JPH0297239A - Power source equipment for aligner - Google Patents
Power source equipment for alignerInfo
- Publication number
- JPH0297239A JPH0297239A JP63246261A JP24626188A JPH0297239A JP H0297239 A JPH0297239 A JP H0297239A JP 63246261 A JP63246261 A JP 63246261A JP 24626188 A JP24626188 A JP 24626188A JP H0297239 A JPH0297239 A JP H0297239A
- Authority
- JP
- Japan
- Prior art keywords
- power
- power supply
- section
- power source
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009826 distribution Methods 0.000 claims abstract description 30
- 230000005856 abnormality Effects 0.000 claims abstract description 13
- 238000012544 monitoring process Methods 0.000 claims abstract description 12
- 238000001514 detection method Methods 0.000 claims description 13
- 230000002159 abnormal effect Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 28
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000011084 recovery Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、例えばマスクパターンをウェハに転写する露
光装置に用いる電源装置に関し、特に停電時にも装置が
急停止しないように停電対策が講じられている電源装置
に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a power supply device used in an exposure device that transfers a mask pattern onto a wafer, for example, and in particular, a power supply device that has measures against power outages to prevent the device from suddenly stopping even in the event of a power outage. This is related to the power supply device that is used.
［従来の技術］
第４図に、従来の露光装置およびその電源装置の概略構
成を示す。同図において、２４はステジ、照明系および
アライメント部の制御回路を含むファインアライメント
部である。２５はＴＶプリアライメントの制御回路を含
むプリアライメント部、２６はウェハ搬送制御回路を含
むウェハ搬送部、２７はマスク搬送制御回路を含むマス
ク搬送部、２８は操作者がマニュアルでアライメントを
するための補助手段である操作パネル、２９は装置と操
作者とのインターフェース用の人出カ装置となるコンソ
ール、３ｏは装置全体のシーケンスを管理するミニコン
ピユータ、３１は各種データの格納および保持をおこな
う外部記憶装置としてのディスクである。また、２３は
外部から交流電源を受けて変圧および直流化等をおこな
って装置の各部へ配電するところの電源部である。[Prior Art] FIG. 4 shows a schematic configuration of a conventional exposure apparatus and its power supply device. In the figure, 24 is a fine alignment section including a stage, an illumination system, and a control circuit for the alignment section. 25 is a pre-alignment section including a control circuit for TV pre-alignment; 26 is a wafer transfer section including a wafer transfer control circuit; 27 is a mask transfer section including a mask transfer control circuit; and 28 is a section for manual alignment by the operator. An operation panel is an auxiliary means, 29 is a console serving as an outgoing device for interface between the device and the operator, 3o is a minicomputer that manages the entire sequence of the device, and 31 is an external memory for storing and retaining various data. It is a disk as a device. Further, 23 is a power supply section that receives AC power from the outside, performs voltage transformation, DC conversion, etc., and distributes the power to each part of the apparatus.
［発明が解決しようとする課題］
しかしながら上記従来例によれば、停電事故等で外部交
流電源の供給が停止した場合には露光装層全体が停止し
てしまい、次に電源が復帰したときには露光装置全体の
初期化をやり直さなければならないという欠点があった
。[Problems to be Solved by the Invention] However, according to the above conventional example, when the supply of external AC power is stopped due to a power outage accident, the entire exposure layer stops, and the next time the power is restored, the exposure layer is stopped. There was a drawback that the entire device had to be initialized again.
また、停電等の電源異常の場合に非常用の電源に切り換
える方式もあるが、非常用の電源によって電源供給が復
帰したときには、露光装置の大部分に電源供給を行なっ
てしまうので、非常用電源の容量も大きくしなりれはな
らないという経済的欠点もあった。There is also a method that switches to an emergency power supply in the event of a power failure such as a power outage, but when the power supply is restored by the emergency power supply, power is supplied to most of the exposure equipment, so the emergency power supply is It also had the economic disadvantage of having a large capacity and being unable to bend.
