JPH01131031A - Production of glass transfer body - Google Patents
Production of glass transfer bodyInfo
- Publication number
- JPH01131031A JPH01131031A JP28864487A JP28864487A JPH01131031A JP H01131031 A JPH01131031 A JP H01131031A JP 28864487 A JP28864487 A JP 28864487A JP 28864487 A JP28864487 A JP 28864487A JP H01131031 A JPH01131031 A JP H01131031A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- coating film
- sol
- adhesive
- transfer body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 41
- 238000012546 transfer Methods 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 34
- 239000000853 adhesive Substances 0.000 claims abstract description 20
- 230000001070 adhesive effect Effects 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000007496 glass forming Methods 0.000 claims abstract description 9
- 239000011159 matrix material Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 22
- 239000010419 fine particle Substances 0.000 claims description 10
- 150000004703 alkoxides Chemical class 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 abstract description 3
- 238000003618 dip coating Methods 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 description 30
- 239000010410 layer Substances 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000002952 polymeric resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000006223 plastic coating Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 102220043690 rs1049562 Human genes 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ガラスの表面に凹凸パターンを形成したガラ
ス転写体の製造方法に関し、特に光情報処理、光通信分
野で使用される、光集積回路、グンーティング、ホログ
ラフィック素子、グループ付き光デイスク基板の製造方
法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method for manufacturing a glass transfer body having a concavo-convex pattern formed on the surface of the glass, and particularly relates to a method for producing a glass transfer body having a concavo-convex pattern formed on the surface of the glass, and in particular, an optical integrated device used in the fields of optical information processing and optical communication. The present invention relates to a method for manufacturing circuits, Gunting, holographic elements, and optical disk substrates with groups.
従来、この種の表面に微細パターンを存するガラス体の
製造方法としては、ガラス基板上にフォトレジスト膜を
塗布した後、紫外光を用いたフォトリングラフィ技術に
より、パターンを形成していた。しかし、このような紫
外光を用いたフォトリングラフィ技術では、作製できる
パターンの細かさはたかだか１μｍ程度のものである。Conventionally, as a manufacturing method of this type of glass body having a fine pattern on its surface, a photoresist film is applied on a glass substrate, and then a pattern is formed by photolithography technology using ultraviolet light. However, with such photolithography technology using ultraviolet light, the fineness of patterns that can be produced is about 1 μm at most.
例えば、光ディスクに要求される凹凸パターン、光導波
路素子の集光グレーティングの凹凸パターンなどでは、
パターン幅として０．５μｍ前後の微細さが要求され、
紫外光を用いたフォトリングラフィ技術では対応できな
い。そこで、このような微細なパターンに対応するため
に、電子ビームや、レーザービーム描画による方法が提
案されている。これらの方法の欠点としては、描画に多
大な時間を要し、スループットが極めて悪いことがあげ
られる。従って、このような微細パターンを有する製品
では、ガラス製品は、レプリカ技術の進んだ樹脂製品に
比すと極めて高価となってしまう。このような欠点を解
決するために、ゾル−ゲル法を利用したガラスのレプリ
カ技術が提案されている。（特開昭６２−１０２４４５
）〔発明が解決しようとする問題点〕
この方法を第４図に沿って説明する。基板１７上に有機
金属化合物を含む溶液の可塑性塗布膜１６を形成する。For example, the uneven pattern required for optical discs, the uneven pattern for condensing gratings of optical waveguide elements, etc.
A fine pattern width of around 0.5 μm is required,
Photophosphorography technology using ultraviolet light cannot handle this problem. Therefore, in order to handle such fine patterns, methods using electron beam or laser beam drawing have been proposed. The disadvantages of these methods are that drawing takes a lot of time and the throughput is extremely low. Therefore, glass products having such fine patterns are extremely expensive compared to resin products with advanced replica technology. In order to solve these drawbacks, a glass replica technology using a sol-gel method has been proposed. (Unexamined Japanese Patent Publication No. 62-102445
) [Problems to be Solved by the Invention] This method will be explained with reference to FIG. A plastic coating film 16 of a solution containing an organometallic compound is formed on a substrate 17 .
