JPH0359001A - Polymerizable composition - Google Patents
Polymerizable compositionInfo
- Publication number
- JPH0359001A JPH0359001A JP19634089A JP19634089A JPH0359001A JP H0359001 A JPH0359001 A JP H0359001A JP 19634089 A JP19634089 A JP 19634089A JP 19634089 A JP19634089 A JP 19634089A JP H0359001 A JPH0359001 A JP H0359001A
- Authority
- JP
- Japan
- Prior art keywords
- polymerization
- cationically polymerizable
- sulfonium salt
- group
- polymerizable substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 32
- -1 p-methoxybenzyloxycarbonyl Chemical group 0.000 claims abstract description 38
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000000126 substance Substances 0.000 claims abstract description 24
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims abstract description 3
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 claims abstract description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 3
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 claims abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 3
- 125000006678 phenoxycarbonyl group Chemical group 0.000 claims abstract description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims abstract 2
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 claims abstract 2
- 238000006116 polymerization reaction Methods 0.000 claims description 36
- 239000002685 polymerization catalyst Substances 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 230000005855 radiation Effects 0.000 claims description 12
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 230000000977 initiatory effect Effects 0.000 claims 1
- 230000000379 polymerizing effect Effects 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 5
- 238000002156 mixing Methods 0.000 abstract description 2
- 229910017048 AsF6 Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 abstract 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 238000001723 curing Methods 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- 239000003822 epoxy resin Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 125000002091 cationic group Chemical group 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000012662 bulk polymerization Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000002028 premature Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- RQXXCWHCUOJQGR-UHFFFAOYSA-N 1,1-dichlorohexane Chemical compound CCCCCC(Cl)Cl RQXXCWHCUOJQGR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000005349 anion exchange Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical class SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical compound CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- JZMJDSHXVKJFKW-UHFFFAOYSA-M methyl sulfate(1-) Chemical compound COS([O-])(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-M 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-O phenylsulfanium Chemical compound [SH2+]C1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-O 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- JMHCCAYJTTWMCX-QWPJCUCISA-M sodium;(2s)-2-amino-3-[4-(4-hydroxy-3,5-diiodophenoxy)-3,5-diiodophenyl]propanoate;pentahydrate Chemical compound O.O.O.O.O.[Na+].IC1=CC(C[C@H](N)C([O-])=O)=CC(I)=C1OC1=CC(I)=C(O)C(I)=C1 JMHCCAYJTTWMCX-QWPJCUCISA-M 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical class SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical class C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、カチオン重合性組成物、重合触媒および重合
方法に関する。更に詳しくは、カチオン重合性物質を光
、電子線等の放射線および/または熱により短時間に重
合させ、良好な物性をもった硬化物や、実用性のあるカ
チオン重合性ビニル化合物のオリゴマーを得るための重
合組成物、その重合のための触媒および重合方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a cationically polymerizable composition, a polymerization catalyst, and a polymerization method. More specifically, a cationic polymerizable substance is polymerized in a short time by radiation such as light, electron beams, and/or heat to obtain a cured product with good physical properties and a practical oligomer of a cationically polymerizable vinyl compound. The present invention relates to a polymerization composition, a catalyst for the polymerization, and a polymerization method.
[従来の技術および解決すべき問題点]−11’,tに
、カチオン重合性物質、とりわけエポキシ樹脂は、高性
能材料を必要とする種々の用途に使われている。特に、
紫外線等所定の波長の放射線の照射により重合硬化させ
る方法は、短時間で硬化させることが可能で、重合工程
が簡易であるため、各種用途に供せられている。[Prior Art and Problems to be Solved] Cationically polymerizable materials, especially epoxy resins, are used in a variety of applications requiring high performance materials. especially,
A method of polymerization and curing by irradiation with radiation of a predetermined wavelength, such as ultraviolet rays, can be cured in a short time and the polymerization process is simple, so it is used for various purposes.
従来、エポキシ樹脂は硬化剤として活性なアミン含有化
合物やカルボン酸無水物を混入し、2液系で広く利用さ
れている。しかし、これらの硬化剤を用いた2液系は、
完全に成分を混合する必要があり、硬化時間も数時間に
及ぶ。Conventionally, epoxy resins have been mixed with active amine-containing compounds and carboxylic acid anhydrides as curing agents, and have been widely used in two-component systems. However, two-component systems using these curing agents,
The ingredients must be thoroughly mixed and the curing time can extend to several hours.
エポキシ樹脂を1液系として硬化するのにフッ化ホウ素
−モノエチルアミンの系があるが、これは160℃ある
いはそれ以上の温度でも1〜8時間を要している。この
改良として米国特許3565861号が挙げられるが、
やはり高温を必要としている。従ってこれらの組成物は
、熱に敏感な電子部品等の被覆には使用できない。There is a boron fluoride-monoethylamine system for curing epoxy resin as a one-component system, but this takes 1 to 8 hours even at a temperature of 160 DEG C. or higher. As an example of this improvement, U.S. Patent No. 3,565,861 can be cited.
