JPH03241787A - Formation of through-hole continuity by welding - Google Patents
Formation of through-hole continuity by weldingInfo
- Publication number
- JPH03241787A JPH03241787A JP30626289A JP30626289A JPH03241787A JP H03241787 A JPH03241787 A JP H03241787A JP 30626289 A JP30626289 A JP 30626289A JP 30626289 A JP30626289 A JP 30626289A JP H03241787 A JPH03241787 A JP H03241787A
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- welding
- hole
- drilled hole
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003466 welding Methods 0.000 title claims abstract description 14
- 230000015572 biosynthetic process Effects 0.000 title 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000011889 copper foil Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000000853 adhesive Substances 0.000 claims abstract description 5
- 230000001070 adhesive effect Effects 0.000 claims abstract description 5
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 17
- 238000005530 etching Methods 0.000 abstract description 16
- 238000007747 plating Methods 0.000 abstract description 9
- 238000007772 electroless plating Methods 0.000 abstract description 3
- 238000009713 electroplating Methods 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract 3
- 238000010030 laminating Methods 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、高分子絶縁基板のスルーホールの導通方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for conducting through holes in a polymer insulating substrate.
本発明は、両面回路基板の導通スルーホールを熔接によ
り行うもので、高分子絶縁基板の所望の位置に導通スル
ーホール用の穿孔穴を設け、その後基板両面に銅箔を熱
圧着し、次いでエツチングにより導体回路パターンを形
成し、前述の穿孔穴の中心にセントした熔接端子により
穿孔穴の両端にある銅箔を熔接することによりスルーホ
ールの導通を取るものである。本方法により、品質の良
く且つコストの安いスルーホールが得られる。The present invention creates conductive through-holes in a double-sided circuit board by welding. Holes for conductive through-holes are formed at desired positions on a polymer insulating board, then copper foil is thermocompression bonded to both sides of the board, and then etched. A conductive circuit pattern is formed by this, and the copper foils at both ends of the perforation are welded using a welding terminal placed at the center of the perforation, thereby establishing electrical continuity between the through-holes. By this method, a through hole of good quality and low cost can be obtained.
従来の導通スルーホールの形成方法として1988年版
電子技術月刊誌6月別冊「プリント配線板のすべて」日
刊工業新聞社、158ページに示されている。第2図に
おいて、ステップfilは高分子絶縁基板2に銅箔4が
圧着されている状態を示すものである。ステップ(2)
は基板2の所定位置に導通スルーホールのための穿孔穴
20を設ける工程を示す。ステップ(3)は穿孔穴に銅
メツキするための前処理として触媒11をコーティング
する工程を示す。ステップ(4)は触媒11をコーティ
ングされた回路基板2に無電解または電解メツキで銅メ
ツキ12する。ステップ(5)は回路基板2に回路をエ
ツチングで形成するため回路として残るパターン以外の
部分、穿孔穴の周りをエツチングレジスト13でコーテ
ィングする工程を示す。ステップ(6)はエツチングレ
ジスト13がコーティングされた部分以外の銅箔4およ
び銅メツキ12をエツチング除去する工程を示す。ステ
ップ(7)はエツチングレジストを除去する工程を示す
。従来技術として以上の工程で行われていた。A conventional method for forming conductive through-holes is shown in the 1988 edition of Electronic Technology Monthly Magazine, June Special Edition, "All About Printed Wiring Boards," Nikkan Kogyo Shimbun, Inc., page 158. In FIG. 2, step fil shows a state in which the copper foil 4 is crimped onto the polymer insulating substrate 2. Step (2)
1 shows a step of providing a perforation hole 20 for a conductive through hole at a predetermined position on the substrate 2. Step (3) shows a step of coating the perforated hole with catalyst 11 as a pretreatment for copper plating. In step (4), the circuit board 2 coated with the catalyst 11 is plated with copper 12 by electroless or electrolytic plating. Step (5) shows the process of coating the area other than the pattern remaining as a circuit and around the perforation hole with etching resist 13 in order to form a circuit on the circuit board 2 by etching. Step (6) shows the step of etching away the copper foil 4 and copper plating 12 other than the portion coated with the etching resist 13. Step (7) shows the step of removing the etching resist. The above process was performed as a conventional technique.
