JPH02209886A - Production of erythroxetanosylnucceoside derivative - Google Patents
Production of erythroxetanosylnucceoside derivativeInfo
- Publication number
- JPH02209886A JPH02209886A JP1028611A JP2861189A JPH02209886A JP H02209886 A JPH02209886 A JP H02209886A JP 1028611 A JP1028611 A JP 1028611A JP 2861189 A JP2861189 A JP 2861189A JP H02209886 A JPH02209886 A JP H02209886A
- Authority
- JP
- Japan
- Prior art keywords
- base
- pyrimidine
- protecting group
- protected
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 claims abstract description 13
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000006239 protecting group Chemical group 0.000 claims abstract description 11
- 125000002252 acyl group Chemical group 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- 125000000524 functional group Chemical group 0.000 claims abstract description 4
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 claims abstract 2
- 239000000126 substance Substances 0.000 claims description 7
- 150000003833 nucleoside derivatives Chemical class 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 19
- 239000002253 acid Substances 0.000 abstract description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- 239000002904 solvent Substances 0.000 abstract description 3
- 239000003443 antiviral agent Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract description 2
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 abstract 3
- 230000003327 cancerostatic effect Effects 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 5
- -1 globionyl Chemical group 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 229940035893 uracil Drugs 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012746 preparative thin layer chromatography Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241001494479 Pecora Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021623 Tin(IV) bromide Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 125000005257 alkyl acyl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 230000000259 anti-tumor effect Effects 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 239000002246 antineoplastic agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- NGYIMTKLQULBOO-UHFFFAOYSA-L mercury dibromide Chemical compound Br[Hg]Br NGYIMTKLQULBOO-UHFFFAOYSA-L 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000010446 mirabilite Substances 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 239000002777 nucleoside Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- QTQPVLDZQVPLGV-UHFFFAOYSA-N oxomemazine Chemical compound C1=CC=C2N(CC(CN(C)C)C)C3=CC=CC=C3S(=O)(=O)C2=C1 QTQPVLDZQVPLGV-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- RSIJVJUOQBWMIM-UHFFFAOYSA-L sodium sulfate decahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-]S([O-])(=O)=O RSIJVJUOQBWMIM-UHFFFAOYSA-L 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- LTSUHJWLSNQKIP-UHFFFAOYSA-J tin(iv) bromide Chemical compound Br[Sn](Br)(Br)Br LTSUHJWLSNQKIP-UHFFFAOYSA-J 0.000 description 1
- WJTPULFEHRBUCP-UHFFFAOYSA-N trimethylsilyl perchlorate Chemical compound C[Si](C)(C)OCl(=O)(=O)=O WJTPULFEHRBUCP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は医薬として期待されるプリン塩基およびピリミ
ジン塩基を有するエリスロオキセタノシルヌクレオシド
誘導体の製造法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing erythrooxetanosyl nucleoside derivatives having purine bases and pyrimidine bases that are expected to be used as pharmaceuticals.
近年オキセタン環を糖部として有する異常ヌクレオシド
、オキセタノシン(下記式)が天然物として初めて単離
された( N、 Shimada、 et al、。Recently, an unusual nucleoside, oxetanosine (formula below), which has an oxetane ring as a sugar moiety, was isolated for the first time as a natural product (N., Shimada, et al.).
J’ Antibio tics、 1J−1623+
(1986)。J' Antibiotics, 1J-1623+
(1986).
示す)で表わされる保護エリスロオキセタノース化合物
に官能基を保護したプリン塩基またはピリミジン塩基を
反応させ、次いで必要に応じて保護基を除去することに
より一般式(It)本物aは抗菌作用、抗1′フィルス
作用、抗腫瘍作用を有しており医薬品として期待されて
いる。By reacting the protected erythrooxetanose compound represented by (shown) with a purine base or pyrimidine base with a protected functional group, and then removing the protective group as necessary, the compound a of the general formula (It) can be obtained with antibacterial and antibacterial properties. It has 1' fils action and antitumor action, and is expected to be used as a drug.
しかし2′−位ノル体、すなわちエリスロオキセタノシ
ル体は本物質からの誘導は困難であり、またその製造法
は全く知られていなし・。However, the 2'-nor form, ie, the erythrooxetanosyl form, is difficult to derive from this substance, and no method for its production is known at all.
