JPH02186536A - Shadow mask-type color cathode ray tube - Google Patents

Shadow mask-type color cathode ray tube

Info

Publication number
JPH02186536A
JPH02186536A JP681389A JP681389A JPH02186536A JP H02186536 A JPH02186536 A JP H02186536A JP 681389 A JP681389 A JP 681389A JP 681389 A JP681389 A JP 681389A JP H02186536 A JPH02186536 A JP H02186536A
Authority
JP
Japan
Prior art keywords
shadow mask
slot
cathode ray
row
ray tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP681389A
Other languages
Japanese (ja)
Inventor
Yasuo Iwasaki
安男 岩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP681389A priority Critical patent/JPH02186536A/en
Publication of JPH02186536A publication Critical patent/JPH02186536A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To make moire almost unnoticeable by making the lengths of pitches in vertical direction of each slot in row in a shadow mask completely at random order. CONSTITUTION:When longitudinally long slots 6 are ranged in vertical direction having bridges parts 7 between each other and keeping a specified pitch Pv, the length of the pitch Pv in the vertical direction in each row of slots is set completely at random order. As a result, the positions of the bridge parts 7 in each row of the slots become completely at random order in horizontal direction and the shadow of the bridge parts 7 projected to a fluorescent plane also become completely irregular and optical interference between stripes of scanning rays of electron beams alters randomly in each slot row. By this structure, as a whole, moire can be made almost unnoticeable.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明はシャドウマスク方式カラー陰極線管に関し、
詳しくはシャドウマスクの電rビーム通過孔(以下、「
スロット」という)の配列に関す〔従来の技術] 第2図は従来のシャドウマスク方式カラー陰極線管の概
略断面図で、シャドウマスク方式カラー陰極線管(1)
のネック部に収納された電r銃(2)から放射された3
木の電子ビームは、偏向ヨーク(3)の水平偏向磁界と
東向偏向磁界によって螢光面(4)の全面にわたって走
査するように偏向され、シャドウマスク(5)のスロッ
ト(6)を通って対応するそれぞれの芭の螢光体ストラ
イプに射突し、螢光体を励起発光させてカラー画像を形
成する、。
[Detailed Description of the Invention] [Industrial Application Field] This invention relates to a shadow mask type color cathode ray tube,
For details, refer to the shadow mask's electric r-beam passage hole (hereinafter referred to as "
[Prior art] Fig. 2 is a schematic cross-sectional view of a conventional shadow mask type color cathode ray tube.
3 emitted from an electric gun (2) stored in the neck of
The wooden electron beam is deflected by the horizontal deflection magnetic field of the deflection yoke (3) and the eastward deflection magnetic field so as to scan over the entire surface of the fluorescent surface (4), and passes through the corresponding slot (6) of the shadow mask (5). The light impinges on the phosphor stripes of each flower, excites the phosphors and causes them to emit light, forming a color image.

第:S図は周知のス[ノットツノ式のシャドウマスク(
5)の−例を示す一部拡大図である。縦長のスロット(
6)をブリッジ部(7)を介して縦方向に一定のピッチ
[)vで連ねたスロット列を、水゛ト方向に定のピッチ
で並列に形成したもので、各スロット(6)の長T=方
向の開ローノ法は一定で、各スロット列のスロット位置
は   Pvずつ交rjにすらして形成されている。こ
のスロット列のスロワ1〜とスロットの間の部分である
ブリッジ部(7)を電工ビームを走査すると、この部分
で電rビームが1f14まれるので、螢光向1にlet
その1.!三が+p H1’lツノ向にまる寸法的な拡
大率を掛けたイll′l)ずつ隔って水宇方向に投影さ
れることになる。他力、電rビームの走査線本数は周知
の通りN T S C方式では525木、1)AI、h
式では625木と定められており、また電rビームもあ
る大きさを持っているので、螢光面を走査した状態で走
査線と走査線の間に影が/Iじ、電工ビーl\による明
暗の縞が発lする。この結果、シャドウマスク(5)の
ブリ\ンジ部(6)による明暗の縞と、走査線による明
暗の縞が光学的干渉を起して干アレが発生ずる。この干
アレが出来るだけ[1\ンたなくなる様にシャドウマス
クのスロットの縦方向のピッチl)vの(ll′iが選
定されるが、通常、この選定は次の禄にして行われる。
Figure S: The well-known Knot-horn style shadow mask (
It is a partially enlarged view showing an example of 5). Vertical slot (
6) are connected in the vertical direction at a constant pitch [)v through the bridge part (7), and are formed in parallel at a constant pitch in the horizontal direction, and the length of each slot (6) is The open Rono method in the T=direction is constant, and the slot positions of each slot row are formed by even intersecting rj by Pv. When the electric beam is scanned over the bridge part (7) which is the part between the slots 1 to 1 of this slot row and the slot, the electric r beam is 1f14 in this part, so let it be in the fluorescent direction 1.
Part 1. ! 3 is projected in the water direction at a distance of +p H1'l, which is multiplied by the dimensional magnification factor applied to the horn direction. As is well known, the number of scanning lines of the electric beam is 525 in the NTC system, 1) AI, h
The formula specifies 625 trees, and the electric beam also has a certain size, so when the fluorescent surface is scanned, a shadow appears between the scanning lines. Light and dark stripes are emitted. As a result, light and dark stripes caused by the bridge portion (6) of the shadow mask (5) and light and dark stripes caused by the scanning line cause optical interference, resulting in dryness. In order to reduce this dryness as much as possible, the vertical pitch of the shadow mask slots l)v (ll'i) is selected, but this selection is usually made in the next step.

シャドウマスクのスロットの縦方向のピッチ[)vのゲ
光面へ投影された・]〆l、1’voの□を1)A、走
査線のII 11.’+力回向間隔J”S、螢光向1で
のモアレの繰り返し間隔(干アレピッチ)を1)IIと
すると ・・・・・・・・・・・・ (1) と表わせる。これら干アレ群のうち、実際にrl 1’
7−)て問題となるのは、実験結果によると[)2(1
,:3) 、 l’w (1,4) 、 l’1l(1
,5)の:3つの場合である3、規準化モアレ・ピッチ
(P。
Vertical pitch of the slots of the shadow mask [) projected onto the light surface of v]〆l, 1'vo □ 1) A, scanning line II 11. If the moiré repetition interval (dry arepitch) in the fluorescent direction 1 is 1)II, then the moiré repetition interval in the fluorescent direction 1 is expressed as (1).These can be expressed as: Of the dry group, actually rl 1'
According to the experimental results, the problem with [)2(1
, :3) , l'w (1,4) , l'1l(1
, 5): Three cases: 3, normalized moiré pitch (P.

/縦方向イ1効径)と、現へL化スロットピッチ(1’
A/縦力向イ1効径)の関係を、N l’ S C方式
の走査について第4図に小才3.2フインチ1(ン°偏
向のカラー陰極線管の場合を例にとると、現へ1.化ス
ロツトビッヂは1.28XIOmmの所で最も干アレが
11立ちにくく、この場合のI)vは0.91mmとな
る。干アレを無くす為には (lj式よりl’)Aを大
きくとれば良いわけであるが、周知のにうに、シャドウ
マスクはほぼ球面構造に成形する必要があり、その成形
f1より≦1.5mm程度となる。また、電rビームの
シャドウマスクに対する透過率の面からは、l’lVは
出来るだけ人きい方が好ましく、l)v≦15mmの範
囲で出来るだけ大きく、11つ干アレのひたない値に選
ばれる。なお、第;3図に小すように、P v≦1.5
mm、IJIノも規べ1.化スロットビツヂ≦2.1X
IO−”の範囲においては、干アレを完全に無くずこと
は不可能である。また、シャドウマスクのブリッジ部(
7)の幅13wを秋くずれば、P vを人きくするのと
同様にモアレを軽減来るが、l’)Aを人きくするのと
同様にシャドウマスクの成形性の問題で好ましくなく、
1)4に関係なく一定の範囲の4+’iが必要であって
5通常0゜mm≦B WS2.15mmの植が要求され
る。このブリッジ部(7)の幅I3 wの影響による螢
光向の影の大きさは、電子ビームの偏向角度とノ1、に
大きくなる。また、走査線の影の部分の幅は、電rビー
ムのフォーカス性能が良くなれば大きくなる傾向にある
。特に電r銃のフォーカス電極に、偏向ヨーク(3)の
偏向電流に同期した変調電圧を加えて螢光面仝面にわた
ってフォーカス特性を良くした電r銃を用いたカラー陰
極線管においては、螢光向Iでの走査線の明暗の縞が鮭
明となって干アレカ月1立ち易い。さらに、最近のよう
に、螢光面が形成されるフェース・プレートの形状が非
球面構造である場合は、螢光向1の各位置での走査線の
間隔が変化し、干アレのパターンも非常に複雑な形状と
なる。
/Longitudinal direction I1 effective diameter) and L-shaped slot pitch (1'
Taking the case of a color cathode ray tube with a deflection of 3.2 inches as an example, the relationship between Currently, the 1. slot bit is least prone to dryness at 1.28XIOmm, and I)v in this case is 0.91mm. In order to eliminate dryness, it is sufficient to make (l' from the lj formula) A large, but as is well known, the shadow mask needs to be formed into an almost spherical structure, and the forming f1 requires ≦1. It will be about 5mm. In addition, from the perspective of the transmittance of the electric r beam to the shadow mask, it is preferable that l'lV be as compact as possible; To be elected. Furthermore, as shown in Fig. 3, P v≦1.5
Also specify mm and IJI.1. slot bit≦2.1X
In the range of IO-", it is impossible to completely eliminate dryness. Also, the bridge part of the shadow mask (
If the width 13w of 7) is reduced, the moiré will be reduced in the same way as making Pv more attractive, but it is not preferable because of the moldability of the shadow mask, as is the case with making Pv more attractive.
1) Regardless of 4, a certain range of 4+'i is required, and 5 usually requires a planting of 0゜mm≦BWS2.15mm. The size of the shadow of the fluorescence direction due to the influence of the width I3w of the bridge portion (7) becomes as large as the deflection angle of the electron beam. Furthermore, the width of the shadow portion of the scanning line tends to increase as the focusing performance of the electric r beam improves. In particular, in a color cathode ray tube using an electric r-gun, in which a modulation voltage synchronized with the deflection current of the deflection yoke (3) is applied to the focus electrode of the electric r-gun to improve focus characteristics over the entire fluorescent surface. The bright and dark stripes of the scanning line in the direction I become salmon bright, making it easy to stand up. Furthermore, if the shape of the face plate on which the fluorescent surface is formed is an aspherical structure, as is the case recently, the spacing between the scanning lines at each position in fluorescent direction 1 changes, and the pattern of dryness also changes. It becomes a very complicated shape.

