JPH05228361A - Device for vaporizing and supplying liquid material - Google Patents
Device for vaporizing and supplying liquid materialInfo
- Publication number
- JPH05228361A JPH05228361A JP11225092A JP11225092A JPH05228361A JP H05228361 A JPH05228361 A JP H05228361A JP 11225092 A JP11225092 A JP 11225092A JP 11225092 A JP11225092 A JP 11225092A JP H05228361 A JPH05228361 A JP H05228361A
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- mass flow
- liquid material
- liquid
- controller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、例えば半導体製造にお
いて用いる四塩化ケイ素（ＳｉＣｌ4 ) などのガスを、
液体材料を気化することによって供給する液体材料気化
供給装置に関する。BACKGROUND OF THE INVENTION The present invention relates to a gas such as silicon tetrachloride (SiCl 4 ) used in semiconductor manufacturing.
The present invention relates to a liquid material vaporizing and supplying device that supplies a liquid material by vaporizing it.
【０００２】[0002]
【従来の技術】前記液体材料気化供給装置として、液体
の原材料を収容した気化槽を恒温槽内に設け、前記原材
料内においてキャリアガスをバブリングさせることによ
り、所定の気化ガスを発生させるようにしたバブリング
方式の液体材料気化供給装置が知られている。2. Description of the Related Art As the liquid material vaporization supply device, a vaporization tank containing a liquid raw material is provided in a constant temperature bath, and a predetermined vaporized gas is generated by bubbling a carrier gas in the raw material. A bubbling type liquid material vaporization and supply device is known.
【０００３】そして、この種の液体材料気化供給装置に
おいては、気化槽内における温度、圧力およびキャリア
ガスの流量が定常状態にあるものと仮定して、所定流量
の反応ガスを発生させるようにしていた。In this type of liquid material vaporization and supply apparatus, it is assumed that the temperature, pressure, and carrier gas flow rate in the vaporization tank are in a steady state, and a reaction gas of a predetermined flow rate is generated. It was
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、気化槽
内では気化ガスの発生によって気化熱が奪われるため、
気化槽内における温度、圧力をそれぞれ一定に保持する
ことは非常に困難であり、たとえ質量流量コントローラ
などによってキャリアガスの流量を一定に制御した場合
でも、所定流量の気化ガスを常に安定に発生させること
は困難であった。However, since the heat of vaporization is taken away by the generation of vaporized gas in the vaporization tank,
It is extremely difficult to keep the temperature and pressure in the vaporization tank constant, and even if the carrier gas flow rate is controlled to be constant by a mass flow controller, etc., the vaporized gas at a predetermined flow rate is always generated stably. It was difficult.
【０００５】本発明は、上述の事柄に留意してなされた
もので、その目的とするところは、所定流量の気化ガス
を常に安定して発生し、これを安定して供給することが
できる液体材料気化供給装置を提供することにある。The present invention has been made in view of the above matters, and an object thereof is a liquid which can always stably generate a predetermined flow rate of vaporized gas and can stably supply the vaporized gas. It is to provide a material vaporization supply device.
【０００６】[0006]
【課題を解決するための手段】上述の目的を達成するた
め、本発明に係る第１の液体材料気化供給装置は、加熱
により液体材料を直接気化させる気化室の一端側に、液
体材料源に接続されると共に液体流量制御器を備えた液
体導入管と、キャリアガス源に接続されると共に質量流
量コントローラを備えたキャリアガス導入管とを接続す
る一方、前記気化室の他端側に、質量流量計を備えた気
化ガス導出管を接続し、前記質量流量計の出力に基づい
て前記液体流量制御器を制御するようにしている。In order to achieve the above-mentioned object, a first liquid material vaporizing and supplying device according to the present invention is provided with a liquid material source at one end side of a vaporizing chamber for directly vaporizing a liquid material by heating. A liquid introducing pipe having a liquid flow rate controller connected thereto and a carrier gas introducing pipe having a mass flow rate controller connected to a carrier gas source are connected, while the other end side of the vaporization chamber has a mass. A vaporized gas outlet pipe equipped with a flow meter is connected to control the liquid flow controller based on the output of the mass flow meter.
