JP6991786B2 - Method for producing salt, acid generator, resist composition and resist pattern - Google Patents

Description

The present invention relates to a method for producing a salt, an acid generator, a resist composition and a resist pattern.

Patent Document 1 describes a resist composition containing a salt represented by the following formula as an acid generator.

Patent Document 2 describes a resist composition containing a salt represented by the following formula as an acid generator.

Japanese Unexamined Patent Publication No. 2010-107955 Japanese Unexamined Patent Publication No. 2013-47210

An object of the present invention is to improve the focus margin (DOF) of a resist pattern obtained by using a resist composition.

［式（Ｉ）中、
Ｒ^１及びＲ^２は、それぞれ独立に、置換基を有していてもよい炭素数６～１８の芳香族炭化水素基を表す。
Ｒ^３は、塩基解離性基を表す。
Ｘ^１は、炭素数１～１２の２価の脂肪族飽和炭化水素基を表し、該２価の脂肪族飽和炭化水素基を構成するメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。
Ａ^－は、有機アニオンを表す。］
〔２〕 前記式（Ｉ）のＸ^１は、炭素数１～６のアルカンジイル基又は－Ｘ^１１－Ｏ－Ｘ^１２－＊（Ｘ^１１は、炭素数１～１０の２価の脂肪族炭化水素基を表し、該２価の脂肪族炭化水素基を構成するメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。Ｘ^１２は、炭素数１～１０の２価の脂肪族炭化水素基を表す。ただし、Ｘ^１１及びＸ^１２の合計炭素数は１１以下である。＊はＲ^３との結合手を表す。）で表される基である〔１〕に記載の塩。
〔３〕 前記式（Ｉ）のＲ^１及びＲ^２は、それぞれ独立に、置換基を有していてもよいフェニル基である〔１〕又は〔２〕に記載の塩。
〔４〕 前記式（Ｉ）のＲ^３は、アルカリと接触すると脱離基が脱離して、ヒドロキシ基又はカルボキシ基を形成する基である〔１〕～〔３〕のいずれかに記載の塩。
〔５〕 前記式（Ｉ）のＲ^３は、式（Ｂａ）又は式（Ｂｂ）で表される基である〔１〕～〔４〕のいずれかに記載の塩。

［式（Ｂａ）中、Ｒ²³は、フッ素原子を有する炭素数１～６のアルキル基を表す。
式（Ｂｂ）中、Ｒ²⁴は、フッ素原子を有する炭素数１～６のアルキル基を表す。
Ｒ²⁵及びＲ²⁶は、それぞれ独立に、フッ素原子を有する炭素数１～６のアルキル基、水素原子又はフッ素原子を表す。
＊は、結合手を表す。］
〔６〕 〔１〕～〔５〕のいずれかに記載の塩を含有する酸発生剤。
〔７〕 酸発生剤と酸不安定基を有する構造単位を含む樹脂とを含有し、前記酸発生剤として〔１〕～〔５〕のいずれかに記載の塩を含有するレジスト組成物。
〔８〕さらに、前記酸発生剤から発生する酸よりも酸性度の低い酸を発生する塩を含有する〔７〕に記載のレジスト組成物。
〔９〕（１）〔７〕又は〔８〕に記載のレジスト組成物を基板上に塗布する工程、
（２）塗布後の組成物を乾燥させて組成物層を形成する工程、
（３）組成物層を露光する工程、
（４）露光後の組成物層を加熱する工程、及び
（５）加熱後の組成物層を現像する工程、
を含むレジストパターンの製造方法。 The present invention provides the following inventions.
[1] A salt represented by the formula (I).

[In formula (I),
R ¹ and R ² each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent.
R ³ represents a base dissociative group.
X ¹ represents a divalent aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms, and the methylene group constituting the divalent aliphatic saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. ..
A ^- represents an organic anion. ]
[2] X ¹ of the formula (I) is an alkanediyl group having 1 to 6 carbon atoms or -X ¹¹ -OX ^12- * (X ¹¹ is a divalent aliphatic hydrocarbon having 1 to 10 carbon atoms. The methylene group representing a hydrogen group and constituting the divalent aliphatic hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. X ¹² is a divalent aliphatic hydrocarbon having 1 to 10 carbon atoms. Representing a group. However, the total carbon number of X ¹¹ and X ¹² is 11 or less . * Represents a bond with R ^3. ) The salt according to [1].
[3] The salt according to [1] or [2], wherein R ¹ and R ^{2 of} the formula (I) are phenyl groups which may independently have a substituent.
[4] The salt according to any one of [1] to [3], wherein R ³ of the formula (I) is a group that is desorbed when it comes into contact with an alkali to form a hydroxy group or a carboxy group. ..
[5] The salt according to any one of [1] to [ ⁴ ], wherein R3 of the formula (I) is a group represented by the formula (Ba) or the formula (Bb).

[In the formula (Ba), R ²³ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
In formula (Bb), R ²⁴ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
R ²⁵ and R ²⁶ independently represent an alkyl group having 1 to 6 carbon atoms, a hydrogen atom, or a fluorine atom having a fluorine atom.
* Represents a bond. ]
[6] An acid generator containing the salt according to any one of [1] to [5].
[7] A resist composition containing an acid generator and a resin containing a structural unit having an acid unstable group, and containing the salt according to any one of [1] to [5] as the acid generator.
[8] The resist composition according to [7], which further contains a salt that generates an acid having a lower acidity than the acid generated from the acid generator.
[9] (1) A step of applying the resist composition according to [7] or [8] onto a substrate,
(2) A step of drying the applied composition to form a composition layer,
(3) Step of exposing the composition layer,
(4) A step of heating the composition layer after exposure, and (5) a step of developing the composition layer after heating,
A method for manufacturing a resist pattern including.

By using a resist composition containing the salt of the present invention as an acid generator, a resist pattern can be produced with a good focus margin (DOF).

As used herein, the term "(meth) acrylic monomer" means at least one of the monomers having a structure of "CH ₂ = CH-CO-" or "CH ₂ = C (CH ₃ ) -CO-". do. Similarly, "(meth) acrylate" and "(meth) acrylic acid" mean "at least one of acrylate and methacrylate" and "at least one of acrylic acid and methacrylic acid", respectively.
In the present specification, the "solid content of the resist composition" means the total amount of the components excluding the solvent (E) described later from the total amount of the resist composition.

The resist composition of the present invention contains a resin (A) having an acid unstable group and a salt represented by the formula (I) (hereinafter, in some cases, referred to as "salt (I)"). In the resist composition, the salt (I) is included as an acid generator. The acid generator of the present invention contains a salt (I) and may contain an acid generator (B) other than the salt (I). The resist composition of the present invention comprises an acid generated from a resin (X) other than the resin (A), a solvent (E), a quencher (C), a salt (I) and an acid generator (B), if necessary. It contains a salt that generates an acid having a lower acidity than that of the other component (F). These will be described below.

［式（Ｉ）中、
Ｒ^１及びＲ^２は、それぞれ独立に、置換基を有していてもよい炭素数６～１８の芳香族炭化水素基を表す。
Ｒ^３は、塩基解離性基を表す。
Ｘ^１は、炭素数１～１２の２価の脂肪族飽和炭化水素基を表し、該２価の脂肪族飽和炭化水素基を構成するメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。
Ａ^－は、有機アニオンを表す。］
式（Ｉ）において、脂肪族飽和炭化水素基に含まれる－ＣＨ_２－が－Ｏ－又は－Ｃ（＝Ｏ）－に置き換わっている場合、置き換わる前の炭素数を該脂肪族飽和炭化水素基の炭素数とする。 <Salt represented by formula (I)>
The salt of the present invention is a salt represented by the formula (I) (salt (I)).

[In formula (I),
R ¹ and R ² each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent.
R ³ represents a base dissociative group.
X ¹ represents a divalent aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms, and the methylene group constituting the divalent aliphatic saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. ..
A ^- represents an organic anion. ]
In the formula (I), when -CH _2- contained in the aliphatic saturated hydrocarbon group is replaced with -O- or -C (= O)-, the carbon number before the replacement is the carbon number of the aliphatic saturated hydrocarbon group. The number of carbon atoms in.

これら置換基のうち、ヒドロキシ基、炭素数１～１２のアルキル基又は炭素数１～１２のアルコキシ基であることが好ましく、ヒドロキシ基又は炭素数１～１２のアルキル基であることがより好ましく、炭素数１～１２のアルキル基であることがさらに好ましく、炭素数１～６のアルキル基がさらにより好ましい。
Ｒ^１及びＲ^２で表される、置換基を有していてもよい炭素数６～１８の芳香族炭化水素基は、フェニル基又は置換基を有するフェニル基が好ましく、フェニル基又は炭素数１～６を有するフェニル基がより好ましい。 Examples of the aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R ¹ and R ² include an aryl group such as a phenyl group, a naphthyl group, an anthryl group, a biphenyl group, a phenanthryl group and a fluorenyl group, and a phenyl group. , Naftyl group and anthryl group are preferable, phenyl group and naphthyl group are more preferable, and phenyl group is further preferable.
The substituents that the aromatic hydrocarbon group having 6 to 18 carbon atoms of R ¹ and R ² may have are a hydroxy group, a carboxyl group, an alkyl group having 1 to 12 carbon atoms, and 1 to 12 carbon atoms. Examples thereof include an alkoxy group, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, and a group combining these groups.
Examples of the alkyl group having 1 to 12 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group and a dodecyl group. ..
The alkoxy group having 1 to 12 carbon atoms includes a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, an octyloxy group, a 2-ethylhexyloxy group, a nonyloxy group, a decyloxy group and an undecyloxy group. Groups, dodecyloxy groups and the like can be mentioned.
Examples of the alicyclic hydrocarbon group having 3 to 12 carbon atoms include the groups shown below. * Is a bond with the ring.

Among these substituents, a hydroxy group, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms is preferable, and a hydroxy group or an alkyl group having 1 to 12 carbon atoms is more preferable. It is more preferably an alkyl group having 1 to 12 carbon atoms, and even more preferably an alkyl group having 1 to 6 carbon atoms.
The aromatic hydrocarbon group having 6 to 18 carbon atoms, which may have a substituent and is represented by R ¹ and R ² , is preferably a phenyl group or a phenyl group having a substituent, and is preferably a phenyl group or a phenyl group having 1 carbon atom. A phenyl group having ~ 6 is more preferable.

［式（Ｂａ）中、Ｒ²³は、フッ素原子を有する炭素数１～６のアルキル基を表す。
式（Ｂｂ）中、Ｒ²⁴は、フッ素原子を有する炭素数１～６のアルキル基を表す。
Ｒ²⁵及びＲ²⁶は、それぞれ独立に、フッ素原子を有する炭素数１～６のアルキル基、水素原子又はフッ素原子を表す。
＊は、結合手を表す。］ <Base dissociative group>
R ³ represents a base dissociative group. The "base dissociable group" means a group having a leaving group, which is removed when in contact with an alkali to form a hydrophilic group (for example, a hydroxy group, a carboxy group, or an amino group). .. Examples of the base dissociative group include a group represented by the formula (Ba), a group represented by the formula (Bb), and the like.

[In the formula (Ba), R ²³ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
In formula (Bb), R ²⁴ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
R ²⁵ and R ²⁶ independently represent an alkyl group having 1 to 6 carbon atoms, a hydrogen atom, or a fluorine atom having a fluorine atom.
* Represents a bond. ]

Alkyl groups having a fluorine atom represented by R ²³ , R ²⁴ R ²⁵ and R ²⁶ are, for example, 1,1,1-trifluoroethyl group, perfluoroethyl group, 1,1,1,2,2-penta. Fluoropropyl group, 2-trifluoromethyl-1,1,1-trifluoroethyl group, perfluoropropyl group, 1,1,1,2,2,3,3-heptafluorobutyl group, perfluorobutyl group, 1,1 , 1,2,2,3,3,4,4-nonafluoropentyl group, perfluoropentyl group, perfluorohexyl group and the like, and a perfluoroalkyl group having 1 to 6 carbon atoms is preferable.
It is preferable that R ²⁵ and R ²⁶ are independently hydrogen atoms or fluorine atoms, respectively.

For example, the group represented by the formula (Ba) is decomposed by the action of an alkali to generate a hydroxy group. Further, the group represented by the formula (Bb) is decomposed by the action of an alkali to generate a carboxy group. As the alkali, tetramethylammonium hydroxide is preferable.
The cleavage of the base dissociative group in the salt (I) can be confirmed according to the method described in JP2013-041269. Note that cleavage means that the bond is cleaved and separated into a plurality of molecules, and does not include a ring-opening reaction.

Ｒ^３が式（Ｂｂ）で表される基の具体例としては、以下の基が挙げられる。

Specific examples of the group in which R ³ is represented by the formula (Ba) include the following groups.

Specific examples of the group in which R ³ is represented by the formula (Bb) include the following groups.

The base dissociative group represented by R ³ is preferably the formula ⁽ IR 3-2-2) or the formula ⁽ IR 3-1-5).

Examples of the divalent aliphatic saturated hydrocarbon group represented by X ¹ include an alkanediyl group, a monocyclic or polycyclic divalent alicyclic saturated hydrocarbon group, and 2 of these groups. It may be a combination of seeds or more.
Specifically, methylene group, ethylene group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1 , 7-Diyl group, Octane-1,8-Diyl group, Nonan-1,9-Diyl group, Decan-1,10-Diyl group, Undecan-1,11-Diyl group, Dodecan-1,12-Diyl group Linear alkanediyl groups such as;
Etan-1,1-diyl group, propane-1,1-diyl group, propane-1,2-diyl group, propane-2,2-diyl group, pentane-2,4-diyl group, 2-methylpropane- Branched alkanediyl groups such as 1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1,4-diyl group, 2-methylbutane-1,4-diyl group;
Monocyclic 2 which is a cycloalkanediyl group such as cyclobutane-1,3-diyl group, cyclopentane-1,3-diyl group, cyclohexane-1,4-diyl group, cyclooctane-1,5-diyl group, etc. Valuable alicyclic saturated hydrocarbon group;
Polycyclic divalent alicyclic saturated hydrocarbons such as norbornane-1,4-diyl group, norbornane-2,5-diyl group, adamantane-1,5-diyl group, and adamantane-2,6-diyl group. The group etc. can be mentioned.

The methylene group constituting the aliphatic saturated hydrocarbon group of X ¹ may be replaced with an oxygen atom or a carbonyl group, for example, an ether bond, an ester bond (-O-CO-, -CO-O-) and-. It may be an aliphatic saturated hydrocarbon group replaced by O—CO—O— or the like.
Specifically, X ¹ represents an alkanediyl group having 1 to 6 carbon atoms or -X ¹¹ -OX ^12- * (X ¹¹ represents a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms. The methylene group constituting the divalent aliphatic hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. X ¹² represents a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms. However, the total number of carbon atoms of X ¹¹ and X ¹² is 11 or less . * Is preferably a group represented by a bond with R ³ ).
The divalent aliphatic hydrocarbon group represented by X ¹¹ is preferably an alkanediyl group (however, the methylene group constituting the alkanediyl group may be replaced with an oxygen atom or a carbonyl group), and carbon is preferable. Alkanediyl group of number 1 to 6 or -X ²² -O-CO- * (X ²² represents a divalent aliphatic hydrocarbon group having 1 to 8 carbon atoms. * Represents a bond with an oxygen atom. .) Is more preferable.
X ¹² is preferably an alkanediyl group having 1 to 6 carbon atoms, and more preferably a methylene group.

Specific examples of the organic cations constituting the salt (I) include organic cations represented by the following formulas (I-c-1) to (I-c-24).

The cation (I) is preferably a cation represented by the formulas (I-c-1) to (I-c-19), and the formula (I-c-1), the formula (I-c-2), and the formula. (I-c-7), cations represented by the formulas (I-c-13) to (I-c-19) are more preferable, and the formula (I-c-1) and the formula (I-c-2) are more preferable. ), The formula (I-c-7), the formula (I-c-16), the formula (I-c-17), and the cation represented by the formula (I-c-18) are more preferable.

［式（Ｉ－Ａ）中、
Ｑ¹及びＱ²は、それぞれ独立に、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。
Ｌ^ｂ１は、炭素数１～２４の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該飽和炭化水素基に含まれる水素原子はフッ素原子又はヒドロキシ基で置換されていてもよい。
Ｙは、置換基を有していてもよいメチル基又は置換基を有していてもよい炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ_２－又は－ＣＯ－に置き換わっていてもよい。］
式（Ｉ－Ａ）において、飽和炭化水素基、脂環式炭化水素基に含まれる－ＣＨ_２－が－Ｏ－、－Ｃ（＝Ｏ）－又は－ＳＯ_２－に置き換わっている場合、置き換わる前の炭素数をそれぞれ該飽和炭化水素基、該脂環式炭化水素基の炭素数とする。 <Organic anions constituting salt (I)>
Examples of the organic anion (A ⁻ ) constituting the salt (I) include a sulfonic acid anion, a sulfonylimide anion, a sulfonylmethide anion and a carboxylic acid anion. Among these, the sulfonic acid anion is preferable, and the sulfonic acid anion represented by the formula (IA) is more preferable.

[In formula (IA),
Q ¹ and Q ² independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and -CH _2- contained in the saturated hydrocarbon group may be replaced with -O- or -CO-, and the saturated hydrocarbon may be replaced. The hydrogen atom contained in the hydrogen group may be substituted with a fluorine atom or a hydroxy group.
Y represents a methyl group which may have a substituent or an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and is contained in the alicyclic hydrocarbon group. CH _2- may be replaced with -O-, -SO _2- or -CO-. ]
In the formula (IA), when -CH _2- contained in the saturated hydrocarbon group or the alicyclic hydrocarbon group is replaced with -O-, -C (= O)-or -SO _2- , it is replaced. The previous carbon number is taken as the carbon number of the saturated hydrocarbon group and the alicyclic hydrocarbon group, respectively.

The perfluoroalkyl groups of ^Q1 and ^Q2 include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group and perfluoro. A hexyl group and the like can be mentioned.
^Q1 and ^Q2 are preferably fluorine atoms or trifluoromethyl groups independently of each other, and more preferably both are fluorine atoms.

Examples of the divalent saturated hydrocarbon group of L ^b1 include a linear or branched alkanediyl group, a monocyclic or polycyclic divalent alicyclic saturated hydrocarbon group, and among these groups. It may be a group formed by combining two or more kinds.
Specifically, methylene group, ethylene group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1 , 7-Diyl group, Octane-1,8-Diyl group, Nonan-1,9-Diyl group, Decan-1,10-Diyl group, Undecan-1,11-Diyl group, Dodecan-1,12-Diyl group , Tridecane-1,13-diyl group, tetradecane-1,14-diyl group, pentadecane-1,15-diyl group, hexadecane-1,16-diyl group and heptadecane-1,17-diyl group. Alcandiyl group;
Etan-1,1-diyl group, propane-1,1-diyl group, propane-1,2-diyl group, propane-2,2-diyl group, pentane-2,4-diyl group, 2-methylpropane- Branched alkanediyl groups such as 1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1,4-diyl group, 2-methylbutane-1,4-diyl group;
Monocyclic 2 which is a cycloalkanediyl group such as cyclobutane-1,3-diyl group, cyclopentane-1,3-diyl group, cyclohexane-1,4-diyl group, cyclooctane-1,5-diyl group, etc. Valuable alicyclic saturated hydrocarbon group;
Polycyclic divalent alicyclic saturated hydrocarbons such as norbornane-1,4-diyl group, norbornane-2,5-diyl group, adamantane-1,5-diyl group, and adamantane-2,6-diyl group. The group etc. can be mentioned.

