JPH04281000A - Method for continuous electropolishing and device therefor - Google Patents

Method for continuous electropolishing and device therefor

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Publication number
JPH04281000A
JPH04281000A JP3976491A JP3976491A JPH04281000A JP H04281000 A JPH04281000 A JP H04281000A JP 3976491 A JP3976491 A JP 3976491A JP 3976491 A JP3976491 A JP 3976491A JP H04281000 A JPH04281000 A JP H04281000A
Authority
JP
Japan
Prior art keywords
electrolytic polishing
electropolishing
polished material
electrolytically polished
gloss
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3976491A
Other languages
Japanese (ja)
Inventor
Hiroyuki Uchida
洋之 内田
Tsutomu Kami
力 上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP3976491A priority Critical patent/JPH04281000A/en
Publication of JPH04281000A publication Critical patent/JPH04281000A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable the improvement of surface quality and increase of produc tion yield by stable mirror finishing by an in-process detection and control of the electropolishing effect. CONSTITUTION:In a process of continuously electropolishing metal strips, etc., after materials to be electropolished are electropolished in an electropolishing vessel, white light or a laser beam 8a is projected on the surface 1a of the materials from the oblique direction to the surface 1a. The luminous intensity of the reflected light from the projected light is detected to determine the glossiness of the surface 1a of the material and is controlled so that the glossiness may be the prescribed one.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、金属ストリップなどを
連続的に電解研磨する工程において、金属ストリップの
鏡面仕上げを安定して行う電解研磨方法及び装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic polishing method and apparatus for stably achieving a mirror finish on a metal strip in the process of continuously electropolishing the metal strip.

【0002】0002

【従来の技術】金属ストリップなどの表面を鏡面仕上げ
する方法の一つとして、電解研磨を用いた例がいくつか
報告されている。電解研磨を用いる方法は、機械式研磨
や化学研磨と比較すると、連続的に、かつ工業的な大量
生産を容易に実現することが可能である。
2. Description of the Related Art Several examples have been reported in which electrolytic polishing is used as a method for mirror-finishing the surface of metal strips and the like. Compared to mechanical polishing or chemical polishing, the method using electrolytic polishing allows continuous and industrial mass production to be easily realized.

【0003】例えば、一方向性珪素鋼板の製造において
は、特公昭52−24499号公報及び特公昭56−4
150 号公報に開示されているように、鋼板表面を鏡
面仕上げすることにより著しく鉄損の低い一方向性珪素
鋼板が生産できることが公表されている。また、特開昭
63−18075号公報には一方向性珪素鋼板の鉄損低
減を工業的に、かつ連続的に実施するために、電解研磨
工程を有する設備が開示されている。
For example, in the production of unidirectional silicon steel sheets, Japanese Patent Publication No. 52-24499 and Japanese Patent Publication No. 56-4
As disclosed in Japanese Patent No. 150, it has been announced that a unidirectional silicon steel plate with extremely low core loss can be produced by mirror-finishing the surface of the steel plate. Further, Japanese Patent Application Laid-Open No. 18075/1983 discloses equipment having an electrolytic polishing process in order to industrially and continuously reduce the iron loss of unidirectional silicon steel sheets.

【0004】0004

【発明が解決しようとする課題】しかしながら、電解研
磨を工程的に採用すると著しいコストアップを招くこと
になり、従って、電解研磨の効果を把握することなく操
業を行うことは大量の電気量を無益に消費することにも
なりかねず、なんらかの手段を用いて被電解研磨材表面
の鏡面仕上げ状況を監視しながら生産を行うことが望ま
れている。このため、被電解研磨材表面の表面光沢値を
用いて鏡面仕上げ状況を判断するケースが見受けられる
[Problem to be solved by the invention] However, if electrolytic polishing is adopted in the process, it will lead to a significant increase in cost, and therefore, operating without understanding the effects of electrolytic polishing will waste a large amount of electricity. Therefore, it is desirable to carry out production while monitoring the mirror finish state of the surface of the electrolytically polished material by some means. For this reason, there are cases where the mirror finish status is determined using the surface gloss value of the surface of the electrolytically polished material.

【0005】金属ストリップなどの表面光沢値を測定す
る方法としては、JISZ8741「鏡面光沢度測定方
法」に記載された装置を用いて測定するものが挙げられ
るが、この方法では被電解研磨材の一部をサンプリング
する必要があるために、連続的に電解研磨を行う工程に
は使えない。また、オペレータの目視判断により表面光
沢値を測定する方法では、光沢値の定量的測定が不可能
であるため、常時安定した電解研磨を実行することがで
きない。
[0005] As a method for measuring the surface gloss value of metal strips, etc., there is a method that uses the apparatus described in JIS Z8741 ``Method for measuring specular gloss''. Since it is necessary to sample the area, it cannot be used for continuous electrolytic polishing processes. Furthermore, with the method of measuring the surface gloss value based on visual judgment by an operator, quantitative measurement of the gloss value is not possible, and therefore stable electrolytic polishing cannot be performed at all times.

【0006】このような問題については、前記公報には
何ら述べられていない。本発明は、上記の問題を解決し
、安定した鏡面仕上げを可能にする金属ストリップなど
の電解研磨方法及び装置を提供することを目的とする。
[0006] Regarding such problems, the above-mentioned publication does not mention anything. An object of the present invention is to provide a method and apparatus for electrolytic polishing of metal strips, etc., which solves the above-mentioned problems and enables a stable mirror finish.

【0007】[0007]

【課題を解決するための手段】本発明の連続式電解研磨
方法は、金属ストリップなどを連続的に電解研磨する工
程において、電解研磨後の被電解研磨材表面の光沢値を
測定し、該光沢値が所定の値になるようにインプロセス
にて電解研磨条件を制御することを特徴とするものであ
る。
[Means for Solving the Problems] The continuous electrolytic polishing method of the present invention measures the gloss value of the surface of the electrolytically polished material after electrolytic polishing in the process of continuously electropolishing a metal strip, etc. This method is characterized by controlling the electrolytic polishing conditions in-process so that the value becomes a predetermined value.

【0008】そして、本発明の連続式電解研磨装置は、
金属ストリップなどを連続的に電解研磨する工程におい
て、電解研磨槽と、電解研磨後の被電解研磨材表面の斜
め方向から白色光あるいはレーザ光を被電解研磨材表面
に投射し、該投射光の反射光の強度を検出して被電解研
磨材表面の光沢値を求める計器と、電解研磨後の被電解
研磨材表面の光沢値が所定の値になるように制御する制
御装置とを備えていることを特徴とするものである。
[0008]The continuous electrolytic polishing apparatus of the present invention has the following features:
In the process of continuous electrolytic polishing of metal strips, etc., white light or laser light is projected onto the surface of the electrolytically polished material from an electrolytic polishing tank and from an oblique direction on the surface of the electrolytically polished material after electropolishing. It is equipped with an instrument that detects the intensity of reflected light to determine the gloss value of the surface of the electrolytically polished material, and a control device that controls the gloss value of the surface of the electrolytically polished material after electropolishing to a predetermined value. It is characterized by this.

【0009】[0009]

【作  用】本発明では電解研磨工程に光沢測定装置を
設置するが、その理由について以下説明する。電解研磨
は機械式研磨などとは異なり、必ずしも研磨量に応じて
被電解研磨材の表面粗度が小さくなるものではない。す
なわち、電解研磨液中のイオンによって被電解研磨材の
表面が削り取られるものであるから、表面の微細凹凸を
つぶすのではなく、むしろ表面地肌を取り去るような働
きをすることになる。従って、表面粗度値はあるレベル
まで低下するものの、無制限に小さくなるものではない
[Function] In the present invention, a gloss measuring device is installed in the electrolytic polishing process, and the reason for this will be explained below. Unlike mechanical polishing, electrolytic polishing does not necessarily reduce the surface roughness of the electrolytically polished material depending on the amount of polishing. That is, since the surface of the electrolytically polished material is scraped off by the ions in the electrolytic polishing solution, it does not work to crush minute irregularities on the surface, but rather to remove the surface texture. Therefore, although the surface roughness value decreases to a certain level, it does not decrease indefinitely.