【０００７】また、本発明に係る第２の液体材料気化供
給装置は、加熱により液体材料を直接気化させる気化室
の一端側に、液体材料源に接続されると共に液体流量制
御器を備えた液体導入管と、キャリアガス源に接続され
ると共に質量流量コントローラを備えたキャリアガス導
入管とを接続する一方、前記気化室の他端側に、質量流
量計を備えた気化ガス導出管を接続し、前記質量流量計
の出力と質量流量コントローラの出力との差に基づいて
前記液体流量制御器を制御するようにしている。The second liquid material vaporization and supply device according to the present invention is a liquid which is connected to a liquid material source and has a liquid flow rate controller on one end side of a vaporization chamber for directly vaporizing the liquid material by heating. The introduction pipe and a carrier gas introduction pipe that is connected to a carrier gas source and that includes a mass flow rate controller are connected, while the other end side of the vaporization chamber is connected to a vaporized gas discharge pipe that includes a mass flow meter. The liquid flow controller is controlled based on the difference between the output of the mass flow meter and the output of the mass flow controller.
【０００８】[0008]
【作用】上記第１または第２の液体材料気化供給装置の
何れにおいても、気化室に導入された液体材料が瞬間的
に気化するため、そのガス発生量は液体材料の導入量に
依存するだけである。その上、気化室内の温度管理も容
易であるため、液体材料を常に安定に気化させることが
できる。In any of the first and second liquid material vaporization and supply devices described above, the liquid material introduced into the vaporization chamber is instantaneously vaporized, and therefore the gas generation amount thereof depends only on the liquid material introduction amount. Is. Moreover, since the temperature inside the vaporizing chamber can be easily controlled, the liquid material can always be vaporized stably.
【０００９】そして、第１の液体材料気化供給装置にお
いては、気化したガスの流量を質量流量計によって測定
し、その流量変化に基づいて液体流量制御器を制御す
る。また、第２の液体材料気化供給装置においては、質
量流量計によって測定された気化したガスの流量と、質
量流量コントローラによって測定されたキャリアガスの
流量の差が所定の値になるように液体流量制御器を制御
する。従って、前記何れの液体材料気化供給装置におい
ても、所定流量の気化ガスを常に安定して供給すること
ができる。In the first liquid material vaporizing and supplying apparatus, the flow rate of the vaporized gas is measured by the mass flow meter, and the liquid flow rate controller is controlled based on the change in the flow rate. Further, in the second liquid material vaporization and supply device, the liquid flow rate is adjusted so that the difference between the flow rate of the vaporized gas measured by the mass flow meter and the flow rate of the carrier gas measured by the mass flow rate controller becomes a predetermined value. Control the controller. Therefore, in any of the liquid material vaporization and supply devices described above, the vaporized gas at a predetermined flow rate can always be stably supplied.
【００１０】[0010]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。Embodiments of the present invention will be described below with reference to the drawings.
【００１１】図１は、本発明に係る液体材料気化供給装
置の一例を示し、この図において、１は例えばステンレ
ス鋼など熱伝導性および耐腐食性の良好な金属よりなる
パイプで、例えばアルミニウムなど熱伝導性の良好な素
材よりなるヒータブロック２に開設された貫通孔３内を
挿通するように設けられている。そして、ヒータブロッ
ク２内には、ヒータブロック２およびパイプ１を加熱す
るためのヒータ４が内蔵されている。FIG. 1 shows an example of a liquid material vaporization and supply device according to the present invention. In this figure, reference numeral 1 denotes a pipe made of a metal having good thermal conductivity and corrosion resistance, such as stainless steel, for example, aluminum. It is provided so as to pass through the through hole 3 formed in the heater block 2 made of a material having good thermal conductivity. The heater block 2 and the heater 4 for heating the pipe 1 are built in the heater block 2.
