JPH036912A - Surface acoustic wave element - Google Patents
Surface acoustic wave elementInfo
- Publication number
- JPH036912A JPH036912A JP14183289A JP14183289A JPH036912A JP H036912 A JPH036912 A JP H036912A JP 14183289 A JP14183289 A JP 14183289A JP 14183289 A JP14183289 A JP 14183289A JP H036912 A JPH036912 A JP H036912A
- Authority
- JP
- Japan
- Prior art keywords
- surface acoustic
- acoustic wave
- piezoelectric substrate
- comb
- air gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000012212 insulator Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 9
- 238000003780 insertion Methods 0.000 abstract description 4
- 230000037431 insertion Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910012463 LiTaO3 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
弾性表面波素子の構造に関し、
弾性表面波素子の電極の質量効果をなくし、帯域内特性
やスプリアス特性を向上させることを目的とし、
圧電体基板と、前記圧電体基板の上方に、エアギャップ
を介して配設された櫛形!極と、前記櫛形電極を支持す
る非圧電体からなる絶縁体ブリッジとを少なくとも備え
、前記櫛形電極により、前記エアギャップを介して前記
圧電体基板における弾性表面波の励振あるいは受信を行
なうように弾性表面波素子を構成する。[Detailed Description of the Invention] [Summary] Regarding the structure of a surface acoustic wave device, the purpose is to eliminate the mass effect of the electrodes of the surface acoustic wave device and improve the in-band characteristics and spurious characteristics, and the present invention includes a piezoelectric substrate and the above-mentioned. A comb shape placed above the piezoelectric substrate through an air gap! and an insulator bridge made of a non-piezoelectric material that supports the comb-shaped electrode, the comb-shaped electrode is configured to excite or receive surface acoustic waves in the piezoelectric substrate via the air gap. Configure a surface wave element.
本発明は弾性表面波素子、とくに、その励振および受信
電極の構成に関する。The present invention relates to a surface acoustic wave device, and in particular to configurations of excitation and reception electrodes thereof.
近年、情報処理機器や通信機器の高速化にともなって、
搬送波や信号波の周波数帯は益々高周波域にシフトして
きており、それに対応して高周波における安定度の高い
基準信号の発生や1位相同期用の素子、あるいは、フィ
ルタなどが必要となり、最近はこれらの用途に弾性表面
波素子、たとえば、弾性表面波フィルタや弾性表面波共
振子が使用されるようになってきた。In recent years, with the increase in speed of information processing equipment and communication equipment,
The frequency bands of carrier waves and signal waves are increasingly shifting to higher frequencies, and correspondingly, it is necessary to generate highly stable reference signals at high frequencies, elements for single-phase synchronization, filters, etc. Surface acoustic wave devices, such as surface acoustic wave filters and surface acoustic wave resonators, have come to be used for applications such as surface acoustic wave filters and surface acoustic wave resonators.
今後、その小形、安価という特徴を生かして、自動車電
話、携帯電話などの移動体無線への展開が期待されてお
り、より一層の高周波化と帯域特性や電力特性の優れた
弾性表面波素子の開発が求められている。In the future, by taking advantage of its small size and low cost, it is expected that it will be used in mobile radio applications such as car phones and mobile phones. development is required.
弾性表面波素子、たとえば、弾性表面波フィルタは、電
気−機械結合係数が大きく、しかも周波数の温度係数が
比較的小さい基板、たとえば、36゜回転VカットーX
伝播LiTaO5(36°Y −X LiTa0s)単
結晶基板の上に、励振および受信用の櫛型電極を設けた
3端子あるいは4端子型素子である。A surface acoustic wave element, for example, a surface acoustic wave filter, uses a substrate having a large electro-mechanical coupling coefficient and a relatively small temperature coefficient of frequency, for example, a 36° rotation V cut-X.
It is a three-terminal or four-terminal device in which comb-shaped electrodes for excitation and reception are provided on a propagation LiTaO5 (36° Y −X LiTa0s) single crystal substrate.
櫛型電極の櫛歯の巾(L)、櫛歯間のスペース(S)。The width of the comb teeth (L) of the comb-shaped electrode, and the space between the comb teeth (S).
