JPH0348654A - Compound of sulfonium compound - Google Patents
Compound of sulfonium compoundInfo
- Publication number
- JPH0348654A JPH0348654A JP18340289A JP18340289A JPH0348654A JP H0348654 A JPH0348654 A JP H0348654A JP 18340289 A JP18340289 A JP 18340289A JP 18340289 A JP18340289 A JP 18340289A JP H0348654 A JPH0348654 A JP H0348654A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- sulfonium
- benzyl
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 sulfonium compound Chemical class 0.000 title claims abstract description 77
- 150000001875 compounds Chemical class 0.000 title abstract description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 39
- 238000006243 chemical reaction Methods 0.000 claims abstract description 16
- 239000003960 organic solvent Substances 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 5
- 150000001340 alkali metals Chemical group 0.000 claims abstract description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims abstract description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims abstract description 3
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 claims abstract description 3
- 125000005843 halogen group Chemical group 0.000 claims abstract description 3
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 claims abstract description 3
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000001476 alcoholic effect Effects 0.000 claims description 2
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 claims description 2
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract description 4
- 239000002685 polymerization catalyst Substances 0.000 abstract description 3
- 238000005349 anion exchange Methods 0.000 abstract description 2
- 239000003054 catalyst Substances 0.000 abstract description 2
- 239000003822 epoxy resin Substances 0.000 abstract description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 abstract description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 229910017048 AsF6 Inorganic materials 0.000 abstract 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 6
- 229940073608 benzyl chloride Drugs 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 5
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- HNKJADCVZUBCPG-UHFFFAOYSA-N thioanisole Chemical compound CSC1=CC=CC=C1 HNKJADCVZUBCPG-UHFFFAOYSA-N 0.000 description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 3
- 239000013067 intermediate product Substances 0.000 description 3
- 150000003568 thioethers Chemical class 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- RKJBDGOZFLXRRV-UHFFFAOYSA-N [4-[(4-acetyloxyphenyl)methylsulfanylmethyl]phenyl] acetate Chemical compound C1=CC(OC(=O)C)=CC=C1CSCC1=CC=C(OC(C)=O)C=C1 RKJBDGOZFLXRRV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- PNNUGSUFBQGJQV-UHFFFAOYSA-N [Cl-].C(C)(=O)OC1=CC=C(C=C1)[SH+]CCC1=CC=CC=C1 Chemical compound [Cl-].C(C)(=O)OC1=CC=C(C=C1)[SH+]CCC1=CC=CC=C1 PNNUGSUFBQGJQV-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- JPJQMOYOFLZTOP-UHFFFAOYSA-N benzyl [4-(benzylsulfanylmethyl)phenyl] carbonate Chemical compound C1=CC=C(C=C1)COC(=O)OC2=CC=C(C=C2)CSCC3=CC=CC=C3 JPJQMOYOFLZTOP-UHFFFAOYSA-N 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-O methylsulfide anion Chemical compound [SH2+]C LSDPWZHWYPCBBB-UHFFFAOYSA-O 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-O phenylsulfanium Chemical compound [SH2+]C1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-O 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910001546 potassium hexafluoroantimonate(V) Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910001545 sodium hexafluoroantimonate(V) Inorganic materials 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、下記一般式で表わされるスルホニウム化合物
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing a sulfonium compound represented by the following general formula.
(ただし、式中R1は水素、アセチル基、メトキシカル
ボニル基、エトキシカルボニル基、 tert −ブト
キシカルボニル基、ベンゾイル基、ベンジルオキシカル
ボ°ニル基、フェノキシカルボニル基。(However, in the formula, R1 is hydrogen, an acetyl group, a methoxycarbonyl group, an ethoxycarbonyl group, a tert-butoxycarbonyl group, a benzoyl group, a benzyloxycarbonyl group, or a phenoxycarbonyl group.
4−メトキシベンジルオキシカルボ“ニル基、9−フル
オレニルメトキシカルボニル基のいずれかを、R2は炭
素数1〜4のアルキル基またはベンジル基、YはSbF
6. PF(、、ASFに、 BF4.のいずれかを示
す。)
更に詳しくは、光および/または熱硬化組成物の重合触
媒として有用であり、特にエポキシ樹脂やスチレンなど
のカチオン重合性ビニル化合物の重合硬化触媒として効
果を有するスルホニウム化合物の製造方法に関する。4-methoxybenzyloxycarbonyl group or 9-fluorenylmethoxycarbonyl group, R2 is an alkyl group having 1 to 4 carbon atoms or benzyl group, Y is SbF
6. PF (indicates either ASF or BF4.) More specifically, it is useful as a polymerization catalyst for photo and/or thermosetting compositions, particularly for the polymerization of cationically polymerizable vinyl compounds such as epoxy resins and styrene. The present invention relates to a method for producing a sulfonium compound that is effective as a curing catalyst.