（第４図（ａ））塗布膜１６が可塑性を存する間に所望
の形状を存するプレス型１８を塗布膜１６に押しつける
。（第４図（ｂ））塗布膜１Ｇが硬化した時点で、プレ
ス型１８を！１１離し焼成することにより表面に微細な
パターンを存する、ガラス体を量産性良く得ることがで
きる（第４図（Ｃ））。しかし当方法には、次にあげる
ような欠点がある。(FIG. 4(a)) A press die 18 having a desired shape is pressed onto the coating film 16 while the coating film 16 remains plastic. (Fig. 4(b)) When the coating film 1G is cured, press the press mold 18! By firing at 11 times apart, a glass body having a fine pattern on its surface can be obtained with good mass productivity (FIG. 4(C)). However, this method has the following drawbacks.
（ｉ） プレス型１８の凹部には空気が存在するため
に、塗布膜１６にプレス型１８の形状を忠実に転写する
ことができない。また、有機金属化合物を含む溶液は水
、アルコールなどの蒸気圧の高い物質から成っており、
空気抜きのための真空引きは困難である。(i) Since air exists in the concave portion of the press mold 18, the shape of the press mold 18 cannot be faithfully transferred to the coating film 16. In addition, solutions containing organometallic compounds consist of substances with high vapor pressure such as water and alcohol.
It is difficult to draw a vacuum to remove air.
（ｉｆ ） プレス型１８を塗布膜１６番ご押しつけ
るには基板１７とプレス型１８の平行度を極めて精度良
く制御しなければならない。そのため、装置が高価なも
のとなってしまう。(if) In order to press the press mold 18 against the coating film No. 16, the parallelism between the substrate 17 and the press mold 18 must be controlled with extremely high precision. Therefore, the device becomes expensive.
（ｉｉｉ ） 塗布膜１６の硬度は、経時的に変化す
るために、プレス型１８を押しつけるタイミングが微妙
であり、高度に制御されたプロセスを必要とされる。本
発明は上述の点に鑑みなされたものであり、その目的と
するところは、所望の型の形状を忠実に転写したガラス
転写体を、高価な装置を使用することなく、極めて量産
性良く製造する方法を提供することにある。(iii) Since the hardness of the coating film 16 changes over time, the timing of pressing the press mold 18 is delicate, and a highly controlled process is required. The present invention has been made in view of the above points, and its purpose is to manufacture a glass transfer body that faithfully transfers the shape of a desired mold with high mass productivity without using expensive equipment. The goal is to provide a way to do so.
本発明のガラス転写体の製造方法は、所望の形状を有す
る母型上に、ガラス形成酸化物微粒子が分散したゾル塗
布膜を形成する第一の工程、前記ゾル塗布膜上に接着剤
を塗布する第二の工程、前記接着剤上に基板をのせて接
着する第三の工程、前記母型と前記ゾル塗布膜との界面
から両者を分離する第四の工程の以上四つの工程から成
ることを特徴とする。The method for manufacturing a glass transfer body of the present invention includes a first step of forming a sol coating film in which glass-forming oxide fine particles are dispersed on a matrix having a desired shape, and applying an adhesive on the sol coating film. a second step of placing a substrate on the adhesive and adhering it; and a fourth step of separating the mother mold and the sol coating film from the interface thereof. It is characterized by
本発明の作用を第一図に沿って説明する。所望の形状を
育する型１を用意しくＡ）、その型１上にデイツプコー
ティング、スピンコーティング、スプレーコーティング
などの方法を使ってガラス形成酸化物微粒子が分散した
ゾル塗布膜２を形成する（Ｂ）。このガラス形成酸化物
微粒子が分散したゾルは、一種もしくは二種以上の金属
アルコキシドを加水分解した溶液を主成分とする。この
加水分解溶液単位で使用しても良いが、例えば、膜厚を
制御するための手法、ガラス形成酸化物微粉末の添加、
シランカップリング剤の添加、界面活性剤の添加、高分
子樹脂の添加なども重要な手法である。また、このガラ
ス転写体を光導波路デバイスとして使用することを考え
た場合、ゾル塗布膜から形成されるガラス薄膜の精密な
屈折率制御が要求され、ゾル作製時の材料の組み合わせ
、例えば、金属アルコキシドの組み合わせが重要である
。金属アルコキシドとしては、Ｓｉ （ＯＲ）４、Ｔｉ
（ＯＲ）４、Ｚｒ （ＯＲ）４、Ｇｅ （ＯＲ）４、
Ｎａ（ＯＲ）、Ｂ（ＯＲ）３、等が考えられるが、これ
らに限定されるものではない。The operation of the present invention will be explained with reference to FIG. A) Prepare a mold 1 that grows a desired shape, and form a sol coating film 2 in which glass-forming oxide fine particles are dispersed on the mold 1 using a method such as dip coating, spin coating, or spray coating. B). The sol in which the glass-forming oxide fine particles are dispersed has as its main component a solution obtained by hydrolyzing one or more metal alkoxides. Although this hydrolyzed solution may be used in units, for example, methods for controlling the film thickness, addition of glass-forming oxide fine powder, etc.
Addition of silane coupling agents, surfactants, polymer resins, etc. are also important methods. In addition, when considering the use of this glass transfer body as an optical waveguide device, precise control of the refractive index of the glass thin film formed from the sol coating film is required. The combination of these is important. As metal alkoxides, Si (OR)4, Ti
(OR)4, Zr (OR)4, Ge (OR)4,
Possible examples include Na(OR), B(OR)3, etc., but are not limited to these.
このようにして塗布されたゾル塗布膜２は、型１の凹部
に空気などの影響を受けずに、確実に入り込むことがで
きる。従って、このゾル塗布膜が、硬化後に型１から離
型することができれば、型１の形状を忠実に転写した、
ガラス転写体を得ることができる。また、型１上に塗布
膜２を形成すれば、その時点で、形状転写プロセスも終
了しまっており、転写工程の省略および、膜の硬度制御
などのような高度のプロセスの省略をはかることができ
る。次に塗布膜の剥離工程を説明する。The sol coating film 2 applied in this manner can reliably enter the recessed portion of the mold 1 without being affected by air or the like. Therefore, if this sol coating film can be released from the mold 1 after curing, the shape of the mold 1 has been faithfully transferred.
A glass transfer body can be obtained. Furthermore, once the coating film 2 is formed on the mold 1, the shape transfer process has already been completed, making it possible to omit the transfer process and other advanced processes such as controlling the hardness of the film. can. Next, the process of peeling off the coating film will be explained.
塗布膜を加熱するなどして、充分に硬化させた後、ディ
ッピング、スピンコーティング、スプレーコーティング
などの手法を用いて、塗布膜２上に接着剤の層３を設け
る（ｃ）。ここで使用する接着剤としては種々のものが
考えられるが、大別すると高分子樹脂系接着剤と、無機
接着剤が考えられる。接着剤の種類は、その目的に応じ
て選択されるべき（例えば屈折率、膜厚制御性など）で
あり限定されるものではない。ただし、高分子樹脂系接
着剤を用いる場合には、接着剤の耐熱比の問題からゾル
塗布膜２を剥離工程の前段階で、焼成しガラス緻密化し
ておく必要がある（ｇ）。After the coating film is sufficiently cured by heating, etc., an adhesive layer 3 is provided on the coating film 2 using a technique such as dipping, spin coating, or spray coating (c). Various types of adhesives can be used here, but they can be broadly classified into polymeric resin adhesives and inorganic adhesives. The type of adhesive should be selected depending on the purpose (for example, refractive index, film thickness controllability, etc.) and is not limited. However, when using a polymeric resin adhesive, it is necessary to bake the sol coating film 2 to make the glass dense before the peeling process due to the heat resistance ratio of the adhesive (g).
無機接着剤を用いた場所でも同様の工程を経ることがで
きるのはいうまでもない。次に接着剤の層３の上に基板
４を載せ接着剤の硬化処理を行ない（ｄ）、硬化が終了
した時点で、母型１と塗布膜２の界面から両者を分離す
る（ｅ）。無機接着剤を用い、ゾル塗布膜２のガラス緻
密化処理（ｇ）を行なっていない場合は、ガラス緻密処
理（ｈ）を行ない、ガラス転写体を得ることができる（
ｆ）。Needless to say, the same process can be carried out in places where inorganic adhesives are used. Next, the substrate 4 is placed on the adhesive layer 3 and the adhesive is cured (d), and when the curing is completed, the matrix 1 and the coating film 2 are separated from the interface (e). If the glass densification treatment (g) of the sol coating film 2 is not performed using an inorganic adhesive, a glass transfer body can be obtained by performing the glass densification treatment (h) (
f).
