JPH0237232B2 - - Google Patents

Info

Publication number
JPH0237232B2
JPH0237232B2 JP58120760A JP12076083A JPH0237232B2 JP H0237232 B2 JPH0237232 B2 JP H0237232B2 JP 58120760 A JP58120760 A JP 58120760A JP 12076083 A JP12076083 A JP 12076083A JP H0237232 B2 JPH0237232 B2 JP H0237232B2
Authority
JP
Japan
Prior art keywords
cleaning
solvent
cleaning solvent
cleaned
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58120760A
Other languages
Japanese (ja)
Other versions
JPS6012187A (en
Inventor
Atsusuke Sakaida
Masanori Suzuki
Tadahiko Shibata
Hachiro Shigeta
Satoshi Kugai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP12076083A priority Critical patent/JPS6012187A/en
Publication of JPS6012187A publication Critical patent/JPS6012187A/en
Publication of JPH0237232B2 publication Critical patent/JPH0237232B2/ja
Granted legal-status Critical Current

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  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】 本発明は洗浄方法及び装置に関するものであ
り、例えば油等で汚染された精密機器類(IC、
電子機器、液晶パネル、ポンプ等)を洗浄する洗
浄方法及び装置として用いて有効である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning method and apparatus for cleaning precision instruments (IC, IC, etc.) contaminated with oil or the like.
It is effective when used as a cleaning method and device for cleaning electronic equipment, liquid crystal panels, pumps, etc.).

洗浄装置は、例えば油等で汚染された精密機器
類(例えばIC、電子機器、液晶パネル、ポンプ
等)をフロン、トリクレン等の洗浄用溶剤中に浸
漬するなどして油等を除去する装置であつて、従
来その構造は第1図に示すように、洗浄装置本体
8と蒸留器9とにより成り、洗浄装置本体1内は
ヒータ3aを有する温浴槽3、超音波振動子4a
を有する冷浴槽4、ヒータ5aを有するベーパー
槽5より構成されている。その洗浄方法は、まず
被処理物(ワーク)を治具付チエンコンベア19
に乗せ、温浴槽3に浸漬する。この温浴槽3内で
ワークに付着している油等は膨張し、一部洗浄溶
剤中に溶解する。次に、冷浴槽4内に浸漬し、超
音波により油等の異物をワークより剥離させると
同時に、ワークの温度を下げる。さらにベーパー
槽5内に搬送しベーパー雰囲気中に設置する。す
ると、ワーク表面で洗浄溶剤が凝縮しワーク表面
をすすぎ洗いする。この後、ワークを冷却蛇管7
の上部に移動させ、ワークを乾燥して取り出す。
Cleaning equipment is equipment that removes oil from precision equipment (e.g., ICs, electronic equipment, liquid crystal panels, pumps, etc.) contaminated with oil, etc. by immersing them in cleaning solvents such as chlorofluorocarbons and trichlene. As shown in FIG. 1, the conventional structure consists of a cleaning device main body 8 and a distiller 9, and the inside of the cleaning device main body 1 includes a hot bath 3 having a heater 3a, and an ultrasonic vibrator 4a.
The vapor tank 5 includes a cold bath 4 having a heater 5a and a vapor tank 5 having a heater 5a. The cleaning method is to first transfer the workpiece to a chain conveyor 19 with a jig.
and immerse it in hot tub 3. Oil and the like adhering to the work in the hot bath 3 expands and partially dissolves in the cleaning solvent. Next, the workpiece is immersed in a cold bath 4, and foreign substances such as oil are peeled off from the workpiece by ultrasonic waves, and at the same time, the temperature of the workpiece is lowered. Further, it is transported into a vapor tank 5 and placed in a vapor atmosphere. Then, the cleaning solvent condenses on the workpiece surface and rinses the workpiece surface. After this, the workpiece is cooled using the spiral pipe 7.
, dry the workpiece, and take it out.

