JPH04204401A - Diffraction optical element - Google Patents

Diffraction optical element

Info

Publication number
JPH04204401A
JPH04204401A JP33508790A JP33508790A JPH04204401A JP H04204401 A JPH04204401 A JP H04204401A JP 33508790 A JP33508790 A JP 33508790A JP 33508790 A JP33508790 A JP 33508790A JP H04204401 A JPH04204401 A JP H04204401A
Authority
JP
Japan
Prior art keywords
optical element
layer
grating
reflection layer
diffractive optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33508790A
Other languages
Japanese (ja)
Inventor
Teruhiro Shiono
照弘 塩野
Kuni Ogawa
小川 久仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP33508790A priority Critical patent/JPH04204401A/en
Priority to US07/731,850 priority patent/US5138495A/en
Priority to EP91112251A priority patent/EP0468410B1/en
Priority to DE69103707T priority patent/DE69103707T2/en
Publication of JPH04204401A publication Critical patent/JPH04204401A/en
Pending legal-status Critical Current

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  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To obtain a diffraction optical element of a reflection type with a surface being hard to scar, little deterioration in reflectivity and good environmental resistance by providing a reflection layer and a protective layer on a grating zone. CONSTITUTION:An optical element part 9 is provided with a multiple number of grating zones 7 formed on a substrate 1, the reflection layer 6 provided on the grating zone 7, and the protective layer 5 installed on the reflective layer 6. Incident light 2 is made incident from the side of substrate 1 in opposite to the side of the reflection layer 6, is made into condensed emitted light 3 by having its optical axis folded, and is condensed to a focus 4. By providing the protective layer 5 on the reflection layer 6, the surface of the reflection layer 6 is made hard to be scarred, and at the same time, by preventing oxidization of the reflection layer 6, the diffraction optical element with environmental resistance is obtained. Thus, the diffraction optical element with superior environmental resistance can be realized.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、回折形の光学素子に関するものである。[Detailed description of the invention] Industrial applications The present invention relates to a diffractive optical element.

従来の技術 回折形の光学素子(以下回折光学素子という)は、グレ
ーティング構造であるため、たかだか数μmの膜厚て集
光作用を有し、超小形軽蝋化が可能となるため、近時重
要な光学素子として注目されている。
Conventional technology Diffractive optical elements (hereinafter referred to as diffractive optical elements) have a grating structure, so they have a light-concentrating effect with a film thickness of several μm at most, and they can be made into ultra-small and light-waxed materials. It is attracting attention as an important optical element.

従来の回折光学素子としては、第2図に示す反射形レン
ズがあった(例えば、■、ジオ八へ、 49カーワ、 
 K、  tフネ、 ■、 ミ月 (T、 5hlO1
+0+  M、 にitagawa、  K。
Conventional diffractive optical elements include the reflective lenses shown in Figure 2 (for example, ■, Geo8, 49 Kawa,
K, t Fune, ■, Mizuki (T, 5hlO1
+0+ M, Itagawa, K.

5eLsune  and  T、  Mitsuyu
): ”リルクシ3ノマイク叶フしネ11しシス−?シ
トー t−ヤ 1−ス イン ?ノ インiクーレイテ
ィト フォーカス七ン雫〜(Reflection m
1cro−Fresnellenses and th
eiruse  in  an  integrate
d  focussensor)” Yフ0ライビt7
’ティ92  (Appl、  opt、、)、  V
ol、Ill、  Jio  15.  pp。
5eLsune and T, Mitsuyu
): "Reflection m
1cro-Fresnellenses and th
eiruse in an integrated
d focus sensor)” Y fly t7
'Ti92 (Appl, opt,,), V
ol, Ill, Jio 15. pp.

3434−3442 (1989)参照)。同図(a)
はその反射形レンズの平面図、同図(b)は断面図であ
る。
3434-3442 (1989)). Figure (a)
1 is a plan view of the reflective lens, and FIG. 3B is a sectional view.

同図において、基板l上に、断面が鋸歯形状のグレーテ
ィングゾーン7を同心円状に複数個設け、そのゾーン7
七に反射層6を設け、光学素子部lOを構成している。
In the figure, a plurality of grating zones 7 each having a sawtooth cross section are provided concentrically on a substrate l, and the zones 7
7, a reflective layer 6 is provided to constitute an optical element section IO.

なお、2は入射光、3は集光出射光、4は焦点、8は空
気を示す。
Note that 2 represents incident light, 3 represents condensed and emitted light, 4 represents a focal point, and 8 represents air.

