JPH0543791B2 - - Google Patents
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- Publication number
- JPH0543791B2 JPH0543791B2 JP61165422A JP16542286A JPH0543791B2 JP H0543791 B2 JPH0543791 B2 JP H0543791B2 JP 61165422 A JP61165422 A JP 61165422A JP 16542286 A JP16542286 A JP 16542286A JP H0543791 B2 JPH0543791 B2 JP H0543791B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- powder
- ultrafine
- ultrafine powder
- ultra
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000843 powder Substances 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 8
- 229910021398 atomic carbon Inorganic materials 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 30
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 239000010408 film Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 11
- 229910002804 graphite Inorganic materials 0.000 description 10
- 239000010439 graphite Substances 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000002657 fibrous material Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003937 drug carrier Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011553 magnetic fluid Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000011197 physicochemical method Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- -1 sensors Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
（技術の分野）
この発明は、表面に反応性ガスに基づく炭素超
薄膜を形成した超微粉体に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Technology) The present invention relates to an ultrafine powder having an ultra-thin carbon film formed on its surface based on a reactive gas.
（技術の背景）
無機化合物、金属、合金あるいは半金属などの
粉体や繊維状物質は、触媒、センサー、磁性材
料、顔料、トナー等として広く工業的に利用され
ている。(Technical background) Powder and fibrous substances such as inorganic compounds, metals, alloys, and semimetals are widely used industrially as catalysts, sensors, magnetic materials, pigments, toners, and the like.
これらの粉体または繊維状物質は粒子サイズが
小さくなるに従つて表面活性が大きくなり、この
大きな表面活性は逆にその安定性を低下させるこ
とも知られている。 It is also known that as the particle size of these powders or fibrous materials decreases, their surface activity increases, and that this increased surface activity conversely reduces their stability.
このため、従来より、このような粉体または繊
維状物質の耐候安定性を保つために、種々の方法
によつて表面処理が行われている。この方法は、
化学的、物理的、あるいは物理化学的方法等に大
別され、粉体または繊維状物質の使用目的、用途
に対応した方法が用いられてきいる。 Therefore, in order to maintain the weather resistance stability of such powder or fibrous materials, various methods have been used to perform surface treatments. This method is
Methods are broadly classified into chemical, physical, and physicochemical methods, and methods are used depending on the purpose and use of the powder or fibrous material.
また、表面処理によつて粒子または繊維状物質
の表面に新しい機能を付与し、表面改質すること
もしばしば行われている。 Furthermore, surface treatment is often carried out to impart new functions to the surface of particles or fibrous substances, thereby modifying the surface.
ドライコーテイング、いわゆる気相被覆処理法
もこのうちの有力な方法の一つである。 Dry coating, a so-called vapor phase coating method, is also one of the effective methods.
このドライコーテイングは液相処理法に比べて
処理プロセスそのための装置が簡単で、かつ、コ
ンパクトなものである。また、形成された被覆が
強固で、さらには、液相法のように処理液の処分
の問題がないなどの点で有利なものである。 This dry coating requires a simpler and more compact treatment process than the liquid phase treatment method. Further, the formed coating is strong and furthermore, it is advantageous in that there is no problem of disposal of the processing liquid as in the liquid phase method.
しかしながら、従来の気相表面処理法である真
空蒸着、スパツタリング、イオンプレーテイング
法では、蒸発物質が蒸発源から直線的に飛行する
ために、粒子の全表面を均一にコーテイングする
ことは難しく、特にその大きさが数百〜数千オン
グストローム単位の超微粉体の場合には困難でも
あつた。 However, with conventional gas phase surface treatment methods such as vacuum evaporation, sputtering, and ion plating, it is difficult to uniformly coat the entire surface of particles because the evaporated substances fly in a straight line from the evaporation source. This was difficult in the case of ultrafine powder with a size of several hundred to several thousand angstroms.