[従来の技術]
従来、スルホニウム化合物の製造方法としては、数多く
提案されている。例えば、特開昭55−125104号
では、ビス−[4−(ジフェニルスルホニオ)フェニル
コスルフイド ビスハライドを水溶液中でMY(式中M
はアルカリ金属。[Prior Art] Conventionally, many methods for producing sulfonium compounds have been proposed. For example, in JP-A-55-125104, bis-[4-(diphenylsulfonio)phenylcosulfide bishalide MY (in the formula M
is an alkali metal.
Yは5bFr、、PF6.ASFGを示す。〉で表わさ
れる化合物と混合してイオン交換させる製造方法が開示
されている。しかしながら、この例に従って水溶液中で
MYを作用させると、特にM S b F [、におい
ては、水に対して非常に不安定なため、反応中または後
処理の段階で目的とするスルホニウム化合物が加水分解
反応を起こして、得られるスルホニウム化合物の収率が
低いか、もしくはまったく得られない場合がある。また
、得られたとしても純度が高いものが得られないため、
精製工程を必要とする。Y is 5bFr, PF6. Indicates ASFG. A manufacturing method is disclosed in which the compound is mixed with a compound represented by the following formula and subjected to ion exchange. However, when MY is reacted in an aqueous solution according to this example, the target sulfonium compound is hydrated during the reaction or in the post-treatment stage because M S b F [, in particular, is very unstable in water. A decomposition reaction may occur, resulting in a low yield of sulfonium compounds or no sulfonium compounds at all. In addition, even if it is obtained, it cannot be obtained with high purity, so
Requires purification process.
また、出願人は、特願平1−4231号および特願平1
−89517号において、ベンジル4−ヒドロキシフェ
ニルアルキルスルホニウムのポリフルオロ(亜)金属塩
を塩基の存在下で酸ハライドと反応させて、置換オキシ
フェニルベンジルアルキルスルホニウムのポリフルオロ
(亜)金属塩を製造する方法を開示している。In addition, the applicant has also submitted Japanese Patent Application No. 1-4231 and
No. 89517, polyfluoro(sub)metallic salts of benzyl 4-hydroxyphenylalkylsulfoniums are reacted with acid halides in the presence of a base to produce polyfluoro(sub)metallic salts of substituted oxyphenylbenzylalkylsulfoniums. The method is disclosed.
「発明が解決しようとする問題点]
本発明は、このスルホニウム化合物を製造するにt)た
つ、中間生成物であるW換オキシフェニルペンジルアル
キルスルポニウム ハライド化合物を有機溶媒から単離
することなく、非求核性陰イオンを有するアルカリ金属
塩を粉末のまま加えて1(3イオン交換反応させて、比
較的簡単でしかも高収率てre喚オキシフェニルベンジ
ルアルキルスルホニウムのポリフルオロ(亜)金属塩を
製造する方法を提供するものである。“Problems to be Solved by the Invention” The present invention is directed to isolating an intermediate product, a W-substituted oxyphenylpenzylalkylsulfonium halide compound, from an organic solvent during the production of the sulfonium compound. Instead, an alkali metal salt having a non-nucleophilic anion is added as a powder, and a 1 (3) ion exchange reaction is carried out to form polyfluoro-oxyphenylbenzylalkyl sulfonium in a relatively simple and high-yield manner. A method for producing a metal salt is provided.
し問題点を解決する手段]
1!IIち本発明は、下記一般式[Illのスルフィド
(ヒ合′肉とベンジルハライドを有機溶媒中で反応させ
て、−a式[Illのスルホニウム ハライド化音物を
生成させ、次に、この一般式[■]のスルホニウム ハ
ライド化合物を反応系外に単離することなく、MYで表
わされる塩を作用させて一般式[II(]で表わされる
スルホニウム化合物の製造方法からなる。[Means to solve the problem] 1! II. The present invention involves reacting a sulfide of the following general formula [Ill with a benzyl halide in an organic solvent to produce a sulfonium halide of the formula -a [Ill]; It consists of a method for producing a sulfonium compound represented by the general formula [II(]) by reacting the sulfonium halide compound represented by the formula [■] with a salt represented by MY without isolating the sulfonium halide compound outside the reaction system.
