JP6896383B2 - A method for producing a photosensitive resin composition, a cured film, a color filter, and a cured film. - Google Patents

Description

The present invention uses a negative type photosensitive resin composition, a cured film obtained by curing the photosensitive resin composition, a color filter provided with the cured film, and the above-mentioned negative type photosensitive resin composition. The present invention relates to a method for producing a cured film.

A display body such as a liquid crystal display has a structure in which a liquid crystal layer is sandwiched between two substrates on which a pair of electrodes are formed so as to face each other. A color filter having pixels of each color such as red (R), green (G), and blue (B) is formed inside one of the substrates. Then, in this color filter, in order to prevent color mixing of different colors in each pixel and to hide the electrode pattern, the pixels of each of R, G, and B are usually arranged in a matrix so as to partition the pixels. A black matrix is formed.

Generally, color filters are formed by lithographic methods. Specifically, first, a black photosensitive composition is applied to a substrate, exposed to light, and developed to form a black matrix. After that, each of the photosensitive compositions of each color of red (R), green (G), and blue (B) is then repeatedly applied, exposed, and developed to form a pattern of each color at a predetermined position to form a color filter. Form.

As a method for forming a colored film constituting a color filter, for example, as a method for forming a black matrix, a method using a negative photosensitive resin composition has been proposed.
Specifically, it has been proposed to use a negative type photosensitive resin composition containing a photopolymerizable compound, a photopolymerization initiator, an acrylic resin fine particle dispersion liquid in which acrylic resin fine particles are dispersed, and a solvent. (See Patent Document 1).

Further, in recent years, a technique for blending a dendritic polymer having a specific structure as a photosensitive resin composition for a black resist containing a light-shielding component such as a black organic pigment or a dispersed resin composition containing a colorant. Has been cultivated.
According to such a technique, it is said that a resin composition having a smooth coating film surface and no deterioration of surface roughness due to thermosetting shrinkage, or a composition having excellent adhesion and pattern shape during development can be achieved ( See Patent Documents 2 and 3).

Japanese Unexamined Patent Publication No. 2011-170075 Japanese Unexamined Patent Publication No. 2012-27448 Japanese Unexamined Patent Publication No. 2012-93591

Patent Document 1 proposes the use of resin-coated carbon black as a black pigment to be blended in a negative-type photosensitive resin composition. When resin-coated carbon black is used as a light-shielding agent, it is easy to form a black matrix having a high resistance value.
However, when resin-coated carbon black is used as a light-shielding agent, it is difficult to form a black matrix having a high optical density (OD).

In order to form a cured film having a high resistance value while solving the problem of low optical density, it is conceivable to use a pigment having a small secondary particle size.
However, when a pigment having a small secondary particle size is used, the colored cured film constituting the color filter such as a black matrix flows excessively due to the post-baking heating performed after exposure and development. An unacceptable shape change may occur in the cured film.

In addition, it is generally required that the patterned colored films that make up the color filters be formed exactly as designed.
When the compositions disclosed in Patent Documents 2 and 3 are used, it is difficult to form a pattern of the size as designed, although it shows a certain suppressing effect on the shape change of the cured film described above. Met.

The present invention has been made in view of the above problems, and is a photosensitive resin composition capable of forming a finely patterned colored cured film having a desired size and which is difficult to excessively flow due to heating during post-baking. An object of the present invention is to provide a method for producing a cured film using the photosensitive resin composition, a cured film obtained by curing the photosensitive resin composition, and a color filter provided with the cured film.

The present inventors have described (A) in a photosensitive resin composition containing (A) an alkali-soluble resin, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a pigment. We have found that the above problems can be solved by using a novolak resin as an alkali-soluble resin and (B) a dendritic polymer having two or more ethylenically polymerizable groups at the ends as a photopolymerizable compound. Has been completed. Specifically, the present invention provides the following.

The first aspect of the present invention is
(A) Alkali-soluble resin and
(B) Photopolymerizable compound and
(C) Photopolymerization initiator and
(D) Pigment and
A photosensitive resin composition comprising
(A) The alkali-soluble resin contains novolak resin and contains
(B) The photopolymerizable compound is a photosensitive resin composition containing a dendritic polymer having two or more ethylenic polymerizable groups at the ends.

A second aspect of the present invention is a cured film obtained by curing the photosensitive resin composition according to the first aspect.

A third aspect of the present invention is a color filter including the cured film according to the second aspect.

A fourth aspect of the present invention includes a step of forming a coating film by applying the photosensitive resin composition according to the first aspect.
The process of regioselectively exposing the coating film and
The process of developing the exposed coating film to form a patterned cured film,
A method for producing a cured film, which comprises a step of baking a patterned cured film.

According to the present invention, a photosensitive resin composition that does not easily flow excessively due to heating during post-baking and is capable of forming a finely patterned colored cured film having a desired size, and the photosensitive resin composition are used. It is possible to provide a method for producing a cured film, a cured film obtained by curing the photosensitive resin composition, and a color filter provided with the cured film.

Hereinafter, the present invention will be described based on preferred embodiments. In addition, "~" in this specification represents the above (lower limit value) to the following (upper limit value) unless otherwise specified.

<< Photosensitive resin composition >>
The photosensitive resin composition contains (A) an alkali-soluble resin, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a pigment.
The photosensitive resin composition contains a novolak resin as the (A) alkali-soluble resin. The photosensitive resin composition also contains, as (B) a photopolymerizable compound, a dendritic polymer having two or more ethylenically polymerizable groups at the ends.
By containing the above-mentioned novolak resin and the dendritic polymer, the photosensitive resin composition forms a colored cured film that is not excessively flowable due to heating during post-baking and is finely patterned in a desired size. Cheap.

Hereinafter, essential or arbitrary components contained in the photosensitive resin composition and a method for preparing the photosensitive resin composition will be described.

<(A) Alkali-soluble resin>
The photosensitive resin composition contains (A) an alkali-soluble resin.
Here, in the present specification, the (A) alkali-soluble resin refers to a resin having a functional group (for example, a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, etc.) having alkali solubility in the molecule.
The (A) alkali-soluble resin includes (A1) novolak resin. Since the photosensitive resin composition contains (A1) novolak resin as (A) alkali-soluble resin, it is easy to form a cured film that is difficult to flow excessively due to overheating during post-baking.
Hereinafter, the (A1) novolak resin and the alkali-soluble resin other than the (A1) novolak resin will be described.

[(A1) Novolac resin]
As the (A1) novolak resin, various novolak resins conventionally blended in the photosensitive resin composition can be used. The novolak resin (A1) is preferably one obtained by addition-condensing an aromatic compound having a phenolic hydroxyl group (hereinafter, simply referred to as "phenols") and aldehydes under an acid catalyst.

(Phenols)
Examples of the phenols used in producing the (A1) novolak resin include phenols; cresols such as o-cresol, m-cresol, and p-cresol; 2,3-xylenol, 2,4-xylenol, and 2 , 5-Xylenol, 2,6-Xylenol, 3,4-Xylenol, 3,5-Xylenol and other xylenols; o-ethylphenol, m-ethylphenol, p-ethylphenol and other ethylphenols; 2-isopropyl Alkylphenols such as phenol, 3-isopropylphenol, 4-isopropylphenol, o-butylphenol, m-butylphenol, p-butylphenol, and p-tert-butylphenol; 2,3,5-trimethylphenol, and 3,4,5 -Trialkylphenols such as trimethylphenol; polyhydric phenols such as resorcinol, catechol, hydroquinone, hydroquinone monomethyl ether, pyrogallol, and fluoroglycinol; alkyl polyhydric phenols such as alkylresorcin, alkylcatechol, and alkylhydroquinone (any of them) The alkyl group of is also having 1 or more and 4 or less carbon atoms.); Α-naphthol; β-naphthol; hydroxydiphenyl; and bisphenol A and the like. These phenols may be used alone or in combination of two or more.

Among these phenols, m-cresol and p-cresol are preferable, and it is more preferable to use m-cresol and p-cresol in combination. In this case, various properties such as heat resistance of the cured film formed by using the photosensitive resin composition can be adjusted by adjusting the blending ratio of both.
The blending ratio of m-cresol and p-cresol is not particularly limited, but the molar ratio of m-cresol / p-cresol is preferably 3/7 or more and 8/2 or less. By using m-cresol and p-cresol in a ratio within such a range, it is easy to obtain a photosensitive resin composition capable of forming a cured film having excellent heat resistance.

A novolak resin produced by using m-cresol and 2,3,5-trimethylphenol in combination is also preferable. When such a novolak resin is used, it is particularly easy to obtain a photosensitive resin composition capable of forming a cured film that is difficult to flow excessively by heating during post-baking.
The mixing ratio of m-cresol and 2,3,5-trimethylphenol is not particularly limited, but the molar ratio of m-cresol / 2,3,5-trimethylphenol is 70/30 or more and 95/5 or less. Is preferable.

(Aldehydes)
Examples of aldehydes used in producing the (A1) novolak resin include formaldehyde, paraformaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, acetaldehyde and the like. These aldehydes may be used alone or in combination of two or more.

(Acid catalyst)
Examples of the acid catalyst used in producing the (A1) novolak resin include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and phosphoric acid; formic acid, oxalic acid, acetic acid, diethyl sulfate, and paratoluene. Examples include organic acids such as sulfonic acid; and metal salts such as zinc acetate. These acid catalysts may be used alone or in combination of two or more.

(Molecular weight)
(A1) The polystyrene-equivalent weight average molecular weight (Mw; hereinafter, also simply referred to as “weight average molecular weight”) of the novolak resin is a viewpoint of resistance to flow by heating of a cured film formed by using the photosensitive resin composition. Therefore, as the lower limit value, 2000 is preferable, 5000 is more preferable, 10000 is particularly preferable, 15000 is further preferable, 20000 is most preferable, 50000 is preferable as an upper limit value, 45000 is more preferable, 40,000 is further preferable, and 35000 is most preferable. ..

As the (A1) novolak resin, at least two kinds of resins having different polystyrene-equivalent weight average molecular weights can be used in combination. By using a combination of large and small materials having different weight average molecular weights, it is possible to balance the developability of the photosensitive resin composition and the heat resistance of the cured film formed by using the photosensitive resin composition.

[(A2) Resin having a cardo structure]
From the viewpoint of further improving the flow resistance of the cured film, the photosensitive resin composition is a resin having a (A2) cardo structure as the (A) alkali-soluble resin (hereinafter, also referred to as "(A2) cardo resin"). Can also be included.

(A2) As the resin having a cardo skeleton, a resin having a cardo skeleton in its structure and having a predetermined alkali solubility can be used. The cardo skeleton is a skeleton in which a second cyclic structure and a third cyclic structure are bonded to one ring carbon atom constituting the first cyclic structure. The second annular structure and the third annular structure may have the same structure or different structures.
A typical example of a cardo skeleton is a skeleton in which two aromatic rings (for example, a benzene ring) are bonded to a carbon atom at the 9-position of the fluorene ring.

The (A2) cardostructure resin is not particularly limited, and conventionally known resins can be used. Among them, the resin represented by the following formula (a-1) is preferable.

In the formula (a-1), X ^a represents a group represented by the following formula (a-2). m1 represents an integer from 0 to 20.

