JPH02192760A - Excess voltage absorbing circuit for semiconductor integrated circuit device - Google Patents

Excess voltage absorbing circuit for semiconductor integrated circuit device

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Publication number
JPH02192760A
JPH02192760A JP1012809A JP1280989A JPH02192760A JP H02192760 A JPH02192760 A JP H02192760A JP 1012809 A JP1012809 A JP 1012809A JP 1280989 A JP1280989 A JP 1280989A JP H02192760 A JPH02192760 A JP H02192760A
Authority
JP
Japan
Prior art keywords
power supply
line
circuit
ground
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1012809A
Other languages
Japanese (ja)
Other versions
JP2752680B2 (en
Inventor
Hisashi Nagamine
久之 長峰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC IC Microcomputer Systems Co Ltd
Original Assignee
NEC IC Microcomputer Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC IC Microcomputer Systems Co Ltd filed Critical NEC IC Microcomputer Systems Co Ltd
Priority to JP1012809A priority Critical patent/JP2752680B2/en
Publication of JPH02192760A publication Critical patent/JPH02192760A/en
Priority to US08/038,556 priority patent/US5343352A/en
Application granted granted Critical
Publication of JP2752680B2 publication Critical patent/JP2752680B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
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Abstract

PURPOSE:To effectively protect the first stage of an input circuit by a method wherein, in a semiconductor integrated circuit, an excess voltage absorbing means is arranged between each of an input line, a plurality of power supply lines and ground lines. CONSTITUTION:When a first stage input circuit 3 and an internal circuit 4 are connected with different power supply lines L1, L3 and ground lines L2, L4, a PMOSTr 11 and a NMOSTr 12 are arranged between the input line L5 and the power supply line L3 and the ground line L4, in addition to the conventional PMOSTr 1 and NMOSTr 2. According to this constitution, when an excess voltage is applied to an external terminal 5 in the manner in which any power sources of the positive power supply lines L1, L3, and the ground lines L2, L4 as a reference, its discharging route is surely present, and the excess voltage is discharged to any of the power supplies. As a result, the first stage input circuit 3 can be protected from the destruction caused by the excess voltage.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は外部端子に印加された過電圧を吸収して内部回
路を保護する半導体集積回路装置の過電圧吸収回路に関
し、特に複数の回路が夫々異なる電源ラインから電力を
供給される半導体集積回路装置の過電圧吸収回路に関す
る。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an overvoltage absorption circuit for a semiconductor integrated circuit device that absorbs an overvoltage applied to an external terminal to protect an internal circuit. The present invention relates to an overvoltage absorption circuit for a semiconductor integrated circuit device that is supplied with power from a power supply line.

[従来の技術] 半導体集積回路装置においては、その回路の動作上の理
由から複数の電源電圧が必要とされる場合、又は電源・
接地線ノイズ対策上の理由から電源線又は接地線の分離
が必要とされる場合がある。
[Prior Art] In a semiconductor integrated circuit device, when multiple power supply voltages are required due to the operation of the circuit, or when multiple power supply voltages are required,
There are cases where it is necessary to separate the power supply line or the ground line for reasons of ground line noise countermeasures.

このような場合には、半導体集積回路に、分離配線され
た複数の電源線又は接地線を設け、これら電源線又は接
地線を介して複数の電源端子又は接地端子から内部の回
路に電源電圧を供給するようにしている。
In such a case, the semiconductor integrated circuit is provided with a plurality of separated power supply lines or ground lines, and the power supply voltage is applied to the internal circuit from the plurality of power supply terminals or ground terminals via these power supply lines or ground lines. We are trying to supply it.