R,o−4防S R2
[1]
(ただし、式中R,,R2およびYは前記と同じであり
、Xはハロゲン原子、Mはアルカリ金属を示す。)
し作用]
本発明の実施にあたって、出発原料である置換オキシフ
ェニルアルキルスルフィド化合物は、4−ヒドロキシフ
ェニルアルキルスルフィドと酸ハライドまたは酸無水物
等をエステル化反応させて簡単に得ることができる。R, o-4 Prevention S R2 [1] (However, in the formula, R,, R2 and Y are the same as above, X is a halogen atom, and M is an alkali metal.) Function] In carrying out the present invention The substituted oxyphenylalkyl sulfide compound, which is a starting material, can be easily obtained by subjecting 4-hydroxyphenylalkyl sulfide to an esterification reaction with an acid halide or an acid anhydride.
このスルフィドの具体例は、4−(アセトキシ)フェニ
ルメチルスルフィド
ボニルオキシ)フェニルメチルスルフィド、4−(ベン
ゾイルオキシ)フェニルメチルスルフィド。Specific examples of this sulfide are 4-(acetoxy)phenylmethylsulfide, bonyloxy)phenylmethylsulfide, and 4-(benzoyloxy)phenylmethylsulfide.
4−(ベンジルオキシカルボニルオキシ)フエニルメヂ
ルスルフィド、4−(フェノキシカルボニルオキシ)フ
ェニルメチルスルフィド、 4−(4−メトキシベンジ
ルオキシカルボニルオキシ)フェニルメチルスルフィド
、4−(9−フルオレニルメトキシカルボニルオキシ)
フェニルメチルスルフィド、 4− (tert−ブト
キシカルボニルオキシ)フェニルメチルスルフィド、エ
チル−4−アセトギシフェニルスルフィド、エチル−4
−(メトキシカルボニルオキシ)フェニルスルフィド、
4−(tert−ブトキシカルボニルオキシ)フェニル
プロピルスルフィド等がある。4-(Benzyloxycarbonyloxy)phenylmethyl sulfide, 4-(phenoxycarbonyloxy)phenylmethyl sulfide, 4-(4-methoxybenzyloxycarbonyloxy)phenylmethyl sulfide, 4-(9-fluorenylmethoxycarbonyl) Oxy)
Phenylmethyl sulfide, 4-(tert-butoxycarbonyloxy)phenylmethyl sulfide, ethyl-4-acetogycyphenyl sulfide, ethyl-4
-(methoxycarbonyloxy)phenyl sulfide,
Examples include 4-(tert-butoxycarbonyloxy)phenylpropyl sulfide.
このスルフィド類と反応させるベンジルハライドの具体
例は、塩化ベンジル、臭化ベンジル等がある。これらを
スルフィド類に対して1.0〜3.0モル比を使用する
。好ましくは1.0〜1.2モル比である。有機溶媒と
しては、メタノール、エタノール、プロパツール等から
選ばれる一種または二種以上のアルコール系混合溶媒が
特に好ましく、反応温度は40℃以下、好ましくは25
〜35℃の温度範囲で反応させる。反応時間は、3〜7
2時間であり、好ましくは24〜48時間pある。Specific examples of benzyl halides reacted with the sulfides include benzyl chloride and benzyl bromide. These are used in a molar ratio of 1.0 to 3.0 to the sulfides. Preferably the molar ratio is 1.0 to 1.2. As the organic solvent, one or more alcoholic mixed solvents selected from methanol, ethanol, propatool, etc. are particularly preferred, and the reaction temperature is 40°C or lower, preferably 25°C.
React at a temperature range of ~35°C. Reaction time is 3-7
2 hours, preferably 24 to 48 hours.
生成した置換または非置換オキシフェニルベンジルアル
キルスルホニウム ハライド化合物は反応溶媒から単離
、精製することなく、連続的に非求核性陰イオンを有す
るアルカリ金属塩、例えばKSbF6.NaSbF6.
NaBF4゜L i BF4. NaPFr、、
KP FG、 NaAs FG。The produced substituted or unsubstituted oxyphenylbenzylalkylsulfonium halide compound is continuously converted into an alkali metal salt having a non-nucleophilic anion, such as KSbF6, without being isolated or purified from the reaction solvent. NaSbF6.
NaBF4゜L i BF4. NaPFr,,
KP FG, NaAs FG.
