JPH05269864A - Three dimensional optical shaping device - Google Patents

Three dimensional optical shaping device

Info

Publication number
JPH05269864A
JPH05269864A JP10346592A JP10346592A JPH05269864A JP H05269864 A JPH05269864 A JP H05269864A JP 10346592 A JP10346592 A JP 10346592A JP 10346592 A JP10346592 A JP 10346592A JP H05269864 A JPH05269864 A JP H05269864A
Authority
JP
Japan
Prior art keywords
liquid
dimensional
resin
crystal panel
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10346592A
Other languages
Japanese (ja)
Inventor
Atsushi Yokoyama
敦 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10346592A priority Critical patent/JPH05269864A/en
Publication of JPH05269864A publication Critical patent/JPH05269864A/en
Withdrawn legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To form a two-dimensional sectional shape by light irradiation with simple controlling mechanism in short processing time. CONSTITUTION:The predetermined masking pattern is formed by driving a liquid crystal panel 11 with a liquid crystal panel driving device 14. Ultraviolet rays emitted from an ultraviolet light source 1 is irradiated through the liquid crystal panel 11 on the liquid level 7 of liquid resin 5 in a tank 6 so as to harden only the irradiated part in order to form the thin resin film having the predetermined two-dimensional sectional shape. By laminating the thin resin films to one another, the three-dimensional solid shape having the predetermined shape is produced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は槽内の液体樹脂に光を照
射して硬化させ、三次元立体形状を成型する三次元光造
形装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional stereolithography apparatus for molding a three-dimensional solid shape by irradiating a liquid resin in a tank with light to cure it.

【0002】[0002]

【従来の技術】液体樹脂槽内の液体樹脂の液面に紫外光
を照射走査して、液面に所定の二次元断面形状の硬化さ
れた樹脂薄膜を形成し、この樹脂薄膜を積層して三次元
立体形状を成型する装置として、三次元光造形装置が知
られている。
2. Description of the Related Art The liquid surface of a liquid resin in a liquid resin tank is irradiated and scanned with ultraviolet light to form a cured resin thin film having a predetermined two-dimensional sectional shape on the liquid surface, and the resin thin films are laminated. As a device for molding a three-dimensional solid shape, a three-dimensional stereolithography device is known.

【0003】図3に従来の三次元光造形装置の一例の概
略構成を示す。図3においてレーザ光源1は波長帯域が
紫外域である紫外光を発する。レーザ光源1から照射さ
れたレーザ光を光学系2を通し、ガルバノミラー3,4
により二次元方向にスキヤニングさせつつ、液体樹脂槽
5内の液体樹脂6の液面7に照射させて、この部分の液
体樹脂6を硬化させる。このときガルバノミラー3,4
はガルバノミラー制御装置8によって精密に駆動制御さ
れ、互いに直交する直線方向にそれぞれレーザ光をスキ
ャニングし、液面7上で所定の二次元断面形状を描画す
る。二次元断面形状内の液体樹脂6が薄膜状に硬化した
後、液体樹脂槽5内に設けられた昇降テーブル9を昇降
駆動装置10により所定ピッチだけ下降させる。その後
硬化された樹脂薄膜上を被覆する液体樹脂6に対して上
述した動作を繰り返して樹脂薄膜を積層し、所定の三次
元立体形状を成型する。
FIG. 3 shows a schematic configuration of an example of a conventional three-dimensional stereolithography apparatus. In FIG. 3, the laser light source 1 emits ultraviolet light having a wavelength band in the ultraviolet region. The laser light emitted from the laser light source 1 passes through the optical system 2 and is passed through the galvano mirrors 3, 4
The liquid surface 6 of the liquid resin 6 in the liquid resin tank 5 is irradiated with the light while scanning in the two-dimensional direction, and the liquid resin 6 in this portion is cured. Galvano mirror 3,4 at this time
Are precisely driven and controlled by the galvano-mirror control device 8, scan the laser light in the respective straight line directions orthogonal to each other, and draw a predetermined two-dimensional cross-sectional shape on the liquid surface 7. After the liquid resin 6 in the two-dimensional cross-sectional shape is hardened into a thin film, the lift table 9 provided in the liquid resin tank 5 is moved down by a predetermined pitch by the lift drive device 10. After that, the above-described operation is repeated for the liquid resin 6 that covers the cured resin thin film, so that the resin thin films are laminated to form a predetermined three-dimensional solid shape.