In the above formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 to 6 carbon atoms, or a halogen atom, and Ra ² independently represents a hydrogen atom or a methyl group, respectively. , ^{R a3} each independently represent an alkylene group of straight or branched chain, m2 is ^{W a} represents 0 or 1, a group represented by the following formula (a3).

Wherein ^(a-2), as the ^{R a3,} preferably an alkylene group having 1 to 20 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, particularly preferably an alkylene group having 1 to 6 carbon atoms , Ethan-1,2-diyl group, propane-1,2-diyl group, and propane1,3-diyl group are most preferred.

Ring A in the formula (a-3) represents an aliphatic ring which may be condensed with an aromatic ring or may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocycle.
Examples of the aliphatic ring include monocycloalkane, bicycloalkane, tricycloalkane, tetracycloalkane and the like.
Specific examples thereof include monocycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane, and adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.
The aromatic ring that may be condensed with the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocycle, and an aromatic hydrocarbon ring is preferable. Specifically, a benzene ring and a naphthalene ring are preferable.

Preferable examples of the divalent group represented by the formula (a-3) include the following groups.

^{The divalent group X a} in the formula (a-1) is formed by ^{reacting the tetracarboxylic dianhydride giving the residue Z a} with the diol compound represented by the formula (a-2a) below. A1) Introduced into cardo resin.

In the formula (a-2a), R ^a1 , R ^a2 , R ^a3 , and m2 are as described in the formula (a-2). The ring A in the formula (a-2a) is as described in the formula (a-3).

The diol compound represented by the formula (a-2a) can be produced, for example, by the following method.
First, the hydrogen atom in the phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) is replaced with a group represented by ^{−R a3 −OH according to a conventional method, if necessary.} Glysidylation is performed using epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c).
Then, the epoxy compound represented by the formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain a diol compound represented by the formula (a-2a).
In the formulas (a-2b) and (a-2c), ^Ra1 , ^Ra3 , and m2 are as described in the formula (a-2). The ring A in the formula (a-2b) and the formula (a-2c) is as described in the formula (a-3).
The method for producing the diol compound represented by the formula (a-2a) is not limited to the above method.

Preferable examples of the diol compound represented by the formula (a-2b) include the following diol compounds.

In the formula ^{(a-1), R a0} is a group represented by hydrogen or a ^-CO-Y a -COOH. Here, ^{Y a} represents the residue obtained by removing dicarboxylic acid anhydride from the acid anhydride group (-CO-O-CO-). Examples of dicarboxylic acid anhydrides are maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydro. Examples thereof include phthalic anhydride and glutaric anhydride.

Further, in the above formula ^(a-1), Z a represents a residue obtained by removing two acid anhydride groups from a tetracarboxylic acid dianhydride. Examples of tetracarboxylic dianhydrides include tetracarboxylic dianhydride represented by the following formula (a-4), pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride. Examples thereof include biphenyl ether tetracarboxylic dianhydride and the like.
Further, in the above formula (a-1), m represents an integer of 0 to 20.

（式（ａ−４）中、Ｒ^ａ４、Ｒ^ａ５、及びＲ^ａ６は、それぞれ独立に、水素原子、炭素原子数１〜１０のアルキル基及びフッ素原子からなる群より選択される１種を示し、ｍ３は、０〜１２の整数を示す。）

(In the formula (a-4), R ^a4 , R ^a5 , and R ^a6 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom. , M3 indicates an integer from 0 to 12.)

^{The alkyl group that can be selected as Ra4} in the formula (a-4) is an alkyl group having 1 to 10 carbon atoms. By setting the number of carbon atoms contained in the alkyl group in this range, the heat resistance of the obtained carboxylic acid ester can be further improved. When R ^a4 is an alkyl group, the number of carbon atoms thereof is preferably 1 to 6, more preferably 1 to 5, further preferably 1 to 4, and 1 to 3 from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained. Is particularly preferable.
When R ^a4 is an alkyl group, the alkyl group may be linear or branched.

^{As R a4} in the formula (a-4), a hydrogen atom or an alkyl group having 1 to 10 carbon atoms is more preferable independently from the viewpoint that a cardo resin having excellent heat resistance can be easily obtained. ^{R a4} in the formula (a-4) is more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and particularly preferably a hydrogen atom or a methyl group.
^{The plurality of Ra4s} in the formula (a-4) are preferably the same group because it is easy to prepare a high-purity tetracarboxylic dianhydride.

M3 in the formula (a-4) represents an integer from 0 to 12. Purification of the tetracarboxylic dianhydride can be facilitated by setting the value of m3 to 12 or less.
The upper limit of m3 is preferably 5 and more preferably 3 because the tetracarboxylic dianhydride can be easily purified.
From the viewpoint of the chemical stability of the tetracarboxylic dianhydride, the lower limit of m3 is preferably 1 and more preferably 2.
The m3 in the formula (a-4) is particularly preferably 2 or 3.

^{R a5,} and an alkyl group having 1 to 10 carbon atoms which can be selected as ^{R a6} in the formula (a4) ^is a same as the alkyl group having 1 to 10 carbon atoms which can be selected as ^{R a4.}
R ^a5 and R ^a6 have hydrogen atoms or 1 to 10 carbon atoms (preferably 1 to 6, more preferably 1 to 5, and even more preferably 1 to 5) because the tetracarboxylic acid dianhydride can be easily purified. It is preferably an alkyl group of 1 to 4, particularly preferably 1 to 3), and particularly preferably a hydrogen atom or a methyl group.

Examples of the tetracarboxylic acid dianhydride represented by the formula (a-4) include norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride (also known as "norbornane-2-spir-2'-cyclopentanone-5'-spiro-2"-norbornane-5,5'', 6,6'' -Tetracarboxylic acid dianhydride "), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-(methylnorbornane) -5,5", 6,6 "-tetra Norbornane dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride (also known as "norbornane-" 2-Spiro-2'-Cyclohexanone-6'-Spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acid dianhydride"), methylnorbornane-2-spiro-α- Cyclohexanone-α'-spiro-2''- (methylnorbornane) -5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclopropanol-α'- Spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclobutanone-α'-spiro-2''-norbornane-5, 5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cycloheptanone-α'-spiro-2''-norbornane-5,5'', 6,6' '-Tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclooctanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride , Norbornane-2-spiro-α-cyclononanonone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclodecanone -Α'-Spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cycloundecanone-α'-spiro-2' '-Norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride, Norbornane-2-spiro-α-cyclododecanone-α'-Spyro-2''-norbornane-5,5' ', 6, 6''-Tetracarboxylic acid dianhydride, Norbornane Nan-2-spiro-α-cyclotridecanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α- Cyclotetradecanone-α'-spiro-2''-norbornane-5,5'', 6,6''-tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclopentadecanone-α' -Spiro-2 "-norbornane-5,5", 6,6 "-tetracarboxylic acid dianhydride, norbornane-2-spiro-α- (methylcyclopentanone) -α'-spiro-2' '-Norbornane-5,5'', 6,6''-Tetracarboxylic acid dianhydride, Norbornane-2-spiro-α- (methylcyclohexanone) -α'-Spiro-2''-norbornane-5,5 '', 6,6''-Tetracarboxylic acid dianhydride and the like can be mentioned.

The weight average molecular weight of the (A2) cardo resin is preferably 1000 to 40,000, more preferably 2000 to 30,000. Within the above range, sufficient heat resistance and film strength can be obtained while obtaining good developability.

[Other alkali-soluble resins]
The alkali-soluble resin (A) may contain other alkali-soluble resins other than (A1) novolak resin and (A2) cardo resin as long as the object of the present invention is not impaired. The other alkali-soluble resin is not particularly limited as long as it is a resin having a predetermined alkali-soluble property, and various resins conventionally blended in the photosensitive resin composition can be appropriately used.
As the other alkali-soluble resin, (A3) acrylic resin is preferable because it is easy to adjust various properties of the alkali-soluble resin.

As the (A3) acrylic resin, a resin containing a structural unit derived from (meth) acrylic acid and / or a structural unit derived from another monomer such as (meth) acrylic acid ester can be used. The (meth) acrylic acid is acrylic acid or methacrylic acid. The (meth) acrylic acid ester is represented by the following formula (a-5), and is not particularly limited as long as the object of the present invention is not impaired.

In the above formula (a-5), R ^a7 is a hydrogen atom or a methyl group, and R ^a8 is a monovalent organic group. This organic group may contain a bond or a substituent other than the hydrocarbon group such as a hetero atom in the organic group. Further, the organic group may be linear, branched or cyclic.

The substituent other than a hydrocarbon group in the organic group R ^a8, the effect is not particularly limited as long as they do not impair the present invention, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group , Isocyanato group, thiocyanato group, isothiocyanato group, silyl group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxy group, carboxylate group, acyl group, acyloxy group, sulfino Group, sulfo group, sulfonate group, phosphino group, phosphinyl group, phosphono group, phosphonato group, hydroxyimino group, alkyl ether group, alkyl thioether group, aryl ether group, aryl thioether group, amino group (-NH ₂ , -NHR, -NRR': R and R'independently indicate a hydrocarbon group) and the like. The hydrogen atom contained in the above substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the substituent may be linear, branched or cyclic.

R ^a8 is preferably an alkyl group, an aryl group, an aralkyl group, or a heterocyclic group, and these groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group, or a heterocyclic group. When these groups contain an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond, or an ester bond.

When the alkyl group is linear or branched, the number of carbon atoms thereof is preferably 1 to 20, more preferably 1 to 15, and particularly preferably 1 to 10. Examples of suitable alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isopentyl group, sec. -Pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, Examples thereof include an isodecyl group.

When the alkyl group is an alicyclic group or a group containing an alicyclic group, suitable alicyclic groups contained in the alkyl group include a cyclopentyl group, a monocyclic alicyclic group such as a cyclohexyl group, and the like. , Adamantyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, tetracyclododecyl group and other polycyclic alicyclic groups.

Further, the (A3) acrylic resin may be obtained by polymerizing a monomer other than the (meth) acrylic acid ester. Examples of such a monomer include (meth) acrylamides, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, styrenes and the like. These monomers can be used alone or in combination of two or more.

Examples of (meth) acrylamides include (meth) acrylamide, N-alkyl (meth) acrylamide, N-aryl (meth) acrylamide, N, N-dialkyl (meth) acrylamide, N, N-aryl (meth) acrylamide, and N. Examples thereof include -methyl-N-phenyl (meth) acrylamide and N-hydroxyethyl-N-methyl (meth) acrylamide.

Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and anhydrides of these dicarboxylic acids.

Examples of the allyl compound include allyl esters such as allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, and allyl lactate; allyloxyethanol; and the like. Can be mentioned.

Examples of vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethyl hexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether and hydroxyethyl vinyl ether. , Diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether and other alkyl vinyl ethers; vinyl phenyl ether, vinyl trill ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether. , Vinyl aryl ethers such as vinyl naphthyl ethers and vinyl anthranyl ethers; and the like.

