JPH04199709A - Apparatus for successive treatment - Google Patents

Apparatus for successive treatment

Info

Publication number
JPH04199709A
JPH04199709A JP33275090A JP33275090A JPH04199709A JP H04199709 A JPH04199709 A JP H04199709A JP 33275090 A JP33275090 A JP 33275090A JP 33275090 A JP33275090 A JP 33275090A JP H04199709 A JPH04199709 A JP H04199709A
Authority
JP
Japan
Prior art keywords
chamber
processing
chambers
transfer
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33275090A
Other languages
Japanese (ja)
Inventor
Yuji Ishida
祐二 石田
Kazuo Suzuki
和夫 鈴木
Kenzo Shima
島 健蔵
Shunichi Hirose
広瀬 俊一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Engineering and Services Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Engineering and Services Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Engineering and Services Co Ltd, Hitachi Ltd filed Critical Hitachi Engineering and Services Co Ltd
Priority to JP33275090A priority Critical patent/JPH04199709A/en
Publication of JPH04199709A publication Critical patent/JPH04199709A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To suppress waiting times of an object to be treated in the inside and outside of an apparatus, by connecting two carrying chambers through one buffer chamber, and by allowing a temporary stay of the object to be treated, and further, by connecting the buffer chamber with the carrying chamber alternately to move the object to be treated in one direction. CONSTITUTION:A buffer chamber 41, in which an object to be treated is stayed temporarily, and two carrying chambers 31, 32 connected through the buffer chamber 41 are provided. A second buffer chamber 42 is connected with one carrying chamber 32 in a desired direction, and further, the carrying chamber 32 is connected with the next carrying chamber 33 through the second buffer chamber 42. Successively, by repeating such connections, the carrying route whose direction can be selected suitably is formed, and treatment chambers 52-54 are connected with the carrying chambers 31-33 in the carrying route, in the order of desired processes being performed. As a result, the apparatuses for the processes of a pretreatment and aftertreatment can be connected directly with this apparatuses for successive treatments. Thereby, the object to be treated does not return to the buffer chamber through which the object has been inputted, and since it doesn't disturb the receiving of the next object to be treated which waits in the pretreatment, the waiting time of the next object to be treated is not increased.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、連続処理装置に係り、特に、複数の異なる真
空処理を、多様な順序で逐次連続的に行うのに好適な連
続処理装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a continuous processing apparatus, and particularly relates to a continuous processing apparatus suitable for sequentially and continuously performing a plurality of different vacuum processes in various orders. .

[従来の技術] 従来の複合真空処理装置としては、特開昭63−1.5
7870号公報に記載のものがある。
[Prior art] As a conventional composite vacuum processing apparatus, there is a
There is one described in Japanese Patent No. 7870.

この従来の装置について、第5A、5B図を参照して説
明する。
This conventional device will be explained with reference to FIGS. 5A and 5B.

第5A、5B図は、従来の連続処理装置600゜700
を示す作用説明図である。
Figures 5A and 5B show conventional continuous processing equipment 600°700
FIG.

第5Δ図について説明する。Fig. 5A will be explained.

同図において、51,52.53は被処理物を処理する
ための処理室、1.11は装置内へ被処理物を出入れす
るための入出力室12(ロードロック室1.バッファ室
1 、、]、) 、  3は入出力室から入った被処理
物を目標とする処理室へ分配するためのセパレーション
室である。
In the figure, 51, 52, 53 are processing chambers for processing objects to be processed, and 1.11 is an input/output chamber 12 (load lock chamber 1, buffer chamber 1, , ], ) , 3 is a separation chamber for distributing the processed material that has entered from the input/output chamber to the target processing chamber.

ここで、被処理物の動きに焦点を当てて動作を見ると、
ロードロック室1から送り込まれた被処理物は、バッフ
ァ室1]−経由し、セパレーション室3に送り込まれ、
ここから目的とする最初の処理の行われる処理室51.
52または53のいずれかに送られる。
Here, if we focus on the movement of the processed object and look at the operation,
The workpiece sent from the load lock chamber 1 is sent to the separation chamber 3 via the buffer chamber 1].
Processing chamber 51, where the intended initial processing is performed.
52 or 53.