（発明の目的）
この発明は、このような事情に鑑みてなされた
ものであり、高表面活性と新機能性が期待されな
がらもその表面への気相薄膜形成が困難であり、
いまだ新物質として実現されてきていない表面被
覆超微粉体を提供することを目的としている。(Objective of the Invention) This invention was made in view of the above circumstances, and although high surface activity and new functionality are expected, it is difficult to form a vapor phase thin film on the surface.
The purpose is to provide surface-coated ultrafine powder, which has not yet been realized as a new material.
さらに詳しくは炭素超薄膜を被覆した超微粉体
を提供することを目的としている。 More specifically, the purpose is to provide ultrafine powder coated with an ultrathin carbon film.
（発明の開示）
この発明は、上記の目的を達成するために、超
微粉体の表面に原子状炭素超薄膜を被覆してなる
ことを特徴とする超微粉体を提供する。(Disclosure of the Invention) In order to achieve the above object, the present invention provides an ultrafine powder characterized in that the surface of the ultrafine powder is coated with an ultrathin film of atomic carbon.
すなわち、この発明は、これまで全く実現され
てきていない原子層レベルの原子状炭素超薄膜ラ
ビリンスシール部を被覆した超微粉体を提供する
ものであり、このような超微粉体の実現を予期す
ることも、また、これを具体化することも従来の
技術からは考えられなかつたことである。 In other words, the present invention provides an ultrafine powder coated with an atomic layer-level atomic carbon ultra-thin film labyrinth seal, which has not been achieved at all up to now. This was something that could not have been anticipated or realized using conventional techniques.
実際、この発明においては、数原子層から数10
原子層程度までの超微細、超微小の領域で、炭素
被覆した超微粉体を提供することを可能とした。 In fact, in this invention, from several atomic layers to several tens of atomic layers
We have made it possible to provide carbon-coated ultrafine powder in the ultrafine and ultrafine regions down to the atomic layer level.
使用するガスとしては、加熱することによつて
超微粉体の表面で反応し、均質な超薄膜、すなわ
原子状レベルでの炭素薄膜の形成を可能としえる
炭化水素または一酸化炭素の任意のものを用いる
ことができる。ガスの反応を可能とするために、
一般的には減圧、高温の条件を採用する。 The gas to be used is any hydrocarbon or carbon monoxide that can react on the surface of the ultrafine powder by heating and form a homogeneous ultra-thin film, that is, a carbon thin film at the atomic level. can be used. To enable gas reactions,
Generally, conditions of reduced pressure and high temperature are adopted.
この際使用する方法は、従来の真空蒸着法、ス
パツタリング、あるいはイオンプレーテイングと
本質的に相違するもので、従来の方法の場合には
蒸発物質が原料もしくは原料ターゲツト材料から
直線的に飛行して粉体や繊維状物質の表面に付着
するのに対し、この発明に採用する方法の場合に
は、超微粉体の表面の全体でガス反応を行わせ
る。 The method used here is essentially different from conventional vacuum evaporation, sputtering, or ion plating, in which the evaporated material flies in a straight line from the raw material or raw target material. In the method employed in the present invention, the gas reaction is caused to occur on the entire surface of the ultrafine powder, whereas it adheres to the surface of the powder or fibrous material.
また、この発明では、炭素超薄膜の形成は、粉
体の表面の活性化作用によつて進行すると考えら
れる。このため、超微粉体とガスとの反応に基づ
く炭素超薄膜との密着性は強く、安定した被膜を
得ることができる。 Further, in the present invention, it is believed that the formation of the ultra-thin carbon film proceeds by activation of the surface of the powder. Therefore, the adhesion between the ultra-fine powder and the ultra-thin carbon film based on the reaction between the gas is strong, and a stable film can be obtained.
対象とする超微粉体の種類についても格別の限
定はない。加熱条件下で分解または反応すること
のない金属、合金、半金属、金属間化合物、無機
化合物、さらには耐熱性有機ポリマーなどの任意
のものを用いることができる。 There are no particular limitations on the type of ultrafine powder to be used. Any material that does not decompose or react under heating conditions can be used, such as metals, alloys, metalloids, intermetallic compounds, inorganic compounds, and even heat-resistant organic polymers.