It still requires high temperatures. Therefore, these compositions cannot be used to coat heat-sensitive electronic components and the like.
更に、光によりエポキシ樹脂を硬化させるのに金属ハロ
ゲン化合物アリールジアゾニウム塩が提案されている。Furthermore, metal halide aryldiazonium salts have been proposed for curing epoxy resins with light.
しかし、これらは、急速に重合し、また早過ぎるゲル化
を受は易く、そのため暗所においてさえ寸時も満足に貯
蔵できない組成物になってしまうことが予想される。金
属ハロゲン化物アリールジアゾニウム塩を含有するエポ
キシ材料に、その組成物の早過ぎるゲル化を抑制し、ま
た暗所における貯蔵性を与えることが提案されたが、コ
ストが増大し、また全く満足すべき結果は得られていな
い。However, these are expected to polymerize rapidly and be susceptible to premature gelation, resulting in compositions that cannot be stored satisfactorily even in the dark. It has been proposed to provide epoxy materials containing metal halide aryl diazonium salts to inhibit premature gelling of the composition and also to provide storage stability in the dark, but this increases cost and is not entirely satisfactory. No results have been obtained.
また、これら組成物は、硬化中に窒素が放出されるため
、これにより得られる硬化物質が好ましくない気胞を含
むという問題がある。These compositions also suffer from the problem that nitrogen is released during curing and the resulting cured material contains undesirable air vesicles.
ところで、オニウム塩については種々の光分解性スルホ
ニウム塩が公知である。例えば特開昭54−53181
号にはp−ヒドロキシフェニルジメヂルスルホニウム
へキサフルオロアルセネート類を光硬化剤とすることが
、また特開昭50−1 5 19 9 7号においては
、フェニルスルホニウム塩をエポキシ用光硬化剤とする
ことが知られている。しかし、これらは光による硬化に
関する開示であり、熱硬化に関する開示はない。By the way, various photodegradable sulfonium salts are known as onium salts. For example, JP-A-54-53181
No. p-hydroxyphenyl dimedyl sulfonium
It is known to use hexafluoroarsenates as a photocuring agent, and in JP-A-50-151997, it is known to use phenylsulfonium salts as a photocuring agent for epoxy. However, these are disclosures regarding curing by light, and there is no disclosure regarding curing by heat.
一方、熱を加えることによりオニウム塩を活性化させ、
エポキシ樹脂を硬化させることのできる熱潜在性触媒に
ついて、特開昭58−37003号や特開昭63−22
3002号にはジアルキルベンジルスルホニウム ヘキ
サフルオロアンデモネート塩のごときベンジルスルホニ
ウム塩が、特開昭56−152833号にはトリアルキ
ル型のスルホニウム塩が報告されている。しかし、この
スルホニウム塩はエポキシ樹脂を硬化させるのに150
°C以上を必要とするなど、加熱時間、温度とも実用的
とはいえない。On the other hand, the onium salt is activated by applying heat,
JP-A-58-37003 and JP-A-63-22 regarding thermally latent catalysts that can cure epoxy resins.
No. 3002 reports benzylsulfonium salts such as dialkylbenzylsulfonium hexafluoroandemonate salts, and JP-A-56-152833 reports trialkyl-type sulfonium salts. However, this sulfonium salt requires 150% to cure the epoxy resin.
Both heating time and temperature are not practical, such as requiring a heating temperature of .degree. C. or higher.
また、これら脂肪族あるいは脂環式スルホニウム塩の出
発原料であるスルフィド類は、一般に特有の悪臭を有し
ており工業的製造において問題となるばかりか硬化物に
も臭気が残る。Furthermore, sulfides, which are the starting materials for these aliphatic or alicyclic sulfonium salts, generally have a characteristic bad odor, which not only poses a problem in industrial production, but also leaves the odor in the cured product.
また、スピロ型エステルのごとき特殊エステルについて
は特開昭60−188425号にその加熱重合に関する
硬化剤が開示されている。Furthermore, for special esters such as spiro-type esters, a curing agent for thermal polymerization thereof is disclosed in JP-A-60-188425.
一方、カチオン重合性ビニル化合物のカチオン重合触媒
としては、鉱酸、BF3.ZnC1z。On the other hand, examples of cationic polymerization catalysts for cationically polymerizable vinyl compounds include mineral acids, BF3. ZnC1z.
AlCl3などのルイス酸型触媒や、AlR2C1゜A
I RC12といったハロゲン含有有機アルミニウム
化合物などが公知である。しかしながら、これら触媒は
0℃以上の温度ではカチオン重合反応があまりにも激し
く、重合反応の調整が思うように制御できず重合度が高
まらない。もちろん、カチオン重合性モノマーとこれら
触媒をあらかじめ室温で一液化し、保存することも不可
能である。Lewis acid type catalysts such as AlCl3, AlR2C1゜A
Halogen-containing organoaluminum compounds such as IRC12 are known. However, these catalysts undergo too vigorous a cationic polymerization reaction at temperatures above 0° C., making it impossible to control the polymerization reaction as desired and preventing the degree of polymerization from increasing. Of course, it is also impossible to prepare the cationically polymerizable monomer and these catalysts into one liquid at room temperature and then store the mixture.