この様な洗浄過程において、例えば1個のワー
クに付着している油分量が70mg/個のものを洗浄
して、油分量が1〜2mg/個以下の洗浄品質を得
るには温浴槽3、冷浴槽4、ベーパー槽5に各
180秒間浸漬する必要があり、設備自体が大型に、
かつヒータ3a,5a容量も大きくなり、設備
費・エネルギ費が高くなるという問題点があつ
た。
In such a cleaning process, for example, to clean a workpiece with an oil content of 70 mg/piece and obtain a cleaning quality with an oil content of 1 to 2 mg/piece, the hot bath 3, Each in cold bath 4 and vapor tank 5.
It is necessary to soak for 180 seconds, and the equipment itself is large.
In addition, the capacity of the heaters 3a and 5a also increases, resulting in an increase in equipment and energy costs.

本発明は上記問題点に鑑み、より短時間にて被
洗浄物の洗浄を行うことを目的とする。
SUMMARY OF THE INVENTION In view of the above-mentioned problems, an object of the present invention is to clean an object to be cleaned in a shorter time.

この目的を達するため本発明では、洗浄溶剤を
圧縮及び大気圧沸点以上に加熱し、その洗浄溶剤
を被洗浄物に噴射して洗浄を行う構成とした。
In order to achieve this objective, the present invention has a configuration in which a cleaning solvent is compressed and heated to a temperature above the atmospheric pressure boiling point, and the cleaning solvent is sprayed onto the object to be cleaned.

次に本発明の実施例を図に基づいて説明する。 Next, embodiments of the present invention will be described based on the drawings.

第2図は本実施例の洗浄装置8全体を示す断面
図である。洗浄装置8はその外形を外枠21によ
つて形成され、この外枠21によつて形成される
空間が内枠22によつて区画されている。この外
枠21の上方側面には搬送開口部21aが形成さ
れ、この搬送開口部21aより治具付チエンコン
ベア19に取付けられた被洗浄物23が洗浄装置
8内に搬入される。治具付チエンコンベア19は
ターンホイール20によつてその進行方向を変え
られており、搬送開口部21aより洗浄装置8内
に進行した直後に下方に向つて進行する。この治
具付チエンコンベア19が下方に向う途中にコイ
ル状の第1冷却蛇管17が配され、この第1冷却
蛇管17の内方を治具付チエンコンベア19が通
過している。第1冷却蛇管17の内部には冷水が
流れており、第1冷却蛇管17の近傍を冷却して
いる。下方に進行する治具付チエンコンベア19
は洗浄装置8の下部までると2つのターンホイー
ル20によつて進行方向を上方に逆転している。
FIG. 2 is a sectional view showing the entire cleaning device 8 of this embodiment. The outer shape of the cleaning device 8 is defined by an outer frame 21, and a space formed by the outer frame 21 is partitioned by an inner frame 22. A conveyance opening 21a is formed in the upper side surface of this outer frame 21, and the object to be cleaned 23 attached to the jig-equipped chain conveyor 19 is conveyed into the cleaning apparatus 8 through this conveyance opening 21a. The direction of movement of the jig-equipped chain conveyor 19 is changed by a turnwheel 20, and immediately after moving into the cleaning device 8 through the conveyance opening 21a, it moves downward. A coil-shaped first cooling corrugated tube 17 is disposed on the way down of the jig-equipped chain conveyor 19, and the jig-equipped chain conveyor 19 passes inside the first cooling corrugated tube 17. Cold water flows inside the first cooling corrugated tube 17 to cool the vicinity of the first cooling corrugated tube 17. Chain conveyor 19 with jig moving downward
When reaching the lower part of the cleaning device 8, the direction of movement is reversed upward by two turn wheels 20.

そして、この方向転換箇所には溶剤タンク10
が設けられ、治具付チエンコンベア19に取付け
られた被洗浄物は溶剤タンク10に貯えられた溶
剤中を進む。
At this direction change point, there is a solvent tank 10.
The object to be cleaned, which is attached to a jig-equipped chain conveyor 19, moves through the solvent stored in the solvent tank 10.