さらに、最近注目されているＸ線を光源とするＸ線露光
装置では、密閉された容器内で露光に適した雰囲気をつ
くっているので、短時間の停電であっても、装置を再立
ち上げするには上記の露光霊囲気をつくることから始め
なければならない。Furthermore, X-ray exposure equipment that uses X-rays as a light source, which has been attracting attention recently, creates an atmosphere suitable for exposure in a sealed container, so even if there is a short power outage, the equipment can be restarted. To do this, we must begin by creating the above-mentioned exposure spirit.
そのため、数時間から半日程度の時間の損失となり、ま
た露光雰囲気をつくるためヘリウム（Ｈｅ）のムダ使い
をしてしまう欠点があった。This results in a loss of time ranging from several hours to half a day, and also has the drawback of wasting helium (He) to create an exposure atmosphere.
特に、シンクロトロン軌道放射光を利用したＸ線露光装
置では、現状では光源を水平方向にしか導入することか
できない。したがって、ウェハにマスクパターンを転写
するためには、ウニへ面を垂直に保持する真空吸着手段
等が必要であり、従来の方法では停電時にウェハ落下等
の事故につながる欠点があった。In particular, in an X-ray exposure apparatus that uses synchrotron orbital synchrotron radiation, the light source can only be introduced horizontally at present. Therefore, in order to transfer a mask pattern onto a wafer, a vacuum suction means or the like is required to hold the surface perpendicular to the wafer, and the conventional method has the disadvantage that it can lead to accidents such as the wafer falling during a power outage.
本発明は、上述の従来形における問題点に鑑み、停電等
の電源異常が原因となって発生するウェハ落下等の事故
を無くし、非常用の電源の容量を従来より小さく紅済的
なものとし、さらに電源が正常に復帰した場合に容易に
再稼動することのできる露光装置用電源装置を提供する
ことを目的とする。In view of the problems with the conventional type described above, the present invention eliminates accidents such as wafer dropping caused by power failures such as power outages, and makes the capacity of the emergency power source smaller and more economical than before. Another object of the present invention is to provide a power supply device for an exposure apparatus that can be easily restarted when the power supply is restored to normal.
［課題を解決するための手段および作用］上記の目的を
達成するため、本発明に係る露光装置用電源装置は、正
常運転時には第１の電源部から露光装置内の各部分に対
し電源を供給し、電源異常により第１の電源部から正常
に電源を供給することができなくなった場合には第２の
電源部から電源を供給することとし、また電源監視部か
ら電源異常の検出信号を配電部へと送出し、配電部では
第１の電源部から第２の電源部へと供給源を切り換える
とともに、電源供給対象を露光装置内の所定の部分のみ
に制限することとしている。[Means and effects for solving the problem] In order to achieve the above object, the power supply device for an exposure apparatus according to the present invention supplies power to each part in the exposure apparatus from the first power supply section during normal operation. However, if power cannot be normally supplied from the first power supply section due to a power supply abnormality, power will be supplied from the second power supply section, and a power supply abnormality detection signal will be distributed from the power supply monitoring section. The power distribution section switches the supply source from the first power supply section to the second power supply section, and limits the power supply to only a predetermined section within the exposure apparatus.
すなわち、停電等の電源異常時には、第１の電源部によ
る電源供給から第２の電源部による電源供給に速やかに
切り換えると同時に、露光装置内の電源供給対象を必要
最小限としている。これにより、必要最小限の機器には
第２の電源部から電源が供給されることとなり、ウェハ
の落下等の事故を無くすことができる。また、第２の電
源部の容量は小さくで診る。さらに、−次側電源供給の
復帰等電源が正常状態に復帰するまで待機させるように
しているので、正常復帰時には露光装置を容易に再稼動
することができる。That is, in the event of a power supply abnormality such as a power outage, the power supply from the first power supply section is quickly switched to the power supply from the second power supply section, and at the same time, the objects of power supply within the exposure apparatus are reduced to the necessary minimum. As a result, power is supplied to the minimum necessary equipment from the second power supply section, and accidents such as dropping of wafers can be eliminated. Also, check that the capacity of the second power supply section is small. Furthermore, since the exposure apparatus is kept on standby until the power supply returns to a normal state, such as when the negative side power supply is restored, the exposure apparatus can be easily restarted when the normal state returns.