K A s F G等のいずれかと室温中で陰イオン交
換させて置換または非置換オキシフェニルベンジルアル
キルスルホニウムのポリフルオロ(亜)金属塩を得る。The polyfluoro(sub)metal salt of substituted or unsubstituted oxyphenylbenzylalkylsulfonium is obtained by anion exchange with K A s F G or the like at room temperature.
アルカリ金属塩の使用量は、スルホニウム ハライド化
合物との反応を完全に行うためには、過剰に用いてもよ
いが、スルホニウムハライド化合物に対して0.8〜2
.0モル比が好ましく、更に好ましくは0.9〜1.1
モル比である。The amount of alkali metal salt to be used may be in excess of 0.8 to 2% relative to the sulfonium halide compound in order to complete the reaction with the sulfonium halide compound.
.. 0 molar ratio is preferred, more preferably 0.9 to 1.1
It is a molar ratio.
反応後、有機溶媒を減圧上濃縮して留去し、残渣を酢酸
エチルで抽出、乾燥、濃縮する。残渣を常法により結晶
化させて、中間生成物である置換または非置換オキシフ
ェニルアルキルスルホニウム ハライド化合物を単離、
精製することなく、容易に高収率で本発明の目的とする
スルホニウム化合物を得ることができる。After the reaction, the organic solvent is concentrated and distilled off under reduced pressure, and the residue is extracted with ethyl acetate, dried, and concentrated. The residue is crystallized by a conventional method to isolate a substituted or unsubstituted oxyphenylalkyl sulfonium halide compound as an intermediate product,
The sulfonium compound targeted by the present invention can be easily obtained in high yield without purification.
この具体例としては、4−アセトキシフェニルベンジル
メチルスルホニウム ヘキサフルオロアンチモネート、
4−アセトキシフェニルベンジルメチルスルホニウムへ
キザフルオロアルセネート。Specific examples include 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimonate,
4-acetoxyphenylbenzylmethylsulfonium hexafluoroarsenate.
11−アセトキシフェニルベンジルメチルスルホニウム
テトラフルオロボレート、4−アセ1〜キシフエニル
ベンジルメチルスルホニウム へキサフルオロホスフェ
−1・、ベンジル−4−(ベンジルオキシカルボニルオ
キシ)フェニルメチルスルホニウム ヘキサフルオロア
ンチモネート、ベンジル−4−(ベンゾイルオキシフェ
ニル)メチルスルホニウム ヘキサフルオロアンチモネ
ート。11-acetoxyphenylbenzylmethylsulfonium tetrafluoroborate, 4-ace1-xyphenylbenzylmethylsulfonium hexafluorophosphate-1, benzyl-4-(benzyloxycarbonyloxy)phenylmethylsulfonium hexafluoroantimonate, benzyl -4-(benzoyloxyphenyl)methylsulfonium hexafluoroantimonate.
ベンジルメチル−4−(フェノキシカルボニルオキシ)
フェニルスルホニウム へキサフルオロアンチモネート
、ベンジル−4−(メトキシカルボニルオキシ
ザフルオロアンチモネート,ベンジル−4−(4メ)〜
キシベンジルレオキシ力ルポニルオキシ)フェニルメチ
ルスルホニウム へキザフルオロアンチモネート,ベン
ジル−4−(9−フルオレニルメトキシカルボニルオキ
シ)フェニルメチルスルホニウム ヘキサフルオロアン
チモネート,ベンジルエチル−4−(エトキシカルボ°
ニルオキシ)フェニルスルホニウム へキサフルオロア
ンチモネート,ベンジル−4−(tert−ブトキシカ
ルボニルオキシ)フェニルメチルスルホニウム ヘキサ
フルオロアンチモネート,ベンジルエチル−4−(ベン
ジルオキシカルボニルオキシ)フェニルスルホニウム
へキサフルオロアンチモネート等を挙げることができる
。Benzylmethyl-4-(phenoxycarbonyloxy)
Phenylsulfonium hexafluoroantimonate, benzyl-4-(methoxycarbonyloxyzafluoroantimonate, benzyl-4-(4meth)~
Hexafluoroantimonate, benzyl-4-(9-fluorenylmethoxycarbonyloxy)phenylmethylsulfonium Hexafluoroantimonate, benzylethyl-4-(ethoxycarbonyloxy) phenylmethylsulfonium
Hexafluoroantimonate, benzyl-4-(tert-butoxycarbonyloxy)phenylmethylsulfonium Hexafluoroantimonate, benzylethyl-4-(benzyloxycarbonyloxy)phenylsulfonium
Examples include hexafluoroantimonate.
