JPH0616121B2 - Fresnel lens and manufacturing method thereof - Google Patents

Fresnel lens and manufacturing method thereof

Info

Publication number
JPH0616121B2
JPH0616121B2 JP3096485A JP3096485A JPH0616121B2 JP H0616121 B2 JPH0616121 B2 JP H0616121B2 JP 3096485 A JP3096485 A JP 3096485A JP 3096485 A JP3096485 A JP 3096485A JP H0616121 B2 JPH0616121 B2 JP H0616121B2
Authority
JP
Japan
Prior art keywords
fresnel lens
substrate
refractive index
ion exchange
changing portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3096485A
Other languages
Japanese (ja)
Other versions
JPS61189504A (en
Inventor
和久 山本
哲夫 谷内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3096485A priority Critical patent/JPH0616121B2/en
Publication of JPS61189504A publication Critical patent/JPS61189504A/en
Publication of JPH0616121B2 publication Critical patent/JPH0616121B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1876Diffractive Fresnel lenses; Zone plates; Kinoforms

Description

【発明の詳細な説明】 産業上の利用分野 本発明ほコヒーレント光を使用する光情報処理分野、あ
るいは光応用計測制御分野に利用できるフレネルレンズ
およびその製造方法に関するものである。
TECHNICAL FIELD The present invention relates to a Fresnel lens which can be used in the field of optical information processing using coherent light, or in the field of measurement and control of optical application, and a manufacturing method thereof.

従来の技術 従来のフレネルレンズとその製造方法を第4図に示す。
第4図(a)のようにガラス基板1上にフォトレジスト2
をスピンコーティングする。次に第4図(b)のようにあ
らかじめ作製されているフレネルレンズパターンを有し
たCr、マスクによりフォトレジスト2上に露光,現像
を行う。上記の方法によって製造されたフレネルレンズ
でスポット径1.5μmを得ていた(例えば、昭和58
年電子通信学会総合全国大会1029)。
Prior Art FIG. 4 shows a conventional Fresnel lens and its manufacturing method.
Photoresist 2 on glass substrate 1 as shown in FIG. 4 (a).
Spin coating. Next, as shown in FIG. 4 (b), exposure and development are performed on the photoresist 2 by using a mask and a mask having a Fresnel lens pattern which has been prepared in advance. The spot diameter of 1.5 μm was obtained with the Fresnel lens manufactured by the above method (for example, Showa 58).
IEICE General Conference 1029).

発明が解決しようとする問題点 ところで光情報処理、光応用計測制御などの分野ではレ
ンズを偏光板と組み合せて使用することが多く回折,偏
光の両機能を合せ持つ素子が望まれていた。
Problems to be Solved by the Invention By the way, in the fields of optical information processing, optical applied measurement control, etc., a lens is often used in combination with a polarizing plate, and an element having both functions of diffraction and polarization has been desired.

上記のような従来のフレネルレンズの製造方法では回折
特性が偏光方向依存性を持つフレネルレンズは製造でき
なかった。
With the conventional method of manufacturing a Fresnel lens as described above, a Fresnel lens whose diffraction characteristic depends on the polarization direction cannot be manufactured.

問題点を解決するための手段 本発明は、ニオブ酸リチウムまたはタンタル酸リチウム
を主成分とする基板と、前記基板表面からの入射光に対
する出射光の回折特性が偏光方向依存性を有するよう
に、前記基板表面にイオン交換により形成した屈折率変
化部とを備えるフレネルレンズとすることにより上記問
題点を解決する。
Means for Solving the Problems The present invention provides a substrate containing lithium niobate or lithium tantalate as a main component, so that the diffraction characteristics of outgoing light with respect to incident light from the surface of the substrate have polarization direction dependence, The above problem is solved by using a Fresnel lens including a refractive index changing portion formed by ion exchange on the surface of the substrate.