方向転換して上方に進む治具付チエンコンベア
19の周囲には内枠22によつてスプレーブース
14が区画形成され、その両脇には洗浄溶剤を被
洗浄物に噴射する噴射手段として直進性のノズル
13が配設されている。このスプレーブース14
は溶剤タンク10内に浸漬し液シールしている。
A spray booth 14 is defined by an inner frame 22 around the jig-equipped chain conveyor 19 that changes direction and moves upward, and on both sides of the spray booth 14 there are spray booths that act as spraying means for spraying cleaning solvent onto the objects to be cleaned. Nozzles 13 are arranged. This spray booth 14
is immersed in a solvent tank 10 and sealed with liquid.

そしてスプレーブース14の上方には、スプレ
ーブース14の開口部14aより溶剤噴霧が洗浄
装置8内を飛散するのを防止するために、バツフ
アーブース16が区画形成されている。
A buffer booth 16 is formed above the spray booth 14 in order to prevent the solvent spray from scattering inside the cleaning device 8 from the opening 14a of the spray booth 14.

このバツフアーブース16内で治具付チエンコ
ンベア19は2つのターンホイール20によつて
180゜方向転換され、バツフアーブース16を抜け
出た直後にまた180゜方向転換されて上方に向つて
進行する。そして上方に進む途中には第2冷却蛇
管24が配され、第2冷却蛇管24の内方を通過
後は洗浄装置8の外形に沿つて進行し、前記搬送
開口部21aに達する。
Inside this buffer booth 16, a chain conveyor 19 with jigs is operated by two turn wheels 20.
It turns 180 degrees, and immediately after exiting the buffer booth 16, it turns again 180 degrees and moves upward. A second cooling flexible pipe 24 is disposed on the way upward, and after passing inside the second cooling flexible pipe 24, it proceeds along the outer shape of the cleaning device 8 and reaches the conveyance opening 21a.

また、第2冷却蛇管24の下方には内枠22に
よつてポンプ室25が区画形成されており、この
ポンプ室25内部には洗浄溶剤を圧縮吐出する圧
縮手段としてスプレーポンプ11が配設され、さ
らにスプレーポンプ11より圧縮吐出された洗浄
溶剤を大気圧沸点以上に加熱するための加熱手段
として熱交換器12が配されている。尚、この熱
交換器12は温水等により間接加熱するものであ
る。
Further, a pump chamber 25 is defined below the second cooling corrugated pipe 24 by the inner frame 22, and a spray pump 11 is disposed inside the pump chamber 25 as a compression means for compressing and discharging the cleaning solvent. Furthermore, a heat exchanger 12 is disposed as a heating means for heating the cleaning solvent compressed and discharged from the spray pump 11 to a temperature higher than the atmospheric pressure boiling point. Note that this heat exchanger 12 is for indirect heating using hot water or the like.

前記溶剤タンク10と前記ポンプ室25との間
には清浄溶剤タンク10aが形成されており、こ
の清浄溶剤タンク10aには蒸留装置9で蒸留さ
れたきれいな洗浄溶剤が流入している。そして前
記スプレーポンプ11の吸収管がこの清浄溶剤タ
ンク10a内に開口しており、清浄溶剤タンク1
0a内中に蒸留された溶剤は前記スプレーポンプ
11によつて吸い上げられ、圧縮された後前記熱
交換器12に送られる。そして熱交換器12で大
気圧沸点以上に加熱された後配管15を通つて前
記ノズル13まで圧送され、ノズル13より噴射
される。
A clean solvent tank 10a is formed between the solvent tank 10 and the pump chamber 25, and a clean cleaning solvent distilled in the distillation device 9 flows into the clean solvent tank 10a. The absorption pipe of the spray pump 11 opens into the clean solvent tank 10a, and the clean solvent tank 1
The solvent distilled into Oa is sucked up by the spray pump 11, compressed, and then sent to the heat exchanger 12. After being heated to a temperature higher than the atmospheric pressure boiling point in the heat exchanger 12, it is pressure-fed through the pipe 15 to the nozzle 13, and is injected from the nozzle 13.