被覆によつて生成させるグラフアイト等の炭素
超薄膜の膜厚やその物性については、使用するガ
スの種類、処理温度、圧力、処理時間を調整する
ことによつて原子層レベルの所望のものとするこ
とができる。 The thickness and physical properties of ultra-thin carbon films such as graphite produced by coating can be adjusted to the desired atomic layer level by adjusting the type of gas used, processing temperature, pressure, and processing time. can do.
たとえば、炭化水素を反応性ガスとして用いる
場合には、温度はたとえば400〜1000℃程度とし、
減圧化、または不活性ガス（アルゴン、ヘリウ
ム、窒素など）の混合によつて１気圧程度として
処理すればよい。 For example, when hydrocarbons are used as the reactive gas, the temperature should be about 400 to 1000°C,
The pressure may be reduced to about 1 atmosphere by reducing the pressure or mixing an inert gas (argon, helium, nitrogen, etc.).
粉体が、ニツケル、コバルト等の遷移元素の場
合には、付着した原子状炭素超薄膜はグラフアイ
ト構造をもつ結晶として成長する。グラフアイト
のＣ面は粒子表面に平行になる。またこの場合、
グラフアイトは、最小二原子層6.8から数10原子
層にまで任意の膜厚に成長させることができる。 When the powder is a transition element such as nickel or cobalt, the attached ultra-thin atomic carbon film grows as a crystal with a graphite structure. The C-plane of graphite is parallel to the particle surface. Also in this case,
Graphite can be grown to any thickness from a minimum of 6.8 diatomic layers to several tens of atomic layers.
シリコンの超微粒子やウイスカー等の超微粉体
についてても同様に安定なグラフアイト被膜を形
成することができる。酸化チタン、二酸化珪素、
アルミナ、酸化鉄などの表面処理にも用いること
ができる。 Similarly, a stable graphite coating can be formed using ultrafine powders such as ultrafine silicon particles and whiskers. titanium oxide, silicon dioxide,
It can also be used for surface treatment of alumina, iron oxide, etc.
グラフアイト薄膜の形成は、このグラフアイト
が安定な非磁性物質であるため、磁性粉体等の表
面コーテイング方法として極めて有効なものであ
る。磁性を持つトナー材料、顔料、磁性流体の製
造にも有利である。また、アルミナ、酸化チタン
などの不良導体の処理に適用することにより、電
気的に導電性を持たせることもでき、導電性の顔
料などを製造することができる。 Formation of a graphite thin film is an extremely effective method for coating the surface of magnetic powder, etc., since graphite is a stable non-magnetic substance. It is also advantageous in the production of magnetic toner materials, pigments, and magnetic fluids. Furthermore, by applying it to the treatment of defective conductors such as alumina and titanium oxide, it is possible to make them electrically conductive, and it is possible to produce conductive pigments and the like.
さらに、グラフアイト等の炭素の超薄膜は表面
が活性であるから、薬剤担体として表面に重合反
応によつて薬剤をコーテイグすることができる。 Furthermore, since the ultra-thin film of carbon such as graphite has an active surface, it is possible to coat the surface with a drug by a polymerization reaction as a drug carrier.
たとえば以上のように、この発明の原子状炭素
超薄膜を被覆した超微粉体によつて、その新素材
としての利用分野はさらに拡大し、またその利用
態様は著しく高度化される。 For example, as described above, the ultrafine powder coated with the atomic carbon ultrathin film of the present invention further expands its field of use as a new material and significantly advances its usage.