【００１２】前記パイプ１のヒータブロック２内の部分
には、熱伝導性および耐腐食性の良好な粉体５が充填さ
れていると共に、その上流側の入口側には液体導入管８
（後述する）が挿入してあって、気化室６に形成してあ
る。そして、粉体５としては、例えばステンレス鋼やチ
タンなどの金属またはＳｉＣなどのセラミックスを、直
径が 100μｍ以上、好ましくは 120μｍ程度の粉体に形
成したものが用いられる。７Ａ, ７Ｂは気化室６の両端
部近傍に設けられるメッシュ体で、粉体５が気化室６か
ら出ないようにするためにその網目の大きさは例えば20
μｍ程度にしてあり、下流側のメッシュ体７Ｂは，フィ
ルタとしても機能する。A portion of the pipe 1 inside the heater block 2 is filled with powder 5 having good thermal conductivity and corrosion resistance, and a liquid introduction pipe 8 is provided on the upstream inlet side thereof.
(Described later) is inserted and formed in the vaporization chamber 6. As the powder 5, for example, a metal such as stainless steel or titanium or a ceramic such as SiC formed into a powder having a diameter of 100 μm or more, preferably about 120 μm is used. 7A and 7B are mesh bodies provided in the vicinity of both ends of the vaporization chamber 6, and their mesh size is, for example, 20 to prevent the powder 5 from coming out of the vaporization chamber 6.
The mesh body 7B on the downstream side also functions as a filter.
【００１３】８は液体材料Ｌを気化室６内に導入するた
めのキャピラリのような細管９（内径が例えば 0.4ｍ
ｍ）を備えた液体導入管で、パイプ１の上流側にこれと
同心状に設けられている。この液体導入管８の上流側
は、液体流量制御器16（後述する）を介して液体材料源
（図外）に接続され、下流側は、上流側のメッシュ体７
Ａを貫通してこのメッシュ体７Ａよりも下流側、すなわ
ち、気化室６内に突設され、先端には粉体５の直径より
も小さい内径（例えば 0.1ｍｍ）を有する細径部10が形
成されており、この細径部10は粉体５が充填された部分
に挿入されている。Reference numeral 8 is a thin tube 9 such as a capillary for introducing the liquid material L into the vaporization chamber 6 (having an inner diameter of 0.4 m, for example).
m) is a liquid introducing pipe provided on the upstream side of the pipe 1 and concentrically therewith. The upstream side of the liquid introduction pipe 8 is connected to a liquid material source (not shown) via a liquid flow rate controller 16 (described later), and the downstream side thereof is the upstream mesh body 7
A small-diameter portion 10 which penetrates A and is provided on the downstream side of the mesh body 7A, that is, in the vaporization chamber 6 and has an inner diameter (for example, 0.1 mm) smaller than the diameter of the powder 5 is formed at the tip. The small diameter portion 10 is inserted in the portion where the powder 5 is filled.
【００１４】11は液体導入管８とパイプ１との接続部12
と気化室６との間においてパイプ１に接続されるブロッ
ク状の管継手で、熱伝導性および耐腐食性の良好な金属
（例えばステンレス鋼）よりなり、その上流側にはキャ
リアガス源（図外）に接続された曲がりくねったキャリ
アガス導入管13が接続されている。ここで用いられるキ
ャリアガスＫとしては、Ｈ2 ，Ｈｅ，Ｎ2 などがある。
14はヒータブロック２、管継手11およびキャリアガス導
入管13を収容するための断熱構造のハウジングである。
15は気化室６に接続された気化ガス導出管である。Reference numeral 11 denotes a connecting portion 12 between the liquid introducing pipe 8 and the pipe 1.
Is a block-shaped pipe joint connected to the pipe 1 between the vaporization chamber 6 and the vaporization chamber 6, and is made of a metal having good thermal conductivity and corrosion resistance (for example, stainless steel), and has a carrier gas source (Fig. A meandering carrier gas inlet pipe 13 connected to the outside is connected. The carrier gas K used here includes H 2 , He, N 2, and the like.
Reference numeral 14 denotes a housing having a heat insulating structure for housing the heater block 2, the pipe joint 11 and the carrier gas introducing pipe 13.
Reference numeral 15 is a vaporized gas outlet pipe connected to the vaporization chamber 6.