また本発明は、ニオブ酸リチウムまたはタンタル酸リチ
ウムを主成分とする基板表面に、マスクパターンを形成
する工程と、前記マスクパターンをマスクとして、前記
基板表面からの入射光に対する出射光の回折特性が偏光
方向依存性を有するように、前記基板表面にイオン交換
法により屈折率変化部を形成する工程とを有するフレネ
ルレンズの製造方法とするとにより上記問題点を解決す
る。
Further, the present invention, a step of forming a mask pattern on the substrate surface containing lithium niobate or lithium tantalate as a main component, and using the mask pattern as a mask, the diffraction characteristics of the emitted light with respect to the incident light from the substrate surface The above problem is solved by providing a Fresnel lens manufacturing method including a step of forming a refractive index changing portion on the surface of the substrate by an ion exchange method so as to have polarization direction dependency.

作用 本発明は基板において異常光に対する屈折率のみが変化
するというイオン交換法を用いてフレネルレンズを製造
するもので、回折特性に偏光方向依存性を持たせること
でこのレンズは回折,偏光の2機能を1部品で実現する
ことができる。
Function The present invention is to manufacture a Fresnel lens by using the ion exchange method in which only the refractive index for extraordinary light changes in the substrate. By making the diffraction characteristic dependent on the polarization direction, the lens has two characteristics of diffraction and polarization. The function can be realized by one component.

実施例 入射平面波の集束球面波のフレネルレンズ上での位相差
がπの整数倍となる半径がフレネルレンズの境界円の半
径に等しい。よって中心からm番目の境界円の半径をR
mとすれば(1)式が成立する。
Example The radius at which the phase difference of the focused spherical wave of the incident plane wave on the Fresnel lens is an integral multiple of π is equal to the radius of the boundary circle of the Fresnel lens. Therefore, let the radius of the mth boundary circle from the center be R
If m, then equation (1) holds.

ここでfは焦点距離、kは波数である。(1)式に従って
ガラス上にCrによる白黒フレネルレンズパターンのマ
スクを形成した。これにより製造されるフレネルレンズ
の仕様は波長0.6328μmで素子直径3mm,焦束距
離4.6mm,パターンの最小線幅は6μmである。
Here, f is the focal length, and k is the wave number. A black-and-white Fresnel lens pattern mask made of Cr was formed on the glass according to the equation (1). The specification of the Fresnel lens manufactured by this is that the wavelength is 0.6328 μm, the element diameter is 3 mm, the focal length is 4.6 mm, and the minimum line width of the pattern is 6 μm.

次に上記マスクを用いたフレネルレンズ製造工程を第1
図に示す。まず第1図(a)のようにニオブ酸リチウム5
のX面上にAl膜6を電子ビーム蒸着により形成した。
次に第1図(b)のようにフォトレジスト2を塗布してフ
レネルレンズパターンを用いてレジスト上にパターニン
グを行った。次に第1図(c)のようにリン酸系エッチン
グ液でAl膜6をエッチングする。最後に第1図(d)の
ように安息香酸中(240℃)1.5時間イオン交換を
行った後、Al膜6を除去する。こうしてイオン交換に
よる屈折率変化部8が形成されるイオン交換時間は以下
のように決定した。
Next, the Fresnel lens manufacturing process using the mask
Shown in the figure. First, as shown in Fig. 1 (a), lithium niobate 5
An Al film 6 was formed on the X surface of the substrate by electron beam evaporation.
Next, as shown in FIG. 1B, a photoresist 2 was applied and patterned on the resist using a Fresnel lens pattern. Next, as shown in FIG. 1C, the Al film 6 is etched with a phosphoric acid-based etching solution. Finally, as shown in FIG. 1 (d), ion exchange is performed in benzoic acid (240 ° C.) for 1.5 hours, and then the Al film 6 is removed. The ion exchange time for forming the refractive index changing portion 8 by ion exchange in this way was determined as follows.

ニオブ酸リチウム中での端数をk1,同イオン交換による
屈折率変化部3での端数をk2,折率変化部8の厚みをd
とすると位相差φは(2)式で与えられる。
The fraction in lithium niobate is k 1 , the fraction in the refractive index changing portion 3 due to the same ion exchange is k 2 , and the thickness of the refractive index changing portion 8 is d.
Then, the phase difference φ is given by equation (2).