【0004】[0004]

【発明が解決しようとする課題】上記のように構成され
た従来の三次元光造形装置においては、CADなどによ
って作成された三次元形状データを所定の間隔で水平に
スライスし、得られた二次元断面形状について点状のレ
ーザ光をガルバノミラー3,4などを用いて二次元的に
走査している。このため二次元断面形状の一面をレーザ
光が走査するのに非常に長い時間を必要とするという問
題があった。また二次元形状データより得られた二次元
断面形状データから、それに対応してガルバノミラー
3,4などを動作させるためには、複雑な制御が必要と
なるという問題もあった。
In the conventional three-dimensional stereolithography apparatus configured as described above, three-dimensional shape data created by CAD or the like is horizontally sliced at a predetermined interval to obtain the two-dimensional shape data. Regarding the dimensional cross-sectional shape, point-like laser light is two-dimensionally scanned using the galvano mirrors 3, 4. Therefore, there is a problem that it takes a very long time for the laser beam to scan one surface of the two-dimensional sectional shape. There is also a problem that complicated control is required to operate the galvanomirrors 3, 4 and the like corresponding to the two-dimensional sectional shape data obtained from the two-dimensional shape data.

【0005】本発明はこのような状況に鑑みてなされた
もので、簡単な制御機構により短い処理時間で二次元断
面形状を形成することのできる三次元光造形装置を提供
することを目的とする。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a three-dimensional stereolithography apparatus capable of forming a two-dimensional cross-sectional shape in a short processing time with a simple control mechanism. ..

【0006】[0006]

【課題を解決するための手段】請求項1に記載の三次元
光造形装置は、液体樹脂槽5内の液体樹脂6を硬化させ
る光を照射して、所定の二次元断面形状の硬化された樹
脂薄膜を形成し、樹脂薄膜を積層して所定の三次元立体
形状を成型する三次元光造形装置において、光源1と液
体樹脂6の液面7との間に液晶パネル駆動装置14によ
り駆動されて所定のマスキングパターンを形成する液晶
パネル11を設けたことを特徴とする。
The three-dimensional stereolithography apparatus according to claim 1 is irradiated with light for curing the liquid resin 6 in the liquid resin tank 5 to cure the liquid resin 6 in a predetermined two-dimensional cross-sectional shape. In a three-dimensional stereolithography apparatus for forming a resin thin film and laminating resin thin films to mold a predetermined three-dimensional solid shape, a liquid crystal panel driving device 14 drives between a light source 1 and a liquid surface 7 of a liquid resin 6. A liquid crystal panel 11 for forming a predetermined masking pattern is provided.

【0007】請求項2に記載の三次元光造形装置は、液
体樹脂6の液面7を照射する光源1からの光路上に、液
晶パネル11のマスキングパターンを液体樹脂6の液面
7上に結像させる光学系12,13を設けたことを特徴
とする。
In the three-dimensional stereolithography apparatus according to the second aspect, the masking pattern of the liquid crystal panel 11 is provided on the liquid surface 6 of the liquid resin 6 on the optical path from the light source 1 which irradiates the liquid surface 7 of the liquid resin 6. It is characterized in that optical systems 12 and 13 for forming an image are provided.

【0008】[0008]

【作用】請求項1に記載の三次元光造形装置において
は、液晶パネル駆動装置14により、液晶パネル11に
所定の二次元断面形状のマスキングパターンが形成され
る。光源1から発射された光は液晶パネル11によって
所定のパターンに遮光され、液体樹脂6の液面7上に照
射される。そして照射された部分だけが薄膜状に硬化さ
れ、所定の二次元断面形状の樹脂薄膜が得られる。従っ
て二次元のパターン形状が一括して形成されるので、処
理時間が大幅に短縮され制御も簡単となる。
In the three-dimensional stereolithography apparatus according to the first aspect, the liquid crystal panel driving device 14 forms a masking pattern having a predetermined two-dimensional cross section on the liquid crystal panel 11. The light emitted from the light source 1 is shielded by the liquid crystal panel 11 in a predetermined pattern, and is irradiated onto the liquid surface 7 of the liquid resin 6. Then, only the irradiated portion is hardened into a thin film to obtain a resin thin film having a predetermined two-dimensional cross-sectional shape. Therefore, the two-dimensional pattern shape is collectively formed, so that the processing time is greatly shortened and the control is simplified.