第2図にその代表的な例として、2つの電源線及び接地
線を備えた半導体集積回路の構成例を示す。この回路は
、入力初段回路3と内部回路4とが夫々異なる電源線に
接続されたものとなっている。即ち、相補対接続された
トランジスタ7.8からなる入力初段回路3は、第1の
電源線Ll及び第1の接地線L2に接続され、これらを
介して電源VDDI及び接地V5glが供給されたもの
となっている。また、相補対接続されたトランジスタ9
.10からなる内部回路4は、第2の電源線L3及び第
2の接地線L4に接続され、これらを介して電源VDD
2及び接地V!is2が供給されたものとなっている。
As a typical example, FIG. 2 shows a configuration example of a semiconductor integrated circuit provided with two power supply lines and a ground line. In this circuit, the first input stage circuit 3 and the internal circuit 4 are connected to different power supply lines. That is, the input first stage circuit 3 consisting of transistors 7 and 8 connected in a complementary pair is connected to a first power supply line Ll and a first ground line L2, and is supplied with a power supply VDDI and a ground V5gl through these. It becomes. In addition, transistors 9 connected in a complementary pair
.. 10 is connected to a second power supply line L3 and a second ground line L4, and is connected to a power supply VDD via these
2 and ground V! is2 is supplied.

このように、入力初段回路3に供給される電源及び接地
と内部回路4に供給される電源及び接地とが分離されて
いる理由は、内部回路4又は図示しない出力バッファの
動作によって発生する電源V DD2及び接地V ss
2の揺れが入力初段回路3に伝達され、この入力初段回
路3の入力電圧マージンが悪化しないようにするためで
ある。
The reason why the power supply and ground supplied to the input first-stage circuit 3 and the power supply and ground supplied to the internal circuit 4 are separated in this way is that the power supply V generated by the operation of the internal circuit 4 or the output buffer (not shown) DD2 and ground V ss
This is to prevent the fluctuation of 2 from being transmitted to the input first stage circuit 3 and the input voltage margin of this input first stage circuit 3 from deteriorating.

ところで、従来、この種のCMO3半導体集積回路装置
においては、入力端子5に印加される静電気及びその他
のサージ電圧に対する保護回路として、例えば、第2図
に示すような過電圧吸収回路6が使用されている。
By the way, conventionally, in this type of CMO3 semiconductor integrated circuit device, an overvoltage absorption circuit 6 as shown in FIG. 2, for example, has been used as a protection circuit against static electricity and other surge voltages applied to the input terminal 5. There is.

この過電圧吸収回路6は、ソース及びゲートがいずれも
電源線L1に接続され、ドレインが入力端子(外部端子
)5と入力初段回路3の入力部とを接続する入力線L5
に接続されたPチャネルM○Sトランジスタ1と、ソー
ス及びゲートがいずれも接地線L2に接続され、ドレイ
ンがトランジスタ1のトレインと共に入力線L5に接続
されたNチャネルMOSトランジスタ2とにより構成さ
れている。トランジスタ1はそのソースを基準にしてド
レインに−15[V]以下の電圧が、また、トランジス
タ2はそのソースを基準にしてドレインに+15[V]
以上の電圧が加わるとパンチスルーによってソースとト
レインとの間を導通状態にするように機能する。
This overvoltage absorption circuit 6 has a source and a gate both connected to a power supply line L1, and a drain connected to an input line L5 that connects an input terminal (external terminal) 5 and an input part of the input first stage circuit 3.
A P-channel MOS transistor 1 connected to the transistor 1, and an N-channel MOS transistor 2 whose source and gate are both connected to the ground line L2 and whose drain is connected to the input line L5 together with the train of the transistor 1. There is. Transistor 1 has a voltage of -15 [V] or less at its drain with its source as a reference, and transistor 2 has a voltage of +15 [V] at its drain with its source as a reference.
When a higher voltage is applied, punch-through functions to bring the source and train into a conductive state.