【００１５】16は液体導入管８の上流側に設けられる液
体流量制御器で、例えば圧電アクチュエータなどによっ
て弁を開閉するように構成されたピエゾバルブよりな
り、圧電アクチュエータに直流電圧を印加すると、その
印加電圧の大きさに応じて弁が開閉され、この弁の開閉
の度合によって液体流量を制御するものである。Reference numeral 16 is a liquid flow rate controller provided on the upstream side of the liquid introducing pipe 8 and is composed of, for example, a piezo valve configured to open and close the valve by a piezoelectric actuator or the like. The valve is opened and closed according to the magnitude of the voltage, and the liquid flow rate is controlled by the degree of opening and closing of the valve.
【００１６】17はキャリアガス導入管13の上流側に設け
られる質量流量コントローラで、キャリアガスＫの質量
流量を測定すると共に、ガス流量を制御するものであ
る。また、18は気化ガス導出管15の下流側に設けられる
質量流量計で、その下流側には例えば半導体製造装置
（図外）が接続されている。なお、気化ガス導出管15、
質量流量計18には、気化ガスが再冷却によって液化され
るのを防止するためのヒータ（図外）が設けられてい
る。Reference numeral 17 denotes a mass flow controller provided on the upstream side of the carrier gas introduction pipe 13 for measuring the mass flow rate of the carrier gas K and controlling the gas flow rate. Further, 18 is a mass flow meter provided on the downstream side of the vaporized gas outlet pipe 15, for example, a semiconductor manufacturing apparatus (not shown) is connected on the downstream side thereof. The vaporized gas outlet pipe 15,
The mass flowmeter 18 is provided with a heater (not shown) for preventing the vaporized gas from being liquefied by recooling.
【００１７】19はコンピュータなどの制御装置で、質量
流量計18の出力ａおよび質量流量コントローラ17の出力
ｂを入力とし、液体流量制御器16への制御信号ｃを出力
するものである。A control device 19 such as a computer receives the output a of the mass flow meter 18 and the output b of the mass flow controller 17, and outputs a control signal c to the liquid flow controller 16.
【００１８】次に、上記構成の液体材料気化供給装置の
動作について説明すると、先ず、ヒータ４を発熱させて
気化室６内に充填された粉体５を所定の温度に加熱す
る。この状態において、質量流量コントローラ17によっ
て一定流量に制御されたキャリアガスＫをキャリアガス
導入管13を介してパイプ１内に導入すると共に、液体流
量制御器16によって流量調整された液体材料Ｌを液体導
入管８を介して気化室６に導入する。液体材料Ｌは、細
径部10を経た後、加熱された粉体５内に導入されて粉体
５と接触する。この場合、その接触面積が大きいため、
液体材料Ｌは短時間のうちに気化して所望のガスＧにな
る。Next, the operation of the liquid material vaporizing and supplying device having the above-described structure will be described. First, the heater 4 is caused to generate heat to heat the powder 5 filled in the vaporizing chamber 6 to a predetermined temperature. In this state, the carrier gas K controlled to a constant flow rate by the mass flow rate controller 17 is introduced into the pipe 1 through the carrier gas introduction tube 13, and the liquid material L whose flow rate is adjusted by the liquid flow rate controller 16 is made into liquid. It is introduced into the vaporization chamber 6 via the introduction pipe 8. The liquid material L passes through the small-diameter portion 10 and then is introduced into the heated powder 5 and comes into contact with the powder 5. In this case, because the contact area is large,
The liquid material L is vaporized into a desired gas G in a short time.
【００１９】そして、前記気化により発生したガスＧ
は、パイプ１およびメッシュ体７Ａを経て気化室６内に
導入されているキャリアガスＫによって速やかに下流側
に導出され、質量流量計18を介して下流側の半導体製造
装置（図外）に気化ガスＧを供給することができる。The gas G generated by the vaporization
Is rapidly led to the downstream side by the carrier gas K introduced into the vaporization chamber 6 through the pipe 1 and the mesh body 7A, and is vaporized to the semiconductor manufacturing apparatus (not shown) on the downstream side via the mass flow meter 18. The gas G can be supplied.