洗浄溶剤はノズル13より大気圧沸点以上の高
温液となつて噴射されるため、被洗浄物に掛つた
高温液、及び掛らなかつた高温液溶剤は蒸発し、
蒸気になつて洗浄装置8内を浮遊するが、第1、
第2冷却蛇管17,24によつて冷却液化され
る。第1冷却蛇管17及び第2冷却蛇管24にて
冷却液化された洗浄溶剤は、洗浄装置8の外面に
設置された水分分離器18に流入する。この水分
分離器18は溶剤と水とを比重によつて分離する
装置で、分離された溶剤は前記蒸留器9によつて
蒸留された溶剤と合流し、前記清浄溶剤タンク1
0a内に流入する。また、前記溶剤タンク10よ
り溢れ出た溶剤は回収れ、蒸留器9に送られて蒸
留精製される。尚、洗浄装置8内の蒸留溶剤は第
1、第2冷却蛇管17,24のみによつて冷却液
化されるのではなく、洗浄装置8内を浮遊してい
る間に自然冷却され、液化して溶剤タンク10あ
るいは清浄溶剤タンク10aに流れ込むものもあ
る。また本実施例では洗浄溶剤としてフロン溶剤
を用いている。
Since the cleaning solvent is injected from the nozzle 13 as a high-temperature liquid with a boiling point above atmospheric pressure, the high-temperature liquid that has splashed on the object to be cleaned and the high-temperature liquid solvent that has not been splashed on the object to be cleaned evaporates.
It turns into steam and floats inside the cleaning device 8, but the first
It is cooled and liquefied by the second cooling spiral pipes 17 and 24. The cleaning solvent cooled and liquefied in the first cooling spiral pipe 17 and the second cooling spiral pipe 24 flows into a moisture separator 18 installed on the outer surface of the cleaning device 8 . This water separator 18 is a device that separates a solvent and water based on specific gravity, and the separated solvent joins the solvent distilled by the distiller 9, and the purified solvent tank 1
Flows into 0a. Further, the solvent overflowing from the solvent tank 10 is collected and sent to the distiller 9 for distillation and purification. Note that the distilled solvent in the cleaning device 8 is not cooled and liquefied only by the first and second cooling coil pipes 17 and 24, but is naturally cooled and liquefied while floating in the cleaning device 8. Some flows into the solvent tank 10 or the clean solvent tank 10a. Further, in this embodiment, a fluorocarbon solvent is used as the cleaning solvent.

次に本実施例の作動について説明する。 Next, the operation of this embodiment will be explained.

まず、外枠21の搬送開口部21aより外方に
出ている治具付チエンコンベア19に、油等で汚
れた被洗浄物23を取り付ける。治具付チエンコ
ンベア19は図示しない駆動源により第2図中矢
印Rで示す方向に駆動されており、最初に被洗浄
物23は第1冷却蛇管17の内方を通過する。そ
の後治具付チエンコンベア19の進行に伴い溶剤
タンク10内に入り、洗浄溶剤に浸漬する。この
とき被洗浄物23に付着している油等は膨張し、
一部洗浄溶剤中に溶解する。そして、次にスプレ
ーブース14内に入り、ノズル13から溶剤を噴
射される。前記清浄溶剤タンク10aよりスプレ
ーポンプ11によつて吸い上げられた洗浄溶剤は
約2Kg/cm2(ゲージ圧)まで圧縮され、その後熱
交換器12によつて約80℃まで加熱される。そし
てこの圧縮加熱された洗浄溶剤がノズル13より
噴射されるものである。
First, the object to be cleaned 23 contaminated with oil or the like is attached to the jig-equipped chain conveyor 19 extending outward from the transport opening 21 a of the outer frame 21 . The jig-equipped chain conveyor 19 is driven by a drive source (not shown) in the direction indicated by an arrow R in FIG. 2, and the object to be cleaned 23 first passes inside the first cooling corrugated pipe 17. Thereafter, as the jig-equipped chain conveyor 19 advances, it enters the solvent tank 10 and is immersed in the cleaning solvent. At this time, oil etc. adhering to the object to be cleaned 23 expands,
Partially soluble in cleaning solvents. Then, the user enters the spray booth 14 and is sprayed with solvent from the nozzle 13. The cleaning solvent sucked up from the cleaning solvent tank 10a by the spray pump 11 is compressed to about 2 kg/cm 2 (gauge pressure), and then heated to about 80° C. by the heat exchanger 12. The compressed and heated cleaning solvent is then injected from the nozzle 13.

