を、SV値が１，０００の場合で直径１mmの管
より吹込んでバブリング状態で接触させ、出口における
ＡｓＨ3 及びＰＨ3 の濃度を測定し、これより除害剤に
よる除害率を求め、結果を表１〜３に示した。Examples 1 to 86 and Comparative Examples 1 and 2 Mixing water as an oxidant with NaClO in an amount shown in Table 1 and a metal and / or a metal compound shown in Table 1 (hereinafter referred to as a metal compound) in an amount shown in the table. 100 ml of the obtained detoxifying agent was put in a glass tube having a diameter of 2.5 cm and a length of 30 cm, and the AsH 3 concentration was 10 ppm and 10 ppm.
Atmosphere of 0 ppm and PH 3 concentration of 10 ppm and 1,000
When the SV value is 1,000 and the SV value is 1,000, it is blown from a pipe with a diameter of 1 mm and brought into contact in a bubbling state, and the concentrations of AsH 3 and PH 3 at the outlet are measured. The results are shown in Tables 1 to 3.
【００１２】[0012]
【表１】 [Table 1]
【００１３】[0013]
【表２】 [Table 2]
【００１４】[0014]
【表３】 [Table 3]
【００１５】[0015]
【実施例８７〜１１０及び比較例３、４】酸化剤として
表４記載量のＨ2 Ｏ2 及び表４記載の金属化合物を表記
載の量配合して得た除害剤を使用する以外は上記実施例
と同様にして除害率を求め、結果を表４に示した。Examples 87 to 110 and Comparative Examples 3 and 4 Except that an abatement agent obtained by blending H 2 O 2 in an amount shown in Table 4 and a metal compound shown in Table 4 as an oxidizing agent was used. The harm removal rate was determined in the same manner as in the above example, and the results are shown in Table 4.
【００１６】[0016]
【表４】 [Table 4]
【００１７】[0017]
【実施例１１１〜１１４及び比較例５，６】酸化剤とし
て表５記載量のＮａＣＩＯ3 及び表５記載の金属化合物
を表記載の量配合して得た除害剤を使用する以外は上記
実施例と同様にして除害率を求め、結果を表５に示し
た。[Examples 111 to 114 and Comparative Examples 5 and 6] The above-mentioned procedures were carried out except that the harmful agents obtained by compounding the amounts of NaCIO 3 shown in Table 5 and the metal compounds shown in Table 5 as the oxidizing agent were used. The harm removal rate was determined in the same manner as in the example, and the results are shown in Table 5.
【００１８】[0018]
【表５】 [Table 5]
【００１９】[0019]
【実施例１１５〜１２３及び比較例７〜９】水に表６記
載の酸化剤及び金属化合物を表６記載の量配合して得た
除害剤１００mlを直径２．５cm、長さ３０cmのガラス管
に入れ、これにＢ2 Ｈ6 濃度が１０ppm の大気、ＳｅＨ
2 濃度が１０ppm の大気、ＧｅＨ4 濃度が１０ppm の大
気及びＰＨ3 濃度が１，０００ppm の大気を、SV値が１
０，０００の場合で直径１mmの管より吹込んでバブリン
グ状態で接触させ、出口におけるＢ2 Ｈ6 、ＳｅＨ2、
ＧｅＨ4 及びＰＨ3 の濃度を測定し、その結果を表７に
示した。Examples 115 to 123 and Comparative Examples 7 to 9 100 ml of detoxifying agents obtained by mixing water with the oxidizing agents and metal compounds shown in Table 6 in the amounts shown in Table 6 have a diameter of 2.5 cm and a length of 30 cm. Put it in a tube and put it in an atmosphere with a B 2 H 6 concentration of 10 ppm, SeH
2 Atmosphere with a concentration of 10 ppm, atmosphere with a GeH 4 concentration of 10 ppm and atmosphere with a PH 3 concentration of 1,000 ppm have an SV value of 1
In the case of 10,000, it is blown from a tube with a diameter of 1 mm and brought into contact in a bubbling state, and B 2 H 6 at the outlet, SeH 2 ,
The concentrations of GeH 4 and PH 3 were measured, and the results are shown in Table 7.
【００２０】[0020]
【表６】 [Table 6]
【００２１】[0021]
【表７】 [Table 7]
【００２２】[0022]
【発明の効果】本発明の方法によればヒ素、ホウ素、リ
ン、セレン、ゲルマニウムの水素化物の一種以上を含有
する有害気体から極めて効率的に且つ経済的に有害ガス
を除去することができ、その奏する効果は格別なもので
ある。According to the method of the present invention, harmful gas can be removed extremely efficiently and economically from harmful gas containing one or more hydrides of arsenic, boron, phosphorus, selenium and germanium. The effect it produces is exceptional.
Claims (1)
ウム、錫、マンガン、鉄、コバルト、白金の粉体、塩及
び酸化物より選ばれた少くとも一種の金属及び／又は金
属化合物を０．０１重量％以上配合した、水溶液状態で
酸化力を有する酸化剤の水溶液にヒ素、ホウ素、リン、
セレン、ゲルマニウムの水素化物の一種以上を含有する
有害気体を接触させることを特徴とする有害気体の除害
方法。1. At least one metal and / or metal compound selected from powders, salts and oxides of copper, silver, magnesium, zinc, aluminum, tin, manganese, iron, cobalt, platinum is added in an amount of 0.01. Arsenic, Boron, Phosphorus,
A method for removing harmful gas, which comprises contacting a harmful gas containing one or more hydrides of selenium and germanium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5026767A JPH06238124A (en) | 1993-02-16 | 1993-02-16 | Removing method of harmful gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5026767A JPH06238124A (en) | 1993-02-16 | 1993-02-16 | Removing method of harmful gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06238124A true JPH06238124A (en) | 1994-08-30 |
Family
ID=12202447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5026767A Pending JPH06238124A (en) | 1993-02-16 | 1993-02-16 | Removing method of harmful gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06238124A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5527517A (en) * | 1994-11-23 | 1996-06-18 | Philip Morris Incorporated | Liquid scrubbing of gas-phase contaminants |
| JP2010537800A (en) * | 2007-08-31 | 2010-12-09 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Method and apparatus for removing at least one hydrogenated chalcogen compound from an exhaust gas stream |
| CN112657325A (en) * | 2019-10-15 | 2021-04-16 | 中国石油化工股份有限公司 | Method for removing nitrogen oxides from gas |
-
1993
- 1993-02-16 JP JP5026767A patent/JPH06238124A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5527517A (en) * | 1994-11-23 | 1996-06-18 | Philip Morris Incorporated | Liquid scrubbing of gas-phase contaminants |
| US5651917A (en) * | 1994-11-23 | 1997-07-29 | Philip Morris Incorporated | Liquid scrubbing of gas-phase contaminants |
| JP2010537800A (en) * | 2007-08-31 | 2010-12-09 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Method and apparatus for removing at least one hydrogenated chalcogen compound from an exhaust gas stream |
| CN112657325A (en) * | 2019-10-15 | 2021-04-16 | 中国石油化工股份有限公司 | Method for removing nitrogen oxides from gas |
| CN112657325B (en) * | 2019-10-15 | 2023-07-21 | 中国石油化工股份有限公司 | Method for removing nitrogen oxides in gas |
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