JPH06200074A - Polymer composition - Google Patents

Abstract

PURPOSE:To impart a long-lasting water and oil repellency to a polymer compsn. by forming a fluorocarbon-based chemisorption film at least on the surface of a filler present on the surface of a compsn. comprising a polymer matrix and the filler. CONSTITUTION:A chemisorbent e.g. heptadecafluorodecyltrichlorosilane, is brought into contact with the surface of a filler, e.g. fine SiO2 particles 2, to form a chemisorption film 1 which is fixed to the SiO2 surface with-SiO-bonds (covalent bonds). The fine SiO2 particles covered with the film are dispressed in a polypropylene resin 3, and part of the filler particles are exposed to the outside.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a surface-modified polymer composition. Particularly, it relates to a polymer composition having water and oil repellency.

[0002]

2. Description of the Related Art Conventionally, as a polymer composition whose surface is modified to be water-repellent and oil-repellent, for example, the surface of the polymer is coated with a fluorine-containing silane coupling agent, wax and a suspension of fluorocarbon polymer. The thing or the thing which disperse | distributed the fluorocarbon fine particle to the general purpose polymer (Japanese Utility Model Laid-Open No. 2-78148) is generally well known.

[0003]

However, the water and oil repellency of the surface of the polymer composition obtained by the conventional method is
Poor compared to polytetrafluoroethylene. For example, there is a problem that the contact angle with water is about 100 degrees, which is lower than 110 degrees of polytetrafluoroethylene. In addition, the coating film has a weak binding force to the substrate containing the polymer, and if the surface is wiped with a cloth or washed with water repeatedly,
There is a problem that the coating film is peeled off from the substrate and the surface treatment effect is lost.

The present invention has been made in view of the conventional drawbacks, and an object of the present invention is to provide a polymer composition having super water / oil repellency and excellent durability.

[0005]

In order to achieve the above object, the polymer composition of the present invention is a polymer composition comprising at least a polymer matrix resin and a filler. Of at least the surface of the filler present on the surface is covered with a fluorocarbon-based chemical adsorption film.

In the above structure, it is preferable that a fluorocarbon-based chemical adsorption film is formed on the surface of the polymer composition. Further, in the above structure, it is preferable that the filler whose surface is covered with the fluorocarbon-based chemical adsorption film is dispersed in the polymer composition.

In the above structure, it is preferable that the fluorocarbon-based chemical adsorption film is a monomolecular film, a monomolecular cumulative film, or a polymer film. Further, in the above structure, the filler is SiO ₂ , TiO ₂ , Al ₂ O ₃ , Zn.
It is preferably at least one of inorganic particles selected from O, copper, ferrite, and ZnO, whiskers, and glass fibers.

In the above structure, it is preferable that the fluorocarbon-based chemical adsorption film is an alkyl fluoride-based chemical adsorption film.

[0009]

The polymer composition of the present invention has a structure in which the inorganic fine particles covered with a fluorocarbon-based chemical adsorption film are dispersed in the polymer. Therefore, the surface of the polymer composition has numerous inorganic fine particle projections,
Moreover, the surface of the protrusion is covered with water-repellent fluorocarbon. Since this structure is like the surface of a lotus leaf, it exhibits super water repellency. Further, since the inorganic fine particles are in close contact with the polymer, they are difficult to peel off from the surface even when wiped with a cloth. Further, even if it is scraped off by friction, new inorganic fine particles will appear on the surface, and therefore the durability will be excellent.

Next, when a fluorocarbon-based chemical adsorption film is formed on the surface of the polymer composition, the super water repellency and durability are further improved. When the filler whose surface is covered with the fluorocarbon-based chemical adsorption film is dispersed in the polymer composition, when the matrix resin is a hydrophobic polymer in addition to the above-described action, the adhesiveness with the resin is improved. improves.

Further, when the fluorocarbon-based chemical adsorption film is a monomolecular film, a monomolecular cumulative film, or a polymer film, from the adsorption film having a thickness of angstrom or nanometer level to the film having a thickness of more than that, the purpose is It can be formed according to.