［実施例］ 以下、図面を用いて本発明の詳細な説明する。[Example] Hereinafter, the present invention will be explained in detail using the drawings.
第１図は、本発明の第１の実施例に係る露光装置用電源
装置を適用した露光装置の構成を示すブロック図である
。同図において、１は第１の電源部、２は第２の電源部
、３は停電等の電源異常を監視するところの電源監視部
、５は露光装置内の各配電対象に配電する配電部、６は
配電部５と各配電対象とを結ぶ配電ライン、７は配電部
５と各配電対象とを結ぶもう一つの配電ラインである。FIG. 1 is a block diagram showing the configuration of an exposure apparatus to which a power supply device for an exposure apparatus according to a first embodiment of the present invention is applied. In the figure, 1 is a first power supply unit, 2 is a second power supply unit, 3 is a power supply monitoring unit that monitors power supply abnormalities such as power outages, and 5 is a power distribution unit that distributes power to each power distribution target in the exposure apparatus. , 6 is a power distribution line connecting the power distribution unit 5 and each power distribution target, and 7 is another power distribution line connecting the power distribution unit 5 and each power distribution target.
８はウェハおよびマスクの搬送のための真空吸着等のバ
ルブ制御と真空ポンプの制御をするところの搬送ポンプ
・バルブ制御部、９はウェハ搬送のためのアクチュエー
タおよびセンサ等の制御をするところのウェハ搬送制御
部、１０はマスクの搬送のためのアクチュエータおよび
センサ等の制御をするところのマスク搬送制御部、１１
は搬送にかかわる各部の中央制御をするところの搬送中
央制御部である。Reference numeral 8 denotes a transfer pump/valve control unit that controls valves such as vacuum suction and vacuum pumps for transferring wafers and masks, and 9 refers to a wafer control unit that controls actuators, sensors, etc. for wafer transfer. A transport control unit 10 is a mask transport control unit 11 that controls actuators, sensors, etc. for transporting the mask.
is a conveyance central control section that centrally controls each section related to conveyance.
また、１２はウェハステージの制御をするところのステ
ージ制御部、１３はマスクとウェハのプリアライメント
をするところのプリアライメント制御部、１４はマスク
とウェハのファインアライメントをするところのファイ
ンアライメント制御部、１５は露光時間の間開く露光シ
ャッタ部、１６はアライメントと露光の中央制御をする
ところのＡＡ（オート・アライメント）露光中央制御部
、１７は露光装置の各所の温度制御をするところの温度
制御部、１８は露光雰囲気をつくるための密閉容器内の
気圧等のコントロールをするところのチャンバ雰囲気制
御部、１９はチャンバ雰囲気と温度を中央制御する環境
中央制御部である。Further, 12 is a stage control unit that controls the wafer stage, 13 is a pre-alignment control unit that performs pre-alignment between the mask and the wafer, and 14 is a fine-alignment control unit that performs fine alignment between the mask and the wafer. 15 is an exposure shutter section that opens during the exposure time, 16 is an AA (auto alignment) exposure central control section that centrally controls alignment and exposure, and 17 is a temperature control section that controls the temperature of various parts of the exposure apparatus. , 18 is a chamber atmosphere control section that controls the air pressure inside the closed container to create an exposure atmosphere, and 19 is an environment central control section that centrally controls the chamber atmosphere and temperature.
２０は各種データの保持および格納を行ない操作者との
マンマシンインターフェースを実現するコンソール部、
２１は各中央制御部と個別機能の制御部との間を結ぶ制
御パスラインである。２２は電源監視部３か配電部５へ
向けて出力する停電検出信号（異常検出信号）である。20 is a console unit that holds and stores various data and realizes a man-machine interface with the operator;
Reference numeral 21 denotes a control path line connecting each central control section and the control sections of individual functions. 22 is a power failure detection signal (abnormality detection signal) output to the power supply monitoring section 3 or the power distribution section 5.