各種エリスロオキセ、タノシルヌクレオシド誘導体の製
造法の開発が望まれている。It is desired to develop a method for producing various erythrooxe and tanosyl nucleoside derivatives.
本発明者らは種々検討した結果、一般式(1)(式中、
R+およびRzは同一またを、を異なってもよいアシル
基、R3は水素又は低級アルキル基を(式中、Bはプリ
ン塩基およびピリミジン塩基を示す)
テ表b サれるエリスロオキセタノシルヌクレオシドが
得られることを見い出した。As a result of various studies, the present inventors found that the general formula (1) (wherein,
R+ and Rz may be the same or different, and R3 is hydrogen or a lower alkyl group (in the formula, B represents a purine base and a pyrimidine base). I found out what I can get.
本発明は上記知見に基づいて完成されたものである。The present invention was completed based on the above findings.
本発明において、アシル基としてはアセチル、グロビオ
ニル、ブチロイル等のC1〜C4の低級アルキルアシル
基、シュウ酸エステル型ノアルコキシ力ルポニルアシル
基、マロン酸エステル型のアルコキシカルボニルメチル
アシル基およびベンゾイル、置換ベンゾイル等の芳香族
アシル基などがあげられる。In the present invention, examples of the acyl group include C1 to C4 lower alkyl acyl groups such as acetyl, globionyl, butyroyl, oxalate ester type noalkoxylponyl acyl group, malonate ester type alkoxycarbonylmethylacyl group, benzoyl, substituted benzoyl, etc. Examples include aromatic acyl groups.
また低級アルキル基としてはメチル基、エチル基、プロ
ピル基およびブチル基などがあげられる。Examples of lower alkyl groups include methyl, ethyl, propyl, and butyl groups.
本発明化合物は以下のようにして製造することかできる
。The compound of the present invention can be produced as follows.
はピリミジン塩基とを通常不活性な有機溶媒好ましくは
無水溶媒中で通常O′C〜約100°C1好ましくは約
0°C〜30 ′Cの温度で、ルイス酸などの縮合剤の
存在下で反応を行ない、得られた化合物を必要に応じて
酸ある(・は塩基で脱保護することにより一般式(Il
lで示される化合物が製造される。is usually prepared with a pyrimidine base in an inert organic solvent, preferably an anhydrous solvent, at a temperature usually from 0°C to about 100°C, preferably from about 0°C to 30'C, in the presence of a condensing agent such as a Lewis acid. The reaction is carried out, and the resulting compound is deprotected with an acid or a base as necessary (. is a base) to give the general formula (Il
A compound represented by l is produced.
無水の溶媒としては特に制限はなし・がアセ1−二トリ
ル、ハロゲノアルカン(例えばジクロルエタン)、キシ
レン、ニトロベンゼン、ジクロルベンゼンなどがあげら
れる。Examples of the anhydrous solvent include, but are not particularly limited to, ace-1-nitrile, halogenoalkane (eg, dichloroethane), xylene, nitrobenzene, dichlorobenzene, and the like.
縮合剤としてはルイス酸が使用され例えば四ハロゲノス
ズ(四塩化スズ、四臭化スズなど)、ハロゲノ第−又は
第二水銀(好ましくは臭化第−又は第二水銀、ヨウ化第
−又は第二水銀など)、トリ低級アルキル(C+〜C4
)シリルの酸結合体(例えばトリメチルシリルトリフル
オロメタンスルホネ−) すどのトリメチルシリルハロ
ケノメタンスルホネート、トリメチルシリル過塩素酸な
どのトリメチルシリル過ハロゲノ酸)などがあげられる
。Lewis acids are used as condensing agents, such as tin tetrahalides (tin tetrachloride, tin tetrabromide, etc.), mercuric or mercuric halides (preferably mercuric or mercuric bromide, mercuric or diiodide), etc. mercury, etc.), tri-lower alkyl (C+~C4
) Acid conjugates of silyl (for example, trimethylsilyl trifluoromethanesulfone), trimethylsilyl halochenomethanesulfonate, trimethylsilyl perhalogenoic acid such as trimethylsilyl perchloric acid), and the like.