〔実施例−１〕
電子ビーム露光により、第２図（ａ）に示すような集光
グレーティングカブラ形状を有するマスター６を作製し
た。次に５ｉ（Ｏｅｔ）、 ２０８ｇ１Ｇｅ（Ｏｅｔ
）４５１ｇ５Ｈｔ０ １５０ｇ１ＨＣｆ！、 ０．１ｇ
を混合加水分解し、ＳｉＱ 、 Ｇ ｅ Ｏ＊微粒子
の分散した第１のゾルを得た。また、Ｓｉ （ＯＦ！ｔ
）ａのみを加水分解したのみのＳ’ＩＯ！微粒子の分散
した第２のゾルを得た。マスター６をスピンコーター上
に基台として設置し、そこに、第１のゾルをスピンコー
ティングした。第１のゾルが充分に乾燥したところで第
１のゾル層７の上に第２のゾルをスピンコードした。第
２のゾルが充分に乾燥したところで、第２のゾル層８上
に無機接着剤（商品名アロンセラミック 東亜合成化学
製）をスピンコードシ、接着剤層９の上に、ガラス基板
１０をのせた。その後１５０°Ｃ１ｈｒの硬化処理をし
マスター６と第１のゾル層７の界面を分離した。この工
程により得られた、ガラス基板上の多孔質層を５００°
Ｃで焼結することにより、グレーティングカプラー１１
を得た。このグレーティングカプラーの断面構造を（ｂ
）に示す。ここで第１のゾル層７は光導波路（ｎ ＝
１．４ ａ ） 、第２のゾル層８はバッファ層（ｎ＝
１．４６）の役割を果たしている。[Example 1] A master 6 having a condensing grating fog shape as shown in FIG. 2(a) was manufactured by electron beam exposure. Next, 5i (Oet), 208g1Ge (Oet
)451g5Ht0 150g1HCf! , 0.1g
were mixed and hydrolyzed to obtain a first sol in which SiQ and G e O* fine particles were dispersed. Also, Si (OF!t
) S'IO which only hydrolyzes a! A second sol in which fine particles were dispersed was obtained. Master 6 was placed on a spin coater as a base, and the first sol was spin coated thereon. After the first sol was sufficiently dried, a second sol was spin-coded onto the first sol layer 7. When the second sol is sufficiently dried, an inorganic adhesive (trade name: Aron Ceramic, manufactured by Toagosei Chemical Co., Ltd.) is applied on the second sol layer 8 by spin coating, and a glass substrate 10 is placed on the adhesive layer 9. Ta. Thereafter, a curing treatment was performed at 150°C for 1 hour to separate the interface between the master 6 and the first sol layer 7. The porous layer on the glass substrate obtained through this process was heated at 500°.
By sintering with C, the grating coupler 11
I got it. The cross-sectional structure of this grating coupler is (b
). Here, the first sol layer 7 is an optical waveguide (n =
1.4a), the second sol layer 8 is a buffer layer (n=
1.46).
このグレーティングカプラの端面に半導体レーザ１２を
端面結合し導波光１３を励振したところ、空気側への出
射光の集光を確認した（ｃ）。When a semiconductor laser 12 was end face coupled to the end face of this grating coupler and guided light 13 was excited, it was confirmed that the emitted light was condensed toward the air side (c).
〔実施例−２〕
ホログラフィ−により、ホログラフィックグレーティン
グを作製し、その溝形状をイオンエツチングによりブレ
ーズ化し、第３図（ａ）に示す断面形状を存するホログ
ラフィックグレーティングマスター１４を得た。次にＳ
ｉ（Ｏｅｔ）４＝２０８ｇと、Ｈ２０＝ １５０ ｇ
１ＨＣρ＝０．２ｇを混合撹拌し、加水分解反応を生ぜ
しめ、ＳｉＯ２微粒子の分散した均質なゾルを得た。ス
ピンコーティングを用いてホログラフィックグレーティ
ングマスター上にゾル層を形成し、ゾル層が充分に硬化
した時点で５００” Ｃまで加熱焼成してゾル層をガラ
ス緻密化した。次にガラス層上にスピンコーティングに
より、樹脂接着層を形成しその上にガラス基板をのせた
。樹脂接着層が充分に硬化した時点で、マスターとガラ
ス層の界面から両者を分離し、第３図（ｂ）に示す断面
形状ををするホログラフィックグレーティング１５を得
た。このグレーティングの＋１次光の回折効率はλ＝７
８０ｎｍにおいて７８％であった。[Example 2] A holographic grating was produced by holography, and its groove shape was blazed by ion etching to obtain a holographic grating master 14 having the cross-sectional shape shown in FIG. 3(a). Next, S
i(Oet)4=208g and H20=150g
1HCρ=0.2g was mixed and stirred to cause a hydrolysis reaction, and a homogeneous sol in which SiO2 fine particles were dispersed was obtained. A sol layer was formed on the holographic grating master using spin coating, and when the sol layer was sufficiently hardened, the sol layer was heated and baked to 500"C to make the sol layer glass densified. Next, spin coating was performed on the glass layer. A resin adhesive layer was formed and a glass substrate was placed on it.When the resin adhesive layer was sufficiently cured, the master and glass layer were separated from each other at the interface, and the cross-sectional shape shown in Figure 3(b) was obtained. A holographic grating 15 was obtained that has the following characteristics.The diffraction efficiency of the +1st order light of this grating is
It was 78% at 80 nm.