Further, the filler is SiO ₂ , TiO ₂ , A
At least one of inorganic particles selected from l ₂ O ₃ , ZnO, copper, ferrite, ZnO, whiskers, and glass fibers.
It is easy to form a chemisorption film via a siloxane bond (-S- bond in the case of copper). Since the filler and the chemisorption film are chemically bonded via the siloxane bond, the durability is excellent.

[0013]

EXAMPLES The present invention will be described in more detail with reference to the following examples. FIG. 1 shows an example of a structure in which inorganic fine particles 2 covered with a fluoroalkyl chemical adsorption film 1 are dispersed in a polymer 3.

In FIG. 2, inorganic fine particles 12 covered with a fluoroalkyl chemical adsorption film 11 are dispersed in a polymer 13 to form a fluoroalkyl chemical adsorption film 11 on the surface of the polymer. It is an example of the structure.

FIG. 3 shows a polymer 23 in which inorganic fine particles 22 are dispersed, and a fluoroalkyl chemical adsorption film 2 is formed on the surface of the inorganic fine particles 22 existing on the surface of the polymer 23.
1 is an example of a structure in which No. 1 is formed.

FIG. 4 shows a polymer 33 in which the inorganic fine particles 32 are dispersed.
2 is an example of a structure in which an alkyl fluoride-based chemical adsorption film 31 is formed on the surface of.

Each of the above examples is characterized in that the surface of the matrix resin is exposed with the filler having the chemical adsorption film covered with the surface. Examples of the polymer resin material that can be used in the present invention include polypropylene resin, polycarbonate resin, acrylic resin, vinyl chloride resin, polystyrene resin, polyethylene resin, polyamide resin,
Aramid resin (aromatic polyamide resin), polyimide resin, acrylic butadiene styrene copolymer (ABS)
Resin, acetal resin, thermoplastic resin such as methylpentene resin, for example, epoxy resin, urea resin, melamine resin, phenol resin, alkyd resin, urethane resin, unsaturated polyester curable resin, thermosetting resin such as ebonite, or butadiene, for example. -Styrene rubber, butyl rubber, nitrile rubber, chloroprene rubber, urethane rubber,
A rubber such as a silicone rubber may be used, and any general general-purpose plastic material may be used.

In the polymer composition of the present invention, when a fluoroalkyl chemical adsorption film is formed on the surfaces of the inorganic fine particles and the polymer, a chlorosilane surfactant having a fluoroalkyl group is used. When the inorganic fine particles are copper, a thiol having a fluorinated alkyl group is used.