【００２０】このとき、質量流量計18は、キャリアガス
Ｋのみが気化ガス導出管15を流れる場合と、気化ガスＧ
が流入した場合とで感度差を生じ、この感度差に対応し
て測定されるガスの流量も変化する。従って、この感度
差、すなわち、ガスの流量を一定に保つように、制御装
置19からの制御信号ｃによって、液体流量制御器16にお
ける弁の開度を調整することにより、常に所定流量の気
化ガスＧを安定して供給することができる。At this time, in the mass flowmeter 18, only the carrier gas K flows through the vaporized gas outlet pipe 15 and the vaporized gas G
There is a difference in sensitivity between when the gas flows in and the measured gas flow rate changes corresponding to this difference in sensitivity. Therefore, by adjusting the opening degree of the valve in the liquid flow rate controller 16 by the control signal c from the control device 19 so that this sensitivity difference, that is, the flow rate of the gas is kept constant, the vaporized gas of a predetermined flow rate is constantly maintained. G can be stably supplied.
【００２１】すなわち、質量流量計18の出力ａを制御装
置19に入力し、予め設定された流量値との比較を行う。
そして、出力値と設定流量値とが異なる場合には、前記
出力ａが所定の値に保たれるように、制御装置19からの
制御信号ｃによって液体流量制御器16における圧電アク
チュエータに印加する直流電圧を調整して、液体材料Ｌ
の流量を制御するのである。このように、質量流量計18
の流量変化に基づいて液体流量制御器16の制御を行うこ
とにより、気化室６に導入される液体材料Ｌの流量調整
を自動化することができる。That is, the output a of the mass flowmeter 18 is input to the controller 19 and compared with a preset flow rate value.
When the output value and the set flow rate value are different, the direct current applied to the piezoelectric actuator in the liquid flow rate controller 16 by the control signal c from the control device 19 so that the output a is maintained at a predetermined value. Adjust the voltage to adjust the liquid material L
It controls the flow rate of. Thus, the mass flowmeter 18
By controlling the liquid flow rate controller 16 based on the change in the flow rate, the flow rate of the liquid material L introduced into the vaporization chamber 6 can be automated.
【００２２】上述の説明では、液体流量制御器16を制御
を、質量流量計18の出力ａと制御装置19内に予め設定さ
れている流量設定値とを制御装置19において比較し、そ
の結果に基づいて行うようにしているが、これに代え
て、質量流量計18の出力ａと質量流量コントローラ17の
出力ｂとを制御装置19に入力し、両者の差（ａ−ｂ）、
すなわち、気化ガスＧとキャリアガスＫとにおける質量
流量の差を予め設定された流量値と比較するようにして
もよい。In the above description, the liquid flow rate controller 16 is controlled by comparing the output a of the mass flow meter 18 with the flow rate set value preset in the control device 19 in the control device 19 and the result is compared. However, instead of this, the output a of the mass flow meter 18 and the output b of the mass flow controller 17 are input to the control device 19, and the difference (ab) between the two,
That is, the difference between the mass flow rates of the vaporized gas G and the carrier gas K may be compared with a preset flow rate value.
【００２３】すなわち、前記出力差（ａ−ｂ）と設定流
量値とが異なる場合には、この出力差（ａ−ｂ）が所定
の値に保たれるように、制御装置19からの制御信号ｃに
よって流体流量制御器16における圧電アクチュエータに
印加する直流電圧を調整して、気化室６に導入される流
体流量を制御するのである。That is, when the output difference (ab) is different from the set flow rate value, the control signal from the control device 19 is controlled so that the output difference (ab) is maintained at a predetermined value. The flow rate of the fluid introduced into the vaporization chamber 6 is controlled by adjusting the DC voltage applied to the piezoelectric actuator in the fluid flow controller 16 by c.