【0009】請求項2に記載の三次元光造形装置におい
ては、光源1からの光路上に光学系12,13を設けた
ので、液晶パネル11のマスキングパターンを液晶樹脂
6の液面7上に正確に投影させることができる。
In the three-dimensional stereolithography apparatus according to the second aspect, since the optical systems 12 and 13 are provided on the optical path from the light source 1, the masking pattern of the liquid crystal panel 11 is placed on the liquid surface 7 of the liquid crystal resin 6. It can be projected accurately.

【0010】[0010]

【実施例】以下、本発明の三次元光造形装置の一実施例
を図面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the three-dimensional stereolithography apparatus of the present invention will be described below with reference to the drawings.

【0011】図1に本発明の一実施例の構成を示す。図
1において、図3に示す従来例の部分と対応する部分に
は同一の符号を付してあり、その説明は適宜省略する。
本実施例の特徴は光源1と液体樹脂6の液面7とを結ぶ
光路上に液晶パネル11と光学系12,13とを設けた
点にある。液晶パネル11は液晶パネル駆動装置14に
よって駆動され、所定の二次元断面形状のマスキングパ
ターンが形成される。また光学系12,13は光路上の
液晶パネル11の前後に設けられ、光源1から照射され
た紫外光を光路上の所定の位置に、所定の大きさで一様
に拡散させるものである。光学系12,13により液体
樹脂6の液面7上に、所定の二次元断面形状のパターン
を正確に投影させることができる。光学系12,13は
複数枚のレンズまたは光を拡散する拡散板で構成されて
いる。
FIG. 1 shows the configuration of an embodiment of the present invention. In FIG. 1, portions corresponding to those of the conventional example shown in FIG. 3 are denoted by the same reference numerals, and description thereof will be omitted as appropriate.
The feature of this embodiment is that the liquid crystal panel 11 and the optical systems 12 and 13 are provided on the optical path connecting the light source 1 and the liquid surface 7 of the liquid resin 6. The liquid crystal panel 11 is driven by the liquid crystal panel drive device 14, and a masking pattern having a predetermined two-dimensional cross-sectional shape is formed. The optical systems 12 and 13 are provided before and after the liquid crystal panel 11 on the optical path and uniformly diffuse the ultraviolet light emitted from the light source 1 to a predetermined position on the optical path in a predetermined size. The optical systems 12 and 13 can accurately project a pattern having a predetermined two-dimensional cross-sectional shape on the liquid surface 7 of the liquid resin 6. The optical systems 12 and 13 are composed of a plurality of lenses or a diffusion plate that diffuses light.

【0012】次に図3を参照して本実施例の作用を説明
する。ステップ101において、CADなどで計算機内
に入力された三次元形状に対し、所定の間隔でその形状
を水平にスライスして、二次元断面形状を求める。次に
ステップ102において、紫外光を所定の位置にある光
源1から照射したとき、ステップ101において求めた
二次元断面形状のパターンが液体樹脂6の液面7上に投
影されるように、そのマスタパターンを液晶駆動装置1
4により液晶パネル11上に表示する。
Next, the operation of this embodiment will be described with reference to FIG. In step 101, a three-dimensional shape input into the computer by CAD or the like is horizontally sliced at predetermined intervals to obtain a two-dimensional cross-sectional shape. Next, in step 102, when the ultraviolet light is emitted from the light source 1 located at a predetermined position, the master of the pattern so that the pattern of the two-dimensional cross-sectional shape obtained in step 101 is projected on the liquid surface 7 of the liquid resin 6. Liquid crystal drive device 1
4 to display on the liquid crystal panel 11.

【0013】次にステップ103において、液晶パネル
11によってマスキングされた紫外光は、光学系12,
13を通って液体樹脂槽5内の液体樹脂6の液面7上に
照射される。そして液体樹脂6の上面の紫外線に照射さ
れた部分だけ、薄膜状に硬化する。次にステップ104
において、液体樹脂槽5内に設けられた昇降テーブル9
を昇降駆動装置10により所定のピッチだけ下降させ、
すでに硬化している樹脂薄膜上を液体樹脂6により一様
に被覆する。このとき液体樹脂6の液面を一様な状態に
するため、機械的な作業で表面を整えてもよい。
Next, in step 103, the ultraviolet light masked by the liquid crystal panel 11 is transmitted to the optical system 12,
The liquid surface 7 of the liquid resin 6 in the liquid resin tank 5 is irradiated with the light passing through 13. Then, only the portion of the upper surface of the liquid resin 6 that is irradiated with ultraviolet rays is cured into a thin film. Then step 104
In which the lifting table 9 provided in the liquid resin tank 5
Is lowered by a predetermined pitch by the lifting drive device 10,
The already cured resin thin film is uniformly covered with the liquid resin 6. At this time, in order to make the liquid surface of the liquid resin 6 uniform, the surface may be prepared by mechanical work.