Examples of vinyl esters include vinyl butyrate, vinylisobutyrate, vinyltrimethylacetate, vinyldiethylacetate, vinylvalerate, vinylcaproate, vinylchloroacetate, vinyldichloroacetate, vinylmethoxyacetate, vinylbutoxyacetate, and vinylphenyl. Examples thereof include acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenylbutyrate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetracrotobenzoate, vinyl naphthoate and the like.

Examples of styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxy. Alkylstyrene such as methylstyrene and acetoxymethylstyrene; alkoxystyrene such as methoxystyrene, 4-methoxy-3-methylstyrene and dimethoxystyrene; chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, Examples thereof include halostyrene such as dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, and 4-fluoro-3-trifluoromethylstyrene.

The amount of the structural unit derived from (meth) acrylic acid and the amount of the structural unit derived from other monomers in the (A3) acrylic resin are not particularly limited as long as the object of the present invention is not impaired. The amount of the structural unit derived from (meth) acrylic acid in the (A3) acrylic resin is preferably 5 to 50% by mass, more preferably 10 to 30% by mass, based on the mass of the acrylic resin.

The weight average molecular weight of the (A3) acrylic resin is preferably 2000 to 50000, and more preferably 5000 to 30000. Within the above range, the film-forming ability of the photosensitive resin composition and the developability after exposure tend to be easily balanced.

The content of the alkali-soluble resin (A) is preferably 10 to 65% by mass, more preferably 15 to 50% by mass, based on the total mass of the solid content of the photosensitive resin composition. Within the above range, it is easy to obtain a photosensitive resin composition having excellent developability.

The content of the (A1) novolak resin is preferably 0.5 to 15% by mass, more preferably 1 to 10% by mass, based on the total mass of the solid content of the photosensitive resin composition. , 1.2 to 5% by mass, more preferably. Within the above range, a cured film that does not easily flow excessively due to heating during post-baking can be formed, and a photosensitive resin composition having excellent developability can be easily obtained.

When the (A2) cardo resin is used, the content thereof is preferably 5 to 40% by mass, preferably 10 to 35% by mass, based on the total mass of the solid content of the photosensitive resin composition. More preferably, it is 15 to 30% by mass. Within the above range, a cured film that is more difficult to flow excessively due to heating during post-baking can be formed, and a photosensitive resin composition having excellent developability can be easily obtained.

<(B) Photopolymerizable compound>
The photosensitive resin composition contains (B) a photopolymerizable compound. As the photopolymerizable compound (B), a compound having an ethylenically polymerizable group can be preferably used.
Further, the photopolymerizable compound (B) contains a dendritic polymer having two or more ethylenically polymerizable groups at the ends.

Here, the point that the photosensitive resin composition of the present embodiment can solve the problem according to the present application is not clear, but the following mechanism can be considered.
That is, when the photosensitive resin composition contains the above-mentioned dendritic polymer as the (B) photopolymerizable compound, the photosensitive resin composition is cured well at the time of exposure, and the cured film is post-baked. However, excessive heat flow of the cured film is unlikely to occur.
On the other hand, when the photosensitive resin composition contains a dendritic polymer, curing by exposure proceeds excessively, and after development, a pattern having a width or diameter larger than a desired size may be formed.
However, when the photosensitive resin composition contains the above-mentioned (A1) novolak resin in combination with a dendritic polymer, the (A1) novolak resin appropriately traps radicals during the curing reaction by exposure and is exposed. Excessive progress of the curing reaction at the time is suppressed.
Therefore, when a photosensitive resin composition containing (A1) novolak resin and a dendritic polymer in combination is used, it is difficult to excessively flow due to heating during post-baking, and a fine pattern having a desired size and shape can be obtained. It is thought that it is easy to form.

[Dendrite polymer]
As described above, the photosensitive resin composition contains, as the (B) photopolymerizable compound, a multi-branched dendritic polymer having two or more ethylenically polymerizable groups at the ends.
The dendritic polymer has branching points in its structure that extend the molecular chains in three or more directions. The number of bifurcation points in one molecule of the dendritic polymer is 3 or more, preferably 4 or more.
For example, dipentaerythritol hexa (meth) acrylate and dipentaerythritol penta (meth) acrylate have two branching points. Therefore, dipentaerythritol hexa (meth) acrylate and dipentaerythritol penta (meth) acrylate do not correspond to dendritic polymers.
Considering the resistance to heat flow and hydrolysis of the cured film formed by using the photosensitive resin composition, it is preferable that the dendritic polymer does not contain urethane bonds.

The ethylenically polymerizable group contained in the dendritic polymer is preferably derived from a (meth) acrylate compound, but is not limited thereto.
The multi-branched dendritic polymer is not particularly limited as long as it has a dendritic multi-branched structure and has two or more ethylenic polymerizable groups at the ends.
As such a dendritic polymer, a so-called dendrimer or hyperbranched polymer is preferably used.

Commercially available dendritic polymers having an ethylenically polymerizable group at the end include Viscort # 1000 (trade name), Viscote # 1020 (trade name), and STAR 501 (SIRIUS 501) manufactured by Osaka Organic Chemical Industry Co., Ltd. , SUBARU 501) (trade name) and the like.
Viscoat # 1000 and Viscoat # 1020 are mainly composed of a multi-branched (dendrimer type) polyester acrylate having an acrylate group at the end. The molecular weight of viscoat # 1000 is about 1000 to 2000, and the molecular weight of viscoat # 1020 is about 1000 to 3000.
STAR-501 contains a core derived from dipentaerythritol and contains a dipentaerythritol hexaacrylate (DPHA) -linked multi-branched polyacrylate having an acrylate group at the terminal as a main component. The molecular weight of STAR 501 is about 16000 to 24000.

Further, the dendritic polymer may be a polymer prepared by using a dendrimer or a hyperbranched polymer having a hydroxyl group, an amino group, or a carboxy group at the terminal.
A hydrogen atom contained in a hydroxyl group or an amino group having a dendrimer or a hyperbranched polymer at the terminal is subjected to a desired amount of an alkenyl group having a double bond at the end such as an acryloyl group, a methacryloyl group, or an allyl group according to a well-known method. By substituting with (B), a dendritic polymer used as a photopolymerizable compound can be obtained.
The carboxy group of the dendrimer or hyperbranched polymer at the end can also be esterified or amidated with an alcohol or amine having an ethylenic double bond at the end according to a well-known method (B). A dendritic polymer used as a photopolymerizable compound is obtained. Examples of the alcohol or amine having an ethylenic double bond at the terminal include 2-hydroxyethyl (meth) acrylate, allyl alcohol, 2-aminoethyl (meth) acrylate, and allylamine.

Examples of dendrimers having a hydroxyl group, an amino group, or a carboxy group at the terminal include, for example.
Polyamide amine dendrimer with a terminal amino group known as PAMAM;
PAMAM type dendrimer in which the terminal amino group is converted to a hydroxyalkylamino group such as a 2-hydroxyethylamino group;
PAMAM type dendrimer in which the terminal amino group is converted to a carboxyalkylamide group such as a succinamide acid group (-NH-CO-CH ₂ CH _2-COOH);
Poly (glycerol-succinic acid) dendrimer having a hydroxyl group at the end, which is a copolymerized polyester of glycerol and succinic acid;
Polyesters that are copolymerized with glycerol and succinic acid, poly (glycerol-succinic acid) dendrimers having a carboxy group at the end; and homopolyesters of 2,2-bis (hydroxymethyl) propanoic acid (bis-MPA). Examples thereof include a dendrimer having a hydroxyl group at the terminal.

Preferred dendritic polymers include the polymers described below.
First, the ethylenically polymerizable group is a group having a carbon-carbon double bond, and in a conjugated compound such as an α, β-unsaturated carbonyl compound in which a carbonyl group is bonded to this carbon-carbon double bond. Is known to cause the Michael addition reaction at the vinyl group, which has the strongest interaction with nucleophiles such as mercapto compounds.
Therefore, if a compound having a plurality of ethylenic polymerizable groups such as an α, β-unsaturated carbonyl compound is reacted with a compound having a plurality of nucleophile groups such as a polyvalent mercapto compound, a carbonyl can be obtained. An addition reaction occurs on the carbon at the β-position with respect to the group, and when there are a plurality of groups on which the addition reaction occurs, many branches occur to form a dendritic polymer. Such a dendritic polymer is known from International Publication No. 2008/47620 and the like, and can be obtained by the method described in such a document.

The dendritic polymer is a Michael addition (α, β-position with respect to the carbonyl group) of a polyfunctional (meth) acrylate compound represented by the following formula (1) and a polyvalent mercapto compound represented by the following formula (2). The adduct polymerized by (addition to carbon-carbon double bond) is preferable.

（式（１）中、Ｒ_１は、水素原子、又は炭素原子数１〜４のアルキル基であり、Ｒ^２は多価アルコールＲ_３（ＯＨ）_ｍのｍ個のヒドロキシ基のうちｎ個のヒドロキシ基を式（１）中のエステル結合に供したｎ価の残基であり、ｍ及びｎはそれぞれ独立に２〜２０の整数であり、ｍ≧ｎである。）

(In the formula (1), R ₁ is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R ² is n out of m hydroxy groups of the polyhydric alcohol R ₃ (OH) _m. It is an n-valent residue in which a hydroxy group is subjected to an ester bond in the formula (1), and m and n are independently integers of 2 to 20 and m ≧ n.)

(HS-CH _2- ) _p- R ⁴ (2)
(In the formula (2), R ⁴ is a single bond or a hydrocarbon group-containing group having 2 to 6 valent carbon atoms 1 to 6, and p ^{is 2 when R 4} is a single bond, and R ⁴ Is an integer of 2 to 6 when is a 2 to 6 valent hydrocarbon group-containing group.)

Here, the Michael addition of the polyvalent mercapto compound represented by the formula (2) to the polyfunctional (meth) acrylate compound represented by the formula (1) is such that the obtained dendritic polymer is still carbon-carbon double. The carbon-carbon double bond of the compound represented by the formula (1) is carried out so as to remain in the range of 0.1 to 50 mol% as a whole so that the radiation polymerization based on the bond can be carried out. Is preferable.

For example, a carbon-carbon double bond between the mercapto group of the polyvalent mercapto compound represented by the formula (2) and the carbon-carbon double bond of the polyfunctional (meth) acrylate compound represented by the formula (1) (CH ₂ = C in the formula (1)). (R ¹ )-refers to a double bond represented by-, and is called a double bond in the case of calculating the molar ratio.) The addition ratio is 1/100 to 1/3 in the molar ratio of the mercapto group / double bond. It is preferable to make it 1/50 to 1/5, and it is particularly preferable to make it 1/50 to 1/8.

Further, the dendritic polymer preferably has a sufficient amount of functional groups for being successfully polymerized by exposure. For this purpose, the molecular weight of the dendritic polymer is preferably in the range of 100 to 10,000 as the molecular weight per mole of the carbon-carbon double bond. The preferred weight average molecular weight (Mw) of the dendritic polymer is 8000-40,000, more preferably 1500-25000.

