JPH04221630A - Translucent substrate and its manufacture - Google Patents

Translucent substrate and its manufacture

Info

Publication number
JPH04221630A
JPH04221630A JP2405755A JP40575590A JPH04221630A JP H04221630 A JPH04221630 A JP H04221630A JP 2405755 A JP2405755 A JP 2405755A JP 40575590 A JP40575590 A JP 40575590A JP H04221630 A JPH04221630 A JP H04221630A
Authority
JP
Japan
Prior art keywords
group
monomolecular film
water
light
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2405755A
Other languages
Japanese (ja)
Other versions
JP2506234B2 (en
Inventor
Kazufumi Ogawa
一文 小川
Norihisa Mino
規央 美濃
Sanemori Soga
眞守 曽我
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2405755A priority Critical patent/JP2506234B2/en
Priority to DE1991629145 priority patent/DE69129145T2/en
Priority to EP91122017A priority patent/EP0492545B1/en
Priority to CA002058341A priority patent/CA2058341C/en
Priority to KR1019910024106A priority patent/KR970002941B1/en
Publication of JPH04221630A publication Critical patent/JPH04221630A/en
Priority to US08/431,578 priority patent/US5580605A/en
Priority claimed from US08/431,578 external-priority patent/US5580605A/en
Priority claimed from JP7229102A external-priority patent/JP2690876B2/en
Application granted granted Critical
Publication of JP2506234B2 publication Critical patent/JP2506234B2/en
Priority to US09/570,264 priority patent/US6521334B1/en
Priority to US09/804,854 priority patent/US6503567B2/en
Priority to US10/085,248 priority patent/US20020094375A1/en
Priority to US10/126,835 priority patent/US20020127331A1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE:To improve a stainproof effect, water repellancy and oil repellancy without spoiling essential gloss of translucent glass, by forming carbon fluoride monomolecular film on the surface of the translucent glass having an extremely thin film thickness of a nanometer level. CONSTITUTION:A natural oxide film is formed on the surface of front glass and a large number of hydroxyl groups are contained in the oxidized surface. Therefore, one layer of a chemical adsorption monomolecular film 2 is formed on the surface of the front glass 1 through a siloxane bond under a state where dehydrochloric acid reaction between chlorine of a identicalSiCl group of a substance containing a carbon fluoride group and chlorosilane group and the hydroxyl group is performed and the monomolecular film 2 containing fluorine is bonded chemically to the surface of a glass extended over the whole of the surface of the front glass. In this instance, defogging front glass where one side surface has water repellancy, oil repellancey and stainproof monomolecular film and the other surface has the hydrophilic hydroxyl group, is obtained by removing a hydrophilic film by washing the same with water after completion of adsorption by a method wherein an aqueous solution of polyvinyl alcohol is applied and formed onto the surface, which is desirous of leaving as it is hydrophilic, as an organic solvent-resistant and hydrophilic film.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、透光性基体に関し、さ
らに詳しくは、乗り物のもしくは建物等の窓、乗り物の
フロントガラス、光学レンズ、眼鏡用レンズ等のように
撥水撥油防汚効果が要求される透光性基体に関する。
[Industrial Application Field] The present invention relates to a light-transmitting substrate, and more specifically, it is water-repellent, oil-repellent, stain-resistant, and used in vehicle or building windows, vehicle windshields, optical lenses, eyeglass lenses, etc. This invention relates to a translucent substrate that requires good effects.

【0002】0002

【従来の技術】従来、例えばガラス等の透光性基体の汚
れを防止するためには、表面をできるだけ滑らかにする
方法、表面に例えば弗素系被膜等の保護膜を塗布する方
法等が提案されている。また、透光性基体表面の曇を防
止するには、親水性のポリマーをコートする方法もしく
は透光性基体中あるいは透光性基体表面にヒーターを設
置する方法等が用いられている。
[Prior Art] Conventionally, in order to prevent stains on a transparent substrate such as glass, methods have been proposed to make the surface as smooth as possible, or to coat the surface with a protective film such as a fluorine-based film. ing. Further, in order to prevent the surface of a transparent substrate from becoming cloudy, a method of coating a hydrophilic polymer or a method of installing a heater in or on the surface of a transparent substrate is used.

【0003】0003

【発明が解決しようとする課題】透光性基体の汚れが水
滴に起因する場合には、例えばヒーター設置により曇止
め効果は働く。しかしヒーターの電源が必要であり、又
埋没もしくは表面に設置されたヒーターが透光性基体の
等明度を妨げるという課題があった。また、例えば親水
性のポリマ−等を塗布する手法は比較的簡便であるが、
効果は一時的であり、透光性基体表面を擦ると簡単に親
水性ポリマ−が剥がれてしまう課題があった。
[Problems to be Solved by the Invention] If the stain on the transparent substrate is caused by water droplets, the anti-fogging effect will work, for example, by installing a heater. However, a power source for the heater is required, and there is a problem that the heater, which is buried or installed on the surface, interferes with the uniform brightness of the transparent substrate. In addition, for example, the method of applying a hydrophilic polymer is relatively simple, but
The effect is temporary, and there is a problem that the hydrophilic polymer easily peels off when the surface of the transparent substrate is rubbed.

【0004】汚れの原因が水滴以外の場合には、これら
の手法はほぼ無意味であり、透光性基体の表面に弗素系
被膜の保護膜を塗布する方法が提案されているが、透光
性基体と弗素系保護膜との密着性が弱く簡単に剥がれ、
又弗素系保護膜自体の不透明性で透光性基体が曇るとい
う課題があり、他の保護膜材料では透明性及び密着性は
向上するが、汚れ成分を簡単に拭い取れないという課題
があった。従って、透光性基体の表面をできるだけ滑ら
かにする方法が実用的であるが、滑らかにするには限界
があり、結局積極的に汚れ防止や溌水溌油性処理を施し
た透光性基体はないという課題があった。
[0004] These methods are almost meaningless when the cause of contamination is other than water droplets, and a method has been proposed in which a fluorine-based protective film is applied to the surface of a translucent substrate. The adhesion between the chemical substrate and the fluorine-based protective film is weak and easily peels off.
In addition, the opacity of the fluorine-based protective film itself causes the transparent substrate to become cloudy, and while other protective film materials improve transparency and adhesion, there is the problem that dirt components cannot be easily wiped off. . Therefore, it is practical to make the surface of a translucent substrate as smooth as possible, but there is a limit to how smooth it can be, and in the end, a translucent substrate that has been actively treated to prevent stains or be water and oil repellent is The problem was that there was no.