[実施例]
次に、本発明の実施例を限定としてではなく、例示とし
て挙げておく。EXAMPLES Examples of the present invention will now be given by way of illustration and not limitation.
実施例1
4−アセトキシフェニルメチルスルフィド100gをメ
タノール150gに溶解して、これに塩化ベンジル69
.5gを加えて、35℃に加温して24時間撹拌した。Example 1 100 g of 4-acetoxyphenylmethyl sulfide was dissolved in 150 g of methanol, and 69 g of benzyl chloride was added to the solution.
.. 5 g was added, heated to 35° C., and stirred for 24 hours.
次に、生成した4−アセトキシフェニルベンジルメチル
スルホニウムクロライドを含むメタノール層を撹拌しな
がら、六フッ化アンチモン酸カリウム150.6gを粉
末のまま加え、室温で更に1時間撹拌する。Next, while stirring the generated methanol layer containing 4-acetoxyphenylbenzylmethylsulfonium chloride, 150.6 g of potassium hexafluoroantimonate was added as a powder, and the mixture was further stirred at room temperature for 1 hour.
反応液を減圧上濃縮し、残渣を酢酸エチルで抽出し、水
洗、乾燥後、減圧上濃縮する。残渣から白色の結晶物を
得た。生成物は4−アセトキシフェニルベンジルメチル
スルホニウム へキサフルオロアンチモネートであった
。生成物はNMRスベクI・ルで確認した。収量は20
5.2g、収率73.5%1融点115.0〜117゜
0℃であった。The reaction solution is concentrated under reduced pressure, and the residue is extracted with ethyl acetate, washed with water, dried, and concentrated under reduced pressure. A white crystalline substance was obtained from the residue. The product was 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimonate. The product was confirmed by NMR spectroscopy. The yield is 20
5.2 g, yield 73.5%, melting point 115.0-117°C.
実施例2
4−(メトキシ力ルホ“ニルオキシ)フェニルメチルス
ルフィド50gをメタノール75gに溶解し、これに塩
化ベンジル32gを加え、35℃に加温して24時間撹
拌した。次に、生成したベンジル−4−(メトキシカル
ボニルオキシ)フェニルメチルスルホニウム クロライ
ドを含むメタノール層を撹拌しながら、六フッ化アンチ
モン酸カリウム69.3 gを粉末のまま加え、室温に
て更に1時間撹拌した。Example 2 50 g of 4-(methoxysulfonyloxy)phenylmethyl sulfide was dissolved in 75 g of methanol, 32 g of benzyl chloride was added thereto, and the mixture was heated to 35°C and stirred for 24 hours. While stirring the methanol layer containing 4-(methoxycarbonyloxy)phenylmethylsulfonium chloride, 69.3 g of potassium hexafluoroantimonate was added as a powder, and the mixture was further stirred at room temperature for 1 hour.
反応液を減圧濃縮して、以下実施例1と同様な操作で白
色の結晶物を得た。生成物はベンジル−4−(メトキシ
カルボニルオキシ)フェニルメチルスルホニウム ヘキ
サフルオロアンチモネートであった。生成物はNMRス
ペクトルで確認した。The reaction solution was concentrated under reduced pressure, and the same procedure as in Example 1 was performed to obtain a white crystalline substance. The product was benzyl-4-(methoxycarbonyloxy)phenylmethylsulfonium hexafluoroantimonate. The product was confirmed by NMR spectrum.
収量は203.6g、収率75.4%、融点72.0〜
75.0℃であった。Yield: 203.6g, yield 75.4%, melting point: 72.0~
The temperature was 75.0°C.