ここでΔnは屈折率変化部8とニオブ酸リチウム5との
屈折率差,K0は真空中での波数である。この位相差を
πだけ変化させようとすると(2)式より厚みd=λ/
(2△n)となる。He−Neレーザの波長λを0.6
328μm,屈折率差を0.128とすると厚みdは
2.5μmとなり、それに要するイオン交換時間は第2
図に示すイオン交換時間とイオン交換深さの関係より
1.5時間となる。
Here, Δn is the refractive index difference between the refractive index changing portion 8 and the lithium niobate 5, and K 0 is the wave number in vacuum. When trying to change this phase difference by π, the thickness d = λ /
(2Δn). The wavelength λ of the He-Ne laser is 0.6
If the refractive index difference is 328 μm and the refractive index difference is 0.128, the thickness d is 2.5 μm, and the ion exchange time required for this is the second.
From the relationship between the ion exchange time and the ion exchange depth shown in the figure, it will be 1.5 hours.

作製されたフレネルレンズ9にHe−Neレーザ光を入
射させ、垂直偏光(異常光方向)と水平偏光(常光方
向)との消光比を測定したところ30dBであった。ま
た焦光面上での光強度分布を測定したところスポットサ
イズは6μmであった。このように本実施例のフレネル
レンズは小型,軽量,製造価格が安いなどの多くの長所
を持つ。
He-Ne laser light was made incident on the prepared Fresnel lens 9, and the extinction ratio of vertically polarized light (extraordinary light direction) and horizontal polarized light (ordinary light direction) was measured and found to be 30 dB. When the light intensity distribution on the focal plane was measured, the spot size was 6 μm. As described above, the Fresnel lens of this embodiment has many advantages such as small size, light weight, and low manufacturing cost.

本発明のフレネルレンズの他の実施例を第3図に示す。
第3図(a)のようにイオン交換のマスクとなるニオブ酸
リチウム5上のAl膜6をのこぎり波状に形成しておき
イオン交換法により第2図(b)のようにニオブ酸リチウ
ム5における屈折率変化部8をブレーズ化した。このよ
うにフレネルレンズ9をブレーズ化することによりほぼ
100%の効率で結像を行うことができ消光比は40d
Bであった。なお実施例では基板にLiNbO3を用い
たがLiTaO3を用いても良い。
Another embodiment of the Fresnel lens of the present invention is shown in FIG.
As shown in FIG. 3 (a), an Al film 6 on the lithium niobate 5 serving as a mask for ion exchange is formed in a sawtooth shape, and the ion exchange method is applied to the lithium niobate 5 as shown in FIG. 2 (b). The refractive index changing portion 8 was blazed. Thus, by blazing the Fresnel lens 9, it is possible to form an image with an efficiency of almost 100%, and the extinction ratio is 40d.
It was B. Although LiNbO 3 was used for the substrate in the examples, LiTaO 3 may be used.