Examples of the chlorosilane-based surfactant having a fluorinated alkyl group include CF ₃ (CF ₂ ) ₇ (C
H ₂ ) ₂ SiCl ₃ , CF ₃ CH ₂ O (CH ₂ ) ₁₅ Si
Cl ₃ , CF ₃ (CH ₂ ) ₂ Si (CH ₃ ) ₂ (C
H ₂ ) ₁₅ SiCl ₃ , CF ₃ (CF ₂ ) ₃ Si (C
H ₃ ) ₂ (CH ₂ ) ₉ SiCl ₃ , CF ₃ (CF ₂ ) ₇
Si (CH ₃ ) ₂ (CH ₂ ) ₉ SiCl ₃ , CF ₃ (C
F ₂ ) ₇ Si (CH ₃ ) ₂ (CH ₂ ) ₁₀ SiCl ₃ , C
F ₃ (CF ₂ ) ₇ Si (CH ₃ ) ₂ (CH ₂ ) ₁₆ SiC
l ₃ , CF ₃ COO (CH ₂ ) ₁₅ SiCl ₃ , CF
Starting with trichlorosilane-based surfactants such as ₃ (CF ₂ ) ₅ (CH ₂ ) ₂ SiCl ₃ etc., for example CF ₃ (CF
₂ ) ₇ (CH ₂ ) ₂ SiCl _n (CH ₃ ) _3-n , CF ₃
(CF ₂ ) ₇ (CH ₂ ) ₂ SiCl _n (C
₂ H ₅ ) _3-n , CF ₃ CH ₂ O (CH ₂ ) ₁₅ SiCl _n
(CH ₃ ) _3-n , CF ₃ CH ₂ O (CH ₂ ) ₁₅ SiCl
_{n (C 2 H 5) 3} -n, CF 3 (CH 2) 2 Si (C
_{H 3) 2 (CH 2)} 15 SiCl n (CH 3) 3-n, CF
₃ (CF ₂ ) ₃ Si (CH ₃ ) ₂ (CH ₂ ) ₉ SiCl
_n (C ₂ H ₅ ) _3-n , CF ₃ (CF ₂ ) ₇ Si (C
_{H 3) 2 (CH 2)} 9 SiCl n (CH 3) 3-n, CF
₃ COO (CH ₂ ) ₁₅ SiCl _n (CH ₃ ) _3-n , CF
₃ (CF ₂ ) ₅ (CH ₂ ) ₂ SiCl _n (CH ₃ ) _3-n
(However, n in the formula is 1 or 2 in each case) and the like, and lower alkyl group-substituted monochlorosilane-based or dichlorosilane-based surfactants. Of these, especially trichlorosilane-based surfactants, because a chlorosilyl bond other than the chlorosilyl bond bonded to the hydrophilic group forms an intermolecular bond with the adjacent chlorosilane group and siloxane bond,
It is preferable because it provides a stronger chemical adsorption film. Also, CF
₃ (CF ₂ ) _n CH ₂ CH ₂ SiCl ₃ (where n in the formula
Is an integer, and about 3 to 25 is the easiest to handle), but it is preferable because it is balanced with solvent solubility, chemical adsorption and functionality such as water-repellency and oil-repellency or antifouling property. Furthermore, if a carbon-carbon double bond or a carbon-carbon triple bond group is incorporated into the alkyl chain or the fluorinated alkyl chain portion, it can be crosslinked by electron beam irradiation of about 5 megarads after the formation of the chemisorption film. Further, it is possible to improve the hardness of the chemical adsorption film itself.

The chlorosilane-based surfactant used in the present invention is not only linear as described above, but also has a branched fluorinated alkyl group or hydrocarbon group, or a fluorinated alkyl group at the terminal silicon. Group substituted with a group or a hydrocarbon group (that is, R, R ¹ , R ² and R ³ are represented by general formulas R ₂ SiCl ₂ , R ³ as fluoroalkyl groups or hydrocarbon groups
₃ SiCl, R ¹ R ² SiCl ² or R ¹ R ² R ³
SiCl, etc.) may be used, but the linear form is generally preferable in order to increase the adsorption density. Further, for example, Si
_{Cl 4, SiHCl 3, SiH 2} Cl 2, Cl- (Si
Cl ₂ O) _n -SiCl ₃ (where n is a natural number), S
iCl _m (CH ₃ ) _4-m , SiCl _m (C ₂ H ₅ ) _4-m
(Where m is an integer of 1 to 3), HSiCl _p (C
H ₃ ) _3-p , HSiCl _p (C ₂ H ₅ ) _3-p (where p is 1 or 2) and the like are chemically adsorbed and then reacted with water, The chlorosilyl bond on the surface turns into a hydrophilic silanol bond, and becomes hydrophilic. Among these substances containing a plurality of chlorosilyl groups, tetrachlorosilane (SiCl ₄ ) is preferable because it has a high reactivity and a small molecular weight and can give a silanol bond at a higher density. When made hydrophilic in this way, for example, a chlorosilane-based surfactant containing a fluorinated alkyl group can be chemisorbed thereon, and the chemisorbed film thus obtained is more highly densified. Functions such as oil repellency and antifouling property are further enhanced.