【0005】本発明の目的は、汚れが付着しないか、例
え付着しても簡単に除去されるような溌水性と防汚効果
の高い透光性基体を提供することにある。
[0005] An object of the present invention is to provide a light-transmitting substrate with high water repellency and antifouling effect so that dirt does not adhere thereto, or even if it does, it is easily removed.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
本発明は、溌水性基を含む化学吸着単分子膜が、少なく
とも一方の表面に形成された透光性基体を提案するもの
である。
[Means for Solving the Problems] In order to solve the above problems, the present invention proposes a light-transmitting substrate in which a chemically adsorbed monomolecular film containing water-repellent groups is formed on at least one surface.

【0007】[0007]

【作用】本発明の透光性基体は、基体表面に形成された
化学吸着単分子膜がナノメータレベルの膜厚できわめて
薄いため、基体本来の透光性を損なうことがない。また
、本発明の化学吸着単分子膜は溌水性を有するため、表
面の防汚効果を高めることが可能である。さらに、透光
性基体の一方の面に溌水性基を有する化学吸着単分子膜
を形成し、透光性基体の他方の面に親水性基を含む化学
吸着単分子膜を形成すると、一方の面は溌水防汚効果と
他方の面には防曇効果を有した透光性基体が提供できる
[Operation] In the light-transmitting substrate of the present invention, the chemically adsorbed monomolecular film formed on the surface of the substrate is extremely thin with a film thickness on the nanometer level, so that the inherent light-transmitting properties of the substrate are not impaired. Moreover, since the chemically adsorbed monomolecular film of the present invention has water repellency, it is possible to enhance the antifouling effect on the surface. Furthermore, if a chemically adsorbed monomolecular film containing water-repellent groups is formed on one surface of a transparent substrate and a chemically adsorbed monomolecular film containing hydrophilic groups is formed on the other surface of the transparent substrate, one A translucent substrate can be provided that has a water-repellent and antifouling effect on one side and an antifogging effect on the other side.

【0008】[0008]

【実施例】一般の透光性基体材料には、ガラスもしくは
プラスティックが供される。基体材料がガラスであると
表面に例えば水酸基のような親水性基を含み、また基体
材料がプラスティック材料でも簡単に酸化処理を行うこ
とで表面を親水性にすることができる。そこで、一端に
反応性シラン基を有する炭素鎖を含む分子を溶解した非
水系有機溶媒に接触すると、表面の親水性基の活性水素
と反応性シラン基とが反応し、含珪素化学結合を介して
単分子膜を形成する。このような反応を化学吸着反応と
言い、このようにして得た単分子膜を化学吸着単分子膜
と言い、化学吸着単分子膜は鏡の実像側表面と強固な化
学結合を介しているため、透光性基体の表面を削り取ら
ない限り一般には剥離しない程度の付着強度を有する。 この分子の他端に撥水性基を含有させると、この溌水性
が汚れ防止効果を引き出す。
EXAMPLE Glass or plastic is used as a general light-transmitting substrate material. When the substrate material is glass, the surface contains a hydrophilic group such as a hydroxyl group, and even if the substrate material is a plastic material, the surface can be made hydrophilic by simple oxidation treatment. Therefore, when a non-aqueous organic solvent in which a molecule containing a carbon chain with a reactive silane group at one end is dissolved, the active hydrogen of the hydrophilic group on the surface reacts with the reactive silane group, and the reaction occurs through silicon-containing chemical bonds. to form a monolayer. This kind of reaction is called a chemisorption reaction, and the monomolecular film obtained in this way is called a chemisorption monomolecular film, because a chemisorption monomolecular film has a strong chemical bond with the real image side surface of the mirror. Generally, the adhesion strength is such that it does not peel off unless the surface of the light-transmitting substrate is scraped off. When a water-repellent group is included at the other end of this molecule, this water-repellent property brings out the stain-preventing effect.

【0009】本発明の透光性基体材料には前述したよう
にガラスを始め、例えばアクリル樹脂、カーボネイト樹
脂等のプラスティックが供されるが、ガラスが最も一般
的であり専ら使用されている。本発明の透光性基体表面
には親水性基が露出している必要があり、親水性基とし
ては水酸基、カルボニル基、アミノ基等の活性水素を有
する基があげられる。透光性基体材料表面に親水性基が
少ない場合には、例えば酸素又は窒素雰囲気中での電子
線照射、イオンビーム照射等通常の手法で親水性化して
供される。
The light-transmitting substrate material of the present invention may include glass as described above, as well as plastics such as acrylic resin and carbonate resin, but glass is the most common and exclusively used. Hydrophilic groups must be exposed on the surface of the light-transmitting substrate of the present invention, and examples of the hydrophilic groups include groups having active hydrogen such as hydroxyl groups, carbonyl groups, and amino groups. When there are few hydrophilic groups on the surface of the light-transmitting substrate material, it is made hydrophilic by a conventional method such as electron beam irradiation or ion beam irradiation in an oxygen or nitrogen atmosphere.