【００２４】ところで、前記気化ガス導出管15にキャリ
アガスＫのみが流れる場合、質量流量計18の出力ａは、
質量流量コントローラ17の出力ｂと同じである。そし
て、気化ガス導出管15に気化ガスＧが流入した場合、質
量流量計18で感度差が生ずるが、この感度差は液体材料
Ｌの導入量と相関関係にある。従って、この感度差を流
体流量制御器16において任意に制御することにより、任
意の流量の液体材料Ｌを気化室６に導入し、キャリアガ
スＫの流量に関係なく、所望の気化ガス流量が得ること
ができる。When only the carrier gas K flows through the vaporized gas outlet pipe 15, the output a of the mass flow meter 18 is
It is the same as the output b of the mass flow controller 17. Then, when the vaporized gas G flows into the vaporized gas outlet pipe 15, a sensitivity difference occurs in the mass flowmeter 18, and this sensitivity difference is correlated with the amount of the liquid material L introduced. Therefore, by arbitrarily controlling this difference in sensitivity in the fluid flow rate controller 16, the liquid material L having an arbitrary flow rate is introduced into the vaporization chamber 6, and a desired vaporized gas flow rate is obtained regardless of the flow rate of the carrier gas K. be able to.
【００２５】すなわち、前記出力差は任意に設定でき、
しかも、コンピュータのような制御装置19を用いること
により、設定値を所望の時間で変化させたり、時間に対
して連続的に変化させたり、これらを組み合わせたりす
るなど、各種パターンに設定でき、これにより、液体材
料Ｌの気化室６への導入量を変化させることができる。That is, the output difference can be set arbitrarily,
Moreover, by using the control device 19 such as a computer, it is possible to set various patterns such as changing the set value at a desired time, continuously changing it with respect to time, or combining these. Thereby, the amount of the liquid material L introduced into the vaporization chamber 6 can be changed.
【００２６】なお、上記実施例においては、ヒータブロ
ック２、管継手11およびキャリアガス導入管13が断熱構
造のハウジング14内に設けてあるので、外周の温度に影
響されることなく、液体材料Ｌの気化が行われる。特
に、キャリアガス導入管13がヒータブロック２からの輻
射熱によって加熱され、キャリアガスＫがある程度の温
度に保温されているので、気化ガスＧとの温度差がほと
んどなく、その上、気化ガス導出管15、質量流量計18に
はヒータ（図外）を設けてあるので、気化ガスＧが冷却
されて液化されるといったことが防止される。In the above embodiment, since the heater block 2, the pipe joint 11 and the carrier gas introduction pipe 13 are provided in the housing 14 having a heat insulating structure, the liquid material L is not affected by the temperature of the outer circumference. Is vaporized. In particular, since the carrier gas introduction pipe 13 is heated by the radiant heat from the heater block 2 and the carrier gas K is kept at a certain temperature, there is almost no temperature difference from the vaporized gas G, and moreover, the vaporized gas outlet pipe. 15. Since the mass flowmeter 18 is provided with a heater (not shown), the vaporized gas G is prevented from being cooled and liquefied.
【００２７】[0027]
【発明の効果】以上説明したように、本発明によれば、
気化室に導入された液体材料が瞬間的に気化するため、
そのガス発生量は液体材料の導入量に依存するだけであ
る。その上、気化室内の温度管理も容易であるため、液
体材料を安定に気化させることができる。As described above, according to the present invention,
Since the liquid material introduced into the vaporization chamber is instantly vaporized,
The amount of gas generated only depends on the amount of liquid material introduced. Moreover, since the temperature inside the vaporizing chamber can be easily controlled, the liquid material can be vaporized stably.
【００２８】そして、請求項１に記載した発明によれ
ば、気化したガスの流量を質量流量計によって測定し、
その流量変化に基づいて液体流量制御器を制御するよう
にしているので、所定流量の気化ガスを安定して常に発
生させることができ、これを常に安定して供給すること
ができる。Further, according to the invention described in claim 1, the flow rate of the vaporized gas is measured by a mass flow meter,
Since the liquid flow rate controller is controlled on the basis of the change in the flow rate, the vaporized gas having a predetermined flow rate can always be stably generated, and this can be constantly and stably supplied.