［式（ｂ１－１）中、
Ｌ^ｂ２は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^ｂ３は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^ｂ２とＬ^ｂ３との合計炭素数は、２２以下である。
式（ｂ１－２）中、
Ｌ^ｂ４は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^ｂ５は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^ｂ４とＬ^ｂ５との合計炭素数は、２２以下である。
式（ｂ１－３）中、
Ｌ^ｂ６は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
Ｌ^ｂ７は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^ｂ６とＬ^ｂ７との合計炭素数は、２３以下である。］ Examples of the group in which -CH _2- in the divalent saturated hydrocarbon group of L ^b1 is replaced with -O- or -CO- are any of the formulas (b1-1) to (b1-3). The group represented by is mentioned. In the formulas (b1-1) to (b1-3) and the following specific examples, * represents a bond with −Y.

[In equation (b1-1),
L ^b2 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b3 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated hydrocarbon group may be substituted. -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total number of carbon atoms of L ^b2 and L ^b3 is 22 or less.
In equation (b1-2),
L ^b4 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated hydrocarbon group may be substituted. -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total carbon number of L ^b4 and L ^b5 is 22 or less.
In equation (b1-3),
L ^b6 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
L ^b7 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated hydrocarbon group may be substituted. -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total number of carbon atoms of L ^b6 and L ^b7 is 23 or less. ]

In the formulas (b1-1) to (b1-3), when _-CH2- contained in the saturated hydrocarbon group is replaced with -O- or -CO-, the number of carbon atoms before the replacement is the saturated hydrocarbon. The carbon number of the group.
As a divalent saturated hydrocarbon group and a group in which -CH _2- or a hydrogen atom contained in the saturated hydrocarbon group may be substituted as described above, a divalent saturated hydrocarbon group of L ^b1 is used. The same can be mentioned.

L ^b2 is preferably a single bond.
L ^b3 is preferably a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.
L ^b4 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b6 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 4 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b7 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. -CH _2- contained in the divalent saturated hydrocarbon group may be replaced with -O- or -CO-.
The group in which _-CH2- in the divalent saturated hydrocarbon group of L ^b1 is replaced with -O- or -CO- is a group represented by the formula (b1-1) or the formula (b1-3). Is preferable.

［式（ｂ１－４）中、
Ｌ^ｂ８は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
式（ｂ１－５）中、
Ｌ^ｂ９は、炭素数１～２０の２価の飽和炭化水素基を表す。
Ｌ^ｂ１０は、単結合又は炭素数１～１９の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ９及びＬ^ｂ１０の合計炭素数は２０以下である。
式（ｂ１－６）中、
Ｌ^ｂ１１は、炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^ｂ１２は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ１１及びＬ^ｂ１２の合計炭素数は２１以下である。
式（ｂ１－７）中、
Ｌ^ｂ１３は、炭素数１～１９の２価の飽和炭化水素基を表す。
Ｌ^ｂ１４は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^ｂ１５は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ１３～Ｌ^ｂ１５の合計炭素数は１９以下である。
式（ｂ１－８）中、
Ｌ^ｂ１６は、炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^ｂ１７は、炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^ｂ１８は、単結合又は炭素数１～１７の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ１６～Ｌ^ｂ１８の合計炭素数は１９以下である。］ Examples of the formula (b1-1) include groups represented by any of the formulas (b1-4) to (b1-8).

[In equation (b1-4),
L ^b8 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
In equation (b1-5),
L ^b9 represents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms.
L ^b10 represents a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. ..
However, the total carbon number of L ^b9 and L ^b10 is 20 or less.
In equation (b1-6),
L ^b11 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b12 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. ..
However, the total carbon number of L ^b11 and L ^b12 is 21 or less.
In equation (b1-7),
L ^b13 represents a divalent saturated hydrocarbon group having 1 to 19 carbon atoms.
L ^b14 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b15 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. ..
However, the total number of carbon atoms of L ^b13 to L ^b15 is 19 or less.
In equation (b1-8),
L ^b16 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b17 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b18 represents a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. ..
However, the total number of carbon atoms of L ^b16 to L ^b18 is 19 or less. ]

L ^b8 is preferably a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.
L ^b9 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b10 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b11 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b12 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b13 is preferably a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b14 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 6 carbon atoms.
L ^b15 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b16 is preferably a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b17 is preferably a divalent saturated hydrocarbon group having 1 to 6 carbon atoms.
L ^b18 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.

［式（ｂ１－９）中、
Ｌ^ｂ１９は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^ｂ２０は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子はフッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ１９及びＬ^ｂ２０の合計炭素数は２３以下である。
式（ｂ１－１０）中、
Ｌ^ｂ２１は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^ｂ２２は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子はフッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
Ｌ^ｂ２３は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ２１～Ｌ^ｂ２３の合計炭素数は２１以下である。
式（ｂ１－１１）中、
Ｌ^ｂ２４は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^ｂ２５は、炭素数１～２１の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子はフッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
Ｌ^ｂ２６は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^ｂ２４～Ｌ^ｂ２６の合計炭素数は２１以下である。］ Examples of the formula (b1-3) include groups represented by any of the formulas (b1-9) to (b1-11).

[In equation (b1-9),
L ^b19 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b20 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group is replaced with a fluorine atom, a hydroxy group or an alkylcarbonyloxy group. May be. -CH _2- contained in the alkylcarbonyloxy group may be replaced with -O- or -CO-, and the hydrogen atom contained in the alkylcarbonyloxy group may be replaced with a hydroxy group.
However, the total carbon number of L ^b19 and L ^b20 is 23 or less.
In equation (b1-10),
L ^b21 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b22 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group is replaced with a fluorine atom, a hydroxy group or an alkylcarbonyloxy group. May be. -CH _2- contained in the alkylcarbonyloxy group may be replaced with -O- or -CO-, and the hydrogen atom contained in the alkylcarbonyloxy group may be replaced with a hydroxy group.
L ^b23 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group is replaced with a fluorine atom, a hydroxy group or an alkylcarbonyloxy group. It may have been. -CH _2- contained in the alkylcarbonyloxy group may be replaced with -O- or -CO-, and the hydrogen atom contained in the alkylcarbonyloxy group may be replaced with a hydroxy group.
However, the total carbon number of L ^b21 to L ^b23 is 21 or less.
In equation (b1-11),
L ^b24 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b25 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and even if the hydrogen atom contained in the divalent saturated hydrocarbon group is substituted with a fluorine atom, a hydroxy group or an alkylcarbonyloxy group. good. -CH _2- contained in the alkylcarbonyloxy group may be replaced with -O- or -CO-, and the hydrogen atom contained in the alkylcarbonyloxy group may be replaced with a hydroxy group.
L ^b26 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and the hydrogen atom contained in the divalent saturated hydrocarbon group is replaced with a fluorine atom, a hydroxy group or an alkylcarbonyloxy group. It may have been. -CH _2- contained in the alkylcarbonyloxy group may be replaced with -O- or -CO-, and the hydrogen atom contained in the alkylcarbonyloxy group may be replaced with a hydroxy group.
However, the total carbon number of L ^b24 to L ^b26 is 21 or less. ]

In formulas (b1-9) to (b1-11), when the hydrogen atom contained in the divalent saturated hydrocarbon group is substituted with an acyloxy group, the number of carbon atoms of the alkylcarbonyloxy group and the CO in the ester bond And the number of O are also included in the number of carbon atoms of the divalent saturated hydrocarbon group.

Examples of the alkylcarbonyloxy group include an acetyloxy group, a propionyloxy group, a butyryloxy group, a cyclohexylcarbonyloxy group, an adamantylcarbonyloxy group and the like.

Examples of the group represented by the formula (b1-4) include the following.

Examples of the group represented by the formula (b1-5) include the following.

Examples of the group represented by the formula (b1-6) include the following.

Examples of the group represented by the formula (b1-7) include the following.

Examples of the group represented by the formula (b1-8) include the following.

Examples of the group represented by the formula (b1-2) include the following.

Examples of the group represented by the formula (b1-9) include the following.

Examples of the group represented by the formula (b1-10) include the following.

Examples of the group represented by the formula (b1-11) include the following.

As the monovalent alicyclic hydrocarbon group represented by Y in the formula (IA), the groups represented by the formulas (Y1) to (Y11) and the formulas (Y36) to (Y38) are used. Can be mentioned.
When -CH _2- contained in the monovalent alicyclic hydrocarbon group represented by Y is replaced by -O-, -SO _2- or -CO-, the number may be one or two or more. There may be more than one. Examples of such a group include groups represented by the formulas (Y12) to (Y35).

Among them, it is preferably a group represented by any one of the formula (Y1) to the formula (Y20), the formula (Y30), and the formula (Y31), and more preferably the formula (Y11), the formula (Y15), and the formula (Y11). Y16), a group represented by the formula (Y20), the formula (Y30) or the formula (Y31), and more preferably a group represented by the formula (Y11), the formula (Y15) or the formula (Y30).
When Y constitutes a spiro ring of the formulas (Y28) to (Y33) and the like, the alkanediyl group between the two oxygens preferably has one or more fluorine atoms. Further, among the alkanediyl groups contained in the ketal structure, those in which the fluorine atom is not substituted in the methylene group adjacent to the oxygen atom are preferable.

The substituent of the methyl group represented by Y in the formula (IA) includes a halogen atom, a hydroxy group, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, and an aromatic hydrocarbon having 6 to 18 carbon atoms. Group, glycidyloxy group or-(CH ₂ ) _ja -O-CO-R ^b1 group (in the formula, R ^b1 is an alkyl group having 1 to 16 carbon atoms and a monovalent alicyclic hydrocarbon having 3 to 16 carbon atoms. It represents a hydrogen group or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms. Ja represents an integer of 0 to 4) and the like.
As the substituent of the monovalent alicyclic hydrocarbon group represented by Y in the formula (IA), an alkyl having 1 to 12 carbon atoms which may be substituted with a halogen atom, a hydroxy group or a hydroxy group may be used. Group, alicyclic hydrocarbon group with 3 to 16 carbon atoms, alkoxy group with 1 to 12 carbon atoms, aromatic hydrocarbon group with 6 to 18 carbon atoms, aralkyl group with 7 to 21 carbon atoms, 2 to 4 carbon atoms Acyl group, glycidyloxy group or-(CH ₂ ) _ja -O-CO-R ^b1 group (in the formula, R ^b1 is an alkyl group having 1 to 16 carbon atoms and a monovalent alicyclic having 3 to 16 carbon atoms. The formula hydrocarbon group or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms is represented. Ja represents an integer of 0 to 4) and the like.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alicyclic hydrocarbon group include a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, a dimethylcyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, an adamantyl group and the like.
Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a p-methylphenyl group, a p-tert-butylphenyl group and a p-adamantylphenyl group; a trill group, a xylyl group, a cumenyl group and a mesityl group. , Biphenyl group, phenanthryl group, 2,6-diethylphenyl group, aryl group such as 2-methyl-6-ethylphenyl and the like.
Examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group and a heptyl group, 2 -An ethylhexyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group and the like can be mentioned.
Examples of the alkyl group that may be substituted with the hydroxy group include hydroxyalkyl groups such as a hydroxymethyl group and a hydroxyethyl group.
Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a decyloxy group and a dodecyloxy group.
Examples of the aralkyl group include a benzyl group, a phenethyl group, a phenylpropyl group, a naphthylmethyl group and a naphthylethyl group.
Examples of the acyl group include an acetyl group, a propionyl group and a butyryl group.

Examples of the alicyclic hydrocarbon group having 1 to 18 carbon atoms which may have a substituent represented by Y in the formula (IA) include the following groups.

In formula (IA), when Y is a methyl group and L ^b1 is a divalent linear or branched saturated hydrocarbon group having 1 to 24 carbon atoms, the group is at the bonding position with Y. It is preferable that -CH _2- of the divalent saturated hydrocarbon group is replaced with -O- or -CO-.

Y is preferably an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and more preferably an adamantyl group which may have a substituent, and is said to be an alicyclic hydrocarbon. -CH _2- , which constitutes a hydrogen group or an adamantyl group, may be replaced with -O-, -SO _2- or -CO-. Y is more preferably an adamantyl group, a hydroxyadamantyl group, an oxoadamantyl group or a group represented by the following.

Examples of the sulfonic acid anion represented by the formula (IA) include anions represented by the formulas (B1-A-1) to (B1-A-54) (hereinafter, "anion (B1)" according to the formula number. -A-1) ", etc.) is preferable, and the formulas (B1-A-1) to (B1-A-4), formulas (B1-A-9), and formulas (B1-A-10) are preferable. ), Formula (B1-A-24) to formula (B1-A-33), formula (B1-A-36) to formula (IA-40), formula (B1-A-47) to formula (B1). An anion represented by any of the anions represented by —A-54) is more preferred.

［式（Ｂ１－Ａ－１）～式（Ｂ１－Ａ－５４）中、
Ｒ^ｉ２～Ｒ^ｉ７は、炭素数１～４のアルキル基を表し、好ましくはメチル基又はエチル基である。
Ｒ^ｉ８は、炭素数１～１２の脂肪族炭化水素基を表し、好ましくは炭素数１～４のアルキル基、炭素数５～１２の１価の脂環式炭化水素基又はこれらを組合せることにより形成される基であり、より好ましくはメチル基、エチル基、シクロヘキシル基又はアダマンチル基である。
Ｌ^Ａ４１は、単結合又は炭素数１～４のアルカンジイル基である。
Ｑ^１及びＱ^２は、上記と同じ意味を表す。］

[In the formula (B1-A-1) to the formula (B1-A-54),
R ⁱ² to R ⁱ⁷ represent an alkyl group having 1 to 4 carbon atoms, and are preferably a methyl group or an ethyl group.
R ⁱ⁸ represents an aliphatic hydrocarbon group having 1 to 12 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 5 to 12 carbon atoms, or a combination thereof. A group formed by, more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.
^LA41 is a single bond or an alkanediyl group having 1 to 4 carbon atoms.
^Q1 and ^Q2 have the same meanings as above. ]

Examples of the sulfonic acid anion represented by the formula (IA) include anions represented by the formulas (B1a-1) to (B1a-30).

Among them, the sulfonic acid anion is an anion represented by any of the formulas (B1a-1) to (B1a-3), the formulas (B1a-7) to (B1a-19), and the formula (B1a-22). Is preferable.

Specific examples of the salt represented by the formula (I) include a salt in which the above-mentioned cation and anion are arbitrarily combined. Specific examples of the salt represented by the formula (I) are shown in Tables 1 to 14.

In each table, each reference numeral represents a reference numeral assigned to the above-mentioned structure representing an anion or cation. For example, the salt (I-1) is a salt composed of an anion represented by the formula (BIa-1) and a cation represented by the formula (I-c-1), and is a salt shown below.

Examples of the acid generator (I) include salt (I-1), salt (I-2), salt (I-3), salt (I-16), salt (I-17), and salt (I-18). , Salt (I-19), Salt (I-22), Salt (I-23), Salt (I-24), Salt (I-25), Salt (I-38), Salt (I-39), Salt (I-40), salt (I-41), salt (I-44), salt (I-45), salt (I-46), salt (I-47), salt (I-60), salt (I-61), salt (I-62), salt (I-63), salt (I-66), salt (I-133), salt (I-134), salt (I-135), salt ( I-148), salt (I-149), salt (I-150), salt (I-151) and salt (I-154), salt (I-331), salt (I-332), salt (I) -333), salt (I-346), salt (I-347), salt (I-348), salt (I-349), salt (I-352), salt (I-353), salt (I-) 354), salt (I-355), salt (I-368), salt (I-369), salt (I-370), salt (I-371), salt (I-374), salt (I-375) ), Salt (I-376), Salt (I-377), Salt (I-390), Salt (I-391), Salt (I-392), Salt (I-393), Salt (I-396) Is preferable.

［式中、全ての符号は、それぞれ上記と同じ意味を表す。］
溶剤としては、アセトニトリルなどが挙げられる。
塩基触媒としては、ピリジンなどが挙げられる。
反応は通常、温度１５～９０℃の範囲で、０．５～２４時間行われる。
式（Ｉ２－ｂ）で表される化合物は、以下で表される化合物等が挙げられる。

<Method for producing salt represented by formula (I)>
In formula (I), the salt (I) [formula (I2)) when R ³ is a group represented by formula (Ba) (* -O-CO-R ²³ (* represents a bond)). The salt (I) represented by (salt (I2))] is a salt represented by the salt (I1-a) and a compound represented by the formula (I2-b) in the presence of a base catalyst. It can be produced by reacting in a solvent.

[In the formula, all the symbols have the same meanings as above. ]
Examples of the solvent include acetonitrile and the like.
Examples of the base catalyst include pyridine and the like.
The reaction is usually carried out in the temperature range of 15 to 90 ° C. for 0.5 to 24 hours.
Examples of the compound represented by the formula (I2-b) include compounds represented by the following.

［式中、全ての符号は、それぞれ上記と同じ意味を表す。］
溶剤としては、アセトニトリルなどが挙げられる。
塩基触媒としては、トリエチルアミンなどが挙げられる。
反応は通常、温度１５～９０℃の範囲で、０．５～２４時間行われる。 In formula (I), X ¹ is -X ¹¹ -OX ^12- *, R ³ is a group represented by formula (Bb) (* -CO-O-CR ²⁴ R ²⁵ R ²⁶ (* is a bond). The salt (I) [salt (I) represented by the following formula (I1) (salt (I1))] is the salt represented by the formula (I1-a'). It can be produced by reacting the compound represented by the formula (I1-b) in a solvent in the presence of a base catalyst.

[In the formula, all the symbols have the same meanings as above. ]
Examples of the solvent include acetonitrile and the like.
Examples of the base catalyst include triethylamine and the like.
The reaction is usually carried out in the temperature range of 15 to 90 ° C. for 0.5 to 24 hours.

Examples of the compound represented by the formula (I1-b) include compounds represented by the following.

［式中、全ての符号は、それぞれ上記と同じ意味を表す。］
触媒としては、安息香酸銅（ＩＩ）などが挙げられ、溶剤としては、モノクロロベンゼンなどが挙げられる。
反応は通常、温度２０～１２０℃の範囲で、０．５～２４時間行われる。 In the salt represented by the formula (I1-a), the salt represented by the formula (I1-c) and the compound represented by the formula (I1-d) are reacted in a solvent in the presence of a catalyst. It can be manufactured by. Further, the salt represented by the formula (I1-a') is a solvent obtained by combining a salt represented by the formula (I1-c) and a compound represented by the formula (I1-d') in the presence of a catalyst. It can be produced by reacting in.