In the above formula (1), preferably R ³ (OH) _m is a polyhydric alcohol based on a non-aromatic linear or branched hydrocarbon skeleton having 2 to 8 carbon atoms, or the polyhydric alcohol. It is a polyhydric alcohol ether in which a plurality of molecules of a valent alcohol are linked via an ether bond by dehydration condensation of the alcohol, or an ester of these polyhydric alcohols or polyhydric alcohol ethers and hydroxyic acid.
In the above equation (1), m and n independently represent integers of 2 to 20, but m ≧ n. Preferably, m and n are integers of 2-10 and m ≧ n.

Preferred specific examples of the polyfunctional (meth) acrylate compound represented by the formula (1) are ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane di (meth) acrylate, and tetraethylene glycol di (). Meta) acrylate, tetramethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, ethylene oxide-modified trimethylolpropane tri (meth) acrylate, propylene oxide-modified trimethylolpropane tri (meth) acrylate, trimethylolethanetri (Meta) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol trimethylolpropane (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth)
Acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol octa (meth) acrylate, tripentaerythritol hepta (meth) acrylate, caprolactone-modified pentaerythritol tri (meth) acrylate, caprolactone-modified pentaerythritol tetra (meth) acrylate, caprolactone Modified dipentaerythritol hexa (meth) acrylate, epichlorohydrin-modified hexahydrophthalate di (meth) acrylate, hydroxypivalate neopentyl glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, ethylene oxide-modified neopentyl glycol di (Meta) acrylate, propylene oxide-modified neopentyl glycol di (meth) acrylate, ethylene oxide-modified trimethylol propanetri (meth) acrylate, propylene oxide-modified trimethylol propanetri (meth) acrylate, trimethylol propanebenzoate (meth) acrylate, Tris ((meth) acryloxyethyl) isocyanurate, alkoxy-modified trimethylolpropane tri (meth) acrylate, dipentaerythritol poly (meth) acrylate, alkyl-modified dipentaerythritol tri (meth) acrylate, and ditrimethylolpropantetra (meth) acrylate. ) Examples of (meth) acrylic acid esters such as acrylate. These compounds may be used alone or in combination of two or more.

In the formula (2), preferably, R ⁴ further contains an oxygen atom in a hydrocarbon group having 1 to 6 carbon atoms which may have a single bond or a substituent or a skeleton of the hydrocarbon group. A good hydrocarbon group, which may be straight or branched.
Further, these hydrocarbon group-containing groups may further have a carbonyloxy group that binds to a part of the _{thiomethyl group (HS-CH 2-) appearing in the formula (2).} When the skeleton of the hydrocarbon group contains an oxygen atom, both ends may be hydrocarbon groups. p represents an integer of 2 to 6 and corresponds to the valence of ^{R 4.}
Therefore, ^{p is 2 when R 4} represents a single bond, p is 2 to ⁴ when R 4 has 1 carbon atom, and ^{2 to 6 when R 4} has 2 to 6 carbon atoms. p will be 2-6.

Examples of the polyvalent mercapto compound represented by the formula (2) include 1,2-dimercaptoethanol, 1,3-dimercaptopropane, 1,4-dimercaptobutane, bisdimercaptoethanethiol, and trimethylpropanetri (mercapto). Acetate), trimethylolpropanetri (mercaptopropionate), pentaerythritol tetra (mercaptoacetate), pentaerythritoltri (mercaptoacetate), pentaerythritol tetra (mercaptopropionate), dipentaerythritol hexa (mercaptoacetate), and Examples thereof include dipentaerythritol hexa (mercaptopropionate).

When synthesizing the dendritic polymer, a polymerization inhibitor can be added if necessary. As the polymerization inhibitor, hydroquinone-based compounds and phenol-based compounds generally used for preventing the polymerization of (meth) acrylate compounds can also be used in the present invention. Specific examples thereof include, but are not limited to, hydroquinone, methoxyhydroquinone, catechol, p-tert-butylcatechol, cresol, dibutylhydroxytoluene, 2,4,6-tri-tert-butylphenol (BHT) and the like. ..

Confirmation of the completion of synthesis of the dendritic polymer can be confirmed by analysis using liquid chromatography, gel filtration chromatography, or other common analytical instruments.

When synthesizing a dendritic polymer, a Michael addition reaction occurs in which the polyvalent mercapto compound represented by the above formula (2) is added to the double bond of the polyfunctional (meth) acrylate compound represented by the above formula (1). This reaction can be carried out by mixing a polyfunctional (meth) acrylate compound and a polyvalent mercapto compound and adding a basic catalyst at room temperature to 100 ° C. The reaction time is not particularly limited, but is usually 30 minutes to 20 hours, preferably 6 to 12 hours.

[Other photopolymerizable compounds]
In addition to the above-mentioned dendritic polymer, the photosensitive resin composition has various light conventionally blended in the photosensitive resin composition for the purpose of improving the resolution, etc., as long as the object of the present invention is not impaired. A polymerizable compound may be included.
As the other photopolymerizable compound, a monomer having an ethylenically unsaturated group is preferable. Such monomers include monofunctional monomers and polyfunctional monomers.

Examples of the monofunctional monomer include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, butoxymethoxymethyl (meth) acrylamide, and N-methylol ( Meta) acrylamide, N-hydroxymethyl (meth) acrylamide, (meth) acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamide- 2-Methylpropanesulfonic acid, tert-butylacrylamide sulfonic acid, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (Meta) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-phenoxy-2-hydroxypropyl (meth) acrylate, 2- (meth) acryloyloxy-2-hydroxypropylphthalate, Glycerin mono (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, dimethylaminoethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3 -Tetrafluoropropyl (meth) acrylate, half (meth) acrylate of phthalic acid derivative and the like can be mentioned. These monofunctional monomers can be used alone or in combination of two or more.

On the other hand, as the polyfunctional monomer, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, butylene glycol Di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,6-hexane glycol di (meth) acrylate, trimethylpropantri (meth) acrylate, glycerin di (meth) acrylate, pentaerythritol triacrylate, pentaerythritol Tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipenta Ellisritol hexa (meth) acrylate, 2,2-bis (4- (meth) acryloxidiethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxipolyethoxyphenyl) propane, 2-hydroxy-3 -(Meta) acryloyloxypropyl (meth) acrylate, ethylene glycol diglycidyl ether di (meth) acrylate, diethylene glycol diglycidyl ether di (meth) acrylate, diglycidyl phthalate di (meth) acrylate, glycerin triacrylate, glycerin poly Glycidyl ether poly (meth) acrylate, urethane (meth) acrylate (ie, reaction product of tolylene diisocyanate, trimethylhexamethylene diisocyanate, hexamethylene diisocyanate, etc. and 2-vidroxyethyl (meth) acrylate), methylenebis (meth) acrylamide, Examples thereof include polyfunctional monomers such as (meth) acrylamide methylene ether, a condensate of polyhydric alcohol and N-methylol (meth) acrylamide, and triacrylic formal. These polyfunctional monomers can be used alone or in combination of two or more.

Among these monomers having ethylenically unsaturated groups, a polyfunctional monomer having three or more functionalities tends to increase the adhesion of the photosensitive resin composition to the substrate and the strength of the photosensitive resin composition after curing. Is preferable, a polyfunctional monomer having four or more functionalities is more preferable, and a polyfunctional monomer having five or more functionalities is further preferable.
Specifically, it is preferable to use a dendritic polymer and a polyfunctional monomer having five or more functionalities in combination, and the dendritic polymer, dipentaerythritol penta (meth) acrylate, and / or dipentaerythritol hexa (meth). It is more preferable to use it in combination with acrylate.

The content of the photopolymerizable compound in the photosensitive resin composition is preferably 1 to 50% by mass, more preferably 5 to 40% by mass, based on the total mass of the solid content of the photosensitive resin composition. Within the above range, it tends to be easy to balance sensitivity, developability, and resolution.

The content of the dendritic polymer in the photosensitive resin composition is preferably 0.1 to 30% by mass, more preferably 0.5 to 25% by mass, based on the total mass of the solid content of the photosensitive resin composition. Within the above range, it is easy to obtain a photosensitive resin composition that does not easily flow excessively due to heating during post-baking and easily forms a fine pattern having a desired size and shape.
The ratio (Wn: Wd) of the content Wn [g] of the novolak resin and the content Wd [g] of the dendritic polymer in the photosensitive resin composition is within the range of 20: 1 to 1:20. Is preferable, the range of 18: 1 to 1:18 is more preferable, the range of 15: 1 to 1:15 is particularly preferable, and the range of 5: 1 to 1:12 is most preferable.

<(C) Photopolymerization Initiator>
The photopolymerization initiator (C) is not particularly limited, and conventionally known photopolymerization initiators can be used.

(C) Specifically, as the photopolymerization initiator, 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyethoxy) phenyl] -2-Hydroxy-2-methyl-1-propane-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2- Hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) Phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1-one, O-acetyl-1- [6- (2- (2-) Methylbenzoyl) -9-ethyl-9H-carbazole-3-yl] etanone oxime, (9-ethyl-6-nitro-9H-carbazole-3-yl) [4- (2-methoxy-1-methylethoxy) -2-Methylphenyl] Metanon O-acetyloxime, 2- (benzoyloxyimino) -1- [4- (phenylthio) phenyl] -1-octanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 4-benzoyl -4'-Methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2-ethylhexyl benzoic acid, 4-Dimethylamino-2-isoamyl benzoic acid, benzyl-β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propandion-2- (O-ethoxycarbonyl) oxime, methyl o-benzoyl benzoate , 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene. , 2-Isopropylthioxanthene, 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, azobisisobutyronitrile, benzoylperoxide, cumenehydroperoxide, 2-mercaptobenzoimi Dazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) -imidazolyl dimer, benzophenone, 2-chlorobenzophenone, p, p' -Bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, Benzoin-n-butyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, p. -Dimethylaminoacetophenone, p-tert-butyltrichloroacetonone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosverone, pentyl- 4-Dimethylaminobenzoate, 9-phenylaclysine, 1,7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl) pentane, 1,3-bis- (9-acridinyl) propane, p-Methoxytriazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-) 2-Il) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4, 6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis ( Trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethi) Lu) -s-triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-bromo-4) -Methoxy) Phenyl-s-Triazine, 2,4-bis-trichloromethyl-6- (3-bromo-4-methoxy) styrylphenyl-s-triazine, 2,4-bis-trichloromethyl-6- (2-) Bromo-4-methoxy) styrylphenyl-s-triazine and the like can be mentioned. These photopolymerization initiators can be used alone or in combination of two or more.

Among these, it is particularly preferable to use an oxime-based photopolymerization initiator in terms of sensitivity. Among the oxime-based photopolymerization initiators, particularly preferable ones are O-acetyl-1- [6- (2-methylbenzoyl) -9-ethyl-9H-carbazole-3-yl] etanone oxime and etanone. , 1- [9-ethyl-6- (pyrrole-2-ylcarbonyl) -9H-carbazol-3-yl], 1- (O-acetyloxime), and 2- (benzoyloxyimino) -1- [4 -(Phenylthio) phenyl] -1-octanone can be mentioned.

（Ｒ^ｃ１は、１価の有機基、アミノ基、ハロゲン、ニトロ基、及びシアノ基からなる群より選択される基であり、
ｎ１は０〜４の整数であり、
ｎ２は０、又は１であり、
Ｒ^ｃ２は、置換基を有してもよいフェニル基、又は置換基を有してもよいカルバゾリル基であり、
Ｒ^ｃ３は、水素原子、又は炭素原子数１〜６のアルキル基である。） As the photopolymerization initiator, it is also preferable to use an oxime compound represented by the following formula (c1).

