JPH04330961A - Development processing equipment - Google Patents

Abstract

PURPOSE:To obtain a development processing equipment capable of discharging a liquid chemical with specified temp. and of efficiency using developer even when stopping and resumption for discharge of the liquid chemical are repeated in the case of causing difference between the temp. of the liquid chemical and the temp. of the atmosphere. CONSTITUTION:A development processing equipment is provided with a liquid chemical supplying line 7 for supplying the liquid chemical held in a liquid chemical tank 1 to a nozzle 4, a temp. controlling means 11 for controlling the temp. of the liquid chemical passed through the line 7 and a recovery line 9 which is connected to the downstream end part of the line 7 and recovers the liquid chemical of the same to a recovery tank 5 at the time of stopping the liquid chemical discharge by the nozzle 4. The liquid chemical in the recovery tank 5 is returned to the tank 1 via a calculation line 12 and thereby reused.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a development processing apparatus for carrying out development processing at a constant temperature in the manufacturing process of semiconductor devices.

0002

2. Description of the Related Art In recent years, as integrated circuits have become highly integrated, semiconductor devices are required to have a high degree of pattern accuracy. In order to achieve such high pattern accuracy, new demands are also being placed on resist materials, exposure equipment, development processing equipment, and the like.

A conventional developing processing apparatus will be explained below. FIG. 2 schematically shows the general structure of a conventional development processing apparatus. The development processing apparatus shown in FIG. 2 includes a chemical tank 1 that supplies a developer, a nozzle 4 that discharges the developer onto an object to be processed, a chemical supply line 7 that supplies the developer to the nozzle 4, and a developer in the chemical supply line 7. It has a constant temperature bath 2 that stores a medium that keeps the liquid at a constant temperature, and a medium temperature control device 3 that keeps the temperature of the medium in the constant temperature bath 2 constant, and the constant temperature bath 2 and the medium temperature control device 3 constitutes a temperature adjusting means 11. The chemical supply line 7 is provided with a supply line opening/closing valve 6a that opens and closes the flow path of the developer. Further, the chemical solution tank 1 is provided with a pressure release valve 6d for opening the inside of the tank 1 to normal pressure.

[0004] The operation of the developing processing apparatus having the above structure will be explained. First, the pressure release valve 6d is closed, nitrogen gas is pressurized into the chemical tank 1 containing the developer, and the developer in the chemical tank 1 is pumped. The pressure-fed developer is guided into the constant temperature bath 2 by the chemical supply line 7, and reaches a predetermined temperature while passing through the constant temperature bath 2. The developer that has reached a predetermined temperature is discharged onto the object to be processed by the nozzle 4 via the supply line opening/closing valve 6a. The discharge of the developer from the nozzle 4 can be stopped and restarted by opening and closing the supply line opening/closing valve 6a.

FIG. 3 shows another example of a conventional developing processing apparatus. The developing processing apparatus shown in FIG. 3 differs from the developing processing apparatus shown in FIG. 2 in that a medium line 8 for circulating the medium from the temperature control device 3 is provided in the chemical tank 1, and a constant temperature bath 2 is not provided. The rest of the configuration is the same as in FIG. 2, and corresponding parts are given the same reference numerals.

The operation of the developing processing apparatus shown in FIG. 3 will be explained. In this development processing apparatus, the medium temperature adjustment device 3
The developer is maintained at a predetermined temperature by a medium circulation line 8 that circulates a medium set at a constant temperature. That is, the entire developer in the chemical tank 1 is maintained at a predetermined temperature. The developer in the chemical solution tank 1, which is maintained at a predetermined temperature, is fed under pressure by the injected nitrogen gas, as in the case of FIG. 2, and is discharged from the nozzle 4 onto the object to be processed through the chemical solution supply line 7.

[0007]

According to the conventional configuration shown in FIGS. 2 and 3, when the developer is continuously discharged from the nozzle 4, the developer at a constant temperature is discharged from the nozzle. 4 can be supplied. However, when the supply line opening/closing valve 6a is closed to stop discharging the developer, the chemical solution is stored in the chemical solution supply line 7 between the constant temperature bath 2 and the nozzle 4 in the case of FIG. 2, and in the chemical solution tank 1 in the case of FIG. The developer remains in the chemical supply line 7 between the nozzle 4 and the nozzle 4. If there is a difference between the temperature of the developer and the temperature of the atmosphere, the staying developer will be affected by the temperature of the atmosphere,
The temperature will deviate from the predetermined temperature. Next, when the discharge of the developer from the nozzle 4 is restarted, the developer at the predetermined temperature is not supplied within a certain period of time after the restart. For this reason, in conventional development processing apparatuses, if there is a difference between the temperature of the developer and the temperature of the atmosphere, the stagnant developer will
This has the problem that the temperature is no longer at the predetermined temperature, so it has to be wasted.