この発明の原子状炭素超薄膜を被覆した超微粉
体を製造するにあたつて用いることのできる反応
装置について説明すると、この装置は、内部を真
空減圧状態とすることのできる加熱炉と、加熱炉
内に反応性ガス、または反応性ガスと不活性ガス
との混合ガスを供給する供給系と、真空排気系
と、加熱炉内に超微粉体とを供給する系と、反応
性ガスに基づくグラフアイト超薄膜を形成させた
超微粉体とを回収する系とからなり、超微粉体の
表面においてガス反応が行われるようにしたこと
を特徴としている。 To explain the reaction apparatus that can be used to produce the ultrafine powder coated with the ultrathin atomic carbon film of the present invention, this apparatus includes a heating furnace that can create a vacuum inside, A supply system that supplies a reactive gas or a mixed gas of a reactive gas and an inert gas into the heating furnace, a vacuum exhaust system, a system that supplies ultrafine powder into the heating furnace, and a reactive gas It consists of a system for recovering ultrafine powder on which an ultrathin graphite film is formed based on graphite, and is characterized in that a gas reaction takes place on the surface of the ultrafine powder.
この装置について、図面に沿つてさらに詳細に
説明する。 This device will be described in more detail with reference to the drawings.
第１図、第２図および第３図は、この発明の装
置の例を示したものである。 1, 2 and 3 show examples of the apparatus of the present invention.
第１図に示した例の場合には、超微粉体１は、
アルミナ製などのるつぼ２に入れ、炭素発熱体３
を熱源とする加熱炉に入れる。加熱炉は炭素繊維
からなる断熱容器４の中心に設置する。外部容器
５は真空排気系６によつて排気する。所定の圧
力、たとえば、真空計７によつて10-5Torr程度
になつたことが確認された段階で、ガス供給系８
から反応性ガス、または反応性ガスと不活性ガス
との混合ガスを導入する。所定の圧力において、
導電端子９から通電して加熱する。温度は、加熱
炉内の熱電対１０によつて測定し、制御する。 In the case of the example shown in FIG. 1, the ultrafine powder 1 is
Place the carbon heating element 3 in a crucible 2 made of alumina, etc.
into a heating furnace with a heat source. The heating furnace is installed at the center of a heat insulating container 4 made of carbon fiber. The outer container 5 is evacuated by a vacuum evacuation system 6. When it is confirmed that the predetermined pressure has reached a predetermined pressure, for example, about 10 -5 Torr by the vacuum gauge 7, the gas supply system 8
A reactive gas or a mixed gas of a reactive gas and an inert gas is introduced. At a given pressure,
Electricity is supplied from the conductive terminal 9 to heat it. Temperature is measured and controlled by a thermocouple 10 within the furnace.
第２図に示した例の場合には、超微粉体をアル
ミナ製などのボート１２に入れる。このボート１
２は両端を真空用フランジ１３，１４でシールさ
れたアルミナ製などの管内１５に収め、管内を真
空排気系１６で排気する。反応性ガス、不活性ガ
スは、供給系１８より供給する。真空計１７によ
り圧力を測定し、電気炉１９によつて加熱する。 In the case of the example shown in FIG. 2, ultrafine powder is placed in a boat 12 made of alumina or the like. this boat 1
2 is placed in a tube 15 made of alumina or the like whose both ends are sealed with vacuum flanges 13 and 14, and the inside of the tube is evacuated by a vacuum exhaust system 16. The reactive gas and inert gas are supplied from a supply system 18. The pressure is measured with a vacuum gauge 17 and heated with an electric furnace 19.
第３図に示した例の場合には、超微粉体１は、
試料だめ２２に充てんする。この試料だめ２２の
下部には、反応性ガスボンベ２３と不活性ガスボ
ンベ２４からの混合ガスを導入する。このガスの
導入によつて超微粉体１を搬送管２５を経て、加
熱管２６内に導入する。垂直に置いた加熱管２６
は電気炉２７によつて加熱する。表面処理された
試料は、水冷却器２８により冷却し、捕集器２９
に捕集する。 In the case of the example shown in FIG. 3, the ultrafine powder 1 is
Fill the sample reservoir 22. A mixed gas from a reactive gas cylinder 23 and an inert gas cylinder 24 is introduced into the lower part of this sample reservoir 22 . By introducing this gas, the ultrafine powder 1 is introduced into the heating tube 26 via the conveying tube 25. Heating tube 26 placed vertically
is heated by an electric furnace 27. The surface-treated sample is cooled by a water cooler 28 and transferred to a collector 29.
to be collected.
余剰ガスおよび不活性ガスは排気管３０から排
気され、再び試料だめ２２に導入する。ガスの導
入に先立つて、真空排気系３１により排気する。
循環するガスは、吸引ポンプ３２によつて試料だ
め２２に送る。 Excess gas and inert gas are exhausted from the exhaust pipe 30 and introduced into the sample reservoir 22 again. Prior to the introduction of gas, exhaust is performed by a vacuum exhaust system 31.
The circulating gas is delivered to the sample reservoir 22 by a suction pump 32.
このような例に示した反応装置によれば、操作
が簡単で、かつ効率よく超微粉体表面への炭素超
薄膜の形成が可能になる。 According to the reaction apparatus shown in such an example, it is possible to easily operate and efficiently form an ultra-thin carbon film on the surface of an ultra-fine powder.
実施例を次に示し、さらに具体的にこの発明の
構成および効果を明らかにする。なお、この発明
は、当然にもこれらの実施例に限定されるもので
はない。 Examples will be shown below to clarify the structure and effects of the present invention in more detail. Note that the present invention is naturally not limited to these examples.
実施例 １
第１図に示した装置を用いてニツケル超微粉体
（平均粒径300Å）の表面被覆を行つた。煤状の超
微粉体の超微粒子をトルエンガス（5Torr）、ア
ルゴンガス（295Torr）の雰囲気中で、粒子温度
500℃で30分間加熱処理した。粒子の表面に厚さ
20Åのグラフアイト化した炭素原子の超薄膜被膜
が形成された。Example 1 The surface of ultrafine nickel powder (average particle size 300 Å) was coated using the apparatus shown in FIG. Ultrafine particles of soot-like ultrafine powder are heated in an atmosphere of toluene gas (5 Torr) and argon gas (295 Torr) to reduce the particle temperature.
Heat treatment was performed at 500°C for 30 minutes. Thickness on the surface of the particle
An ultrathin film of graphitized carbon atoms of 20 Å was formed.
実施例 ２
実施例１と同様にして、球状のシリコン超微粉
体の表面被覆を行つた。この場合の条件は、トル
エンガス（10Torr）、アルゴンガス（290Torr）、
温度800℃、30分間の加熱とした。Example 2 In the same manner as in Example 1, the surface of spherical ultrafine silicon powder was coated. The conditions in this case are toluene gas (10Torr), argon gas (290Torr),
Heating was performed at a temperature of 800°C for 30 minutes.
原子状の炭素超薄膜が形成された。その電子顕
微鏡写真を第４図（21mm：100Å）に示す。表面
に形成した超薄膜の厚さは30Aで、層状のグラフ
アイト化した膜になつている。 An ultra-thin atomic carbon film was formed. The electron micrograph is shown in Fig. 4 (21 mm: 100 Å). The ultra-thin film formed on the surface is 30A thick, and is a layered graphite film.
また、同様にして処理したアルミナの電子顕微
鏡写真を第５図（18mm：100Å）に示す。層状の
炭素超薄膜が形成されている。 Furthermore, an electron micrograph of alumina treated in the same manner is shown in FIG. 5 (18 mm: 100 Å). A layered ultra-thin carbon film is formed.