【0010】本発明者らの研究によれば、このような過
程を評価するためには、被電解研磨材の地金露出の程度
、すなわち光沢値を用いることが最適であることが明ら
かになった。光沢測定を行う装置としては、JISZ8
741「鏡面光沢度測定方法」に記載された装置をその
まま用いることが最適であるが、この装置の光学系はス
リット、レンズを備えた構造になっているために、被測
定面がレンズ焦点位置に固定された状態を前提としてい
る。そのため、金属ストリップなどを連続的に電解研磨
する工程では、被電解研磨材の走行に伴う振動のために
、JISZ8741記載の装置をインプロセス計測装置
として用いることは難しい。あるいは、補助ロールなど
により被電解研磨材を固定することが考えられるが、生
産ラインの複雑化を招くことになる。
According to the research conducted by the present inventors, it has become clear that in order to evaluate such a process, it is optimal to use the degree of bare metal exposure of the electrolytically polished material, that is, the gloss value. Ta. The equipment for measuring gloss is JISZ8.
It is best to use the device described in 741 “Method for Measuring Specular Glossiness” as is, but since the optical system of this device has a structure equipped with a slit and a lens, the surface to be measured is located at the focal point of the lens. It is assumed that the state is fixed at . Therefore, in the process of continuously electrolytically polishing a metal strip or the like, it is difficult to use the device described in JIS Z8741 as an in-process measuring device due to vibrations caused by the movement of the electrolytically polished material. Alternatively, it may be possible to fix the electrolytically polished material using an auxiliary roll or the like, but this would complicate the production line.

【0011】しかしながら、工業的規模で連続的に電解
研磨する工程では必ずしも精度の高い光沢測定が求めら
れるのではなく、操業に必要なレベルでの測定精度が保
証されれば十分であるケースが多い。本発明者らは、連
続的に電解研磨する工程に要求される精度を有する測定
方法、装置について調べたところ、斜め方向から白色光
、あるいはレーザ光を被電解研磨材表面に投射してその
反射光の強度を検出し、反射光の強度から被電解研磨材
表面の光沢値を求めれば実用上問題がないことを見出し
た。図3は白色光の反射光の強度から被電解研磨材表面
の光沢値を求めた一例を示すものであり、図4はレーザ
光の反射光の強度から被電解研磨材表面の光沢値を求め
た一例を示すものである。測定精度の点では白色光を光
源とする方法が好ましいが、装置製作上はレーザ光を光
源とするほうが有利である。
[0011] However, in the process of continuous electrolytic polishing on an industrial scale, highly accurate gloss measurement is not necessarily required, and in many cases it is sufficient to guarantee measurement accuracy at the level necessary for operation. . The present inventors investigated a measuring method and device that have the precision required for the process of continuous electrolytic polishing, and found that white light or laser light is projected onto the surface of the electrolytically polished material from an oblique direction, and the reflected light is reflected. It has been found that there is no practical problem if the intensity of the light is detected and the gloss value of the surface of the electrolytically polished material is determined from the intensity of the reflected light. Figure 3 shows an example of determining the gloss value of the surface of the electrolytically polished material from the intensity of the reflected light of white light, and Figure 4 shows an example of determining the gloss value of the surface of the electrolytically polished material from the intensity of the reflected light of the laser beam. This is an example. In terms of measurement accuracy, it is preferable to use white light as the light source, but in terms of device fabrication, it is more advantageous to use laser light as the light source.

【0012】一般に、光の反射強度は反射面の表面粗度
値と反射率による影響が強いが、前述のように電解研磨
が表面地肌を取り去るような働きをするために、表面粗
度値がほぼ一定で、反射率のみが変化しているものと推
測される。このため、単純な反射光の強度を検出する方
法、装置によっても、電解研磨工程では十分な光沢値測
定が行えるのである。
Generally, the reflection intensity of light is strongly influenced by the surface roughness value and reflectance of the reflective surface, but as mentioned above, since electrolytic polishing works to remove the surface texture, the surface roughness value It is presumed that it is almost constant and only the reflectance changes. Therefore, even with a simple method and device for detecting the intensity of reflected light, sufficient gloss value measurement can be performed in the electrolytic polishing process.

