JPH04204656A - Negative type photosensitive composition and formation of color filter using same - Google Patents

Abstract

PURPOSE:To avoid deterioration with time lapse due to alkali metal atoms contained in natural substances and to obtain the negative type photosensitive composition to be used for the color separation filter by mixing an aqueous solution of a copolymer having a specified dye group with an aqueous solution of a diazo resin. CONSTITUTION:This negative type photosensitive composition is prepared by dissolving in water the water-soluble diazo resin and the copolymer having a weight average molecular weight of 500-100000 and comprising 5-20% acrylic monomer units, 45-55% 2-hydroxyethyl acrylate monomer units, 20-30% methacrylamide nonomer units, and 5-20% benzyl methacrylate monomer units and one of oxypolybasic acids. The color filter is formed by coating a substrate with this composition, exposing it to ultraviolet rays, eluting the unexposed parts only with water to form a pattern, and dyeing it with a water-soluble dye. This photosensitive composition can be used also as a photoresist to be used for processing a shadow mask and a lead frame requiring a plate making process to be processed only with water.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a negative-working photosensitive composition and a method for forming filters used for color separation in color solid-state image carriers and liquid crystal display devices. This article relates to a method for creating a color filter using the same.

[Prior art and its problems] Color separation filters (hereinafter referred to as color filters) developed for color video cameras in the 1960s
Currently, practical use is underway for two methods: bonding with a photodiode and on-chip method forming directly on a photodiode.

The size of a color filter for a video camera is
Most are red, green, and blue (R, G, E) at an angle of respiration of 10 mm.
Alternatively, the number of pixels of three complementary colors is 10,000 or more, and it is manufactured using photolithography.

Specifically, a water-soluble photosensitive solution made by imparting photosensitivity to natural proteins such as casein and gelatin with ammonium dichromate is applied onto a substrate, dried, and the coating film is pattern-exposed by irradiating ultraviolet rays. part is eluted with water to form a dot,
Color filters are manufactured by dyeing the formed dots with water-soluble dyes.

Color filters for color liquid crystal displays (LCDs) are made using this dyeing method to increase their size.

Currently, it is common to have 100,000 or more RGB pixels of 200 to 300 μm square. The driving method is TFT, MI
M and STN, but due to the manufacturing process and larger panel sizes, the color filters used for these are required to have better properties than before, such as heat resistance, light resistance, and solvent resistance. .

For this purpose, dyeing methods are still the mainstream, but pigment dispersion methods, dye dispersion methods, printing methods, electrodeposition methods, interference methods, electrodeposition transfer methods, etc. have been developed and are being put into practical use in some areas.

In the mainstream dyeing method, the photosensitive resin that forms the relief pattern is made of natural proteins such as casein, gelatin, and fish glue, and dichromates such as ammonium dichromate, cerium dichromate, and sodium dichromate. added is used. These compositions are
It is mainly composed of natural polymers, and although the concentration of functional groups such as amine groups involved in dyeing and the molecular weight distribution have been stabilized to a certain extent through the efforts of manufacturers, it may deteriorate due to long-term storage and may be harmful to the human body as a photohardening agent. It has drawbacks such as the use of harmful ROM compounds. Furthermore, it contains several tens of ppm of alkali metal elements (Na, Ca, K, etc.), and because these alkali metal ions diffuse, the dark voltage of the solid-state imager increases even though passivation is provided with a protective film. It is believed that this is one of the causes of deterioration over time.

However, the mainstream dyeing method uses a water-soluble photosensitive liquid and uses water-based pattern exposure, which has the advantage of not having to worry about toxicity, odor, or flammability caused by solvents, which is not available in conventional semiconductor manufacturing lines. ing.

A number of patents have been proposed that take advantage of these advantages and solve problems.

JP-A-58-199342 discloses a copolymer using 2-hydroxyethyl methacrylate and a nitrogen-containing acrylic ester such as N,N-dimethylaminopropyl methacrylate or its methyl chloride, and a diazo compound as a photocrosslinking agent. A photosensitive composition containing an azide compound or an azide compound is described. 2-hydroxyethyl methacrylate 50%, dimethylaminopropyl methacrylate 40%
% and 10% methacrylamide, all the functional groups have high hydrophilicity, so the relief pattern formed by exposure is rounded and fills lines and spaces of 5μ or less, making it difficult to understand. I can't image it. Also, as the amount of dimethylaminopropyl methacrylate is reduced, the roundness disappears to some extent, but the roundness cannot essentially be eliminated.We tried to improve the resolution by further increasing the average molecular weight, but 2- The gel content due to hydroxyethyl methacrylate increased and the filterability deteriorated, and no significant improvement in resolution could be expected.