【0010】本発明に供される化学吸着単分子膜の構成
分子としては、一端にクロロシラン(−SiClnX3
−n)基又はアルコキシシラン(−Si(OA)nX3
−n)基を含有し、他端に炭化水素基又は弗素置換した
炭素を含有するシラン系界面活性剤が挙げられる。但し
式中のnは1〜3の整数であり、Xは水素、低級アルキ
ル基又は低級アルコキシ基を表わし、Aは低級アルキル
基を表わす。上記シラン系界面活性剤の内クロルシラン
系界面活性剤は、室温下で化学吸着反応を行え確実に化
学吸着単分子膜が形成できるため好ましい。クロルシラ
ン系界面活性剤の内でもトリクロルシラン基(即ち式中
のnが3)であると、吸着分子間でもシロキサン結合を
介するため好ましい。また、本発明に供されるシラン系
界面活性剤は、吸着分子密度を向上させるには直鎖状が
好ましい。具体的にはCH3−(R)m−SiClnX
3−n、CF3−(CF2)p−(R)m−SiCln
X3−nで表わされるクロルシラン系界面活性剤が好ま
しい。但し式中pは0または整数、mは0または1、R
は炭素数1以上のメチレン基、含ビニレン基の炭素数1
以上のメチレン基、含エチニレン基の炭素数1以上のメ
チレン基、含シリコン原子の炭素数1以上のメチレン基
または含酸素原子の炭素数1以上のメチレン基の何れか
、Xは水素原子、低級アルキル基または低級アルコキシ
基、nは0〜2の整数である。更に具体的には例えばC
H3(CH2)9SiCl3、CH3(CH2)15S
iCl3、CH3CH2O(CH2)15SiCl3、
CH3(CH2)2Si(CH3)2(CH2)15S
iCl3、CF3(CF2)7(CH2)2SiCl3
、CF3CH2O(CH2)15SiCl3、CF3(
CH2)2Si(CH3)2(CH2)15SiCl3
、F(CF2)4(CH2)2Si(CH3)2(CH
2)9SiCl3、CF3COO(CH2)15SiC
l3、CF3(CF2)5(CH2)2SiCl3等が
挙げられる。 又、上記式中のR基がビニレン基またはエチニレン基を
含有すると、触媒、光又は高エネルギー線照射等で不飽
和結合を重合させることにより、分子間に結合が生じよ
り強固な単分子膜となるため好ましい。なお、溌水性基
として含フッ化炭素を用いると溌水効果が大きく又溌油
効果も発揮できるため特に好ましい。
The constituent molecules of the chemically adsorbed monomolecular film used in the present invention include chlorosilane (-SiClnX3) at one end.
-n) group or alkoxysilane (-Si(OA)nX3
-n) group, and a silane surfactant containing a hydrocarbon group or fluorine-substituted carbon at the other end. However, n in the formula is an integer of 1 to 3, X represents hydrogen, a lower alkyl group or a lower alkoxy group, and A represents a lower alkyl group. Among the silane-based surfactants mentioned above, chlorosilane-based surfactants are preferable because they can carry out a chemisorption reaction at room temperature and can reliably form a chemisorption monomolecular film. Among the chlorosilane surfactants, a trichlorosilane group (that is, n in the formula is 3) is preferable because siloxane bonds are formed between adsorbed molecules. Furthermore, the silane surfactant used in the present invention is preferably linear in order to improve the density of adsorbed molecules. Specifically, CH3-(R)m-SiClnX
3-n, CF3-(CF2)p-(R)m-SiCln
A chlorosilane surfactant represented by X3-n is preferred. However, in the formula, p is 0 or an integer, m is 0 or 1, R
is a methylene group with a carbon number of 1 or more, a vinylene-containing group with a carbon number of 1
Any of the above methylene groups, ethynylene-containing methylene groups having 1 or more carbon atoms, silicon-containing methylene groups having 1 or more carbon atoms, or oxygen-containing atoms having 1 or more carbon atoms, X is a hydrogen atom, lower an alkyl group or a lower alkoxy group, n is an integer of 0 to 2; More specifically, for example, C
H3(CH2)9SiCl3, CH3(CH2)15S
iCl3, CH3CH2O(CH2)15SiCl3,
CH3(CH2)2Si(CH3)2(CH2)15S
iCl3, CF3(CF2)7(CH2)2SiCl3
, CF3CH2O(CH2)15SiCl3, CF3(
CH2)2Si(CH3)2(CH2)15SiCl3
, F(CF2)4(CH2)2Si(CH3)2(CH
2) 9SiCl3, CF3COO(CH2)15SiC
13, CF3(CF2)5(CH2)2SiCl3, and the like. In addition, when the R group in the above formula contains a vinylene group or an ethynylene group, the unsaturated bonds are polymerized by a catalyst, light, or high-energy ray irradiation, resulting in intermolecular bonds, resulting in a stronger monomolecular film. Therefore, it is preferable. Note that it is particularly preferable to use a fluorinated carbon as the water-repellent group because it has a large water-repellent effect and can also exhibit an oil-repellent effect.

【0011】本発明の透光性基体の製造方法としては、
予め成形加工した透光性基体が一般的に供される。なお
、特に本発明の透光性基体にクロルシラン系界面活性剤
を用いる場合には、化学吸着単分子膜を形成した後化学
吸着単分子膜を水分に接触させずに洗浄する必要が一般
にはあり、この洗浄工程を経なければ未反応のクロルシ
ラン系界面活性剤が水分と反応し白濁する。
[0011] The method for manufacturing the translucent substrate of the present invention includes:
A preformed translucent substrate is generally provided. In addition, especially when using a chlorosilane surfactant in the light-transmitting substrate of the present invention, it is generally not necessary to wash the chemisorption monomolecular film without contacting it with moisture after forming the chemisorption monomolecular film. If this washing step is not performed, unreacted chlorosilane surfactant reacts with moisture and becomes cloudy.

【0012】また、特に本発明でクロルシラン系界面活
性剤を使用する場合には、界面活性剤と水分との反応性
が高いため、非水系の有機溶剤に溶解させる必要があり
、このような溶剤としては例えばn−ヘキサデカン、ト
ルエン、キシレン、ジシクロヘキシル、四塩化炭素、ク
ロロホルム等が単独又は複数種混合して用いられる。 クロルシラン系以外のシラン系界面活性剤の場合には、
これ以外に例えばメチルアルコ−ルやエチルアルコ−ル
等も適用できる。
In addition, especially when using a chlorosilane surfactant in the present invention, it is necessary to dissolve it in a non-aqueous organic solvent because the surfactant has high reactivity with water. For example, n-hexadecane, toluene, xylene, dicyclohexyl, carbon tetrachloride, chloroform, etc. may be used alone or in combination. In the case of silane-based surfactants other than chlorosilane-based,
In addition to these, for example, methyl alcohol, ethyl alcohol, etc. can also be used.