【0013】さらに、本発明による装置を用いて電解研
磨を行うと、被電解研磨材の鏡面仕上げ状況をインプロ
セスにて観察できるので、電解研磨の効果を把握しなが
ら操業を行うことができる。従って、表面光沢値が所定
の値になるように、電解研磨電流値や通板速度などの電
解研磨条件を変化することにより、常時安定した鏡面仕
上げが可能になる。
Further, when electrolytic polishing is performed using the apparatus according to the present invention, the mirror finish state of the electrolytically polished material can be observed in-process, so operations can be carried out while grasping the effects of electrolytic polishing. Therefore, by changing electrolytic polishing conditions such as electrolytic polishing current value and sheet passing speed so that the surface gloss value becomes a predetermined value, a stable mirror finish can be achieved at all times.

【0014】[0014]

【実施例】本発明の装置の一実施例を図1に示す。図1
において金属ストリップなどの被電解研磨材1はコイル
状態から酸洗槽2、第1の洗浄槽3を経て電解研磨槽4
に導かれ鏡面仕上げ処理がなされる。さらに、第2の洗
浄槽5を通り、洗浄液などを乾燥するための乾燥装置6
を経てコイル状に巻取られるが、乾燥装置6を出た後に
光沢測定装置7によって表面光沢値が測定される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the apparatus of the present invention is shown in FIG. Figure 1
In the process, the electrolytically polished material 1 such as a metal strip is transferred from a coiled state to an electrolytic polishing tank 4 via a pickling tank 2 and a first cleaning tank 3.
A mirror finishing process is performed. Furthermore, a drying device 6 for drying the cleaning liquid etc. that passes through the second cleaning tank 5
After leaving the drying device 6, the surface gloss value is measured by a gloss measuring device 7.

【0015】光沢測定装置7を乾燥装置6の後に配する
のは、被電解研磨材1の表面に付着した洗浄液、電解研
磨液による測定誤差の発生を防ぐためである。被電解研
磨材1がコイル状に巻取られる前に、ルーパや溶接機な
どを配することもあるが、乾燥装置より以降ならば、特
に光沢測定装置7の配する場所を限定するものではない
The reason why the gloss measuring device 7 is placed after the drying device 6 is to prevent measurement errors from occurring due to the cleaning liquid and electrolytic polishing liquid adhering to the surface of the electrolytically polished material 1. A looper, welding machine, etc. may be placed before the electrolytically polished material 1 is wound into a coil, but there is no particular restriction on the location where the gloss measuring device 7 is placed as long as it is after the drying device. .

【0016】光沢測定を行う装置としては、図2に模式
的に示すように、半導体レーザ8を例えば投射角60d
eg.で鋼板表面1aに照射し、その反射強度を第1の
光検出器9を用いて受光する構造のものを使用すればよ
い。図2に示す第2の光検出器10は、半導体レーザ8
の強度モニターの役割を果すものであり、レーザ光8a
の強度変化に起因する測定誤差を補正するものである。 さらに、光検出器9,10によって検出された光強度信
号は増幅器11を経て演算装置12に送信し、演算装置
12によって光沢値が算出される。算出された光沢値は
出力装置13によってオペレータに表示される。
As a device for measuring gloss, as schematically shown in FIG.
eg. It is sufficient to use a structure in which the steel plate surface 1a is irradiated with light and the reflected intensity is received using the first photodetector 9. The second photodetector 10 shown in FIG.
This serves as an intensity monitor for the laser beam 8a.
This is to correct measurement errors caused by intensity changes. Further, the light intensity signals detected by the photodetectors 9 and 10 are transmitted to the arithmetic unit 12 via the amplifier 11, and the arithmetic unit 12 calculates a gloss value. The calculated gloss value is displayed to the operator by the output device 13.