ビニル化合物を重合させようとすると、連鎖移動反応や
停止反応を制御する必要があり、通常、適当な溶媒に溶
解したカチオン重合性モノマーを所定の極低温まで冷却
した後に、触媒液が仕込まれ重合反応が行われる。しか
し、重合反応を工業的に極めて低温(例えば−130〜
−40°C)で行うためには、低温の冷媒を使用する必
要があるため操作が煩雑であり、また冷却費用がかさむ
など決して満足すべき方法とはいえない。When trying to polymerize vinyl compounds, it is necessary to control chain transfer reactions and termination reactions. Usually, a cationically polymerizable monomer dissolved in an appropriate solvent is cooled to a predetermined cryogenic temperature, and then a catalyst solution is added to initiate polymerization. A reaction takes place. However, the polymerization reaction is industrially carried out at extremely low temperatures (e.g. -130 to
-40°C), it is necessary to use a low-temperature refrigerant, which makes the operation complicated and increases the cooling cost, which is not a satisfactory method.
[発明の目的]
本発明の目的は、放射線および/または熱でエポキシ樹
脂などのカチオン重合性物質を重合することができ、か
つまた、室温での貯蔵安定性に優れ、封止剤、腹合材用
マトリックス樹脂などに利用されるカチオン重合性組成
物を提供し、その重合の方法、重合用の触媒を提案する
ことにある。[Object of the Invention] An object of the present invention is to be able to polymerize cationic polymerizable substances such as epoxy resins with radiation and/or heat, to have excellent storage stability at room temperature, and to be able to polymerize cationically polymerizable substances such as epoxy resins with radiation and/or heat, and to have excellent storage stability at room temperature, and to The purpose of this invention is to provide a cationic polymerizable composition that can be used as a matrix resin for materials, and to propose a polymerization method and a catalyst for the polymerization.
または、スチレンなどのカチオン重合性ビニル化合物を
一定の条件のもとに重合させるとともに、重合触媒との
混合物との貯蔵安定性に1憂れな七ツマー組成物を提供
するとともに、実用性のあるビニル1ヒ合物のオリゴマ
ーを工業的に提供し、その重合の方法、重合用の触媒を
提案することにある。Alternatively, it is possible to polymerize a cationically polymerizable vinyl compound such as styrene under certain conditions, provide a seven-mer composition with poor storage stability when mixed with a polymerization catalyst, and provide a practical composition. The purpose of this project is to provide industrially available vinyl monomer oligomers, and to propose methods for their polymerization and catalysts for the polymerization.
[問題点を解決するための手段]
本発明者らは、前記したような問題点を解決すべく鋭意
研究を重ねた結果、本発明に至った。[Means for Solving the Problems] The present inventors have conducted intensive research to solve the above-mentioned problems, and as a result, they have arrived at the present invention.
即ち、本発明は、カチオン重合性物質と、これを放射線
および/または熱により重合させることのできる下記一
般式[I1カチオン重合性物質を含む重合性組成物、お
よび下記−殺伐[I]を主成分とする重合触媒、更には
重合方法に関する。That is, the present invention provides a polymerizable composition containing a cationic polymerizable substance, a cationically polymerizable substance of the following general formula [I1] which can be polymerized by radiation and/or heat, and The present invention relates to a polymerization catalyst as a component and a polymerization method.
る。Ru.
R1ニアセチル基、メトキシカルボニル基。R1 niacetyl group, methoxycarbonyl group.
エトキシカルボニル基、ベンジルホキジカルボニル基、
ベンゾイル基、フェノキシカルボニル基、p−メトキシ
ベンジルオキシカルボニル基、9−フルオレニルメトキ
シカルボニル基のいずれかである。Ethoxycarbonyl group, benzylhokidicarbonyl group,
It is any one of a benzoyl group, a phenoxycarbonyl group, a p-methoxybenzyloxycarbonyl group, and a 9-fluorenylmethoxycarbonyl group.
R2,R,:それぞれ独立して水素、ハロゲン。R2, R,: each independently hydrogen and halogen.
C1〜C4のアルキル基のいずれかで ある。Any of C1 to C4 alkyl groups be.
R,1,Rt、:それぞれ独立してメチル基、エチル基
のいずれかである。R, 1, Rt: Each independently represents either a methyl group or an ethyl group.
X : SbF6.AsF+;、PFr、、のいずれ
かである。X: SbF6. AsF+;, PFr, .
[発明の構成]
本発明の重合触媒は、ジアルキル−4−置換オキシフェ
ニル スルホニウム化合物と所定の陰イオンとの対の化
合物であり、これらを構成要件としている。[Structure of the Invention] The polymerization catalyst of the present invention is a compound of a dialkyl-4-substituted oxyphenyl sulfonium compound and a predetermined anion, and has these as constituent elements.