しかし、従来のスルーホール形成力法では、無電解また
は電解銅めっきの設備が必要であり、且つ各工程に要す
る化学薬品の消費量も多く、しかも工程中に出る廃水の
廃水処理設備等、環境面、設備面、処理薬品に要する費
用及び工程が長くなりコストが高くなっていた。また、
銅メツキのメッキ厚のバラツキにより微細パターンの製
造に悪影響を及ぼすなどの欠点があった。However, the conventional through-hole forming force method requires equipment for electroless or electrolytic copper plating, consumes a large amount of chemicals in each process, and requires environmentally friendly equipment such as wastewater treatment equipment for wastewater generated during the process. The costs required for surfaces, equipment, processing chemicals, and processes became longer, resulting in higher costs. Also,
There were drawbacks such as variations in the thickness of copper plating, which adversely affected the production of fine patterns.
ここで、本発明は従来の欠点を解消するために穿孔穴の
両端に導体回路パターン膜を形成し、そのパターン膜を
両側から熔接して、導通スルーホールをえるものである
。In order to solve the conventional drawbacks, the present invention forms a conductive circuit pattern film on both ends of a perforated hole, and welds the pattern film from both sides to obtain a conductive through hole.
上記課題を解決するために、銅メツキの替わりに、穿孔
穴(スルーホール)の両端に回路基板に熱圧着した銅箔
を残して、エツチングにて回路パターンを形成し、穿孔
穴の両端に存在する銅箔を両側から溶接端子で圧着して
熔接する。以上の方法で8通スルーホールを形成する。In order to solve the above problem, instead of copper plating, we left copper foil thermocompressed to the circuit board at both ends of the drilled hole (through hole) and formed a circuit pattern by etching. Crimp the copper foil from both sides with welding terminals and weld. Eight through holes are formed using the above method.
上記のように、本発明の導通スルーホールの形成方法は
、めっき工程が全くなく、また工程も簡単な為、設備費
用等が安くなり、導通性の信頼性が高くなる。As described above, the method for forming a conductive through-hole of the present invention does not require any plating process and the process is simple, resulting in lower equipment costs and higher reliability of conductivity.
以下に本発明の実施例を図面に基づいて説明する。第1
図は本発明の工程を示す断面図であり、ステップ(1+
はポリイミド等の高分子材料でできた絶縁基板2の所定
位置に穿孔穴(スルーホール)20を設けその両面に接
着剤1をコーティングする工程である。ステップ(2)
は接着剤lをコーティングした基板2に銅箔4を熱圧着
して銅箔4をラミネートする工程である。ステップ(3
)は、回路基板の導通回路として残しておく所と、穿孔
穴20の所に、エツチングを防止するために、エンチン
グレジストをコーティングする工程である。ステップ(
4)はエツチングレジストでコーティングされていない
銅箔を除去するためのエツチング工程である。この工程
で絶縁基板2の導通回路と穿孔穴20の所に銅箔が残る
。ステップ(5)はエツチング防止のためのエツチング
レジストを除去する工程である。ステップ(6)は絶縁
基板2の穿孔穴20の両端に存在する銅箔4を両側から
熱圧着し熔接する工程である。詳しく説明すると、絶縁
基板2にガイド用の穴21を2箇所設け、熔接器(図示
せず)側の治具であるピンをそのガイド用穴に挿入して
、基板2の穿孔穴20の位置と熔接器の上下溶接端子7
.8の位置の合わせる。次に、基板2の位置に対して相
対的に上下方向から上下溶接端子7.8を接近させ、上
下の銅箔4を加熱しながら押し当てる。加熱方法は、電
気的または、超音波その他の加熱方法がとれる。以上の
工程で穿孔穴(スルーホール)の導体回路パターンがで
きるものである。Embodiments of the present invention will be described below based on the drawings. 1st
The figure is a sectional view showing the process of the present invention, and the step (1+
This is a step in which a through hole 20 is provided at a predetermined position on an insulating substrate 2 made of a polymeric material such as polyimide, and an adhesive 1 is coated on both sides of the hole. Step (2)
1 is a step in which the copper foil 4 is thermocompression bonded to the substrate 2 coated with the adhesive l, and the copper foil 4 is laminated. Step (3
) is a step of coating the portions of the circuit board that are to be left as conductive circuits and the perforated holes 20 with an etching resist in order to prevent etching. Step (
4) is an etching step for removing the copper foil not coated with etching resist. In this process, copper foil remains at the conductive circuits of the insulating substrate 2 and the perforated holes 20. Step (5) is a step of removing the etching resist for preventing etching. Step (6) is a step in which the copper foils 4 present at both ends of the perforated hole 20 of the insulating substrate 2 are thermocompressed and welded from both sides. To explain in detail, two guide holes 21 are provided in the insulating substrate 2, and a pin, which is a jig on the welding machine (not shown), is inserted into the guide holes to determine the position of the drilled hole 20 in the substrate 2. and upper and lower welding terminals 7 of the welder
.. Align position 8. Next, upper and lower welding terminals 7.8 are brought closer to each other from above and below relative to the position of the substrate 2, and the upper and lower copper foils 4 are pressed against each other while being heated. The heating method may be electrical, ultrasonic, or other heating methods. Through the above steps, a conductor circuit pattern of perforated holes (through holes) is created.