櫛歯ビ、ツチ(P)は表面波の波長をλとすると、通常
、L =S−λ/4.P=λ/2といった設計値のもの
が多い、たとえば、中心周波数835MHzを得るため
には、前記基板1のX伝播表面波の音速4090m/s
からλ=4.9μmが算出され、電極ピッチは2.45
μm、電極巾および電極間隔は1.23μmとなる。When the wavelength of the surface wave of a comb-teeth (P) is λ, usually L = S - λ/4. There are many design values such as P=λ/2. For example, in order to obtain a center frequency of 835 MHz, the sound velocity of the X-propagating surface wave of the substrate 1 is 4090 m/s.
λ = 4.9 μm is calculated, and the electrode pitch is 2.45
μm, electrode width and electrode spacing are 1.23 μm.
第3図は従来の弾性表面波素子の構成の2つの例を示す
図で、同図(イ)は従来例の斜視図、同図(ロ)は従来
例のA−A’断面図、同図(ハ)は他の従来例の^−^
°断面図である。図中、100”は圧電体基板で、たと
えば、36’ Y −X LiTa0n板である。11
0は励振用櫛形電極、111および112はそのリード
導出部、120は受信用櫛形電極、121および122
はそのリード導出部である。FIG. 3 is a diagram showing two examples of the configuration of a conventional surface acoustic wave element, in which (a) is a perspective view of the conventional example, and (b) is a sectional view taken along line A-A' of the conventional example; Figure (c) is another conventional example ^-^
It is a sectional view. In the figure, 100" is a piezoelectric substrate, for example, a 36' Y-X LiTa0n plate. 11
0 is a comb-shaped electrode for excitation, 111 and 112 are lead-out portions thereof, 120 is a comb-shaped electrode for reception, 121 and 122
is its lead derivation part.
これら電極の材料にはAuのような電気抵抗の小さい金
属が好ましいが、密度の高い金属は表面波振動に対する
質量効果によって、帯域内リップル特性や挿入損失特性
への悪影響が生じる。このため通常は軽いAf(あるい
はAf金合金を用い、なおかつ、100〜150nmと
薄い膜を蒸着などにより被着している。As the material for these electrodes, metals with low electrical resistance such as Au are preferable, but metals with high density have an adverse effect on the in-band ripple characteristics and insertion loss characteristics due to the mass effect on surface wave vibration. For this reason, a light film of Af (or Af gold alloy) is usually used, and a thin film of 100 to 150 nm is deposited by vapor deposition or the like.
同図(ロ)の断面図に示した従来例は、圧電体基板10
0の表面に櫛型電極110および120を直接に密着形
成した最も一般的な表面波フィルタの電極構成法である
。In the conventional example shown in the cross-sectional view of FIG.
This is the most common electrode construction method for surface wave filters, in which comb-shaped electrodes 110 and 120 are directly and tightly formed on the surface of a surface wave filter.
一方、同図(ハ)の断面図に示した他の従来例は、圧電
体基板100の表面と櫛型電極110および120の間
に非圧電体からなる絶縁層101を介在させた電極構成
をとっている。このような構成の例として最もよく知ら
れている辺は、LiTa0=を圧電体基板100として
用いた場合の絶縁層101として厚さ数μmの二酸化シ
リコン(Sing)膜を介在させた例で、Sin、膜の
表面波伝播速度の温度係数がLiTa0zのそれと寺逆
符号であり、周波数温度特性の改善を行なうために提案
された素子構成である(たとえばIEELI975 U
ltrasonics SycsposiutsPro
ceedings、pp 503〜5Q7.5ept、
、1975参照)。On the other hand, another conventional example shown in the cross-sectional view of FIG. I'm taking it. The most well-known example of such a configuration is an example in which a silicon dioxide (Sing) film with a thickness of several μm is interposed as the insulating layer 101 when LiTa0= is used as the piezoelectric substrate 100. The temperature coefficient of the surface wave propagation velocity of the film is of the opposite sign to that of LiTa0z, and this is an element configuration proposed to improve the frequency-temperature characteristics (for example, IEELI975 U
ltrasonics SycsposiutsPro
ceedings, pp 503-5Q7.5ept,
, 1975).