〔実施例−３〕
レーザーカッティングマシーンを用いて、グループ付き
ディスク用のマスターを作製した。このマスターのグル
ープの深さは、塗布するゾル膜の乾燥、焼成に伴う厚さ
方向の収縮を見込んで、通常のグループ深さより課目に
作製しである。次にＳ ｉ （ＯＦ！ｔ）、＝２０８
ｇとＨ，Ｏ＝１５０ｇ１ＨＣρ＝０．２ｇを混合撹拌し
、加水分解反応を生ぜしめＳ ｉ Ｏ２微粒子の分散し
た均質なゾルを得た。このゾルに、前述のマスターをデ
ィッピングしゾル層を形成した。ゾル層が充分に硬化後
、５ｎＯ＠Ｃまで加熱焼成しゾル層をガラス緻密化した
。次にスピンコーティングによりガラス層上に無機接着
剤を塗布し、その上にガラス基板をのせて１５０°Ｃ１
ｈｒの硬化処理を行なった。その後、マスターとガラス
層の界面から両者を分離し、グループ付きガラスディス
クを得ることができた。[Example 3] A master for a disc with groups was produced using a laser cutting machine. The depth of the master group is made to be larger than the normal group depth, taking into account shrinkage in the thickness direction due to drying and baking of the sol film to be applied. Then S i (OF!t), = 208
g and H,O=150 g1HCρ=0.2 g were mixed and stirred to cause a hydrolysis reaction and obtain a homogeneous sol in which SiO2 fine particles were dispersed. The aforementioned master was dipped into this sol to form a sol layer. After the sol layer was sufficiently hardened, it was heated and fired to 5nO@C to make the sol layer densified into glass. Next, apply an inorganic adhesive on the glass layer by spin coating, place a glass substrate on top of it, and heat it at 150°C.
A hardening process was performed for hr. Thereafter, the master and the glass layer were separated from the interface to obtain a grouped glass disk.
以上述べたように本発明によれば、所望の形状を有する
母型上にガラス形成酸化物微粒子が分散したゾル塗布膜
を形成し、その塗布膜を接着剤を用いて基板上に移し取
るという極めて簡単な工程で、簡便な装置を用いるだけ
で、転写性に極めて優れた、ガラス転写体を得ることが
できる。このガラス転写体はグレーティング、光ディス
ク、先導波路素子等の光学素子作製上、応用範囲の広い
技術であることは本実施例で述べたが、これらの実施例
にのみ限定されるものではないことはいうまでもない。As described above, according to the present invention, a sol coating film in which glass-forming oxide fine particles are dispersed is formed on a matrix having a desired shape, and the coating film is transferred onto a substrate using an adhesive. A glass transfer body with extremely excellent transferability can be obtained by using an extremely simple process and a simple device. As described in this example, this glass transfer material is a technology with a wide range of applications in the production of optical elements such as gratings, optical disks, and guiding waveguide elements, but it is not limited to these examples. Needless to say.
第１図は本発明の詳細な説明する図、第２図及び第３図
は本発明の詳細な説明する図、第４図は従来の技術を説
明する図である。
１・・・所望の形状を有する型
２・・・ゾル塗布膜
３・・・接着剤の層
４・・・基板
５・・・焼成炉
６・・・グレーティングカプラ形状を育するマスター
７・・・第１のゾル層
８・・・第２のゾル層
９・・・接着剤層
１０・・・ガラス基板
１１・・・グレーティングカブラ
１２・・・半導体レーザ
１３・・・導波光
１４・・・ホログラフィックグレーティングマスター
１５・・・ホログラフィックグレーティング１６・・・
可塑性塗布膜
１７・・・基板
１８・・・プレス型
以 上
出願人 セイコーエプソン株式会社
Ｃ立Ｔｈ１
（Ａ）
（ＢＪ
（グ）
（Ｃ）
第２図
／４
（（Ａ’）
第３図
（幻
（ｂ）
第４図FIG. 1 is a diagram explaining the present invention in detail, FIGS. 2 and 3 are diagrams explaining the present invention in detail, and FIG. 4 is a diagram explaining the conventional technique. 1... Mold having a desired shape 2... Sol coating film 3... Adhesive layer 4... Substrate 5... Firing furnace 6... Master 7 for growing the grating coupler shape... - First sol layer 8... Second sol layer 9... Adhesive layer 10... Glass substrate 11... Grating cover 12... Semiconductor laser 13... Waveguide light 14... Holographic grating master 15... Holographic grating 16...