[In the formula, all the symbols have the same meanings as above. ]
Examples of the catalyst include copper (II) benzoate, and examples of the solvent include monochlorobenzene and the like.
The reaction is usually carried out in the temperature range of 20 to 120 ° C. for 0.5 to 24 hours.

Examples of the salt represented by the formula (I1-c) include salts represented by the following.

Examples of the compound represented by the formula (I1-d) include compounds represented by the following.

［式中、全ての符号は、それぞれ上記と同じ意味を表す。］
溶剤としては、アセトニトリル、クロロホルムなどが挙げられる。
反応は通常、温度１５～８０℃の範囲で、０．５～２４時間行われる。 ^{In formula (} I), the ^salt (I) [ The salt (I) (salt (I2))] represented by the formula (I3) is obtained by reacting the salt represented by (I3-a) with carbonyldiimidazole in a solvent, and then further formulating (I3). It can be produced by reacting with the compound represented by −b).

[In the formula, all the symbols have the same meanings as above. ]
Examples of the solvent include acetonitrile, chloroform and the like.
The reaction is usually carried out at a temperature in the range of 15 to 80 ° C. for 0.5 to 24 hours.

式（Ｉ３－ｂ）で表される化合物は、以下で表される化合物等が挙げられ、市場より容易に入手できる。

Examples of the salt represented by the formula (I3-a) include compounds represented by the following, which are easily available on the market.

Examples of the compound represented by the formula (I3-b) include compounds represented by the following, which are easily available on the market.

<Resist composition>
The resist composition of the present invention contains an acid generator and a resin having an acid unstable group (hereinafter, may be referred to as "resin (A)"). The resist composition contains a salt (I) as an acid generator. Here, the "acid-unstable group" has a leaving group, and the leaving group is removed by contact with an acid, and the constituent unit has a hydrophilic group (for example, a hydroxy group or a carboxy group). It means a group to be converted into a unit.
The resist composition of the present invention preferably contains a quencher (hereinafter, may be referred to as "citrate (C)") such as a salt that generates an acid having a weaker acidity than the acid generated from the acid generator. , A solvent (hereinafter, may be referred to as "solvent (E)") is preferably contained.

<Acid generator>
The acid generator of the present invention contains a salt (I). The acid generator of the present invention contains one or more of the salt (I), and preferably contains two or more. Hereinafter, the salt (I) as an acid generator may be particularly referred to as “acid generator (I0)”.
The acid generator of the present invention may contain other acid generators known in the resist field other than the acid generator (I0) (hereinafter, may be referred to as "acid generator (B)"). ..
When the acid generator (I0) and the acid generator (B) are contained as the acid generator, the contents of the acid generator (I0) and the acid generator (B) are the acid generator (I0) in terms of mass ratio. ): The acid generator (B) is usually 1:99 to 99: 1, preferably 2:98 to 98: 2, more preferably 5:95 to 95: 5, and even more preferably 25. : 75 to 75:25.
In the resist composition, the content of the acid generator (I0) is preferably 1.5 to 40 parts by weight, more preferably 3 to 35 parts by weight, based on 100 parts by weight of the resin (A).

<Acid generator (B)>
As the acid generator (B), a known acid generator can be used, and either an ionic acid generator or a nonionic acid generator may be used. Nonionic acid generators include organic halides, sulfonate esters (eg 2-nitrobenzyl ester, aromatic sulfonate, oxime sulfonate, N-sulfonyloxyimide, sulfonyloxyketone, diazonaphthoquinone 4-sulfonate), sulfones. (For example, disulfone, ketosulfone, sulfonyldiazomethane) and the like are included. Examples of the ionic acid generator include an ionic acid generator composed of a combination of a known cation and a known anion, and an onium salt containing an onium cation (for example, a diazonium salt, a phosphonium salt, a sulfonium salt, an iodonium salt) is represented. It is a target. Examples of the onium salt anion include a sulfonic acid anion, a sulfonylimide anion, and a sulfonylmethide anion.

Examples of the acid generator (B) include JP-A-63-26653, JP-A-55-164824, JP-A-62-69263, JP-A-63-146038, JP-A-63-163452, and Japanese Patent Publication No. 63-163452. Kaisho 62-153853, JP-A-63-146029, US Patent No. 3,779,778, US Patent No. 3,849,137, German Patent No. 3914407, European Patent No. 126,712, etc. The compound that generates an acid by radiation, the acid generator described in JP2013-68914A, JP2013-3155A, JP2013-11905, and the like can be used. Further, a compound produced by a known method may be used.

Examples of the acid generator (B) include organic sulfonates and the like, preferably a fluorine-containing acid generator, and more preferably an acid generator represented by the formula (B1) (hereinafter, "acid generator (hereinafter" acid generator (B)). B1) "may be mentioned).

［式（Ｂ１）中、
Ｑ^１１及びＱ^１２は、それぞれ独立に、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。
Ｌ^Ｂ１は、炭素数１～２４の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該２価の飽和炭化水素基に含まれる水素原子はフッ素原子又はヒドロキシ基で置換されていてもよい。
Ｙ^Ｂ１は、置換基を有していてもよいメチル基又は置換基を有していてもよい炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ_２－又は－ＣＯ－に置き換わっていてもよい。
Ｚ^＋は、有機カチオンを表す。］

[In formula (B1),
^Q11 and ^Q12 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
^LB1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and -CH _2- contained in the divalent saturated hydrocarbon group may be replaced with -O- or -CO-. The hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
Y ^B1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and is contained in the alicyclic hydrocarbon group. -CH _2- may be replaced with -O-, -SO _2- or -CO-.
Z ⁺ represents an organic cation. ]

^Examples of the perfluoroalkyl groups of ^Q11 and Q12 include groups similar to those mentioned for the perfluoroalkyl groups represented by ^Q1 and ^Q2 .
Independently, Q ¹¹ and Q ¹² are preferably a fluorine atom or a trifluoromethyl group, and more preferably a fluorine atom. It is more preferable that both Q ¹¹ and Q ¹² are fluorine atoms.

Examples of the divalent saturated hydrocarbon group represented by ^LB1 include the same divalent saturated hydrocarbon groups represented by ^Lb1 .
The group in which -CH _2- replaced by -O- or -CO- contained in the divalent saturated hydrocarbon group represented by L ^B1 is contained in the divalent saturated hydrocarbon group represented by L ^b1 . The same group in which -CH _2- is replaced with -O- or -CO- can be mentioned. Specific examples thereof include groups represented by the above-mentioned formulas (b1-1) to (b1-3). When LB1 is a group represented by the formulas (b1-1) to (b1-3), * in the groups represented by the formulas (b1-1) to ( ^{b1-3) is Y B1 .} Represents a bond with.
L ^B1 is preferably any of the groups represented by the formulas (b1-1) to (b1-3), and * 2-CO-O- (CH ₂ ) _t1- , * 2- (CH). ₂ ) _t2 -O-CO- (t1 represents any integer from 0 to 6. t2 represents any integer from 1 to 6. * 2 represents -C (Q ¹¹ ) (Q ¹² )-. It is more preferable that it represents a bond with.).

The monovalent alicyclic hydrocarbon group represented by Y ^B1 may be a monocyclic ring, a polycyclic ring, or a spiro ring. Specific examples thereof include monovalent alicyclic hydrocarbon groups represented by Y ^B1 (groups represented by the above formulas (Y1) to (Y38), etc.). Of the groups represented by Y ^B1 , the preferred group is the same as the preferred range of the group represented by Y.

Examples of the anion represented by the formula (B1) include formulas (B1-A-1) to (B1-A-55). Anions represented by the formulas (B1-A-1) to (B1-A-55) [hereinafter, may be referred to as "anions (B1-A-1)" depending on the formula number. ] Are preferable, and the formulas (B1-A-1) to (B1-A-4), formulas (B1-A-9), formulas (B1-A-10), and formulas (B1-A-24) to formulas (B1-A-24) to formulas are preferable. (B1-A-33), formula (B1-A-36) to formula (B1-A-40), formula (B1-A-47) to formula (B1-A-55). Anions are more preferred.

Here, R ⁱ² to R ⁱ⁷ are, for example, an alkyl group having 1 to 4 carbon atoms, preferably a methyl group or an ethyl group.
R ⁱ⁸ is, for example, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 5 to 12 carbon atoms, or a combination thereof. It is a group formed, more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.
L ⁴⁴ is a single bond or an alkanediyl group having 1 to 4 carbon atoms.
^Q11 and ^Q12 are the same as above.

Examples of the anion in the salt represented by the formula (B1) include anions represented by the formulas (Ia-1) to (Ia-34).

Among them, the formulas (B1a-1) to (B1a-3) and the formulas (B1a-7) to (B1a-16), the formulas (B1a-18), the formulas (B1a-19), and the formulas (B1a-22). )-Anion represented by any of the formulas (B1a-34) is preferable.

The cation Z ⁺ in the acid generator (B1) is preferably an organic onium cation. Examples of the organic onium cation include an organic sulfonium cation, an organic iodine cation, an organic ammonium cation, a benzothiazolium cation, an organic phosphonium cation and the like. Among these, organic sulfonium cations and organic iodonium cations are preferable, and aryl sulfonium cations are more preferable. Specifically, the cation represented by any of the formulas (b2-1) to (b2-4) (hereinafter, may be referred to as "cation (b2-1)" or the like depending on the formula number). Can be mentioned.

[In equations (b2-1) to (b2-4),
R ^b4 to R ^b6 independently represent a chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms, or an aromatic hydrocarbon group having 6 to 36 carbon atoms. The hydrogen atom contained in the chain hydrocarbon group is a hydroxy group, an alkoxy group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms. It may be substituted, and the hydrogen atom contained in the alicyclic hydrocarbon group is a halogen atom, an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms or a glycidyloxy group. It may be substituted, and the hydrogen atom contained in the aromatic hydrocarbon group may be substituted with a halogen atom, a hydroxy group or an alkoxy group having 1 to 12 carbon atoms.
R ^b4 and R ^b5 may be bonded to each other to form a ring together with the sulfur atom to which they are bonded, and -CH _2- contained in the ring may be -O-, -S- or. It may be replaced with -CO-.
R ^b7 and R ^b8 independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
m2 and n2 each independently represent an integer of 0 to 5.
When m2 is 2 or more, the plurality of R ^b7s may be the same or different from each other, and when n2 is 2 or more, the plurality of R ^b8s may be the same or different from each other.
R ^b9 and R ^b10 independently represent a chain hydrocarbon group having 1 to 36 carbon atoms or an alicyclic hydrocarbon group having 3 to 36 carbon atoms.
R ^b9 and R ^b10 may be bonded to each other to form a ring together with the sulfur atom to which they are bonded, and -CH _2- contained in the ring may be -O-, -S- or. It may be replaced with -CO-.
R ^b11 represents a hydrogen atom, a chain hydrocarbon group having 1 to 36 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^b12 represents a chain hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms, and is included in the chain hydrocarbon group. The hydrogen atom may be substituted with an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the hydrogen atom contained in the aromatic hydrocarbon group may be an alkoxy group having 1 to 12 carbon atoms or 1 to 12 carbon atoms. It may be substituted with 12 alkylcarbonyloxy groups.
R ^b11 and R ^b12 may be bonded to each other to form a ring including -CH-CO- to which they are bonded, and -CH _2- contained in the ring is -O-, -S. -Or -CO- may be replaced.
R ^b13 to R ^b18 independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
L ^b31 represents a sulfur atom or an oxygen atom.
o2, p2, s2, and t2 each independently represent an integer of 0 to 5.
q2 and r2 each independently represent an integer of 0 to 4.
u2 represents 0 or 1.
When o2 is 2 or more, multiple R ^b13s are the same or different, when p2 is 2 or more, multiple R ^b14s are the same or different, and when q2 is 2 or more, multiple R ^b15s are the same or different. , When r2 is 2 or more, the plurality of R ^b16s are the same or different, when s2 is 2 or more, the plurality of R ^b17s are the same or different, and when t2 is 2 or more, the plurality of R ^b18s are the same or different. different.

特に、Ｒ^b9～Ｒ^b12の脂環式炭化水素基は、好ましくは炭素数３～１８、より好ましくは炭素数４～１２である。 The aliphatic hydrocarbon group represents a chain hydrocarbon group and an alicyclic hydrocarbon group.
The chain hydrocarbon group includes an alkyl group of a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, an octyl group and a 2-ethylhexyl group. Can be mentioned.
In particular, the chain hydrocarbon group of R ^b9 to R ^b12 preferably has 1 to 12 carbon atoms.
The alicyclic hydrocarbon group may be either a monocyclic group or a polycyclic group, and the monocyclic alicyclic hydrocarbon group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and a cyclo. Cycloalkyl groups such as a heptyl group, a cyclooctyl group and a cyclodecyl group can be mentioned. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a norbornyl group and the following groups.

In particular, the alicyclic hydrocarbon group of R ^b9 to R ^b12 preferably has 3 to 18 carbon atoms, and more preferably 4 to 12 carbon atoms.

Examples of the alicyclic hydrocarbon group in which the hydrogen atom is substituted with an aliphatic hydrocarbon group include a methylcyclohexyl group, a dimethylcyclohexyl group, a 2-methyladamantan-2-yl group and a 2-ethyladamantan-2-yl group. , 2-Isopropyl adamantan-2-yl group, methylnorbornyl group, isobornyl group and the like. In the alicyclic hydrocarbon group in which the hydrogen atom is substituted with an aliphatic hydrocarbon group, the total carbon number of the alicyclic hydrocarbon group and the aliphatic hydrocarbon group is preferably 20 or less.

Examples of the aromatic hydrocarbon group include phenyl group, trill group, xsilyl group, cumenyl group, mesityl group, p-ethylphenyl group, p-tert-butylphenyl group, p-cyclohexylphenyl group and p-adamantylphenyl group. , Biphenylyl group, naphthyl group, phenanthryl group, 2,6-diethylphenyl group, 2-methyl-6-ethylphenyl group and other aryl groups.
When the aromatic hydrocarbon group contains a chain hydrocarbon group or an alicyclic hydrocarbon group, a chain hydrocarbon group having 1 to 18 carbon atoms and an alicyclic hydrocarbon having 3 to 18 carbon atoms are used. Groups are preferred.
Examples of the aromatic hydrocarbon group in which the hydrogen atom is substituted with an alkoxy group include a p-methoxyphenyl group and the like.
Examples of the chain hydrocarbon group in which the hydrogen atom is substituted with an aromatic hydrocarbon group include an aralkyl group such as a benzyl group, a phenethyl group, a phenylpropyl group, a trityl group, a naphthylmethyl group and a naphthylethyl group.

Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a decyloxy group and a dodecyloxy group.
Examples of the alkylcarbonyl group include an acetyl group, a propionyl group, a butyryl group and the like.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
The alkylcarbonyloxy group includes a methylcarbonyloxy group, an ethylcarbonyloxy group, a propylcarbonyloxy group, an isopropylcarbonyloxy group, a butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, and a pentylcarbonyloxy group. , Hexylcarbonyloxy group, octylcarbonyloxy group, 2-ethylhexylcarbonyloxy group and the like.

Rings formed by the bonds of R ^b4 and R ^b5 together with the sulfur atoms they bond to can be monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated. It may be a ring of. Examples of this ring include a ring having 3 to 18 carbon atoms, preferably a ring having 4 to 18 carbon atoms. Further, the ring containing a sulfur atom may be a 3-membered ring to a 12-membered ring, preferably a 3-membered ring to a 7-membered ring, and examples thereof include the following rings.

The ring formed by R ^b9 and R ^b10 together may be monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated. This ring may be a 3-membered ring to a 12-membered ring, preferably a 3-membered ring to a 7-membered ring. For example, a thiolan-1-ium ring (tetrahydrothiophenium ring), a thian-1-ium ring, a 1,4-oxathian-4-ium ring and the like can be mentioned.
The ring formed by R ^b11 and R ^b12 together may be monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated. This ring may be a 3-membered ring to a 12-membered ring, preferably a 3-membered ring to a 7-membered ring. Examples thereof include an oxocycloheptane ring, an oxocyclohexane ring, an oxonorbornane ring, and an oxoadamantane ring.

Among the cations (b2-1) to cations (b2-4), the cation (b2-1) is preferable.

Examples of the cation (b2-1) include the following cations.

Examples of the cation (b2-2) include the following cations.

Examples of the cation (b2-3) include the following cations.

Examples of the cation (b2-4) include the following cations.

Among them, the formulas (b2-c-1), (b2-c-10), (b2-c-12), (b2-c-14), (b2-c-27), (b2-c-30). And the cation represented by (b2-c-31) are preferable.

Examples of the acid generator (B) include organic sulfonic acids and organic sulfonium salts. For example, the acid generation described in JP2013-68914A, JP2013-3155, and JP2013-11905. Agents and the like can be mentioned. Specifically, those represented by any of the formulas (B1-1) to (B1-48) can be mentioned. Among them, those containing an aryl sulfonium cation are preferable, and formulas (B1-1) to (B1-3), formulas (B1-5) to formulas (B1-7), formulas (B1-11) to formulas (B1-14). ), Formula (B1-17), formula (B1-20) to formula (B1-26), formula (B1-29), formula (B1-31) to formula (B1-48). Salt is more preferred.

<Structural unit of resin (A)>
The resin (A) has a structural unit having an acid unstable group (hereinafter, may be referred to as “structural unit (a1)”). It is preferable that the resin (A) further contains a structural unit other than the structural unit (a1). As the structural unit other than the structural unit (a1), a structural unit having no acid unstable group (hereinafter, may be referred to as “structural unit (s)”) and other structural units (hereinafter, “structural unit (t)””. In some cases).

［式（１）中、Ｒ^a1～Ｒ^a3は、それぞれ独立に、置換基を有していてもよい炭素数１～８のアルキル基、置換基を有していてもよい炭素数３～２０の脂環式炭化水素基を表すか、Ｒ^a1及びＲ^a2は互いに結合してそれらが結合する炭素原子とともに炭素数３～２０の非芳香族炭化水素環を形成する。
ｍａ及びｎａは、それぞれ独立に０又は１を表し、ｍａ及びｎａのうち少なくとも一方は１である。
＊は結合手を表す。］

［式（２）中、Ｒ^a1’及びＲ^a2’は、それぞれ独立に、水素原子又は炭素数１～１２の炭化水素基を表し、Ｒ^a3’は、炭素数１～２０の炭化水素基を表すか、Ｒ^a2’及びＲ^a3’は互いに結合してそれらが結合する炭素原子とともに炭素数３～２０の複素環を形成し、該炭化水素基及び該複素環に含まれるメチレン基は、酸素原子又は硫黄原子で置き換わってもよい。
Ｘは、酸素原子又は硫黄原子を表す。
ｎａ’は、０又は１を表す。
＊は結合手を表す。］ <Structural unit having an acid unstable group (a1)>
The structural unit (a1) is derived from a monomer having an acid unstable group (hereinafter, may be referred to as “monomer (a1)”). Here, the "acid-unstable group" means a group having a leaving group, and the leaving group is removed by contact with an acid to form a hydrophilic group (for example, a hydroxy group or a carboxy group). do.
<Acid unstable group>
In the resin (A), the acid unstable group contained in the structural unit (a1) is preferably a group represented by the following formula (1) and / or a group represented by the formula (2).