このように構成された従来の過電圧吸収回路6は、接地
VssIを基準にして、正の静電気等のサージ電圧が入
力端子5に印加された場合には、トランジスタ2のパン
チスルー電流として、また、負のサージ電圧が印加され
た場合には、トランジスタ2のチャネル電流としてトラ
ンジスタ2及び接地線L2を介して接地V SS+へそ
のサージ電圧が放電される。一方、電源VDDIを基準
として、正のサージ電圧が入力端子5に印加された場合
にはトランジスタ1のチャネル電流として、また、負の
サージ電圧が印加された場合には、トランジスタ1のパ
ンチスルー電流としてトランジスタ1及び電源線り、を
介して電源VDDIへそのサージ電圧が放電される。こ
のように、入力端子5に印加されたサージ電圧をトラン
ジスタ1及びトランジスタ2を介して夫々電源V001
及び接地VssIへ逃がすことによって、入力初段回F
#13を構成するトランジスタ7及びトランジスタ8の
ゲート酸化膜等の破壊を防止することができる。
The conventional overvoltage absorption circuit 6 configured as described above uses the ground VssI as a reference when a surge voltage such as positive static electricity is applied to the input terminal 5, as a punch-through current of the transistor 2, and as a punch-through current of the transistor 2. When a negative surge voltage is applied, the surge voltage is discharged to the ground VSS+ as a channel current of the transistor 2 through the transistor 2 and the ground line L2. On the other hand, with reference to the power supply VDDI, when a positive surge voltage is applied to the input terminal 5, the channel current of transistor 1 is applied, and when a negative surge voltage is applied, the punch-through current of transistor 1 As a result, the surge voltage is discharged to the power supply VDDI via the transistor 1 and the power supply line. In this way, the surge voltage applied to the input terminal 5 is transferred to the power supply V001 through the transistor 1 and the transistor 2, respectively.
and ground VssI, the input first stage F
Destruction of the gate oxide films and the like of the transistors 7 and 8 constituting #13 can be prevented.

[発明が解決しようとする課題] 上述した従来の過電圧吸収回路は、例えば電源線り、及
び接地線L2に夫々電源VDDI及び接地■ss!が与
えられていない状態、即ちフローティング状態で電源V
DD2又は接地V s52を基準として入力端子5にサ
ージ電圧が印加された場合には、1〜ランジスタ1又は
トランジスタ2を介して電源線り、又は接地線L2に放
電されるものの、電源線L1及び接地線L2はフローテ
ィングの状態であるため、その寄生容量分の僅かなサー
ジ電荷しか吸収することができない。また、入力端子5
と電源VDD2及び接地線Vs5□との間の電流経路は
存在しないので、入力端子5に印加された静電気のほと
んどは入力初段回路3を構成するトランジスタ7及びト
ランジスタ8のゲートに印加される。
[Problems to be Solved by the Invention] The conventional overvoltage absorption circuit described above has, for example, a power supply VDDI and a ground ■ss! on the power supply line and the ground line L2, respectively. In a state where V is not applied, that is, in a floating state, the power supply V
When a surge voltage is applied to the input terminal 5 using DD2 or the ground Vs52 as a reference, it is discharged to the power line or the ground line L2 through the transistors 1 to 1 or the transistor 2; Since the ground line L2 is in a floating state, it can absorb only a small amount of surge charge corresponding to its parasitic capacitance. In addition, input terminal 5
Since there is no current path between the power supply VDD2 and the ground line Vs5□, most of the static electricity applied to the input terminal 5 is applied to the gates of the transistors 7 and 8 that constitute the input first stage circuit 3.

この結果、入力初段回路3を構成するトランジスタ7.
8のゲート酸化膜の破壊を招き、また、トランジスタ1
及びトランジスタ2を介して電源線L1及び接地線L2
に放電され蓄積した電荷はトランジスタ7及びトランジ
スタ8のソースと基板との間の接合の破壊、又は入力線
L5と基板との間の絶縁膜の破壊を引き起こすという問
題点がある。
As a result, the transistors 7 configuring the input first stage circuit 3.
This leads to destruction of the gate oxide film of transistor 1.
and a power line L1 and a ground line L2 via the transistor 2.
There is a problem in that the discharged and accumulated charge causes breakdown of the junction between the source and substrate of the transistors 7 and 8, or breakdown of the insulating film between the input line L5 and the substrate.

本発明はかかる問題点に鑑みてなされたものであって、
複数の回路が異なる電源線及び接地線と接続された半導
体集積回路装置にあって、入力端子といずれの電源線又
は接地線との間に印加された過電圧に対しても十分な回
路保護を図ることができる半導体集積回路装置の過電圧
吸収回路を提供することを目的とする。
The present invention has been made in view of such problems, and includes:
In a semiconductor integrated circuit device in which multiple circuits are connected to different power supply lines and ground lines, sufficient circuit protection is provided against overvoltage applied between the input terminal and any of the power supply lines or ground lines. An object of the present invention is to provide an overvoltage absorption circuit for a semiconductor integrated circuit device that can be used in a semiconductor integrated circuit device.

[課題を解決するための手段] 本発明に係る半導体集積回路装置の過電圧吸収回路は、
第1の正電源線と第1の負電源線との間に接続されその
入力部が外部端子に接続された第1の回路と、第2の正
電源線と第2の負電源線との間に接続された第2の回路
とを有する半導体集積回路装置における前記第1の回路
の入力部と前記外部端子とを接続する入力線路に設けら
れ、前記外部端子に印加された過電圧を吸収する半導体
集積回路装置の過電圧吸収回路において、前記入力線路
と前記第1の正電源線及び前記第1の負電源線の少なく
とも一方との間、並びに前記入力線路と前記第2の正電
源線及び前記第2の負電源線の少なくとも一方との間に
接続され、前記外部端子に過電圧が加わった場合に導通
する手段を備えたことを特徴とする。
[Means for Solving the Problems] An overvoltage absorption circuit for a semiconductor integrated circuit device according to the present invention includes:
A first circuit connected between a first positive power line and a first negative power line, the input part of which is connected to an external terminal, and a second positive power line and a second negative power line. Provided on an input line connecting the input section of the first circuit and the external terminal in a semiconductor integrated circuit device having a second circuit connected therebetween, the input line absorbs an overvoltage applied to the external terminal. In the overvoltage absorption circuit of a semiconductor integrated circuit device, between the input line and at least one of the first positive power supply line and the first negative power supply line, and between the input line and the second positive power supply line and the The device is characterized in that it includes means that is connected to at least one of the second negative power supply lines and that conducts when an overvoltage is applied to the external terminal.

[作用] 本発明によれば、外部端子と第1の回路の入力部とを接
続する入力線と第1の正電源線及び負電源線との間のみ
ならず、入力線と第2の正電源線及び負電源線との間に
も過電圧を吸収する手段を設けている。この過電圧を吸
収する手段は、外部端子に過電圧が加わった場合に導通
し、第1の回路又は第2の回路とで電荷の放電経路を形
成するように作用する。従って、第1の正電源線及び第
2の正電源線並びに第1の負電源線及び第2の負電源線
のいずれの電源を基準として過電圧が外部端子に印加さ
れても必ずその放電経路が存在し、いずれかの電源に放
電されるため、過電圧による第1の回路の破壊を防ぐこ
とができる。
[Function] According to the present invention, not only between the input line connecting the external terminal and the input section of the first circuit and the first positive power line and the negative power line, but also between the input line and the second positive power line Means for absorbing overvoltage is also provided between the power supply line and the negative power supply line. This overvoltage absorbing means becomes conductive when an overvoltage is applied to the external terminal, and acts to form a charge discharge path with the first circuit or the second circuit. Therefore, even if overvoltage is applied to the external terminal with reference to either the first positive power supply line, the second positive power supply line, the first negative power supply line, or the second negative power supply line, the discharge path will always be Since the first circuit exists and is discharged to either power source, it is possible to prevent the first circuit from being destroyed due to overvoltage.

[実施例] 次に、本発明の実施例について添付の図面を参照して説
明する。
[Example] Next, an example of the present invention will be described with reference to the accompanying drawings.