In the present invention, fluoroalkyl thiol is used when forming a fluoroalkyl chemical adsorption film on the surface of copper fine particles. Examples of fluoroalkyl thiols include F (CF ₂ ) _n (CH ₂ ) _m SH, CF ₃ (C
F ₂ ) _m (CH ₂ ) _n SH (m, n = 1 to 18: integer)
And so on.

Examples of the inorganic fine particles used in the present invention include SiO, TiO, SiO ₂ , TiO ₂ and Al.
Examples include ₂ O ₃ , ZnO, ferrite, ZnO whiskers, glass fibers, copper, and the like.

The size of the inorganic fine particles used in the present invention is preferably 0.1 to 100 μm in diameter.
In the polymer composition of the present invention, it is desirable that the inorganic fine particles are dispersed in a proportion of 1 to 200 parts by weight with respect to 100 parts by weight of the polymer resin.

In the first embodiment of the present invention, inorganic fine particles whose surface is covered with a fluoroalkyl chemical adsorption film are dispersed in a polymer. To produce inorganic fine particles whose surface is covered with a fluoroalkyl chemisorption film, a non-aqueous organic solvent in which a chlorosilane-based surfactant having a fluoroalkyl group is dissolved (containing no hydroxyl group, amino group, or imino group) Inorganic fine particles are added to, and 0.5 to 2 under an inert gas atmosphere.
After stirring for an hour, the solvent is removed. When the inorganic fine particles covered with the alkyl fluoride chemisorption film are copper fine particles, the copper fine particles are added to the organic solvent in which the alkyl fluoride thiol is dissolved, and the solvent is removed after stirring for 0.5 to 2 hours.

The second embodiment of the present invention is to disperse inorganic fine particles whose surface is covered with an alkylfluoride-based chemical adsorption film in a polymer and then to deposit the alkylfluoride-based chemical adsorption film on the surface of the polymer. To form.

To form a fluoroalkyl chemisorption film on the surface of the polymer, the polymer is immersed in a non-aqueous organic solvent in which a chlorosilane-based surfactant having a fluoroalkyl group is dissolved for 0.5 to 24 hours. Or dip. The polymer may be exposed to the vapor of a chlorosilane-based surfactant having a fluorinated alkyl group. Alternatively, a non-aqueous organic solvent in which a chlorosilane-based surfactant having a fluorinated alkyl group is dissolved may be sprayed.

The non-aqueous organic solvent used when forming the chemisorption film by the adsorption method is preferably a solvent having no active hydrogen when a chlorosilane-based surfactant is used. Examples include hexadecane, isooctane, toluene, xylene, cyclohexane, tetralin, petroleum ether, chloroform, carbon tetrachloride, perfluorocarbons, perfluoroalkyl tertiary amines and perfluoroalkyl cyclic ethers. When a fluorinated alkyl thiol is used, an alcohol solvent such as ethanol can be used in addition to the non-aqueous solvent. In addition,
When selecting an adsorption solvent, it is necessary to select a solvent that does not dissolve the polymer.

When a chemisorption film is formed on the surface of a polymer, a polymer having no active hydrogen (hydroxyl group, amino group, imino group, carboxyl group, etc.) on the surface is pre-oxidized on the surface before adsorption, It is necessary to create an active group. Examples of the method include oxygen plasma treatment, UV / ozone treatment, corona treatment, and immersion in a mixed solution of concentrated sulfuric acid and potassium dichromate (chromium mixed acid solution treatment).

In the third embodiment of the present invention, inorganic fine particles are dispersed in a polymer, and then a fluoroalkyl chemical adsorption film is formed on the surface of the inorganic fine particles exposed on the surface of the polymer. When the surface of the inorganic fine particles is covered with a thin polymer film, the chemical adsorption film can be efficiently formed on the surface of the inorganic fine particles by removing the polymer film with a sandpaper or sandblast.