上記構成において、外部交流電源が正常に電源１および
電源２に供給されている間は、電源１は露光装置に給電
するために配電部５に各種の電力を出力している。この
とき、電源２は内部の蓄電池に充電をしており、配電部
５へは電力供給を停止している状態にある。電源監視部
３は電源１の動作状態を監視しており、前述のように電
源１が正常に電力供給をしているとぎは、停電検出信号
２２は正常状態を示している。配電部５は前記の正常状
態を示している停電検出信号２２を受りて、配電ライン
６および配電ライン７に給電をする。In the above configuration, while the external AC power is being normally supplied to the power supplies 1 and 2, the power supply 1 outputs various kinds of power to the power distribution section 5 in order to supply power to the exposure apparatus. At this time, the power supply 2 is charging its internal storage battery and is in a state where power supply to the power distribution unit 5 is stopped. The power supply monitoring unit 3 monitors the operating state of the power supply 1, and when the power supply 1 is normally supplying power as described above, the power failure detection signal 22 indicates a normal state. The power distribution unit 5 receives the power outage detection signal 22 indicating the normal state, and supplies power to the power distribution line 6 and the power distribution line 7.
配電ライン６は、ウェハ搬送制御部９、マスク搬送制御
部１０、搬送中央制御部１１、プリアライメント制御部
１３、ファインアライメント制御部１４、露光シャッタ
部１５、ＡＡ露光中央制御部１６、温度制御部１７、チ
ャンバ雰囲気制御部１８および環境中央制御部１９へ接
続されており、各制御部で必要とする各種の電圧の直流
および交流電力を供給している。給電ライン７は、搬送
ポンプ・バルブ制御部８、ステージ制御部１２およびコ
ンソール部２０へ接続されており、これらの各制御部で
必要とする各種の電圧の直流および交梳電力を供給して
いる。The power distribution line 6 includes a wafer transfer control section 9, a mask transfer control section 10, a transfer central control section 11, a pre-alignment control section 13, a fine alignment control section 14, an exposure shutter section 15, an AA exposure central control section 16, and a temperature control section. 17, is connected to the chamber atmosphere control section 18 and the environment central control section 19, and supplies DC and AC power of various voltages required by each control section. The power supply line 7 is connected to the transfer pump/valve control section 8, the stage control section 12, and the console section 20, and supplies DC and AC power of various voltages required by each of these control sections. .
搬送中央制御部１１は、ウェハおよびマスク搬送にかか
わる各制御部、すなわち搬送ポンプ・バルブ制御部８、
ウェハ搬送制御部９およびマスク搬送制御部１０の上位
に当る制御部であって、制御パスライン２１を通してこ
れら各部に対する中央制御を行なう。搬送ポンプ・バル
ブ制御部８は、ウェハおよびマスク搬送につかわれる真
空ポンプ、真空計およびバルブの制御を担当する。ウェ
ハ搬送制御部９は、ウェハを搬送するための各種アクチ
ュエータセンサの制御を担当している。The transport central control unit 11 includes various control units related to wafer and mask transport, that is, a transport pump/valve control unit 8,
This control section is located above the wafer transfer control section 9 and the mask transfer control section 10, and centrally controls these sections through the control path line 21. The transfer pump/valve control unit 8 is in charge of controlling vacuum pumps, vacuum gauges, and valves used for wafer and mask transfer. The wafer transport control unit 9 is in charge of controlling various actuator sensors for transporting wafers.
マスク搬送制御部１０は、マスクを搬送するための各種
アクチュエータおよびセンサの制御を担当している。The mask transport control unit 10 is in charge of controlling various actuators and sensors for transporting the mask.
ＡＡ露光中央制御部１６は、ステージ制御部１２、プリ
アライメント制御部１３、ファインアライメント制御部
１４および露光シャッタ部１５の上位に当る制御部であ
って、制御パスライン２１を通じてこれら各部に対する
中央制御を行なう。ステージ制御部１２は、マスクとウ
ェハとの位置合せに用いるステージの制御を担当する。The AA exposure central control section 16 is a control section above the stage control section 12, pre-alignment control section 13, fine alignment control section 14, and exposure shutter section 15, and centrally controls these sections through the control path line 21. Let's do it. The stage control unit 12 is in charge of controlling a stage used for aligning a mask and a wafer.