また、本発明に使用されるカチオン重合性物質とは、酸
重合性または酸硬化性物質、とりわけエポキシ樹脂が好
ましく用いられる。適当な物質の例は、エポキシド単量
体類、エビサルファイド単量体類、ポリエポキシド類(
あるいはエポキシ樹脂)、ポリエビザルファイド類(あ
るいはエビーリ゛ルファイド樹脂)、フェノール/ホル
ムアルデヒド樹脂、メラミン/ホルムアルデヒド樹脂、
尿素/ホルムアルデヒド樹脂、スピロオルトエステル、
ビシクロオルソエステル、スピロオルトカーボネートの
ような環状エーテルおよび環状チオニーデル(エポキシ
ドおよびエビサルファイド以外のもの)およびそれらの
重合体、ラクトン、スチレン、ビニルエーテルおよびビ
ニルチオエーテルならびに、酸により処理されたとき樹
脂を交叉結合または硬化させる交叉結合剤を含有する樹
脂であり、単独でも2種類以上の混合でもかまわない。The cationic polymerizable substance used in the present invention is preferably an acid polymerizable or acid curable substance, especially an epoxy resin. Examples of suitable materials are epoxide monomers, evisulfide monomers, polyepoxides (
or epoxy resin), polyevisulfides (or ebylyl sulfide resin), phenol/formaldehyde resin, melamine/formaldehyde resin,
Urea/formaldehyde resin, spiro orthoester,
Bicycloorthoesters, cyclic ethers and cyclic thionidels (other than epoxides and evisulfides) such as spiroorthocarbonates and their polymers, lactones, styrenes, vinyl ethers and vinyl thioethers, and cross-linking resins when treated with acids. Alternatively, it is a resin containing a cross-linking agent to be cured, and it may be used alone or in combination of two or more types.
[作用]
このような本発明の重合触媒として使用されるスルホニ
ウム塩は前述のとおりであり、このスルホニウム塩は、
対応する4−(置換オキシフェニルアルキルスルフィド
をアルキル硫酸と反応させ、メチル硫酸イオンを有する
スルホニウム塩を合成し、しかる後に所定の錯塩と陰イ
オン交換を行うことで高収率に得られる。[Function] The sulfonium salt used as the polymerization catalyst of the present invention is as described above, and this sulfonium salt has the following properties:
A high yield can be obtained by reacting the corresponding 4-(substituted oxyphenylalkyl sulfide with an alkyl sulfate to synthesize a sulfonium salt having a methyl sulfate ion, and then performing anion exchange with a predetermined complex salt.
本発明におけるスルホニウム塩として好ましいのは、4
−アセトキシフエニルジメチルスルホニウム へキサフ
ルオロアンチモネート、4−アセトキシフェニルジメチ
ルスルポニウム へキサフルオロアルセネート、ジメチ
ル−4−(ベンジルオキシカルボニルオキシ)フェニル
スルホニウムへキザフルオロアンチモネート、ジエチル
−4−(ベンジルオキシカルボニルオキシ)フェニルス
ルホニウム へキサフルオロホスフェート。Preferred sulfonium salts in the present invention are 4
-acetoxyphenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, dimethyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate, diethyl-4-(benzyl Oxycarbonyloxy)phenylsulfonium hexafluorophosphate.
ジメチル−4−(ベンゾイルオキシ)フェニルスルホニ
ウム ヘキサフルオロアンチモネート、−ジメチル−4
−(ベンゾイルオキシ)フェニルスルホニウム へキサ
フルオロアセネート、ジメチル−4−(p−メトキシベ
ンジルオキシカルボニルオキシ)フェニルスルホニウム
へキサフルオロアンチモネート、ジメチル−4−(フ
ェノキシカルボニルオキシ)フェニルスルホニウム へ
キザフルオロアルセネート、ジメチル−4−(9−フル
オレニルメトキシカルボニルオキシ)フェニルスルホニ
ウム へキサフルオロホスフェ−ト。Dimethyl-4-(benzoyloxy)phenylsulfonium hexafluoroantimonate, -dimethyl-4
-(benzoyloxy)phenylsulfonium hexafluoroacenate, dimethyl-4-(p-methoxybenzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate, dimethyl-4-(phenoxycarbonyloxy)phenylsulfonium hexafluoroarsenate , dimethyl-4-(9-fluorenylmethoxycarbonyloxy)phenylsulfonium hexafluorophosphate.
ジメチル−2−クロロ−4−(ベンジルオキシカルボニ
ルオキシ)フェニルスルホニウム へキサフルオロアン
チモネート、ジメチル−3−メチル−4−(ベンジルオ
キシカルボニルオキシ)フェニルスルホニウム へキザ
フルオロアンチモネート、ジメチル−3−クロロ−4−
アセトキシフェニルスルホニウム ヘキサフルオロアン
チモネート等が挙げられる。Dimethyl-2-chloro-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate, dimethyl-3-methyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate, dimethyl-3-chloro- 4-
Examples include acetoxyphenylsulfonium hexafluoroantimonate.