しかし、上記従来例では、軽いAIlとはいえ櫛形電極
の重量が、直接あるいは5i02膜を介して、圧電体表
面にかかっており、質量効果は影響している。とくに、
最近のGHz帯近傍で使用する表面波素子では、その影
響がますます問題となっており、その解決が必要であっ
た。However, in the conventional example described above, although the AII is light, the weight of the comb-shaped electrode is applied to the surface of the piezoelectric body either directly or through the 5i02 film, and the mass effect has an influence. especially,
In recent surface wave devices used in the vicinity of the GHz band, this influence has increasingly become a problem, and a solution to this problem was needed.
上記の課題は、圧電体基板1と、前記圧電体基Filの
上方に、エアギャップ2を介して配設された櫛形電極3
と、前記櫛形電極3を支持する非圧電体からなる絶縁体
ブリッジ4とを少なくとも備え、前記櫛形電極3により
、前記エアギャップを介して前記圧電体基板lにおける
弾性表面波の励振あるいは受信を行なうことを特徴とし
た弾性表面波素子によって解決することができる。The above problem is solved by a piezoelectric substrate 1 and a comb-shaped electrode 3 disposed above the piezoelectric substrate Fil with an air gap 2 in between.
and an insulator bridge 4 made of a non-piezoelectric material that supports the comb-shaped electrode 3, and the comb-shaped electrode 3 excites or receives surface acoustic waves in the piezoelectric substrate l via the air gap. This problem can be solved by a surface acoustic wave element characterized by the following.
本発明の弾性表面波素子は、圧電体基板lと櫛形電極3
との間にエアギャップ2を介在させているので、直接的
にも、また、間接的にも電極の質量が前記圧電体基板1
の表面に伝播する弾性表面波に、何ら影響を与えること
がなく、また、エアギャップ2を設けたため電極材料や
電極厚さに制約がなくなり、を極抵抗を充分小さくする
ことができ、帯域内リップル特性や挿入損失特性などが
改善できるとともに、素子に入力できる電力も増加させ
ることが可能となる。The surface acoustic wave element of the present invention includes a piezoelectric substrate l and a comb-shaped electrode 3.
Since the air gap 2 is interposed between the piezoelectric substrate 1 and the piezoelectric substrate 1, the mass of the electrode is directly and indirectly
In addition, since the air gap 2 is provided, there are no restrictions on the electrode material or electrode thickness, and the polar resistance can be made sufficiently small. Ripple characteristics, insertion loss characteristics, etc. can be improved, and the power that can be input to the element can also be increased.
〔実施例]
第1図は本発明の実施例の構成を示す図で、同図(イ)
は斜視図、同図(ロ)はA−A“断面図、同図(ハ)は
x−x’矢視図である。[Embodiment] FIG. 1 is a diagram showing the configuration of an embodiment of the present invention, and FIG.
1 is a perspective view, (b) is a sectional view taken along line A-A, and (c) is a view taken along line xx'.
図中、1は圧電帯基板で、たとえば、36°Y −X
LiTaO3板である。2はエアギャップ、3a、3b
はそれぞれ励振用および受信用の櫛形電極、3L32は
それぞれのリード導出部、4は絶縁体ブリッジ、5は絶
縁体ブリッジ4に明けられた開口部である。In the figure, 1 is a piezoelectric band substrate, for example, 36°Y −X
It is a LiTaO3 plate. 2 is air gap, 3a, 3b
are comb-shaped electrodes for excitation and reception, respectively, 3L32 is a lead lead-out portion, 4 is an insulator bridge, and 5 is an opening made in the insulator bridge 4.
図かられかるように、リード導出部31.32は圧電体
基Fi1の上に直接固着されており、これに対して櫛形
電i3a、3bの部分は絶縁体ブリッジ4の裏面に懸垂
されるごとくに固着され、圧電体基Fi1との間にエア
ギャップ2を形成している。As can be seen from the figure, the lead lead-out portions 31 and 32 are directly fixed on the piezoelectric base Fi1, whereas the comb-shaped electrodes i3a and 3b are suspended on the back surface of the insulator bridge 4. The air gap 2 is formed between the piezoelectric substrate Fi1 and the piezoelectric substrate Fi1.
次に、上記実施例装置を構成するための製造工程の具体
例を工程を追って説明する。Next, a specific example of the manufacturing process for constructing the above embodiment device will be explained step by step.