プリアライメント制御部１３は、マスクとウェハとの粗
い位置合せ（プリアライメント）を担当する。ファイン
アライメント制御部１４はマスクとウェハとの高精度な
位置合せ（ファインアライメント）を担当する。露光シ
ャッタ部１５はシャッタの制御を担当する。The pre-alignment control unit 13 is in charge of rough alignment (pre-alignment) between the mask and the wafer. The fine alignment control unit 14 is in charge of highly accurate alignment (fine alignment) between the mask and the wafer. The exposure shutter section 15 is in charge of shutter control.
環境中央制御部１９は、温度制御部１７とチャンバ雰囲
気制御部１８の上位に当る制御部であって、制御パスラ
イン２１を通じてこれら各部に対する中央制御を担当す
る。温度制御部１７は、ウェハの温度および周囲温度等
の制御を担当する。The environment central control section 19 is a control section above the temperature control section 17 and the chamber atmosphere control section 18, and is in charge of central control of these sections through the control path line 21. The temperature control unit 17 is in charge of controlling the wafer temperature, ambient temperature, and the like.
チャンバ雰囲気制御部１８は、露光に最適な気圧および
ガス組成の制御を担当する。The chamber atmosphere control unit 18 is in charge of controlling the optimum atmospheric pressure and gas composition for exposure.
コンソール部２０は、各種データの蓄積とマンマシンイ
ンターフェースを担当する。The console unit 20 is in charge of accumulating various data and providing a man-machine interface.
次に、外部交流電源が異常状態例えば停電となったとき
、電源監視部３は速やかにこの停電を検知して停電検出
信号２２を停電状態にする。電源２は、停電になると内
部蓄電池に対する充電を停止し、電力を配電部５に対し
て供給する。このとき、電源１は配電部５に対する電力
供給ができなくなっている。そして、停電状態を示して
いる停電検出信号２２を受けた配電部５は、配電ライン
６に対する給電を停止し、配電ライン７に対する給電を
続ける。Next, when the external AC power supply is in an abnormal state, for example, a power outage occurs, the power supply monitoring unit 3 promptly detects this power outage and sets the power outage detection signal 22 to the power outage state. When a power outage occurs, the power supply 2 stops charging the internal storage battery and supplies power to the power distribution unit 5. At this time, the power supply 1 is unable to supply power to the power distribution unit 5. Then, upon receiving the power failure detection signal 22 indicating a power outage state, the power distribution unit 5 stops power supply to the power distribution line 6 and continues power supply to the power distribution line 7 .
この結果、配電ライン６に接続されているすべての制御
部は動作を停止する。一方、配電ライン７に接続されて
いる搬送ポンプ・バルブ制御部８、ステージ制御部１２
およびコンソール部２０には電源が供給されているので
、これらの部分は停電時の最小限の動作を続ける。As a result, all control units connected to the power distribution line 6 stop operating. On the other hand, a transfer pump/valve control section 8 and a stage control section 12 are connected to the power distribution line 7.
Since power is supplied to the console section 20 and the console section 20, these sections continue to operate at a minimum level during a power outage.
第２図は、上記実施例の装置の動作を説明するためのタ
イミングチャートである。外部交流電源の停電に同期し
て、第１の電源部１から第２の電源部２へと切り換り、
同時に配電ライン６への給電が停止している。その結果
、消費電力が低下している様子がわかる。FIG. 2 is a timing chart for explaining the operation of the apparatus of the above embodiment. Switching from the first power supply section 1 to the second power supply section 2 in synchronization with a power outage of the external AC power supply,
At the same time, power supply to the power distribution line 6 is stopped. As a result, it can be seen that power consumption is decreasing.
本実施例によれば、以下のような効果がある。According to this embodiment, the following effects are achieved.
■ 停電時には最小限の制御部だけに給電しているので
第２の電源部２の規模が最小限でよい。したがって、経
済的効果がある他に、スペースファクタの点でも有利で
ある。- Since power is supplied to only the minimum number of control units during a power outage, the size of the second power supply unit 2 can be kept to a minimum. Therefore, in addition to being economically effective, it is also advantageous in terms of space factor.