また官能基を保護したプリン塩基およびピリミジン塩基
としては例えばアミン基やオキシ基が保護された化合物
があげられ好ましくは下記一般式
(式中、R4および1(7は保護基、Rs 、 Raお
よびnsは−ORho (11(+oは保護基)または
−NH−R,。Purine bases and pyrimidine bases with protected functional groups include, for example, compounds with protected amine groups and oxy groups, preferably represented by the following general formula (wherein R4 and 1 (7 is a protecting group, Rs, Ra and ns is -ORho (11 (+o is a protecting group) or -NH-R,.
(Rhは保護基)、R9は水素、ハロゲンまたは低級ア
ルキル基を示す)
で表わされる官能基保護プリン塩基およびピリミジン塩
基があげられる。R4y RyおよびRhoの保護基と
してはアシル基、シリル保護基(低級アリルシリル、例
えばトリメチ2シリル、低級アルキルアリールシリル、
例えばイソプロピルジフェニルシリル、t−7”チルジ
フェニルシリル、t−ブチルジメチルシリル)などがあ
げられる。(Rh is a protecting group) and R9 is hydrogen, halogen, or a lower alkyl group) Functionally protected purine bases and pyrimidine bases are mentioned. Protecting groups for R4y Ry and Rho include acyl groups, silyl protecting groups (lower allylsilyl, such as trimethydisilyl, lower alkylarylsilyl,
Examples include isopropyldiphenylsilyl, t-7'' tyldiphenylsilyl, t-butyldimethylsilyl).
Roの保護基としてはアミン基の保護に使用されるもの
は特に制限はなく、アシル基(例えばアセチル、グロビ
オニル、ハロゲノアセチル等の置換または非置換の低級
アルキルカルボニル、ベンゾイルなどの芳香族カルボニ
ルなどがあげられる。There are no particular restrictions on the protecting group for Ro that can be used to protect the amine group, and examples include acyl groups (for example, substituted or unsubstituted lower alkyl carbonyls such as acetyl, globionyl, and halogenoacetyl, and aromatic carbonyls such as benzoyl). can give.
本発明の一般式(Illで表わされる化合物はオキセタ
ノシンと同様抗ウィルス剤や制癌剤として期待できるも
の乎ある。The compound represented by the general formula (Ill) of the present invention is expected to be used as an antiviral agent and an anticancer agent like oxetanosine.
次に実施例を挙げて本発明の製造例を具体的に説明する
実施例1゜
N、N−ジベンゾイル−9−< 2’、 4’−ジー、
〇−ベンゾイルーβ−り一エリスロオキセタノシルアデ
ニン(化合物(2))の合成
化合物(11(6,83mg、0.018 mmole
)をジクロロエタン(1ml)に溶解し、モリキュジ
ーシープ4A(粉末60ff1g)を加えて室温にて1
.5時間撹拌した後、N−ベンゾイル−ビス−(トリメ
チルシリル)アデニ7(23mg、 0.04mmol
e)および塩化スズ(IVI (0,15+++A!、
8.17 X I Q−’mmole)を加え氷水浴中
にて45分間撹拌した。飽和重曹水を加え10分間撹拌
した後、反応液を濾過し、F液を減圧濃縮し、得られる
残渣を分取薄層クロマトグラフィー(ヘキサン:酢酸エ
チル−1:4)を用いて精製した。こうして得られた結
晶物質をメタノールC0,75m1)に溶解し0.2規
定ナトリ九ムメトモサイド(sodiummethox
ide ) (0,25ml )を加え、室温にて1時
間撹拌した後、減圧濃縮し、得られる残渣をりooメタ
ン(1mA’)に溶解し、氷水浴中にてピリミジ7(0
,1ml、1.236 mmole)及びヘンソイルク
ロライド(0,1ml、 0.862 mmole )
を加え、8℃にて15時間放置した。反応液を酢酸エチ
ルで希釈しl規定塩酸で洗浄した後、有機層を水で洗浄
し、飽和重曹水で洗浄した。有機層を再び水で洗浄し、
飽和食塩水で洗浄した後、芒硝乾燥し、減圧濃縮して得
られる残渣をカラムクロマトグラフィー(シリカゲル3
0■;ヘキサン:酢酸エチル=3 : ] )を用いて
精製し、N、N−ジベンジル−4−<2’、4’−ジー
0−ベンゾイル−β−D−エリスロオキセタノイルアデ
ニン(化合物(2) ) (2,57ff1g)(3工
程全収率22.8%)を得た。Next, the production examples of the present invention will be specifically explained with reference to Examples.Example 1゜N,N-dibenzoyl-9-<2',4'-di,
Synthetic compound (11 (6.83 mg, 0.018 mmole) of 〇-benzoyl-β-ri-erythrooxetanosyladenine (compound (2))
) was dissolved in dichloroethane (1 ml), Molecuy Sheep 4A (powder 60ff 1 g) was added, and the solution was dissolved at room temperature.