These copolymers are obtained by polymerizing in methyl cellosolve, pouring into cyclohexane, and separating and drying the copolymer, but due to their high hydrophilicity, hydrogen bonds occur during drying, resulting in a partial dehydration reaction. It often becomes water-insoluble, perhaps because crosslinking occurs upon reaction. In addition, the adjustment of the photosensitive solution by adding acetic acid and the phenomenon caused by acetic acid water make the room smell like acetic acid.

In Japanese Patent Publication No. 54-12331, acrylamide,
Ammonium methacrylate, ethyl acrylate, 6 parts of a water-soluble unsaturated polymer obtained by adding glycidyl methacrylate to a 2-hydroxyethyl acrylate copolymer, 0.4 part of anthraquinone-β-sulfonic acid sodium, 4,4'-diazide Stilbene-2,2'-disulfonic acid sorter 0.0
A water-soluble photosensitive liquid was prepared by dissolving 5 parts of trimethylphosphine and 0.06 parts of trimethylphosphine in 94 parts of water. It is described that this photosensitive solution is applied to a substrate, a negative film is brought into close contact with the substrate, and after exposure to 111 g of ultraviolet light, the unexposed areas are eluted with wood alone and developed. According to this, environmental pollution caused by hexavalent chromium is eliminated, but it is difficult to dye with the acidic dye aqueous solution used in the dyeing solution of color filters. Furthermore, due to insufficient crosslinking by the photosensitive agent, the 10 μm line and space is filled with run-off during development.

JP-A-58-204042 discloses a copolymer consisting of 15 g of vinylpyrrolidone and 77.5 g of 3-methacryloxypropyltrimethylammonium chloride, 4
4'-Diazidostilbene 2,2'-disulfonic acid 0,
Dissolve 9g in water 100+nj2 to make a photosensitive composition with dyeing properties, and apply it to a film thickness of 0.5μ on a substrate.
Heat treatment was performed at 130°C for 50 minutes. After that, UV irradiation was performed through a predetermined mask, and the product was developed with water to a pH of 7.
It is described that a color filter is created by dyeing with Q acidic dye water. The film is thin and dyes well in the dyeing bath, but
It is difficult to control the yellow, cyan, and macenda colors because they are too dyed. Furthermore, the combination of a copolymer consisting of vinyl, lolidone, and 3-methacryloxypropyltrimethylammonium chloride and an azide compound is easily soluble in water and has no resolution, and since the amount of the azide compound added is large, it is difficult to heat it at 200°C. It is not possible to make a practical color filter because the color develops and the light transmittance in the visible region decreases.

JP-A-59-116651 discloses that the degree of saponification is 87%.
, 2 mol% of stilbenzenesulfonic acid ammonium salt in partially saponified polyvinyl alcohol with a polymerization degree of 2 (100)
After dissolving the introduced resist with water to prepare a 5% resist solution, a resist film with a thickness of 1.0 μm was formed by spin coating on the solid-state image sensor or transparent support layer, and exposed to ultraviolet light through a mask. , describes that a color filter is created by immersing it in pure water for 30 seconds, developing it, patterning it, and then dyeing it in a basic dye bath at 60°C.

This photosensitive layer using polyvinyl alcohol as a binder has poor heat resistance, and when heated to 180 to 200°C, the light transmittance in the visible region decreases to 70% or less.

JP-A-59-155412 discloses N-vinyl-2
- 1 g of a copolymer consisting of 30.0 g of pyrrolidinone, 1 g of 2-hydroxy-3-methacryloxypropyltrimethylammonium chloride IO, 15.0 g of methyl meccrylate and 4°4'-diazidostilbene-2
, prepare a photosensitive resin solution by dissolving 5 mg of sodium 2'-disulfonate in water, apply it on a transparent substrate, expose it to ultraviolet light (4.5 mw/cmz x 5 seconds) through a mask, and remove the unexposed areas. is developed with water to form a pattern. Next, a part of the red filter was formed by immersing it in a water-soluble dyeing bath containing 1.0% Suminol Milling Red G and 2.0% acetic acid at 25°C for 4 minutes, and a methyl methacrylate polymer, which is an intermediate film, was placed on top using a spinner. After applying the above photosensitive resin solution again and patterning, Suminol Milling, Brilliant Green 6G 2%, Acetic acid 2.0%
It is described that a part of the green filter is formed by immersing it in a water-soluble dyeing bath at 25°C for 6 minutes, and then a part of the blue filter is formed by repeating the above operation to create an on-chip color separation filter. However, since dyeing can be done at room temperature, it is difficult to control the color density, and the dyed area tends to swell, making cracks more likely to occur. In addition, the relief obtained by water development is rounded, making it impossible to resolve lines and spaces of 3 μm.