■ 停電時に搬送ポンプ・バルブ制御部８に給電されて
いるので、吸着中のウェハを落下させてしまう危険を回
避できる。- Since power is supplied to the transfer pump/valve control unit 8 during a power outage, it is possible to avoid the risk of dropping the wafer being sucked.
■ 停電時にもコンソール部２０へ給電しているので、
電源異常が発生したときのマンマシン・インターフェー
スを確保でき安全である。■ Power is supplied to the console unit 20 even during a power outage, so
It is safe because a man-machine interface can be secured in the event of a power failure.
また、保存前のデータを保存する時間もあり信頼性の高
いシステムになる。Additionally, there is time to save data before it is saved, making the system highly reliable.
■停電時にもステージ制御部１２へ給電しているので、
ステージを停電直前の状態に保持でき、停電から回復し
たときのウェハ回収などの動作が容易である。■Since power is supplied to the stage control unit 12 even during a power outage,
The stage can be maintained in the state immediately before a power outage, and operations such as wafer recovery after recovery from a power outage are easy.
［他の実施例コ
第３図は、本発明の第２の実施例に係る電源装置を適用
した露光装置の構成を示すブロック図である。同図にお
いて、第１図と同一の付番は同または共通の部分を示す
ものとする。第３図の構成では、第１図のものと異なり
電源２および電源監視部３がない。ただし、工場内無停
電電源４が追加されており、電源監視部はこの工場内無
停電電源４の内部に設けられている。また、工場内無停
電電源４は、正常時に電源供給を行なう回路（第１図の
第１の電源部１に相当する）および外部交流電源の異常
等の場合に電源供給を行なう回路（第１図の第２の電源
部２に相当する）を備えている。[Other Embodiments] FIG. 3 is a block diagram showing the configuration of an exposure apparatus to which a power supply device according to a second embodiment of the present invention is applied. In this figure, the same numbers as in FIG. 1 indicate the same or common parts. The configuration shown in FIG. 3 differs from the configuration shown in FIG. 1 in that it does not have a power source 2 and a power source monitoring section 3. However, an in-factory uninterruptible power supply 4 is added, and a power supply monitoring section is provided inside this in-factory uninterruptible power supply 4. The factory uninterruptible power supply 4 also includes a circuit (corresponding to the first power supply unit 1 in FIG. 1) that supplies power during normal times and a circuit (the first (corresponding to the second power supply section 2 in the figure).
本実施例は、露光装置の外部に工場内無停電電源４を設
置する場合の実施例である。露光装置は工場内無停電電
源４より電力供給を受ける。また、停電検出信号２２が
工場内無停電電源４の内部の不図示の電源監視部から露
光装置内の配電部５へ入力されている。この停電検出信
号２２は、工場内無停電電源４の内部の電源監視部が停
電を検出した時は停電状態を示す。配電部５は、この停
電検出信号２２の状態を見て、第１の実施例と同様の動
作をする。This embodiment is an embodiment in which an in-factory uninterruptible power supply 4 is installed outside the exposure apparatus. The exposure apparatus receives power from an in-factory uninterruptible power supply 4. Further, a power failure detection signal 22 is inputted from a power supply monitoring section (not shown) inside the factory uninterruptible power supply 4 to the power distribution section 5 in the exposure apparatus. This power outage detection signal 22 indicates a power outage state when the internal power monitoring section of the in-factory uninterruptible power supply 4 detects a power outage. The power distribution unit 5 looks at the state of this power outage detection signal 22 and performs the same operation as in the first embodiment.
なお、複数の露光装置の内に無停電電源を設けるより、
製造ライン全体で１つの無停電電源を設置した方が経済
的には得策である。Note that rather than installing uninterruptible power supplies in multiple exposure devices,
It is economically advantageous to install one uninterruptible power supply for the entire production line.