第1図は本発明の実施例に係る過電圧吸収回路を適用し
た回路構成例を示す回路図である。第2図に示した従来
の回路と相違する点は、過電圧吸収回路16として、入
力端子5と入力初段回路3の入力部とを接続する入力線
L5と電源線L1及び接地線L2との間に夫々設けられ
ているPチャネルMO3)ランジスタ1及びNチャネル
MOSトランジスタ2に加えて、入力線L5と電源線L
3及び接地線L4との間に夫々PチャネルM○Sトラン
ジスタ11及びNチャネルMO9)−ランジスタ12が
新たに設けられている点である。即ち、l・ランジスタ
11のソースとゲートはいずれも電源線L3を介して電
源VDD2に接続され、そのドレインは入力端子5と入
力初段回路3の入力部を接続する入力線り、に接続され
ている。また、NチャネルMO3)ランジスタ12のソ
ースとゲートはいずれも接地線L4を介して接地V s
s2に接続され、そのトレインはトランジスタ11のド
レインと共に入力線L5に接続されている。トランジス
タ11はそのソースを基準にしてドレインに−15[V
]以下の電圧が、また、トランジスタ7はそのソースを
基準にしてドレインに+15[V]以上の電圧が加わる
とパンチスルーによってソースとドレインとの間が夫々
導通するように機能する。また、その他の構成要素は第
2図に示した従来例と同一であるので説明は省略する。
FIG. 1 is a circuit diagram showing an example of a circuit configuration to which an overvoltage absorption circuit according to an embodiment of the present invention is applied. The difference from the conventional circuit shown in FIG. 2 is that an overvoltage absorption circuit 16 is connected between the input line L5 connecting the input terminal 5 and the input part of the input first stage circuit 3, the power supply line L1, and the ground line L2. In addition to the P-channel MO3) transistor 1 and the N-channel MOS transistor 2 provided in the input line L5 and the power supply line L
3 and the ground line L4, respectively, a P-channel M○S transistor 11 and an N-channel MO9)-transistor 12 are newly provided. That is, the source and gate of the L transistor 11 are both connected to the power supply VDD2 via the power supply line L3, and its drain is connected to the input line connecting the input terminal 5 and the input part of the input first stage circuit 3. There is. In addition, both the source and gate of the N-channel MO3) transistor 12 are connected to the ground V s via the ground line L4.
s2, and its train is connected together with the drain of transistor 11 to input line L5. The transistor 11 has a drain voltage of -15[V with respect to its source.
] or below, and when a voltage of +15 [V] or more is applied to the drain of the transistor 7 with respect to the source, the transistor 7 functions so that the source and drain are electrically connected by punch-through. Further, since the other components are the same as those of the conventional example shown in FIG. 2, their explanation will be omitted.

次に、このように構成された本実施例の回路の動作につ
いて説明する。
Next, the operation of the circuit of this embodiment configured as described above will be explained.

トランジスタ1及びトランジスタ2は従来例と同様の動
作をする。即ち、電源VDDI又は接地■55.を基準
として入力端子5に印加されたサージ電圧、例えば正の
静電気は、接地vsslに対してはトランジスタ2のパ
ンチスルー電流として、電源VDDIに対してはトラン
ジスタ1のチャネル電流として放電される。また、入力
端子5に印加された負のサージ電圧は、接地Vsslに
対してはトランジスタ2のチャネル電流として、電源v
DD1に対してはトランジスタ1のパンチスルー電流と
して放電される。これによって、電源VoD、又は接地
VSSIを基準として入力端子らに印加されたサージ電
圧は入力初段回路3を構成するトランジスタ7.8のゲ
ート酸化膜破壊電圧以下に抑えられ、サージ電圧による
入力初段回路3の破壊を防ぐことができる。
Transistor 1 and transistor 2 operate in the same manner as in the conventional example. That is, power supply VDDI or ground ■55. A surge voltage, for example, positive static electricity, applied to the input terminal 5 with reference to , is discharged as a punch-through current of the transistor 2 with respect to the ground vssl, and as a channel current of the transistor 1 with respect to the power supply VDDI. Further, the negative surge voltage applied to the input terminal 5 is converted into a channel current of the transistor 2 with respect to the ground Vssl, and the negative surge voltage is applied to the power supply Vssl.
It is discharged to DD1 as a punch-through current of transistor 1. As a result, the surge voltage applied to the input terminals with reference to the power source VoD or ground VSSI is suppressed to below the gate oxide film breakdown voltage of the transistors 7 and 8 constituting the input first stage circuit 3, and the surge voltage applied to the input first stage circuit 3 can be prevented from being destroyed.