.. After stirring for 5 hours, N-benzoyl-bis-(trimethylsilyl)adeni7 (23 mg, 0.04 mmol
e) and tin chloride (IVI (0,15+++A!,
8.17 X I Q-'mmole) was added and stirred for 45 minutes in an ice water bath. After adding saturated aqueous sodium bicarbonate and stirring for 10 minutes, the reaction solution was filtered, Solution F was concentrated under reduced pressure, and the resulting residue was purified using preparative thin layer chromatography (hexane:ethyl acetate-1:4). The crystalline substance thus obtained was dissolved in methanol CO (0.75 ml) and dissolved in 0.2N sodium methoxide.
ide) (0.25 ml) was added, stirred at room temperature for 1 hour, concentrated under reduced pressure, the resulting residue was dissolved in methane (1 mA'), and pyrimidine 7 (0.25 ml) was added in an ice-water bath.
, 1 ml, 1.236 mmole) and Hensoyl chloride (0.1 ml, 0.862 mmole)
was added and left at 8°C for 15 hours. The reaction solution was diluted with ethyl acetate and washed with 1N hydrochloric acid, and then the organic layer was washed with water and then with saturated aqueous sodium bicarbonate. Wash the organic layer again with water and
After washing with saturated saline, drying with Glauber's salt and concentrating under reduced pressure, the resulting residue was subjected to column chromatography (silica gel 3
N,N-dibenzyl-4-<2',4'-di0-benzoyl-β-D-erythrooxetanoyl adenine (compound ( 2) ) (2,57ff1g) (total yield of 3 steps 22.8%) was obtained.
化合物(2)の白色結晶物質
’H−NMR(400M H2,CDCl2. TMS
) :δ4556(IH,dd、J=2.44,11
.23Hz )、4.683(l H,dd、 J=4
゜88.4.23H2)、5.775(IH,m)、6
.264 (IH,br、s )、6.473(IH,
d、 J=1.47Hz )、 7.335−7.
410(6H,Complex )、 7.451−
7.545 (6H。White crystalline substance 'H-NMR of compound (2) (400M H2, CDCl2. TMS
): δ4556 (IH, dd, J=2.44,11
.. 23Hz), 4.683(lH,dd, J=4
゜88.4.23H2), 5.775 (IH, m), 6
.. 264 (IH, br, s ), 6.473 (IH,
d, J=1.47Hz), 7.335-7.
410 (6H, Complex), 7.451-
7.545 (6H.
Complex )、 7.815−7.885 (
4H,Complex)。Complex), 7.815-7.885 (
4H, Complex).
8.079−8.135(4H,Complex )、
8.405(IH,s)、 8.617(IH
,s)。8.079-8.135 (4H, Complex),
8.405 (IH,s), 8.617 (IH
,s).
実施例2゜
■−<2’、4′−ジーO−ベンゾイルーα−D−エリ
スロオキセタノシル)ウラシル(化合物(41)の合成
化合物(3) (9,53■、0.258 mmole
)をジクo。Example 2゜■-<2',4'-di-O-benzoyl-α-D-erythrooxetanosyl)uracil (synthesis of compound (41) Compound (3) (9,53■, 0.258 mmole
) to Jiku o.
エタン(1+++Aりに溶解し、モリキュラーシーフγ
4A(粉末、50■)を加え文ルゴン雰囲気下室温にて
80分間撹拌した後、ビス−〇−(トリメチルシリル)
ウラシル(過剰量)及び塩化スズGV)(過剰量)を加
え、40分間撹拌した。Dissolved in ethane (1+++A), added Molecular Thief γ 4A (powder, 50 μg) and stirred at room temperature under a hydrogen atmosphere for 80 minutes.