[In the formula (1), R ^a1 to R ^a3 independently have an alkyl group having 1 to 8 carbon atoms which may have a substituent and an alkyl group having 3 to 20 carbon atoms which may have a substituent. Representing the alicyclic hydrocarbon group of, R ^a1 and R ^a2 are bonded to each other to form a non-aromatic hydrocarbon ring having 3 to 20 carbon atoms together with the carbon atom to which they are bonded.
ma and na independently represent 0 or 1, respectively, and at least one of ma and na is 1.
* Represents a bond. ]

[In the formula (2), R ^a1'and R ^a2' each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, and R ^a3' represents a hydrocarbon group having 1 to 20 carbon atoms. In other words, R ^a2'and R ^a3' are bonded to each other to form a heterocycle having 3 to 20 carbon atoms together with the carbon atom to which they are bonded, and the hydrocarbon group and the methylene group contained in the heterocycle are oxygen. It may be replaced with an atom or a sulfur atom.
X represents an oxygen atom or a sulfur atom.
na'represents 0 or 1.
* Represents a bond. ]

置換基を有していてもよい炭素数１～８のアルキル基の置換基としては、炭素数３～２０の脂環式炭化水素基が挙げられる。置換基を有していてもよい炭素数３～２０の脂環式炭化水素基の置換基としては、炭素数１～８のアルキル基が挙げられる。より具体的には、メチルシクロヘキシル基、ジメチルシクロへキシル基、メチルノルボルニル基、シクロヘキシルメチル基、アダマンチルメチル基、ノルボルニルエチル基等が挙げられる。
好ましくは、ｍａは０であり、ｎａは１である。
Ｒ^a1及びＲ^a2が互いに結合して非芳香族炭化水素環を形成する場合の－Ｃ（Ｒ^a1）（Ｒ^a2）（Ｒ^a3）としては、下記の環が挙げられる。非芳香族炭化水素環は、好ましくは炭素数３～１２である。＊は－Ｏ－との結合手を表す。

Examples of the alkyl group of R ^a1 to R ^a3 include a methyl group, an ethyl group, a propyl group, an n-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, an n-octyl group and the like.
The alicyclic hydrocarbon groups of R ^a1 to R ^a3 may be either monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a norbornyl group and the following groups (* indicates a bond). The alicyclic hydrocarbon group of R ^a1 to R ^a3 has preferably 3 to 16 carbon atoms.

Examples of the substituent of the alkyl group having 1 to 8 carbon atoms which may have a substituent include an alicyclic hydrocarbon group having 3 to 20 carbon atoms. Examples of the substituent of the alicyclic hydrocarbon group having 3 to 20 carbon atoms which may have a substituent include an alkyl group having 1 to 8 carbon atoms. More specifically, a methylcyclohexyl group, a dimethylcyclohexyl group, a methylnorbornyl group, a cyclohexylmethyl group, an adamantylmethyl group, a norbornylethyl group and the like can be mentioned.
Preferably, ma is 0 and na is 1.
Examples of -C (R ^a1 ) (R ^a2 ) (R ^a3 ) in the case where R ^a1 and R a ² are bonded to each other to form a non-aromatic hydrocarbon ring include the following rings. The non-aromatic hydrocarbon ring preferably has 3 to 12 carbon atoms. * Represents a bond with -O-.

As the group represented by the formula (1), a group in which R ^a1 to R ^a3 are alkyl groups (preferably a tert-butoxycarbonyl group) in the formula (1), and R ^a1 and R ^a2 in the formula (1) are mutually exclusive. They are bonded to form an adamantan ring together with the carbon atoms to which they are bonded, and R ^a3 is an alkyl group, and in formula (1), R ^a1 and R ^a2 are alkyl groups, and R ^a3 . Examples thereof include a group in which is an adamantyl group.

Ｒ^a1'及びＲ^a2'のうち、少なくとも１つは水素原子であることが好ましい。 Examples of the hydrocarbon group of R a1'to R ^{a3' include} an alkyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group formed by combining these groups.
Examples of the alkyl group and the alicyclic hydrocarbon group include the same as above.
Examples of the aromatic hydrocarbon group include phenyl group, naphthyl group, anthryl group, p-methylphenyl group, p-tert-butylphenyl group, p-adamantylphenyl group, trill group, xylyl group, cumenyl group, mesityl group and biphenyl. Examples thereof include an aryl group such as a group, a phenanthryl group, a 2,6-diethylphenyl group and 2-methyl-6-ethylphenyl.
^Examples of the heterocycle in which R a2'and R ^a3' are bonded to each other and formed together with the carbon atom and X to which they are bonded include the following rings. * Represents a bond.

Of R ^a1'and R ^a2' , at least one is preferably a hydrogen atom.

Specific examples of the group represented by the formula (1) include the following groups. * Represents a bond.

Specific examples of the group represented by the formula (2) include the following groups. * Represents a bond.

The monomer (a1) is preferably a monomer having an acid unstable group and an ethylenically unsaturated bond, and more preferably a (meth) acrylic monomer having an acid unstable group.

Among the (meth) acrylic monomers having an acid unstable group, those having an alicyclic hydrocarbon group having 5 to 20 carbon atoms are preferable. If the resin (A) having a structural unit derived from the monomer (a1) having a bulky structure such as an alicyclic hydrocarbon group is used in the resist composition, the resolution of the resist pattern can be improved.

<Specific example of structural unit (a1)>
The structural unit derived from the (meth) acrylic monomer having a group represented by the formula (1) is preferably a structural unit represented by the formula (a1-0) (hereinafter referred to as a structural unit (a1-0)). In some cases), a structural unit represented by the formula (a1-1) (hereinafter, may be referred to as a structural unit (a1-1)) or a structural unit represented by the formula (a1-2) (hereinafter, referred to as a structural unit). It may be referred to as a structural unit (a1-2)). These may be used alone or in combination of two or more.

［式（ａ１－０）中、
Ｌ^a01は、酸素原子又は^＊－Ｏ－（ＣＨ₂）_k01－ＣＯ－Ｏ－を表し、ｋ０１は１～７のいずれかの整数を表し、＊はカルボニル基との結合手を表す。
Ｒ^a01は、水素原子又はメチル基を表す。
Ｒ^a02、Ｒ^a03及びＲ^a04は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環式炭化水素基又はこれらを組み合わせた基を表す。］

[In equation (a1-0),
^La01 represents an oxygen atom or ^* -O- (CH ₂ ) _k01 -CO-O-, k01 represents an integer of 1 to 7, and * represents a bond with a carbonyl group.
R ^a01 represents a hydrogen atom or a methyl group.
R ^a02 , R ^a03 and R ^a04 independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group combining these groups. ]

^La01 is preferably an oxygen atom or ^* -O- (CH ₂ ) _k01 -CO-O-, and more preferably an oxygen atom. k01 is preferably an integer of 1 to 4, and more preferably 1.
Examples of the alkyl group of R ^a02 , R ^a03 and R ^a04 , the alicyclic hydrocarbon group and the group combining these groups include the same groups as those mentioned in R ^a1 to R ^a3 of the formula (1).
The alkyl groups of R ^a02 , R ^a03 and R ^a04 preferably have 6 or less carbon atoms.
The alicyclic hydrocarbon group of R ^a02 , R ^a03 and R ^a04 preferably has 3 to 8 carbon atoms, and more preferably 3 to 6 carbon atoms.
The group in which the alkyl group and the alicyclic hydrocarbon group are combined preferably has a total carbon number of 18 or less in combination of these alkyl groups and the alicyclic hydrocarbon group. Examples of such a group include a methylcyclohexyl group, a dimethylcyclohexyl group, a methylnorbornyl group and the like.
R ^a02 and R ^a03 are preferably an alkyl group having 1 to 6 carbon atoms, and more preferably a methyl group or an ethyl group.
R ^a04 is preferably an alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 5 to 12 carbon atoms, and more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.

［式（ａ１－１）及び式（ａ１－２）中、
Ｌ^a1及びＬ^a2は、それぞれ独立に、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k1－ＣＯ－Ｏ－を表し、ｋ１は１～７のいずれかの整数を表し、＊は－ＣＯ－との結合手を表す。
Ｒ^a4及びＲ^a5は、それぞれ独立に、水素原子又はメチル基を表す。
Ｒ^a6及びＲ^a7は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環式炭化水素基又はこれらを組み合わせることにより形成される基を表す。
ｍ１は、０～１４のいずれかの整数を表す。
ｎ１は、０～１０のいずれかの整数を表す。
ｎ１’は、０～３のいずれかの整数を表す。］

[In the formula (a1-1) and the formula (a1-2),
L ^a1 and L ^a2 independently represent -O- or ^* -O- (CH ₂ ) _k1 -CO-O-, k1 represents an integer of 1 to 7, and * represents -CO-. Represents a bond with.
R ^a4 and R ^a5 each independently represent a hydrogen atom or a methyl group.
R ^a6 and R ^a7 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group formed by combining them.
m1 represents any integer from 0 to 14.
n1 represents any integer from 0 to 10.
n1'represents an integer of 0 to 3. ]

L ^a1 and L ^a2 are preferably —O— or ^* —O— (CH ₂ ) _{k1 ′} −CO—O—, and more preferably —O—. k1'is an integer of 1 to 4, preferably 1.
R ^a4 and R ^a5 are preferably methyl groups.
The alkyl groups of R ^a6 and R ^a7 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group and n-hexyl group. Examples thereof include an n-heptyl group, a 2-ethylhexyl group and an n-octyl group.
The alicyclic hydrocarbon group of R ^a6 and R ^a7 may be either monocyclic or polycyclic, and the monocyclic alicyclic hydrocarbon group may be, for example, a cyclopropyl group, a cyclobutyl group or a cyclopentyl group. , Cycloalkyl group, methylcyclohexyl group, dimethylcyclohexyl group, cycloheptyl group, cyclooctyl group, cycloheptyl group, cyclodecyl group and the like. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a 2-alkyladamantan-2-yl group, a 1- (adamantan-1-yl) alkyl group, a norbornyl group and a methylnor. Examples thereof include a boronyl group and an isobornyl group.
Examples of the group formed by combining the alkyl group of R ^a6 and R ^a7 and the alicyclic hydrocarbon group include an aralkyl group, a benzyl group, a phenethyl group and the like.
The number of carbon atoms of the alkyl groups of R ^a6 and R ^a7 is preferably 6 or less.
The alicyclic hydrocarbon groups of R ^a6 and R ^a7 have preferably 3 to 8 carbon atoms, more preferably 3 to 6 carbon atoms.
m1 is preferably an integer of 0 to 3, and more preferably 0 or 1.
n1 is preferably an integer of 0 to 3, and more preferably 0 or 1.
n1'is preferably 0 or 1.

As the structural unit (a1-0), for example, a structural unit represented by any of the formulas (a1-0-1) to (a1-0-12) is preferable, and the structural units (a1-0-1) to The structural unit represented by any of the formulas (a1-0-10) is more preferable.

In the above formulas (a1-0-1) to (a1-0-12), the structural unit in which the methyl group corresponding to R ^a01 is replaced with a hydrogen atom is also given as a specific example of the structural unit (a1-0). Can be done.

Examples of the structural unit (a1-1) include structural units derived from those described in JP-A-2010-204646. It is preferably a structural unit represented by any of the formulas (a1-1-1) to (a1-1-8), and more preferably the formulas (a1-1-1) to (a1-1-1). It is a structural unit represented by any of 4).

The structural unit (a1-2) is preferably a structural unit represented by any of the formulas (a1-2-1) to (a1-2-12), and more preferably the formula (a1-2-2). 3), a structural unit represented by the formula (a1-2-4), the formula (a1-2-9) or the formula (a1-2-10).

When the resin (A) contains a structural unit (a1-0) and / or a structural unit (a1-1) and / or a structural unit (a1-2), the total content of these is the total structure of the resin (A). It is usually 10 to 95 mol%, preferably 15 to 90 mol%, and more preferably 20 to 85 mol% with respect to the total of the units.

［式（ａ１－５）中、
Ｒ^a8は、ハロゲン原子を有してもよい炭素数１～６のアルキル基、水素原子又はハロゲン原子を表す。
Ｚ^a1は、単結合又は＊－（ＣＨ₂）_h3－ＣＯ－Ｌ⁵⁴－を表し、ｈ３は１～４のいずれかの整数を表し、＊は、Ｌ⁵¹との結合手を表す。
Ｌ⁵¹、Ｌ⁵²、Ｌ⁵³及びＬ⁵⁴は、それぞれ独立に、－Ｏ－又は－Ｓ－を表す。
ｓ１は、１～３のいずれかの整数を表す。
ｓ１’は、０～３のいずれかの整数を表す。］ As the structural unit (a1) having an acid unstable group, a structural unit represented by the formula (a1-5) (hereinafter, may be referred to as “structural unit (a1-5)”) can also be used.

[In equation (a1-5),
R ^a8 represents an alkyl group having 1 to 6 carbon atoms, a hydrogen atom or a halogen atom which may have a halogen atom.
Z ^a1 represents a single bond or *-(CH ₂ ) _h3 -CO-L ^54- , h3 represents an integer of 1 to 4, and * represents a bond with L ⁵¹ .
L ⁵¹ , L ⁵² , L ⁵³ and L ⁵⁴ independently represent -O- or -S-, respectively.
s1 represents an integer of 1 to 3.
s1'represents an integer of 0 to 3. ]

In the formula (a1-5), R ^a8 is preferably a hydrogen atom, a methyl group or a trifluoromethyl group.
L ⁵¹ is preferably —O—.
It is preferable that one of L ⁵² and L ⁵³ is -O- and the other is -S-.
As s1, 1 is preferable.
As s1', any integer of 0 to 2 is preferable.
As Z ^a1 , a single bond or * -CH ₂ -CO-O- is preferable.

Examples of the monomer for inducing the structural unit (a1-5) include the monomers described in JP-A-2010-61117. Among them, the structural unit represented by any of the formulas (a1-5-1) to (a1-5-4) is preferable, and the formula (a1-5-1) or the formula (a1-5-2) is used. The structural unit to be used is more preferable.

When the resin (A) has a structural unit (a1-5), the content thereof is preferably 1 to 50 mol% with respect to the total of all the structural units of the resin (A), and 3 to 45. It is more preferably mol%, and even more preferably 5-40 mol%.

Further, as the structural unit (a1), the following structural units can also be mentioned.

When the resin (A) contains the above structural units, the content thereof is preferably 10 to 95 mol%, more preferably 15 to 90 mol%, and 20 to 85 mol% with respect to all the structural units of the resin (A). % Is more preferable.

The structural unit (a1) having an acid unstable group in the resin (A) includes a structural unit (a1-0), a structural unit (a1-1), a structural unit (a1-2), and a structural unit (a1-5). ) Is preferred, at least two or more are more preferred, and combinations of structural units (a1-1) and structural units (a1-2), structural units (a1-1) and structural units (a1-1) Combination of a1-5), combination of structural unit (a1-1) and structural unit (a1-0), combination of structural unit (a1-2) and structural unit (a1-0), structural unit (a1-5) And the combination of the structural unit (a1-0), the structural unit (a1-0), the combination of the structural unit (a1-1) and the structural unit (a1-2), the structural unit (a1-0), the structural unit (a1-). The combination of 1) and the structural unit (a1-5) is more preferable, and the combination of the structural unit (a1-1) and the structural unit (a1-2), the structural unit (a1-1) and the structural unit (a1-5) The combination is particularly preferred.

<Structural unit without acid unstable group (s)>
The structural unit (s) is derived from a monomer having no acid unstable group (hereinafter, may be referred to as “monomer (s)”). As the monomer (s) for deriving the structural unit (s), a monomer having no acid unstable group known in the resist field can be used.
As the structural unit (s), a structural unit having a hydroxy group or a lactone ring and having no acid unstable group is preferable. A structure having a hydroxy group and no acid unstable group (hereinafter sometimes referred to as "structural unit (a2)") and / or having a lactone ring and no acid unstable group. If a resin having a unit (hereinafter sometimes referred to as "structural unit (a3)") is used in the resist composition of the present invention, the resolution of the resist pattern and the adhesion to the substrate can be improved.

<Structural unit (a2)>
The hydroxy group of the structural unit (a2) may be a phenolic hydroxy group or an alcoholic hydroxy group.
When a resist pattern is produced from the resist composition of the present invention, when a high energy ray such as a KrF excimer laser (248 nm), an electron beam or EUV (ultraviolet light) is used as an exposure light source, the structural unit (a2) is used. , It is preferable to include a structural unit (a2) having a phenolic hydroxy group. When an ArF excimer laser (193 nm) or the like is used, it is preferable that the structural unit (a2) includes a structural unit (a2) having an alcoholic hydroxy group. As the structural unit (a2), one type may be contained alone, or two or more types may be contained.

Examples of the structural unit (a2) having a phenolic hydroxy group include structural units derived from the monomers described in JP-A-2010-204634.

When the resin (A) has a structural unit (a2) having a phenolic hydroxy group, the content thereof is preferably 5 to 95 mol% with respect to all the structural units of the resin (A), preferably 10 to 80 mol. % Is more preferred, and 15-80 mol% is even more preferred.

［式（ａ２－１）中、
Ｌ^a3は、－Ｏ－又は＊－Ｏ－（ＣＨ₂）_k2－ＣＯ－Ｏ－を表し、
ｋ２は、１～７のいずれかの整数を表す。＊は－ＣＯ－との結合手を表す。
Ｒ^a14は、水素原子又はメチル基を表す。
Ｒ^a15及びＲ^a16は、それぞれ独立に、水素原子、メチル基又はヒドロキシ基を表す。
ｏ１は、０～１０のいずれかの整数を表す。］ Examples of the structural unit (a2) having an alcoholic hydroxy group include structural units represented by the formula (a2-1) (hereinafter, may be referred to as “structural unit (a2-1)”).

[In equation (a2-1),
L ^a3 represents -O- or * -O- (CH ₂ ) _k2 -CO-O-
k2 represents an integer of 1 to 7. * Represents a bond with -CO-.
R ^a14 represents a hydrogen atom or a methyl group.
R ^a15 and R ^a16 independently represent a hydrogen atom, a methyl group or a hydroxy group, respectively.
o1 represents an integer of 0 to 10. ]

In the formula (a2-1), ^La3 is preferably -O-, -O- (CH ₂ ) _f1 -CO-O- (the f1 is an integer of 1 to 4). , More preferably -O-.
R ^a14 is preferably a methyl group.
R ^a15 is preferably a hydrogen atom.
R ^a16 is preferably a hydrogen atom or a hydroxy group.
o1 is preferably an integer of 0 to 3, and more preferably 0 or 1.

アルコール性ヒドロキシ基を有する構造単位（ａ２）を誘導するモノマーとしては、例えば、特開２０１０－２０４６４６号公報に記載されたモノマーが挙げられる。 Examples of the structural unit (a2-1) include those described in JP-A-2010-204646, which are represented by any of the formulas (a2-1-1) to (a2-1-6). The structural unit is preferably, and the structural unit represented by any of the formulas (a2-1-1) to (a2-1-4) is more preferable, and the formula (a2-1-1) or the formula (a2-1-4) is more preferable. The structural unit represented by -3) is more preferable.