第2図は本発明の弾性表面波素子の製造工程の実施例を
示す図である。FIG. 2 is a diagram showing an embodiment of the manufacturing process of the surface acoustic wave device of the present invention.
工程(1):厚さ0.35mmの36°’l −X L
iTa0.板の表面を平滑に研磨する。Process (1): 36°'l-XL with a thickness of 0.35mm
iTa0. Polish the surface of the board smooth.
工程(2):前記処理済基板の表面にスペース材6を厚
さS/10.すなわち、λ/40前後に、たとえば、中
心周波数835MHzの表面波フィルタの場合には、約
50〜150nm程度に、弾性表面波の伝播領域をカバ
ーするように被着する。その材料はあとで選択エツチン
グにより除去できるように、たとえば、ポリシリコンを
スパッタリングあるいはCVD法などで膜形成し、ホト
エツチング法で領域形成を行なう。Step (2): Spread a spacer material 6 on the surface of the treated substrate to a thickness of S/10. That is, it is deposited around λ/40, for example, in the case of a surface acoustic wave filter with a center frequency of 835 MHz, about 50 to 150 nm to cover the propagation region of surface acoustic waves. For example, a film of polysilicon is formed by sputtering or CVD, and a region is formed by photoetching so that the material can be removed later by selective etching.
工程(3):前記処理済基板の上に電極金属膜30゜た
とえば、厚さ2μmの^Uを電子ビーム蒸着法で被着す
る。Step (3): An electrode metal film 30°, for example, 2 μm thick, is deposited on the treated substrate by electron beam evaporation.
工程(4):前記処理済基板の電極金属膜30を公知の
ホトエツチング法、あるいは、イオンエツチング法によ
り、櫛形電極3a、3b 、リード導出部31.32な
どをパターン形成する。Step (4): Patterning of the comb-shaped electrodes 3a, 3b, lead lead-out portions 31, 32, etc. is performed on the electrode metal film 30 of the treated substrate by a known photoetching method or ion etching method.
工程(5):前記処理済基板の櫛形電極3a、3bの全
てと、リード導出部31.32の一部を覆うように絶縁
膜40を、たとえば、前記ポリシリコン膜の選択エツチ
ング液に強い530g膜を約5μmの厚さに蒸着する。Step (5): Cover all of the comb-shaped electrodes 3a, 3b of the processed substrate and part of the lead lead-out portions 31, 32 with an insulating film 40 of, for example, a 530 g film that is resistant to the selective etching solution for the polysilicon film. The film is deposited to a thickness of approximately 5 μm.
工程(6):前記処理済基板の櫛形電極3aと3bの中
間のStagからなる絶縁膜40に、電極部にかからな
い程度の適度の大きさの開口部5を、たとえば、CF4
の中でイオンエツチングにより形成する。Step (6): An opening 5 of an appropriate size that does not cover the electrode part is formed in the insulating film 40 made of Stag between the comb-shaped electrodes 3a and 3b of the processed substrate, for example, with CF4.
It is formed by ion etching in a chamber.
工程(カニ前記処理済基板の開口部5および両側の側面
部のスペース材6の露出部分から、選択エツチング、た
とえば、EPW液(エチレンジアミン+ピテカロール士
水)または80’CのKOH溶液の中で、ポリシリコン
のスペース材6だけを選択的に溶解除去する。Process (selective etching from the exposed parts of the opening 5 and the spacer 6 on both sides of the treated substrate, for example, in an EPW solution (ethylenediamine + pitecarol water) or a KOH solution at 80'C, Only the polysilicon space material 6 is selectively dissolved and removed.
かくして、ポリシリコンのスペース材6の部分が厚さ約
50〜150nmのエアギャップ2として残り、櫛形電
極3a、3bは空中に浮いた状、態となり、圧電体基板
lには全(質量効果を及ぼさない本発明の弾性表面波素
子が形成される。In this way, the polysilicon space material 6 remains as an air gap 2 with a thickness of about 50 to 150 nm, the comb-shaped electrodes 3a and 3b are suspended in the air, and the piezoelectric substrate 1 has a total (mass effect). A surface acoustic wave element of the present invention is formed which has no effect on the surface acoustic wave.