最初の処理室で1回目の処理が行われたのち、被処理物
は、−旦、セパレーション室3へ戻され、引き続き次の
処理を行うため、次の処理室へ送られる。
After the first treatment is performed in the first treatment chamber, the object to be treated is returned to the separation chamber 3 and then sent to the next treatment chamber for the next treatment.

こうして、被処理物は、セパレーション室3を中心にし
て各処理室51,52.53へ、自由な順序で順次送ら
れ、連続的に処理が行われる。処理された後は再びバッ
ファ室1]を経由してロードロック室1へ戻され、装置
外部へ取出される。
In this way, the objects to be processed are sequentially sent to each of the processing chambers 51, 52, 53 in an arbitrary order centering on the separation chamber 3, and are continuously processed. After being processed, it is returned to the load lock chamber 1 via the buffer chamber 1 and taken out of the apparatus.

さらに、従来例では、4室以上の処理室が必要となった
場合は、第5B図に示すように、セパレーション室3]
−を入出力室1,11とは反対方向に増やして処理室の
増加に対応するようになっている。ここで、バッファ室
]−1は被処理物の単なる通過室であり、被処理物の−
・時滞留はセパレーション室31、32で行われる。
Furthermore, in the conventional example, if four or more processing chambers are required, as shown in FIG. 5B, a separation chamber 3]
- is increased in the opposite direction to the input/output chambers 1 and 11 to accommodate the increase in the number of processing chambers. Here, the buffer chamber ]-1 is a mere passage chamber for the processed material, and
- Time retention is performed in separation chambers 31 and 32.

〔発明が解決しようとする課題] 」−1記従来例では、入出力室12およびセパレーショ
ン室3(31,32)から構成される1本の往復搬送径
路を被処理物が移送される。従って、被処理物を移動さ
せる搬送手段は、往復兼用であり、同時に被処理物を出
入れできず、処理室数が増加すると、入出力室12にお
ける待ち時間が増加するという問題がある。
[Problems to be Solved by the Invention] In the conventional example described in item 1, the object to be processed is transported through one reciprocating transport path composed of the input/output chamber 12 and the separation chamber 3 (31, 32). Therefore, the conveying means for moving the objects to be processed is used for both reciprocating purposes, and the objects to be processed cannot be taken in and taken out at the same time.As the number of processing chambers increases, there is a problem in that the waiting time in the input/output chamber 12 increases.

すなわち、第5A図に示す装置において、処理室51→
52→53と順序連続的に処理されていく場合は、最終
上程の処理室53から被処理物が取り出され、入出力室
J2へこの被処理物が移送されたのち、各処理室に入っ
ていた各被処理物が順序法の処理室へ移送されないと、
新しい被処理物を入出力室12から取込めない。
That is, in the apparatus shown in FIG. 5A, the processing chamber 51→
When processing is carried out in the order of 52 → 53, the object to be processed is taken out from the final upper processing chamber 53, transferred to the input/output chamber J2, and then transferred to each processing chamber. If each workpiece is not transferred to the processing chamber of the sequential method,
New objects to be processed cannot be taken in from the input/output chamber 12.

また、本装置の処理工程の前後に、他装置の処理工程を
組合せた一貫連続処理工程を形成したい場合は、入出力
室】−2の位置が1−ケ所と限定されているため、前後
の工程の処理を行う処理装置と、本装置の入出力室12
とを直結できず、本装置との間で被処理物を移動させる
搬送手段を準備しなければならない。
In addition, if you want to form an integrated continuous processing process that combines the processing processes of other devices before and after the processing process of this device, the input/output chamber]-2 is limited to one location. A processing device that processes the process and an input/output chamber 12 of this device
It is not possible to connect directly to the equipment, and a transport means must be prepared to move the workpiece to and from the equipment.

本発明の目的は、処理室数が増加しても、処理の待ち時
間が増加せず、しかも、前後の処理工程装置と方向性の
制約なく直結でき、装置間の搬送手段を別途準備する必
要のない連続処理装置を提供することにある。
The purpose of the present invention is that even if the number of processing chambers increases, the waiting time for processing does not increase, and furthermore, it can be directly connected to the processing process equipment before and after it without restrictions on directionality, and there is no need to separately prepare transportation means between the equipment. The purpose of the present invention is to provide a continuous processing device without any

「課題を解決するための手段」 上記目的は、被処理物を一時的に滞留させるバッファ室
と、このバッファ室を介して接続される2つの搬送室と
を備えて構成される連続処理装置により達成できる。
"Means for Solving the Problem" The above purpose is achieved by using a continuous processing device comprising a buffer chamber in which the material to be processed is temporarily retained and two transfer chambers connected via this buffer chamber. It can be achieved.