本発明において使用されるスルフ1;ニウム塩は、熱に
対して活性を上げるだけでなく、光、電子線などの放射
線に対しても活性がある。すなわち、熱または放射線で
励起されたこれらスルホニウム塩は、アシルカチオンを
放出し、前述のカチオン重合性物質の重合を進行させる
と考えられる。The sulfur-1;nium salt used in the present invention not only increases its activity against heat, but also has activity against radiation such as light and electron beams. That is, it is thought that these sulfonium salts excited by heat or radiation release acyl cations and promote polymerization of the above-mentioned cationic polymerizable substance.
また本発明において、カチオン重合性物質がビニル化合
物の場合は、重合反応に際して通常、触媒、モノマーな
どに不活性な溶媒を用いた溶液重合が行われるが、場合
によっては塊状重合も行われる。溶媒としては、例えば
、トルエン、ベンゼン、キシレンのような芳香族炭化水
素類、n −ヘキサン、n−へブタンのような脂肪族炭
化水素−類、ジクロヘキサンのような脂環式炭化水素類
、石油エーテル、リグロインのような炭化水素混合物類
、クロルベンゼン、ジクロルエタンのようなハロゲン化
炭化水素類などが使用でき、また、これらビニル化合物
の重合反応は常圧または加圧下で行われ、反応温度は8
0°C以上の温度、好ましくは100〜150°Cであ
る。Further, in the present invention, when the cationically polymerizable substance is a vinyl compound, solution polymerization using an inert solvent for the catalyst, monomer, etc. is usually performed during the polymerization reaction, but bulk polymerization is also performed in some cases. Examples of the solvent include aromatic hydrocarbons such as toluene, benzene, and xylene; aliphatic hydrocarbons such as n-hexane and n-hebutane; alicyclic hydrocarbons such as dichlorohexane; Hydrocarbon mixtures such as petroleum ether and ligroin, halogenated hydrocarbons such as chlorobenzene and dichloroethane, etc. can be used, and the polymerization reaction of these vinyl compounds is carried out under normal pressure or increased pressure, and the reaction temperature is 8
The temperature is 0°C or higher, preferably 100-150°C.
また、本発明において重合触媒として使用されるスルホ
ニウム塩は室温ではカチオン重合反応を開始しないため
、必要によってはあらかじめモノマーと触媒を適当な溶
媒を用いて一液化し、保存しておくことも可能である。Furthermore, since the sulfonium salt used as a polymerization catalyst in the present invention does not initiate a cationic polymerization reaction at room temperature, if necessary, it is also possible to prepare the monomer and catalyst in one liquid using an appropriate solvent and store it. be.
本発明に使用されるスルホニウム塩は、樹脂100重量
部に対して0.01〜20重量部、好ましくは0.1〜
5重量部である。0.01重量部より少ないと充分な重
合物が得られない。20重量部を越える添加量では、重
合後の物性において好ましいものが得られず、コストの
面においても好ましくない。また、重合硬化は、放射線
処理または加熱処理により行われ、必要によっては加熱
と放射線照射を併用することも可能である。The sulfonium salt used in the present invention is 0.01 to 20 parts by weight, preferably 0.1 to 20 parts by weight, based on 100 parts by weight of the resin.
5 parts by weight. If it is less than 0.01 part by weight, a sufficient polymer cannot be obtained. If the amount added exceeds 20 parts by weight, favorable physical properties cannot be obtained after polymerization, and it is also unfavorable in terms of cost. Further, polymerization curing is performed by radiation treatment or heat treatment, and heating and radiation irradiation can be used together if necessary.
また、重合時には、必要により溶媒を用いることもでき
る。Further, during polymerization, a solvent can be used if necessary.
本発明による放射線としては、波長250〜400 n
m範囲の紫外線が最も効率よく、そのゆえ、光源として
は、低圧水銀灯、中圧水銀灯、高圧水銀灯、キセノンラ
ンプ、カーボンアーク灯などが挙げられ、さらに電子線
を照射することによっても重合、硬化させることができ
る。The radiation according to the invention has a wavelength of 250 to 400 nm.
Ultraviolet rays in the m range are the most efficient, so light sources include low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, xenon lamps, carbon arc lamps, etc. Polymerization and curing can also be achieved by irradiating electron beams. be able to.
本発明の組成物は、更に場合によっては、増量剤、難燃
剤、静電防止剤、界面活性剤、酸無水物に代表される助
剤等を混合して用いられる。The composition of the present invention may further contain additives such as fillers, flame retardants, antistatic agents, surfactants, and acid anhydrides.
本発明の組成物は、艶出しフェス、インキ、塗料、接着
剤、積層板、プリプレグ、成型材料、封止材料等に使用
できる。The composition of the present invention can be used for polishing surfaces, inks, paints, adhesives, laminates, prepregs, molding materials, sealing materials, and the like.
本発明の硬化性組成物は、室温において長期間保存可能
であり、150℃以下の加熱で速やかに重合を開始する
機能を備え、高温硬化性に優れ、吸湿性がなく、耐水性
、耐薬品性、電気性に優れた硬化物を与える。The curable composition of the present invention can be stored for a long period of time at room temperature, has the ability to quickly start polymerization when heated to 150°C or less, has excellent high temperature curability, is non-hygroscopic, has water resistance, and chemical resistance. Provides a cured product with excellent properties and electrical properties.