実施例3
4−(フェノキシ力ルホ゛ニルオキシ)フェニルメチル
スルフィド10’ Ogをメタノール150gに溶解し
て、これに塩化ベンジル48.7gを加えて35℃に加
温して24時間撹拌した。次に、生成したベンジルメチ
ル−4−(フェノキシカルボニルオキシ)フェニルスル
ホニウム クロライドを含むメタノール層を撹拌しなが
ら、六フッ化アンチモン酸カリウム105.5gを粉末
のまま加え、室温にて1時間撹拌した。反応液を減圧上
濃縮して、以下実施例1と同様な操作で白色結晶を得た
。生成物は、ベンジルメチル−4−(フェノキシカルボ
ニルオキシ)フェニルスルホニウムへキザフルオロアン
チモネートであった。生成物はNMRスペクトルで確認
した。収量は192.5g、収率85.3%、融点94
.0〜96.0℃であった。Example 3 10'Og of 4-(phenoxylsulfonyloxy)phenylmethylsulfide was dissolved in 150g of methanol, and 48.7g of benzyl chloride was added thereto, heated to 35°C, and stirred for 24 hours. Next, while stirring the generated methanol layer containing benzylmethyl-4-(phenoxycarbonyloxy)phenylsulfonium chloride, 105.5 g of potassium hexafluoroantimonate was added as a powder, and the mixture was stirred at room temperature for 1 hour. The reaction solution was concentrated under reduced pressure, and the same procedure as in Example 1 was performed to obtain white crystals. The product was benzylmethyl-4-(phenoxycarbonyloxy)phenylsulfonium hexafluoroantimonate. The product was confirmed by NMR spectrum. Yield: 192.5g, yield 85.3%, melting point 94
.. The temperature was 0 to 96.0°C.
実施例4
4−(ベンゾイルオキシ)フェニルメチルスルフィド7
0gをメタノール105gに溶解して、これに塩化ベン
ジル35.5 gを加え、35℃に加温して24時間撹
拌した。次に生成したベンジルメチル−4−(ベンゾイ
ルオキシ)フェニルスルホニウム クロライドを含むメ
タノール溶液を室温にて撹拌しながら、六フッ化アンチ
モン酸カリウム77gを粉末のまま加え、室温で1時間
撹拌した。反応液を減圧上濃縮して、以下実施例1と同
様の操作を行って白色の結晶物を得た。Example 4 4-(benzoyloxy)phenylmethyl sulfide 7
0 g was dissolved in 105 g of methanol, 35.5 g of benzyl chloride was added thereto, and the mixture was heated to 35° C. and stirred for 24 hours. Next, while stirring the generated methanol solution containing benzylmethyl-4-(benzoyloxy)phenylsulfonium chloride at room temperature, 77 g of potassium hexafluoroantimonate was added as a powder, and the mixture was stirred at room temperature for 1 hour. The reaction solution was concentrated under reduced pressure, and the same operation as in Example 1 was performed to obtain a white crystalline substance.
生成物はベンジルメチル−4−(ベンゾイルオキシ)フ
ェニルスルホニウム へキサフルオロアンチモネートで
あった。生成物はNMRスペクトルで確認した。収量は
131.5g、・収率82.2%。The product was benzylmethyl-4-(benzoyloxy)phenylsulfonium hexafluoroantimonate. The product was confirmed by NMR spectrum. Yield: 131.5g, yield: 82.2%.
融点113.0〜115.0℃であった。The melting point was 113.0-115.0°C.
実施例5
4−(ベンジルオキシカルボニルオキシ)フェニルメチ
ルスルフィド100gをメタノール150gに溶解して
、これに塩化ベンジル45.6gを加え、35℃に加温
して24時間撹拌した。次に生成したベンジル−4−(
ベンジルオキシカルボニルオキシ)フェニルメチルスル
ホニウム クロライドを含むメタノール溶液を撹拌しな
がら、六フッ化アンヂモン酸カリウム98.9gを粉末
のまま加え、室温で1時間撹拌した。反応液を減圧上濃
縮して、以下実施例1と同様の操作を行って白色の結晶
物を得た。生成物はベンジル−4−(ベンジルオキシカ
ルボニルオキシ)フェニルメチルスルホニウム ヘキサ
フルオロアンチモネ−1・であった。生成物はNMRス
ペクトルで確認した。収量は194.9部、収率90.
0%、融点119〜120℃であった。Example 5 100 g of 4-(benzyloxycarbonyloxy)phenylmethyl sulfide was dissolved in 150 g of methanol, 45.6 g of benzyl chloride was added thereto, and the mixture was heated to 35° C. and stirred for 24 hours. Next, the benzyl-4-(
While stirring the methanol solution containing benzyloxycarbonyloxy)phenylmethylsulfonium chloride, 98.9 g of potassium hexafluorandimonate was added as a powder, and the mixture was stirred at room temperature for 1 hour. The reaction solution was concentrated under reduced pressure, and the same operation as in Example 1 was performed to obtain a white crystalline substance. The product was benzyl-4-(benzyloxycarbonyloxy)phenylmethylsulfonium hexafluoroantimone-1. The product was confirmed by NMR spectrum. The yield was 194.9 parts, yield 90.
0%, melting point 119-120°C.