ここで、洗浄溶剤に加える圧力と洗浄溶剤(フ
ロン溶剤)の沸点との関係を第3図に示す。この
第3図よりわかる様に、洗浄溶剤は大気圧下で
47.6℃で蒸発するが、2Kg/cm2加圧時では84℃で
蒸発する。従つてノズル13内までには2Kg/
cm2、80℃の洗浄溶剤は高温液状のままであり、こ
の洗浄溶剤液を被洗浄物に向けて噴射させるので
ある。また、被洗浄物に掛らなかつた液は液自体
の保有している熱容量で蒸発する。常温と80℃と
のフロン溶剤の保有する熱エネルギは約10倍異な
る。この熱エネルギを利用して80℃の洗浄溶剤液
を被洗浄物に照射させることにより、被洗浄物表
面に付着している油等は従来540秒かかつていた
ものが約30秒で約70mg/個から1〜2mg/個の残
留油分になる。さらに、100μ程の微細な空隙に
ある油でも、80℃の洗浄溶剤液が浸透し、空隙内
で高温洗浄溶剤液が蒸発し、この洗浄溶剤蒸気の
動きにより洗浄溶剤液が複雑に挙動し微細空隙内
の油等も洗浄する。なお、被洗浄物の汚染程度に
よつては圧力、温度とも下げても良い洗浄品質が
得られる。ただし、大気圧沸点以上にする必要が
ある。
Here, FIG. 3 shows the relationship between the pressure applied to the cleaning solvent and the boiling point of the cleaning solvent (fluorocarbon solvent). As you can see from Figure 3, the cleaning solvent is
It evaporates at 47.6℃, but when the pressure is 2Kg/ cm2 , it evaporates at 84℃. Therefore, up to the inside of the nozzle 13, 2 kg/
The cleaning solvent at 80° C. cm 2 remains in a high-temperature liquid state, and this cleaning solvent solution is sprayed toward the object to be cleaned. Further, the liquid that does not touch the object to be cleaned evaporates due to the heat capacity of the liquid itself. The thermal energy possessed by fluorocarbon solvents at room temperature and 80°C differs by approximately 10 times. By using this thermal energy to irradiate the object with a cleaning solvent solution at 80°C, the oil and other substances adhering to the surface of the object to be cleaned can be reduced to 70 mg/kg in about 30 seconds, compared to the previous 540 seconds. 1 to 2 mg of residual oil per piece. Furthermore, the cleaning solvent solution at 80°C penetrates into the oil in minute voids of about 100μ, and the high-temperature cleaning solvent solution evaporates within the voids.The movement of this cleaning solvent vapor causes the cleaning solvent solution to behave in a complicated manner. Also clean oil etc. in the void. Note that, depending on the degree of contamination of the object to be cleaned, good cleaning quality can be obtained by lowering both the pressure and temperature. However, the temperature must be above the atmospheric pressure boiling point.