【0013】さらに、本発明の化学吸着単分子膜は、透
光性基体の一方の面にクロロシリル基を含む物質を接触
させ、その後未反応のクロロシリル基を含む物質を洗浄
し、水と反応させ透光性基体表面にシロール基を有した
単分子膜を形成させ、しかる後フッ化炭素を含有するシ
ラン系界面活性剤を化学吸着させる方法を採用すると、
表面に露出した親水性基が少ない鏡の場合でも、溌水性
基を含むシラン系界面活性剤を高密度に化学吸着するこ
とができるため好ましい。このクロロシリル基を有する
材料としては、例えばSiCl4、SiHCl3、Si
H2Cl2、Cl−(SiCl2O)n−SiCl3、
Hl(R1)3−lSi(R2)nSiClm(R3)
3−m等が挙げられ、一般にはCl−Si結合数が多い
方がシラン系界面活性剤を高密度に化学吸着できるため
好ましい。但し式中nは整数、l及びmは1〜3の整数
、R1及びR3は低級アルキル基、R2は炭素数1以上
のメチレン基である。特に、クロロシリル基を含む物質
としてSiCl4を用いれば、分子が小さく水酸基化に
対する活性も大きいので、鏡表面を均一に親水化する効
果が大きく好ましい。  さらに、本発明の透光性基体
は、一方に面だけを溌水性記を含有する化学吸着単分子
膜を形成し、他面は親水性基を有する化学吸着単分子膜
を形成し、透光性基体の両面で異なる性質を呈する基体
も提供できる。この手法としては例えば、クロロシラン
基を含む物質を透光性基体の両面に化学吸着し、クロロ
シラン基を含む単分子膜を形成し、この単分子膜を水洗
等の手法でシロール基を表面に析出させ、親水性単分子
膜で残しておきたい面に例えばポリビニルアルコ−ルも
しくはプルラン等の水溶性高分子材料の水溶液を塗布し
ておき、しかる後溌水性基を含む化学吸着単分子膜を形
成し、その後水溶性高分子材料を水洗除去する手法等が
ある。
Furthermore, the chemically adsorbed monomolecular film of the present invention can be obtained by contacting one surface of a light-transmitting substrate with a substance containing a chlorosilyl group, and then washing the unreacted substance containing a chlorosilyl group and reacting it with water. By forming a monomolecular film having silole groups on the surface of a transparent substrate and then chemically adsorbing a silane surfactant containing fluorocarbon,
Even in the case of a mirror with few hydrophilic groups exposed on the surface, it is preferable because the silane surfactant containing the water-repellent group can be chemically adsorbed at high density. Examples of materials having this chlorosilyl group include SiCl4, SiHCl3, Si
H2Cl2, Cl-(SiCl2O)n-SiCl3,
Hl(R1)3-lSi(R2)nSiClm(R3)
3-m and the like, and in general, it is preferable that the number of Cl--Si bonds is large because the silane surfactant can be chemically adsorbed at a high density. However, in the formula, n is an integer, l and m are integers of 1 to 3, R1 and R3 are lower alkyl groups, and R2 is a methylene group having 1 or more carbon atoms. In particular, it is preferable to use SiCl4 as the substance containing a chlorosilyl group, since the molecule is small and the activity against hydroxylization is large, so that the effect of uniformly making the mirror surface hydrophilic is large. Furthermore, the light-transmitting substrate of the present invention has a chemically adsorbed monomolecular film containing a water-repellent group formed on only one surface, and a chemically adsorbed monomolecular film containing a hydrophilic group on the other surface. It is also possible to provide a substrate that exhibits different properties on both sides of the substrate. For example, this method involves chemically adsorbing a substance containing chlorosilane groups onto both sides of a transparent substrate to form a monomolecular film containing chlorosilane groups, and washing this monomolecular film with water to precipitate silole groups on the surface. Then, apply an aqueous solution of a water-soluble polymer material such as polyvinyl alcohol or pullulan to the surface to be left with a hydrophilic monolayer, and then form a chemically adsorbed monolayer containing water-repellent groups. However, there is a method in which the water-soluble polymer material is then removed by washing with water.

【0014】なお、本発明の化学吸着単分子膜は、一層
の単分子膜でもよく又単分子累積膜でも良いが、単分子
累積膜の場合には累積層間でも化学結合していることが
要求される。
[0014] The chemically adsorbed monomolecular film of the present invention may be a single layer monomolecular film or a monomolecular cumulative film, but in the case of a monomolecular cumulative film, it is required that there be chemical bonds between the cumulative layers. be done.

【0015】以下に本発明に関する透光性基体材料とし
てガラスを挙げ、代表例として自動車のフロントガラス
を取り上げ順に説明する。
[0015] Glass will be cited as a translucent substrate material relating to the present invention, and an automobile windshield will be taken up as a representative example and explained in order.

【0016】実施例1 まず、加工の終了したフロントガラスを有機溶媒で洗浄
した後、フッ化炭素基及びクロロシラン基を含む物質と
してCF3(CF2)7(CH2)2SiCl3を用い
、非水系の溶媒である80%n−ヘキサデカン、12%
四塩化炭素、8%クロロホルムの混合溶剤に10%の濃
度で溶かした溶液を調整し、フロントガラスを2時間程
度浸漬した。フロントガラス表面には自然酸化膜が形成
されており、その酸化膜表面の水酸基が多数含まれてい
るので、フッ化炭素基及びクロロシラン基を含む物質の
≡SiCl基の塩素と、水酸基とが脱塩酸反応しフロン
トガラス表面全面に亘り(化1)に示す結合が生成され
Example 1 First, after cleaning the processed windshield with an organic solvent, it was washed with a non-aqueous solvent using CF3(CF2)7(CH2)2SiCl3 as a substance containing fluorocarbon groups and chlorosilane groups. 80% n-hexadecane, 12%
A solution was prepared by dissolving carbon tetrachloride and 8% chloroform in a mixed solvent at a concentration of 10%, and the windshield was immersed for about 2 hours. A natural oxide film is formed on the surface of the windshield, and the surface of the oxide film contains many hydroxyl groups. Therefore, the chlorine of the ≡SiCl group of substances containing fluorocarbon groups and chlorosilane groups and the hydroxyl groups are removed. Hydrochloric acid reacts and the bond shown in (Chemical formula 1) is generated over the entire surface of the windshield.