実施例6
実施例5の手順を繰返した。ただし、本例では、六フッ
化アンヂモン酸カリウムの代わりに六フッ化リン酸カリ
ウム66.2 gを使用した。ベンジル−4−(ベンジ
ルオキシカルボニルオキシ)フェニルメチルスルホニウ
ム へキサフルオロホスフェートが収量160.4g、
収率87.3%で得られ、融点は114.0〜116.
0’Cであった。Example 6 The procedure of Example 5 was repeated. However, in this example, 66.2 g of potassium hexafluorophosphate was used instead of potassium hexafluorandimonate. Yield: 160.4 g of benzyl-4-(benzyloxycarbonyloxy)phenylmethylsulfonium hexafluorophosphate;
Obtained in a yield of 87.3%, with a melting point of 114.0-116.
It was 0'C.
比較例
六フッ化アンチモン酸カリウムの水溶液を加える以外は
、実施例4と同じ操作を繰り返してベンジルメチル−4
−(ベンゾイルオキシ)フェニルスルホニウム へキサ
フルオロホスフェ−トの合成を行ったが、反応中または
後処理中に加水分解を起こして、目的とするスルホニウ
ム化合物は得られなかった。Comparative Example The same procedure as in Example 4 was repeated except for adding an aqueous solution of potassium hexafluoroantimonate to prepare benzylmethyl-4.
-(benzoyloxy)phenylsulfonium hexafluorophosphate was synthesized, but hydrolysis occurred during the reaction or post-treatment, and the desired sulfonium compound could not be obtained.
[発明の効果]
本発明の製造方法によれば、比較的簡単な操作で有機溶
媒から中間生成物を単離することなく、連続的にしかも
効果的に高収率で置換または非置換オキシフェニルベン
ジルアルキルスルホニウムのポリフルオロ(亜)金属化
合物を製造することができる。[Effects of the Invention] According to the production method of the present invention, substituted or unsubstituted oxyphenyl can be produced continuously and effectively in high yield with relatively simple operations and without isolating intermediate products from organic solvents. Polyfluoro(sub)metallic compounds of benzylalkylsulfonium can be produced.
Claims (3)
ルハライドを有機溶媒中で反応させて、一般式[II]の
スルホニウムハライド化合物を生成させ、次に、この一
般式[II]のスルホニウムハライド化合物を反応系外に
単離することなく、MYで表わされる塩を作用させて、
陰イオン交換反応させることを特徴とする一般式[III
]で表わされるスルホニウム化合物の製造方法。 ▲数式、化学式、表等があります▼[ I ] ▲数式、化学式、表等があります▼[II] ▲数式、化学式、表等があります▼[III] (ただし、式中R_1は水素、アセチル基、メトキシカ
ルボニル基、エトキシカルボニル基、tert−ブトキ
シカルボニル基、ベンゾイル基、ベンジルオキシカルボ
ニル基、フェノキシカルボニル基、4−メトキシベンジ
ルオキシカルボニル基、9−フルオレニルメトキシカル
ボニル基のいずれかを、R_2は炭素数1〜4のアルキ
ル基またはベンジル基、Xはハロゲン原子、Mはアルカ
リ金属、YはSbF_6、PF_6、AsF_6、BF
_4、のいずれかを示す。)(1) A sulfide compound of the following general formula [I] and benzyl halide are reacted in an organic solvent to produce a sulfonium halide compound of the general formula [II], and then a sulfonium halide compound of the general formula [II] is produced. without isolating it outside the reaction system, by allowing the salt represented by MY to act,
General formula [III
] A method for producing a sulfonium compound represented by: ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [I] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [II] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [III] (However, R_1 in the formula is hydrogen or an acetyl group. , methoxycarbonyl group, ethoxycarbonyl group, tert-butoxycarbonyl group, benzoyl group, benzyloxycarbonyl group, phenoxycarbonyl group, 4-methoxybenzyloxycarbonyl group, 9-fluorenylmethoxycarbonyl group, R_2 is Alkyl group or benzyl group having 1 to 4 carbon atoms, X is a halogen atom, M is an alkali metal, Y is SbF_6, PF_6, AsF_6, BF
_4. )
ルから選ばれる一種または二種以上のアルコール系溶媒
である特許請求の範囲第一項記載の製造方法。(2) The manufacturing method according to claim 1, wherein the organic solvent is one or more alcoholic solvents selected from methanol, ethanol, and propanol.
成させる反応温度が25〜35℃である特許請求の範囲
第一項記載の製造方法。(3) The manufacturing method according to claim 1, wherein the reaction temperature for producing the sulfonium halide compound of general formula [II] is 25 to 35°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18340289A JP2598704B2 (en) | 1989-07-14 | 1989-07-14 | Method for producing sulfonium compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18340289A JP2598704B2 (en) | 1989-07-14 | 1989-07-14 | Method for producing sulfonium compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0348654A true JPH0348654A (en) | 1991-03-01 |
JP2598704B2 JP2598704B2 (en) | 1997-04-09 |
Family
ID=16135151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18340289A Expired - Fee Related JP2598704B2 (en) | 1989-07-14 | 1989-07-14 | Method for producing sulfonium compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2598704B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006028132A (en) * | 2004-07-21 | 2006-02-02 | Sanshin Chem Ind Co Ltd | Preparation method of sulfonium compound |
JP2006198218A (en) * | 2005-01-21 | 2006-08-03 | Aruze Corp | Game machine |
WO2007111075A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111092A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111074A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111098A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing same |
US7358408B2 (en) | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
JP2014185157A (en) * | 2008-09-30 | 2014-10-02 | Tokyo Ohka Kogyo Co Ltd | Compound and acid generator comprising the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200831583A (en) | 2006-09-29 | 2008-08-01 | Nippon Catalytic Chem Ind | Curable resin composition, optical material, and method of regulating optical material |
-
1989
- 1989-07-14 JP JP18340289A patent/JP2598704B2/en not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7358408B2 (en) | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
JP2006028132A (en) * | 2004-07-21 | 2006-02-02 | Sanshin Chem Ind Co Ltd | Preparation method of sulfonium compound |
JP4566642B2 (en) * | 2004-07-21 | 2010-10-20 | 三新化学工業株式会社 | Method for producing sulfonium compound |
JP2006198218A (en) * | 2005-01-21 | 2006-08-03 | Aruze Corp | Game machine |
WO2007111075A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111092A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111074A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
WO2007111098A1 (en) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing same |
JP2014185157A (en) * | 2008-09-30 | 2014-10-02 | Tokyo Ohka Kogyo Co Ltd | Compound and acid generator comprising the same |
Also Published As
Publication number | Publication date |
---|---|
JP2598704B2 (en) | 1997-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2797024B2 (en) | Sulfonium compound | |
JPH0348654A (en) | Compound of sulfonium compound | |
JP2711491B2 (en) | Sulfonium complex or oxosulfonium complex | |
JPH0670005B2 (en) | Sulfonium compound and method for producing the same | |
JPH03200761A (en) | Dialkylsulfonium compound and production thereof | |
JP2592686B2 (en) | Dibenzylsulfonium compound | |
JPH08188569A (en) | Production of sulfonium compound | |
JP4122085B2 (en) | Method for producing sulfonium compound | |
JPS6112658A (en) | Manufacture of azetidine and intermediate therefor | |
KR20000051197A (en) | Sulfonium salts and method of synthesis | |
Szechner | Synthesis and absolute configuration of two diastereoisomeric (1R, 2S, 3R)-and (1S, 2S, 3R)-2-amino-1-(2-furyl)-1, 3-butandiols | |
JP2895959B2 (en) | Method for producing sulfonium salt | |
JP2001247306A (en) | Method for synthesizing ionic metal complex and method for purifying the same | |
JPH02268173A (en) | Benzothiazolium compound and production thereof | |
JPH0348179B2 (en) | ||
JP2925711B2 (en) | Novel methacrylic acid derivatives and their polymers | |
JP2808489B2 (en) | Water-soluble thiourea dioxide derivative and method for producing the same | |
JP2001261684A (en) | Tetrakis (acyloxy) borate (1-) and method for synthesizing substituted onium tetrakis(acyloxy) borate (1-) | |
Fabbri et al. | Binaphthyl-Substituted Chiral Phosphines and Oxides from Binaphthophooles and Nucleophiles | |
JP2001181282A (en) | Synthetic method of tetraacyl borate and substituted onium tetraacyl borate | |
KR0131050B1 (en) | Novel amine compounds and process preparing thereof | |
KR810001319B1 (en) | Process for the preparation of new isobutyramide derivatives | |
JPH1192435A (en) | Benzene derivative and its production | |
JP2946698B2 (en) | Method for producing α, β-substituted cycloalkanone | |
JP2500316B2 (en) | 1,4,5,8-Tetrakis (halogenomethyl) naphthalene derivative and method for producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |