JPH05142414A - Pattern forming method - Google Patents

Abstract

PURPOSE:To obtain a smooth surface which facilitates a flattening treatment in a post stage at the time of producing color filters of a liquid crystal display, etc. CONSTITUTION:Color patterns 13 and the pattern of a black matrix 14 are once formed by a printing method on a glass substrate 11 for transfer having a release layer 12 and thereafter the patterns are inspected. Only the non- defective patterns are formed on a glass substrate 16 via an adhesive layer 15 of a UV curing resin, etc. Since only the non-defective patterns are transferred onto the glass substrate, the yield is improved. The patterns having the excellent surface flatness are formed by the transfer from the release layer.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern forming method used for manufacturing color filters for liquid crystal color displays.

[0002]

2. Description of the Related Art Recently, in the field of electronics,
Color panels such as liquid crystal displays, plasma displays and EL displays are being developed.

Conventionally, as a method of manufacturing a color panel, after sputtering chromium on a transparent substrate, a pattern is formed by photolithography to produce a black matrix,
A layer to be dyed such as gelatin is provided on top of this, a window is opened in the resist only where it is necessary for photolithography, and a dyeing method in which the layer to be dyed is dyed with an organic dye or a method in which an organic pigment is dispersed in a photoresist is used as a photo. A dispersion method of forming a pattern by lithography and a printing method of forming by intaglio or lithographic printing are mainly used. For example, Haneda et al., J.
Asia Electronics Union, vo112, no.6, p35-56 (198
There is 7).

[0004]

However, the dyeing method and the dispersion method using the photolithography technique have a drawback that the cost of the color filter is high because the process is complicated and the manufacturing apparatus is expensive.

In the conventional printing method, the black matrix and RGB (Red, Green, Blu) are also used.
Since the color pattern of e) is sequentially formed, the yield is the product of the yields in each process, which causes the cost not to be reduced so much.

Further, in the case of the printing method, a large step is generated in the overlapping portion of the black matrix and the color pattern (between RGB when there is no black matrix), which makes the surface flattening process very difficult. FIG. 3 shows a cross-sectional view of a color filter portion formed by a conventional printing method. Here, 31 is a glass substrate, 32 is a black matrix, and 33 is a color pattern, and a large step is generated in the overlapping portion of the black matrix 32 and the color pattern 33.

In view of the above problems, the present invention provides a pattern forming method for manufacturing a color filter at a low cost, and is used for manufacturing a color filter having a smooth surface which can be easily subjected to a flattening process in a subsequent step. An object of the present invention is to provide a pattern forming method.

[0008]

In order to solve the above-mentioned problems, the pattern forming method of the present invention comprises forming a pattern on a transfer substrate (for example, polishing glass) having a release layer, and then transferring the transferred substrate. The pattern is transferred onto a (generally glass substrate) via an adhesive layer.

Further, in the pattern forming method of the present invention, a resin layer is formed on a transfer substrate (for example, polishing glass) having a release layer, a pattern is formed on the resin layer, and then the transfer substrate (generally, a transfer target substrate) is formed. The resin layer and the pattern are transferred onto the glass substrate) via the adhesive layer to the transfer target substrate. However, if the pattern or the resin layer has adhesiveness to the transferred substrate, the adhesive layer is not necessary.

In the present invention, a transfer substrate having a release layer made of a fluorine-based release agent is used. As the release agent, a commercially available fluorine-based release agent is also effective. For example, the following general formula

[0011]

[Chemical 1] A compound having a fluoroalkyl group represented by

[0012]

[Chemical 2] There is a compound having a fluorine-based silane group represented by the formula (3) below, and a release agent having a fluorine-based silane group is particularly excellent.

As a method for producing the release layer, although a spray method can be used by spraying, a forming method of dipping or baking is superior from the viewpoint of durability.

[0014]

With the above structure, the pattern formed on the transfer substrate having the release layer on its surface is inspected, and only the non-defective product is transferred onto the transferred substrate. If the pattern is defective, the formed pattern is formed. Is removed by wiping, etc., and the transfer substrate is reused. Also, when a member is manufactured by stacking several patterns, the yield is not the product of the yields in some pattern forming processes because the inspection is performed before the transfer process and only good products are transferred. Only the yield of the transfer process is required, and the pattern forming cost can be significantly reduced.