【0017】[0017]

【化1】 フッ素を含む単分子膜2が鏡の表面と化学結合した状態
で、図1に示したようにフロントガラス1表面にシロキ
サン結合を介して化学吸着単分子膜2が一層形成された
。この化学吸着単分子膜2の膜厚は、分子構造からおよ
そ15Åである。なお、単分子膜はきわめて強固に化学
結合しているので、全く剥離することがなかった。
[Chemical 1] With the fluorine-containing monomolecular film 2 chemically bonded to the surface of the mirror, a chemisorbed monomolecular film 2 was formed on the surface of the windshield 1 through siloxane bonds as shown in FIG. . The thickness of this chemically adsorbed monomolecular film 2 is approximately 15 Å from the molecular structure. Note that the monomolecular film had extremely strong chemical bonds, so it did not peel off at all.

【0018】このフロントガラスを用い実使用を試みた
が、処理しないものに比べ汚物の付着を大幅に低減でき
、また例え付着した場合にもブラシ等でこする程度で簡
単に除去できた。また、このとき、フロントガラス1表
面に傷は全く付かなかった。また、油脂分汚れでも除去
は水洗のみで可能であった。
[0018] When we tried to use this windshield in practice, we were able to significantly reduce the adhesion of dirt compared to the untreated one, and even if it did stick, it could be easily removed by rubbing it with a brush or the like. Further, at this time, no scratches were left on the surface of the windshield 1. In addition, oil and fat stains could be removed only by washing with water.

【0019】なお、透光性基体の材質が、アクリル樹脂
やポリカーボネート樹脂等のプラスチックの場合には、
表面を例えば300W10分程度プラズマ処理して表面
を酸化し親水性とすること、および吸着液をフレオン溶
剤に換えることで同様の技術を用いることが可能であつ
た。
Note that if the material of the transparent substrate is plastic such as acrylic resin or polycarbonate resin,
It was possible to use a similar technique by oxidizing the surface to make it hydrophilic by subjecting the surface to plasma treatment at 300 W for 10 minutes, for example, and by replacing the adsorption liquid with a Freon solvent.

【0020】実施例2 親水性ではあるが水酸基を含む割合が少ない例えば表面
を架橋性プラスティックで架橋処理したフロントガラス
などの場合、トリクロロシリル基を含む物質としてSi
Cl4を、非水系溶媒のクロロホルム溶媒に1重量パー
セント溶解した溶液に30分間程度浸漬すると、図2に
示したようにフロントガラス11表面には親水性の水酸
基(OH基)12が多少とも存在するので表面で脱塩酸
反応が生じ、トリクロロシリル基を含む物質のクロロシ
ラン単分子膜が形成された。このようにトリクロロシリ
ル基を含む物質としてSiCl4を用いれば、フロント
ガラス11表面に少量の親水性のOH基12しか存在し
ていなくとも、フロントガラス11表面で脱塩酸反応が
生じ(化2)のように分子が−SiO−結合を介して表
面に固定される。
Example 2 In the case of a windshield that is hydrophilic but contains a small proportion of hydroxyl groups, for example, the surface of which is crosslinked with a crosslinkable plastic, Si is used as a material containing trichlorosilyl groups.
When Cl4 is immersed in a solution of 1% by weight dissolved in chloroform, a non-aqueous solvent, for about 30 minutes, some hydrophilic hydroxyl groups (OH groups) 12 are present on the surface of the windshield 11, as shown in FIG. Therefore, a dehydrochlorination reaction occurred on the surface, and a chlorosilane monomolecular film of a substance containing trichlorosilyl groups was formed. If SiCl4 is used as a substance containing a trichlorosilyl group in this way, even if only a small amount of hydrophilic OH groups 12 are present on the surface of the windshield 11, the dehydrochlorination reaction will occur on the surface of the windshield 11 (Chemical formula 2). As such, molecules are immobilized on the surface via -SiO- bonds.

【0021】[0021]

【化2】 なお、この時一般には未反応のSiCl4もクロロシラ
ン単分子膜上に存在するため、その後、クロロホルムの
非水系の溶媒で洗浄して、さらに水で洗浄すると、フロ
ントガラス11表面の水酸基と未反応のSiCl4分子
は除去され、図3に示したようにフロントガラス11表
面に(化3)等のシロキサン単分子膜13が得られる。
[Chemical formula 2] At this time, unreacted SiCl4 is also present on the chlorosilane monomolecular film, so if it is then washed with a non-aqueous solvent such as chloroform and then with water, the hydroxyl groups on the surface of the windshield 11 are removed. The unreacted SiCl4 molecules are removed, and a siloxane monomolecular film 13 such as (Chemical formula 3) is obtained on the surface of the windshield 11 as shown in FIG.

【0022】[0022]

【化3】 なお、このときできた単分子膜13は、フロントガラス
11表面と−SiO−の化学結合を介して完全に結合さ
れているので剥がれることが全く無い。また、得られた
シロキサン単分子膜13は、表面にSiOH結合を数多
く持つ。当初の水酸基のおよそ3倍程度の数が生成され
る。
[Image Omitted] Note that the monomolecular film 13 formed at this time is completely bonded to the surface of the windshield 11 through the chemical bonds of -SiO-, and therefore will not peel off at all. Moreover, the obtained siloxane monomolecular film 13 has many SiOH bonds on the surface. Approximately three times as many hydroxyl groups as the original hydroxyl groups are generated.