(R ^c1 is a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group, and a cyano group.
n1 is an integer from 0 to 4,
n2 is 0 or 1,
R ^c2 is a phenyl group which may have a substituent or a carbazolyl group which may have a substituent.
R ^c3 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. )

In the formula (c1), R ^c1 is not particularly limited as long as it does not interfere with the object of the present invention, and is appropriately selected from various organic groups. Preferable examples of the case where R ^c1 is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, a saturated aliphatic acyloxy group, an alkoxycarbonyl group and a substituent. A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a benzoyloxy which may have a substituent. A group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, and a substituent. A naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, an amino group, 1 , Or an amino group substituted with 2 organic groups, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like. When n1 is an integer of 2 to 4, R ^c1 may be the same or different. Further, the number of carbon atoms of the substituent does not include the number of carbon atoms of the substituent further possessed by the substituent.

When R ^c1 is an alkyl group, the number of carbon atoms is preferably 1 to 20, and more preferably 1 to 6 carbon atoms. When R ^c1 is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c1 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group. , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, Examples thereof include an n-decyl group and an isodecyl group. When R ^c1 is an alkyl group, the alkyl group may contain an ether bond (−O−) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ^c1 is an alkoxy group, the number of carbon atoms is preferably 1 to 20, and more preferably 1 to 6 carbon atoms. When R ^c1 is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c1 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group and n. -Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Trt-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c1 is an alkoxy group, the alkoxy group may contain an ether bond (−O−) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy group, ethoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, propyloxyethoxyethoxy group, methoxypropyloxy group and the like.

When R ^c1 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms is preferably 3 to 10, and more preferably 3 to 6 carbon atoms. Specific examples of the case where R ^c1 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like. Specific examples of the case where R ^c1 is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, a cyclooctyloxy group and the like.

When R ^c1 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms is preferably 2 to 20, and more preferably 2 to 7 carbon atoms. Specific examples of the case where R ^c1 is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n. -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Examples thereof include a noyl group and an n-hexadecanoyl group. Specific examples of the case where R ^c1 is a saturated aliphatic acyloxy group include an acetyloxy group, a propanoyloxy group, an n-butanoyloxy group, a 2-methylpropanoyloxy group, an n-pentanoyloxy group, and 2, 2-Dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group and the like can be mentioned.

When R ^c1 is an alkoxycarbonyl group, the number of carbon atoms is preferably 2 to 20, and more preferably 2 to 7 carbon atoms. Specific examples of the case where R ^c1 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, isononyloxycarbonyl group, n-decyloxycarbonyl group, and Examples thereof include an isodecyloxycarbonyl group.

When R ^c1 is a phenylalkyl group, the number of carbon atoms is preferably 7 to 20, and more preferably 7 to 10 carbon atoms. When R ^c1 is a naphthylalkyl group, the number of carbon atoms is preferably 11 to 20, and more preferably 11 to 14 carbon atoms. Specific examples of the case where R ^c1 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ^c1 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2- (α-naphthyl) ethyl group, and 2- (β-naphthyl) ethyl group. .. When R ^c1 is a phenylalkyl group or a naphthylalkyl group, ^Rc1 may further have a substituent on the phenyl group or the naphthyl group.

When R ^c1 is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed. Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrol, oxazole, isooxazole, thiazole, thiazazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indol, Examples thereof include isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxalin. When R ^c1 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ^c1 is an amino group substituted with 1 or 2 organic groups, suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and carbon. Saturated aliphatic acyl group having 2 to 20 atoms, phenyl group which may have a substituent, benzoyl group which may have a substituent, and phenyl which may have a substituent and which has 7 to 20 carbon atoms. Examples thereof include an alkyl group, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthylalkyl group which may have a substituent and has 11 to 20 carbon atoms, and a heterocyclyl group. Be done. Specific examples of these suitable organic groups are the same as for R ^c1 . Specific examples of the amino group substituted with the organic group 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, an isopropylamino group, and an n-. Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naftylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples thereof include a decanoylamino group, a benzoylamino group, an α-naphthoylamino group, and a β-naphthoylamino group.

When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c1} further have a substituent, the substituent includes an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a carbon atom. A monoalkylamino group having a saturated aliphatic acyl group having a number of 2 to 7, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, and an alkyl group having 1 to 6 carbon atoms. , Dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, halogen, nitro group, cyano group and the like. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c1} further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, but 1 to 4 is preferable. When ^{the phenyl group, the naphthyl group, and the heterocyclyl group contained in R c1} have a plurality of substituents, the plurality of substituents may be the same or different.

Among R ^c1 , alkyl groups having 1 to 6 carbon atoms and 1 to 1 carbon atoms have an alkyl group having 1 to 6 carbon atoms and 1 to 6 carbon atoms because they are chemically stable, have few steric obstacles, and facilitate the synthesis of an oxime ester compound. A group selected from the group consisting of an alkoxy group of 6 and a saturated aliphatic acyl group having 2 to 7 carbon atoms is preferable, an alkyl having 1 to 6 carbon atoms is more preferable, and a methyl group is particularly preferable.

Position R ^c1 is bonded to the phenyl group, the phenyl group R ^c1 are attached the position of the bond to the main chain of the phenyl group and the oxime ester compound as a 1-position, if the 2-position of the position of the methyl group In addition, the 4th or 5th position is preferable, and the 5th position is more preferable. Further, n1 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1.

R ^c2 is a phenyl group which may have a substituent or a carbazolyl group which may have a substituent. When R ^c2 is a carbazolyl group which may have a substituent, the nitrogen atom on the carbazolyl group may be substituted with an alkyl group having 1 to 6 carbon atoms.

In R ^c2 , the substituent contained in the phenyl group or the carbazolyl group is not particularly limited as long as it does not impair the object of the present invention. Examples of suitable substituents that the phenyl group or carbazolyl group may have on the carbon atom include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and 3 carbon atoms. Cycloalkyl group of 10 to 10, cycloalkoxy group of 3 to 10 carbon atoms, saturated aliphatic acyl group of 2 to 20 carbon atoms, alkoxycarbonyl group of 2 to 20 carbon atoms, saturation of 2 to 20 carbon atoms An aliphatic acyloxy group, a phenyl group which may have a substituent, a phenoxy group which may have a substituent, a phenylthio group which may have a substituent, a benzoyl group which may have a substituent, and a substituent. It may have a phenoxycarbonyl group which may have a group, a benzoyloxy group which may have a substituent, a phenylalkyl group which may have a substituent and has 7 to 20 carbon atoms, and a substituent. A naphthyl group, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, and a naphthoyloxy group which may have a substituent. , A naphthylalkyl group having 11 to 20 carbon atoms which may have a substituent, a heterocyclyl group which may have a substituent, a heterocyclylcarbonyl group which may have a substituent, an amino group, 1, or 2 Examples thereof include an amino group substituted with an organic group, a morpholin-1-yl group, a piperazine-1-yl group, a halogen, a nitro group, a cyano group and the like.

When R ^c2 is a carbazolyl group, examples of suitable substituents that the carbazolyl group may have on the nitrogen atom include an alkyl group having 1 to 20 carbon atoms and a cycloalkyl group having 3 to 10 carbon atoms. , Saturated aliphatic acyl group having 2 to 20 carbon atoms, alkoxycarbonyl group having 2 to 20 carbon atoms, phenyl group which may have a substituent, benzoyl group which may have a substituent, and a substituent. A phenoxycarbonyl group may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, and a naphthoyl group which may have a substituent. It has a naphthoxycarbonyl group which may have a substituent, a naphthylalkyl group which may have a substituent and has 11 to 20 carbon atoms, a heterocyclyl group which may have a substituent, and a substituent. A good heterocyclylcarbonyl group and the like can be mentioned. Among these substituents, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.

Specific examples of the substituent which the phenyl group or the carbazolyl group may have are an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, and a substituent. For phenylalkyl groups which may have groups, naphthylalkyl groups which may have substituents, heterocyclyl groups which may have substituents, and amino groups substituted with one or two organic groups. , R ^c1 .

In R ^c2 , an alkyl group having 1 to 6 carbon atoms is an example of a substituent when the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituent of the phenyl group or the carbazolyl group further have a substituent. An alkoxy group having 1 to 6 carbon atoms; a saturated aliphatic acyl group having 2 to 7 carbon atoms; an alkoxycarbonyl group having 2 to 7 carbon atoms; a saturated aliphatic acyloxy group having 2 to 7 carbon atoms; a phenyl group. Naftyl group; benzoyl group; naphthoyl group; benzoyl substituted with a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, and a phenyl group. Group; Monoalkylamino group having an alkyl group with 1 to 6 carbon atoms; Dialkylamino group with an alkyl group with 1 to 6 carbon atoms; Morphorin-1-yl group; Piperazin-1-yl group; Halogen; Nitro Group; cyano group can be mentioned. When the phenyl group, the naphthyl group, and the heterocyclyl group contained in the substituent of the phenyl group or the carbazolyl group further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired. 1 to 4 are preferable. When the phenyl group, the naphthyl group, and the heterocyclyl group have a plurality of substituents, the plurality of substituents may be the same or different.

Among R ^c2, the group represented by the following formula (c2) or (c3) is preferable, and the group represented by the following formula (c2) is more preferable, from the viewpoint that a photopolymerization initiator having excellent sensitivity can be easily obtained. , A group represented by the following formula (c2) in which A is S is particularly preferable.

（Ｒ^ｃ４は、１価の有機基、アミノ基、ハロゲン、ニトロ基、及びシアノ基からなる群より選択される基であり、ＡはＳ又はＯであり、ｎ３は、０〜４の整数である。）

(R ^c4 is a group selected from the group consisting of a monovalent organic group, an amino group, a halogen, a nitro group, and a cyano group, A is S or O, and n3 is an integer of 0 to 4. is there.)

（Ｒ^ｃ５及びＲ^ｃ６は、それぞれ、１価の有機基である。）

(R ^c5 and R ^c6 are monovalent organic groups, respectively.)

^{When R c4} in the formula (c2) is an organic group, it can be selected from various organic groups as long as the object of the present invention is not impaired. ^{A preferred example of the case where R c4} is an organic group in the formula (c2) is an alkyl group having 1 to 6 carbon atoms; an alkoxy group having 1 to 6 carbon atoms; a saturated aliphatic group having 2 to 7 carbon atoms. Acyl group; alkoxycarbonyl group with 2 to 7 carbon atoms; saturated aliphatic acyloxy group with 2 to 7 carbon atoms; phenyl group; naphthyl group; benzoyl group; naphthoyl group; alkyl group with 1 to 6 carbon atoms, morpholin A benzoyl group substituted with a group selected from the group consisting of a -1-yl group, a piperazin-1-yl group, and a phenyl group; a monoalkylamino group having an alkyl group having 1 to 6 carbon atoms; a monoalkylamino group having 1 to 6 carbon atoms; Examples thereof include a dialkylamino group having an alkyl group of 1 to 6; a morpholin-1-yl group; a piperazin-1-yl group; a halogen; a nitro group; a cyano group.