Uracil (excess) and tin chloride (GV) (excess) were added and stirred for 40 minutes.
飽和重曹水を加え、10分間撹拌した後、反応液を濾過
し、炉液を減圧濃縮して得られる残渣な、分取薄層クロ
マトグラフィー(ヘキサン:酢酸エチル=1:3)を用
いて精製し、1−(2:4−ジー0−ベンゾイル〜α−
D−エリスロオキセタノシル)ウラシル(化合物(4i
)(1,85■、収率17.0%)を得た。After adding saturated sodium bicarbonate solution and stirring for 10 minutes, the reaction solution was filtered, and the residue obtained by concentrating the filtrate under reduced pressure was purified using preparative thin layer chromatography (hexane: ethyl acetate = 1:3). 1-(2:4-di-0-benzoyl~α-
D-erythrooxetanosyl)uracil (compound (4i)
) (1.85 μm, yield 17.0%) was obtained.
化合物(4) 白色結晶物質
ca〕I)5−31..0 < C,0,09,CH
Czi)IR(7(ルム) : 1730r 169
0.1600 (””’)’H−NMR(400MHz
、 CDCl2. TMS ) :δ4.706−4.
74 1 (2((、Complex)、 5.
082(IH,dd、 J=2.93.3.79Hz
)、 5.859(IH,m)、 6.047 (IH
,d、 J=6.84B(z)。Compound (4) White crystalline substance ca]I) 5-31. .. 0 < C, 0, 09, CH
Czi) IR (7 (rum): 1730r 169
0.1600 (''”')'H-NMR (400MHz
, CDCl2. TMS): δ4.706-4.
74 1 (2((, Complex), 5.
082 (IH, dd, J=2.93.3.79Hz
), 5.859 (IH, m), 6.047 (IH
, d, J=6.84B(z).
6.195 (IH,d、 、J=2.93Hz )、
7.372−7.553 (4H,Complex
)、 7.573−7.582(:H−1,Compl
ex )、 7.808−7.841 C2H。6.195 (IH, d, , J=2.93Hz),
7.372-7.553 (4H, Complex
), 7.573-7.582 (:H-1, Compl
ex), 7.808-7.841 C2H.
(’omplex )、 7.985−8.006
(2H,Complex )。('oplex), 7.985-8.006
(2H, Complex).
8.070 (IH,m)。8.070 (IH, m).
Claims (2)
いアシル基、R_3は水素又は低級アルキル基を示す)
で示される保護エリスロオキセタノース誘導体に官能基
を保護したプリン塩基又はピリミジン塩基を反応させ、
次いで必要に応じ保護基を除去することを特徴とする下
記一般式(II)で表わされるエリスロオキセタノシルヌ
クレオシド誘導体の製造法。 ▲数式、化学式、表等があります▼(II) (式中、Bはプリン型塩基およびピリミジン型塩基を示
す)(1) General formula (1) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (1) (In the formula, R_1 and R_2 are acyl groups that may be the same or different, and R_3 represents hydrogen or a lower alkyl group.)
Reacting the protected erythrooxetanose derivative represented by with a purine base or pyrimidine base with a protected functional group,
A method for producing an erythrooxetanosyl nucleoside derivative represented by the following general formula (II), which comprises then removing a protecting group if necessary. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, B represents a purine type base and a pyrimidine type base)
体およびその塩(2) General formula (II) ▲Mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, B represents a pyrimidine type base) Erythrooxetanosyl nucleoside derivatives and their salts
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1028611A JPH02209886A (en) | 1989-02-09 | 1989-02-09 | Production of erythroxetanosylnucceoside derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1028611A JPH02209886A (en) | 1989-02-09 | 1989-02-09 | Production of erythroxetanosylnucceoside derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02209886A true JPH02209886A (en) | 1990-08-21 |
Family
ID=12253365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1028611A Pending JPH02209886A (en) | 1989-02-09 | 1989-02-09 | Production of erythroxetanosylnucceoside derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02209886A (en) |
-
1989
- 1989-02-09 JP JP1028611A patent/JPH02209886A/en active Pending
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