In the fourth embodiment of the present invention, inorganic fine particles are dispersed in a polymer, and then a fluoroalkyl chemical adsorption film is formed on the surface of the inorganic fine particles and the polymer. Let

Further, the polymer composition of the present invention and the chemisorption film formed on the surface of the inorganic fine particles can sufficiently function even if only one chemisorption monomolecular film is formed. In order to form only one layer of chemisorption monolayer, a chlorosilane-based surfactant (or thiol-based compound) or a substance containing multiple chlorosilyl groups is chemisorbed and then washed with a non-aqueous solvent without contact with water. It can be done simply without any special process. Further, it goes without saying that the chemical adsorption film may be a monomolecular film accumulated or formed of a polymer.
In this way, when the chemisorption film forms a monomolecular film, the added functional groups are oriented and the density is improved, so that a higher function can be exhibited.

Next, the present invention will be described with reference to specific examples. Example 1 SiO ₂ fine particles 10 having an average particle size of 1 μm in a nitrogen atmosphere
After placing 0 g in a 300 ml beaker, 200 ml of a 1% by volume solution of heptadecafluorodecyltrichlorosilane in cyclohexane was added, and the mixture was left to stand for 50 minutes under ultrasonic waves for 50 minutes. Next, the fine particles are allowed to settle to remove the solvent in the supernatant liquid, washed twice with cyclohexane, and taken out into the air. SiO thus obtained
₂ 20g of fine particles and 100 pellets of polypropylene resin
g was mixed and made into a polymer resin substrate having a thickness of 0.5 mm by a molding machine.

Example 2 The same experiment as in Example 1 was conducted, except that the SiO ₂ fine particles having an average particle size of 1 μm were replaced with glass fibers having a diameter of 1 μm and a length of 20 μm.

Example 3 A similar experiment was conducted by changing the heptadecafluorodecyltrichlorosilane in Example 1 to 10- (heptadecafluorodecyldimethylsilyl) decyltrichlorosilane.

Example 4 A similar experiment was conducted by changing the polypropylene resin in Example 1 to an ABS resin.

Example 5 The same experiment as in Example 1 was carried out by changing the SiO ₂ fine particles to copper fine particles and heptadecafluorodecyltrichlorosilane to heptadecafluorodecylthiol.

Example 6 TiO ₂ fine particles 10 having an average particle size of 1 μm in a nitrogen atmosphere
After placing 0 g in a 300 ml beaker, 200 ml of a 1% heptadecafluorodecyltrichlorosilane solution in cyclohexane was added, and the mixture was subjected to ultrasonic waves for 10 minutes and left as it was for 50 minutes. Next, the solvent is removed by decantation, washed twice with cyclohexane, and taken out in the air. TiO ₂ fine particles 20 thus obtained
g and 100 g of polypropylene pellets were mixed to form a polymer substrate having a thickness of 0.5 mm by a molding machine.

Oxygen plasma (barrel type plasma processing apparatus, P
M-600, manufactured by Samco International Laboratories) and then treated with heptadecafluorodecyltrichlorosilane as a chlorosilane-based surfactant containing a fluoroalkyl group, and a perfluorocarbon solution (FC-40 with a concentration of 10 ^-2 mol / liter) is used. , 3M) in a nitrogen atmosphere at room temperature for 60 minutes, followed by washing unreacted heptadecafluorodecyltrichlorosilane with a perfluorocarbon solvent, followed by washing with pure water to obtain a siloxane containing a fluorinated alkyl group. A chemisorption monolayer was formed on the surface of the polymer substrate through the bond.

Example 7 The same experiment as in Example 6 was carried out by changing the TiO ₂ fine particles to ZnO whiskers.

Example 8 The same experiment as in Example 6 was carried out by changing the polypropylene resin to a polyamide resin.

Example 9 The same experiment as in Example 6 was conducted, except that the polypropylene resin was changed to the polyimide resin.

Example 10 The same experiment as in Example 6 was carried out except that the polypropylene resin was changed to the polyaramid resin.

Example 11 20 g of Al ₂ O ₃ fine particles having an average particle diameter of 1 μm and 100 g of polypropylene resin pellets were mixed and made into a polymer substrate having a thickness of 0.5 mm by a molding machine.