【0014】この後、ステップ103で硬化させた樹脂
薄膜の上に、次の二次元断面形状のパターンを膜状に硬
化させるため、新しいパターンについてステップ101
乃至ステップ104の作業をくりかえす。
Thereafter, in order to cure the next two-dimensional cross-sectional pattern into a film on the resin thin film cured in step 103, a new pattern is processed in step 101.
The work of step 104 is repeated.

【0015】本実施例によれば、液体樹脂6の液面7の
二次元断面形状の領域を薄膜状に硬化させるとき、一括
して液体樹脂6の液面7にこの二次元断面形状のパター
ンを有する紫外光を照射させるため、この処理時間が大
幅に短縮される。また複雑な制御機構を必要とせずに紫
外光の二次元断面パターンを形成することができ、高速
かつ容易に種々のパターンを作り出すことができる。ま
た光学系12,13により液体樹脂6の液面7上に求め
られる形状のパターン光を正確に投影させることができ
る。
According to this embodiment, when the two-dimensional cross-sectional area of the liquid surface 6 of the liquid resin 6 is hardened into a thin film, the pattern of the two-dimensional cross-sectional shape is formed on the liquid surface 7 of the liquid resin 6 all at once. This treatment time is greatly shortened because the ultraviolet light having a wavelength of 1 is irradiated. Further, it is possible to form a two-dimensional cross-sectional pattern of ultraviolet light without requiring a complicated control mechanism, and it is possible to easily create various patterns at high speed. Further, the optical systems 12 and 13 can accurately project the pattern light of the desired shape on the liquid surface 7 of the liquid resin 6.

【0016】上記実施例では紫外線で硬化する液体樹脂
6を用いた場合について説明したが、白色光または赤外
光で硬化する液体樹脂を用いてもよい。また光学系1
2,13は省略してもよい。さらに光源1から液体樹脂
6の液面7に至る光路が直線状であり、この直線上に光
学系12,13及び液晶パネル11を配設した場合につ
いて説明したが、複数の反射鏡などを用いて光路を屈折
させ、液晶パネル11及び光学系12,13などを光路
上の任意の位置に設けてもよい。また一面の樹脂薄膜の
硬化が終了して次のパターン光を照射するまでの間、紫
外線の光源1からの照射を停止してもよく、連続的に照
射を続けてもよい。
In the above embodiment, the case where the liquid resin 6 which is hardened by ultraviolet rays is used has been described, but a liquid resin which is hardened by white light or infrared light may be used. Also optical system 1
2 and 13 may be omitted. Further, the case where the optical path from the light source 1 to the liquid surface 7 of the liquid resin 6 is linear and the optical systems 12 and 13 and the liquid crystal panel 11 are arranged on this straight line has been described, but a plurality of reflecting mirrors and the like are used. The optical path may be refracted by providing the liquid crystal panel 11 and the optical systems 12 and 13 at arbitrary positions on the optical path. Further, the irradiation of the ultraviolet light from the light source 1 may be stopped or the irradiation may be continuously continued until the resin thin film on one surface is cured and the next pattern light is irradiated.

【0017】[0017]

【発明の効果】以上説明したように、請求項1に記載の
三次元光造形装置によれば、光源と液体樹脂の液面との
間に所定のマスキングパターンを形成する液晶パネルを
設けたので、液体樹脂の液面上に二次元断面形状のパタ
ーンを有する光を一括して照射させることができ、処理
時間を短縮し制御機構を簡単とすることができる。
As described above, according to the three-dimensional stereolithography apparatus of the first aspect, the liquid crystal panel for forming a predetermined masking pattern is provided between the light source and the liquid surface of the liquid resin. The light having the two-dimensional cross-sectional pattern can be collectively irradiated onto the liquid surface of the liquid resin, the processing time can be shortened, and the control mechanism can be simplified.

【0018】また請求項2に記載の三次元光造形装置に
よれば、光源から液体樹脂の液面に至る光路上に光学系
を設けたので、液体樹脂の液面上に所定の二次元パター
ン光を正確に投影することができる。
According to the three-dimensional stereolithography apparatus of the second aspect, since the optical system is provided on the optical path from the light source to the liquid surface of the liquid resin, a predetermined two-dimensional pattern is formed on the liquid surface of the liquid resin. The light can be projected accurately.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の三次元光造形装置の一実施例の構成を
示すブロック図である。
FIG. 1 is a block diagram showing the configuration of an embodiment of a three-dimensional stereolithography apparatus of the present invention.

【図2】本実施例の作用説明するフロー図である。FIG. 2 is a flowchart illustrating the operation of this embodiment.

【図3】従来の三次元光造形装置の一例の構成を示すブ
ロック図である。
FIG. 3 is a block diagram showing a configuration of an example of a conventional three-dimensional stereolithography apparatus.

【符号の説明】[Explanation of symbols]

1 光源 5 液体樹脂槽 6 液体樹脂 7 液面 11 液晶パネル 12,13 光学系 14 液晶パネル駆動装置 1 Light Source 5 Liquid Resin Tank 6 Liquid Resin 7 Liquid Level 11 Liquid Crystal Panels 12 and 13 Optical System 14 Liquid Crystal Panel Driving Device

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 // B29K 105:24 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location // B29K 105: 24

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 液体樹脂槽内の液体樹脂の液面に前記液
体樹脂を硬化させる光を照射して、所定の二次元断面形
状の硬化された樹脂薄膜を形成し、前記樹脂薄膜を積層
して所定の三次元立体形状を成型する三次元光造形装置
において、 光源と前記液体樹脂の液面との間に液晶パネル駆動装置
により駆動されて所定のマスキングパターンを形成する
液晶パネルを設けたことを特徴とする三次元光造形装
置。
1. A surface of the liquid resin in the liquid resin tank is irradiated with light for curing the liquid resin to form a cured resin thin film having a predetermined two-dimensional cross-sectional shape, and the resin thin films are laminated. A three-dimensional stereolithography apparatus that molds a predetermined three-dimensional shape by providing a liquid crystal panel that is driven by a liquid crystal panel driving device and forms a predetermined masking pattern between the light source and the liquid surface of the liquid resin. A three-dimensional stereolithography device characterized by.
【請求項2】 液体樹脂の液面を照射する光源からの光
路上に液晶パネルのマスキングパターンを液体樹脂の液
面上に結像させる光学系を設けたことを特徴とする請求
項1記載の三次元光造形装置。
2. An optical system for forming an image of a masking pattern of a liquid crystal panel on the liquid surface of the liquid resin on an optical path from a light source for irradiating the liquid surface of the liquid resin. 3D stereolithography equipment.
JP10346592A 1992-03-30 1992-03-30 Three dimensional optical shaping device Withdrawn JPH05269864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10346592A JPH05269864A (en) 1992-03-30 1992-03-30 Three dimensional optical shaping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10346592A JPH05269864A (en) 1992-03-30 1992-03-30 Three dimensional optical shaping device

Publications (1)

Publication Number Publication Date
JPH05269864A true JPH05269864A (en) 1993-10-19

Family

ID=14354768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10346592A Withdrawn JPH05269864A (en) 1992-03-30 1992-03-30 Three dimensional optical shaping device

Country Status (1)

Country Link
JP (1) JPH05269864A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100344248B1 (en) * 1999-12-27 2002-07-24 전자부품연구원 Exposure device and method for manufacturing three-dimensional a structure using the exposure device
EP1344633A1 (en) * 2002-03-12 2003-09-17 Teijin Seiki Co., Ltd. Three-dimensional stereolithographic method and apparatus
US7682147B2 (en) * 2002-02-20 2010-03-23 University Of South Florida Apparatus for forming an array of microlenses under artificial gravity
CN105813826A (en) * 2013-12-20 2016-07-27 索尼公司 Shaping device and shaping method
WO2017018837A1 (en) * 2015-07-28 2017-02-02 박성진 3d printer and printing system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100344248B1 (en) * 1999-12-27 2002-07-24 전자부품연구원 Exposure device and method for manufacturing three-dimensional a structure using the exposure device
US7682147B2 (en) * 2002-02-20 2010-03-23 University Of South Florida Apparatus for forming an array of microlenses under artificial gravity
EP1344633A1 (en) * 2002-03-12 2003-09-17 Teijin Seiki Co., Ltd. Three-dimensional stereolithographic method and apparatus
US7137801B2 (en) 2002-03-12 2006-11-21 Teijin Seiki Co., Ltd. Three-dimensional stereolithographic apparatus
CN105813826A (en) * 2013-12-20 2016-07-27 索尼公司 Shaping device and shaping method
WO2017018837A1 (en) * 2015-07-28 2017-02-02 박성진 3d printer and printing system

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