溶剤液噴射によつて洗浄された被洗浄物は、治
具付チエンコンベア19に伴つて、第2冷却蛇管
24の内方を通過して乾燥され、搬送開口部21
aまで運ばれる。
The objects to be cleaned that have been cleaned by spraying the solvent liquid are passed through the inside of the second cooling corrugated pipe 24 along with the jig-equipped chain conveyor 19 and dried, and then passed through the conveying opening 21.
carried to a.

ノズル13より噴射されて液化した洗浄溶剤は
溶剤タンク10内に流れ込み、蒸気のままの洗浄
溶剤は第1、第2冷却蛇管17,24によつて冷
却液化され、溶剤タンク10あるいは清浄溶剤タ
ンク10a内に流入する。そして、溶剤タンク1
0内に流入する汚れた洗浄溶剤は蒸留器9に送ら
れ、蒸留器9によつて蒸留された後、清浄溶剤タ
ンク10a内に送られる。この様な洗浄溶剤の流
れが繰り返される。
The cleaning solvent sprayed from the nozzle 13 and liquefied flows into the solvent tank 10, and the cleaning solvent in vapor state is cooled and liquefied by the first and second cooling coil pipes 17, 24, and then transferred to the solvent tank 10 or the cleaning solvent tank 10a. flow inside. And solvent tank 1
The dirty cleaning solvent flowing into the tank 10 is sent to the distiller 9, and after being distilled by the distiller 9, it is sent into the cleaning solvent tank 10a. This flow of cleaning solvent is repeated.

本実施例の様な洗浄装置を用いれば、ノズル1
3より溶剤を噴射する空間が内枠22によつてス
プレーブース14として区画されているため、噴
射溶剤が洗浄装置8外に飛散することはほとんど
ない。従つて作業環境を良好に保ちつづけること
ができる。
If a cleaning device like this embodiment is used, nozzle 1
Since the space in which the solvent is sprayed from the cleaning device 3 is divided by the inner frame 22 as the spray booth 14, the sprayed solvent is hardly scattered outside the cleaning device 8. Therefore, it is possible to continue to maintain a good working environment.

尚、上記実施例では洗浄溶剤としてフロン溶剤
を用いたが、トリクレン、トリクロールエタン等
の洗浄溶剤でも同様の効果を得ることができる。
In the above embodiments, a chlorofluorocarbon solvent was used as the cleaning solvent, but similar effects can be obtained with cleaning solvents such as trichlene and trichloroethane.

さらに、熱交換器12を用いて洗浄溶剤を温水
で間接加熱したが、電気ヒータで直接加熱しても
よい。
Furthermore, although the cleaning solvent was indirectly heated with hot water using the heat exchanger 12, it may be directly heated with an electric heater.

さらに、上記実施例では一槽式の設備で説明し
たが、多槽式の溶剤洗浄装置の一工程である一槽
内に、この機構を導入すればさらに良好な洗浄品
質が得られることはもちろんである。
Furthermore, although the above embodiment has been explained using a single-tank type equipment, it goes without saying that even better cleaning quality can be obtained by introducing this mechanism into a single tank, which is one process in a multi-tank solvent cleaning system. It is.

また、ノズル13として直進性のあるものを利
用したが、被洗浄の大きさ等によりV型、フルコ
ーン型等のノズルを用いても良い。
Furthermore, although a straight-advancing nozzle 13 was used, a V-shaped, full-cone, or other type nozzle may be used depending on the size of the object to be cleaned.

以上説明した様に、本発明の洗浄方法を用いれ
ば従来より極めて短時間に高洗浄品質の洗浄を行
うことができる。また、本発明の洗浄装置を用い
れば本発明の洗浄方法を容易に達成することがで
きる。
As explained above, by using the cleaning method of the present invention, high-quality cleaning can be performed in a much shorter time than in the past. Further, by using the cleaning device of the present invention, the cleaning method of the present invention can be easily achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の洗浄装置を示す断面図、第2図
は本発明の実施例を示す断面図、第3図はフロン
溶剤の圧力と沸点との関係を示す図である。 11……スプレーポンプ(圧縮手段)、12…
…熱交換器(加熱手段)、13……ノズル(噴射
手段)。
FIG. 1 is a sectional view showing a conventional cleaning device, FIG. 2 is a sectional view showing an embodiment of the present invention, and FIG. 3 is a diagram showing the relationship between the pressure and boiling point of a fluorocarbon solvent. 11... Spray pump (compression means), 12...
...Heat exchanger (heating means), 13... Nozzle (injection means).