さらに、上記目的は、バッファ室と搬送室とを、交互に
、必要数だけ接続することによっても達成できる。
Furthermore, the above object can also be achieved by alternately connecting a necessary number of buffer chambers and transfer chambers.

[作用] 本発明の連続処理装置は、第1のバッファ室が2つの搬
送室の中間に位置し、被処理物の搬送径路単位を形成す
る。
[Function] In the continuous processing apparatus of the present invention, the first buffer chamber is located between the two transport chambers, and forms a transport path unit for the object to be processed.

一方の搬送室に、第2のバッファ室を目的とする方向へ
接続し、さらに、この第2のバッファ室を介して、次の
搬送室を接続する。順次、このような接続をくり返し、
適切な方向をえらべる搬送径路を形成するとともに、搬
送路内の搬送室に所望の工程順に処理室を接続する。こ
の結果、前後の処理工程装置と、この連続処理装置とを
直結することができる。
A second buffer chamber is connected to one transfer chamber in the desired direction, and further, the next transfer chamber is connected via this second buffer chamber. Repeat this connection one after another,
A conveyance path that selects an appropriate direction is formed, and processing chambers are connected to the conveyance chambers in the conveyance path in a desired process order. As a result, the preceding and succeeding processing devices can be directly connected to this continuous processing device.

この連続処理装置において、1つの処理室で目的とする
処理が終了した被処理物は、この処理室に接続された搬
送室を経て、次工程側のバッファ室に移送される。この
ように、被処理物は入力してきたバッファ室へ戻らない
ので、前工程で待機している次の被処理物の取込みに妨
げない。この結果、待機している次の被処理物の待ち時
間を増加させない。
In this continuous processing apparatus, a workpiece that has been subjected to a target process in one processing chamber is transferred to a buffer chamber on the next process side via a transfer chamber connected to this processing chamber. In this way, since the object to be processed does not return to the buffer chamber into which it was input, it does not interfere with the taking in of the next object to be processed that is waiting in the previous process. As a result, the waiting time for the next object to be processed is not increased.

[実施例] 次に、本発明の実施例を図面を参照して説明する。[Example] Next, embodiments of the present invention will be described with reference to the drawings.

本発明の第1実施例を第1A図を用いて説明する。A first embodiment of the present invention will be described using FIG. 1A.

第1図は、本実施例の連続処理装W100の作用説明図
である。
FIG. 1 is an explanatory diagram of the operation of the continuous processing device W100 of this embodiment.

同図において、1は被処理物を取込むロード室、2は被
処理物を取出すアンロード室、31,32゜33はベル
トやローラなどの移送手段を設けた搬送室、41.42
は搬送室間に介在するバッファ室、そして、51,52
,53,54..55は被処理物がエツチング、成膜あ
るいは加熱処理等の真空処理が行われる処理室である。
In the figure, 1 is a load chamber for taking in the workpiece, 2 is an unloading room for taking out the workpiece, 31, 32, 33 is a transport chamber equipped with transport means such as belts and rollers, 41, 42
is a buffer chamber interposed between the transfer chambers, and 51, 52
,53,54. .. Reference numeral 55 denotes a processing chamber in which the object to be processed is subjected to vacuum processing such as etching, film formation, or heat treatment.

各室間は、搬送室内に設けられたゲートバルブ61によ
り仕切られ、それぞれの室ごとに設けられだ独自の排気
装置(図示せず)がそれぞれの室で要求される真空条件
を維持している。
Each chamber is separated by a gate valve 61 provided in the transfer chamber, and a unique exhaust device (not shown) provided in each chamber maintains the vacuum conditions required in each chamber. .

次に、この連続処理装置100を用いて、被処理物を処
理する場合について説明する。
Next, a case will be described in which a workpiece is processed using this continuous processing apparatus 100.

同図に示す複数の矢印は、被処理物の移動方向を示すも
のである。
A plurality of arrows shown in the figure indicate the moving direction of the object to be processed.