また、カチオン重合性ビニル化合物組成物においては、
従来困難であった七ツマ−と触媒の一液化保存、更には
80°C以上でのカチオン重合反応を可能とし、かつ、
簡単な加熱で実用性のある重合度の高い重合体を得るこ
とが可能になった点にある。In addition, in the cationically polymerizable vinyl compound composition,
It is now possible to store the 7-mer and catalyst in one liquid, which was previously difficult, and to perform cationic polymerization reactions at temperatures above 80°C.
The point is that it has become possible to obtain a practical polymer with a high degree of polymerization by simple heating.
[実施例コ
以下実施例にて本発明を詳細にするが、本発明は以下の
みに限定されるものではない。[Example] The present invention will be described in detail in the following examples, but the present invention is not limited to the following examples.
実施例1〜7
フェニルグリシジルエーテル1gに対して、種々のスル
ホニウム塩を0.030g混合、この混合物を脱気封管
し、60℃、140℃でそれぞれ1時間重合させた時の
フェニルグリシジルエーテルの転化率を’H−NMRを
用いて決定した。Examples 1 to 7 0.030 g of various sulfonium salts were mixed with 1 g of phenyl glycidyl ether, this mixture was sealed in a degassed tube, and polymerized at 60°C and 140°C for 1 hour, respectively. Conversion was determined using 'H-NMR.
結果を表1に示す。また、ここで調製した組成物を40
℃で1力月放置したところ、著しい増粘は見られなかっ
た。The results are shown in Table 1. In addition, the composition prepared here was
When it was left at ℃ for 1 month, no significant thickening was observed.
(以下余白)
実施例8
3.9−ジベンジル−1,5,7,11−テトラオキサ
スピロ[5,5]ウンデ°カン0.5gに対して、ジメ
チル−4−(ベンジルオキシカルボニルオキシ)フェニ
ルスルホニウム へキサフルオロアンチモネートを3n
o1%(0,0231g)混合し、脱気、封管した。こ
の混合物を140℃で2時間塊状重合させた。重合後、
’H−NMRスペクトルより転化率99%を確認した。(Left below) Example 8 Dimethyl-4-(benzyloxycarbonyloxy)phenyl to 0.5 g of 3.9-dibenzyl-1,5,7,11-tetraoxaspiro[5,5]undecane Sulfonium hexafluoroantimonate 3n
o1% (0,0231 g) was mixed, degassed, and sealed. This mixture was subjected to bulk polymerization at 140°C for 2 hours. After polymerization,
A conversion rate of 99% was confirmed by 'H-NMR spectrum.
次に、重合物を塩化メチレン2mlで溶解し、ヘキサン
100m1中に注入した。ついでヘキサン不溶部を乾燥
させ、0.45gのポリマーを得な。Next, the polymer was dissolved in 2 ml of methylene chloride and poured into 100 ml of hexane. Then, dry the hexane-insoluble portion to obtain 0.45 g of polymer.
実施例9
精製したスチレン0.5gに対してジメチル−4−(ベ
ンジルオキシカルボニルオキシ)フェニルスルホニウム
へキサフルオロアンチモネート1 mOL’6を混合
し、脱気、封管した。ついで、撹拌下、140°Cで重
合を行った。30分後、固化した反応液を四塩化炭素2
mlで溶解し、この’ H−N M Rスペクトルより
転化率96%を確認した。Example 9 1 mOL'6 of dimethyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate was mixed with 0.5 g of purified styrene, and the mixture was degassed and sealed. Then, polymerization was carried out at 140°C while stirring. After 30 minutes, the solidified reaction solution was diluted with 2 carbon tetrachloride.
ml, and a conversion rate of 96% was confirmed from this 'H-NMR spectrum.
次にメタノール中にこれを注入し、重合を停止させ重合
体を析出させた。精製乾燥した重合体は白色結晶で収率
83%であった。Next, this was poured into methanol to stop polymerization and precipitate a polymer. The purified and dried polymer was white crystals with a yield of 83%.
また、GPC(ポリスチレン換算)によりMn=310
0.Mw/Mn=2.12であり、また熱重合体(ラジ
カル重合体)は含まれなかった。Also, Mn=310 by GPC (polystyrene equivalent)
0. Mw/Mn=2.12, and no thermal polymer (radical polymer) was included.
実施例10〜14
実施例9に準じ種々のスルホニウム塩を用いてスチレン
の重合を行った。結果を表2に示す。Examples 10 to 14 Styrene was polymerized according to Example 9 using various sulfonium salts. The results are shown in Table 2.
(以下余白)
実施例15
実施例9に準じ40℃で60分でスチレンの重合を行っ
たが、転化率は0%であった。(Left below) Example 15 Styrene was polymerized at 40° C. for 60 minutes in accordance with Example 9, but the conversion rate was 0%.