Further, the pattern formed on the transfer substrate having the release layer on the surface can be easily transferred onto the transfer substrate via the adhesive layer, and the smooth surface condition of the transfer substrate can be patterned. A pattern that can be reflected on the surface and has a flat surface can be formed.

Further, by forming the resin layer on the transfer substrate having the release layer on the surface, it is possible to form the pattern on the resin layer even with a material which is difficult to form a pattern on the surface of the release layer. Specifically, it is possible to prevent the material from being repelled during pattern formation and the formed pattern from being peeled off before transfer. Furthermore, when the resin layer and the pattern formed on the transfer substrate are transferred to the transfer substrate via the adhesive layer, the resin layer becomes the uppermost layer on the transfer substrate,
Since the pattern material is not exposed on the surface, homogeneity of the surface material is obtained and a flatter surface is obtained as compared to the case where the pattern material is exposed on the surface.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to the drawings. 1A to 1D are schematic cross-sectional views of each step of the pattern forming method in the first embodiment, FIG. 1A is a transfer substrate forming step, and FIG. 1B is a pattern forming step. Steps, FIG. 1 (c) shows a bonding step, and FIG. 1 (d) shows a transfer step. In FIG. 1, 11 is a transfer glass substrate, 12 is a release layer, 13 is a color pattern, 14 is a black matrix, 15 is an adhesive layer, and 16 is a glass substrate.

The polished transfer glass substrate 11 is used as a release agent having a fluorine-based silane group, 1H, 1H, 2H, 2
After dipping in an ethanol solution containing 2% by weight of H-perfluorodecyltriethoxysilane (manufactured by PCR), 0.5% by weight of acetic acid and 5% by weight of water for 2 minutes and pulling up the transfer glass substrate 23 from the solution, 120 Hold for 10 minutes at ℃, Figure 1 (a)
As shown in, a release layer 12 containing a compound having a fluorine-based silane group was formed.

Then, by a printing method, as shown in FIG. 1B, an RGB color pattern 13 and a black matrix 14 are formed.
Formed. After that, the pattern consisting of the RGB color pattern and the black matrix was inspected, and only non-defective products were sent to the following steps.

A low-viscosity UV-curing resin to be the adhesive layer 15 is applied on the pattern, and the surface of the silane coupling agent (K, made by Shin-Etsu Silicone Co., Ltd., as shown in FIG.
The glass substrate 16 primed with BM603) was slowly attached so as to prevent air bubbles from entering. After that, ultraviolet rays were irradiated from the glass substrate side to cure the ultraviolet curable resin, and the adhesive layer 15 was formed to a thickness of several μm.

The laminated glass substrate 16 is used as a release layer.
The transfer substrate 11 having 12 was peeled off. When the transfer substrate and the transferred substrate are peeled off from each other, as shown in FIG. 1D, the release layer 12 and the color pattern 13 are always peeled off due to the difference in adhesiveness.

The thickness of the color pattern thus completed is about 4 μm and the surface smoothness is very excellent.
The surface roughness was ± 0.03 μm or less, and when it was used as a color filter of a liquid crystal display, there was no problem even if an ITO transparent electrode or an alignment film was formed directly on it.

When a liquid crystal panel was manufactured by using the color filter manufactured by the above method, a sharp screen which was almost equal to or higher than that of the conventional product was obtained. It is considered that this is because the ITO transparent electrode pattern was formed immediately above the color filter.

Further, the yield of the color filter panel in this embodiment is 0.92, while the RGB color pattern is 1
In the case of the conventional printing method in which colors are stacked, the yield is about 0.55. This is the product of the yield in each step in the conventional method, but in this embodiment, the inspection is performed once on the transfer substrate, and in the case of a defective product, the color filter pattern is wiped and the transfer substrate is reused. Is possible. Therefore, only the yield at the time of transfer is effective as the yield, and the yield is greatly improved as compared with the conventional method.

Next, a second embodiment will be described with reference to the drawings. 2A to 2D are schematic cross-sectional views of the respective steps of the pattern forming method in the second embodiment.
2A is a black matrix forming process, FIG. 2B is a color pattern forming process, FIG. 2C is a laminating process, and FIG.
Indicates each of the peeling steps. In FIG. 2, 21 is a glass substrate, 22 is a black matrix, 23 is a transfer glass substrate, 24 is a release layer, 25 is a resin layer, 26 is a color pattern, and 27 is an adhesive layer.