［発明の効果コ
以上説明したように、本発明によれば、停電等の電源異
常が発生した場合に非常用の第２の電源部に切り換え、
露光装置内の必要最小限の部分に給電することとしてい
るので、電源異常が原因で発生する事故やウェハ損品な
なくすことができる。また、第２の電源部による給電は
必要最小限でよいので、その容量も最小限でよく経済的
である。さらに、必要最小限の部分は稼動を続けている
ので、電源異常から復帰したときの露光装置の再稼動が
容易である。[Effects of the Invention] As explained above, according to the present invention, when a power supply abnormality such as a power outage occurs, switching to the emergency second power supply unit,
Since power is supplied to the minimum necessary parts of the exposure apparatus, accidents and lost wafers caused by power supply abnormalities can be eliminated. Furthermore, since the second power supply unit only needs to supply the minimum amount of power, its capacity can also be kept to a minimum, which is economical. Furthermore, since the minimum necessary parts continue to operate, it is easy to restart the exposure apparatus when the exposure apparatus recovers from a power failure.
第１図は、本発明の第１の実施例に係る露光装置用電源
装置を適用した露光装置の構成を示すブロック図、
第２図は、上記実施例の装置の動作を説明するためのタ
イミングチャート、
第３図は、本発明の第２の実施例に係る電源装置を適用
した露光装置の構成を示すブロック図、第４図は、従来
の露光装置およびその電源装置の概略構成図である。
第１の電源部、
第２の電源部、
電源監視部、
工場内無停電電源、
配電部、
７ 配電ライン、
搬送ポンプ・バルブ制御部、
ウェハ搬送制御部、
マスク搬送制御部、
：ｒ送中央制御部、
：ステージ制御部、
ニブリアライメン）・制御部、
：ファインアライメント制御部、
：露光シャッタ部、
二ＡＡ露光中央制御部、
：温度制御部、
：チャンバー雰囲気制御部、
環境中央制御部、
コンソール部、
制御パスライン、
２２ 停電検出信号。FIG. 1 is a block diagram showing the configuration of an exposure apparatus to which a power supply device for an exposure apparatus according to the first embodiment of the present invention is applied, and FIG. 2 is a timing chart for explaining the operation of the apparatus of the above embodiment. 3 is a block diagram showing the configuration of an exposure apparatus to which a power supply device according to a second embodiment of the present invention is applied, and FIG. 4 is a schematic configuration diagram of a conventional exposure apparatus and its power supply device. . 1st power supply section, 2nd power supply section, power supply monitoring section, in-factory uninterruptible power supply, power distribution section, 7 power distribution line, transfer pump/valve control section, wafer transfer control section, mask transfer control section, :r transfer center control unit, :stage control unit, nib rear alignment control unit, :fine alignment control unit, :exposure shutter unit, 2AA exposure central control unit, :temperature control unit, :chamber atmosphere control unit, environment central control unit, Console section, control path line, 22 power outage detection signal.
Claims (1)
給する第１の電源部と、電源異常により該第１の電源部
から正常に電源を供給することができなくなった場合に
電源を供給する第２の電源部と、該電源異常を検出して
異常検出信号を送出する電源監視部と、該異常検出信号
を受けて、上記第１の電源部から上記第２の電源部へと
供給源を切り換え、さらに電源供給対象を露光装置内の
所定の部分のみに制限する配電部とを具備することを特
徴とする露光装置用電源装置。(1) A first power supply section that supplies power to each part of the exposure apparatus during normal operation, and a power supply section that supplies power to each part of the exposure apparatus when it is no longer able to normally supply power from the first power supply section due to a power failure. a second power supply unit that supplies power, a power supply monitoring unit that detects the power supply abnormality and sends out an abnormality detection signal, and receives the abnormality detection signal from the first power supply unit to the second power supply unit. 1. A power supply device for an exposure apparatus, comprising: a power distribution section that switches a supply source and further limits power supply to a predetermined portion within the exposure apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63246261A JPH0297239A (en) | 1988-09-30 | 1988-09-30 | Power source equipment for aligner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63246261A JPH0297239A (en) | 1988-09-30 | 1988-09-30 | Power source equipment for aligner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0297239A true JPH0297239A (en) | 1990-04-09 |
Family
ID=17145891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63246261A Pending JPH0297239A (en) | 1988-09-30 | 1988-09-30 | Power source equipment for aligner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0297239A (en) |
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