【0017】光沢測定装置7によって測定された被電解
研磨材の表面光沢値は、電解研磨工程全体を制御する中
央制御装置14に伝送される。中央制御装置14には、
図示しない他の計器からの信号も伝送され、工程全体が
所定の働きを行うように制御機器を通して工程の各部を
調整し運転している。図1に示す実施例では、上述のよ
うな制御機器の一例として、被電解研磨材1の巻取り制
御機器15及び電解研磨槽4の電流制御機器16を有し
ており、中央制御装置8が表面光沢値から被電解研磨材
1の鏡面仕上げ状況を判断し、鏡面仕上げが安定して行
えるように巻取り制御機器15、電流制御機器16を運
転する。
The surface gloss value of the electrolytically polished material measured by the gloss measuring device 7 is transmitted to a central controller 14 that controls the entire electrolytic polishing process. The central control device 14 includes:
Signals from other instruments (not shown) are also transmitted, and each part of the process is adjusted and operated through the control equipment so that the entire process performs a predetermined function. The embodiment shown in FIG. 1 has a winding control device 15 for the electropolishing material 1 and a current control device 16 for the electrolytic polishing tank 4 as examples of the control devices described above, and the central control device 8 The mirror finish status of the electrolytically polished material 1 is determined from the surface gloss value, and the winding control device 15 and current control device 16 are operated so that the mirror finish can be stably performed.

【0018】図3は、本発明による電解研磨方法の処理
の流れを示す図である。次に、図1,2の装置を用いて
、鋼板表面の連続電解研磨を行い、この際、研磨電流値
の変化による鋼板表面の鏡面仕上げ状態を調べた。図5
は研磨電流値と光沢測定値の対応を示す一実施例であり
、光沢測定値が被電解研磨材の鏡面仕上げ状態を良好に
表現していることが分かる。
FIG. 3 is a diagram showing the processing flow of the electrolytic polishing method according to the present invention. Next, using the apparatus shown in FIGS. 1 and 2, continuous electrolytic polishing was performed on the surface of the steel plate, and at this time, the mirror finish state of the surface of the steel plate was examined due to changes in the polishing current value. Figure 5
This is an example showing the correspondence between the polishing current value and the measured gloss value, and it can be seen that the measured gloss value satisfactorily expresses the mirror finish state of the electrolytically polished material.

【0019】さらに、光沢測定装置7による測定値が電
解研磨中にほぼ一定になるように電流値を制御して操業
を行った。図6は光沢測定の結果に基づいて電流値の制
御を行った場合と行わない場合の比較結果の一例を示す
ものであり、電流値制御を行った電解研磨のほうが常時
安定した鏡面仕上げが達成されていることが分る。
Furthermore, the operation was carried out by controlling the current value so that the value measured by the gloss measuring device 7 remained approximately constant during electrolytic polishing. Figure 6 shows an example of the comparison results between when the current value is controlled and when it is not performed based on the results of gloss measurement. Electrolytic polishing with current value control achieves a consistently stable mirror finish. I can see that it is being done.

【0020】[0020]

【発明の効果】以上説明したように、本発明によれば、
連続的に、かつ工業的に金属ストリップなどの電解研磨
を行う工程において、電解研磨の効果をインプロセスに
て検出、制御することが可能となる。この結果、安定し
た鏡面仕上げを行えるので、製品の表面品質向上、歩留
りアップを実現することができる。
[Effects of the Invention] As explained above, according to the present invention,
In the process of continuously and industrially electropolishing metal strips, etc., it becomes possible to detect and control the effects of electrolytic polishing in-process. As a result, a stable mirror finish can be achieved, thereby improving the surface quality of the product and increasing the yield.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の一実施例を模式的に示した全体説明図
である。
FIG. 1 is an overall explanatory diagram schematically showing an embodiment of the present invention.

【図2】本発明の光沢測定装置の一実施例を模式的に示
したブロック図である。
FIG. 2 is a block diagram schematically showing an embodiment of the gloss measuring device of the present invention.