[発明が解決しJ:うとする課題] 以1゛のように、従来のシャ)・ウマスフ方式カラ陰極
線管においては、縦方向に連ねられたスロットとスロッ
トとの間に有限な幅のブリッジ部が(rl+1−る限り
、走査線による縞模様との間に)1じる千アレは、程度
のバはイ1つても避けがたいものであった。
[Problems to be Solved by the Invention] As described in 1 above, in the conventional color cathode ray tube of the Sha-Umasuf method, a bridge portion of a finite width is formed between the slots arranged in the vertical direction. (as long as rl+1-, between the striped pattern caused by the scanning line), the 1,000-color difference was unavoidable, no matter how bad it was.

この発明はV記の様な問題点を解消する為になされたも
ので、千アレがほとんど皆無か、またはほとんと゛に1
1ンたないシャドウマスクカニ(カラー陰極線管を得る
ことを目的とするものである。
This invention was made to solve the problems mentioned in V.
The purpose is to obtain a color cathode ray tube with no shadow mask.

[課題を解決するための丁°段〕 この発明に係るシャドウマスク11式カラー陰極線管は
、シャドウマスクの各スロット列毎のスロットの縦方向
のピッチl”vの人きさを完全不規則(ランダム)配列
となるように設定した点を特徴とする。
[Just steps to solve the problem] The shadow mask type 11 color cathode ray tube according to the present invention has a completely irregular ( It is characterized by points set in a random) arrangement.

〔作用] この発明におけるシャドウマスクは、各スロット列のス
ロットの縦方向のピッチ1)、の大きさを完全不規則(
ランダム)配列としたので、各スロット列毎のブリッジ
部の位置も水・1εツノ向に関しては完全不規則配列と
なり、そのブリッジ部が螢光面に投影された影も水平方
向に関しては全く規則性の無いものとなるので、電rビ
ームの走査線の縞模様との間の光学的1゛−渉が各スロ
ット列1りにランダムに変る為全体の干アレとしては1
11°l、ちにくいものとなる。
[Operation] The shadow mask according to the present invention has a completely irregular pitch (1) of the slots in each slot row in the vertical direction.
Since the arrangement is random), the position of the bridge part for each slot row is completely irregular in the water/1ε horn direction, and the shadow projected by the bridge part on the fluorescent surface is also completely regular in the horizontal direction. Since the optical interference between the striped pattern of the scanning line of the electric r beam and the striped pattern of the scanning line changes randomly for each slot row, the overall difference is 1.
11°l, it becomes small.

[発明の実施例] 以教この発明の一実施例を第1図により説明する。[Embodiments of the invention] An embodiment of the present invention will now be described with reference to FIG.

この実施例においては、縦長のスロット(6)をブリッ
ジ部(7)を介して縦方向に一定のピッチ、で連ねたの
は従来例と同様であるが、従来はどのスロット列のピッ
チP vも全て同一であったのに対して、この実施例で
は、各スロット列毎に縦方向のピッチP vの人きさを
完全不規則(ランダム)配列になる様に設定しである。
In this embodiment, the vertically elongated slots (6) are arranged in a row at a constant pitch in the longitudinal direction via the bridge part (7), as in the conventional example. However, in this embodiment, the vertical pitch Pv of each slot row is set to be completely irregular (random).

この完全不規則配列のP vの値を決定するには、乱数
発生器により完全に不規則な統1.1処理を11うこと
により行われる。このようにスロット列毎の縦方向のピ
ッチPvをランダムに決定すると、各スロット列毎に螢
光向に投影されたブリッジ部(7)の影による明暗の縞
模様と、電子ビームの走査線による明暗の縞模様との間
に水平方向のスロットの配列ピッチで決まる細かいモア
レが発するが、そのバタンか各スロット列毎に細かくラ
ンダムに変化する為、全体としては干アレとして非常に
[1−l°ちにくいものとなる。
To determine the value of Pv for this completely irregular array, a random number generator performs a completely irregular process 1.1. If the vertical pitch Pv for each slot row is randomly determined in this way, a bright and dark striped pattern due to the shadow of the bridge part (7) projected in the fluorescent direction for each slot row and a pattern due to the scanning line of the electron beam will be created. Fine moiré, which is determined by the horizontal slot arrangement pitch, occurs between the bright and dark striped patterns, but because the bangs or the small and random changes occur in each slot row, the overall appearance is very dry. °Becomes less fragile.

なお、電rビームの透過性の観点からはPv≧0.3m
mの範囲で出来るだけ大きい)Jが好ましいが、シャド
ウマスクの成形性の面からは1)、≦1.5mmとした
方が良い。また、螢光向を形成する際には、長い線状光
源をシャドウマスクのスロットの長手方向に配設して露
光することにより、シャドウマスクのブリッジ部の影の
影響を無くして縦方向に連続したストライプ状の螢光面
を写真製版技術により形成するのは周知のことであるが
、この露光条件を決める際にも、あまり1)9の範囲が
広過ぎるのは好ましくない3.シかるに、前に述べた1
、5mm≧Pv≧0.3mmの範囲であれば、線状光源
をその長毛方向に往復運動させながら露光を行うことに
より、従来と同様な写真製版技術によって縦方向に連続
したストライプ状の螢光面を形成することがl■能であ
ることが実験的に確かめられた。
In addition, from the viewpoint of the transparency of the electric r beam, Pv≧0.3m
J is preferably as large as possible within the range of m, but from the viewpoint of moldability of the shadow mask, it is better to set the value to 1) ≦1.5 mm. In addition, when forming the fluorescent light direction, by placing a long linear light source in the longitudinal direction of the slot of the shadow mask and exposing it, the effect of the shadow of the bridge part of the shadow mask is eliminated and the light is continuous in the vertical direction. It is well known that striped fluorescent surfaces are formed by photolithography, but when determining the exposure conditions, it is undesirable for the range of 1) 9 to be too wide. 3. Shikarun, the 1 mentioned before
, in the range of 5mm≧Pv≧0.3mm, by performing exposure while reciprocating the linear light source in the direction of the long hairs, continuous stripe-like fluorescence is produced in the vertical direction using conventional photolithography technology. It was experimentally confirmed that it is possible to form a surface.

〔発明の効果〕〔Effect of the invention〕

以りのように、この発明によれば、シャドウマスク方式
カラー陰極線管のシャドウマスクの各スロット列毎の縦
方向のスロットのピッチP vをラングt\に設定した
ので、螢光向に投影されたブリッジ部の影と、ttr−
ビームの走査線との間で生じる光学的1′渉が各スロッ
ト列毎に細かく変化するので、全体としては干アレの発
生が緩和され、非常に品位の高い画像を再生できるシャ
ドウマスク方式カラー陰極線管が得られる効果がある。
As described above, according to the present invention, the vertical slot pitch Pv of each slot row of the shadow mask of the shadow mask type color cathode ray tube is set to rung t\, so that the shadow mask is projected in the direction of the fluorescent light. The shadow of the bridge section and the ttr-
Since the optical 1' cross-over between the beam and the scanning line varies minutely for each slot row, the shadow mask type color cathode ray reduces the occurrence of shadow rays as a whole and can reproduce very high quality images. There is an effect that the tube can be obtained.