Examples of the monomer for inducing the structural unit (a2) having an alcoholic hydroxy group include the monomers described in JP-A-2010-204646.

When the resin (A) contains a structural unit (a2) having an alcoholic hydroxy group, the content thereof is usually 1 to 45 mol%, preferably 1 to 1 to all the structural units of the resin (A). It is 40 mol%, more preferably 1 to 35 mol%, still more preferably 2 to 20 mol%.

<Structural unit (a3)>
The lactone ring of the structural unit (a3) may be a monocyclic ring such as a β-propiolactone ring, a γ-butyrolactone ring, or a δ-valerolactone ring, or a fused ring of a monocyclic lactone ring and another ring. However, the lactone ring preferably includes a γ-butyrolactone ring, an adamantan lactone ring, or a crosslinked ring containing a γ-butyrolactone ring structure.

［式（ａ３－１）中、
Ｌ^ａ４は、－Ｏ－又は＊－Ｏ－（ＣＨ_２）_ｋ３－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^ａ１８は、水素原子又はメチル基を表す。
Ｒ^ａ２１は、炭素数１～４の脂肪族炭化水素基を表す。
ｐ１は、０～５のいずれかの整数を表す。ｐ１が２以上のとき、複数のＲ^ａ２１は互いに同一であっても異なってもよい。
式（ａ３－２）中、
Ｌ^ａ５は、－Ｏ－又は＊－Ｏ－（ＣＨ_２）_ｋ３－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^ａ１９は、水素原子又はメチル基を表す。
Ｒ^ａ２２は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
ｑ１は、０～３のいずれかの整数を表す。ｑ１が２以上のとき、複数のＲ^ａ２２は互いに同一であっても異なってもよい。
式（ａ３－３）中、
Ｌ^ａ６は、－Ｏ－又は＊－Ｏ－（ＣＨ_２）_ｋ３－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^ａ２０は、水素原子又はメチル基を表す。
Ｒ^ａ２３は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
ｒ１は、０～３のいずれかの整数を表す。ｒ１が２以上のとき、複数のＲ^ａ２３は互いに同一であっても異なってもよい。
式（ａ３－４）中、
Ｒ^ａ２４は、ハロゲン原子を有していてもよい炭素数１～６のアルキル基、水素原子又はハロゲン原子を表す。
Ｌ^ａ７は、＊－Ｏ－、＊－Ｏ－Ｌ^ａ８－Ｏ－、＊－Ｏ－Ｌ^ａ８－ＣＯ－Ｏ－、＊－Ｏ－Ｌ^ａ８－ＣＯ－Ｏ－Ｌ^ａ９－ＣＯ－Ｏ－又は＊－Ｏ－Ｌ^ａ８－Ｏ－ＣＯ－Ｌ^ａ９－Ｏ－を表す。
＊はカルボニル基との結合手を表す。
Ｒ^ａ２５は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
ｗは、０～８のいずれかの整数を表す。
Ｌ^ａ８及びＬ^ａ９は、互いに独立に、炭素数１～６のアルカンジイル基を表す。］ The structural unit (a3) is preferably a structural unit represented by any of the formulas (a3-1) to (a3-4). The resin (A) may contain one of these types alone, or may contain two or more types of the resin (A).

[In equation (a3-1),
L ^a4 represents a group represented by -O- or * -O- (CH ₂ ) _k3 -CO-O- (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
R ^a18 represents a hydrogen atom or a methyl group.
R ^a21 represents an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
p1 represents any integer from 0 to 5. When p1 is 2 or more, the plurality of Ra ^21s may be the same or different from each other.
In equation (a3-2),
L ^a5 represents a group represented by -O- or * -O- (CH ₂ ) _k3 -CO-O- (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
^Ra19 represents a hydrogen atom or a methyl group.
R ^a22 represents a carboxy group, a cyano group, or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
q1 represents an integer of 0 to 3. When q1 is 2 or more, the plurality of Ra ^22s may be the same or different from each other.
In equation (a3-3),
L ^a6 represents a group represented by -O- or * -O- (CH ₂ ) _k3 -CO-O- (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
R ^a20 represents a hydrogen atom or a methyl group.
R ^a23 represents a carboxy group, a cyano group, or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
r1 represents any integer from 0 to 3. When r1 is 2 or more, the plurality of Ra ^23s may be the same or different from each other.
In equation (a3-4),
R ^a24 represents an alkyl group having 1 to 6 carbon atoms, a hydrogen atom or a halogen atom which may have a halogen atom.
L ^a7 is * -O-, * -OL ^a8 -O-, * -OL a8-CO-O-, * ^{-OL a8 -} CO-O-L ^a9 -CO-O- or * Represents -OL ^a8 -O-CO-L ^a9 -O-.
* Represents a bond with a carbonyl group.
R ^a25 represents a carboxy group, a cyano group or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
w represents an integer of 0 to 8.
L ^a8 and ^{La 9} represent an alkanediyl group having 1 to 6 carbon atoms independently of each other. ]

Examples of the aliphatic hydrocarbon group of R ^a21 , R ^a22 , R ^a23 and R ^a25 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group and a tert-butyl group. Alkyl groups can be mentioned.
Examples of the halogen atom of ^Ra24 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group of R ^a24 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group and an n-hexyl group. It is preferably an alkyl group having 1 to 4 carbon atoms, and more preferably a methyl group or an ethyl group.
Alkyl groups having a halogen atom of ^Ra24 include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group and perfluoro. Examples thereof include a hexyl group, a trichloromethyl group, a tribromomethyl group, and a triiodomethyl group.

The alkanediyl groups of ^La8 and ^La9 include methylene group, ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group and pentane-1,5. -Diyl group, hexane-1,6-diyl group, butane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1, Examples thereof include 4-diyl group and 2-methylbutane-1,4-diyl group.

In the formulas (a3-1) to (a3-3), ^La4 to ^La6 are independent of each other, preferably −O— or k3 is an integer of any one of 1 to 4 * —O— (CH). ₂ ) A group represented by _k3 -CO-O-, more preferably -O- and * -O-CH ₂ -CO-O-, and even more preferably -O-.
R ^a18 to R ^a21 are preferably methyl groups.
R ^a22 and R ^a23 are independent of each other, preferably a carboxy group, a cyano group or a methyl group.
p1, q1, r1 and w are independent of each other, preferably an integer of 0 to 2, and more preferably 0 or 1.

［式中、Ｒ^ａ２４、Ｌ^ａ７は、それぞれ上記と同じ意味を表す。］ In the formula (a3-4), ^Ra24 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, and further preferably a hydrogen atom or a methyl group. Is.
L ^a7 is preferably * -O- or * -O-L ^a8 -CO-O-, and more preferably * -O-, * -O-CH ₂ -CO-O- or * -O-C. ₂ H ₄ -CO-O-.
The formula (a3-4) is particularly preferably the formula (a3-4)'.

[In the formula, ^Ra24 and ^La7 have the same meanings as described above, respectively. ]

As the monomer for inducing the structural unit (a3), the monomer described in JP-A-2010-204646, the monomer described in JP-A-2000-122294, and the monomer described in JP-A-2012-41274. Can be mentioned. The structural unit (a3) includes equations (a3-1-1) to (a3-1-4), equations (a3-2-1) to equations (a3-2-4), and equations (a3-3-3). 1) The structural unit represented by any of the formulas (a3-3-4) and the formulas (a3-4-1) to (a3-4-12) is preferable, and the formula (a3-1-1), It is represented by any one of the formula (a3-1-2), the formula (a3-2-3) to the formula (a3-2-4), and the formula (a3-4-1) to the formula (a3-4-12). The structural unit represented by any of the formulas (a3-4-1) to (a3-4-12) is more preferable, and the structural unit represented by any of the formulas (a3-4-1) to (a3-4-1) is more preferable. The structural unit represented by any of 4-6) is even more preferable.

The structural unit (a3) may contain one kind alone or two or more kinds. Examples of the structural unit (a3) include the following structural units.

In the structural units represented by the above formulas (a3-4-1) to (a3-4-12), the compound in which the methyl group corresponding to R ^a24 is replaced with a hydrogen atom is also the structural unit (a3-4). Can be given as a specific example of.

When the resin (A) contains the structural unit (a3), the total content thereof is usually 5 to 70 mol%, preferably 10 to 65 mol%, based on all the structural units of the resin (A). , More preferably 10-60 mol%.
The content of each of the structural units represented by the formula (a3-1), the formula (a3-2), the formula (a3-3) and the formula (a3-4) is the total structural unit of the resin (A). , Usually 5 to 60 mol%, preferably 5 to 50 mol%, more preferably 10 to 50 mol%.

<Other structural units (t)>
The resin (A) may further contain other structural units (t). The structural unit (t) is a structural unit other than the structural unit (a2) and the structural unit (a3) and has a halogen atom (hereinafter, referred to as “structural unit (a4)” in some cases) and non-structural unit. Examples thereof include a structural unit having a desorbed hydrocarbon group (hereinafter, may be referred to as “structural unit (a5)”).

［式（ａ４－０）中、
Ｒ^５は、水素原子又はメチル基を表す。
Ｌ^５は、単結合又は炭素数１～４の脂肪族飽和炭化水素基を表す。
Ｌ^３は、炭素数１～８のペルフルオロアルカンジイル基又は炭素数５～１２のペルフルオロシクロアルカンジイル基を表す。
Ｒ^６は、水素原子又はフッ素原子を表す。］ <Structural unit (a4)>
As the halogen atom in the structural unit (a4), a fluorine atom is preferable. Examples of the structural unit (a4) include a structural unit represented by the formula (a4-0).

[In equation (a4-0),
^R5 represents a hydrogen atom or a methyl group.
L ⁵ represents a single bond or an aliphatic saturated hydrocarbon group having 1 to 4 carbon atoms.
L ³ represents a perfluoroalkanediyl group having 1 to 8 carbon atoms or a perfluorocycloalkanediyl group having 5 to 12 carbon atoms.
R ⁶ represents a hydrogen atom or a fluorine atom. ]

Examples of the aliphatic saturated hydrocarbon group of L5 include an alkanediyl group having 1 to ⁴ carbon atoms, for example, a methylene group, an ethylene group, a propane-1,3-diyl group and a butane-1,4-diyl group. Such as linear alkanediyl group, linear alkanediyl group having an alkyl group (among others, methyl group, ethyl group, etc.) side chain, ethane-1,1-diyl group, propane-1,2 Examples thereof include branched alkanediyl groups such as a diyl group, a butane-1,3-diyl group, a 2-methylpropane-1,3-diyl group and a 2-methylpropane-1,2-diyl group.

The perfluoroalkanediyl group of L ³ includes a difluoromethylene group, a perfluoroethylene group, a perfluoroethylfluoromethylene group, a perfluoropropane-1,3-diyl group, a perfluoropropane-1,2-diyl group, and a perfluoropropane-2,2. -Diyl group, perfluorobutane-1,4-diyl group, perfluorobutane-2,2-diyl group, perfluorobutane-1,2-diyl group, perfluoropentane-1,5-diyl group, perfluoropentane-2,2 -Diyl group, perfluoropentane-3,3-diyl group, perfluorohexane-1,6-diyl group, perfluorohexane-2,2-diyl group, perfluorohexane-3,3-diyl group, perfluoroheptane-1,7 -Diyl group, perfluoroheptane-2,2-diyl group, perfluoroheptane-3,4-diyl group, perfluoroheptane-4,4-diyl group, perfluorooctane-1,8-diyl group, perfluorooctane-2,2 -Diyl group, perfluorooctane-3,3-diyl group, perfluorooctane-4,4-diyl group and the like can be mentioned.
Examples of the perfluorocycloalkanediyl group of L3 include a perfluorocyclohexanediyl group ^, a perfluorocyclopentanediyl group, a perfluorocycloheptanediyl group, a perfluoroadamantandiyl group and the like.

^L5 is preferably a single bond, a methylene group or an ethylene group, and more preferably a single bond or a methylene group.
L ³ is preferably a perfluoroalkanediyl group having 1 to 6 carbon atoms, and more preferably a perfluoroalkanediyl group having 1 to 3 carbon atoms.

Examples of the structural unit (a4-0) include the following.

In the above structural unit, a structural unit in which a methyl group corresponding to R ⁵ is replaced with a hydrogen atom can also be mentioned as a specific example of the structural unit (a4-0).

［式（ａ４－１）中、
Ｒ^ａ４１は、水素原子又はメチル基を表す。
Ｒ^a42は、置換基を有していてもよい炭素数１～２０の炭化水素基を表し、該炭化水素基に含まれる－ＣＨ₂－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ａ^a41は、置換基を有していてもよい炭素数１～６のアルカンジイル基又は式（ａ－ｇ１）で表される基を表す。ただし、Ａ^ａ４１及びＲ^ａ４２のうち少なくとも１つは、置換基としてハロゲン原子（好ましくはフッ素原子）を有する。

〔式（ａ－ｇ１）中、
ｓは０又は１を表す。
Ａ^a42及びＡ^a44は、それぞれ独立に、置換基を有していてもよい炭素数１～５の２価の脂肪族炭化水素基を表す。
Ａ^a43は、置換基を有していてもよい炭素数１～５の２価の脂肪族炭化水素基又は単結合を表す。
Ｘ^a41及びＸ^a42は、それぞれ独立に、－Ｏ－、－ＣＯ－、－ＣＯ－Ｏ－又は－Ｏ－ＣＯ－を表す。
ただし、Ａ^a42、Ａ^a43、Ａ^a44、Ｘ^a41及びＸ^a42の炭素数の合計は６以下である。
＊、＊＊は結合手であり、＊が－Ｏ－ＣＯ－Ｒ^ａ４２との結合手である。〕
ただし、Ａ^a41及びＲ^a42のうち少なくとも一方は、置換基としてハロゲン原子を有する基である。］
ｓは０が好ましい。 Examples of the structural unit (a4) include a structural unit represented by the equation (a4-1).

[In equation (a4-1),
R ^a41 represents a hydrogen atom or a methyl group.
R ^a42 represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-. good.
A ^a41 represents an alkanediyl group having 1 to 6 carbon atoms which may have a substituent or a group represented by the formula (ag1). However, at least one of ^Aa41 and ^Ra42 has a halogen atom (preferably a fluorine atom) as a substituent.

[In the formula (ag1),
s represents 0 or 1.
A a ⁴² and A a ⁴⁴ each independently represent a divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent.
A ^a43 represents a divalent aliphatic hydrocarbon group or a single bond having 1 to 5 carbon atoms which may have a substituent.
X ^a41 and X ^a42 independently represent -O-, -CO-, -CO-O- or -O-CO-, respectively.
However, the total number of carbon atoms of A ^a42 , A ^a43 , A ^a44 , X ^a41 and X ^a42 is 6 or less.
* And ** are bonds, and * is a bond with -O-CO-R ^a42 . ]
However, at least one of A ^a41 and R ^a42 is a group having a halogen atom as a substituent. ]
s is preferably 0.

芳香族炭化水素基としては、例えば、フェニル基、ナフチル基、アントリル基、ビフェニリル基、フェナントリル基及びフルオレニル基等が挙げられる。 Examples of the hydrocarbon group of R ^a42 include chain and cyclic aliphatic hydrocarbon groups, aromatic hydrocarbon groups, and groups formed by combining these groups. Chain-type aliphatic hydrocarbon groups include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, decyl group, dodecyl group, hexadecyl group, pentadecyl group and hexyldecyl group. , Heptadecyl group, octadecyl group and other alkyl groups. Cyclic alicyclic fatty group hydrocarbon groups include cycloalkyl groups such as cyclopentyl group, cyclohexyl group, cycloheptyl group and cyclooctyl group; decahydronaphthyl group, adamantyl group, norbornyl group and the following groups (*). Represents a bond.) Examples thereof include a polycyclic alicyclic hydrocarbon group.

Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a biphenylyl group, a phenanthryl group and a fluorenyl group.

As the hydrocarbon group of R ^a42 , a chain type or a cyclic type aliphatic hydrocarbon group and a group formed by combining these are preferable. These groups may have a carbon-carbon unsaturated bond, but chain and cyclic aliphatic saturated hydrocarbon groups and groups formed by combining them are more preferable.

［式（ａ－ｇ３）中、
Ｘ^a43は、酸素原子、カルボニル基、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^a45は、少なくとも１つのハロゲン原子を有する炭素数１～１７の脂肪族炭化水素基を表す。
＊はＲ^a42の炭化水素基との結合手を表す。］ Examples of the substituent of R ^a42 include a halogen atom and a group represented by the formula (ag3). Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

[In the formula (ag3),
X ^a43 represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group.
A ^a45 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms having at least one halogen atom.
* Represents a bond with the hydrocarbon group of R ^a42 . ]

Examples of the aliphatic hydrocarbon group of A ^a45 include the same group as the aliphatic hydrocarbon group exemplified in R ^a42 .
R ^a42 is preferably an aliphatic hydrocarbon group which may have a halogen atom, and more preferably an alkyl group having a halogen atom and / or an aliphatic hydrocarbon group having a group represented by the formula (ag3). preferable.

When R ^a42 is an aliphatic hydrocarbon group having a halogen atom, it is preferably an aliphatic hydrocarbon group having a fluorine atom, more preferably a perfluoroalkyl group or a perfluorocycloalkyl group, and further preferably having a carbon number of carbon. It is a perfluoroalkyl group of 1 to 6, and particularly preferably a perfluoroalkyl group having 1 to 3 carbon atoms. Examples of the perfluoroalkyl group include a perfluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluoropentyl group, a perfluorohexyl group, a perfluoroheptyl group and a perfluorooctyl group. Examples of the perfluorocycloalkyl group include a perfluorocyclohexyl group.

When R ^a42 is an aliphatic hydrocarbon group having a group represented by the formula (ag3), the aliphatic hydrocarbon includes the number of carbon atoms contained in the group represented by the formula (ag3). The total carbon number of the group is preferably 15 or less, more preferably 12 or less. When the group represented by the formula (ag3) is used as a substituent, the number thereof is preferably one.

［式（ａ－ｇ２）中、
Ａ^a46は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す。
Ｘ^a44は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^a47は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す。
ただし、Ａ^a46、Ａ^a47及びＸ^a44の炭素数の合計は１８以下であり、Ａ^a46及びＡ^a47のうち、少なくとも一方は、少なくとも１つのハロゲン原子を有する。
＊はカルボニル基との結合手を表す。］ An aliphatic hydrocarbon having a group represented by the formula (ag3) is more preferably a group represented by the formula (ag2).

[In the formula (ag2),
A ^a46 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
X ^a44 represents a carbonyloxy group or an oxycarbonyl group.
A ^a47 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
However, the total number of carbon atoms of A ^a46 , A ^a47 and X ^a44 is 18 or less, and at least one of A ^a46 and A ^a47 has at least one halogen atom.
* Represents a bond with a carbonyl group. ]

The aliphatic hydrocarbon group of A ^a46 preferably has 1 to 6 carbon atoms, more preferably 1 to 3 carbon atoms.
The aliphatic hydrocarbon group of A ^a47 preferably has 4 to 15 carbon atoms, more preferably 5 to 12 carbon atoms, and even more preferably a cyclohexyl group or an adamantyl group.