【図3】本発明による電解研磨方法の処理の流れを示す
図である。
FIG. 3 is a diagram showing the processing flow of the electrolytic polishing method according to the present invention.

【図4】白色光の反射光の強度から被電解研磨材表面の
光沢値を求めた一例を示す図である。
FIG. 4 is a diagram showing an example of determining the gloss value of the surface of the electrolytically polished material from the intensity of reflected white light.

【図5】レーザ光の反射光の強度から被電解研磨材表面
の光沢値を求めた一例を示す図である。
FIG. 5 is a diagram showing an example of determining the gloss value of the surface of the electrolytically polished material from the intensity of the reflected laser beam.

【図6】研磨電流値と光沢測定値の対応を示す一例を示
す図である。
FIG. 6 is a diagram showing an example of the correspondence between polishing current values and gloss measurement values.

【図7】本発明の電解研磨方法による電解研磨の具体的
実施例を示す図である。
FIG. 7 is a diagram showing a specific example of electropolishing by the electropolishing method of the present invention.

【符号の説明】 1    被電解研磨材 1a  鋼板表面 2    酸洗槽 3    第1の洗浄槽 4    電解研磨槽 5    第2の洗浄槽 6    乾燥装置 7    光沢測定装置 8    半導体レーザ 8a  レーザ光 9    第1の光検出器 10    第2の光検出器 11    増幅器 12    演算装置 13    出力装置 14    中央制御装置 15    制御機器 16    電流制御機器[Explanation of symbols] 1 Electrolytically polished material 1a Steel plate surface 2 Pickling tank 3. First cleaning tank 4 Electrolytic polishing tank 5 Second cleaning tank 6 Drying equipment 7 Gloss measurement device 8 Semiconductor laser 8a Laser light 9 First photodetector 10 Second photodetector 11 Amplifier 12 Arithmetic device 13 Output device 14 Central control unit 15 Control equipment 16 Current control equipment

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  金属ストリップなどを連続的に電解研
磨する工程において、電解研磨後の被電解研磨材表面の
光沢値を測定し、該光沢値が所定の値になるようにイン
プロセスにて電解研磨条件を制御することを特徴とする
連続式電解研磨方法。
Claim 1: In the process of continuously electrolytically polishing a metal strip or the like, the gloss value of the surface of the electrolytically polished material after electrolytic polishing is measured, and the electrolysis is performed in-process so that the gloss value becomes a predetermined value. A continuous electrolytic polishing method characterized by controlling polishing conditions.
【請求項2】  金属ストリップなどを連続的に電解研
磨する工程において、電解研磨槽と、電解研磨後の被電
解研磨材表面の斜め方向から白色光あるいはレーザ光を
被電解研磨材表面に投射し、該投射光の反射光の強度を
検出して被電解研磨材表面の光沢値を求める計器と、電
解研磨後の被電解研磨材表面の光沢値が所定の値になる
ように制御する制御装置とを備えていることを特徴とす
る連続式電解研磨装置。
2. In the process of continuously electropolishing a metal strip or the like, white light or laser light is projected onto the surface of the electrolytically polished material from an electrolytic polishing tank and from an oblique direction of the surface of the electrolytically polished material after electropolishing. , an instrument that detects the intensity of the reflected light of the projected light to determine the gloss value of the surface of the electrolytically polished material, and a control device that controls the gloss value of the surface of the electrolytically polished material after electropolishing to a predetermined value. A continuous electropolishing device characterized by comprising:
JP3976491A 1991-03-06 1991-03-06 Method for continuous electropolishing and device therefor Pending JPH04281000A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3976491A JPH04281000A (en) 1991-03-06 1991-03-06 Method for continuous electropolishing and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3976491A JPH04281000A (en) 1991-03-06 1991-03-06 Method for continuous electropolishing and device therefor

Publications (1)

Publication Number Publication Date
JPH04281000A true JPH04281000A (en) 1992-10-06

Family

ID=12562009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3976491A Pending JPH04281000A (en) 1991-03-06 1991-03-06 Method for continuous electropolishing and device therefor

Country Status (1)

Country Link
JP (1) JPH04281000A (en)

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