【００２９】また、請求項２に記載した発明によれば、
キャリアガスの流量を任意に変化させても、質量流量計
と質量流量コントローラとにおける出力差を一定に保持
することによって、所定流量の気化ガスを安定して常に
発生させることができ、これを常に安定して供給するこ
とができる。According to the invention described in claim 2,
Even if the flow rate of the carrier gas is arbitrarily changed, by keeping the output difference between the mass flow meter and the mass flow controller constant, it is possible to constantly generate a vaporized gas at a predetermined flow rate, which is always maintained. It can be stably supplied.
【図１】本発明に係る液体材料気化供給装置の一例を示
す概略構成図である。FIG. 1 is a schematic configuration diagram showing an example of a liquid material vaporization and supply device according to the present invention.
６…気化室、８…液体導入管、13…キャリアガス導入
管、15…気化ガス導出管、16…液体流量制御器、17…質
量流量コントローラ、18…質量流量計、Ｌ…液体材料、
Ｇ…気化ガス、ａ…質量流量計の出力、ｂ…質量流量コ
ントローラの出力。6 ... Vaporization chamber, 8 ... Liquid introduction pipe, 13 ... Carrier gas introduction pipe, 15 ... Vaporized gas discharge pipe, 16 ... Liquid flow controller, 17 ... Mass flow controller, 18 ... Mass flow meter, L ... Liquid material,
G ... Vaporized gas, a ... Output of mass flow meter, b ... Output of mass flow controller.
Claims (2)
化室の一端側に、液体材料源に接続されると共に液体流
量制御器を備えた液体導入管と、キャリアガス源に接続
されると共に質量流量コントローラを備えたキャリアガ
ス導入管とを接続する一方、前記気化室の他端側に、質
量流量計を備えた気化ガス導出管を接続し、前記質量流
量計の出力に基づいて前記液体流量制御器を制御するよ
うにしたことを特徴とする液体材料気化供給装置。1. A liquid introduction pipe connected to a liquid material source and equipped with a liquid flow rate controller at one end of a vaporization chamber for directly vaporizing a liquid material by heating, and a mass flow rate connected to a carrier gas source. While connecting with a carrier gas introduction pipe equipped with a controller, a vaporized gas outlet pipe equipped with a mass flow meter is connected to the other end of the vaporization chamber, and the liquid flow rate control is performed based on the output of the mass flow meter. A liquid material vaporization and supply device characterized in that it is configured to control a vessel.
化室の一端側に、液体材料源に接続されると共に液体流
量制御器を備えた液体導入管と、キャリアガス源に接続
されると共に質量流量コントローラを備えたキャリアガ
ス導入管とを接続する一方、前記気化室の他端側に、質
量流量計を備えた気化ガス導出管を接続し、前記質量流
量計の出力と質量流量コントローラの出力との差に基づ
いて前記液体流量制御器を制御するようにしたことを特
徴とする液体材料気化供給装置。2. A liquid introduction pipe connected to a liquid material source and provided with a liquid flow rate controller at one end of a vaporization chamber for directly vaporizing the liquid material by heating, and a mass flow rate connected to a carrier gas source. While connecting with a carrier gas introduction pipe provided with a controller, the other end of the vaporization chamber is connected with a vaporized gas discharge pipe provided with a mass flow meter, and the output of the mass flow meter and the output of the mass flow controller. The liquid material vaporizing and supplying device, wherein the liquid flow rate controller is controlled based on the difference between
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11225092A JP3200464B2 (en) | 1991-08-27 | 1992-04-04 | Liquid material vaporizer |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3-242586 | 1991-08-27 | ||
| JP24258691 | 1991-08-27 | ||
| JP11225092A JP3200464B2 (en) | 1991-08-27 | 1992-04-04 | Liquid material vaporizer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05228361A true JPH05228361A (en) | 1993-09-07 |
| JP3200464B2 JP3200464B2 (en) | 2001-08-20 |
Family
ID=26451467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11225092A Expired - Fee Related JP3200464B2 (en) | 1991-08-27 | 1992-04-04 | Liquid material vaporizer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3200464B2 (en) |
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