ロード室1から搬送室31へ入った被処理物は、所望の
最初の処理が行われる処理室51.52のいずれかに送
られる。送られた処理室で第1回目の処理が行われた被
処理物は、処理終了後搬送室31へ戻され、もう一方の
処理室52.51のいずれかにへ送られるか、または、
バッファ室8へ送られる。すなわち、最初に被処理物が
送り込まれたロード室1に、被処理物が戻らないため、
ロード室内又は装置の外で待機している次の被処理物は
これに妨げられることなく搬送室31に取込まれ、処理
室へ送ることが可能となる。
The workpiece that has entered the transfer chamber 31 from the load chamber 1 is sent to one of the processing chambers 51 and 52 where a desired initial treatment is performed. The workpiece that has been processed for the first time in the processing chamber to which it has been sent is returned to the transfer chamber 31 after the processing is completed, and is sent to one of the other processing chambers 52, 51, or
It is sent to buffer room 8. In other words, since the object to be processed does not return to the load chamber 1 into which it was initially sent,
The next object to be processed, which is waiting in the loading chamber or outside the apparatus, can be taken into the transfer chamber 31 without being hindered and sent to the processing chamber.

同様に、搬送室32においては、処理室53での処理を
終えた被処理物が、次工程側のバッファ室42へ移送さ
れた後、前工程側のバッファ室41に待機していた被処
理物が、上記被処理物に妨げられることなく搬送室32
に取込まれ、処理室53に送られる。さらに、搬送室3
3においても、処理室54または処理室55にて、真空
処理が終了した被処理物は搬送室33を経てアンロード
室2へ出され、バッファ室42に待機していた次の被処
理物が、上記被処理物に妨害されることなく搬送室33
に取込まれ、処理室54又は55に移送される。
Similarly, in the transfer chamber 32, the workpiece that has been processed in the processing chamber 53 is transferred to the buffer chamber 42 on the next process side, and then the workpiece that was waiting in the buffer chamber 41 on the previous process side is The object is transferred to the transfer chamber 32 without being obstructed by the object to be processed.
and sent to the processing chamber 53. Furthermore, the transfer chamber 3
3, the workpiece that has been vacuum-processed in the processing chamber 54 or 55 is taken out to the unloading chamber 2 via the transfer chamber 33, and the next workpiece waiting in the buffer chamber 42 is transferred. , the transfer chamber 33 without being obstructed by the object to be processed.
and transported to the processing chamber 54 or 55.

したがって、一つの搬送単位(バッファ室と、このバッ
ファ室を介して接続される2つの搬送室)を考えた場合
、この搬送単位で被処理物の移送待ち時間が減少できる
ので、その前後の搬送室での被処理物の移送に応じて、
各バッファ室における被処理物の滞留を、コンピュータ
等を用いて適切に制御することにより、装置内の被処理
物の処理待ち時間を抑制することができる。
Therefore, when one transport unit (a buffer chamber and two transport chambers connected via this buffer chamber) is considered, the waiting time for transferring the processed material can be reduced in this transport unit, so the transport before and after it can be Depending on the transfer of the processed material in the room,
By appropriately controlling the retention of the objects to be processed in each buffer chamber using a computer or the like, it is possible to suppress the waiting time for processing the objects to be processed in the apparatus.

ここで、本実施例における被処理物の搬送径路は、各処
理室への出入りを除くと、ロード室1→搬送室3]→バ
ッファ室41→搬送室32→バッファ室42→搬送室3
3→アンロード室2を通過するものとなっており、各々
のバッファ室41゜42が中間に位置する搬送路単位3
]→41→32および32→42→33は一直線状に並
んでいる。一方、本装置の前処理工程装置6.後処理−
[程装置7は、この−直線状搬送径路に対し、片側に位
置しているため、ロー1へ室1.アンロード室2も同様
に直線搬送径路の片側に配置し、これら前後処理工程装
置に直結しである。
Here, the transport path of the processed material in this embodiment is, excluding the entry and exit to and from each processing chamber, load chamber 1→transfer chamber 3]→buffer chamber 41→transfer chamber 32→buffer chamber 42→transfer chamber 3
3 → A conveyance path unit 3 which passes through the unloading chamber 2 and in which each buffer chamber 41 and 42 are located in the middle.
]→41→32 and 32→42→33 are arranged in a straight line. On the other hand, the pretreatment process device 6 of this device. Post-processing
[Since the processing device 7 is located on one side of this linear conveyance path, the processing device 7 is located on one side of the linear conveyance path, so that the chamber 1. The unloading chamber 2 is similarly arranged on one side of the linear conveyance path and is directly connected to these pre- and post-processing process devices.