さらに、このように−列のスロットピッチを同とし、各
スロット列ごとのピッチをランダムとすると、スロット
列に関係なく、スロットピッチをランダムにするのに比
べて、写真製版用のパターンの製作が容易となる効果も
得られる。
Furthermore, if the slot pitches of the rows are the same and the pitch of each slot row is random, it will be easier to produce patterns for photolithography than if the slot pitch is random regardless of the slot row. It also has the effect of making it easier.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例であるシャドウマスクの−
・部拡人図、第2図はシャドウマスク方式カラー陰極線
管の概略断面図、第3図は従来のシャドウマスクの一部
拡大図、第4図は干アレの干−ドを小ず図である。 (1)・・・シャドウマスク方式カラー陰極線管。 (5)・・・シャドウマスク、 (6)・・・スロット
、 (7)・・・ブリッジ部、。 <) なお、 各図中、 同 ?]弓は同 または+1 当部 分を示す。
FIG. 1 shows a shadow mask according to an embodiment of the present invention.
・Figure 2 is a schematic cross-sectional view of a shadow mask type color cathode ray tube, Figure 3 is a partially enlarged view of a conventional shadow mask, and Figure 4 is a small diagram of a dry area. be. (1)...Shadow mask type color cathode ray tube. (5)...Shadow mask, (6)...Slot, (7)...Bridge part. <) In each figure, are they the same? ] The bow indicates the same or +1 part.

Claims (1)

【特許請求の範囲】[Claims] (1)インライン配列の3電子銃と縦長のスロットを縦
方向に一定のピッチP_vでもつて連ねたスロット列を
水平方向に並列に形成したシャドウマスクと、このシャ
ドウマスクに対向して配設された縦方向に連続したスト
ライプ状の螢光面とを具備したシャドウマスク方式カラ
ー陰極線管において、上記各スロット列のスロットの縦
方向のピッチ(P_v)の大きさを1.5≧P_v≧0
.3の範囲内で完全不規則の配列となるように形成した
ことを特徴とするシャドウマスク方式カラー陰極線管。
(1) A shadow mask in which three in-line electron guns and vertically elongated slots are arranged in parallel in the horizontal direction at a constant pitch P_v; In a shadow mask type color cathode ray tube having a striped fluorescent surface continuous in the vertical direction, the vertical pitch (P_v) of the slots in each slot row is set to 1.5≧P_v≧0.
.. 3. A shadow mask type color cathode ray tube, characterized in that the color cathode ray tube is formed in a completely irregular arrangement within the range of 3.
JP681389A 1989-01-13 1989-01-13 Shadow mask-type color cathode ray tube Pending JPH02186536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP681389A JPH02186536A (en) 1989-01-13 1989-01-13 Shadow mask-type color cathode ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP681389A JPH02186536A (en) 1989-01-13 1989-01-13 Shadow mask-type color cathode ray tube

Publications (1)

Publication Number Publication Date
JPH02186536A true JPH02186536A (en) 1990-07-20

Family

ID=11648641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP681389A Pending JPH02186536A (en) 1989-01-13 1989-01-13 Shadow mask-type color cathode ray tube

Country Status (1)

Country Link
JP (1) JPH02186536A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010081586A (en) * 2000-02-16 2001-08-29 구자홍 Shadow-Mask for a color picture tube
US6545402B1 (en) 1998-07-29 2003-04-08 Lg Electronics Inc. Shadow mask having vertical pitch between 2.7 and 8 times vertical pitch
US6812629B2 (en) * 1999-12-10 2004-11-02 Samsung Sdi Co., Ltd. Shadow mask frame assembly for flat CRT with slot groups

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6545402B1 (en) 1998-07-29 2003-04-08 Lg Electronics Inc. Shadow mask having vertical pitch between 2.7 and 8 times vertical pitch
US6812629B2 (en) * 1999-12-10 2004-11-02 Samsung Sdi Co., Ltd. Shadow mask frame assembly for flat CRT with slot groups
KR20010081586A (en) * 2000-02-16 2001-08-29 구자홍 Shadow-Mask for a color picture tube

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