実施例16
精製したスチレン10gとジメチル−4−(ベンジルオ
キシカルボニルオキシ)フェニルスルホニウム へキサ
フルオロアンチモネート0.50gをクロルベンゼン1
00m1で溶解させ、脱気、封管し室温で1か月装置し
たが、スチレンの重合は起こらなかった。Example 16 10 g of purified styrene and 0.50 g of dimethyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate were mixed with 1 gram of chlorobenzene.
The solution was dissolved in 00 ml of water, degassed, sealed, and kept in an apparatus at room temperature for one month, but no styrene polymerization occurred.
実施例17〜22
エピコート828(油化シェルエポキシ製ビスフェノー
ルA型エポキシ樹脂)100重量部と種ノzのスルホニ
ウム塩2重量部からなる配合物を調整し、各々約100
mgをとり、150℃に加熱した熱板上(日、新化学株
式会社製 ゲル化試[’;!?:n GT D
J I S型)でゲル化時間を測定した。結果を表3に
示す。Examples 17-22 A blend consisting of 100 parts by weight of Epicoat 828 (bisphenol A type epoxy resin manufactured by Yuka Shell Epoxy) and 2 parts by weight of a sulfonium salt of Seed No.
Take mg and heat it to 150℃ on a hot plate (Japan, Shin Kagaku Co., Ltd. gelation test [';!?:n GT D
The gelation time was measured using JIS model). The results are shown in Table 3.
(以下余白)
実施例23
実施例10〜14で調製した組成物を40℃で1か月装
置したが、著しい増粘は見られなかった。(The following is a blank space) Example 23 The compositions prepared in Examples 10 to 14 were stored at 40° C. for one month, but no significant thickening was observed.
実施例24〜28
フェニルグリシジルエーテル1.0gに対して種々のス
ルホニウム塩を0.030 g混合した。Examples 24 to 28 0.030 g of various sulfonium salts were mixed with 1.0 g of phenyl glycidyl ether.
この混合物を脱気、封管し、60分光塊状重合を行い、
転化率を’H−NMRより求めた。光源は400W高圧
水銀灯を用い、理工科学産業製のロータリー光科学反応
装置を使用した。重合温度は20’C(水冷下)とした
。結果を表4に示す。This mixture was degassed, sealed, and subjected to bulk polymerization for 60 minutes.
The conversion rate was determined by 'H-NMR. A 400W high-pressure mercury lamp was used as a light source, and a rotary photochemical reaction device manufactured by Rikou Kagaku Sangyo was used. The polymerization temperature was 20'C (under water cooling). The results are shown in Table 4.
(以下余白)
[発明の効果]
以上のとおり本発明に係る所定のスルホニウム塩は、カ
チオン重合性物質の重合触媒として有効であり、これら
を含有する重合組成物は加熱処理による重合方法で重合
、硬化することができる。(The following is a blank space) [Effects of the Invention] As described above, the predetermined sulfonium salts according to the present invention are effective as polymerization catalysts for cationic polymerizable substances, and polymerization compositions containing them can be polymerized by a polymerization method using heat treatment. Can be hardened.
またこの−液化した組成物は混合後も安定であり、室温
での胛蔵性に優れている。よって所期の目的を達成でき
る。Furthermore, this liquefied composition is stable even after mixing and has excellent shelf life at room temperature. Therefore, the intended purpose can be achieved.
Claims (14)
般式[ I ]で示されるスルホニウム塩を含む重合性組
成物。 ▲数式、化学式、表等があります▼[ I ] R_1:アセチル基、メトキシカルボニル基、エトキシ
カルボニル基、ベンジルオキシ カルボニル基、ベンゾイル基、フェノキ シカルボニル基、p−メトキシベンジル オキシカルボニル基、9−フルオレニル メトキシカルボニル基のいずれかである。 R_2、R_3:それぞれ独立して水素、ハロゲン、C
_1〜C_4のアルキル基のいずれかである。 R_4、R_5:それぞれ独立してメチル基、エチル基
のいずれかである。 X:SbF_6、AsF_6、PF_6、のいずれかで
ある。(1) A polymerizable composition containing one or more cationically polymerizable substances and a sulfonium salt represented by the general formula [I]. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [I] R_1: Acetyl group, methoxycarbonyl group, ethoxycarbonyl group, benzyloxycarbonyl group, benzoyl group, phenoxycarbonyl group, p-methoxybenzyloxycarbonyl group, 9-fluorene Any of the nylmethoxycarbonyl groups. R_2, R_3: each independently hydrogen, halogen, C
Any one of _1 to C_4 alkyl groups. R_4, R_5: Each independently represents either a methyl group or an ethyl group. X: One of SbF_6, AsF_6, and PF_6.
物である特許請求の範囲第1項記載の重合性組成物。(2) The polymerizable composition according to claim 1, wherein the cationically polymerizable substance is a compound having an epoxy group.
物である特許請求の範囲第1項記載の重合性組成物。(3) The polymerizable composition according to claim 1, wherein the cationically polymerizable substance is a cationically polymerizable vinyl compound.