The present invention solves the above-mentioned conventional problems, and an object of the present invention is to reduce the amount of developer supplied to the chemical solution discharging means even when there is a difference between the temperature of the developer and the temperature of the atmosphere. To provide a development processing device which can always keep the temperature of a solution constant and can use a developer without wasting it.

[0009]

[Means for Solving the Problems] In order to achieve the above-mentioned object, the developing processing apparatus of the present invention has a temperature control means that sets the temperature to a predetermined temperature even when discharging the chemical solution from the chemical solution discharging means. The structure is such that the chemical liquid is returned to the chemical liquid tank by the chemical liquid recirculation means from the upstream side of the chemical liquid discharge means, that is, the downstream end of the chemical liquid supply path, without stopping the flow of the chemical liquid.

Specifically, the measures taken by the present invention include a chemical liquid tank that stores a chemical liquid, a chemical liquid discharge means that discharges the chemical liquid onto the object to be treated, and a chemical liquid supply that supplies the chemical liquid from the chemical liquid tank to the chemical liquid discharge means. and a temperature adjustment means for adjusting the temperature of the chemical liquid flowing through the chemical liquid supply path and supplied to the chemical liquid discharging means, and the chemical liquid discharging means stops discharging the chemical liquid. The chemical liquid reflux means is provided for causing the chemical liquid at the downstream end of the chemical liquid supply path to flow back to the chemical liquid tank when the chemical liquid is in the chemical liquid supply path.

[0011]

[Function] According to the structure of the present invention, when the chemical liquid discharging means stops discharging the chemical liquid, the chemical liquid reflux means is provided which causes the chemical liquid at the downstream end of the chemical liquid supply path to flow back to the chemical liquid tank. Even when the discharge is stopped, the chemical solution does not accumulate at the downstream end of the chemical solution supply path, and the chemical solution at a predetermined temperature is always supplied to the downstream end of the chemical solution supply path. Therefore, when the next time discharge of the chemical liquid from the chemical liquid discharge means is resumed, the chemical liquid at the predetermined temperature is immediately supplied.

[0012] Further, while the chemical liquid discharging means stops discharging the chemical liquid, the chemical liquid flowing in the chemical liquid supply line is returned to the chemical liquid tank by the chemical liquid reflux means and is reused.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the developing processing apparatus of the present invention will be described below with reference to FIG.

The development processing apparatus of this embodiment includes a chemical tank 1 for storing a developer as a chemical, a nozzle 4 for discharging the developer onto an object to be processed, and a system for supplying the developer from the chemical tank 1 to the nozzle 4. A chemical liquid supply line 7 as a chemical liquid supply path,
It is equipped with a temperature adjustment means 11 for adjusting the temperature of the developer flowing through the chemical solution supply line 7, and this temperature adjustment means 11
The apparatus is comprised of a constant temperature bath 2 for storing the medium and a medium temperature control device 3 for adjusting the temperature of the medium. A supply line opening/closing valve 6a is provided at the downstream end of the chemical supply line 7. On the upstream side of the supply line opening/closing valve 6a in the chemical supply line 7, the developer at the downstream end of the chemical supply line 7 is transferred to a recovery tank 5. The upstream end of a recovery line 9 serving as a recovery path is connected to the recovery line 9 for recovery. Collection line 9
is provided with a recovery line opening/closing valve 6b that opens and closes the flow path of the recovery line 9.

Between the recovery tank 5 and the chemical tank 1,
A reflux line 12 is provided for refluxing the developer collected in the recovery tank 5 to the chemical tank 1, and this reflux line 12 is provided with a reflux line opening/closing valve 6g for opening and closing the reflux line 12. The recovery tank 5 and the chemical tank 1 are provided with first and second pressure release valves 6c that release the pressure in the recovery tank 5 and the chemical tank 1 to normal pressure, respectively.
and 6d are provided. Further, the downstream ends of first and second nitrogen supply lines 10a and 10b, which are branched from one nitrogen supply line whose upstream side is connected to a nitrogen supply source, are connected to the chemical solution tank 1 and the recovery tank 5, respectively. The first and second nitrogen supply lines each have a first
and second flow path opening/closing valves 6f, 6e are provided.

As explained above, the recovery line opening/closing valve 6b, the recovery line 9, the recovery tank 5, the first pressure release valve 6c, the reflux line 12, the reflux line opening/closing valve 6g, and the second nitrogen supply By line 10b,
A chemical liquid reflux means is configured.

The operation of the developing processing apparatus of this embodiment having the above-described configuration will be explained below.

First, when the developer is discharged from the nozzle 4, the supply line on-off valve 6a and the first pressure release valve 6c are opened, and the recovery line on-off valve 6b, the second pressure release valve 6d, and the second flow path on/off are opened. Close the valve 6e and the reflux line opening/closing valve 6g. Next, the first flow path opening/closing valve 6
Open f and pressurize nitrogen gas into the chemical tank 1. As a result, the developer in the chemical tank 1 is force-fed through the chemical supply line 7 toward the nozzle 4 . The developing solution pressure-fed through the chemical solution supply line 7 reaches a predetermined temperature while passing through the constant temperature bath 2 which is set at a predetermined temperature by the medium temperature control device 3 . The developer that has reached a predetermined temperature is further supplied to the nozzle 4 through the chemical supply line 7, and is discharged onto the object to be processed.

