JPH01119526A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPH01119526A JPH01119526A JP27645887A JP27645887A JPH01119526A JP H01119526 A JPH01119526 A JP H01119526A JP 27645887 A JP27645887 A JP 27645887A JP 27645887 A JP27645887 A JP 27645887A JP H01119526 A JPH01119526 A JP H01119526A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- silica glass
- sol
- silica
- cracks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 229920002873 Polyethylenimine Polymers 0.000 claims abstract description 17
- -1 Silicon alkoxide Chemical class 0.000 claims abstract description 13
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 13
- 239000010703 silicon Substances 0.000 claims abstract description 13
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000003980 solgel method Methods 0.000 abstract description 4
- 230000007062 hydrolysis Effects 0.000 abstract description 2
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000000499 gel Substances 0.000 description 26
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 235000019441 ethanol Nutrition 0.000 description 6
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 5
- 229960001231 choline Drugs 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は光学用、半導体工業用、電子工業用、理化学用
等に使用されるシリカガラスを製造する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention produces silica glass used for optics, semiconductor industry, electronic industry, physics and chemistry, etc.
(従来の技術)
シリカガラスは耐熱性、耐食性および光学的性質に優れ
ていることから、半導体 製造に欠かせない重要な材料
であり、さらには光ファイバやIC製造用フォトマスク
基1反、TFTi板などに使用され、その用途はますま
す拡大されている。(Prior art) Silica glass has excellent heat resistance, corrosion resistance, and optical properties, so it is an important material indispensable for semiconductor manufacturing. It is used for boards, etc., and its applications are expanding more and more.
従来のシリカガラスの製造法には、天然石英を電気炉ま
たは酸水素炎により溶解する方法、あるいは四塩化ケイ
素を酸水素炎又はプラズマ炎中で高温酸化し溶解する方
法があるが、いずれの方法も製造工程に2.000℃あ
るいはそれ以上の高温を必要とするため大量のエネルギ
ーを消費し、また製造時にそのような高温に耐える材料
が必要であり、また高純度のものが得にくいなど経済的
5品質的にいくつかの問題点をもっている。Conventional methods for manufacturing silica glass include melting natural quartz in an electric furnace or oxyhydrogen flame, or oxidizing and melting silicon tetrachloride at high temperature in an oxyhydrogen flame or plasma flame. The manufacturing process requires a high temperature of 2,000°C or higher, which consumes a large amount of energy, and materials that can withstand such high temperatures are required during manufacturing, and it is difficult to obtain high-purity materials, making it economical. 5) There are some problems in terms of quality.
これに対し、近年ゾル−ゲル法と呼ばれるシリカガラス
を低温で合成する方法が注目されている。その概要を簡
単に述べる。On the other hand, in recent years, a method of synthesizing silica glass at low temperature called the sol-gel method has been attracting attention. The outline will be briefly described below.
一般式S i (OR) a (R:アルキル基)で
表わされるシリコンアルキシド(本発明に於いては、そ
の重縮合物を含′ム)1例えば(RO)3St・ (O
S i (OR)z)−・03i(OR)s、 (n
=o〜B、R:アルキル基)に水(アルカリまたは酸で
pHを調整してもよい)を加え、加水分解し、シリカヒ
ドロシル(本発明に於いてはシリカゾルという)とする
。この時、シリコンアルコキシドと水が均一な系となる
様、一般には溶媒として適当なアルコールが添加されて
いる。このシリカゾルを静置、昇温、ゲル化剤の添加等
によってゲル化させる。その後ゲルを蒸発乾燥すること
によりシリカ乾燥ゲルとする。この乾燥ゲルを適当な雰
囲気中な焼結することによりシリカガラスを得る。Silicon alkoxide (including its polycondensate in the present invention) represented by the general formula S i (OR) a (R: alkyl group) 1 For example, (RO)3St・(O
S i (OR)z)-・03i(OR)s, (n
=o~B, R: alkyl group) is added with water (pH may be adjusted with an alkali or acid) and hydrolyzed to produce silica hydrosil (referred to as silica sol in the present invention). At this time, an appropriate alcohol is generally added as a solvent so that the silicon alkoxide and water form a homogeneous system. This silica sol is gelled by standing still, increasing the temperature, adding a gelling agent, etc. Thereafter, the gel is evaporated to dryness to obtain a dry silica gel. Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
(発明が解決しようとする問題点)
しかし、ゾル−ゲル法によるシリカガラスの製造にはま
だ未解決の問題が残されている。(Problems to be Solved by the Invention) However, there are still unresolved problems in the production of silica glass by the sol-gel method.