【0023】次に、実施例1で述べた溶液に、この表面
にシロキサン単分子膜13の形成されたフロントガラス
11を1時間程度浸漬すると、シロキサン単分子膜13
表面に(化4)の結合が生成され、図4に示したように
フッ素を含む化学吸着単分子膜14が、下層のシロキサ
ン単分子膜13と化学結合した状態で鏡表面全面に亘り
およそ15Åの膜厚で形成できた。
Next, when the windshield 11 with the siloxane monomolecular film 13 formed on its surface is immersed in the solution described in Example 1 for about one hour, the siloxane monomolecular film 13 is immersed in the solution described in Example 1.
A bond of (Chemical formula 4) is generated on the surface, and as shown in FIG. 4, the chemically adsorbed monomolecular film 14 containing fluorine is chemically bonded to the siloxane monomolecular film 13 below, and a bond of approximately 15 Å is formed over the entire surface of the mirror. It was possible to form a film with a film thickness of .

【0024】[0024]

【化4】 なお、単分子膜は剥離試験を行なっても全く剥離するこ
とがなかった。
[Image Omitted] Note that the monomolecular film did not peel off at all even when a peel test was performed.

【0025】また、本実施例のフロントガラスを用いて
実使用を試みたが、表面の弗素の溌水性の効果で水滴の
付着は全くなく、ワックス成分等の流れを想定してワッ
クスを含んだアセトンを吹き付けたが、やはり表面に化
学吸着した単分子膜中の弗素の溌油性の効果で油は弾か
れ曇ることはなく、また汚れも簡単に拭い取れた。
[0025]Also, actual use was attempted using the windshield of this example, but due to the water-repellent effect of the fluorine on the surface, there was no adhesion of water droplets at all. I sprayed acetone on it, but the oil was repelled by the oil-repellent effect of the fluorine in the monomolecular film that was chemically adsorbed on the surface, so it did not become cloudy, and the dirt was easily wiped off.

【0026】なお、フッ化炭素基及びクロロシラン基を
含む物質を混ぜた非水系の溶媒を用い、単分子膜を化学
吸着する際、防曇効果を付与するため親水性のままで残
したい面に耐有機溶媒性の親水性被膜としてポリビニル
アルコ−ル水溶液を塗布形成ししておくことで、吸着終
了後前記親水性被膜を水洗除去して、図5に示したよう
な一方の表面が撥水撥油防汚性単分子膜14で、他面が
親水性の水酸基を有する単分子膜13のフロントガラス
が得られた。このガラスで防曇効果を確かめたが、親水
性のままで残したガラス面は、全く曇ることがなかった
[0026] When chemically adsorbing a monomolecular film using a non-aqueous solvent containing a substance containing a fluorocarbon group and a chlorosilane group, the surface to be left hydrophilic has an antifogging effect. By applying and forming an aqueous polyvinyl alcohol solution as a hydrophilic film that is resistant to organic solvents, the hydrophilic film can be washed away after adsorption and one surface becomes water repellent as shown in Figure 5. A windshield was obtained in which the oil-repellent and antifouling monomolecular film 14 had a monomolecular film 13 having hydrophilic hydroxyl groups on the other side. The antifogging effect of this glass was confirmed, and the glass surface, which remained hydrophilic, did not fog at all.

【0027】また、実施例1では単分子膜一層の場合、
実施例2ではシロキサン単分子膜一層の後弗素を含むシ
ラン系界面活性剤層を一層累積した場合を示したが、本
発明の化学吸着単分子膜は一層に限らず多層に累積して
もその効果は変化するものではない。
In addition, in Example 1, in the case of a single layer of monomolecular film,
In Example 2, a case was shown in which a single layer of a siloxane monolayer was followed by a layer of a silane-based surfactant containing fluorine. The effect is not variable.

【0028】さらにまた、上記実施例では、含フッ化炭
素クロルシラン系界面活性剤としてCF3(CF2)7
(CH2)2SiCl3を用いたが、CF3−(CF2
)p−(R)m−SiClnX3−nで表わされるクロ
ルシラン系界面活性剤のRの部分に例えばビニレン基(
−CH=CH−)やエチニレン基(−C≡C−)を付加
したり組み込んで置けば、単分子膜形成後5メガラド程
度の電子線照射で架橋できるので、さらに単分子膜の硬
度を向上させることも可能である。
Furthermore, in the above example, CF3(CF2)7 was used as the fluorocarbon chlorosilane surfactant.
(CH2)2SiCl3 was used, but CF3-(CF2
)p-(R)m-SiClnX3-n, for example, a vinylene group (
If -CH=CH-) or ethynylene group (-C≡C-) is added or incorporated, it can be crosslinked by electron beam irradiation of about 5 megarads after monomolecular film formation, further improving the hardness of the monomolecular film. It is also possible to do so.

【0029】なお、フッ化炭素系界面活性剤として上記
のもの以外にもCF3CH2O(CH2)15SiCl
3、CF3(CH2)2Si(CH3)2(CH2)1
5SiCl3、F(CF2)4(CH2)2Si(CH
3)2(CH2)9SiCl3、CF3COO(CH2
)15SiCl3、CF3(CF2)5(CH2)2S
iCl3等のトリクロルシラン系界面活性剤を始め、例
えばCF3CH2O(CH2)15Si(CH3)2C
l、CF3(CH2)2Si(CH3)2(CH2)1
5Si(CH3)2Cl、CF3CH2O(CH2)1
5Si(CH3)Cl2、CF3COO(CH2)15
Si(CH3)2Cl等のクロルシラン系界面活性剤が
利用できた。又CF3(CF2)7(CH2)2Si(
OCH3)3、CF3CH2O(CH2)15Si(O
CH3)3等のアルコキシシラン系界面活性剤も、界面
活性剤溶液を加熱することにより同様の効果が得られた
。CH3(CH2)9SiCl3、CH3(CH2)1
5SiCl3、CH3CH2O(CH2)15SiCl
3、CH3(CH2)2Si(CH3)2(CH2)1
5SiCl3等の炭化水素基を有するクロルシラン系界
面活性剤でも、同様に室温で化学吸着単分子膜が形成さ
れ、溌水性と防汚性の効果が現われた。
In addition to the above-mentioned fluorocarbon surfactants, CF3CH2O(CH2)15SiCl
3, CF3(CH2)2Si(CH3)2(CH2)1
5SiCl3, F(CF2)4(CH2)2Si(CH
3) 2(CH2)9SiCl3, CF3COO(CH2
)15SiCl3, CF3(CF2)5(CH2)2S
Trichlorosilane surfactants such as iCl3, for example CF3CH2O(CH2)15Si(CH3)2C
l, CF3(CH2)2Si(CH3)2(CH2)1
5Si(CH3)2Cl, CF3CH2O(CH2)1
5Si(CH3)Cl2, CF3COO(CH2)15
Chlorosilane surfactants such as Si(CH3)2Cl were available. Also, CF3(CF2)7(CH2)2Si(
OCH3)3, CF3CH2O(CH2)15Si(O
Similar effects were obtained using alkoxysilane surfactants such as CH3)3 by heating the surfactant solution. CH3(CH2)9SiCl3, CH3(CH2)1
5SiCl3, CH3CH2O(CH2)15SiCl
3, CH3(CH2)2Si(CH3)2(CH2)1
Chlorosilane surfactants having a hydrocarbon group such as 5SiCl3 also formed a chemically adsorbed monomolecular film at room temperature, exhibiting water repellency and antifouling properties.