第１図、第２図および第３図は、この発明に用
いる装置の例を示た断面図である。第４図および
第５図は、シリコンおよびアルミナ超微粉体の表
面処理後の電子顕微鏡写真を示している。
なお、図中の番号は次のものを示している。１
……超微粉体、２……るつぼ、３……発熱体、４
……断熱容器、６……真空排気系、７……ガス供
給系、１２……ボート、１３，１４……真空フラ
ンジ、１９……電気炉、２２……試料だめ、２
３，２４……ガスボンベ、２５……搬送管、２６
……加熱管、２７……電気炉、２８……冷却器、
２９……捕集器。
FIGS. 1, 2, and 3 are cross-sectional views showing examples of devices used in the present invention. FIGS. 4 and 5 show electron micrographs of silicon and alumina ultrafine powders after surface treatment. Note that the numbers in the figure indicate the following. 1
... Ultrafine powder, 2 ... Crucible, 3 ... Heating element, 4
...Insulated container, 6...Evacuation system, 7...Gas supply system, 12...Boat, 13, 14...Vacuum flange, 19...Electric furnace, 22...Sample reservoir, 2
3, 24...Gas cylinder, 25...Transport pipe, 26
... Heating tube, 27 ... Electric furnace, 28 ... Cooler,
29... Collector.
Claims (1)
てなることを特徴とする超微粉体。1. An ultrafine powder characterized by coating the surface of the ultrafine powder with an ultrathin film of atomic carbon.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61165422A JPS6320480A (en) | 1986-07-14 | 1986-07-14 | Method and apparatus for surface treatment of powder or fibrous material |
| JP1089283A JPH02236278A (en) | 1986-07-14 | 1989-04-07 | Method for ultra-thin film coating of superfine powder or fine fibrous material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61165422A JPS6320480A (en) | 1986-07-14 | 1986-07-14 | Method and apparatus for surface treatment of powder or fibrous material |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1089283A Division JPH02236278A (en) | 1986-07-14 | 1989-04-07 | Method for ultra-thin film coating of superfine powder or fine fibrous material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6320480A JPS6320480A (en) | 1988-01-28 |
| JPH0543791B2 true JPH0543791B2 (en) | 1993-07-02 |
Family
ID=15812121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61165422A Granted JPS6320480A (en) | 1986-07-14 | 1986-07-14 | Method and apparatus for surface treatment of powder or fibrous material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6320480A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010189628A (en) * | 2009-01-20 | 2010-09-02 | Toray Ind Inc | Black resin composition, resin black matrix, color filter and liquid crystal display device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02236278A (en) * | 1986-07-14 | 1990-09-19 | Res Dev Corp Of Japan | Method for ultra-thin film coating of superfine powder or fine fibrous material |
| JP4824095B2 (en) * | 2009-03-12 | 2011-11-24 | 株式会社栗本鐵工所 | Magnetorheological fluid |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4893589A (en) * | 1972-03-13 | 1973-12-04 | ||
| JPS5669210A (en) * | 1979-11-09 | 1981-06-10 | Mitsubishi Chem Ind Ltd | Method for depositing thermally decomposed carbon |
| JPS58100601A (en) * | 1981-12-09 | 1983-06-15 | Japan Synthetic Rubber Co Ltd | Coated ultrafine particle or its film and method and device for forming said particle or film |
| JPS6078635A (en) * | 1983-10-07 | 1985-05-04 | Res Dev Corp Of Japan | Method and apparatus for forming discrete ultra-fine particles |
-
1986
- 1986-07-14 JP JP61165422A patent/JPS6320480A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4893589A (en) * | 1972-03-13 | 1973-12-04 | ||
| JPS5669210A (en) * | 1979-11-09 | 1981-06-10 | Mitsubishi Chem Ind Ltd | Method for depositing thermally decomposed carbon |
| JPS58100601A (en) * | 1981-12-09 | 1983-06-15 | Japan Synthetic Rubber Co Ltd | Coated ultrafine particle or its film and method and device for forming said particle or film |
| JPS6078635A (en) * | 1983-10-07 | 1985-05-04 | Res Dev Corp Of Japan | Method and apparatus for forming discrete ultra-fine particles |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010189628A (en) * | 2009-01-20 | 2010-09-02 | Toray Ind Inc | Black resin composition, resin black matrix, color filter and liquid crystal display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6320480A (en) | 1988-01-28 |
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