特にゲルを乾燥していく過程でゲルにクランクや割れが
発生し易く、クランクや割れのないモノリシックな大形
の乾燥ゲルを歩留り良く製造することが困難となること
である。In particular, during the process of drying the gel, cracks and cracks are likely to occur in the gel, making it difficult to produce a monolithic large-sized dried gel without any cracks or cracks with a good yield.
本発明はクラックや割れの発生することのないシリカガ
ラスの製造法を提供するものである。The present invention provides a method for producing silica glass that does not cause cracks or breaks.
(問題点を解決するための手段)
本発明は、ゾル−ゲル法によるシリカガラスの製造法に
於て、ゾル調整時に分子量100から200.000の
範囲のポリエチレンイミンをシリコンアルコキシド10
0重量部に対し0.1〜20重量部添加することを特徴
とするものである。(Means for Solving the Problems) The present invention provides a method for producing silica glass using a sol-gel method, in which polyethyleneimine having a molecular weight in the range of 100 to 200,000 is mixed with silicon alkoxide 10
It is characterized by adding 0.1 to 20 parts by weight relative to 0 parts by weight.
本発明において、シリコンアルコキッドのアルキル基に
ついて、特に制限はないが、加水分解のし易さ、ゲル化
時間の点から、メチル基、エチル基、プロピル基、ブチ
ル基を有するシリコンアルコキシドを使用することが好
ましい。シリコンアルコキシドに水又は水とアルコール
の混合溶液を加えて加水分解してシリカゾルを生成させ
る際、水、アルコール、又は水とアルコールの混合溶液
にあらかじめポリエチレンイミンyjci加、均一に溶
解させておく。In the present invention, there are no particular restrictions on the alkyl group of the silicon alkoxide, but from the viewpoint of ease of hydrolysis and gelation time, silicon alkoxides having a methyl group, ethyl group, propyl group, or butyl group are used. It is preferable. When adding water or a mixed solution of water and alcohol to silicon alkoxide and hydrolyzing it to produce silica sol, polyethyleneimine yjci is added in advance to water, alcohol, or a mixed solution of water and alcohol to uniformly dissolve it.
添加するポリエチレンイミンの分子量(量平均分子量)
は、100から200,000の範囲のものが使用でき
、これらは単独でも混合物でもよい、ポリエチレンイミ
ンの分子量が100未満であると、有効な効果を得るた
めには。Molecular weight of polyethyleneimine to be added (weight average molecular weight)
can be used in the range of 100 to 200,000, and these may be used alone or as a mixture. In order to obtain an effective effect, the molecular weight of polyethyleneimine is less than 100.
かなりの量を系内に加える必要があり、後のゲルの焼結
ガラス化工程でクランクや割れが発生し易くなる。一方
1分子量が200,000を越えると、著しいゲル化促
進効果のため、均一なゲルを得ることは非常に困難とな
る。添加するポリエチレンイミンの量、はポリエチレン
イミンの分子量によって1選択されるべきである。比較
的低分子量のポリエチレンイミンの場合、シリコンアル
コキシド100重量部に対して、0.1重量部未満の添
加では、はとんど効果はない。一方、比較的高分子量の
ポリエチレンイミンの場合、シリコンアルコキシド縮重
合物100重量部に対して20重量部を越える添加では
、著しいゲル化促進効果のため、均一なゲルを得ること
は非常に困難となる。水と共に加える触媒は、塩基、酸
等特に制限しないが、ゲル化時間、また得られる乾燥ゲ
ルの焼結のし易すさの点から塩基の方が好゛ましい結果
が得られる。水と共に加えるアルコールについては特に
制限しないが、水。It is necessary to add a considerable amount to the system, and cranks and cracks are likely to occur during the subsequent gel sintering and vitrification process. On the other hand, if the molecular weight exceeds 200,000, it becomes extremely difficult to obtain a uniform gel due to the significant gelation promoting effect. The amount of polyethyleneimine added should be selected depending on the molecular weight of the polyethyleneimine. In the case of relatively low molecular weight polyethyleneimine, adding less than 0.1 part by weight to 100 parts by weight of silicon alkoxide will hardly have any effect. On the other hand, in the case of relatively high molecular weight polyethyleneimine, if it is added in excess of 20 parts by weight to 100 parts by weight of the silicon alkoxide condensate, it has a significant gelation promoting effect, making it extremely difficult to obtain a uniform gel. Become. The catalyst to be added together with water is not particularly limited, such as a base or an acid, but a base gives preferable results in terms of gelation time and ease of sintering the resulting dry gel. There are no particular restrictions on the alcohol added with water, but water.
アルコキシドの両者に対する熔解性の点より。From the point of view of solubility for both alkoxides.
メチルアルコール、エチルアルコール、1−プロピルア
ルコール、2−プロピルアルコール等を使用するのが好
ましい。Preferably, methyl alcohol, ethyl alcohol, 1-propyl alcohol, 2-propyl alcohol, etc. are used.