また、電源VDD2又は接地Vgg□を基準として入力
端子5に印加されたサージ電圧は、接地VSS2に対し
てはトランジスタ12がVSSIに対するトランジスタ
2と同様に、また、電源V DD2に対してはトランジ
スタ11がvootに対するトランジスタ1と同様に機
能することによって電源v oa2又は接地■ss2へ
放電され、サージ電圧による入力初段回路3の破壊を防
ぐことができる。
In addition, the surge voltage applied to the input terminal 5 with reference to the power supply VDD2 or the ground Vgg By functioning in the same manner as the transistor 1 for voot, it is discharged to the power supply voa2 or the ground ss2, and damage to the input first stage circuit 3 due to surge voltage can be prevented.

ここで、入力端子5に電源Voos又は電源VDD2を
基準にして、トランジスタ1又はトランジスタ11のチ
ャネル電流又はパンチスルー電流のみでは電源VDDI
又は電源■DD2へ放電しきれないような大きなサージ
電圧が印加された場合には、その超過分はトランジスタ
2又はトランジスタ12のチャネル電流又はパンチスル
ー電流によって夫々接地線L2又は接地線L4へ放電さ
れる。
Here, when the input terminal 5 is connected to the power source Voos or the power source VDD2 as a reference, if only the channel current or punch-through current of the transistor 1 or the transistor 11 is applied, the power source VDDI
Alternatively, if a large surge voltage that cannot be fully discharged is applied to the power supply DD2, the excess voltage is discharged to the ground line L2 or L4 by the channel current or punch-through current of the transistor 2 or transistor 12, respectively. Ru.

この結果、接地線L2又は接地線L4の電位は上昇する
が、電源線L1と接地線L2との間に接続され入力初段
回路3を構成するトランジスタ7゜8又は電源線L3と
接地M L 4との間に接続され内部回路4を構成する
トランジスタ9.10等のチャネル電流及びパンチスル
ー電流によって、接地線L2又は接地線L4に蓄積され
た電荷は夫々電源線L1又は電源線L3へ放電される。
As a result, the potential of the ground line L2 or the ground line L4 increases, but the potential of the transistor 78 connected between the power line L1 and the ground line L2 and forming the input first stage circuit 3 or between the power line L3 and the ground line M L4 The charge accumulated in the grounding line L2 or the grounding line L4 is discharged to the power line L1 or the power line L3, respectively, by the channel current and punch-through current of the transistors 9, 10, etc. connected between the ground line and the internal circuit 4, and constitutes the internal circuit 4. Ru.

従って、入力端子5から電源V 001及び電源VDD
2への放電経路はトランジスタ1についてはトランジス
タ2及び入力初段回路3を介する経路が、また、トラン
ジスタ11についてはトランジスタ12及び内部回路4
を介する経路が並列に存在し、トランジスタ1及び11
が設置されない場合には、これらの経路によって夫々電
源V DDI及び電源VDD□に放電される。
Therefore, from input terminal 5 to power supply V 001 and power supply VDD
For transistor 1, the discharge path to transistor 2 is through transistor 2 and input first stage circuit 3, and for transistor 11, it is through transistor 12 and internal circuit 4.
There are parallel paths through transistors 1 and 11.
If not installed, these paths will discharge to the power supply V DDI and the power supply VDD□, respectively.

同様にして、入力端子5に接地V 551又は接地VS
S□を基準にして、トランジスタ2又はトランジスタ1
2のチャネル電流又はパンチスルー電流のみで接地Vs
sl又は接地VSS2へ放電しきれないような大きなサ
ージ電圧が印加された場合には、その超過分は夫々トラ
ンジスタ1から入力初段回路3を介して接地V551へ
至る経路又はトランジスタ11から内部回路4を介して
接地VSS□へ至る経路によって接地v sst及び接
地vsszに放電される。
Similarly, input terminal 5 is connected to ground V 551 or ground VS
Based on S□, transistor 2 or transistor 1
2 channel current or punch-through current only to ground Vs
When a large surge voltage that cannot be fully discharged is applied to sl or ground VSS2, the excess voltage is applied to the path from transistor 1 to ground V551 via input first stage circuit 3, or from transistor 11 to internal circuit 4. is discharged to ground v sst and ground vssz by a path to ground VSS□ through the ground VSS□.

以上の説明から明らかなように、トランジスタ1及びト
ランジスタ11、トランジスタ1及びトランジスタ12
、トランジスタ2及びトランジスタ11、l・ランジス
タ2及びトランジスタ12のいずれかの組合せがあれば
入力端子5と各電源及び各接地との間の放電経路が形成
され、サージ耐圧を向上させることができるが、本実施
例のように、トランジスタ1,2及びトランジスタ11
゜12を全て備えることによって、更に一層放電能力を
高めることができる。これにより、静電気・ノイズ等の
サージ電荷はすみやかに移動し、電源電位及び接地電位
を急速に安定させることができ、静電気等のサージ耐圧
を大幅に向上させることができる。
As is clear from the above description, transistor 1 and transistor 11, transistor 1 and transistor 12
, transistor 2 and transistor 11, and transistor 2 and transistor 12, a discharge path is formed between input terminal 5 and each power supply and each ground, and the surge withstand voltage can be improved. , as in this embodiment, transistors 1 and 2 and transistor 11
By providing all of the above characteristics, the discharge capacity can be further improved. As a result, surge charges such as static electricity and noise can be quickly moved, the power supply potential and ground potential can be rapidly stabilized, and the withstand voltage for surges such as static electricity can be greatly improved.

なお、前述したPチャネルMO3)ランジスタ1.2及
びNチャネルMOSトランジスタ11゜12のしきい値
電圧及びパンチスルー開始電圧は製造プロセスを修正す
ることにより変更することができ、目的に応じて放電能
力を調整して用いることができる。
Note that the threshold voltage and punch-through start voltage of the P-channel MO transistor 1.2 and the N-channel MOS transistor 11, 12 described above can be changed by modifying the manufacturing process, and the discharge capacity can be changed depending on the purpose. can be adjusted and used.

また、本発明は、PチャネルMOSトランジスタ1.2
及びNチャネルMOSトランジスタ11゜12に相当す
る放電手段を適宜増設することによって、任意の数の電
源及び接地を有する半導体集積回路装置に適用すること
ができる。
The present invention also provides a P-channel MOS transistor 1.2.
By appropriately adding discharge means corresponding to the N-channel MOS transistors 11 and 12, the present invention can be applied to a semiconductor integrated circuit device having an arbitrary number of power supplies and grounds.