Plastic coating film 17...Substrate 18...Press type or above Applicant Seiko Epson Co., Ltd. Vision (b) Figure 4
Claims (3)
微粒子が分散したゾル塗布膜を形成する第一の工程、前
記ゾル塗布膜上に接着剤を塗布する第二の工程、前記接
着剤上に基板をのせて接着する第三の工程、前記母型と
前記ゾル塗布膜との界面から両者を分離する第四の工程
の以上四つの工程から成ることを特徴とするガラス転写
体の製造方法。(1) A first step of forming a sol coating film in which glass-forming oxide fine particles are dispersed on a matrix having a desired shape, a second step of applying an adhesive onto the sol coating film, and the adhesion. A glass transfer body characterized by comprising the above four steps: a third step of placing a substrate on the agent and adhering it, and a fourth step of separating the mother mold and the sol coating film from the interface thereof. Production method.
は前記第四の工程の直後に加熱焼成してガラス緻密化す
ることを特徴とする特許請求の範囲、第１項記載のガラ
ス転写体の製造方法。(2) The glass transfer according to claim 1, characterized in that the sol coating film is heated and baked immediately after the first step or immediately after the fourth step to make the glass densified. How the body is manufactured.
種もしくは二種以上の金属アルコキシドの加水分解溶液
を主成分とすることを特徴とする特許請求の範囲第１項
記載のガラス転写体の製造方法。(3) Production of a glass transfer body according to claim 1, wherein the sol in which the glass-forming oxide fine particles are dispersed has a hydrolyzed solution of one or more metal alkoxides as a main component. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28864487A JPH01131031A (en) | 1987-11-16 | 1987-11-16 | Production of glass transfer body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28864487A JPH01131031A (en) | 1987-11-16 | 1987-11-16 | Production of glass transfer body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01131031A true JPH01131031A (en) | 1989-05-23 |
Family
ID=17732830
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28864487A Pending JPH01131031A (en) | 1987-11-16 | 1987-11-16 | Production of glass transfer body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01131031A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02244008A (en) * | 1989-03-16 | 1990-09-28 | Omron Tateisi Electron Co | Optical circuit and production of the optical circuit |
| JPH05273427A (en) * | 1991-09-18 | 1993-10-22 | Carl Zeiss:Fa | Optical waveguide having substantially flat substrate and treatment for its manufacture |
| EP0867921A2 (en) * | 1997-03-26 | 1998-09-30 | Canon Kabushiki Kaisha | Substrate and production method thereof |
| JP2001154049A (en) * | 1999-11-24 | 2001-06-08 | Toppan Printing Co Ltd | Method for manufacturing optical wiring layer, and method for manufacturing opto-electric wiring substrate |
| JP2008006639A (en) * | 2006-06-28 | 2008-01-17 | Toppan Printing Co Ltd | Imprinting mold and its manufacturing method |
-
1987
- 1987-11-16 JP JP28864487A patent/JPH01131031A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02244008A (en) * | 1989-03-16 | 1990-09-28 | Omron Tateisi Electron Co | Optical circuit and production of the optical circuit |
| JPH05273427A (en) * | 1991-09-18 | 1993-10-22 | Carl Zeiss:Fa | Optical waveguide having substantially flat substrate and treatment for its manufacture |
| EP0867921A2 (en) * | 1997-03-26 | 1998-09-30 | Canon Kabushiki Kaisha | Substrate and production method thereof |
| EP0867921A3 (en) * | 1997-03-26 | 1999-03-17 | Canon Kabushiki Kaisha | Substrate and production method thereof |
| JP2001154049A (en) * | 1999-11-24 | 2001-06-08 | Toppan Printing Co Ltd | Method for manufacturing optical wiring layer, and method for manufacturing opto-electric wiring substrate |
| JP4507315B2 (en) * | 1999-11-24 | 2010-07-21 | 凸版印刷株式会社 | Manufacturing method of optical / electrical wiring board |
| JP2008006639A (en) * | 2006-06-28 | 2008-01-17 | Toppan Printing Co Ltd | Imprinting mold and its manufacturing method |
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