次に、本発明の第2実施例について、第1B図を用いて
説明する。
Next, a second embodiment of the present invention will be described using FIG. 1B.

本実施例は、第1実施例の変形例であり、第1A図に示
す前後の処理工程装置6,7の位置関係を適宜変更可能
であることを示す例である。
This embodiment is a modification of the first embodiment, and is an example showing that the positional relationship between the front and rear processing process apparatuses 6 and 7 shown in FIG. 1A can be changed as appropriate.

第1B図は、第1A図と同一の搬送径路に対して、同一
直線上に前処理工程装置6と後処理工程装置7を接続し
た連続処理装置200の作用説明図である。
FIG. 1B is an explanatory diagram of the operation of the continuous processing apparatus 200 in which the pre-processing process device 6 and the post-processing process device 7 are connected on the same straight line with respect to the same conveyance path as in FIG. 1A.

基本的構成は、第1実施例の連続処理装置100と同じ
であるが、ロード室1・前処理]1程装置6と、処理室
5]との位置が入れ換っている。
The basic configuration is the same as the continuous processing apparatus 100 of the first embodiment, but the positions of the load chamber 1/preprocessing device 6 and the processing chamber 5 are swapped.

また、アンロード室2・後処理工程装置7と、処理室5
5との位置が入れ換っている。
In addition, the unloading chamber 2, the post-processing process device 7, and the processing chamber 5
The positions with 5 have been swapped.

搬送室31.33は同一形状の開口部を有しているので
、処理室5j及び55とロード室1.アンロード室2の
位置を入れ換るだけで、直線上の一貫処理ラインを構成
することが可能となっている。
Since the transfer chambers 31 and 33 have openings of the same shape, the processing chambers 5j and 55 and the load chamber 1. By simply changing the position of the unloading chamber 2, it is possible to construct a linear integrated processing line.

次に、本発明の第3実施例を第2図を用いて説明する。Next, a third embodiment of the present invention will be described using FIG. 2.

第2図は、本実施例の連続処理装置300の作用説明図
である。
FIG. 2 is an explanatory diagram of the operation of the continuous processing apparatus 300 of this embodiment.

第1A、B図と同一の要素からなる構成例であり、搬送
室3トバノファ室41・搬送室32から成る搬送径路単
位と、搬送室32・バッファ室42・搬送室33から成
る搬送径路単位が、搬送室32の位置で方向を変更し、
直角に折れ曲がった搬送路を構成し、前処理工程装置6
と後処理工程装置7とに直結している例である。
This is an example of a configuration consisting of the same elements as in Figures 1A and B, and includes a transport path unit consisting of the transport chamber 3, transfer chamber 41, and transport chamber 32, and a transport path unit comprising the transport chamber 32, buffer chamber 42, and transport chamber 33. , change the direction at the position of the transfer chamber 32,
A transport path bent at right angles is configured, and the pre-processing process device 6
In this example, the post-processing device 7 is directly connected to the post-processing device 7.

本発明特有のバッファ室41および42がなく、=11
− 搬送室31,32.33だけで、直接、移送装置間で被
処理物を受渡す配置にすると、搬送室32の位置で径路
を直角に折り曲げるため、処理室52と55が重なって
しまうことになるが、バッファ室44,4.2を設ける
ので、処理室の据置位置が干渉しない空間的余裕を確保
てきる同時に、機器に対する保守空間をも確保できる。
Without the buffer chambers 41 and 42 unique to the present invention, =11
- If the transfer chambers 31, 32, and 33 are arranged to directly transfer the workpiece between the transfer devices, the processing chambers 52 and 55 will overlap because the path is bent at a right angle at the transfer chamber 32 position. However, since the buffer chambers 44, 4.2 are provided, it is possible to secure a space that does not interfere with the installation position of the processing chamber, and at the same time, it is possible to secure a maintenance space for the equipment.