なお、本発明におけるエアギャップ2は、等角写像法に
よる電界分布の計算から、λ/40程度であれば、弾性
表面波の励振電力が充分に入力でき、また、同様に受信
電極から電気信号への変換が可能である。It should be noted that if the air gap 2 in the present invention is about λ/40 from the calculation of the electric field distribution using the conformal mapping method, the excitation power of the surface acoustic wave can be inputted sufficiently, and the electric signal from the receiving electrode can also be inputted into the air gap 2. It is possible to convert to
以上の製造工程は一実施例を示したもので、他の材料、
あるいはそれらの組み合わせ、また、膜形成技術につい
ても他の方法を適宜用いて、同様に本発明の弾性表面波
素子を構成してもよいことは勿論である。The above manufacturing process shows one example, and other materials,
It goes without saying that the surface acoustic wave device of the present invention may be similarly constructed by using a combination thereof or using other film forming techniques as appropriate.
また、上記実施例では弾性表面波フィルタの場合を示し
たが、その他表面波共振子や遅延素子なども、本発明が
同様に適用できることはいうまでもない。Furthermore, although the above-described embodiments show the case of a surface acoustic wave filter, it goes without saying that the present invention can be similarly applied to other surface acoustic wave resonators, delay elements, and the like.
以上述べたように、本発明による弾性表面波素子は、圧
電体基板1と櫛形電極3との間にエアギャップ2を介在
させであるので、直接的にも、また、間接的にも電極の
質量が前記圧電体基板10表面に伝播する弾性表面波に
、何ら影響を与えることがなく、また、エアギャップ2
を設けたため電極材料や電極厚さに制約がなくなり、電
極抵抗を充分小さくすることができ、帯域内リップル特
性や挿入損失特性、あるいは耐電力性など弾性表面波素
子の性能2品質の向上に寄与するところが極めて大きい
。As described above, in the surface acoustic wave element according to the present invention, since the air gap 2 is interposed between the piezoelectric substrate 1 and the comb-shaped electrode 3, the air gap 2 is interposed between the piezoelectric substrate 1 and the comb-shaped electrode 3. The mass does not have any influence on the surface acoustic waves propagating to the surface of the piezoelectric substrate 10, and the air gap 2
This eliminates restrictions on electrode materials and electrode thickness, making it possible to sufficiently reduce electrode resistance and contributing to improvements in the performance and quality of surface acoustic wave devices, such as in-band ripple characteristics, insertion loss characteristics, and power durability. There is a huge amount to do.
31.32 はリート導出部である。31.32 is the REET derivation part.
第1図は本発明の実施例の構成を示す図、第2図は本発
明の弾性表面波素子の製造工程の実施例を示す図、
第3図は従来の弾性表面波素子の構成の2つの例を示す
図である。
図において、
1は圧電体基板、
2はエアギャップ%
3 (3a、3b)は櫛形電極、
4は絶縁体ブリッジ、
5は開口部、
6はポリシリコン膜、
c口)A−A〜所所動0
国lす×−X′矢視図
牽売幌/)デ施例を精A’!示ず図
11 旧FIG. 1 is a diagram showing the configuration of an embodiment of the present invention, FIG. 2 is a diagram showing an embodiment of the manufacturing process of the surface acoustic wave device of the present invention, and FIG. 3 is a diagram showing the configuration of a conventional surface acoustic wave device. FIG. 2 is a diagram showing two examples. In the figure, 1 is a piezoelectric substrate, 2 is an air gap %, 3 (3a, 3b) is a comb-shaped electrode, 4 is an insulator bridge, 5 is an opening, 6 is a polysilicon film, c) A-A ~ location Motion 0 Country lsu ×- Figure 11 Old
Claims (1)
介して配設された櫛形電極(3)と、 前記櫛形電極(3)を支持する非圧電体からなる絶縁体
ブリッジ(4)とを少なくとも備え、前記櫛形電極(3
)により、前記エアギャップ(2)を介して前記圧電体
基板(1)における弾性表面波の励振あるいは受信を行
なうことを特徴とした弾性表面波素子。[Claims] A piezoelectric substrate (1), a comb-shaped electrode (3) disposed above the piezoelectric substrate (1) with an air gap (2) in between, and the comb-shaped electrode (3). and an insulator bridge (4) made of a non-piezoelectric material supporting the comb-shaped electrode (3).