【0030】[0030]

【発明の効果】以上述べてきたように、きわめて薄いナ
ノメータレベルの膜厚のフッ化炭素系単分子膜を透光ガ
ラス表面に形成するため、透光ガラス本来の光沢を損な
うことがない。また、この膜はフッ化炭素系単分子膜は
撥水撥油性にも優れており、表面の防汚効果を高めるこ
とが可能となる。従って、きわめて防汚効果の高い高性
能透光ガラスを提供することができる。さらに内面を親
水化して置くことにより防曇性効果も得られた。
[Effects of the Invention] As described above, since an extremely thin fluorocarbon monomolecular film with a film thickness on the nanometer level is formed on the surface of a light-transmitting glass, the inherent luster of the light-transmitting glass is not impaired. Furthermore, this fluorocarbon monomolecular film has excellent water and oil repellency, making it possible to enhance the antifouling effect on the surface. Therefore, it is possible to provide a high-performance light-transmitting glass with an extremely high antifouling effect. Furthermore, by making the inner surface hydrophilic, an antifogging effect was also obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の透光性基体の一実施例であるフロント
ガラスを分子レベルまで拡大した断面概念図
[Fig. 1] A conceptual cross-sectional diagram of a windshield, which is an example of the translucent substrate of the present invention, enlarged to the molecular level.

【図2】本
発明の透光性基体の他の実施例であるフロントガラスの
表面を分子レベルまで拡大した断面工程概念図
[Fig. 2] A cross-sectional process conceptual diagram showing the surface of a windshield, which is another example of the light-transmitting substrate of the present invention, enlarged to the molecular level.

【図3】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
[Fig. 3] A cross-sectional process conceptual diagram showing the surface of a windshield, which is another example of the light-transmitting substrate of the present invention, enlarged to the molecular level.

【図4】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
[Fig. 4] A cross-sectional process conceptual diagram showing the surface of a windshield, which is another example of the transparent substrate of the present invention, enlarged to the molecular level.

【図5】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面概念図
[Fig. 5] A conceptual cross-sectional view of the surface of a windshield, which is another example of the transparent substrate of the present invention, enlarged to the molecular level.

【符号の説明】[Explanation of symbols]

1  フロントガラス 2  化学吸着単分子膜 11  フロントガラス 12  水酸基 13  シロキサン単分子膜 14  化学吸着単分子膜 1. Windshield 2 Chemisorption monolayer 11 Windshield 12 Hydroxyl group 13 Siloxane monolayer 14 Chemical adsorption monolayer