発明の効果 本発明のフレネルレンズおよびその製造方法によれば、
このフレネルレンズは回折特性が偏光方向依存性を有す
るため回折機能および偏光機能の二機能を一素子で構成
することができるコンパクト化が図れる。
Effects of the Invention According to the Fresnel lens of the present invention and the manufacturing method thereof,
Since the Fresnel lens has a diffraction direction dependency of the diffraction characteristic, it is possible to make the Fresnel lens compact, in which the two functions of the diffraction function and the polarization function can be configured by one element.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例のフレネルレンズの製造工程
を説明するための図、第2図はイオン交換時間とイオン
交換深さの関係を示す図、第3図は本発明の他の実施例
のフレネルレンズの製造工程を説明するための図、第4
図は従来のフレネルレンズの製造工程を説明するための
図である。 5……ニオブ酸リチウム、8……屈折率変化部、9……
フレネルレンズ。
FIG. 1 is a diagram for explaining a manufacturing process of a Fresnel lens according to an embodiment of the present invention, FIG. 2 is a diagram showing a relation between ion exchange time and ion exchange depth, and FIG. 3 is another diagram of the present invention. FIG. 4 is a view for explaining the manufacturing process of the Fresnel lens of the embodiment, FIG.
The figure is a figure for demonstrating the manufacturing process of the conventional Fresnel lens. 5: Lithium niobate, 8: Refractive index changing part, 9:
Fresnel lens.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】ニオブ酸リチウムまたはタンタル酸リチウ
ムを主成分とする基板と、 前記基板表面からの入射光に対する出射光の回折特性が
偏光方向依存性を有するように、前記基板表面にイオン
交換により形成した屈折率変化部とを備えることを特徴
とするフレネルレンズ。
1. A substrate containing lithium niobate or lithium tantalate as a main component, and ion exchange is performed on the surface of the substrate so that diffraction characteristics of outgoing light with respect to incident light from the surface of the substrate have polarization direction dependence. A Fresnel lens comprising the formed refractive index changing portion.
【請求項2】ニオブ酸リチウムまたはタンタル酸リチウ
ムを主成分とする基板にはX板を用いることを特徴とす
る特許請求の範囲第1項記載のフレネルレンズ。
2. The Fresnel lens according to claim 1, wherein an X plate is used as the substrate containing lithium niobate or lithium tantalate as a main component.
【請求項3】屈折率変化部の厚みdと、入射光の波長λ
と、前記屈折率変化部と基板との屈折率差Δnとの間
に、 d=λ/(2・Δn)の関係があることを特徴とする特
許請求の範囲第1項記載のフレネルレンズ。
3. The thickness d of the refractive index changing portion and the wavelength λ of the incident light.
2. The Fresnel lens according to claim 1, wherein there is a relationship of d = λ / (2 · Δn) between the refractive index change portion and the refractive index difference Δn between the substrate and the substrate.
【請求項4】ニオブ酸リチウムまたはタンタル酸リチウ
ムを主成分とする基板表面に、マスクパターンを形成す
る工程と、 前記マスクパターンをマスクとして、前記基板表面から
の入射光に対する出射光の回折特性が偏光方向依存性を
有するように、前記基板表面にイオン交換法により屈折
率変化部を形成する工程とを有することを特徴とするフ
レネルレンズの製造方法。
4. A step of forming a mask pattern on the surface of a substrate containing lithium niobate or lithium tantalate as a main component, and using the mask pattern as a mask, diffraction characteristics of outgoing light with respect to incident light from the substrate surface And a step of forming a refractive index changing portion on the surface of the substrate by an ion exchange method so as to have polarization direction dependency.
【請求項5】安息香酸中、160℃〜250℃の温度で
イオン交換法を行うことを特徴とする特許請求の範囲第
4項記載のフレネルレンズの製造方法。
5. The method for producing a Fresnel lens according to claim 4, wherein the ion exchange method is carried out in benzoic acid at a temperature of 160 ° C. to 250 ° C.
JP3096485A 1985-02-19 1985-02-19 Fresnel lens and manufacturing method thereof Expired - Lifetime JPH0616121B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3096485A JPH0616121B2 (en) 1985-02-19 1985-02-19 Fresnel lens and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3096485A JPH0616121B2 (en) 1985-02-19 1985-02-19 Fresnel lens and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPS61189504A JPS61189504A (en) 1986-08-23
JPH0616121B2 true JPH0616121B2 (en) 1994-03-02

Family

ID=12318354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3096485A Expired - Lifetime JPH0616121B2 (en) 1985-02-19 1985-02-19 Fresnel lens and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0616121B2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0630166B2 (en) * 1986-12-12 1994-04-20 日本電気株式会社 Optical head device
DE69319676T2 (en) * 1992-08-07 1998-12-10 Matsushita Electric Ind Co Ltd Optical system and device for image information
JP2532818B2 (en) * 1993-02-01 1996-09-11 松下電器産業株式会社 Objective lens and optical head device
US5815293A (en) * 1993-02-01 1998-09-29 Matsushita Electric Industrial Co., Ltd. Compound objective lens having two focal points
US5754512A (en) * 1995-05-30 1998-05-19 Matsushita Electric Industrial Co., Ltd. Correction elements to lower light intensity around an optical axis of an optical head with a plurality of focal points
DE19619478A1 (en) * 1996-05-14 1997-11-20 Sick Ag Optical arrangement with diffractive optical element
TWI575257B (en) * 2012-12-17 2017-03-21 鴻海精密工業股份有限公司 Optical coupling lens and optical communication module
TW201426153A (en) * 2012-12-24 2014-07-01 Hon Hai Prec Ind Co Ltd Light modulator
CN107037512B (en) * 2017-05-19 2023-08-22 首都师范大学 High-efficiency diffraction lens

Also Published As

Publication number Publication date
JPS61189504A (en) 1986-08-23

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