なお、第1A図に示すように、バッファ室41゜42に
補助バルブ8を設けたので、前後の搬送装置や処理室が
故障等が原因で、被処理物の正規の処理工程が実行でき
なくなった場合は、処理途中にある被処理物の中途取出
しを可能とすることができる。このような補助バルブは
、第1B図、第2図に示したバッファ室に取付けてもよ
く、その効果は同様である。
As shown in Fig. 1A, the auxiliary valves 8 are provided in the buffer chambers 41 and 42, so that the regular processing of the processed material cannot be performed due to a malfunction in the front or rear transport devices or processing chambers. In this case, it is possible to take out a workpiece that is in the middle of processing. Such an auxiliary valve may be attached to the buffer chamber shown in FIGS. 1B and 2, and the effect will be the same.

次に、本発明の第4実施例を、第3図を用いて説明する
Next, a fourth embodiment of the present invention will be described using FIG. 3.

第3図は、一部の搬送室とバッファ室の構造を−・体止
した連続処理装置400の作用説明図である。
FIG. 3 is an explanatory diagram of the operation of a continuous processing apparatus 400 in which the structures of a part of the transfer chamber and a buffer chamber are combined.

−】2− 第1A図において、搬送室3]とバッファ室41、およ
び、搬送室32とバッファ室42とを、それぞれ、一体
止した点と、補助バルブ8を設けていない点以外は、同
図に示す連続処理装置100と同じ構成であるので、そ
の説明は省略する。
-]2- In Fig. 1A, the transfer chamber 3] and the buffer chamber 41, and the transfer chamber 32 and the buffer chamber 42 are integrally connected, respectively, and the auxiliary valve 8 is not provided. Since it has the same configuration as the continuous processing apparatus 100 shown in the figure, its explanation will be omitted.

本実施例は、両室の真空雰囲気や熱雰囲気が共通でもさ
しつかえない場合に利用でき、グー1−バルブや排気装
置の合理化がはかれる。
This embodiment can be used when it is acceptable for both chambers to have a common vacuum atmosphere or thermal atmosphere, and it is possible to rationalize the gas valve and the exhaust device.

次に、本発明の第5実施例を、第4図を用いて説明する
Next, a fifth embodiment of the present invention will be described using FIG. 4.

第4図は、第1図で示した連続処理装置100に、はぼ
同様な連続処理装置を並列に追加した連続処理装置50
0を示す作用説明図である。
FIG. 4 shows a continuous processing device 50 in which a similar continuous processing device is added in parallel to the continuous processing device 100 shown in FIG.
It is an explanatory diagram of an action showing 0.

その構成は、バッファ室43.46を用いて、連続処理
装置1.00を2つ接続したものであり、また、その接
続のために、処理室42.54の位置を変えている。
Its configuration is such that two continuous processing apparatuses 1.00 are connected using buffer chambers 43, 46, and the positions of processing chambers 42, 54 are changed for the connection.

上記以外の構成は、はぼ同じであるので、その説明は省
略する。
The configurations other than those described above are almost the same, so the explanation thereof will be omitted.

また、この連続処理装置500の作用は、上記他の実施
例とほぼ同様となるので、その説明は省略する。
Further, since the operation of this continuous processing apparatus 500 is almost the same as that of the other embodiments described above, the explanation thereof will be omitted.

第4図に示すように、容易に増設が可能なのは、搬送室
・バッファ室・処理室がユニット化されているためであ
り、さらに、多様な、または、多量な被処理物処理が可
能な連続処理装置を構成できる。
As shown in Figure 4, expansion is possible because the transfer chamber, buffer chamber, and processing chamber are integrated into a unit, and in addition, a continuous Can configure processing equipment.

また、上記実施例では、搬送室は四角形であるが、四角
形に限定されることはなく、多角形として、処理室を多
く接続してもよい。
Further, in the above embodiment, the transfer chamber is square, but the shape is not limited to a square, and a polygon may be used to connect many processing chambers.