、ビシクロオルソエステル基、スピロオルトカーボネー
ト基のいずれかを一種または二種以上有する化合物であ
る特許請求の範囲第1項記載の重合性組成物。(4) The polymerizable composition according to claim 1, wherein the cationically polymerizable substance is a compound having one or more types of spiroorthoester groups, bicycloorthoester groups, and spiroorthocarbonate groups.
[ I ]で示されるスルホニウム塩が、0.01〜20
重量部を添加してなる特許請求の範囲第1項記載の重合
性組成物。(5) The amount of the sulfonium salt represented by the general formula [I] is 0.01 to 20 parts by weight per 100 parts by weight of the cationically polymerizable substance.
The polymerizable composition according to claim 1, wherein parts by weight are added.
されるスルホニウム塩を主成分とするカチオン重合性物
質の重合触媒。(6) A polymerization catalyst for a cationically polymerizable substance containing as a main component a sulfonium salt represented by the general formula [I] according to claim 1.
ルスルホニウムヘキサフルオロアンチモネートである特
許請求の範囲第6項記載の重合触媒。(7) The polymerization catalyst according to claim 6, wherein the sulfonium salt is 4-acetoxyphenyldimethylsulfonium hexafluoroantimonate.
シカルボニルオキシ)フェニルスルホニウムヘキサフル
オロアンチモネートである特許請求の範囲第6項記載の
重合触媒。(8) The polymerization catalyst according to claim 6, wherein the sulfonium salt is dimethyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate.
キシ)フェニルスルホニウムヘキサフルオロアンチモネ
ートである特許請求の範囲第6項記載の重合触媒。(9) The polymerization catalyst according to claim 6, wherein the sulfonium salt is dimethyl-4-(benzoyloxy)phenylsulfonium hexafluoroantimonate.
キシカルボニルオキシ)フェニルスルホニウムヘキサフ
ルオロアンチモネートである特許請求の範囲第6項記載
の重合触媒。(10) The polymerization catalyst according to claim 6, wherein the sulfonium salt is diethyl-4-(benzyloxycarbonyloxy)phenylsulfonium hexafluoroantimonate.
許請求の範囲第1項記載の一般式[ I ]で示されるス
ルホニウム塩の一種または二種以上を触媒として加え、
これを放射線および/または熱により、重合を開始させ
ることを特徴とするカチオン重合性物質の重合方法。(11) adding one or more sulfonium salts represented by the general formula [I] according to claim 1 to one or more cationically polymerizable substances as a catalyst;
A method for polymerizing a cationically polymerizable substance, which comprises initiating polymerization using radiation and/or heat.
記載の重合方法。(12) The polymerization method according to claim 11, wherein the radiation is ultraviolet rays.
る特許請求の範囲第11項記載の重合方法。(13) The polymerization method according to claim 11, wherein the polymerization is carried out at a temperature of 80° C. or higher.
許請求の範囲第1項記載の一般式[ I ]で示されるス
ルホニウム塩を、0.01〜20重量部添加してなる特
許請求の範囲第11項記載の重合方法。(14) A claim in which 0.01 to 20 parts by weight of a sulfonium salt represented by the general formula [I] described in claim 1 is added to 100 parts by weight of a cationically polymerizable substance. The polymerization method according to item 11.
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JP1196340A JP2782093B2 (en) | 1989-07-27 | 1989-07-27 | Polymerizable composition |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006096742A (en) * | 2004-08-31 | 2006-04-13 | Sanshin Chem Ind Co Ltd | Sulfonium compound |
US7358408B2 (en) | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
KR20100036966A (en) * | 2008-09-30 | 2010-04-08 | 도쿄 오카 고교 가부시키가이샤 | Resist composition, method of forming resist pattern, compound and acid generator including the compound |
JP2014185157A (en) * | 2008-09-30 | 2014-10-02 | Tokyo Ohka Kogyo Co Ltd | Compound and acid generator comprising the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240023506A (en) | 2021-06-24 | 2024-02-22 | 가부시키가이샤 아데카 | Epoxy resin composition |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6426550A (en) * | 1987-07-01 | 1989-01-27 | Basf Ag | Sulfonium salt having acid-unstable group |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE3721741A1 (en) | 1987-07-01 | 1989-01-12 | Basf Ag | RADIATION-SENSITIVE MIXTURE FOR LIGHT-SENSITIVE COATING MATERIALS |
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1989
- 1989-07-27 JP JP1196340A patent/JP2782093B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6426550A (en) * | 1987-07-01 | 1989-01-27 | Basf Ag | Sulfonium salt having acid-unstable group |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7358408B2 (en) | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
JP2006096742A (en) * | 2004-08-31 | 2006-04-13 | Sanshin Chem Ind Co Ltd | Sulfonium compound |
KR20100036966A (en) * | 2008-09-30 | 2010-04-08 | 도쿄 오카 고교 가부시키가이샤 | Resist composition, method of forming resist pattern, compound and acid generator including the compound |
JP2014185157A (en) * | 2008-09-30 | 2014-10-02 | Tokyo Ohka Kogyo Co Ltd | Compound and acid generator comprising the same |
Also Published As
Publication number | Publication date |
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JP2782093B2 (en) | 1998-07-30 |
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