JP-A-62-109040 and JP-A-63-1
No. 33148 uses polyvinyl alcohol having a stilbazolium group as a binder for a colored photosensitive resin composition, but it has no heat resistance and the light transmittance in the visible region decreases when heated at 180 to 200°C.

JP-A-57-168248 discloses that acrylamide and diacetone acrylamide (for example, N-(1,1-
A photosensitive solution in which 2 to 10% of a diazo resin is added to a copolymer of dimethyl-3-oxbutyl acrylamide is disclosed, but since it is disclosed for use in the fields of plate making, printing, and drafting, Not suitable for creating color filters that require high resolution. Furthermore, since there is a problem that dyeing cannot be done at a high concentration depending on the type of dye, JP-A-1-282504 discloses a method using acrylamide with an average molecular weight of 110,000 and N-(1,1-dimethyl-3-oxobutyl)acrylamide (mole ratio 5). : 1) Mixing diazo resin in the copolymer in an amount of 10% or more based on the water-soluble polymer
Although the resolution is less than μ, the dyeing density is low, so it is described that after pattern formation, the pattern is immersed in an aqueous chromic acid anhydride solution and then dyed with a water-soluble dye. Mixing diazo resin in an amount of 10% or more with respect to the water-soluble polymer is prohibited under 18.
When heated at 0 to 200°C, the light transmittance in the visible region decreases, making it impossible to create a good color filter.

Others: JP-A-63-100443, JP-A-62-2
No. 83339, JP-A-2-138802, JP-A-1-
No. 200353, JP-A-1-128064, JP-A-2
-96704, Japanese Unexamined Patent Publication No. 62-209503, and many others. For these, a photosensitive composition for color filters is prepared by dissolving a copolymer with a dyeing group and an azide compound in an organic solvent, and the unexposed areas are coated on a substrate and exposed to ultraviolet light through a mask. It is described that a color filter is created by developing and patterning with a developer containing an organic solvent or water as a main component, and then dyeing with a water-soluble dye. Of course, the toxicity, odor, and flammability of organic solvents are problems, but the use of developing solutions containing such organic solvents also increases the swelling of the photosensitive layer, making it difficult to obtain resolutions below 3μ. The reality is that it is difficult.

[Problems to be Solved by the Invention] A water-soluble photosensitive solution in which natural proteins such as casein and gelatin are made photosensitized with ammonium dichromate has good resolution. As for casein, it has become possible to resolve lines and spaces of 2μ using the i1B stepper.As for the staining properties, it has become possible to resolve such natural proteins, although this may be due to training. Dye was also found,
Currently, it is the mainstream in the production of color filters.

However, since it is a protein, it is easily degraded by microorganisms such as bacteria, and it is also easily deteriorated by proteolytic enzymes or waste products secreted by microorganisms. Furthermore, weakly alkaline colloid solutions such as gelatin and casein,
Although colloids tend to aggregate during storage and are unstable,
It is also becoming clear that removing this agglomerate by storing it in the refrigerator and filtering it before use can solve the problem.

Gelatin, casein, etc., which are natural proteins, contain metals such as sodium, potassium, calcium, magnesium, iron, and copper, and it was extremely difficult to remove these, but thanks to the efforts of manufacturers, Although it is becoming less common, it is extremely difficult to completely eliminate it. Although passivation is applied, when used in solid-state image elements and liquid crystal displays at semiconductor production sites, these metals diffuse into solid-state image elements and liquid crystals.
It is easy to suspect that it may cause malfunction or failure.

Water-soluble photosensitive solutions containing natural proteins and dichromates are becoming easier to use thanks to the efforts of manufacturers.

In addition, although the treatment of hexavalent chromium has become easier and the problem is being solved to some extent, the toxicity of hexavalent chromium has not disappeared, and it is difficult to bring photosensitive liquids containing metals into semiconductor production sites. This in itself leads to a downgrading of the image.

[Means for Solving the Problems] As a result of intensive research to solve these problems, the present inventors found that a water-soluble diazo resin with a weight average molecular weight of 5.
The following general formula in the range of 000 to 100,000: (wherein, R1 represents a hydrogen atom or CH, and R2 and R
3 independently represents an alkyl group or an allyl group such as CH3, C2H5, C6H*, and n represents 1-10. )
Acrylic monomers 5 to 20 responsible for the dyeing group represented by
% (preparation weight %), a copolymer consisting of 45 to 55% of 2-hydroxyethyl methacrylate, 20 to 30% of meccrylamide, and 5 to 20% of benzyl methacrylate and oxypolybasic acids were dissolved in water. A negative photosensitive composition was completed.

The present invention also relates to a method for producing a color filter, in which the negative photosensitive composition is applied onto a substrate, exposed to ultraviolet rays, unexposed areas are eluted with water alone to form a pattern, and then dyed with a water-soluble dye. .

The water-soluble diazo resin used in the present invention can be produced, for example, by the following method.

Dissolve zinc chloride or sulfate double salts of 4-diazodiphenylamine and 3-methoxy-4-diazodiphenylamine in a mixed solution of concentrated sulfuric acid or concentrated phosphoric acid while cooling. 8. Add rose formaldehyde to the diazo compound while stirring.
Add 1.1 mol % and carry out linearization reaction at 5 to 6°C for 3 hours. The reaction solution is poured into isopropyl alcohol to cause precipitation.

Re-precipitation purification with water-isopropyl alcohol (to produce a diazo resin sulfate or a mixed salt of sulfuric acid and phosphate with less metal Na and K).

The ultraviolet absorption spectrum of this water-soluble diazo resin extends from the deep ultraviolet region to the visible region of 500 nm, with a maximum absorption peak at 375 nm. Therefore, in terms of sensitivity and resolution, the exposure equipment for photocuring is better than a G-line stepper.
It is clear that it is advantageous to use a line stepper. The amount of water-soluble diazo resin added is 5 to 15% based on the copolymer, considering the decrease in light transmittance in the visible range during heating.
A range of is preferred.

Suitable examples of the acrylic monomer responsible for the dyeing group represented by the general formula used as a structural unit of the copolymer of the present invention include N,N-dimethylaminoethyl methacrylate, N,N-dimethylamino Examples include propyl methacrylate, diethylaminoethyl acrylate, N,N-dipropylaminoethyl methacrylate, N,N-dimethylaminohexyl methacrylate, N-methyl-N-pendylethyl meccrylate, etc., and the amount used is If it is too small, the dyeability of the resin layer will be insufficient, and if it is too large, the photocurability of the copolymer will be insufficient, so it is preferable that the charged weight is in the range of 5 to 20% of the copolymer. It has a large number of alkyl and allyl groups (indeed, it tends to swell less in the dye solution and is less prone to cracking).

2-hydroxymethacrylate, which is a constituent unit of the copolymer, increases the adhesion to the substrate and at the same time promotes the photocrosslinking reaction. If the amount used is too small, the photocurability will be insufficient, and if it is too large, gels will occur frequently during the production of the copolymer, so the charged weight is preferably in the range of 45 to 55%.

Methacrylamide, which is a structural unit of the copolymer, is essential for dissolving the photosensitive composition of the present invention with only water and eluating (developing) unexposed areas with only water. If the amount used is too small, water development will not be possible, and if too much, the swelling will be severe and the resolution will be lowered, so the weight of the preparation is preferably in the range of 20 to 30%.

Furthermore, benzyl methacrylate, which is a constituent unit of the copolymer, is copolymerized to suppress swelling during water development and to control excessive dyeing. If the amount used is too large, the gel content of the copolymer will increase, making filtration difficult.6 The charged weight is preferably in the range of 5 to 25%. Benzyl methacrylate, like methyl methacrylate, butyl acrylate, and styrene, contributes to imparting hydrophobicity to the copolymer, but even if monomers imparting hydrophobicity other than benzyl methacrylate are copolymerized, the It became impossible to develop it, and it was not possible to control it by dyeing.

In the copolymer of the present invention, each acrylic monomer is dissolved in ethylene glycol monomethyl ether (methyl cellosolve).
0 to 40%, add azobisisobutyronitrile as a polymerization initiator in the range of 0.1 to 1% based on the monomer, and conduct the polymerization reaction at 80°C for 4 to 6 hours under nitrogen purge. The copolymer of the present invention has a weight average molecular weight of 5. The copolymer of the present invention has a weight average molecular weight of 5.
The range is preferably from 000 to 100,000.

If the weight average molecular weight is too large than 100,000, it may be difficult to dissolve in water and become cloudy, making it impossible to filter. If necessary,
In order to improve the light resistance of the copolymer of the present invention, the reactivity of 2-hydroxy-4-(2-methacryloxyethoxy)benzophenone and 1,2,2,6,6-pankmethyl-4-piperidyl methacrylate, etc. A few percent of the ultraviolet absorber may be copolymerized.

The oxypolybasic acids used in the present invention serve as an aid for dissolving the copolymer of the present invention in water. Malic acid, tartaric acid, citric acid, etc., which do not emit an odor at room temperature like acetic acid, are used. The amount used is 5 to 15% based on the copolymer of the present invention.
A range of % is preferred.

The photosensitive composition for color filters of the present invention is prepared by dissolving a copolymer oxypolybasic acid in purified water, and adding a surfactant, an antifoaming agent, a preservative, etc. to prevent uneven coating, if necessary. On the other hand, the water-soluble diazo resin is separately dissolved in purified water in a range of 5 to 15% based on the copolymer, and the final filtration is carried out using a filter with 0.2μ pores. It is preferable to filter it using a filter having pores of 0.2U, and mix it with the copolymer aqueous solution before use.

The photosensitive composition of the present invention prepared under the above conditions is applied onto a substrate such as a solid-state image sensor or a liquid crystal display device by roll coating, spin cord, spray coating, etc., and after drying, it is photocured through an original mask. be done. The unexposed areas can be removed with water to create a relief pattern.

The dyes used to dye the photosensitive resin of the present invention include Lanazol Blue 8G (manufactured by Ciba Geigy), Sumilite Splat, Brilliant Blue G, Sumifix Star Kiss Blue-X, Suminol Fast Red G, Suminol Milling Brilliant Red 4BS, Suminol Milling Yellow MR, Suminol Fast Yellow G (manufactured by Suminol Chemical Co., Ltd.), Kayanol Cyanine G
, Kayanol Yellow MSG, Kayanol Milling Red RS (manufactured by Nippon Kayaku Co., Ltd.), and the dyeing conditions include the dye, dyeing temperature, and time depending on the required spectral density.

Furthermore, the photosensitive composition of the present invention can also be applied as a photoresist for use in processing shadow masks and lead frames due to the nature of the plate-making process, which involves processing using only water.

[Example] Next, the present invention will be described in detail by giving Examples and Comparative Examples, but the present invention is not limited thereto.

Example 1 A monomer solvent and a polymerization initiator were charged in a 300 mβ round bottom flask in the following weight ratios, mixed and dissolved while blowing nitrogen gas, heated to 80° C., and stirred for 5 hours to polymerize. The polymerization solution was added dropwise to a large amount of ethyl acetate for precipitation purification and vacuum drying. 46 g of copolymer was obtained.

2-Hydroxyethyl meccrylate 50g (HEMAI
Dimethylaminoethyl methacrylate 15g (DMAEM
AI Methylmethacrylamide 25g fMAA)
Benzyl methacrylate 10 g FBZ) Azobisisobutyronitrile 0.2 g fAIBN) Methyl cellosolve 200 g This copolymer has a weight average molecular weight fMw) = 26950 and a number average molecular weight (Mn)
= 6650. 12 g of this copolymer and 1.2 g of citric acid were stirred and dissolved in 88 g of purified water, filtered through filter paper, filtered through a filter with 1μ pores, filtered through a filter with 0.45μ pores, and finally filtered with 0.2μ pores. Filtered using a Teflon filter with pores.

Separately, 1.2 g of diazo resin having elemental analysis values of 47.1% carbon, 3.9% hydrogen, 14.1% nitrogen, 7.6% sulfur, and 0.34% phosphorus was dissolved in 20 g of purified water, and filter paper After filtration,
Filtered using a Teflon filter with 0.2μ pores.

A copolymer aqueous solution and a diazo resin aqueous solution were mixed to prepare an odorless water-soluble photosensitive liquid. This photosensitive solution was spin-coated onto a silicon wafer using a spinner at 150° rpm, and dried by heating at 80°C for 5 minutes on a hot plate to a film thickness of 1.0 μm.
A coating of m was obtained. Reduction projection exposure device D through the mask
SW-6500A (G line stepper manufactured by GCA, N
A = 0.301.5 seconds exposure (approximately 600 mj/cm
2) L/, immersed in purified water for 60 seconds, developed, rinsed with ethanol for 30 seconds, and dried to form a pattern. Although the relief pattern was somewhat rounded, lines and spaces with a minimum line width of 3 μm were resolved.

After heating and drying on a hot plate at 130°C for 10 minutes, DFCOI-10 (cyan color staining solution for color filters sold by Fuji Pharmaceutical Co., Ltd.) was heated to 70°C.
After being immersed for 0 minutes, it was washed with water and dried at 100°C for 10 minutes to form a cyan colored color filter. Next, 3 coats of FVR-10 (Fuji Pharmaceutical Co., Ltd.'s acrylic transparent photosensitive resin for color filters) was applied as a resisting layer.
The coating was spin-coated at 0.000 rpm and heat treated at 150° C. for 30 minutes to obtain a dry intermediate protective coating with a thickness of 0.6 μm. Next, the dyed photosensitive solution for color filters prepared above was applied in the same manner and dried by heating to obtain a film having a thickness of 1.0 μm. After exposure through a mask, the pattern was developed by immersion in purified water for 60 seconds, rinsed with ethanol for 30 seconds, and dried to form a pattern. The relief pattern had good adhesion even on the intermediate protective film and resolved lines and spaces of <3 μm. 1
After heating and drying on a hot plate at 30°C for 10 minutes,
DFYOI-10 (yellow color) was immersed for 10 minutes in Rakuten heated to 70°C, washed with water, and dried at 100°C for 10 minutes to form a color filter dyed yellow. An intermediate protective film having a thickness of 0.6 u was obtained using FVR-10 again in the same manner as above. Further, the color filter dyeing photosensitive solution prepared above was applied and dried in the same manner to obtain a film having a thickness of 1.0 μm. After exposure in the same manner through a mask, it was immersed in purified water for 60 seconds, developed, and then rinsed with ethanol for 3D seconds and dried to form a pattern. The relief pattern has a minimum line width of 3u, which provides good adhesion even with some steps.
It resolved the lines and spaces of m. 130°C
After heating and drying for IO minutes, DFMOI-10 (magenta color) was immersed in a liquid heated to 70°C for 10 minutes, washed with water, and dried at 100°C for 10 minutes to form a color filter dyed magenta. .

As shown in the figure, these complementary color filters exhibited the same spectral transmittance curve as that of the complementary color filter formed using a casein-ammonium dichromate photosensitive solution.

Examples 2 to 6 Comparative Examples 1 to 5 Using the same formulation as in Example 1, resins having the compositions shown in Tables 1 and 2 were polymerized and evaluated.

【Effect of the invention〕

As described above, by using the negative photosensitive composition of the present invention and the method for producing a color filter using the same, not only has the color filter manufacturing process become pollution-free, but also the alkali metals contained in natural products have been realized. The present invention has achieved freedom from the causes of elemental deterioration over time, and makes a significant contribution to the production of color separation filters used in color solid-state image sensors and liquid crystal display devices.

[Brief explanation of the drawing]

The figure is a graph showing the spectral transmittance curve of the complementary color filter obtained in Example 1. Patent applicant: Fuji Pharmaceutical Co., Ltd. (2 idiots)

Claims (2)

[Claims] (1) Water-soluble diazo resin and weight average molecular weight of 5000~
The following general formula in the range of 100,000: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_1 represents a hydrogen atom or CH_3, R_2
and R_3 are CH_3, C_2H_5,
It represents an alkyl group or an allyl group such as C_6H_5, and n represents 1 to 10. ) 5 to 20% of the monomer shown in 2-
A negative photosensitive composition characterized in that a copolymer consisting of 45 to 55% of hydroxyethyl methacrylate, 20 to 30% of methacrylamide, and 5 to 20% of benzyl methacrylate and an oxypolybasic acid are dissolved in water. (2) The negative photosensitive composition according to claim 1 is applied onto a substrate, and after exposure to ultraviolet rays, unexposed areas are eluted with water alone to form a pattern, and then dyed with a water-soluble dye. How to create distinctive color filters.