以上のことは熔接器を多軸の溶接ユニントと組み合わせ
ることにより連続加工が可能になる。Continuous processing of the above becomes possible by combining a welder with a multi-axis welding unit.
一方、ポリイミド等の絶縁基板は厚みが100μm以下
の材料を対象とする。これは、それ以上であると、穿孔
穴20の両端の銅箔を熔接器で熔接するとき、変形量が
大きくなり銅箔4が破断するためである。On the other hand, insulating substrates such as polyimide are intended for materials with a thickness of 100 μm or less. This is because if the deformation amount exceeds this, when the copper foils at both ends of the perforated hole 20 are welded with a welder, the amount of deformation becomes large and the copper foil 4 breaks.
無電解と電解メツキが不要になるため、メツキに要する
せつび投資が不要になり、又そのランニングコストも不
要になり、コストダウンが図れると同時に、また熔接に
よる導通であるから導通に対する信頼性が高くなると言
う効果がある。Since electroless plating and electrolytic plating are no longer required, there is no need to invest in plating, and the running costs are also eliminated, reducing costs. At the same time, since conduction is achieved by welding, the reliability of conduction is improved. It has the effect of increasing the price.
第1図は、本発明の工程を示す断面図であり、第2図は
、従来技術の工程を示す断面図である。
■・・・接着剤 2・・・絶縁基板4 ・ ・
・ 銅箔 5 ・ ・ ・ エフ
チンクレジスト20・・穿孔穴
以上FIG. 1 is a sectional view showing the process of the present invention, and FIG. 2 is a sectional view showing the process of the prior art. ■... Adhesive 2... Insulating substrate 4 ・ ・
・ Copper foil 5 ・ ・ ・ E-chin resist 20...Drilled hole or more
Claims (1)
且つ両面に接着剤を塗布してある高分子絶縁基板の両面
に銅箔を熱圧着し、 その後前記絶縁基板をエッチングして、前記銅箔の一部
が前記穿孔穴の両端を覆う状態で導体回路パターンを形
成し、 その後前記穿孔穴の両端に形成されている部分の前記導
体回路パターンの銅箔を熔接端子で熔接することを特徴
とする溶接によるスルーホール導通形成法。[Claims] Having at least one or more perforated holes at predetermined positions,
Copper foil is thermocompression bonded to both sides of a polymer insulating board with adhesive applied to both sides, and then the insulating board is etched to form a conductor with a portion of the copper foil covering both ends of the perforated hole. A method for forming through-hole conductivity by welding, comprising forming a circuit pattern, and then welding the copper foil of the conductor circuit pattern formed at both ends of the perforated hole with a welding terminal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30626289A JPH03241787A (en) | 1989-11-24 | 1989-11-24 | Formation of through-hole continuity by welding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30626289A JPH03241787A (en) | 1989-11-24 | 1989-11-24 | Formation of through-hole continuity by welding |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03241787A true JPH03241787A (en) | 1991-10-28 |
Family
ID=17954962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30626289A Pending JPH03241787A (en) | 1989-11-24 | 1989-11-24 | Formation of through-hole continuity by welding |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03241787A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09283881A (en) * | 1996-04-12 | 1997-10-31 | Yamaichi Electron Co Ltd | Interlayer connecting structure in circuit board |
KR20030021654A (en) * | 2001-09-07 | 2003-03-15 | 지식정보기술 주식회사 | Both sides material connecting Method of PCB of film type |
-
1989
- 1989-11-24 JP JP30626289A patent/JPH03241787A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09283881A (en) * | 1996-04-12 | 1997-10-31 | Yamaichi Electron Co Ltd | Interlayer connecting structure in circuit board |
KR20030021654A (en) * | 2001-09-07 | 2003-03-15 | 지식정보기술 주식회사 | Both sides material connecting Method of PCB of film type |
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