[0044] After sandblasting the surface of the polymer substrate, using a heptadecafluorodecyltrichlorosilane as chlorosilane-based surface active agent containing a fluorinated alkyl group, concentration 10 ^-2 mol / liter of perfluorocarbon solution (FC- 40, manufactured by 3M) under a nitrogen atmosphere at room temperature for 60 minutes, followed by washing unreacted heptadecafluorodecyltrichlorosilane with a perfluorocarbon solvent, followed by washing with pure water to contain a fluorinated alkyl group. A chemisorption monomolecular film via a siloxane bond was formed on the surface of Al ₂ O ₃ fine particles.

Example 12 The same experiment as in Example 11 was carried out by changing the Al ₂ O ₃ particles in Example 11 to ZnO particles.

Example 13 The same experiment as in Example 11 was conducted except that the polypropylene resin in Example 11 was changed to a polycarbonate resin.

Example 14 In Example 11, heptadecafluorodecyltrichlorosilane was added to CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ Si (CH
₃ ) ₂ (CH ₂ ) ₁₆ SiCl ₃ was replaced with the same experiment.

Example 15 The same experiment as in Example 11 was conducted, except that the Al ₂ O ₃ fine particles were changed to Cu fine particles and the heptadecafluorodecyltrichlorosilane was changed to heptadecafluorodecylthiol.

Example 16 20 g of ferrite fine particles having an average particle size of 1 μm and 100 g of 6,6-nylon resin pellets were mixed and made into a polymer resin substrate having a thickness of 0.5 mm by a molding machine.

After the surface of this polymer resin substrate was sandblasted, it was treated with oxygen plasma (barrel type plasma treatment apparatus, PM-600, manufactured by Samco International Laboratories) under the condition of 100 W for 1 minute, and then a fluoroalkyl group was added. using heptadecafluorodecyltrichlorosilane as chlorosilane-based surface active agent containing, concentration 10 ^-2 mo
l / l perfluorocarbon solution (FC-4
0, manufactured by 3M) at room temperature under a nitrogen atmosphere for 60 minutes, and then washed with unreacted heptadecafluorodecyltrichlorosilane with a perfluorocarbon solvent,
Then, it was washed with pure water to form a chemisorption monomolecular film via a siloxane bond containing a fluoroalkyl group on the surface of the polymer resin substrate and the ferrite fine particles.

Example 17 The same experiment as in Example 16 was carried out by changing the ferrite fine particles to ZnO fine particles.

Example 18 The same experiment as in Example 16 was carried out, except that the 6,6-nylon resin was changed to a urethane resin.

Example 19 In Example 16, heptadecafluorodecyltrichlorosilane was added to CF ₃ (CF ₂ ) ₇ (CH ₂ ) ₂ Si (C
A similar experiment was conducted by changing to H ₃ ) ₂ (CH ₂ ) ₁₀ SiCl ₃ .

Example 20 In Example 16, heptadecafluorodecyltrichlorosilane was adsorbed on the surface of the polymer substrate and the fine ferrite particles in the gas phase.

The contact angle of water and hexadecane on the surface of the polymer substrate obtained in Examples 1 to 20 was measured with an automatic contact angle meter (CA-Z type, manufactured by Kyowa Interface Science). The results are shown in Table 1.

[0056]

[Table 1]

As is clear from Table 1, the polymer composition obtained in this example has a contact angle with water of 140 ° or more,
It can be seen that water and oil repellency are excellent when the contact angle with hexadecane is 100 degrees or more.

In the polymer composition of this example, the contact angle with respect to water and hexadecane did not change even after the surface was repeatedly rubbed 10,000 times repeatedly with a cloth containing water, and the durability was excellent.

The chemical adsorption films described in the above examples are all single-layer monomolecular films. However, even a polymer composition in which the chemical-adsorption monomolecular film is accumulated has an unreacted chlorosilane-based surfactant. Even with a chemisorption film formed without cleaning
There was no change in its function.

