JPH0480052U - - Google Patents
Info
- Publication number
- JPH0480052U JPH0480052U JP12560490U JP12560490U JPH0480052U JP H0480052 U JPH0480052 U JP H0480052U JP 12560490 U JP12560490 U JP 12560490U JP 12560490 U JP12560490 U JP 12560490U JP H0480052 U JPH0480052 U JP H0480052U
- Authority
- JP
- Japan
- Prior art keywords
- tweezers
- dust
- view
- free paper
- featuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000001694 spray drying Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
Description
第１図はこの考案の一実施例であるピンセツト
の断面側面図、第２図は第１図のピンセツトで吹
付け乾燥を行つている状態の正面図、第３図は従
来のピンセツトを用いた吹付け乾燥状態を示す斜
視図である。図において、１はピンセツト、２は
半導体ウエハ、３はＮ２ガス又は乾燥空気、４は
水滴、１１は無じん紙を示す。なお、図中、同一
符号は同一、又は相当部分を示す。
Figure 1 is a cross-sectional side view of a tweezers that is an embodiment of this invention, Figure 2 is a front view of the tweezers shown in Figure 1 being used for spray drying, and Figure 3 is a view of the tweezers shown in Figure 1 using conventional tweezers. FIG. 3 is a perspective view showing a spray drying state. In the figure, 1 is a tweezers, 2 is a semiconductor wafer, 3 is N2 gas or dry air, 4 is a water droplet, and 11 is dust-free paper. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (1)
するピンセツト。 Tweezers featuring dust-free paper with excellent water absorption.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12560490U JPH0480052U (en) | 1990-11-27 | 1990-11-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12560490U JPH0480052U (en) | 1990-11-27 | 1990-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0480052U true JPH0480052U (en) | 1992-07-13 |
Family
ID=31873196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12560490U Pending JPH0480052U (en) | 1990-11-27 | 1990-11-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0480052U (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005036623A1 (en) * | 2003-10-08 | 2005-04-21 | Zao Nikon Co., Ltd. | Substrate transporting apparatus and method, exposure apparatus and method, and device producing method |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
| US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
| US9891539B2 (en) | 2005-05-12 | 2018-02-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
-
1990
- 1990-11-27 JP JP12560490U patent/JPH0480052U/ja active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
| US9885959B2 (en) | 2003-04-09 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator |
| WO2005036623A1 (en) * | 2003-10-08 | 2005-04-21 | Zao Nikon Co., Ltd. | Substrate transporting apparatus and method, exposure apparatus and method, and device producing method |
| US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9760014B2 (en) | 2003-10-28 | 2017-09-12 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US10281632B2 (en) | 2003-11-20 | 2019-05-07 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction |
| US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10241417B2 (en) | 2004-02-06 | 2019-03-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10234770B2 (en) | 2004-02-06 | 2019-03-19 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10007194B2 (en) | 2004-02-06 | 2018-06-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US9891539B2 (en) | 2005-05-12 | 2018-02-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9857599B2 (en) | 2007-10-24 | 2018-01-02 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |