JPH03295655A - Liquid jet head - Google Patents
Liquid jet headInfo
- Publication number
- JPH03295655A JPH03295655A JP9786190A JP9786190A JPH03295655A JP H03295655 A JPH03295655 A JP H03295655A JP 9786190 A JP9786190 A JP 9786190A JP 9786190 A JP9786190 A JP 9786190A JP H03295655 A JPH03295655 A JP H03295655A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- cantilever
- silicon substrate
- piezoelectric thin
- piezo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 24
- 239000010409 thin film Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 239000010703 silicon Substances 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 4
- 238000005530 etching Methods 0.000 abstract description 10
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- -1 LiNb O3 Inorganic materials 0.000 description 1
- 229910012463 LiTaO3 Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野〕
本発明はインクジェットプリンタ等に用いられる液体噴
射ヘッド、特に圧電素子を用いた液体噴射ヘッドに関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a liquid ejecting head used in an inkjet printer or the like, and particularly to a liquid ejecting head using a piezoelectric element.
[従来の技術]
従来のインクジェットプリンタにおける液体噴射ヘッド
には、特公昭60−8953に示されるごとく、片持ち
梁構造の圧電振動子を印字信号に応じたパルス電圧でた
わみ振動させることにより、インクへ圧力を加えインク
滴を飛翔させるタイプのものが知られている。[Prior Art] As shown in Japanese Patent Publication No. 60-8953, a liquid ejecting head in a conventional inkjet printer uses a piezoelectric vibrator having a cantilever structure to deflect and vibrate with a pulse voltage corresponding to a print signal. A type of ink droplet is known that applies pressure to the ink droplet.
[発明が解決しようとする課題]
従来の、片持ち梁の圧電薄膜振動子より成る液体噴射ヘ
ッドにおいては、片持ち梁を形成するために異方性エツ
チングを用いていたが、エッチストップ層を用いてエツ
チングの制御を行なっていた。エッチストップ層の上に
片持ち梁を残して除去するためのエピタキシャル層を形
成し、更に梁となる5i02層を形成していた。エッチ
ストップ層を形成する工程や、エピタキシャル層を形成
する工程をなくし、工程数を減らすことを目的とする。[Problems to be Solved by the Invention] In a conventional liquid ejecting head consisting of a cantilevered piezoelectric thin film vibrator, anisotropic etching was used to form the cantilevered beam. was used to control etching. An epitaxial layer was formed on the etch stop layer to be removed leaving a cantilever, and a 5i02 layer was further formed to serve as the beam. The purpose is to reduce the number of steps by eliminating the steps of forming an etch stop layer and forming an epitaxial layer.
[課題を解決するための手段]
以上述べた課題を解決するため、本発明の液体噴射ヘッ
ドは、複数のノズルを有するノズルプレートと、前記ノ
ズルの各々と対向配置し、シリコン基板上に形成した片
持ち梁の圧電薄膜振動子とを備え、電圧印加により前記
片持ち梁の圧電薄膜振動子を変位させ、前記ノズルとの
間隙に存在する液体の圧力を高めて前記ノズルから液滴
を吐出させる液体噴射ヘッドに於いて、前記片持ち梁の
圧電薄膜振動子のシリコン基板上の周囲を前記片持ち梁
を形成している材料の一部で覆ったことを特徴とする。[Means for Solving the Problems] In order to solve the above-mentioned problems, the liquid ejecting head of the present invention includes a nozzle plate having a plurality of nozzles, arranged to face each of the nozzles, and formed on a silicon substrate. and a cantilevered piezoelectric thin film vibrator, and the cantilevered piezoelectric thin film vibrator is displaced by voltage application to increase the pressure of the liquid existing in the gap with the nozzle, thereby ejecting droplets from the nozzle. The liquid ejecting head is characterized in that the periphery of the cantilevered piezoelectric thin film vibrator on the silicon substrate is covered with a part of the material forming the cantilever.