[発明の効果] 以上説明したように本発明は、入力初段回路の入力部と
入力端子とを接続する入力線と複数の電源・接地線対の
電源及び接地の少なくとも一方との間にサージ電圧の放
電経路を設けている。このため、いずれの電源又は接地
を基準としてサージ電圧が入力端子に印加されたとして
も、そのサージ電圧をいずれかの電源又は接地に放電さ
せることができ、入力初段回路を静電気等のサージ電圧
から効果的に保護することができる。
[Effects of the Invention] As explained above, the present invention prevents surge voltage between the input line connecting the input part of the input first stage circuit and the input terminal and at least one of the power supply and ground of the plurality of power supply/ground line pairs. A discharge path is provided. Therefore, even if a surge voltage is applied to the input terminal with reference to either power supply or ground, the surge voltage can be discharged to either power supply or ground, and the input first stage circuit can be protected from surge voltage such as static electricity. can be effectively protected.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例(こ係る過電圧吸収回路の適用
例を示す回路図、第2図は従来の過電圧吸収回路の適用
例を示す回路図である。 1.7,9,11.PチャネルMO3)ランジスタ、2
,8,10,12.NチャネルMOSトランジスタ、3
;入力初段回路、4;内部回路、5;入力端子、6,1
6;過電圧吸収回路、LlL、;電源線、L2.L4 
、接地線、VDDIVooz;電源、V 551  V
 55□ ;接地出願人 日本電気アイジ−マイコンシ
ステム株式会社
FIG. 1 is a circuit diagram showing an example of application of an overvoltage absorption circuit according to an embodiment of the present invention, and FIG. 2 is a circuit diagram showing an application example of a conventional overvoltage absorption circuit. 1.7, 9, 11. P channel MO3) transistor, 2
, 8, 10, 12. N-channel MOS transistor, 3
; Input first stage circuit, 4; Internal circuit, 5; Input terminal, 6, 1
6; Overvoltage absorption circuit, LlL; Power line, L2. L4
, ground wire, VDDIVooz; power supply, V 551 V
55□; Grounding applicant: NEC IG Microcomputer System Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)第1の正電源線と第1の負電源線との間に接続さ
れその入力部が外部端子に接続された第1の回路と、第
2の正電源線と第2の負電源線との間に接続された第2
の回路とを有する半導体集積回路装置における前記第1
の回路の入力部と前記外部端子とを接続する入力線路に
設けられ、前記外部端子に印加された過電圧を吸収する
半導体集積回路装置の過電圧吸収回路において、前記入
力線路と前記第1の正電源線及び前記第1の負電源線の
少なくとも一方との間、並びに前記入力線路と前記第2
の正電源線及び前記第2の負電源線の少なくとも一方と
の間に接続され、前記外部端子に過電圧が加わった場合
に導通する手段を備えたことを特徴とする半導体集積回
路装置の過電圧吸収回路。
(1) A first circuit connected between a first positive power line and a first negative power line, the input part of which is connected to an external terminal, and a second positive power line and a second negative power line. The second wire connected between
The first circuit in the semiconductor integrated circuit device having a circuit of
In the overvoltage absorption circuit of a semiconductor integrated circuit device, which is provided on an input line connecting an input section of the circuit and the external terminal, and absorbs an overvoltage applied to the external terminal, the input line and the first positive power supply line and at least one of the first negative power supply line, and between the input line and the second negative power supply line.
Overvoltage absorption for a semiconductor integrated circuit device, characterized in that the device is provided with a means connected between the positive power supply line and at least one of the second negative power supply line, and conductive when an overvoltage is applied to the external terminal. circuit.
JP1012809A 1989-01-20 1989-01-20 Overvoltage absorption circuit of semiconductor integrated circuit device Expired - Lifetime JP2752680B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1012809A JP2752680B2 (en) 1989-01-20 1989-01-20 Overvoltage absorption circuit of semiconductor integrated circuit device
US08/038,556 US5343352A (en) 1989-01-20 1993-03-26 Integrated circuit having two circuit blocks energized through different power supply systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1012809A JP2752680B2 (en) 1989-01-20 1989-01-20 Overvoltage absorption circuit of semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPH02192760A true JPH02192760A (en) 1990-07-30
JP2752680B2 JP2752680B2 (en) 1998-05-18

Family

ID=11815716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1012809A Expired - Lifetime JP2752680B2 (en) 1989-01-20 1989-01-20 Overvoltage absorption circuit of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JP2752680B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122650A (en) * 1993-10-22 1995-05-12 Yamaha Corp Semiconductor device
US5521415A (en) * 1993-12-24 1996-05-28 Nec Corporation Semiconductor device having a circuit for protecting the device from electrostatic discharge
US6927956B1 (en) 1999-07-28 2005-08-09 Rohm Co., Ltd. Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6336557A (en) * 1986-07-30 1988-02-17 Nec Corp Complementary mis integrated circuit
JPS63202056A (en) * 1987-02-18 1988-08-22 Toshiba Corp Semiconductor integrated circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6336557A (en) * 1986-07-30 1988-02-17 Nec Corp Complementary mis integrated circuit
JPS63202056A (en) * 1987-02-18 1988-08-22 Toshiba Corp Semiconductor integrated circuit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122650A (en) * 1993-10-22 1995-05-12 Yamaha Corp Semiconductor device
US5521415A (en) * 1993-12-24 1996-05-28 Nec Corporation Semiconductor device having a circuit for protecting the device from electrostatic discharge
US6927956B1 (en) 1999-07-28 2005-08-09 Rohm Co., Ltd. Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown
US6972938B2 (en) 1999-07-28 2005-12-06 Rohm Co., Ltd. Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown
US7154720B2 (en) 1999-07-28 2006-12-26 Rohm Co., Ltd. Semiconductor integrated circuit device with enhanced resistance to electrostatic breakdown

Also Published As

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