シリカガラスは、上記のようにして調整したシリカゾル
をシャーレ等の容器に移し、室温〜70℃に保って、ゲ
ル化し1次いで室温以上の温度で数週間乾燥して、乾燥
ゲルとし。Silica glass is obtained by transferring the silica sol prepared as described above to a container such as a Petri dish, keeping it at room temperature to 70°C to gel it, and then drying it at a temperature above room temperature for several weeks to form a dry gel.
更に公知の方法9例えば、空気中で1 、000〜1.
400℃に昇温して焼結することにより得られる。Further known methods 9, for example 1,000-1.
It is obtained by raising the temperature to 400°C and sintering it.
(作用)
ポリエチレンイミンの添加効果の原因については、詳細
は不明であるが、ゾル中でのシリカ微粒子の生成の制御
、ゲル中でのこれらのシリカ微粒子間の結合、乾燥過程
でゲル中に発生する応力の緩和等に寄与し、ゲルの大形
化が可能となったものと考えられる。(Effect) Although the details of the cause of the effect of adding polyethyleneimine are unknown, it is due to the control of the formation of silica particles in the sol, the bonding between these silica particles in the gel, and the generation of silica particles in the gel during the drying process. It is thought that this contributed to the relaxation of the stress caused by the gel, making it possible to increase the size of the gel.
実施例 l
水54g、メチルアルコール96g、コリン0.06g
を混合し、これにポリエチレンイミン(平均分子量50
,000〜60,000)を1 、52g添加し、溶解
させた。得られた溶液を152gのシリコメトキシド(
St (OCL) 4)にゆっくりと加え、さらに充分
混合し2 シリカゾルを得た。これを直径1501のテ
フロンでコーティングしたガラス製シャーレに入れ、ア
ルミ箔で密封し、室温でゲル化した。その後、蓋に孔を
開け、50℃の恒温槽中で2週間乾燥し、その後120
℃の恒温槽に移して1日乾燥して、直径約1101の乾
燥ゲルを得た。こうして得られた乾燥ゲルのかさ密度は
約0.7g/−であり、クランクや割れは全くなかった
。Example l Water 54g, methyl alcohol 96g, choline 0.06g
and polyethyleneimine (average molecular weight 50
1,000 to 60,000) was added and dissolved. The resulting solution was mixed with 152 g of silicomethoxide (
It was slowly added to St (OCL) 4) and mixed thoroughly to obtain 2 silica sol. This was placed in a Teflon-coated glass Petri dish with a diameter of 1501 mm, sealed with aluminum foil, and gelatinized at room temperature. After that, a hole was made in the lid, and it was dried for 2 weeks in a constant temperature oven at 50℃, and then heated to 120℃.
The mixture was transferred to a constant temperature bath at 0.degree. C. and dried for one day to obtain a dried gel having a diameter of about 1101 mm. The bulk density of the dry gel thus obtained was about 0.7 g/-, and there were no cracks or cracks.
得られたゲルを空気中1,300’℃まで加熱焼結した
ところ直径約80mm、厚さ5fflII+のクラック
や割れのない透明なシリカガラスが得られた。このシリ
カガラスは分析の結果、そのシリカガラスと一致した。When the obtained gel was heated and sintered in air to 1,300'C, a transparent silica glass having a diameter of about 80 mm and a thickness of 5 fflII+ without any cracks or breaks was obtained. As a result of analysis, this silica glass matched that of the silica glass.
実施例 2
平均分子150.000〜60.000のポリエチレン
イミン7.6gを、54gの水、96gのメチルアルコ
ール、 0.06gのコリンと共に混合、溶解させた。Example 2 7.6 g of polyethyleneimine with an average molecular weight of 150.000 to 60.000 was mixed and dissolved with 54 g of water, 96 g of methyl alcohol, and 0.06 g of choline.
以下実施例1と同様の乾燥を行って乾燥ゲルを得た。得
られた乾燥ゲルにはクラックや割れは全くなかった。Thereafter, drying was carried out in the same manner as in Example 1 to obtain a dried gel. The dried gel obtained had no cracks or breaks.
実施例 3
分子@10,000のポリエチレンイミン7.6gを5
4gの水、96gのメチルアルコール、 0.06gの
コリンと共に混合、溶解させた。以下実施例1と同様の
操作を行って乾燥ゲルを得た。得られた乾燥ゲルには、
クランクや割れは全くなかった。Example 3 7.6 g of polyethyleneimine of 10,000 molecules @ 5
It was mixed and dissolved with 4g of water, 96g of methyl alcohol, and 0.06g of choline. Thereafter, the same operation as in Example 1 was performed to obtain a dry gel. The resulting dry gel contains
There were no cracks or cracks at all.
実施例 4
分子量s、oooのポリエチレンイミン15.2gを5
4gの水、96gのメチルアルコール、 0.06゜の
コリンと共に混合、溶解させた。以下実施例1と同様の
操作を行って乾燥ゲルを得た。Example 4 15.2 g of polyethyleneimine with molecular weight s, ooo was
It was mixed and dissolved with 4g of water, 96g of methyl alcohol, and 0.06° choline. Thereafter, the same operation as in Example 1 was performed to obtain a dry gel.
得られた乾燥ゲルには、クランクや割れは全くなかった
。The dried gel obtained had no cracks or cracks.
実施例 5
分子量2.000のポリエチレンイミン22.8gを、
54gの水、96gのメチルアルコール、 0.06g
のコリンと共に混合、溶解させた。以下。Example 5 22.8 g of polyethyleneimine with a molecular weight of 2.000,
54g water, 96g methyl alcohol, 0.06g
was mixed and dissolved with choline. below.
実施例1と同様の操作を行って乾燥ゲルを得た。得られ
た。乾燥ゲルには、クラックや割れは、全くなかった。A dry gel was obtained by performing the same operation as in Example 1. Obtained. There were no cracks or breaks in the dried gel.
(発明の効果)
本発明によれば、クランクや割れのない大形のシリカガ
ラスをゾルケール法により容易に製造可能となる。その
大きさは基本的には制約がなく、形状も板状、棒状、管
状等のいずれでも製造できる。(Effects of the Invention) According to the present invention, large-sized silica glass without cranks or cracks can be easily produced by the Solcale method. There are basically no restrictions on its size, and it can be manufactured in any shape such as a plate, rod, or tube.
また1本発明によればシリカガラスは従来より安価に製
造できるため、従来から使用されてきたIC製造用フォ
トマスク基材等の分野はもちろん、液晶表示用基材等に
も応用が拡大できる。Furthermore, according to the present invention, silica glass can be manufactured at a lower cost than before, so it can be applied not only to fields such as photomask substrates for IC manufacturing, which have been conventionally used, but also to substrates for liquid crystal displays, etc.
Claims (1)
し、次いで焼結するシリカガラスの製造法に於て、シリ
コンアルキシドを加水分解してシリカゾルとする段階で
、分子量 100〜200,000のポリエチレンイミンを、シリ
コンアルコキシド100重量部に対し0.1〜20重量
添加することを特徴とするシリカガラスの製造法。[Scope of Claims] 1. In a method for producing silica glass in which silicon alkoxide is hydrolyzed to form silica sol, this is gelled, dried to form a dry gel, and then sintered, silicon alkoxide is hydrolyzed. A method for producing silica glass, which comprises adding 0.1 to 20 parts by weight of polyethyleneimine having a molecular weight of 100 to 200,000 to 100 parts by weight of silicon alkoxide in the step of preparing a silica sol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27645887A JPH01119526A (en) | 1987-10-31 | 1987-10-31 | Production of silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27645887A JPH01119526A (en) | 1987-10-31 | 1987-10-31 | Production of silica glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01119526A true JPH01119526A (en) | 1989-05-11 |
Family
ID=17569720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27645887A Pending JPH01119526A (en) | 1987-10-31 | 1987-10-31 | Production of silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01119526A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5009688A (en) * | 1988-09-28 | 1991-04-23 | Asahi Glass Company, Ltd. | Process for producing porous glass |
EP0583943A3 (en) * | 1992-08-14 | 1994-08-17 | At & T Corp | Manufacture of a vitreous silica product by a sol-gel process |
KR100417682B1 (en) * | 1999-12-24 | 2004-02-11 | 재단법인 포항산업과학연구원 | A composition for molding silica sleeve and a method of preparing silica sleeve therefrom |
KR100425241B1 (en) * | 1999-12-24 | 2004-03-30 | 재단법인 포항산업과학연구원 | A composition for molding silica sleeve and a method of preparing silica sleeve therefrom |
-
1987
- 1987-10-31 JP JP27645887A patent/JPH01119526A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5009688A (en) * | 1988-09-28 | 1991-04-23 | Asahi Glass Company, Ltd. | Process for producing porous glass |
EP0583943A3 (en) * | 1992-08-14 | 1994-08-17 | At & T Corp | Manufacture of a vitreous silica product by a sol-gel process |
KR100417682B1 (en) * | 1999-12-24 | 2004-02-11 | 재단법인 포항산업과학연구원 | A composition for molding silica sleeve and a method of preparing silica sleeve therefrom |
KR100425241B1 (en) * | 1999-12-24 | 2004-03-30 | 재단법인 포항산업과학연구원 | A composition for molding silica sleeve and a method of preparing silica sleeve therefrom |
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