[実施例]
第1図(a)及び(b)は、それぞれ本発明の実施例に
おける液体噴射ヘッドの片持ち梁の圧電薄膜振動子の平
面図と断面図である。第1図(a)及び(b)において
、101は片持ち梁の圧電薄膜振動子、102はその一
部が前記片持ち梁の圧電薄膜振動子を構成している5i
02層、103はシリコンの(111)面で、前記片持
ち梁の圧電薄膜振動子が変位するための空間である溝を
形成している。105は下電極、106はPZTの圧電
薄膜、107は上電極、108は5i02の保護層、1
09はノズル、110はノズルプレート、111はノズ
ルプレートとシリコン基板とを接着するための接着層で
ある。このような構造は、まず(100)面単結晶シリ
コン基板104上に5i02層102、下部電極105
、圧電薄膜106、上部電極107、保護層108を積
層し、片持ち梁の圧電薄膜振動子101を形成した後、
シリコン基板104の異方性エツチングを行なう。[Embodiment] FIGS. 1(a) and 1(b) are a plan view and a sectional view, respectively, of a cantilever piezoelectric thin film vibrator of a liquid jet head in an embodiment of the present invention. In FIGS. 1(a) and (b), 101 is a cantilevered piezoelectric thin film resonator, and 102 is a part of the cantilevered piezoelectric thin film resonator 5i.
The 02 layer and 103 are (111) planes of silicon, and form grooves that are spaces in which the cantilevered piezoelectric thin film vibrator is displaced. 105 is a lower electrode, 106 is a PZT piezoelectric thin film, 107 is an upper electrode, 108 is a protective layer of 5i02, 1
09 is a nozzle, 110 is a nozzle plate, and 111 is an adhesive layer for bonding the nozzle plate and the silicon substrate. In this structure, first, a 5i02 layer 102 and a lower electrode 105 are formed on a (100) plane single crystal silicon substrate 104.
, after laminating the piezoelectric thin film 106, the upper electrode 107, and the protective layer 108 to form the cantilever piezoelectric thin film vibrator 101,
Anisotropic etching of the silicon substrate 104 is performed.
シリコン基板の表面が(111)面103で覆われた時
点でエツチングは停止する0片持ち梁の圧電薄膜振動子
の間に5i02層を残すようにしたので、異方性エツチ
ングが、それぞれの片持ち梁部分毎に働くようになった
。 (111)面はく100)面に対して約55度傾
いているので、 (100)面で幅100μmの部分を
異方性エツチングすると、幅100μm、深さ71μm
の溝を形成することができた1幅を揃えておけば、全て
の溝の深さは等しくなる。Etching stops when the surface of the silicon substrate is covered with the (111) plane 103. Since the 5i02 layer was left between the cantilever piezoelectric thin film resonators, the anisotropic etching was performed on each piece. Now works on each beam part. Since the (111) plane is tilted approximately 55 degrees with respect to the 100) plane, if a 100 μm wide part of the (100) plane is anisotropically etched, the width will be 100 μm and the depth will be 71 μm.
If the widths of the grooves that can be formed are made the same, the depths of all the grooves will be the same.
第2図は本発明の液体噴射ヘッドの他の実施例を示す平
面図で、液体噴射ヘッドへのインクの供給を改善したも
のである。同図において、第1図と同一の記号は第1図
と同一のものを表す、シリコン基板上に形成した5i0
2層102をパターニングして片持ち梁の圧電薄膜振動
子101を形成する。この後、シリコン基板を貫通する
穴212をレーザで開ける。この穴212がインク供給
路となり、基板裏側からインクが(111)面103で
囲まれた溝部分へ流れ込む0個々の溝へ供給されるイン
クの大部分が穴212から直接供給されることになる。FIG. 2 is a plan view showing another embodiment of the liquid ejecting head of the present invention, in which the supply of ink to the liquid ejecting head is improved. In the same figure, the same symbols as in FIG. 1 represent the same things as in FIG. 1.
The two layers 102 are patterned to form a cantilever piezoelectric thin film vibrator 101. After this, a hole 212 penetrating the silicon substrate is made using a laser. This hole 212 becomes an ink supply path, and ink flows from the back side of the substrate into the groove portion surrounded by the (111) plane 103. Most of the ink supplied to each groove is directly supplied from the hole 212. .
このため任意の溝へのインク供給が隣接する溝へ及ぼす
影響が小さくなり、インク噴射頻度を上げることや、片
持ち梁の密度を増すことが可能になった0片持ち梁の圧
電薄膜振動子を形成するための溝は同図に示したように
複数の梁で共有することもできる。Therefore, the influence of ink supply to any groove on adjacent grooves is reduced, making it possible to increase the frequency of ink ejection and increase the density of cantilevers. The groove for forming the beam can also be shared by multiple beams as shown in the same figure.
このような片持ち梁の構造を形成する方法は以上の方法
に限定されるわけではない。また、基板を貫通する穴2
12の形成方法も以上の方法に限定されるわけではなく
、例えば、異方性エツチングや、レーザアシストエツチ
ング等の方法も利用できる。また圧電薄膜はPZTのみ
に限定されるわけではなく、これ以外にもP L Z
T、 P b T i03、LiTaO3,LiNb
O3,BaTiO3等も利用できる。The method of forming such a cantilever structure is not limited to the above method. In addition, hole 2 that penetrates the board
The method of forming 12 is not limited to the above method, and for example, methods such as anisotropic etching and laser assisted etching can also be used. In addition, piezoelectric thin films are not limited to PZT, and there are other types of PZT as well.
T, P b T i03, LiTaO3, LiNb
O3, BaTiO3, etc. can also be used.
以上のごとき液体噴射ヘッドは、片持ち梁の圧電薄膜振
動子101をフォトリソグラフィー技術を用いて形成で
きるため、精度良くかつ微細に形成できる。特にこの様
な構造の液体噴射ヘッドにおける液体噴射特性を大きく
支配する、片持ち梁の大きさや、厚さを容易に制御でき
る。このため、液体噴射を行なうノズルの高密度化や、
ノズルをライン状に長尺に形成するマルチノズル化が容
易となり、10dots/mmの解像度で5cmの長さ
を持つライン液体噴射ヘッドが形成できた。In the liquid ejecting head as described above, since the cantilever piezoelectric thin film vibrator 101 can be formed using photolithography technology, it can be formed precisely and minutely. In particular, it is possible to easily control the size and thickness of the cantilever beam, which largely governs the liquid ejection characteristics of a liquid ejection head having such a structure. For this reason, the density of the nozzle that performs liquid injection is increased,
It became easy to create multi-nozzles by forming long nozzles in a line shape, and it was possible to form a line liquid jet head with a length of 5 cm at a resolution of 10 dots/mm.
なお、本発明の液体噴射ヘッドは以上述べた実施例のみ
ならず、本発明の主旨を逸脱しない範囲において広く応
用が可能であり、また、インクジェットプリンタのみな
らず、他の印字、印刷装置(例えば、タイプライタ、コ
ピー機出力等)や、塗装装置、捺染装置等に広く適用さ
れる。The liquid ejecting head of the present invention can be applied not only to the embodiments described above, but also to a wide range of applications without departing from the spirit of the present invention. , typewriters, copy machine output, etc.), coating equipment, textile printing equipment, etc.
[発明の効果]
以上述べたように本発明によれば、片持ち梁の圧電薄膜
振動子の周囲を前記片持ち梁を形成している材料の一部
で覆ったことにより、適当な深さで自動終了する異方性
エツチングを用いて、片持ち梁の形成ができるようにな
った。これにより、エピタキシャル層形成のような非常
に時間のかかる工程を省くことができるようになり、そ
の効果は大きい、また、インク供給に関しても、基板を
賞通した穴を通して供給されるインクが個々の片持ち梁
の溝へ直接流れ込むので、他の片持ち梁の溝への影響が
少なく、クロストークのない駆動ができた。[Effects of the Invention] As described above, according to the present invention, by covering the periphery of the piezoelectric thin film vibrator of the cantilever beam with a part of the material forming the cantilever beam, an appropriate depth can be obtained. Cantilever beams can now be formed using anisotropic etching, which automatically terminates at . This makes it possible to omit extremely time-consuming processes such as epitaxial layer formation, which has a great effect.In addition, regarding ink supply, the ink supplied through the holes cut through the substrate is Since it flows directly into the grooves of the cantilever beams, there is little influence on the grooves of other cantilever beams, making it possible to drive without crosstalk.