On the glass substrate 21, as shown in FIG.
The black matrix pattern 22 was formed by the photolithography method. Next, as shown in FIG. 2B, on the transfer glass substrate 23 having the release layer 24 formed in the same manner as in the first embodiment, as shown in FIG.
An ultraviolet curable resin was applied and exposed to form a resin layer 25, and then a color pattern 26 was formed on the resin layer 25 by a pigment dispersion method.

After the inspection, only the non-defective products are black matrix
While aligning with the glass substrate 21 on which 22 was formed, as in the first embodiment, as shown in FIG. 2 (c), bonding was performed via an ultraviolet curable resin. When the alignment was completed, ultraviolet rays were radiated to cure the ultraviolet curable resin to form the adhesive layer 27. After this, the glass substrate
When mechanical stress is applied between the glass substrate 21 and the transfer glass substrate 23, as shown in FIG.
As shown in (d), peeling was performed between the release layer 24 and the resin layer 25.

In this way, the completed color filter had better surface smoothness than that of the first embodiment, and the surface roughness was ± 0.02 μm or less. The yield was the product of the yield in the black matrix manufacturing process and the yield in transfer and peeling, which was about 0.82.

As the adhesive at the time of transfer, a thermosetting adhesive such as an epoxy adhesive was also effective in addition to the ultraviolet curable resin. Further, when a pattern was formed by a pigment dispersion method without providing a resin layer on the release layer, the pattern peeled before the pattern was transferred to the transfer substrate.

As the releasing agent, those having a fluorine-containing silane group containing Si are excellent, but those having only a fluorine-containing fluoroalkyl group are also effective.

[0031]

As described above, according to the present invention, after the pattern is formed on the transfer substrate having the release layer, the pattern is transferred onto the transfer target substrate via the adhesive layer. Alternatively, a resin layer is formed on a transfer substrate having a release layer, a pattern is formed on the resin layer, and then the resin layer and the pattern are transferred to the transfer substrate via an adhesive layer on the transfer substrate. As a result, the surface of the pattern becomes flatter than that of the conventional pattern forming method.
There is an advantage that flattening treatment is not necessary when forming the TO or only coating with a leveling agent is required. Therefore, it is excellent for use in forming patterns such as color filters of liquid crystal displays.

In the pattern forming method of the present invention, the pattern is once formed on the transfer substrate, the pattern is inspected, and only good products are bonded onto the transfer substrate (generally a glass substrate) with an adhesive layer such as an ultraviolet curing resin. In the case of manufacturing a member by stacking several patterns by transferring via a transfer method, the inspection is performed before the transfer process, and only non-defective products can be transferred. However, the yield of the transfer process is almost the same, and the pattern formation cost can be significantly reduced.

[Brief description of drawings]

FIG. 1 is a schematic sectional view of each step of a color simple matrix liquid crystal substrate in a first embodiment of the present invention.

FIG. 2 is a schematic cross-sectional view of each step of the color simple matrix liquid crystal substrate in the second embodiment of the present invention.

FIG. 3 is a cross-sectional view of a color filter portion formed by a conventional printing method.

[Explanation of symbols]

 11 Transfer glass substrate 12 Release layer 13 Color pattern 14 Black matrix 15 Adhesive layer 16 Glass substrate 21 Glass substrate 22 Black matrix 23 Transfer glass substrate 24 Release layer 25 Resin layer 26 Color pattern 27 Adhesive layer

Claims (6)

[Claims] 1. A step of forming a pattern on a transfer substrate having a release layer on its surface, and a step of transferring the pattern from the transfer substrate having the release layer onto a transfer target substrate. And a pattern forming method. 2. A step of forming a resin layer on a transfer substrate having a release layer on its surface; a step of forming a pattern on the resin layer; and a step of forming the resin layer and the pattern on the release layer. A pattern forming method comprising a step of transferring from a transfer substrate onto a transferred substrate. 3. The pattern forming method according to claim 1, wherein the release layer is made of a fluorine-based release agent. 4. The release layer has the following general formula: 3. The pattern forming method according to claim 1, comprising a compound having a fluoroalkyl group represented by: 5. The release layer has the following general formula: 3. The pattern forming method according to claim 1, further comprising a compound having a fluorine-based silane group represented by 6. The pattern forming method according to claim 1, wherein the pattern or the pattern and the resin layer are transferred onto the transfer target substrate via the adhesive layer.