In R ^c4 , it is substituted with a group selected from the group consisting of a benzoyl group; a naphthoyl group; an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazine-1-yl group, and a phenyl group. Benzoyl group; nitro group is preferable, benzoyl group; naphthoyl group; 2-methylphenylcarbonyl group; 4- (piperazin-1-yl) phenylcarbonyl group; 4- (phenyl) phenylcarbonyl group is more preferable.

Further, in the formula (c2), n3 is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1. If n3 is 1, binding position of R ^c4, to the bond to the phenyl group R ^c4 is bonded is bonded to an oxygen atom or a sulfur atom, it is preferably in the para position.

^{R c5} in the formula (c3) can be selected from various organic groups as long as the object of the present invention is not impaired. Preferable examples of R ^c5 are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a saturated aliphatic acyl group having 2 to 20 carbon atoms, and 2 to 20 carbon atoms. An alkoxycarbonyl group, a phenyl group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a carbon atom number 7 which may have a substituent. It may have a phenylalkyl group of ~ 20, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthoxycarbonyl group which may have a substituent, and a substituent. Examples thereof include a naphthylalkyl group having 11 to 20 carbon atoms, a heterocyclyl group which may have a substituent, and a heterocyclylcarbonyl group which may have a substituent.

Among R ^c5 , an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 6 carbon atoms is more preferable, and an ethyl group is particularly preferable.

^{R c6} in the formula (c3) is not particularly limited as long as it does not impair the object of the present invention, and can be selected from various organic groups. Specific examples of a group suitable as R ^c6 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent. Heterocyclyl groups may be mentioned. Among these groups, a phenyl group which may have a substituent is more preferable as R ^{c6, and a 2-methylphenyl group is particularly preferable.}

When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c4} , R ^c5 , or R ^c6 further have a substituent, the substituent includes an alkyl group having 1 to 6 carbon atoms and 1 to 1 carbon atoms. An alkoxy group of 6, a saturated aliphatic acyl group having 2 to 7 carbon atoms, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, and an alkyl having 1 to 6 carbon atoms. Examples thereof include a monoalkylamino group having a group, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, and a cyano group. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c4} , R ^c5 , or R ^c6 further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired. 1 to 4 are preferable. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c4} , R ^c5 , or R ^c6 has a plurality of substituents, the plurality of substituents may be the same or different.

^{R c3} in the formula (c1) is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As R ^c3 , a methyl group or an ethyl group is preferable, and a methyl group is more preferable.

Among the oxime ester compounds represented by the formula (c1), the following PI-1 to PI-42 are particularly suitable compounds.

An oxime ester compound represented by the following formula (c4) is also preferable as a photopolymerization initiator.

（Ｒ^ｃ７は水素原子、ニトロ基又は１価の有機基であり、Ｒ^ｃ８及びＲ^ｃ９は、それぞれ、置換基を有してもよい鎖状アルキル基、置換基を有してもよい環状有機基、又は水素原子であり、Ｒ^ｃ８とＲ^ｃ９とは相互に結合して環を形成してもよく、Ｒ^ｃ１０は１価の有機基であり、Ｒ^ｃ１１は、水素原子、置換基を有してもよい炭素原子数１〜１１のアルキル基、又は置換基を有してもよいアリール基であり、ｎ４は０〜４の整数であり、ｎ５は０又は１である。）

(R ^c7 is a hydrogen atom, a nitro group or a monovalent organic group, and R ^c8 and R ^c9 are a chain alkyl group which may have a substituent and a cyclic organic group which may have a substituent, respectively. It is a group or a hydrogen atom, and R ^c8 and R ^c9 may be bonded to each other to form a ring, R ^c10 is a monovalent organic group, and R ^c11 has a hydrogen atom and a substituent. It is an alkyl group having 1 to 11 carbon atoms or an aryl group which may have a substituent, n4 is an integer of 0 to 4, and n5 is 0 or 1.)

Here, as the oxime compound for producing the oxime ester compound of the formula (c4), the compound represented by the following formula (c5) is suitable.

（Ｒ^ｃ７、Ｒ^ｃ８、Ｒ^ｃ９、Ｒ^ｃ１０、ｎ４、及びｎ５は、式（ｃ４）と同様である。）

(R ^c7 , R ^c8 , R ^c9 , R ^c10 , n4, and n5 are the same as in the formula (c4).)

In formulas (c4) and (c5), R ^c7 is a hydrogen atom, a nitro group or a monovalent organic group. R ^c7 is attached to a 6-membered aromatic ring on the fluorene ring in the formula (c4), which is different from the 6-membered aromatic ring attached to the group represented by _{− (CO) n5-.} In the formula (c4), the ^{binding position of R c7} with respect to the fluorene ring is not particularly limited. When the compound represented by the formula (c4) has 1 or more R ^{c7 , one of the 1 or more R c7} is a fluorene ring because the compound represented by the formula (c4) can be easily synthesized. It is preferable to bind to the 2-position of the inside. If R ^c7 is more, a plurality of R ^c7 is independently in may be the same or different.

When R ^c7 is an organic group, R ^c7 is not particularly limited as long as it does not interfere with the object of the present invention, and is appropriately selected from various organic groups. Preferable examples of the case where R ^c7 is an organic group include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, a saturated aliphatic acyloxy group, an alkoxycarbonyl group and a substituent. A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a benzoyloxy which may have a substituent. A group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, and a substituent. It has a naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent. Examples thereof include a heterocyclylcarbonyl group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like.

When R ^c7 is an alkyl group, the number of carbon atoms of the alkyl group is preferably 1 to 20, more preferably 1 to 6. When R ^c7 is an alkyl group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c7 is an alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group and an n-pentyl group. , Isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, Examples thereof include an n-decyl group and an isodecyl group. When R ^c7 is an alkyl group, the alkyl group may contain an ether bond (−O−) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ^c7 is an alkoxy group, the number of carbon atoms of the alkoxy group is preferably 1 to 20, more preferably 1 to 6. When R ^c7 is an alkoxy group, it may be a straight chain or a branched chain. Specific examples of the case where R ^c7 is an alkoxy group include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, a tert-butyloxy group and n. -Pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec-octyloxy group , Trt-octyloxy group, n-nonyloxy group, isononyloxy group, n-decyloxy group, isodecyloxy group and the like. When R ^c7 is an alkoxy group, the alkoxy group may contain an ether bond (−O−) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include methoxyethoxy group, ethoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, propyloxyethoxyethoxy group, methoxypropyloxy group and the like.

When R ^c7 is a cycloalkyl group or a cycloalkoxy group, the number of carbon atoms of the cycloalkyl group or the cycloalkoxy group is preferably 3 to 10 and more preferably 3 to 6. Specific examples of the case where R ^c7 is a cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like. Specific examples of the case where R ^c7 is a cycloalkoxy group include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, a cyclooctyloxy group and the like.

When R ^c7 is a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the number of carbon atoms of the saturated aliphatic acyl group or the saturated aliphatic acyloxy group is preferably 2 to 21, more preferably 2 to 7. Specific examples of the case where R ^c7 is a saturated aliphatic acyl group include an acetyl group, a propanoyl group, an n-butanoyl group, a 2-methylpropanoyl group, an n-pentanoyl group, a 2,2-dimethylpropanoyl group and n. -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca Examples thereof include a noyl group and an n-hexadecanoyl group. Specific examples of the case where R ^c7 is a saturated aliphatic acyloxy group include an acetyloxy group, a propanoyloxy group, an n-butanoyloxy group, a 2-methylpropanoyloxy group, an n-pentanoyloxy group, and 2, 2-Dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group, n -Dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, n-hexadecanoyloxy group and the like can be mentioned.

When R ^c7 is an alkoxycarbonyl group, the number of carbon atoms of the alkoxycarbonyl group is preferably 2 to 20, more preferably 2 to 7. Specific examples of the case where R ^c7 is an alkoxycarbonyl group include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propyloxycarbonyl group, an isopropyloxycarbonyl group, an n-butyloxycarbonyl group, an isobutyloxycarbonyl group, and sec-butyl. Oxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group Group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, isononyloxycarbonyl group, n-decyloxycarbonyl group, and Examples thereof include an isodecyloxycarbonyl group.

When R ^c7 is a phenylalkyl group, the number of carbon atoms of the phenylalkyl group is preferably 7 to 20, more preferably 7 to 10. When R ^c7 is a naphthylalkyl group, the number of carbon atoms of the naphthylalkyl group is preferably 11 to 20, more preferably 11 to 14. Specific examples of the case where R ^c7 is a phenylalkyl group include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. Specific examples of the case where R ^c7 is a naphthylalkyl group include α-naphthylmethyl group, β-naphthylmethyl group, 2- (α-naphthyl) ethyl group, and 2- (β-naphthyl) ethyl group. .. When R ^c7 is a phenylalkyl group or a naphthylalkyl group, ^Rc7 may further have a substituent on the phenyl group or the naphthyl group.

When R ^c7 is a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, or the monocycles are fused together, or the monocycle and the benzene ring are condensed. Heterocyclyl group. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrol, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxalin, piperazine, piperazine, morpholine, piperidine, tetrahydropyran, tetrahydrofuran and the like. Be done. When R ^c7 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When R ^c7 is a heterocyclyl carbonyl group, the heterocyclyl group contained in the heterocyclyl carbonyl group is the same as when R ^c7 is a heterocyclyl group.

When R ^c7 is an amino group substituted with 1 or 2 organic groups, suitable examples of the organic group are an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, and a carbon atom. Saturated aliphatic acyl group of number 2 to 21, phenyl group which may have a substituent, benzoyl group which may have a substituent, phenylalkyl which may have a substituent and may have 7 to 20 carbon atoms. Examples thereof include a group, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, a naphthylalkyl group which may have a substituent and has 11 to 20 carbon atoms, and a heterocyclyl group. .. Specific examples of these suitable organic groups are the same as for R ^c7 . Specific examples of the amino group substituted with the organic group 1 or 2 include a methylamino group, an ethylamino group, a diethylamino group, an n-propylamino group, a di-n-propylamino group, an isopropylamino group, and an n-. Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naftylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- Examples thereof include a decanoylamino group, a benzoylamino group, an α-naphthoylamino group, and a β-naphthoylamino group.

When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c7} further have a substituent, the substituents include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a carbon atom. A monoalkylamino group having a saturated aliphatic acyl group having a number of 2 to 7, an alkoxycarbonyl group having 2 to 7 carbon atoms, a saturated aliphatic acyloxy group having 2 to 7 carbon atoms, and an alkyl group having 1 to 6 carbon atoms. , Dialkylamino group having an alkyl group having 1 to 6 carbon atoms, morpholin-1-yl group, piperazin-1-yl group, halogen, nitro group, cyano group and the like. When ^{the phenyl group, naphthyl group, and heterocyclyl group contained in R c7} further have a substituent, the number of the substituent is not limited as long as the object of the present invention is not impaired, but 1 to 4 is preferable. When ^{the phenyl group, the naphthyl group, and the heterocyclyl group contained in R c7} have a plurality of substituents, the plurality of substituents may be the same or different.