Examples of the group represented by the formula (ag2) include the following groups.

The alkanediyl group of A ^a41 is a methylene group, an ethylene group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, and a hexane-1,6-diyl group. Linear alkanediyl groups such as propane-1,2-diyl group, butane-1,3-diyl group, 2-methylpropane-1,2-diyl group, 1-methylbutane-1,4-diyl group, etc. Examples thereof include a branched alkanediyl group such as 2-methylbutane-1,4-diyl group.
Examples of the substituent in the alkanediyl group of A ^a41 include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.
A ^a41 is preferably an alkanediyl group having 1 to 4 carbon atoms, more preferably an alkanediyl group having 2 to 4 carbon atoms, and further preferably an ethylene group.

Examples of the aliphatic hydrocarbon groups of A ^a42 , A ^a43 and A ^a44 in the group represented by the formula (a-g1) (hereinafter, sometimes referred to as "group (a-g1)") include a methylene group and an ethylene group. , Propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group, 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group Examples include a group, a 2-methylpropane-1,2-diyl group and the like. Examples of these substituents include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.

Examples of the group (ag1) in which X ^a42 is an oxygen atom include the following groups. In the following examples, * and ** represent the bond, respectively, and ** is the bond with -O-CO-R ^a42 .

Examples of the group (ag1) in which X ^a42 is a carbonyl group include the following groups.

Examples of the group (ag1) in which X ^a42 is a carbonyloxy group include the following groups.

Examples of the group (ag1) in which X ^a42 is an oxycarbonyl group include the following groups.

［式（ａ４－２）中、
Ｒ^ｆ1は、水素原子又はメチル基を表す。
Ａ^ｆ1は、炭素数１～６のアルカンジイル基を表す。
Ｒ^ｆ2は、フッ素原子を有する炭素数１～１０の炭化水素基を表す。］ As the structural unit represented by the formula (a4-1), the structural unit represented by the formula (a4-2) is preferable.

[In equation (a4-2),
R ^f1 represents a hydrogen atom or a methyl group.
A ^f1 represents an alkanediyl group having 1 to 6 carbon atoms.
R ^f2 represents a hydrocarbon group having 1 to 10 carbon atoms having a fluorine atom. ]

The alkanediyl group of A ^f1 includes a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane-1,4-diyl group, and a pentane-1,5-diyl group. , Hexine-1,6-diyl group and other linear alkanediyl groups; 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2 Examples thereof include a branched alkanediyl group such as a diyl group, a 1-methylbutane-1,4-diyl group and a 2-methylbutane-1,4-diyl group.

The hydrocarbon group of R ^f2 includes an aliphatic hydrocarbon group and an aromatic hydrocarbon group, and the aliphatic hydrocarbon group includes a chain type, a cyclic type and a group formed by a combination thereof. As the aliphatic hydrocarbon group, an alkyl group and an alicyclic hydrocarbon group are preferable.
Alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-octyl group and 2 -Examples include ethylhexyl groups.
The alicyclic hydrocarbon group may be either a monocyclic group or a polycyclic group, and the monocyclic alicyclic hydrocarbon group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and a methylcyclohexyl group. , Cycloalkyl groups such as dimethylcyclohexyl group, cycloheptyl group, cyclooctyl group, cycloheptyl group and cyclodecyl group. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a 2-alkyladamantan-2-yl group, a 1- (adamantan-1-yl) alkane-1-yl group, and a norbornyl group. Examples thereof include a methylnorbornyl group and an isobornyl group.

Examples of the hydrocarbon group having a fluorine atom of R ^f2 include an alkyl group having a fluorine atom and an alicyclic hydrocarbon group having a fluorine atom.
Specifically, examples of the alkyl group having a fluorine atom include a difluoromethyl group, a trifluoromethyl group, a 1,1-difluoroethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group. Perfluoroethyl group, 1,1,2,2-tetrafluoropropyl group, 1,1,2,2,3,3-hexafluoropropyl group, perfluoroethylmethyl group, 1- (trifluoromethyl) -1,2 , 2,2-Tetrafluoroethyl group, Perfluoropropyl group, 1,1,2,2-Tetrafluorobutyl group, 1,1,2,2,3,3-hexafluorobutyl group, 1,1,2, 2,3,3,4,4-octafluorobutyl group, perfluorobutyl group, 1,1-bis (trifluoro) methyl-2,2,2-trifluoroethyl group, 2- (perfluoropropyl) ethyl group, 1,1,2,2,3,3,4,4-octafluoropentyl group, perfluoropentyl group, 1,1,2,2,3,3,4,5,5-decafluoropentyl group, 1,1-bis (trifluoromethyl) -2,2,3,3,3-pentafluoropropyl group, perfluoropentyl group, 2- (perfluorobutyl) ethyl group, 1,1,2,2,3,3 , 4,4,5,5-decafluorohexyl group, 1,1,2,2,3,3,4,5,5,6,6-dodecafluorohexyl group, perfluoropentylmethyl group and perfluorohexyl Examples thereof include an alkyl fluoride group such as a group.
Examples of the alicyclic hydrocarbon group having a fluorine atom include a fluorocycloalkyl group such as a perfluorocyclohexyl group and a perfluoroadamantyl group.

In the formula (a4-2), A ^f1 is preferably an alkanediyl group having 2 to 4 carbon atoms, and more preferably an ethylene group.
As R ^f2 , an alkyl fluoride group having 1 to 6 carbon atoms is preferable.

Examples of the structural unit represented by the formula (a4-2) include the structural unit shown below and the structural unit in which the methyl group corresponding to R ^f1 in the following structural unit is replaced with a hydrogen atom.

Examples of the structural unit (a4) include the following structural units and structural units in which a methyl group bonded to the main chain is replaced with a hydrogen atom.

When the resin (A) has a structural unit (a4), the content thereof is preferably 1 to 20 mol%, more preferably 2 to 15 mol%, and 3) with respect to all the structural units of the resin (A). -10 mol% is more preferred.

［式（ａ５－１）中、
Ｒ⁵¹は、水素原子又はメチル基を表す。
Ｒ⁵²は、炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる水素原子は炭素数１～８の脂肪族炭化水素基で置換されていてもよい。但し、Ｌ⁵⁵との結合位置にある炭素原子に結合する水素原子は、炭素数１～８の脂肪族炭化水素基で置換されない。
Ｌ⁵⁵は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれるメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。］ <Structural unit (a5)>
Examples of the non-desorbing hydrocarbon group contained in the structural unit (a5) include a linear, branched or cyclic hydrocarbon group, and preferably an alicyclic hydrocarbon group. Examples of the structural unit (a5) include a structural unit represented by the formula (a5-1).

[In equation (a5-1),
R ⁵¹ represents a hydrogen atom or a methyl group.
R ⁵² represents an alicyclic hydrocarbon group having 3 to 18 carbon atoms, and the hydrogen atom contained in the alicyclic hydrocarbon group may be substituted with an aliphatic hydrocarbon group having 1 to 8 carbon atoms. .. However, the hydrogen atom bonded to the carbon atom at the bond position with L ⁵⁵ is not substituted with the aliphatic hydrocarbon group having 1 to 8 carbon atoms.
L ⁵⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and the methylene group contained in the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. ]

The alicyclic hydrocarbon group of R ⁵² may be either a monocyclic or polycyclic group. Examples of the monocyclic alicyclic hydrocarbon group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group. Examples of the polycyclic alicyclic hydrocarbon group include an adamantyl group and a norbornyl group.
Examples of the aliphatic hydrocarbon group having 1 to 8 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, a pentyl group and a hexyl group. , Octyl groups and alkyl groups such as 2-ethylhexyl groups.
Examples of the alicyclic hydrocarbon group having a substituent include a 3-methyladamantyl group.
R ⁵² is preferably an unsubstituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, and more preferably an adamantyl group, a norbornyl group or a cyclohexyl group.

Examples of the divalent saturated hydrocarbon group of L ⁵⁵ include a divalent aliphatic saturated hydrocarbon group and a divalent alicyclic saturated hydrocarbon group, and a divalent aliphatic saturated hydrocarbon group is preferable. ..
Examples of the divalent aliphatic saturated hydrocarbon group include an alkanediyl group such as a methylene group, an ethylene group, a propanediyl group, a butanjiyl group and a pentandiyl group.
The divalent alicyclic saturated hydrocarbon group may be either monocyclic or polycyclic. Examples of the monocyclic alicyclic saturated hydrocarbon group include a cycloalkanediyl group such as a cyclopentanediyl group and a cyclohexanediyl group. Examples of the polycyclic divalent alicyclic saturated hydrocarbon group include an adamantandiyl group and a norbornanediyl group.

［式（Ｌ１－１）中、
Ｘ^x1は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ｌ^x1は、炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x2は、単結合又は炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x1及びＬ^x2の合計炭素数は、１６以下である。
式（Ｌ１－２）中、
Ｌ^x3は、炭素数１～１７の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x4は、単結合又は炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x1及びＬ^x2の合計炭素数は、１７以下である。
式（Ｌ１－３）中、
Ｌ^x5は、炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x6及びＬ^x７は、それぞれ独立に、単結合又は炭素数１～１４の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x5、Ｌ^x6及びＬ^x7の合計炭素数は、１５以下である。
式（Ｌ１－４）中、
Ｌ^x8及びＬ^x9は、互いに独立に、単結合又は炭素数１～１２の２価の脂肪族飽和炭化水素基を表す。
Ｗ^x1は、炭素数３～１５の２価の脂環式飽和炭化水素基を表す。
ただし、Ｌ^x8、Ｌ^x9及びＷ^x1の合計炭素数は、１５以下である。］ Examples of the group in which the methylene group contained in the saturated hydrocarbon group is replaced with an oxygen atom or a carbonyl group include groups represented by the formulas (L1-1) to (L1-4). In the following formula, * represents a bond with an oxygen atom.

[In the formula (L1-1),
X ^x1 represents a carbonyloxy group or an oxycarbonyl group.
L ^x1 represents a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
L ^x2 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
However, the total number of carbon atoms of L ^x 1 and L ^{x 2} is 16 or less.
In equation (L1-2),
L ^x3 represents a divalent aliphatic saturated hydrocarbon group having 1 to 17 carbon atoms.
L ^x4 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
However, the total number of carbon atoms of L ^x 1 and L ^{x 2} is 17 or less.
In formula (L1-3),
L ^{x 5} represents a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
L ^x6 and L ^x7 each independently represent a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 14 carbon atoms.
However, the total carbon number of L ^x5 , L ^x6 and L ^x7 is 15 or less.
In formula (L1-4),
L ^x8 and L ^x9 represent a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms independently of each other.
W ^x 1 represents a divalent alicyclic saturated hydrocarbon group having 3 to 15 carbon atoms.
However, the total carbon number of L ^x8 , L ^x9 and W ^x1 is 15 or less. ]

L ^x1 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a methylene group or an ethylene group.
L ^x2 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a single bond.
L ^x3 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x4 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^{x 5} is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a methylene group or an ethylene group.
L ^x6 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a methylene group or an ethylene group.
L ^x7 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x8 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a single bond or a methylene group.
L ^x9 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, and more preferably a single bond or a methylene group.
W ^x 1 is preferably a divalent alicyclic saturated hydrocarbon group having 3 to 10 carbon atoms, and more preferably a cyclohexanediyl group or an adamantandiyl group.

Examples of the group represented by the formula (L1-1) include the divalent group shown below.

Examples of the group represented by the formula (L1-2) include the divalent group shown below.

Examples of the group represented by the formula (L1-3) include the divalent group shown below.

Examples of the group represented by the formula (L1-4) include the divalent group shown below.

L ⁵⁵ is preferably a single bond, a methylene group, an ethylene group or a group represented by the formula (L1-1), and more preferably a single bond or a group represented by the formula (L1-1). ..

Examples of the structural unit ( ^a5-1 ) include the structural unit shown below and the structural unit in which the methyl group corresponding to R51 in the following structural unit is replaced with a hydrogen atom.

When the resin (A) has a structural unit (a5), the content thereof is preferably 1 to 30 mol%, more preferably 2 to 20 mol%, and 3) with respect to all the structural units of the resin (A). It is more preferably ~ 15 mol%.

The resin (A) may have a structural unit other than the above-mentioned structural unit, and examples of such a structural unit include structural units well known in the art.

<Resin (A)>
The resin (A) is preferably a resin composed of a structural unit (a1) and a structural unit (s), that is, a copolymer of a monomer (a1) and a monomer (s).
The structural unit (a1) is preferably at least one selected from a structural unit (a1-1) and a structural unit (a1-2) (preferably the structural unit having a cyclohexyl group and a cyclopentyl group), more preferably a structural unit (a1). It is at least two kinds selected from a1-1) or a structural unit (a1-1) and a structural unit (a1-2) (preferably the structural unit having a cyclohexyl group and a cyclopentyl group).
The structural unit (s) is preferably at least one of the structural unit (a2) and the structural unit (a3). The structural unit (a2) is preferably a structural unit represented by the formula (a2-1). The structural unit (a3) is preferably a structural unit represented by the formulas (a3-1-1) to (a3-1-4), and the formulas (a3-2-1) to (a3-2-4). And at least one selected from the structural units represented by the formulas (a3-4-1) to (a3-4-2).

Each structural unit constituting the resin (A) may be used alone or in combination of two or more, and is produced by a known polymerization method (for example, a radical polymerization method) using a monomer for inducing these structural units. can do. The content of each structural unit of the resin (A) can be adjusted by adjusting the amount of the monomer used for the polymerization.
The weight average molecular weight of the resin (A) is preferably 2,000 or more (more preferably 2,500 or more, still more preferably 3,000 or more), 50,000 or less (more preferably 30,000 or less, still more preferable). Is 15,000 or less). In the present specification, the weight average molecular weight is a value obtained by gel permeation chromatography under the conditions described in Examples.

<Resin (X) other than resin (A)>
The resist composition of the present invention may contain a resin (X) other than the resin (A), which does not contain the structural unit (a1) having an acid unstable group. Examples of such a resin (X) include a resin containing a structural unit (t).

As the resin (X), a resin containing the structural unit (a4) exemplified as the structural unit (t) is preferable. In the resin (X), the content of the structural unit (a4) is preferably 40 mol% or more, more preferably 45 mol% or more, still more preferably 50 mol% or more, based on all the structural units of the resin (X). ..
Examples of the structural unit that the resin (X) may further include include a structural unit (a2) having no acid unstable group, a structural unit (a3), and a structural unit derived from other known monomers. ..
The weight average molecular weight of the resin (X) is preferably 8,000 or more (more preferably 10,000 or more) and 80,000 or less (more preferably 60,000 or less). The means for measuring the weight average molecular weight of the resin (X) is the same as that of the resin (A).
When the resist composition contains the resin (X), the content thereof is preferably 1 to 60 parts by mass, more preferably 1 to 50 parts by mass, and further, with respect to 100 parts by mass of the resin (A). It is preferably 1 to 40 parts by mass, and particularly preferably 2 to 30 parts by mass.

The total content of the resin (A) and the resin (X) is preferably 80% by mass or more and 99% by mass or less with respect to the solid content of the resist composition. The solid content of the resist composition and the content of the resin relative to the solid content can be measured by a known analytical means such as liquid chromatography or gas chromatography.

<Solvent (E)>
The content of the solvent (E) in the resist composition is usually 90% by mass or more, preferably 92% by mass or more, more preferably 94% by mass or more, and 99.9% by mass or less. It is preferably 99% by mass or less. The content of the solvent (E) can be measured by a known analytical means such as liquid chromatography or gas chromatography.

Examples of the solvent (E) include glycol ether esters such as ethyl cellosolve acetate, methyl cellosolve acetate and propylene glycol monomethyl ether acetate; glycol ethers such as propylene glycol monomethyl ether; ethyl lactate, butyl acetate, amyl acetate and ethyl pyruvate. Esters; ketones such as acetone, methylisobutylketone, 2-heptanone and cyclohexanone; cyclic esters such as γ-butyrolactone; and the like. One type of solvent (E) may be contained alone, or two or more types may be contained.

<Quencher (C)>
Examples of the quencher (C) include a basic nitrogen-containing organic compound or a salt that generates an acid having a lower acidity than the acid generated from an acid generator. The content of the quencher (C) is preferably 0.01 to 5% by mass, more preferably 0.01 to 3% by mass, based on the solid content of the resist composition.

<Basic nitrogen-containing organic compounds>
Examples of the basic nitrogen-containing organic compound include amines and ammonium salts. Examples of amines include aliphatic amines and aromatic amines. Aliphatic amines include primary amines, secondary amines and tertiary amines.

Examples of amines include 1-naphthylamine, 2-naphthylamine, aniline, diisopropylaniline, 2-,3- or 4-methylaniline, 4-nitroaniline, N-methylaniline, N, N-dimethylaniline, diphenylamine, hexylamine, Heptylamine, octylamine, nonylamine, decylamine, dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, triethylamine, trimethylamine, tripropylamine, tributylamine, trypentylamine, trihexylamine, tri Heptylamine, Trioctylamine, Trinonylamine, Tridecylamine, Methyldibutylamine, Methyldipentylamine, Methyldihexylamine, Methyldicyclohexylamine, Methyldiheptylamine, Methyldioctylamine, Methyldinonylamine, Methyldidecylamine, Ethyldibutylamine, ethyldipentylamine, ethyldihexylamine, ethyldiheptylamine, ethyldioctylamine, ethyldinonylamine, ethyldidecylamine, dicyclohexylmethylamine, tris [2- (2-methoxyethoxy) ethyl] amine, tri Isopropanolamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 4,4'-diamino-3 , 3'-diethyldiphenylmethane, 2,2'-methylenebisaniline, imidazole, 4-methylimidazole, pyridine, 4-methylpyridine, 1,2-di (2-pyridyl) ethane, 1,2-di (4-di) Pyridyl) ethane, 1,2-di (2-pyridyl) ethene, 1,2-di (4-pyridyl) ethen, 1,3-di (4-pyridyl) propane, 1,2-di (4-pyridyloxy) ) Etan, di (2-pyridyl) ketone, 4,4'-dipyridyl sulfide, 4,4'-dipyridyl disulfide, 2,2'-dipyridylamine, 2,2'-dipicorylamine, bipyridine and the like. Diisopropylaniline is preferable, and 2,6-diisopropylaniline is more preferable.

Examples of the ammonium salt include tetramethylammonium hydroxide, tetraisopropylammonium hydroxide, tetrabutylammonium hydroxide, tetrahexylammonium hydroxide, tetraoctylammonium hydroxide, phenyltrimethylammonium hydroxide, and 3- (trifluoromethyl) phenyltrimethyl. Ammonium hydroxide, tetra-n-butylammonium salicylate, choline and the like can be mentioned.