Claims (1)

【特許請求の範囲】 1 洗浄溶剤液を圧縮する圧縮工程と、前記圧縮
工程により圧縮された洗浄溶剤液を大気圧沸点以
上に加熱する加熱工程と、前記圧縮工程及び加熱
工程で圧縮加熱された洗浄溶剤液を大気圧におい
て被洗浄物に噴射して洗浄する工程とを有する洗
浄方法。 2 洗浄溶剤液を保有する洗浄槽と、洗浄溶剤液
を圧縮する圧縮手段と、洗浄溶剤液を大気圧沸点
以上に加熱する加熱手段と、前記圧縮手段及び加
熱手段によつて圧縮加熱された洗浄溶剤液を大気
圧において被洗浄物に噴射する噴射手段とを備え
る洗浄装置。
[Claims] 1. A compression step of compressing the cleaning solvent liquid, a heating step of heating the cleaning solvent liquid compressed in the compression step to a boiling point of atmospheric pressure or higher, and a heating step of compressing and heating the cleaning solvent liquid in the compression step and heating step. A cleaning method comprising the step of spraying a cleaning solvent onto an object to be cleaned at atmospheric pressure. 2. A cleaning tank holding a cleaning solvent solution, a compression means for compressing the cleaning solvent solution, a heating means for heating the cleaning solvent solution above the atmospheric pressure boiling point, and a cleaning device compressed and heated by the compression means and the heating means. A cleaning device comprising a spraying means for spraying a solvent solution onto an object to be cleaned at atmospheric pressure.
JP12076083A 1983-07-02 1983-07-02 Washing method and device Granted JPS6012187A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12076083A JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12076083A JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Publications (2)

Publication Number Publication Date
JPS6012187A JPS6012187A (en) 1985-01-22
JPH0237232B2 true JPH0237232B2 (en) 1990-08-23

Family

ID=14794311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12076083A Granted JPS6012187A (en) 1983-07-02 1983-07-02 Washing method and device

Country Status (1)

Country Link
JP (1) JPS6012187A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0744167B2 (en) * 1990-03-14 1995-05-15 株式会社ダン・クリーン・プロダクト Spray cleaning equipment
JP2596483B2 (en) * 1991-08-23 1997-04-02 坂東機工株式会社 Glass plate processing machine
US5807166A (en) * 1994-07-21 1998-09-15 Bando Kiko Co., Ltd. Glass-plate working machine
JP5423555B2 (en) * 2010-04-16 2014-02-19 株式会社デンソー Washing and drying method and washing and drying apparatus
US9406501B2 (en) * 2012-05-31 2016-08-02 Semes Co., Ltd. Apparatus and method for cleaning substrate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218594U (en) * 1975-07-28 1977-02-09
JPS5546936A (en) * 1978-09-06 1980-04-02 Ekstroem H A B & Co Mandrel that can be expanded
JPS588378U (en) * 1981-07-07 1983-01-19 内田 千年 A removable cold-weather collar that can also be used as a storage bag for two small items, and a cover for a warmer.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218594U (en) * 1975-07-28 1977-02-09
JPS5546936A (en) * 1978-09-06 1980-04-02 Ekstroem H A B & Co Mandrel that can be expanded
JPS588378U (en) * 1981-07-07 1983-01-19 内田 千年 A removable cold-weather collar that can also be used as a storage bag for two small items, and a cover for a warmer.

Also Published As

Publication number Publication date
JPS6012187A (en) 1985-01-22

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