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】  溌水性基を含む化学吸着単分子膜が、
少なくとも一方の表面に形成されていることを特徴とし
た透光性基体。
[Claim 1] A chemically adsorbed monomolecular film containing a water-repellent group,
A translucent substrate characterized by being formed on at least one surface.
【請求項2】  溌水性基を含む化学吸着単分子膜が、
シロキサン結合を介していることを特徴とした、請求項
1記載の透光性基体。
[Claim 2] A chemically adsorbed monomolecular film containing a water-repellent group,
2. The light-transmitting substrate according to claim 1, wherein the transparent substrate has a siloxane bond.
【請求項3】  溌水性基を含む化学吸着単分子膜が、
少なくともシロキサン系単分子膜を介して表面に形成さ
れていることを特徴とする、請求項2記載の透光性基体
[Claim 3] A chemically adsorbed monomolecular film containing a water-repellent group,
3. The light-transmitting substrate according to claim 2, wherein the transparent substrate is formed on the surface with at least a siloxane-based monomolecular film interposed therebetween.
【請求項4】  片面に溌水性基を含む化学吸着単分子
膜が表面に形成されており、他の面が親水性基を含む化
学吸着単分子膜で被われていることを特徴とした透光性
基体。
4. A transparent material characterized by having a chemically adsorbed monomolecular film containing water-repellent groups formed on its surface on one side, and covered with a chemically adsorbed monomolecular film containing hydrophilic groups on the other side. Photosensitive substrate.
【請求項5】  溌水性基が、含弗素炭化水素基である
ことを特徴とする、請求項1〜4何れかに記載の透光性
基体。
5. The light-transmitting substrate according to claim 1, wherein the water-repellent group is a fluorine-containing hydrocarbon group.
【請求項6】  親水性基が、水酸基であることを特徴
とする、請求項4記載の透光性基体。
6. The light-transmitting substrate according to claim 4, wherein the hydrophilic group is a hydroxyl group.
【請求項7】  成形加工の終了した透光性基体の少な
くとも一方の面に、一端に反応性シラン基を有し、他端
に溌水性基を有するシラン系界面活性剤を溶かした有機
溶媒に前記透光性基体を接触し、前記シラン系界面活性
剤よりなる化学吸着単分子膜を前記透光性基体表面全体
に亘り形成する工程を含むことを特徴とする透光性基体
の製造方法。
7. At least one surface of the transparent substrate that has been molded is coated with an organic solvent containing a silane surfactant having a reactive silane group at one end and a water-repellent group at the other end. A method for producing a light-transmitting substrate, comprising the step of contacting the light-transmitting substrate to form a chemically adsorbed monomolecular film made of the silane surfactant over the entire surface of the light-transmitting substrate.
【請求項8】  成形加工の終了した透光性基体の少な
くとも一方の面に、クロロシリル基を含む物質を混ぜた
非水系溶媒に接触させる接触工程、前記接触工程後前記
透光性基体上の未反応のクロロシリル基を含む物質を非
水系有機溶媒を用い洗浄除去する洗浄工程、前記洗浄工
程後水分と反応させ前記透光性基体上にシロール基を含
む物質よりなる単分子膜を形成するシロール形成工程、
前記シロール形成工程後一端に反応性シラン基を有し他
端に溌水性基を含むシラン系界面活性剤を用い、前記シ
ロール基を含む単分子膜上に化学吸着単分子吸着膜を累
積する化学吸着単分子膜累積工程を含むことを特徴とす
る透光性基体の製造方法。
8. A contacting step in which at least one surface of the transparent substrate that has been molded is brought into contact with a non-aqueous solvent mixed with a substance containing a chlorosilyl group; A cleaning step in which a substance containing a reactive chlorosilyl group is washed away using a non-aqueous organic solvent, and a silole formation step in which a monomolecular film made of a substance containing a silole group is formed on the transparent substrate by reacting with moisture after the washing step. process,
After the silole formation step, a chemical method in which a silane surfactant having a reactive silane group at one end and a water-repellent group at the other end is used to accumulate a chemically adsorbed monomolecular adsorption film on the monomolecular film containing the silole group. A method for producing a translucent substrate, comprising a step of accumulating an adsorbed monolayer.
【請求項9】  シロール形成工程と化学吸着単分子膜
累積工程との間に、透光性基体の一方の面を水溶性被膜
でコートする塗布工程を経ることを特徴とした、請求請
求項8記載の透光性基体の製造方法。
9. Claim 8, further comprising a coating step of coating one surface of the light-transmitting substrate with a water-soluble film between the silole forming step and the chemically adsorbed monomolecular film accumulation step. The method for manufacturing the translucent substrate described above.
【請求項10】  反応性シラン基が、クロロシラン基
であることを特徴とする、請求項7又は8何れかに記載
の透光性基体の製造方法。
10. The method for producing a light-transmitting substrate according to claim 7, wherein the reactive silane group is a chlorosilane group.
【請求項11】  シラン系界面活性剤が、CF3−(
CF2)n−(R)m−SiClpX3−p(nは0ま
たは整数、mは0または1、Rは炭素数1以上のメチレ
ン基、含ビニレン基の炭素数1以上のメチレン基、含エ
チニレン基の炭素数1以上のメチレン基、含シリコン原
子の炭素数1以上のメチレン基または含酸素原子の炭素
数1以上のメチレン基の何れか、Xは水素原子、低級ア
ルキル基または低級アルコキシ基、pは0〜2の整数)
であることを特徴とした、請求請求項7又は8何れかに
記載の透光性基体の製造方法。
Claim 11: The silane surfactant is CF3-(
CF2) n-(R)m-SiClpX3-p (n is 0 or an integer, m is 0 or 1, R is a methylene group having 1 or more carbon atoms, a methylene group having 1 or more carbon atoms in a vinylene-containing group, an ethynylene-containing group a methylene group with 1 or more carbon atoms, a methylene group with 1 or more carbon atoms of a silicon-containing atom, or a methylene group with 1 or more carbon atoms of an oxygen-containing atom, X is a hydrogen atom, a lower alkyl group, or a lower alkoxy group, p is an integer from 0 to 2)
The method for producing a translucent substrate according to claim 7 or 8, characterized in that:
【請求項12】  クロロシリル基を含む物質が、Si
Cl4、SiHCl3、SiH2Cl2、Cl−(Si
Cl2O)n−SiCl3(nは整数)の何れかである
ことを特徴とした、請求請求項8記載の透光性基体の製
造方法。
12. The substance containing a chlorosilyl group is Si
Cl4, SiHCl3, SiH2Cl2, Cl-(Si
9. The method for producing a translucent substrate according to claim 8, wherein the substrate is one of Cl2O)n-SiCl3 (n is an integer).
JP2405755A 1990-12-25 1990-12-25 Method for manufacturing translucent substrate Expired - Lifetime JP2506234B2 (en)

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JP2405755A JP2506234B2 (en) 1990-12-25 1990-12-25 Method for manufacturing translucent substrate
DE1991629145 DE69129145T2 (en) 1990-12-25 1991-12-20 Transparent substrate with applied monomolecular film and process for its production
EP91122017A EP0492545B1 (en) 1990-12-25 1991-12-20 Transparent substrate with monomolecular film thereon and method of manufacturing the same
CA002058341A CA2058341C (en) 1990-12-25 1991-12-23 Transparent substrate and method of manufacturing the same
KR1019910024106A KR970002941B1 (en) 1990-12-25 1991-12-24 Transparent substrate and method of manufacturing the same
US08/431,578 US5580605A (en) 1990-12-25 1995-05-01 Transparent substrate and method of manufacturing the same
US09/570,264 US6521334B1 (en) 1990-12-25 2000-05-12 Transparent substrate and method of manufacturing the same
US09/804,854 US6503567B2 (en) 1990-12-25 2001-03-13 Transparent substrate and method of manufacturing the same
US10/085,248 US20020094375A1 (en) 1990-12-25 2002-02-26 Transparent substrate and method of manufacturing the same
US10/126,835 US20020127331A1 (en) 1990-12-25 2002-04-19 Transparent substrate and method of manufacturing the same

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Application Number Priority Date Filing Date Title
JP2405755A JP2506234B2 (en) 1990-12-25 1990-12-25 Method for manufacturing translucent substrate
US08/431,578 US5580605A (en) 1990-12-25 1995-05-01 Transparent substrate and method of manufacturing the same
JP7229102A JP2690876B2 (en) 1995-05-01 1995-09-06 Translucent substrate

Related Child Applications (1)

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JP7229102A Division JP2690876B2 (en) 1990-12-25 1995-09-06 Translucent substrate

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS559652A (en) * 1978-07-05 1980-01-23 Dainichi Nippon Cables Ltd Water repellent

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