Furthermore, in each of the above examples, only the polymer containing inorganic fine particles was used, but even a polymer containing a plasticizer, a coloring agent or the like can be used in the polymer composition. There was no change in the assigned functions. Further, when the matrix resin is a fluorine-based resin, the fluorocarbon-based chemical adsorption film is formed on the surface of the filler, so that the adhesiveness between the matrix resin and the filler is improved.

[0061]

As described above, the polymer composition of the present invention has a structure in which inorganic fine particles whose surface is covered with a fluorocarbon-based chemical adsorption film are dispersed in a polymer,
The surface of the polymer composition has innumerable projections of inorganic fine particles, and the surface of the projections is covered with water-repellent fluorocarbon, so that super-water repellency is exhibited. In addition, since the inorganic fine particles are in close contact with the polymer, the durability becomes excellent.

Next, when a fluorocarbon-based chemical adsorption film is formed on the surface of the polymer composition, the super water repellency and durability are further improved. When the filler whose surface is covered with the fluorocarbon-based chemical adsorption film is dispersed in the polymer composition, when the matrix resin is a hydrophobic polymer in addition to the above-described action, the adhesiveness with the resin is improved. improves.

When the fluorocarbon-based chemical adsorption film is a monomolecular film, a monomolecular accumulating film, or a polymer film, the adsorption film having a thickness of angstrom or nanometer level to a film having a thickness of more than that can be obtained. It can be formed according to.

Further, the filler is SiO ₂ , TiO ₂ , A
At least one of inorganic particles selected from l ₂ O ₃ , ZnO, copper, ferrite, ZnO, whiskers, and glass fibers.
It is easy to form a chemisorption film via a siloxane bond (-S- bond in the case of copper). Since the filler and the chemisorption film are chemically bonded via the siloxane bond, the durability is excellent.

[Brief description of drawings]

FIG. 1 is an enlarged sectional conceptual view of a resin composition surface of an example of the present invention.

FIG. 2 is an enlarged sectional conceptual view of the surface of a resin composition of another example of the present invention.

FIG. 3 is an enlarged sectional conceptual view of the surface of a resin composition according to still another embodiment of the present invention.

FIG. 4 is an enlarged sectional conceptual view of the surface of a resin composition of yet another example of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Alkyl fluoride chemical adsorption film 2 Inorganic fine particles (filler) 3 Polymer 11 Alkyl fluoride chemical adsorption film 12 Inorganic fine particles (filler) 13 Polymer matrix resin 21 Alkyl fluoride chemical adsorption film 22 Inorganic fine particles (filler) 23 Polymer Matrix Resin 31 Alkyl Fluoride Chemical Adsorption Film 32 Inorganic Fine Particles (Filler) 33 Polymer Matrix Resin

Front page continuation (72) Inventor Kazufumi Ogawa 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (6)

[Claims] 1. A polymer composition comprising at least a polymer matrix resin and a filler, wherein the surface of the filler present on at least the surface of the polymer composition is covered with a fluorocarbon-based chemical adsorption film. Polymer composition. 2. The polymer composition according to claim 1, wherein a fluorocarbon-based chemical adsorption film is formed on the surface of the polymer composition. 3. The polymer composition according to claim 1, wherein the filler whose surface is covered with the fluorocarbon-based chemical adsorption film is dispersed in the polymer composition. 4. The fluorocarbon-based chemisorption film is a monomolecular film, a monomolecular cumulative film, or a polymer film.
2. The polymer composition according to 2, or 3. 5. The filler is SiO ₂ , TiO ₂ , or Al _2.
The polymer composition according to claim 1, 2, 3, or 4, which is at least one of inorganic particles selected from O ₃ , ZnO, copper, ferrite, and ZnO, whiskers, and glass fibers. 6. The polymer composition according to claim 1, wherein the fluorocarbon-based chemical adsorption film is an alkyl fluoride-based chemical adsorption film.