<Salt that produces an acid with a lower acidity than the acid generated from an acid generator>
A salt that generates an acid that is weaker in acidity than the acid generated from the acid generator is more acidic than the acid generated from the salt (I) when it contains only the salt (I) as the acid generator. It means a salt that generates a weak acid, and when it contains a salt (I) as an acid generator and an acid generator (B) which is another acid generator, the salt (I) and the acid generator (B). ) Means a salt that produces an acid that is less acidic than the acid generated from.
The acidity of a salt that produces an acid that is less acidic than the acid generated by the acid generator is indicated by the acid dissociation constant (pKa). The salt that generates an acid having a lower acidity than the acid generated from the acid generator is a salt having an acid dissociation constant of the acid generated from the salt usually -3 <pKa, preferably -1 <pKa <7. A salt of 0 <pKa <5, more preferably a salt of 0 <pKa <5.
Examples of the salt that generates an acid having a lower acidity than the acid generated from the acid generator include salts represented by the following formulas, JP-A-2012-229206, JP-A-2012-6908, and JP-A-2012. Examples thereof include the salts described in JP-A-72109, JP-A-2011-390502, and JP-A-2011-191745.

<Other ingredients (F)>
If necessary, the resist composition of the present invention may contain a component other than the above-mentioned components (hereinafter, may be referred to as "other component (F)"). The other component (F) is not particularly limited, and additives known in the resist field, such as sensitizers, dissolution inhibitors, surfactants, stabilizers, dyes and the like, can be used.

<Preparation of resist composition>
The resist composition of the present invention comprises a resin (A), a salt (I) of the present invention, and, if necessary, a resin (X), an acid generator (B), a solvent (E), a quencher (C), and the like. And other components (F) can be prepared by mixing. The mixing order is arbitrary and is not particularly limited. The temperature at the time of mixing can be selected from 10 to 40 ° C., depending on the type of the resin or the like and the solubility of the resin or the like in the solvent (E). As the mixing time, an appropriate time can be selected from 0.5 to 24 hours depending on the mixing temperature. The mixing means is not particularly limited, and stirring and mixing or the like can be used.
After mixing each component, it is preferable to filter using a filter having a pore size of about 0.003 to 0.2 μm.

<Manufacturing method of resist pattern>
The method for producing a resist pattern of the present invention is
(1) A step of applying the resist composition of the present invention onto a substrate,
(2) A step of drying the applied composition to form a composition layer,
(3) Step of exposing the composition layer,
It includes (4) a step of heating the composition layer after exposure and (5) a step of developing the composition layer after heating.

The resist composition can be applied onto the substrate by a commonly used device such as a spin coater. Examples of the substrate include an inorganic substrate such as a silicon wafer. The substrate may be washed before the resist composition is applied, or an antireflection film or the like may be formed on the substrate.

By drying the composition after coating, the solvent is removed and a composition layer is formed. Drying is performed, for example, by evaporating the solvent using a heating device such as a hot plate (so-called pre-baking), or by using a depressurizing device. The heating temperature is preferably 50 to 200 ° C., and the heating time is preferably 10 to 180 seconds. The pressure for drying under reduced pressure is preferably about ¹ to 1.0 × 105 Pa.

The obtained composition layer is usually exposed using an exposure machine. The exposure machine may be an immersion exposure machine. The exposure light source includes a KrF excimer laser (wavelength 248 nm), an ArF excimer laser (wavelength 193 nm), an F ₂ excima laser (wavelength 157 nm) that emits laser light in the ultraviolet region, and a solid-state laser light source (YAG or semiconductor laser). Etc.), and various ones such as those that radiate harmonic laser light in the far ultraviolet region or vacuum ultraviolet region by wavelength conversion, those that irradiate electron beams, super-ultraviolet light (EUV), etc. are used. Can be done. In addition, in this specification, irradiation of these radiations may be generically referred to as "exposure". At the time of exposure, the exposure is usually performed through a mask corresponding to the required pattern. When the exposure light source is an electron beam, it may be exposed by direct drawing without using a mask.

The composition layer after exposure is heat-treated (so-called post-exposure bake) in order to promote the deprotection reaction at the acid unstable group. The heating temperature is usually about 50 to 200 ° C, preferably about 70 to 150 ° C.

The heated composition layer is usually developed using a developer and a developer. Examples of the developing method include a dip method, a paddle method, a spray method, and a dynamic dispense method. The development temperature is preferably, for example, 5 to 60 ° C., and the development time is preferably, for example, 5 to 300 seconds. A positive resist pattern or a negative resist pattern can be produced by selecting the type of developer as follows.

When producing a positive resist pattern from the resist composition of the present invention, an alkaline developer is used as the developer. The alkaline developer may be any alkaline aqueous solution used in this field. For example, an aqueous solution of tetramethylammonium hydroxide or (2-hydroxyethyl) trimethylammonium hydroxide (commonly known as choline) can be mentioned. The alkaline developer may contain a surfactant.
After development, it is preferable to wash the resist pattern with ultrapure water and then remove the substrate and the water remaining on the pattern.

When a negative resist pattern is produced from the resist composition of the present invention, a developer containing an organic solvent (hereinafter, may be referred to as "organic developer") is used as the developer.
Examples of the organic solvent contained in the organic developer include a ketone solvent such as 2-hexanone and 2-heptanone; a glycol ether ester solvent such as propylene glycol monomethyl ether acetate; an ester solvent such as butyl acetate; and a glycol such as propylene glycol monomethyl ether. Examples include an ether solvent; an amide solvent such as N, N-dimethylacetamide; an aromatic hydrocarbon solvent such as anisole, and the like.
The content of the organic solvent in the organic developer is preferably 90% by mass or more and 100% by mass or less, more preferably 95% by mass or more and 100% by mass or less, and further preferably substantially only the organic solvent.
Among them, as the organic developer, a developer containing butyl acetate and / or 2-heptanone is preferable. The total content of butyl acetate and 2-heptanone in the organic developer is preferably 50% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and substantially butyl acetate and / or 2 -It is more preferable that it is only heptanone.
The organic developer may contain a surfactant. Further, the organic developer may contain a small amount of water.
At the time of development, the development may be stopped by substituting with a solvent of a type different from that of the organic developer.

It is preferable to wash the resist pattern after development with a rinsing solution. The rinsing solution is not particularly limited as long as it does not dissolve the resist pattern, and a solution containing a general organic solvent can be used, and an alcohol solvent or an ester solvent is preferable.
After cleaning, it is preferable to remove the rinse liquid remaining on the substrate and the pattern.

<Use>
The resist composition of the present invention is suitable as a resist composition for KrF excimer laser exposure, a resist composition for ArF excimer laser exposure, a resist composition for electron beam (EB) exposure, or a resist composition for EUV exposure. Yes, it is more suitable as a resist composition for ArF excimer laser exposure, and is useful for fine processing of semiconductors.

The present invention will be described in more detail with reference to examples. In the examples, "%" and "part" indicating the content or the amount used are based on mass unless otherwise specified.
The weight average molecular weight is a value obtained by gel permeation chromatography. The analysis conditions for gel permeation chromatography are as follows.
Column: TSKgel Multipore HXL-M x 3 + guardcolumn (manufactured by Tosoh)
Eluent: Tetrahydrofuran Flow rate: 1.0 mL / min
Detector: RI detector Column temperature: 40 ℃
Injection volume: 100 μL
Molecular weight standard: Standard polystyrene (manufactured by Tosoh)

The structure of the compound was confirmed by measuring the molecular ion peak using mass spectrometry (LC: Agilent 1100 type, MASS: Agilent LC / MSD type). In the following examples, the value of this molecular ion peak is indicated by "MASS".

式（Ｉ－２－ａ）で表される塩２．９８部、式（Ｉ－２－ｂ）で表される化合物０．６３部及びモノクロロベンゼン２４部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、式（Ｉ－２－ｃ）で表される安息香酸銅０．０３部を添加し、１００℃程度まで昇温した後、同温度で１時間攪拌した。得られた反応物を濃縮した後、得られた濃縮物に、クロロホルム４５部及びイオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。得られた有機層に、イオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。この水洗操作を５回繰り返した。回収された有機層をろ過した後、得られたろ液を濃縮した。得られた濃縮物に、ｔｅｒｔ－ブチルメチルエーテル２０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－２―ｄ）で表される塩１．５９部を得た。

式（Ｉ－２－ｄ）で表される塩０．６３部、式（Ｉ－２－ｅ）で表される化合物０．２３部及びアセトニトリル１５部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、トリエチルアミン０．１２部を仕込み、７５℃程度で３時間攪拌した。得られた混合物を、２３℃まで冷却し、クロロホルム３０部及びイオン交換水２０部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。このような水洗操作をさらに５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。次に、得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－２）で表される塩０．２２部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４７７．２
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３３９．１ [Example 1] Synthesis of salt represented by the formula (I-2)

2.98 parts of the salt represented by the formula (I-2-a), 0.63 part of the compound represented by the formula (I-2-b) and 24 parts of monochlorobenzene were charged in the reactor and 30 at 23 ° C. Stir for minutes. To the obtained mixture, 0.03 part of copper benzoate represented by the formula (I-2-c) was added, the temperature was raised to about 100 ° C., and the mixture was stirred at the same temperature for 1 hour. After concentrating the obtained reaction product, 45 parts of chloroform and 15 parts of ion-exchanged water were added to the obtained concentrate, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. To the obtained organic layer, 15 parts of ion-exchanged water was added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. This washing operation was repeated 5 times. After filtering the recovered organic layer, the obtained filtrate was concentrated. To the obtained concentrate, 20 parts of tert-butylmethyl ether was added and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 1.59 parts of a salt represented by the formula (I-2-d).

0.63 parts of the salt represented by the formula (I-2-d), 0.23 parts of the compound represented by the formula (I-2-e) and 15 parts of acetonitrile were charged in the reactor and charged at 23 ° C. for 30 minutes. Stirred. 0.12 parts of triethylamine was added to the obtained mixture, and the mixture was stirred at about 75 ° C. for 3 hours. The obtained mixture was cooled to 23 ° C., 30 parts of chloroform and 20 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. Next, 10 parts of tert-butylmethyl ether was added to the obtained residue and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.22 parts of a salt represented by the formula (I-2).
MASS (ESI (+) Spectrum): M ⁺ 477.2
MASS (ESI (-) Spectrum): M ^- 339.1

式（Ｉ－２－ｄ）で表される塩１．２６部、アセトニトリル２５部及びピリジン０．１６部を、２３℃で３０分間攪拌混合し、０℃まで冷却した。同温度を保持したまま、得られた混合物に、式（Ｉ－３３２－ｅ）で表される化合物０．６２部を、１時間かけて添加し、さらに、１０℃程度まで温度を上げ、同温度で１時間攪拌した。得られた反応物に、クロロホルム６０部及び２％塩酸水溶液１１部を加え、２３℃で３０分間攪拌した。静置、分液することにより有機層を回収した。回収された有機層に、イオン交換水３０部を仕込み２３℃で３０分間攪拌し、静置、分液することにより有機層を水洗した。このような水洗操作を５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－３３２）で表される塩０．６６部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４３３．１
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３３９．１ [Example 2] Synthesis of salt represented by the formula (I-332)

1.26 parts of the salt represented by the formula (I-2-d), 25 parts of acetonitrile and 0.16 parts of pyridine were stirred and mixed at 23 ° C. for 30 minutes and cooled to 0 ° C. While maintaining the same temperature, 0.62 part of the compound represented by the formula (I-332-e) was added to the obtained mixture over 1 hour, and the temperature was further raised to about 10 ° C. to obtain the same temperature. The mixture was stirred at temperature for 1 hour. To the obtained reaction product, 60 parts of chloroform and 11 parts of a 2% aqueous hydrochloric acid solution were added, and the mixture was stirred at 23 ° C. for 30 minutes. The organic layer was recovered by allowing it to stand and separating the liquid. 30 parts of ion-exchanged water was added to the recovered organic layer, stirred at 23 ° C. for 30 minutes, allowed to stand, and separated to wash the organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. To the obtained residue was added 10 parts of tert-butylmethyl ether and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.66 parts of a salt represented by the formula (I-332).
MASS (ESI (+) Spectrum): M ⁺ 433.1
MASS (ESI (-) Spectrum): M ^- 339.1

式（Ｉ－３－ａ）で表される塩２．９１部、式（Ｉ－２－ｂ）で表される化合物０．６３部及びモノクロロベンゼン２４部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、式（Ｉ－２－ｃ）で表される安息香酸銅０．０３部を添加し、１００℃程度まで昇温した後、同温度で１時間攪拌した。得られた反応物を濃縮した。得られた濃縮物に、クロロホルム４５部及びイオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。得られた有機層に、イオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。この水洗操作を５回繰り返した。回収された有機層をろ過した後、得られたろ液を濃縮した。得られた濃縮物に、ｔｅｒｔ－ブチルメチルエーテル２０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－３－ｄ）で表される塩１．７２部を得た。

式（Ｉ－３－ｄ）で表される塩０．６１部、式（Ｉ－２－ｅ）で表される化合物０．２３部及びアセトニトリル１５部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、トリエチルアミン０．１２部を仕込み、７５℃程度で３時間攪拌した。得られた混合物を、２３℃まで冷却し、クロロホルム３０部及びイオン交換水２０部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。このような水洗操作をさらに５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。次に、得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－３）で表される塩０．４８部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４７７．２
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３２３．０ [Example 3] Synthesis of salt represented by the formula (I-3)

2.91 parts of the salt represented by the formula (I-3-a), 0.63 parts of the compound represented by the formula (I-2-b) and 24 parts of monochlorobenzene were charged in the reactor and 30 at 23 ° C. Stir for minutes. To the obtained mixture, 0.03 part of copper benzoate represented by the formula (I-2-c) was added, the temperature was raised to about 100 ° C., and the mixture was stirred at the same temperature for 1 hour. The resulting reaction was concentrated. To the obtained concentrate, 45 parts of chloroform and 15 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. To the obtained organic layer, 15 parts of ion-exchanged water was added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. This washing operation was repeated 5 times. After filtering the recovered organic layer, the obtained filtrate was concentrated. To the obtained concentrate, 20 parts of tert-butylmethyl ether was added and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 1.72 parts of a salt represented by the formula (I-3-d).

0.61 part of the salt represented by the formula (I-3-d), 0.23 part of the compound represented by the formula (I-2-e) and 15 parts of acetonitrile were charged in the reactor and charged at 23 ° C. for 30 minutes. Stirred. 0.12 parts of triethylamine was added to the obtained mixture, and the mixture was stirred at about 75 ° C. for 3 hours. The obtained mixture was cooled to 23 ° C., 30 parts of chloroform and 20 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. Next, 10 parts of tert-butylmethyl ether was added to the obtained residue and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.48 parts of a salt represented by the formula (I-3).
MASS (ESI (+) Spectrum): M ⁺ 477.2
MASS (ESI (-) Spectrum): M ^- 323.0

式（Ｉ－１８－ａ）で表される塩２．９８部、式（Ｉ－２－ｂ）で表される化合物０．６３部及びモノクロロベンゼン２４部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、式（Ｉ－２－ｃ）で表される安息香酸銅０．０３部を添加し、１００℃程度まで昇温した後、同温度で１時間攪拌した。得られた反応物を濃縮した。得られた濃縮物に、クロロホルム４５部及びイオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。得られた有機層に、イオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。この水洗操作を５回繰り返した。回収された有機層をろ過した後、得られたろ液を濃縮した。得られた濃縮物に、ｔｅｒｔ－ブチルメチルエーテル２０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－１８－ｄ）で表される塩１．６２部を得た。

式（Ｉ－１８－ｄ）で表される塩０．６３部、式（Ｉ－２－ｅ）で表される化合物０．２３部及びアセトニトリル１５部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、トリエチルアミン０．１２部を仕込み、７５℃程度で３時間攪拌した。得られた混合物を、２３℃まで冷却し、クロロホルム３０部及びイオン交換水２０部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。このような水洗操作をさらに５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。次に、得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－１８）で表される塩０．４３部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４７７．２
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３３９．１ [Example 4] Synthesis of salt represented by the formula (I-18)

2.98 parts of the salt represented by the formula (I-18-a), 0.63 part of the compound represented by the formula (I-2-b) and 24 parts of monochlorobenzene were charged in the reactor and 30 at 23 ° C. Stir for minutes. To the obtained mixture, 0.03 part of copper benzoate represented by the formula (I-2-c) was added, the temperature was raised to about 100 ° C., and the mixture was stirred at the same temperature for 1 hour. The resulting reaction was concentrated. To the obtained concentrate, 45 parts of chloroform and 15 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. To the obtained organic layer, 15 parts of ion-exchanged water was added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. This washing operation was repeated 5 times. After filtering the recovered organic layer, the obtained filtrate was concentrated. To the obtained concentrate, 20 parts of tert-butylmethyl ether was added and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 1.62 parts of a salt represented by the formula (I-18-d).

0.63 parts of the salt represented by the formula (I-18-d), 0.23 parts of the compound represented by the formula (I-2-e) and 15 parts of acetonitrile were charged in the reactor and charged at 23 ° C. for 30 minutes. Stirred. 0.12 parts of triethylamine was added to the obtained mixture, and the mixture was stirred at about 75 ° C. for 3 hours. The obtained mixture was cooled to 23 ° C., 30 parts of chloroform and 20 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. Next, 10 parts of tert-butylmethyl ether was added to the obtained residue and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.43 parts of a salt represented by the formula (I-18).
MASS (ESI (+) Spectrum): M ⁺ 477.2
MASS (ESI (-) Spectrum): M ^- 339.1

式（Ｉ－１９－ａ）で表される塩２．９７部、式（Ｉ－２－ｂ）で表される化合物０．６３部及びモノクロロベンゼン２４部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、式（Ｉ－２－ｃ）で表される安息香酸銅０．０３部を添加し、１００℃程度まで昇温した後、同温度で１時間攪拌した。得られた反応物を濃縮した。得られた濃縮物に、クロロホルム４５部及びイオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。得られた有機層に、イオン交換水１５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。この水洗操作を５回繰り返した。回収された有機層をろ過した後、得られたろ液を濃縮した。得られた濃縮物に、ｔｅｒｔ－ブチルメチルエーテル２０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－１９―ｄ）で表される塩１．８２部を得た。

式（Ｉ－１９－ｄ）で表される塩０．６２部、式（Ｉ－２－ｅ）で表される化合物０．２３部及びアセトニトリル１５部を反応器に仕込み、２３℃で３０分間攪拌した。得られた混合物に、トリエチルアミン０．１２部を仕込み、７５℃程度で３時間攪拌した。得られた混合物を、２３℃まで冷却し、クロロホルム３０部及びイオン交換水２０部を加え、２３℃で３０分間攪拌した。その後、静置し、分液して有機層を得た。このような水洗操作をさらに５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。次に、得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－１９）で表される塩０．４６部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４７７．２
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３３７．１ [Example 5] Synthesis of salt represented by the formula (I-19)

2.97 parts of the salt represented by the formula (I-19-a), 0.63 part of the compound represented by the formula (I-2-b) and 24 parts of monochlorobenzene were charged in the reactor and 30 at 23 ° C. Stir for minutes. To the obtained mixture, 0.03 part of copper benzoate represented by the formula (I-2-c) was added, the temperature was raised to about 100 ° C., and the mixture was stirred at the same temperature for 1 hour. The resulting reaction was concentrated. To the obtained concentrate, 45 parts of chloroform and 15 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. To the obtained organic layer, 15 parts of ion-exchanged water was added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. This washing operation was repeated 5 times. After filtering the recovered organic layer, the obtained filtrate was concentrated. To the obtained concentrate, 20 parts of tert-butylmethyl ether was added and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 1.82 parts of a salt represented by the formula (I-19-d).

0.62 parts of the salt represented by the formula (I-19-d), 0.23 parts of the compound represented by the formula (I-2-e) and 15 parts of acetonitrile were charged in the reactor and charged at 23 ° C. for 30 minutes. Stirred. 0.12 parts of triethylamine was added to the obtained mixture, and the mixture was stirred at about 75 ° C. for 3 hours. The obtained mixture was cooled to 23 ° C., 30 parts of chloroform and 20 parts of ion-exchanged water were added, and the mixture was stirred at 23 ° C. for 30 minutes. Then, it was allowed to stand, and the liquid was separated to obtain an organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. Next, 10 parts of tert-butylmethyl ether was added to the obtained residue and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.46 parts of a salt represented by the formula (I-19).
MASS (ESI (+) Spectrum): M ⁺ 477.2
MASS (ESI (-) Spectrum): M ^- 337.1

式（Ｉ－３－ｄ）で表される塩１．２３部、アセトニトリル２５部及びピリジン０．１６部を、２３℃で３０分間攪拌混合し、０℃まで冷却した。同温度を保持したまま、得られた混合物に、式（Ｉ－３３２－ｅ）で表される化合物０．６２部を、１時間かけて添加し、さらに、１０℃程度まで温度を上げ、同温度で１時間攪拌した。得られた反応物に、クロロホルム６０部及び２％塩酸水溶液１１部を加え、２３℃で３０分間攪拌した。静置、分液することにより有機層を回収した。回収された有機層に、イオン交換水３０部を仕込み２３℃で３０分間攪拌し、静置、分液することにより有機層を水洗した。このような水洗操作を５回繰り返した。回収された有機層に活性炭０．５０部を加えて攪拌し、ろ過した。得られたろ液を濃縮し、酢酸エチル１０部を加えて攪拌し、上澄液を除去した。得られた残渣にｔｅｒｔ－ブチルメチルエーテル１０部を加えて攪拌した。得られた上澄液を除去し、上澄液除去後の残渣をさらに濃縮した。得られた濃縮物をアセトニトリルに溶解した後、濃縮することにより、式（Ｉ－３３３）で表される塩０．７８部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４３３．１
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３２３．０ [Example 6] Synthesis of salt represented by the formula (I-333)

1.23 parts of the salt represented by the formula (I-3-d), 25 parts of acetonitrile and 0.16 parts of pyridine were stirred and mixed at 23 ° C. for 30 minutes and cooled to 0 ° C. While maintaining the same temperature, 0.62 part of the compound represented by the formula (I-332-e) was added to the obtained mixture over 1 hour, and the temperature was further raised to about 10 ° C. to obtain the same temperature. The mixture was stirred at temperature for 1 hour. To the obtained reaction product, 60 parts of chloroform and 11 parts of a 2% aqueous hydrochloric acid solution were added, and the mixture was stirred at 23 ° C. for 30 minutes. The organic layer was recovered by allowing it to stand and separating the liquid. 30 parts of ion-exchanged water was added to the recovered organic layer, stirred at 23 ° C. for 30 minutes, allowed to stand, and separated to wash the organic layer. Such a washing operation was repeated 5 times. 0.50 part of activated carbon was added to the recovered organic layer, the mixture was stirred, and the mixture was filtered. The obtained filtrate was concentrated, 10 parts of ethyl acetate was added, and the mixture was stirred to remove the supernatant. To the obtained residue was added 10 parts of tert-butylmethyl ether and stirred. The obtained supernatant was removed, and the residue after removing the supernatant was further concentrated. The obtained concentrate was dissolved in acetonitrile and then concentrated to obtain 0.78 parts of a salt represented by the formula (I-333).
MASS (ESI (+) Spectrum): M ⁺ 433.1
MASS (ESI (-) Spectrum): M ^- 323.0

<Synthesis of resin (A) and resin (X)>
The compounds (monomers) used for the synthesis of the resin (A1) and the resin (A2) which are the resin (A), the resin (X1) and the resin (X2) which are the resin (X) are shown below. Hereinafter, these compounds are referred to as "monomer (a1-1-3)" or the like according to the formula number.

[Synthesis Example 1] Synthesis of Resin (A1) As the monomer, a monomer (a1-1-3), a monomer (a1-2-9), a monomer (a2-1-1) and a monomer (a3-4-2) are used. The molar ratio [monomer (a1-1-3): monomer (a1-2-9): monomer (a2-1-1): monomer (a3-4-2)] used was 35: 15: 2.5. The mixture was mixed so as to have a ratio of 47.5, and propylene glycol monomethyl ether acetate 1.5% by mass of the total amount of the monomers was added to prepare a solution. To this solution, azobisisobutyronitrile and azobis (2,4-dimethylvaleronitrile) as initiators were added in an amount of 1 mol% and 3 mol%, respectively, based on the total amount of monomers, and these were heated at 75 ° C. for about 5 hours. did. The obtained reaction mixture was poured into a large amount of methanol / water mixed solvent to precipitate a resin, and the resin was filtered. The obtained resin was added to a mixed solvent of methanol / water, repulped, and then filtered, which was performed twice to obtain a resin (A1) having a weight ^average molecular weight of 8.0 × 103 in a yield of 69%. rice field. This resin (A1) has the following structural units.

[Synthesis Example 2] Synthesis of Resin (A2) As the monomer, a monomer (a1-1-3), a monomer (a1-2-11), a monomer (a2-1-1) and a monomer (a3-4-2) are used. The molar ratio [monomer (a1-1-3): monomer (a1-2-11): monomer (a2-1-1): monomer (a3-4-2)] used was 35: 15: 2.5. The same operation as in Synthesis Example 1 was carried out except that the mixture was mixed so as to have a weight average of 47.5, and a resin (A2) having a weight average molecular weight of 7.9 × 10 ³ was obtained in a yield of 65%. This resin (A2) has the following structural units.

[Synthesis Example 3] Synthesis of resin (X1) A monomer (a4-1-7) was used as a monomer, and methyl isobutyl ketone 1.5% by mass of the total amount of the monomer was added to prepare a solution. Azobisisobutyronitrile and azobis (2,4-dimethylvaleronitrile) as initiators were added to the solution in an amount of 0.7 mol% and 2.1 mol%, respectively, based on the total amount of the monomers, and these were added at 75 ° C. It was heated for about 5 hours. The obtained reaction mixture was poured into a large amount of a mixed methanol / water solvent to precipitate a resin, and the resin was filtered to obtain a resin (X1) having a weight ^average molecular weight of 1.8 × 104 in a yield of 77%. .. This resin (X1) has the following structural units.

[Synthesis Example 4] Synthesis of Resin (X2) As a monomer, a monomer (a5-1-1) and a monomer (a4-0-12) are used, and the molar ratio thereof [monomer (a5-1-1): monomer (a4). -0-12)] was mixed so as to be 50:50, and methylisobutylketone 1.2% by mass of the total amount of monomers was added to prepare a solution. Azobis (2,4-dimethylvaleronitrile) as an initiator was added to this solution in an amount of 3 mol% based on the total amount of monomers, and the mixture was heated at 70 ° C. for about 5 hours. The obtained reaction mixture is poured into a large amount of a mixed methanol / water solvent to precipitate a resin, and the resin is filtered to yield a resin (X2) (copolymer) having a weight average molecular weight of 1.0 × 10 ⁴ . Obtained at 91%. This resin (X2) has the following structural units.

<Preparation of resist composition>
Each of the following components and solvents shown in Tables 15 and 16 was mixed, and the obtained mixture was filtered through a fluororesin filter having a pore size of 0.2 μm to prepare each resist composition.

ＩＸ－１：（特開２０１０－１０７９５５号公報の実施例に従って合成）

ＩＸ－２：（特開２０１３－４７２１０号公報の実施例に従って合成）

ＩＸ－３：（特開２０１３－４７２１０号公報の実施例に従って合成）

＜化合物（Ｄ）＞
Ｄ１：（東京化成工業（株）製）

<Resin>
A1, A2, X1, X2: Resin (A1), Resin (A2), Resin (X1), Resin (X2)
<Acid generator (B)>
B1-21: Salt represented by the formula (B1-21) (synthesized according to an example of JP2012-224611A)
B1-22: Salt represented by the formula (B1-22) (synthesized according to an example of JP2012-224611A)

IX-1: (Synthesized according to the examples of JP-A-2010-107955)

IX-2: (Synthesized according to an example of Japanese Patent Application Laid-Open No. 2013-47210)

IX-3: (Synthesized according to an example of Japanese Patent Application Laid-Open No. 2013-47210)

<Compound (D)>
D1: (manufactured by Tokyo Chemical Industry Co., Ltd.)

<Solvent>
Propylene Glycol Monomethyl Ether Acetate 265 Parts Propylene Glycol Monomethyl Ether 20 Parts 2-Heptanone 20 Parts γ-Butyrolactone 3.5 Parts

[Examples 7 to 21, Comparative Examples 1 to 6] Production of resist pattern and evaluation thereof A composition for an organic antireflection film [ARC-29; manufactured by Nissan Chemical Industries, Ltd.] is applied onto a 12-inch silicon wafer. Then, by baking at 205 ° C. for 60 seconds, an organic antireflection film having a thickness of 78 nm was formed. Next, the resist composition was spin-coated on the organic antireflection film so that the film thickness of the composition layer after drying (prebaking) was 100 nm. After coating, the silicon wafer was prebaked on a direct hot plate at the temperature of PB described in the “PB / PEB” column of Tables 15 and 16 for 60 seconds to form a composition layer on the silicon wafer. ..
ArF excimer laser stepper for immersion exposure [XT: 1900Gi; ASML, NA = 1.35, Anal σ _out = 0.85 σ _in = 0.65 XY- pol. In [Illumination], a mask for forming a trench pattern (pitch 120 nm / trench width 40 nm) was used, and the exposure amount was changed stepwise for exposure. Ultrapure water was used as the immersion medium.
After the exposure, post-exposure baking was performed on a hot plate at the temperature of PEB described in the “PB / PEB” column of Tables 15 and 16 for 60 seconds. Next, the composition layer on this silicon wafer was developed using butyl acetate (manufactured by Tokyo Chemical Industry Co., Ltd.) as a developing solution at 23 ° C. for 20 seconds by the dynamic dispensing method to obtain a negative resist pattern. Manufactured.

In the obtained resist pattern, the exposure amount at which the width of the trench pattern was 40 nm was taken as the effective sensitivity.

<Focus Margin Evaluation (DOF)>
A negative resist pattern was manufactured by performing the same operation as above except that the focus was changed stepwise for exposure in terms of effective sensitivity. In the obtained resist pattern, the focus range in which the width of the trench pattern was 40 nm ± 5% (38 to 42 nm) was defined as DOF (nm). The results are shown in Table 17.

[Examples 22 to 26, Comparative Examples 7 to 9] Production of resist pattern and its evaluation A composition for an organic antireflection film [ARC-29; manufactured by Nissan Chemical Industries, Ltd.] is applied onto a 12-inch silicon wafer. Then, by baking at 205 ° C. for 60 seconds, an organic antireflection film having a thickness of 78 nm was formed. The above resist composition was spin-coated on the organic antireflection film so that the film thickness after drying was 85 nm.
The silicon wafer obtained by applying the resist composition was prebaked (PB) on a direct hot plate at the temperature of "PB" described in the "PB / PEB" column of Tables 15 and 16 for 60 seconds.
An ArF excimer stepper for immersion exposure [XT: 1900Gi; ASML, NA = 1.35, 3/4 Anal XY polarization] was used on the obtained wafer to change the exposure amount stepwise. The and-space pattern was immersed and exposed. Ultrapure water was used as the immersion medium.
After the exposure, post-exposure baking (PEB) was performed on a hot plate at the temperature of "PEB" described in the "PB / PEB" column of Tables 15 and 16 for 60 seconds.
Further, paddle development was carried out for 60 seconds with a 2.38 mass% tetramethylammonium hydroxide aqueous solution.

For each resist film, the exposure amount at which the line-and-space pattern of 50 nm was 1: 1 was defined as the effective sensitivity.

<Focus Margin Evaluation (DOF)>
In terms of effective sensitivity, the DOF was defined as a range (47.5 to 52.5 nm) in which the line width was 50 nm ± 5% when the focus was changed. The results are shown in Table 18.

The salt of the present invention and the resist composition containing the salt are suitable for microfabrication of semiconductors and are industrially useful because a resist pattern having a good focus margin (DOF) can be obtained.

Claims (9)

A salt represented by the formula (I).

[In formula (I),
R ¹ and R ² each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, and the substituents are a hydroxy group, a carboxyl group and 1 to 1 carbon atoms. It is an alkyl group of 12, an alkoxy group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 3 to 12 carbon atoms .
R ³ is a group represented by the formula (Ba) .
X ¹ is an alkanediyl group having 1 to 6 carbon atoms.
A ⁻ represents a sulfonic acid anion represented by the formula (IA) . ]

[In the formula (Ba), R ²³ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
* Represents a bond. ]

[In formula (IA),
Q ¹ and Q ² independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and -CH _2- contained in the saturated hydrocarbon group may be replaced with -O- or -CO-, and the saturated hydrocarbon may be replaced. The hydrogen atom contained in the hydrogen group may be substituted with a fluorine atom or a hydroxy group.
Y represents a methyl group which may have a substituent or an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and is contained in the alicyclic hydrocarbon group. CH _2- may be replaced with -O-, -SO _2- or -CO-.
The substituent that the methyl group represented by Y may have is a halogen atom, a hydroxy group, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the like. It is a glycidyloxy group or- (CH ₂ ) _ja -O-CO-R ^b1 group.
The substituent which the alicyclic hydrocarbon group represented by Y may have may be a halogen atom, a hydroxy group, an alkyl group having 1 to 12 carbon atoms which may be substituted with a hydroxy group, and 3 carbon atoms. ~ 16 alicyclic hydrocarbon groups, alkoxy groups with 1-12 carbon atoms, aromatic hydrocarbon groups with 6-18 carbon atoms, aralkyl groups with 7-21 carbon atoms, acyl groups with 2-4 carbon atoms, glycidyl It is an oxy group or- (CH ₂ ) _ja -O-CO-R ^b1 group.
The R ^b1 represents an alkyl group having 1 to 16 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 16 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms.
The ja represents an integer of 0 to 4. ] A salt represented by the formula (I).

[In formula (I),
R ¹ and R ² each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, and are a hydroxy group, a carboxyl group, an alkyl group having 1 to 12 carbon atoms, and carbon. It is an alkoxy group having a number of 1 to 12 or an alicyclic hydrocarbon group having 3 to 12 carbon atoms.
R ³ is a group represented by the formula (Bb).
X ¹ represents -X ¹¹ -O - X ^12- * (X ¹¹ represents a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, and a methylene group constituting the divalent aliphatic hydrocarbon group. May be replaced with an oxygen atom or a carbonyl group. X ¹² represents a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, provided that the total carbon atoms of X ¹¹ and X ¹² are 11 or less . * Is a group represented by a bond with R ^3. ) .
A ⁻ represents a sulfonic acid anion represented by the formula (IA). ]

[In the formula (Bb), R ²⁴ represents an alkyl group having 1 to 6 carbon atoms having a fluorine atom.
R ²⁵ and R ²⁶ independently represent an alkyl group having 1 to 6 carbon atoms, a hydrogen atom, or a fluorine atom having a fluorine atom.
* Represents a bond. ]

[In formula (IA),
Q ¹ and Q ² independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and -CH _2- contained in the saturated hydrocarbon group may be replaced with -O- or -CO-, and the saturated hydrocarbon may be replaced. The hydrogen atom contained in the hydrogen group may be substituted with a fluorine atom or a hydroxy group.
Y represents a methyl group which may have a substituent or an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and is contained in the alicyclic hydrocarbon group. CH _2- may be replaced with -O-, -SO _2- or -CO-.
The substituent that the methyl group represented by Y may have is a halogen atom, a hydroxy group, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the like. It is a glycidyloxy group or- (CH ₂ ) _ja -O-CO-R ^b1 group.
The substituent which the alicyclic hydrocarbon group represented by Y may have may be a halogen atom, a hydroxy group, an alkyl group having 1 to 12 carbon atoms which may be substituted with a hydroxy group, and 3 carbon atoms. ~ 16 alicyclic hydrocarbon groups, alkoxy groups with 1-12 carbon atoms, aromatic hydrocarbon groups with 6-18 carbon atoms, aralkyl groups with 7-21 carbon atoms, acyl groups with 2-4 carbon atoms, glycidyl It is an oxy group or- (CH ₂ ) _ja -O-CO-R ^b1 group.
The R ^b1 represents an alkyl group having 1 to 16 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 16 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms.
The ja represents an integer of 0 to 4. ] R ¹ and R ² of the above formula (I) are phenyl groups which may independently have a substituent, respectively .
The substituent is a hydroxy group, a carboxyl group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 3 to 12 carbon atoms according to claim 1 or 2. The salt mentioned. The salt according to any one of claims 1 to 3, wherein L ^b1 in the formula (IA) is a group represented by the formula (b1-1) or the formula (b1-2) .

[In equation (b1-1),
L ^b2 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b3 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated hydrocarbon group may be substituted. -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total number of carbon atoms of L ^b2 and L ^b3 is 22 or less.
* Represents a bond with Y.
In equation (b1-2),
L ^b4 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated hydrocarbon group may be substituted. -CH _2- contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total carbon number of L ^b4 and L ^b5 is 22 or less.
* Represents a bond with Y. ] Y in the formula (IA) represents an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, and is contained in the alicyclic hydrocarbon group-CH 2- _. May be replaced with -O-, -SO _2- or -CO-,
The substituent which the alicyclic hydrocarbon group represented by Y may have may be a halogen atom, a hydroxy group, an alkyl group having 1 to 12 carbon atoms which may be substituted with a hydroxy group, and 3 carbon atoms. ~ 16 alicyclic hydrocarbon groups, alkoxy groups with 1-12 carbon atoms, aromatic hydrocarbon groups with 6-18 carbon atoms, aralkyl groups with 7-21 carbon atoms, acyl groups with 2-4 carbon atoms, glycidyl Oxy group or-(CH ₂ ) _ja -O-CO-R ^b1 group (in the formula, R ^b1 is an alkyl group having 1 to 16 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 16 carbon atoms or The salt according to any one of claims 1 to 4 , which represents a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, where ja represents an integer of 0 to 4) . The acid generator containing the salt according to any one of claims 1 to 5. A resist composition containing an acid generator and a resin containing a structural unit having an acid unstable group, and containing the salt according to any one of claims 1 to 5 as the acid generator. The resist composition according to claim 7, further comprising a salt that generates an acid having a lower acidity than the acid generated from the acid generator. (1) A step of applying the resist composition according to claim 7 or 8 onto a substrate.
(2) A step of drying the applied composition to form a composition layer,
(3) Step of exposing the composition layer,
(4) A step of heating the composition layer after exposure, and (5) a step of developing the composition layer after heating,
A method for manufacturing a resist pattern including.