[発明の効果] 本発明によれば、複数の処理室を有する連続処理装置に
おいて、1つのバッファ室を介して2つの搬送室を接続
して、被処理物を一時滞留できるようにし、さらに、こ
れらバッファ室と搬送室とを交互に連結させて、被処理
物が一方向に移送されるようにしたので、搬送室に接続
された処理室にて順序処理を実施する工程では、被処理
物の装置内外での待ち時間を抑制することができる。こ
れとともに、バッファ室と搬送室とで構成される搬送径
路単位を、目的とする方向に接続できるので、前処理工
程装置・後処理工程装置の位置に直結することが可能と
なる。
[Effects of the Invention] According to the present invention, in a continuous processing apparatus having a plurality of processing chambers, two transfer chambers are connected via one buffer chamber to temporarily retain the object to be processed, and further, These buffer chambers and transfer chambers are connected alternately so that the objects to be processed can be transferred in one direction. The waiting time inside and outside the device can be suppressed. At the same time, since the transport path unit composed of the buffer chamber and the transport chamber can be connected in the desired direction, it is possible to connect directly to the position of the pre-processing process device and the post-processing process device.

また、搬送径路上にバッファ室を設け、このバ・ソファ
室に、適宜、補助バルブを設けることにより、装置の保
守空間が確保できるとともに、装置が故障時においては
、処理途中の被処理物を補助バルブから取出し、装置の
復旧をすばや〈実施できる効果もある。
In addition, by providing a buffer chamber on the conveyance path and providing appropriate auxiliary valves in this bath/sofa chamber, space for maintenance of the equipment can be secured, and in the event of a failure of the equipment, the workpieces in the middle of processing can be removed. It also has the effect of being able to be taken out from the auxiliary valve and the equipment restored quickly.

【図面の簡単な説明】[Brief explanation of the drawing]

第1A図は第1実施例の連続処理装置を示す作用説明図
、第1B図は第2実施例の連続処理装置を示す作用説明
図、第2図は第3実施例の連続処理装置を示す作用説明
図、第3図は第4実施例の1 ロード室、2 ・アンロ
ード室、31〜36・・・搬送室、41〜45・・・バ
ッファ室、51〜59・処理室、6・・前処理工程装置
、7・・後処理工程装置、8・・・補助バルブ、100
,200,300゜4、、.500,600,700−
・・連続処理装置。
Fig. 1A is an explanatory view of the operation of the continuous processing apparatus of the first embodiment, Fig. 1B is an explanatory view of the operation of the continuous processing apparatus of the second embodiment, and Fig. 2 is an explanatory diagram of the continuous processing apparatus of the third embodiment. The action explanatory diagram, FIG. 3, is of the fourth embodiment. - Pre-treatment process device, 7... Post-treatment process device, 8... Auxiliary valve, 100
,200,300°4,. 500,600,700-
...Continuous processing equipment.

Claims (1)

【特許請求の範囲】 1、被処理物を処理する1以上の処理室と接続される搬
送室を経て、1種類以上の処理が連続的に行われる連続
処理装置において、 少なくとも2以上の搬送室と、 この搬送室の間に配置されて、被処理物を一時的に滞留
させるためのバッファ室と、このバッファ室を介して接
続される2つの搬送室と、を備えて構成されることを特
徴とする連続処理装置。 2、上記バッファ室と搬送室とが交互に接続され、1種
類以上の処理を連続的に実施可能とすることを特徴とす
る請求項1記載の連続処理装置。 3、被処理物を処理する1以上の処理室と接続される搬
送室を経て、1種類以上の処理が連続的に行われる連続
処理装置において、 上記被処理物を一時的に滞留させるバッファ室を介して
接続される複数の搬送室と、 この搬送室に少くとも1以上接続される処理室と、 この処理室で処理を行うために被処理物を準備するロー
ド室と、 被処理物を解体するアンロード室とを備え、被処理物移
送時は、被処理物がロード室からアンロード室へ一方向
に移送されることを特徴とした連続処理装置。 4、隣接する上記搬送室とバッファ室とは、開閉自在の
仕切を介して接続されていることを特徴とする請求項1
、2または3記載の連続処理装置。 5、隣接する上記搬送室とバッファ室とは、仕切を持た
ずに、一つの容器で構成されることを特徴とする請求項
1、2、3または4記載の連続処理装置。 6、被処理物を処理する1以上の処理室と接続される搬
送室を経て、1種類以上の処理が連続的に行われる連続
処理装置において、 1以上の処理室を備える搬送室をマトリックス状に配置
し、各搬送室を、被処理物を一時的に滞留させるための
バッファ室を介して連結することを特徴とする連続処理
装置。 7、請求項1、2、3、4、5または6記載の連続処理
装置を、半導体装置の連続処理に用いて、複数の搬送径
路を形成し、同時に多様な真空処理を行えることを特徴
とする複合真空処理装置。
[Scope of Claims] 1. In a continuous processing apparatus in which one or more types of processing are continuously performed via a transfer chamber connected to one or more processing chambers that process objects to be processed, at least two or more transfer chambers. and a buffer chamber disposed between the transfer chamber and for temporarily retaining the processed material, and two transfer chambers connected via the buffer chamber. Features of continuous processing equipment. 2. The continuous processing apparatus according to claim 1, wherein the buffer chamber and the transfer chamber are connected alternately to enable continuous execution of one or more types of processing. 3. In a continuous processing device in which one or more types of processing are continuously performed via a transfer chamber connected to one or more processing chambers for processing the object to be processed, a buffer chamber in which the object to be processed is temporarily retained. a plurality of transfer chambers connected to each other via the transfer chamber; at least one processing chamber connected to the transfer chamber; a load chamber for preparing the object to be processed for processing in the processing chamber; 1. A continuous processing device comprising an unloading chamber for dismantling the workpiece, and when transferring the workpiece, the workpiece is transferred in one direction from the loading chamber to the unloading chamber. 4. Claim 1, wherein the adjacent transfer chamber and buffer chamber are connected via a partition that can be opened and closed.
, 2 or 3. The continuous processing apparatus according to . 5. The continuous processing apparatus according to claim 1, 2, 3, or 4, wherein the adjacent transfer chamber and buffer chamber are constituted by one container without a partition. 6. In a continuous processing device in which one or more types of processing are continuously performed via a transfer chamber connected to one or more processing chambers that process the object to be processed, the transfer chambers including one or more processing chambers are arranged in a matrix. A continuous processing apparatus characterized in that the transport chambers are connected via a buffer chamber for temporarily retaining the object to be processed. 7. The continuous processing apparatus according to claim 1, 2, 3, 4, 5 or 6 is used for continuous processing of semiconductor devices, forming a plurality of transport paths and simultaneously performing various vacuum processing. Composite vacuum processing equipment.
JP33275090A 1990-11-29 1990-11-29 Apparatus for successive treatment Pending JPH04199709A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33275090A JPH04199709A (en) 1990-11-29 1990-11-29 Apparatus for successive treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33275090A JPH04199709A (en) 1990-11-29 1990-11-29 Apparatus for successive treatment

Publications (1)

Publication Number Publication Date
JPH04199709A true JPH04199709A (en) 1992-07-20

Family

ID=18258439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33275090A Pending JPH04199709A (en) 1990-11-29 1990-11-29 Apparatus for successive treatment

Country Status (1)

Country Link
JP (1) JPH04199709A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5820679A (en) * 1993-07-15 1998-10-13 Hitachi, Ltd. Fabrication system and method having inter-apparatus transporter
WO2013105295A1 (en) * 2012-01-10 2013-07-18 株式会社日立ハイテクノロジーズ Vacuum processing device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5820679A (en) * 1993-07-15 1998-10-13 Hitachi, Ltd. Fabrication system and method having inter-apparatus transporter
US5858863A (en) * 1993-07-15 1999-01-12 Hitachi, Ltd. Fabrication system and method having inter-apparatus transporter
US6099598A (en) * 1993-07-15 2000-08-08 Hitachi, Ltd. Fabrication system and fabrication method
US7062344B2 (en) 1993-07-15 2006-06-13 Renesas Technology Corp. Fabrication system and fabrication method
US7310563B2 (en) 1993-07-15 2007-12-18 Renesas Technology Corp. Fabrication system and fabrication method
US7392106B2 (en) 1993-07-15 2008-06-24 Renesas Technology Corp. Fabrication system and fabrication method
US7603194B2 (en) 1993-07-15 2009-10-13 Renesas Technology Corp. Fabrication system and fabrication method
WO2013105295A1 (en) * 2012-01-10 2013-07-18 株式会社日立ハイテクノロジーズ Vacuum processing device

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