Among the groups described above, as R ^c7 , a nitro group or ^{a group represented by R c12-} CO- tends to improve the sensitivity and is preferable. R ^c12 is not particularly limited as long as it does not interfere with the object of the present invention, and can be selected from various organic groups. Examples of suitable groups as R ^c12 include an alkyl group having 1 to 20 carbon atoms, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, and a substituent. A good heterocyclyl group is mentioned. Among these groups, 2-methylphenyl group, thiophen-2-yl group, and α-naphthyl group are particularly preferable as R ^c12.
Further, when R ^c7 is a hydrogen atom, the transparency tends to be good, which is preferable. If R ^c7 is a hydrogen atom and R ^c10 is a group represented by the formula (c4a) or (c4b) described later, the transparency tends to be better.

In the formula (c4), R ^c8 and R ^c9 are a chain alkyl group which may have a substituent, a cyclic organic group which may have a substituent, or a hydrogen atom, respectively. R ^c8 and R ^c9 may be coupled to each other to form a ring. Among these groups, as R ^c8 and R ^c9 , a chain alkyl group which may have a substituent is preferable. When R ^c8 and R ^c9 are chain alkyl groups which may have a substituent, the chain alkyl group may be a straight chain alkyl group or a branched chain alkyl group.

When R ^c8 and R ^c9 are chain alkyl groups having no substituent, the number of carbon atoms of the chain alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. Specific examples of cases where R ^c8 and R ^c9 are chain alkyl groups include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. , N-Pentyl group, Isopentyl group, sec-Pentyl group, tert-Pentyl group, n-Hexyl group, n-Heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl Examples thereof include a group, an isononyl group, an n-decyl group, and an isodecyl group. Further, when R ^c8 and R ^c9 are alkyl groups, the alkyl group may contain an ether bond (−O−) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, a methoxypropyl group and the like.

When R ^c8 and R ^c9 are chain alkyl groups having a substituent, the number of carbon atoms of the chain alkyl group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 6. In this case, the number of carbon atoms of the substituent is not included in the number of carbon atoms of the chain alkyl group. The chain alkyl group having a substituent is preferably linear.
The substituent which the alkyl group may have is not particularly limited as long as it does not impair the object of the present invention. Preferable examples of the substituent include a cyano group, a halogen atom, a cyclic organic group, and an alkoxycarbonyl group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Among these, a fluorine atom, a chlorine atom and a bromine atom are preferable. Examples of the cyclic organic group include a cycloalkyl group, an aromatic hydrocarbon group, and a heterocyclyl group. Specific examples of the cycloalkyl group are the same as in the preferred example when ^{R c7 is a cycloalkyl group.} Specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like. Specific examples of the heterocyclyl group are the same as in the preferred example when ^{R c7 is a heterocyclyl group.} When R ^c7 is an alkoxycarbonyl group, the alkoxy group contained in the alkoxycarbonyl group may be linear or branched, preferably linear. The number of carbon atoms of the alkoxy group contained in the alkoxycarbonyl group is preferably 1 to 10, and more preferably 1 to 6.

When the chain alkyl group has a substituent, the number of the substituent is not particularly limited. The number of preferred substituents depends on the number of carbon atoms in the chain alkyl group. The number of substituents is typically 1-20, preferably 1-10, more preferably 1-6.

When R ^c8 and R ^c9 are cyclic organic groups, the cyclic organic group may be an alicyclic group or an aromatic group. Examples of the cyclic organic group include an aliphatic cyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclyl group. When R ^c8 and R ^c9 are cyclic organic groups, the substituents that the cyclic organic group may have are the same as when R ^c8 and R ^c9 are chain alkyl groups.

When R ^c8 and R ^c9 are aromatic hydrocarbon groups, whether the aromatic hydrocarbon group is a phenyl group or a group formed by bonding a plurality of benzene rings via a carbon-carbon bond. , It is preferable that the group is formed by condensing a plurality of benzene rings. When the aromatic hydrocarbon group is a phenyl group or a group formed by bonding or condensing a plurality of benzene rings, the number of rings of the benzene ring contained in the aromatic hydrocarbon group is not particularly limited. 3 or less is preferable, 2 or less is more preferable, and 1 is particularly preferable. Preferred specific examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, a phenanthryl group and the like.

When R ^c8 and R ^c9 are aliphatic cyclic hydrocarbon groups, the aliphatic cyclic hydrocarbon group may be monocyclic or polycyclic. The number of carbon atoms of the aliphatic cyclic hydrocarbon group is not particularly limited, but is preferably 3 to 20, and more preferably 3 to 10. Examples of monocyclic cyclic hydrocarbon groups include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, Examples thereof include a tetracyclododecyl group and an adamantyl group.

When R ^c8 and R ^c9 are heterocyclyl groups, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, O, such monocycles, or such monocyclic and benzene rings. Is a heterocyclyl group condensed with. When the heterocyclyl group is a fused ring, the number of rings is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. Examples of the heterocycle constituting such a heterocyclyl group include furan, thiophene, pyrrol, oxazole, isooxazole, thiazole, thiadiazol, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, and indol. Isoindole, indridin, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxalin, piperazine, piperazine, morpholine, piperidine, tetrahydropyran, tetrahydrofuran and the like. Be done.

R ^c8 and R ^c9 may be coupled to each other to form a ring. The group consisting of the ring formed by ^{R c8} and R ^{c9 is preferably a cycloalkylidene group.} When R ^c8 and R ^c9 are combined to form a cycloalkylidene group, the ring constituting the cycloalkylidene group is preferably a 5-membered ring to a 6-membered ring, and more preferably a 5-membered ring.

When ^{the group formed by combining R c8} and R ^c9 is a cycloalkylidene group, the cycloalkylidene group may be condensed with one or more other rings. Examples of rings that may be fused with a cycloalkylene group include a benzene ring, a naphthalene ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a furan ring, a thiophene ring, a pyrrole ring, and a pyridine. Rings, pyrazine rings, pyrimidine rings and the like can be mentioned.

Examples of suitable groups among ^{R c8} and R ^c9 described above include groups represented by the ^{formula −A 1} −A ^2. In the formula, A ¹ is a linear alkylene group, and A ² is an alkoxy group, a cyano group, a halogen atom, an alkyl halide group, a cyclic organic group, or an alkoxycarbonyl group.

The ^{number of carbon atoms of the linear alkylene group of A 1} is preferably 1 to 10, and more preferably 1 to 6. When A ² is an alkoxy group, the alkoxy group may be linear or branched, preferably linear. The number of carbon atoms of the alkoxy group is preferably 1 to 10, and more preferably 1 to 6. When A ² is a halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom, a chlorine atom and a bromine atom are more preferable. When A ² is an alkyl halide group, the halogen atom contained in the alkyl halide group is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom. The alkyl halide group may be linear or branched, preferably linear. When A ² is a cyclic organic group, examples of the cyclic organic group are the same as those of the cyclic organic group that ^{R c8} and R ^{c9 have as substituents.} When A ² is an alkoxycarbonyl group, examples of alkoxycarbonyl groups are similar to the alkoxycarbonyl groups that ^{R c8} and R ^{c9 have as substituents.}

Preferable specific examples of R ^c8 and R ^c9 are alkyl groups such as ethyl group, n-propyl group, n-butyl group, n-hexyl group, n-heptyl group, and n-octyl group; 2-methoxyethyl. Group, 3-methoxy-n-propyl group, 4-methoxy-n-butyl group, 5-methoxy-n-pentyl group, 6-methoxy-n-hexyl group, 7-methoxy-n-heptyl group, 8-methoxy -N-octyl group, 2-ethoxyethyl group, 3-ethoxy-n-propyl group, 4-ethoxy-n-butyl group, 5-ethoxy-n-pentyl group, 6-ethoxy-n-hexyl group, 7- Alkyl alkyl groups such as ethoxy-n-heptyl group and 8-ethoxy-n-octyl group; 2-cyanoethyl group, 3-cyano-n-propyl group, 4-cyano-n-butyl group, 5-cyano-n Cyanalkyl groups such as −pentyl group, 6-cyano-n-hexyl group, 7-cyano-n-heptyl group, and 8-cyano-n-octyl group; 2-phenylethyl group, 3-phenyl-n-propyl Phenyl such as group, 4-phenyl-n-butyl group, 5-phenyl-n-pentyl group, 6-phenyl-n-hexyl group, 7-phenyl-n-heptyl group, and 8-phenyl-n-octyl group. Alkyl group; 2-cyclohexylethyl group, 3-cyclohexyl-n-propyl group, 4-cyclohexyl-n-butyl group, 5-cyclohexyl-n-pentyl group, 6-cyclohexyl-n-hexyl group, 7-cyclohexyl-n -Heptyl group, 8-cyclohexyl-n-octyl group, 2-cyclopentylethyl group, 3-cyclopentyl-n-propyl group, 4-cyclopentyl-n-butyl group, 5-cyclopentyl-n-pentyl group, 6-cyclopentyl- Cycloalkylalkyl groups such as n-hexyl group, 7-cyclopentyl-n-heptyl group, and 8-cyclopentyl-n-octyl group; 2-methoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl group, 4-methoxy Carbonyl-n-butyl group, 5-methoxycarbonyl-n-pentyl group, 6-methoxycarbonyl-n-hexyl group, 7-methoxycarbonyl-n-heptyl group, 8-methoxycarbonyl-n-octyl group, 2-ethoxy Carbonyl ethyl group, 3-ethoxycarbonyl-n-propyl group, 4-ethoxycarbonyl-n-butyl group, 5-ethoxycarbonyl-n-pentyl group, 6-ethoxycarbonyl-n-hexyl group, 7-etoki An alkoxycarbonylalkyl group such as a sicarbonyl-n-heptyl group and an 8-ethoxycarbonyl-n-octyl group; 2-chloroethyl group, 3-chloro-n-propyl group, 4-chloro-n-butyl group, 5- Chloro-n-pentyl group, 6-chloro-n-hexyl group, 7-chloro-n-heptyl group, 8-chloro-n-octyl group, 2-bromoethyl group, 3-bromo-n-propyl group, 4- Bromo-n-butyl group, 5-bromo-n-pentyl group, 6-bromo-n-hexyl group, 7-bromo-n-heptyl group, 8-bromo-n-octyl group, 3,3,3-tri Examples thereof include a fluoropropyl group and an alkyl halide group such as 3,3,4,4,5,5,5-heptafluoro-n-pentyl group.

As R ^c8 and R ^c9 , the preferred groups among the above are ethyl group, n-propyl group, n-butyl group, n-pentyl group, 2-methoxyethyl group, 2-cyanoethyl group, 2-phenylethyl group, 2-Cyclohexylethyl group, 2-methoxycarbonylethyl group, 2-chloroethyl group, 2-bromoethyl group, 3,3,3-trifluoropropyl group, and 3,3,4,5,5,5-hepta It is a fluoro-n-pentyl group.