第1図(a)及び(b)は、それぞれ本発明の実施例に
おける液体噴射ヘッドの平面図及び断面図。
第2図は、本発明の他の実施例における液体噴射ヘッド
の平面図。
101・・・片持ち梁の圧電薄膜振動子102・・・5
i02層
103・・・シリコン(111)面
104・・・シリコン基板
105・・・下部電極
106・・・圧電薄膜
107・・・上部電極
108・・・保護膜
109・・・ノズル
110・・・ノズルプレート
111・・・接着層
212・・・穴FIGS. 1(a) and 1(b) are a plan view and a sectional view, respectively, of a liquid jet head in an embodiment of the present invention. FIG. 2 is a plan view of a liquid ejecting head in another embodiment of the present invention. 101...Cantilever piezoelectric thin film vibrator 102...5
i02 layer 103...Silicon (111) surface 104...Silicon substrate 105...Lower electrode 106...Piezoelectric thin film 107...Upper electrode 108...Protective film 109...Nozzle 110... Nozzle plate 111...adhesive layer 212...hole
Claims (1)
各々と対向配置し、シリコン基板上に形成した片持ち梁
の圧電薄膜振動子とを備え、電圧印加により前記片持ち
梁の圧電薄膜振動子を変位させ、前記ノズルとの間隙に
存在する液体の圧力を高めて前記ノズルから液滴を吐出
させる液体噴射ヘッドに於いて、前記片持ち梁の圧電薄
膜振動子のシリコン基板上の周囲を前記片持ち梁を形成
している材料の一部で覆ったことを特徴とする液体噴射
ヘッド。A nozzle plate having a plurality of nozzles, and a cantilever piezoelectric thin film vibrator disposed opposite each of the nozzles and formed on a silicon substrate, and the cantilever piezoelectric thin film vibrator is displaced by applying a voltage. In a liquid ejecting head that increases the pressure of the liquid existing in a gap with the nozzle to eject droplets from the nozzle, the periphery of the cantilevered piezoelectric thin film vibrator on the silicon substrate is cantilevered. A liquid ejecting head characterized in that a beam is covered with a part of a material forming the beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9786190A JPH03295655A (en) | 1990-04-13 | 1990-04-13 | Liquid jet head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9786190A JPH03295655A (en) | 1990-04-13 | 1990-04-13 | Liquid jet head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03295655A true JPH03295655A (en) | 1991-12-26 |
Family
ID=14203536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9786190A Pending JPH03295655A (en) | 1990-04-13 | 1990-04-13 | Liquid jet head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03295655A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0634273A2 (en) * | 1993-07-13 | 1995-01-18 | Sharp Kabushiki Kaisha | Ink jet head and a method of manufacturing thereof |
US5825383A (en) * | 1994-12-20 | 1998-10-20 | Sharp Kabushiki Kaisha | Ink jet head compact and allowing ink to be discharged with great force by using deformable structure |
EP1101615A1 (en) * | 1999-11-15 | 2001-05-23 | Seiko Epson Corporation | Ink-jet recording head and ink-jet recording apparatus |
EP1116588A1 (en) * | 1999-08-04 | 2001-07-18 | Seiko Epson Corporation | Ink jet recording head, method for manufacturing the same, and ink jet recorder |
US6890066B2 (en) | 2003-05-22 | 2005-05-10 | Lexmark International, Inc. | Inkjet printer having improved ejector chip |
CN103660573A (en) * | 2012-09-08 | 2014-03-26 | 珠海纳思达电子科技有限公司 | Liquid ink nozzle |
-
1990
- 1990-04-13 JP JP9786190A patent/JPH03295655A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0634273A2 (en) * | 1993-07-13 | 1995-01-18 | Sharp Kabushiki Kaisha | Ink jet head and a method of manufacturing thereof |
EP0634273A3 (en) * | 1993-07-13 | 1995-08-23 | Sharp Kk | Ink jet head and a method of manufacturing thereof. |
US5666141A (en) * | 1993-07-13 | 1997-09-09 | Sharp Kabushiki Kaisha | Ink jet head and a method of manufacturing thereof |
US5825383A (en) * | 1994-12-20 | 1998-10-20 | Sharp Kabushiki Kaisha | Ink jet head compact and allowing ink to be discharged with great force by using deformable structure |
EP1116588A1 (en) * | 1999-08-04 | 2001-07-18 | Seiko Epson Corporation | Ink jet recording head, method for manufacturing the same, and ink jet recorder |
EP1116588A4 (en) * | 1999-08-04 | 2007-07-11 | Seiko Epson Corp | Ink jet recording head, method for manufacturing the same, and ink jet recorder |
EP1101615A1 (en) * | 1999-11-15 | 2001-05-23 | Seiko Epson Corporation | Ink-jet recording head and ink-jet recording apparatus |
US6378996B1 (en) | 1999-11-15 | 2002-04-30 | Seiko Epson Corporation | Ink-jet recording head and ink-jet recording apparatus |
US6890066B2 (en) | 2003-05-22 | 2005-05-10 | Lexmark International, Inc. | Inkjet printer having improved ejector chip |
CN103660573A (en) * | 2012-09-08 | 2014-03-26 | 珠海纳思达电子科技有限公司 | Liquid ink nozzle |
CN103660573B (en) * | 2012-09-08 | 2015-06-17 | 珠海赛纳打印科技股份有限公司 | Liquid ink nozzle |
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