発明が解決しようとする課題 しかしながら、第2図に示した従来の回折光学素子では
、反射層6の表面が傷つき易く、つまりグレーティング
ゾーン7が傷つき易く、また反射層6として用いた金属
層は、表面が凹凸であるため、平坦に堆積したときより
も酸化し易く、そのため、反射率が低下して集光効率が
悪くなるいう課題があった。
Problems to be Solved by the Invention However, in the conventional diffractive optical element shown in FIG. 2, the surface of the reflective layer 6 is easily damaged, that is, the grating zone 7 is easily damaged, and the metal layer used as the reflective layer 6 is Since the surface is uneven, it is more easily oxidized than when it is deposited flat, which causes a problem in that the reflectance decreases and the light collection efficiency deteriorates.

本発明は、前記従来の回折光学索子の課題に鑑みてなさ
れたもので、表面が傷つきにくく、さらに反射率の低下
がほとんど無く、耐環境性のよい反射形の回折光学素子
を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems with the conventional diffractive optical probe, and an object of the present invention is to provide a reflective diffractive optical element that has a surface that is hard to be damaged, has almost no decrease in reflectance, and has good environmental resistance. With the goal.

課題を解決するための手段 本発明は、基板上に形成した複数のグレーティングゾー
ンと、前記グレーティングゾーン上に設けた反射層と、
前記反射層上に設けた保護層からなる回折光学素子であ
る。
Means for Solving the Problems The present invention provides a plurality of grating zones formed on a substrate, a reflective layer provided on the grating zones,
The diffractive optical element includes a protective layer provided on the reflective layer.

作用 本発明では、反111F!’の上に、flt層を設ける
ことによって、反射層の表面を傷つきにくくシ、同時に
反射層の酸化を防止し、耐環境性のある回折光学素子が
実現する。
Effect In the present invention, anti-111F! By providing the flt layer on top of ', the surface of the reflective layer is hard to be damaged, and at the same time, oxidation of the reflective layer is prevented, thereby realizing a diffractive optical element with environmental resistance.

実施例 以下、本発明の実施例について図面を参照して説明する
Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図は、本発明の一実施例の回折光学素子の基本構成
を示す断面図であり、入射光が集光する様子を示してい
る。
FIG. 1 is a sectional view showing the basic structure of a diffractive optical element according to an embodiment of the present invention, and shows how incident light is condensed.

同図において、光学素子部9は、基板l上に形成した複
数のグレーティングゾーン7と、このグレーティングゾ
ーン7上に設けた反射i6と、反射N6上に設けた保護
層5を有する。
In the figure, the optical element section 9 has a plurality of grating zones 7 formed on a substrate l, a reflection i6 provided on the grating zone 7, and a protective layer 5 provided on a reflection N6.

本実施例は、従来例と同しく、反射形回折光学しンズの
場合であり、グレーティングゾーン7の平面構造は同心
円で、外周にいくにしたがって周關が小さくなる構造を
している(従来例の第2図(a)参照)。
This example is a case of a reflective diffraction optical lens, as in the conventional example, and the planar structure of the grating zone 7 is concentric circles, and the circumference becomes smaller toward the outer periphery (as in the conventional example). (See Figure 2(a)).

入射光2は、反射層6とは反対側の基板1側から入射し
、光軸を折返し、集光出射光3となり、焦点4に集光さ
れる。
The incident light 2 enters from the side of the substrate 1 opposite to the reflective layer 6, turns its optical axis, becomes condensed outgoing light 3, and is condensed at a focal point 4.

その製造方法は、本実施例では基板lとして、上面に、
グレーティングゾーン7を形成する。例えは、基板lと
して■TOの透明導電膜のついたガラス基板を用い、そ
の上に、例えば、PMMAやCMS等の電子ビームレジ
ストといわれる電子ビームに感光する合成樹脂をコーテ
ィングをした後、電子ビーム描画装置にて、製造する光
学素子のパターン形状に対応するように電子ビームを照
射した。
In this embodiment, the manufacturing method is as follows:
A grating zone 7 is formed. For example, use a glass substrate with a TO transparent conductive film as the substrate l, coat it with a synthetic resin sensitive to electron beams called electron beam resist, such as PMMA or CMS, and then apply electron beam resist. An electron beam was irradiated using a beam drawing device so as to correspond to the pattern shape of the optical element to be manufactured.

その後、現像処理を行なうことにより、そのグレーティ
ングゾーン7の膜厚を変化させた後1反射層6として、
たとえばAgやAI、Au等の金属層を、たとえば40
0OA程度堆積した。反射層6の膜厚は、グレーティン
グゾーン5の最大膜厚くたとえば0.2μm)よりも大
きくすることにより、反射効率を高めることができる。
Thereafter, by performing a development process, the film thickness of the grating zone 7 is changed, and then the first reflective layer 6 is formed.
For example, a metal layer such as Ag, AI, Au, etc.
Approximately 0OA was deposited. By making the thickness of the reflective layer 6 larger than the maximum thickness of the grating zone 5 (for example, 0.2 μm), the reflection efficiency can be increased.

次に、反射N6の上に保護N5として、たとえば、  
AI、Cu、Cr等の金属層、UV硬化樹脂やラッカー
塗料なとの合成樹脂、誘電体多層膜、・S io、  
S io2.  MgF2、Sac、グラフフイ]、ダ
イヤモンド等を、例えは100OAから数77 m堆積
して、光学素子部9を形成した。
Then on top of the reflection N6 as protection N5, e.g.
Metal layers such as AI, Cu, and Cr, synthetic resins such as UV curing resins and lacquer paints, dielectric multilayer films, S io,
Sio2. The optical element portion 9 was formed by depositing MgF2, Sac, graphite, diamond, etc., for example, in a thickness of several 77 m from 100 OA.

特に、反射層6として、Agを用いると例えば波長λ”
0.6328I1mのHe−Neレーザ光を入射光2に
用いた場合では、最も反射率がよく、回折光学素子の光
の利用効率を、高めることができた。さらにAg反射N
6を用いた場合では、それのみては、他の金属層を用い
た場合よりも酸化され易かったため、本発明の効果が太
きかった。
In particular, if Ag is used as the reflective layer 6, for example, the wavelength λ''
When a 0.6328I1m He-Ne laser beam was used as the incident light 2, the reflectance was the best, and the light utilization efficiency of the diffractive optical element could be improved. Furthermore, Ag reflection N
In the case of using 6, the effect of the present invention was greater because it was more easily oxidized than in the case of using other metal layers.

このとき、Ag反射層6を用いた場合では、反射N6と
グレーティングゾーン7の付着強度が弱くはがれ易いと
いう不都合があったが、保護N5として、A1を用いる
と、反射率は高いままて付着強度も強くなり、特に本発
明の効果が太きかつた。
At this time, when the Ag reflective layer 6 was used, there was a problem that the adhesive strength between the reflective layer N6 and the grating zone 7 was weak and it was easy to peel off, but when A1 is used as the protective layer N5, the reflectance remains high and the adhesive strength is The effect of the present invention was particularly strong.

本実施例で作製した回折光学レンズは、たとえば、口径
1rnm、波長λ=0.632811m、2%点距M 
f = 7.5mtn (屈折率1.6のガラス基板中
)、グレーティングゾーン5の数は34、各グレーティ
ングゾーン5の最大膜厚は0.2μm、グレーティング
ゾーン5の最外周開門は6.371mである。  本発
明の回折光学素子は、以上述べた以外に、仕様にあわせ
て、任意のものが作製可能である。例えは、反射形均−
周期グレーティングや反射形シリンドリカルレンズ、反
射形楕円マイクロフレネルレンズ等の光学素子も、グレ
ーティングゾーン7をそれらに合わせて形成し、その上
に反射層6と保護層5を堆積して同様に構成可能である
The diffractive optical lens produced in this example has, for example, an aperture of 1 rnm, a wavelength λ=0.632811 m, and a 2% focal length M
f = 7.5 mtn (in a glass substrate with a refractive index of 1.6), the number of grating zones 5 is 34, the maximum film thickness of each grating zone 5 is 0.2 μm, and the outermost circumference opening of grating zone 5 is 6.371 m. be. The diffractive optical element of the present invention can be manufactured in any other manner in accordance with specifications in addition to those described above. For example, reflective type
Optical elements such as periodic gratings, reflective cylindrical lenses, and reflective elliptical micro Fresnel lenses can also be constructed in the same way by forming grating zones 7 to match them and depositing reflective layers 6 and protective layers 5 thereon. be.

また、反射層6の保護層5は一層の時について説明した
が、2N以上の保護層を設けてもよい。
Moreover, although the case where the protective layer 5 of the reflective layer 6 is one layer has been described, a protective layer of 2N or more may be provided.

大量生産は、反射層6を堆積する前の素子を原盤として
、例えは、ニッケル電鋳法で金型を作製し、例えば、U
V硬化樹脂を用いて金型から複製し、反射N6と保護N
5を堆積すれば原盤と同一の回折光学素子が低価格で製
造可能である。
For mass production, using the element before depositing the reflective layer 6 as a master, a mold is made by, for example, nickel electroforming, and
Replicated from mold using V-cured resin, reflective N6 and protection N
5, a diffractive optical element identical to that of the master can be manufactured at a low cost.

基板lとしては、使用波長に対して透明であれば良く、
例えば石英等のカラス基板は、温度的にも安定であり、
合成樹脂を基板に用いた場合ては軽量になる。
The substrate l only needs to be transparent to the wavelength used.
For example, glass substrates such as quartz are stable in terms of temperature,
If synthetic resin is used for the substrate, it will be lighter.

発明の効果 以上述べたように、本発明の回折光学素子は、保護層を
設けたため、表面に傷がついても、反射層及びグレーテ
ィングゾーンに与える影響は小さくなり、さらに、金属
反射層は酸化されにくくなり、耐環境性の優れた回折光
学素子が実現可能である。
Effects of the Invention As described above, since the diffractive optical element of the present invention is provided with a protective layer, even if the surface is scratched, the effect on the reflective layer and grating zone is reduced, and furthermore, the metal reflective layer is prevented from being oxidized. This makes it possible to realize a diffractive optical element with excellent environmental resistance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の回折光学素子の断面図、第
2図は従来の回折光学素子の平面および断面図である。 l・・・基板、5・・・保護層、6・・・反射層、7・
・・グレーティングゾーン。 代理人 弁理士 松 1)正 道 第2図 (a”) 1 基板      6 反l14IllI2 大剣光
     7 グレーティング・f−ン3 電光出射光
   8 空気 4 焦点     10 光字素子部 (b)
FIG. 1 is a sectional view of a diffractive optical element according to an embodiment of the present invention, and FIG. 2 is a plan view and a sectional view of a conventional diffractive optical element. l... Substrate, 5... Protective layer, 6... Reflective layer, 7...
...Grating zone. Agent Patent Attorney Matsu 1) Tadashi Michi Diagram 2 (a”) 1 Substrate 6 Anti-l14IllI2 Great sword light 7 Grating f-n 3 Lightning output light 8 Air 4 Focus 10 Optical element part (b)

Claims (3)

【特許請求の範囲】[Claims] (1)基板上に形成した複数のグレーティングゾーンと
、前記グレーティングゾーン上に設けた反射層と、前記
反射層上に設けた保護層を備えたことを特徴とする回折
光学素子。
(1) A diffractive optical element comprising a plurality of grating zones formed on a substrate, a reflective layer provided on the grating zones, and a protective layer provided on the reflective layer.
(2)反射層は、銀(Ag)であることを特徴とする請
求項1記載の回折光学素子。
(2) The diffractive optical element according to claim 1, wherein the reflective layer is made of silver (Ag).
(3)保護層は、アルミニュウム(Al)であることを
特徴とする請求項2記載の回折光学素子(4)反射層の
膜厚は、グレーティングゾーン最大膜厚よりも大きいこ
とを特徴とする請求項1記載の回折光学素子。
(3) The diffractive optical element according to claim 2, wherein the protective layer is made of aluminum (Al). (4) The thickness of the reflective layer is larger than the maximum thickness of the grating zone. Item 1. Diffractive optical element according to item 1.
JP33508790A 1990-07-27 1990-11-29 Diffraction optical element Pending JPH04204401A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP33508790A JPH04204401A (en) 1990-11-29 1990-11-29 Diffraction optical element
US07/731,850 US5138495A (en) 1990-07-27 1991-07-17 Diffractive optical lens
EP91112251A EP0468410B1 (en) 1990-07-27 1991-07-22 A diffractive optical lens
DE69103707T DE69103707T2 (en) 1990-07-27 1991-07-22 Optical diffraction lens.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33508790A JPH04204401A (en) 1990-11-29 1990-11-29 Diffraction optical element

Publications (1)

Publication Number Publication Date
JPH04204401A true JPH04204401A (en) 1992-07-24

Family

ID=18284628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33508790A Pending JPH04204401A (en) 1990-07-27 1990-11-29 Diffraction optical element

Country Status (1)

Country Link
JP (1) JPH04204401A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002098820A (en) * 2000-09-21 2002-04-05 Nippon Sheet Glass Co Ltd Reflection type diffraction grating
WO2011021557A1 (en) 2009-08-19 2011-02-24 浜松ホトニクス株式会社 Spectroscopy module and manufacturing method therefor
JP2012150370A (en) * 2011-01-21 2012-08-09 Hitachi High-Technologies Corp Diffraction grating, capillary array electrophoresis apparatus, liquid chromatograph, spectrophotometer, and biochemical autoanalyzer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002098820A (en) * 2000-09-21 2002-04-05 Nippon Sheet Glass Co Ltd Reflection type diffraction grating
WO2011021557A1 (en) 2009-08-19 2011-02-24 浜松ホトニクス株式会社 Spectroscopy module and manufacturing method therefor
US9075193B2 (en) 2009-08-19 2015-07-07 Hamamatsu Photonics K.K. Spectroscopy module and manufacturing method therefor
US9797773B2 (en) 2009-08-19 2017-10-24 Hamamatsu Photonics K.K. Spectroscopy module and manufacturing method therefor
JP2012150370A (en) * 2011-01-21 2012-08-09 Hitachi High-Technologies Corp Diffraction grating, capillary array electrophoresis apparatus, liquid chromatograph, spectrophotometer, and biochemical autoanalyzer

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