Next, when stopping the discharge of the developer,
The supply line opening/closing valve 6a is closed, and the recovery line opening/closing valve 6b is opened. As a result, the developer at a predetermined temperature that is pressure-fed through the chemical supply line 7 is collected from the upstream side of the nozzle 4, that is, from the downstream end of the supply line 7, without staying between the temperature adjustment means 11 and the nozzle 4. It is collected into a collection tank 5 via a line 9.

Next, when discharging the developer from the nozzle 4 is started again, the channel opening/closing valve 6b is closed and the supply line opening/closing valve 6a is opened. As a result, the developer at the predetermined temperature is discharged from the nozzle 4 again.

The developer recovered in the recovery tank 5 is transferred to the second pressure relief valve 6 by closing the recovery line opening/closing valve 6b, the first pressure relief valve 6c, and the first flow path opening/closing valve 6f.
d. Open the second flow path opening/closing valve 6e and the reflux line opening valve 6g to transfer the developer in the recovery tank 5 to the reflux line 12.
It can be reused by force-feeding it to the chemical liquid tank 1 via.

According to the development processing apparatus of this embodiment, even when the discharge of the developer by the nozzle 4 is stopped, the developer does not stay in the chemical supply line 7, and the developer does not stay in the chemical supply line 7 upstream of the nozzle 4, that is, in the chemical supply line. From the downstream end of 7, it is collected into a collection tank 5 via a collection line 9. Therefore, the discharge of the developer from the nozzle 4 can be resumed in the same state as before the discharge was stopped.
Even if there is a difference between the set temperature of the developer and the temperature of the atmosphere, the developer can always be discharged at a constant temperature.

[0023] Also, an on-off valve 6 provided in each line
By electrically controlling the opening and closing of a to 6g, it is possible to automatically discharge the developer from the nozzle 4, collect it in the recovery tank 5, and return it from the recovery tank 5 to the chemical tank 1.

[0024] In this embodiment, a development processing apparatus was particularly described among semiconductor device manufacturing apparatuses, but the present invention can also be applied to a wet etching apparatus. It goes without saying that the present invention can also be applied to photomask manufacturing equipment in addition to semiconductor device manufacturing equipment.

[0025]

As described above, the developing processing apparatus of the present invention has a chemical liquid reflux system that allows the chemical liquid at the downstream end of the chemical liquid supply path to flow back to the chemical liquid tank when the chemical liquid discharging means stops discharging the chemical liquid. Since the chemical liquid is provided with the chemical liquid supply means, the chemical liquid does not remain at the downstream end of the chemical liquid supply path, and even while the chemical liquid discharge from the chemical liquid discharge means is stopped, the chemical liquid at a predetermined temperature flows through the chemical liquid supply path. . Immediately after the discharge of the chemical liquid is resumed, the medical liquid at a constant temperature is supplied to the chemical liquid discharge means.

[0026] Furthermore, in the development processing apparatus of the present invention,
The chemical liquid flowing through the chemical liquid supply path while the discharge of the chemical liquid from the chemical liquid discharge means is stopped is returned to the baking liquid tank by the chemical liquid recirculation means, so that the chemical liquid can be used without wasting it.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram of an embodiment of a developing processing apparatus of the present invention.

FIG. 2 is a schematic diagram of a conventional development processing apparatus.

FIG. 3 is a schematic diagram of another conventional development processing apparatus.

[Explanation of symbols]

1 Chemical tank 2　Thermostatic chamber 3 Medium temperature control device 4 Nozzle (chemical liquid discharge means) 5 Recovery tank 6a Supply line opening/closing valve 6b Recovery line opening/closing valve 6c First pressure release valve 6d Second pressure release valve 6e Second flow path opening/closing valve 6f First flow path opening/closing valve 6g Reflux line opening/closing valve 7 Chemical solution supply line (chemical solution supply path) 9 Collection line (recovery path) 10a First nitrogen supply line 10b Second nitrogen supply line 11 Temperature control means 12 Reflux line

Claims (1)

[Claims] 1. A chemical solution tank for storing a chemical solution, a chemical solution discharging means for discharging the chemical solution onto the object to be treated, a chemical solution supply path for supplying the chemical solution from the chemical solution tank to the chemical solution discharging means, and a flow path through the chemical solution supply path. and temperature adjusting means for adjusting the temperature of the chemical liquid supplied to the chemical liquid discharging means, wherein when the chemical liquid discharging means stops discharging the chemical liquid, the temperature of the chemical liquid supply path is adjusted. A developing processing apparatus comprising a chemical liquid reflux means for causing the chemical liquid at the downstream end to flow back to the chemical liquid tank.