), a surface acoustic wave element is characterized in that surface acoustic waves are excited or received in the piezoelectric substrate (1) via the air gap (2).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14183289A JPH036912A (en) | 1989-06-02 | 1989-06-02 | Surface acoustic wave element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14183289A JPH036912A (en) | 1989-06-02 | 1989-06-02 | Surface acoustic wave element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH036912A true JPH036912A (en) | 1991-01-14 |
Family
ID=15301174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14183289A Pending JPH036912A (en) | 1989-06-02 | 1989-06-02 | Surface acoustic wave element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH036912A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5453652A (en) * | 1992-12-17 | 1995-09-26 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device with interdigital transducers formed on a holding substrate thereof and a method of producing the same |
US5548178A (en) * | 1992-07-08 | 1996-08-20 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric vibrator and manufacturing method thereof |
US5668057A (en) * | 1991-03-13 | 1997-09-16 | Matsushita Electric Industrial Co., Ltd. | Methods of manufacture for electronic components having high-frequency elements |
US5747857A (en) * | 1991-03-13 | 1998-05-05 | Matsushita Electric Industrial Co., Ltd. | Electronic components having high-frequency elements and methods of manufacture therefor |
US7535152B2 (en) | 2005-10-19 | 2009-05-19 | Murata Manufacturing Co., Ltd. | Lamb wave device |
US7642882B2 (en) * | 2006-07-27 | 2010-01-05 | Samsung Electronics Co., Ltd. | Multi-band filter module and method of fabricating the same |
WO2013134077A1 (en) * | 2012-03-06 | 2013-09-12 | Qualcomm Mems Technologies, Inc. | Piezoelectric resonator with airgap |
CN103614937A (en) * | 2013-11-13 | 2014-03-05 | 贵州钢绳股份有限公司 | Method for preliminarily forming strands of triangular strand ropes |
DE112017000383B4 (en) | 2016-01-14 | 2019-10-10 | Topy Kogyo Kabushiki Kaisha | Pushing device and pressing method |
WO2023160905A1 (en) * | 2022-02-23 | 2023-08-31 | Rf360 Singapore Pte. Ltd. | Suspending an electrode structure using a dielectric |
-
1989
- 1989-06-02 JP JP14183289A patent/JPH036912A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5668057A (en) * | 1991-03-13 | 1997-09-16 | Matsushita Electric Industrial Co., Ltd. | Methods of manufacture for electronic components having high-frequency elements |
US5747857A (en) * | 1991-03-13 | 1998-05-05 | Matsushita Electric Industrial Co., Ltd. | Electronic components having high-frequency elements and methods of manufacture therefor |
US5548178A (en) * | 1992-07-08 | 1996-08-20 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric vibrator and manufacturing method thereof |
EP0797300B1 (en) * | 1992-07-08 | 2001-07-25 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric vibrator and manufacturing method thereof |
US5453652A (en) * | 1992-12-17 | 1995-09-26 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device with interdigital transducers formed on a holding substrate thereof and a method of producing the same |
US7535152B2 (en) | 2005-10-19 | 2009-05-19 | Murata Manufacturing Co., Ltd. | Lamb wave device |
US7642882B2 (en) * | 2006-07-27 | 2010-01-05 | Samsung Electronics Co., Ltd. | Multi-band filter module and method of fabricating the same |
US9628048B2 (en) | 2006-07-27 | 2017-04-18 | Samsung Electronics Co., Ltd. | Multi-band filter module and electronic device comprising the same |
WO2013134077A1 (en) * | 2012-03-06 | 2013-09-12 | Qualcomm Mems Technologies, Inc. | Piezoelectric resonator with airgap |
CN103614937A (en) * | 2013-11-13 | 2014-03-05 | 贵州钢绳股份有限公司 | Method for preliminarily forming strands of triangular strand ropes |
DE112017000383B4 (en) | 2016-01-14 | 2019-10-10 | Topy Kogyo Kabushiki Kaisha | Pushing device and pressing method |
WO2023160905A1 (en) * | 2022-02-23 | 2023-08-31 | Rf360 Singapore Pte. Ltd. | Suspending an electrode structure using a dielectric |
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