Examples of suitable organic groups for R ^c10 include alkyl groups, alkoxy groups, cycloalkyl groups, cycloalkoxy groups, saturated aliphatic acyl groups, alkoxycarbonyl groups, saturated aliphatic acyloxy groups and substituents ^{, as in R c7.} A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent. A good benzoyloxy group, a phenylalkyl group which may have a substituent, a naphthyl group which may have a substituent, a naphthoxy group which may have a substituent, a naphthoyl group which may have a substituent, A naphthoxycarbonyl group which may have a substituent, a naphthyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, and a substituent. Examples thereof include a heterocyclylcarbonyl group which may have a group, an amino group substituted with one or two organic groups, a morpholin-1-yl group, a piperazine-1-yl group and the like. Specific examples of these groups are similar to those described for ^{R c7.} Further, as R ^c10 , a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring are also preferable. The substituents that the phenoxyalkyl group and the phenylthioalkyl group may have are the same as the substituents that the phenyl group contained ^{in R c7 may have.}

Among the organic groups, R ^c10 includes an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, and a phenylthio which may have a substituent on the aromatic ring. Alkyl groups are preferred. As the alkyl group, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 4 carbon atoms is particularly preferable, and a methyl group is most preferable. Among the phenyl groups that may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 to 10, more preferably 5 to 8, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 to 8, more preferably 1 to 4, and particularly preferably 2. Among the cycloalkylalkyl groups, a cyclopentylethyl group is preferable. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 to 8, more preferably 1 to 4, and particularly preferably 2. Among the phenylthioalkyl groups that may have a substituent on the aromatic ring, a 2- (4-chlorophenylthio) ethyl group is preferable.

^As the ^{R c10,} a group represented by -A 3 ^{-CO-O-A 4} are also preferred. A ³ is a divalent organic group, preferably a divalent hydrocarbon group, and preferably an alkylene group. A ⁴ is a monovalent organic group, preferably a monovalent hydrocarbon group.

When A ³ is an alkylene group, the alkylene group may be linear or branched, preferably linear. When A ³ is an alkylene group, the number of carbon atoms of the alkylene group is preferably 1 to 10, more preferably 1 to 6, and particularly preferably 1 to 4.

Preferred examples of A ⁴ is an alkyl group having 1 to 10 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. Specific preferable examples of A ⁴ is methyl group, ethyl group, n- propyl group, an isopropyl group, n- butyl group, isobutyl group, sec- butyl group, tert- butyl group, n- pentyl group, n- hexyl Examples thereof include a group, a phenyl group, a naphthyl group, a benzyl group, a phenethyl group, an α-naphthylmethyl group, a β-naphthylmethyl group and the like.

Preferable specific examples of the group represented by −A ³ −CO—O—A ⁴ include 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-n-propyloxycarbonylethyl group, 2-n. -Butyloxycarbonylethyl group, 2-n-pentyloxycarbonylethyl group, 2-n-hexyloxycarbonylethyl group, 2-benzyloxycarbonylethyl group, 2-phenoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl Group, 3-ethoxycarbonyl-n-propyl group, 3-n-propyloxycarbonyl-n-propyl group, 3-n-butyloxycarbonyl-n-propyl group, 3-n-pentyloxycarbonyl-n-propyl group , 3-n-hexyloxycarbonyl-n-propyl group, 3-benzyloxycarbonyl-n-propyl group, 3-phenoxycarbonyl-n-propyl group and the like.

（式（ｃ４ａ）及び（ｃ４ｂ）中、Ｒ^ｃ１３及びＲ^ｃ１４はそれぞれ有機基であり、ｎ６は０〜４の整数であり、Ｒ^ｃ１３及びＲ^８がベンゼン環上の隣接する位置に存在する場合、Ｒ^ｃ１３とＲ^ｃ１４とが互いに結合して環を形成してもよく、ｎ７は１〜８の整数であり、ｎ８は１〜５の整数であり、ｎ９は０〜（ｎ８＋３）の整数であり、Ｒ^ｃ１５は有機基である。） ^Having described ^{R c10,} as the ^{R c10,} preferably a group represented by the following formula (C4a) or (C4b).

(In formulas (c4a) and (c4b), R ^c13 and R ^c14 are organic groups, respectively, n6 is an integer of 0 to 4, and R ^c13 and R ⁸ are present at adjacent positions on the benzene ring. , R ^c13 and R ^c14 may be combined with each other to form a ring, n7 is an integer of 1 to 8, n8 is an integer of 1 to 5, and n9 is an integer of 0 to (n8 + 3). ^Yes , R c15 is an organic group.)

Examples of organic groups for ^{R c13} and R ^{c14 in} formula (c4a) are similar to ^{R c7.} As R ^c13 , an alkyl group or a phenyl group is preferable. When R ^c13 is an alkyl group, the number of carbon atoms thereof is preferably 1 to 10, more preferably 1 to 5, particularly preferably 1 to 3, and most preferably 1. That is, R ^c13 is most preferably a methyl group. When R ^c13 and R ^c14 combine to form a ring, the ring may be an aromatic ring or an aliphatic ring. Preferable examples of the group represented by the formula (c4a) in which R ^c13 and R ^c14 form a ring include a naphthalene-1-yl group and 1,2,3,4-. Examples thereof include a tetrahydronaphthalene-5-yl group. In the above formula (c4a), n6 is an integer of 0 to 4, preferably 0 or 1, and more preferably 0.

In the above formula (c4b), R ^c15 is an organic group. ^Examples of the organic group include groups similar to the organic group described for R c7. Among the organic groups, an alkyl group is preferable. The alkyl group may be linear or branched. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and particularly preferably 1 to 3. As R ^c15 , a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group and the like are preferably exemplified, and among these, a methyl group is more preferable.

In the above formula (c4b), n8 is an integer of 1 to 5, preferably an integer of 1 to 3, and more preferably 1 or 2. In the above formula (c4b), n9 is 0 to (n8 + 3), an integer of 0 to 3 is preferable, an integer of 0 to 2 is more preferable, and 0 is particularly preferable. In the above formula (c4b), n7 is an integer of 1 to 8, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, and particularly preferably 1 or 2.

In the formula (c4), R ^c11 is a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. As the ^{substituent which may be possessed when R c11} is an alkyl group, a phenyl group, a naphthyl group and the like are preferably exemplified. Further, ^{as the substituent which may be possessed when R c7} is an aryl group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, a halogen atom and the like are preferably exemplified.

In the formula (c4), as R ^c11 , a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a phenyl group, a benzyl group, a methylphenyl group, a naphthyl group and the like are preferably exemplified. Of these, a methyl group or a phenyl group is more preferable.

The compound represented by the formula (c4) has an oxime group (> C = N-OH) contained in the compound represented by the above formula (c5) represented by> C = NO-COR ^c11. Manufactured by a method comprising the step of converting to an oxime ester group. R ^c11 are the same as ^{R c11} in formula (c4).

The conversion of the oxime group (> C = N-OH) ^{to the oxime ester group represented by> C = NO-COR c11} is carried out by using the compound represented by the above formula (c5) and an acylating agent. It is done by reacting.
The acylating agent to give the acyl group represented by -COR ^{c11, (R c11} _CO) or an acid anhydride represented by ₂ ^O, R c11 COHal (Hal is a halogen atom) include acid halide represented by Be done.

Preferable specific examples of the compound represented by the formula (c4) include the following PI-43 to PI-83.

The content of the photopolymerization initiator (C) is preferably 0.5 to 30% by mass, more preferably 1 to 20% by mass, based on the total mass of the solid content of the photosensitive resin composition. .. By setting the content of the photopolymerization initiator (C) in the above range, it is possible to obtain a photosensitive resin composition in which defects in the pattern shape are unlikely to occur.

Moreover, you may combine (C) a photopolymerization initiator with a photoinitiator aid. Photoinitiator aids include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminobenzoate 2-. Ethylhexyl, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9, 10-Diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2-mercapto-5-methoxybenzothiazole, 3-mercaptopropion Examples thereof include thiol compounds such as acid, methyl 3-mercaptopropionate, pentaeristol tetramercaptoacetate and 3-mercaptopropionate. These photoinitiator aids can be used alone or in combination of two or more.

<(D) Pigment>
The photosensitive resin composition contains (D) pigment. The pigment (D) is not particularly limited, but for example, a compound classified as Pigment in the Color Index (CI; The Society of Dyers and Colorists), specifically, the following. Those with a color index (CI) number such as, can be used.

Examples of preferably usable yellow pigments include C.I. I. Pigment Yellow 1 (hereinafter, "CI Pigment Yellow" is the same and only the number is described), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53. , 55, 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116 , 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180. , And 185.

Examples of preferably usable orange pigments include C.I. I. Pigment Orange 1 (hereinafter, "CI Pigment Orange" is the same and only the number is described), 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46. , 49, 51, 55, 59, 61, 63, 64, 71, and 73.

Examples of suitably usable purple pigments include C.I. I. Pigment Violet 1 (hereinafter, "CI Pigment Violet" is the same and only the number is described), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, and 50. Can be mentioned.

Examples of preferably usable red pigments include C.I. I. Pigment Red 1 (Hereinafter, "CI Pigment Red" is the same and only the number is described.) 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48: 1, 48: 2, 48: 3, 48: 4, 49: 1, 49: 2, 50: 1, 52: 1, 53: 1, 57, 57: 1, 57: 2, 58: 2, 58: 4, 60: 1, 63: 1, 63: 2, 64: 1, 81: 1, 83, 88, 90: 1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 192, 193, 194, 202, 206, 207, 208, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 242, 243, 245, 254, 255, 264, and 265.

Examples of preferably usable blue pigments include C.I. I. Pigment Blue 1 (hereinafter, "CI Pigment Blue" is the same, and only the number is described.) 2, 15, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64 , And 66.

Examples of pigments of the above other hues that can be suitably used include C.I. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Green 37 and other green pigments, C.I. I. Pigment Brown 23, C.I. I. Pigment Brown 25, C.I. I. Pigment Brown 26, C.I. I. Pigment Brown 28 and other brown pigments, C.I. I. Pigment Black 1, C.I. I. Examples thereof include black pigments such as Pigment Black 7.

Further, the photosensitive resin composition preferably contains a black pigment as the (D) pigment. By using a photosensitive resin composition containing a black pigment, a light-shielding property is imparted to the formed cured film. Therefore, the photosensitive resin composition containing a black pigment is suitably used for forming a black matrix or a black column spacer in a liquid crystal display panel, or forming a bank for partitioning a light emitting layer in an organic EL element.

Examples of black pigments include carbon black, perylene pigments, lactam pigments, titanium black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver and other metal oxides, composite oxides and metal sulfides. Various pigments can be mentioned regardless of organic or inorganic substances such as substances, metal sulfates or metal carbonates. Among these black pigments, carbon black is preferable because it is easily available and it is easy to form a cured film having excellent light-shielding properties and high electrical resistance.
The hue of the black pigment is not limited to black, which is an achromatic color in terms of color theory, and may be purplish black, bluish black, or reddish black.

As the carbon black, known carbon blacks such as channel black, furnace black, thermal black, and lamp black can be used. Further, resin-coated carbon black may be used.

As the carbon black, carbon black that has been subjected to a treatment for introducing an acidic group is also preferable. The acidic group introduced into carbon black is a functional group that exhibits acidity as defined by Bronsted. Specific examples of the acidic group include a carboxy group, a sulfonic acid group, a phosphoric acid group and the like. The acidic group introduced into the carbon black may form a salt. The cation forming the salt with the acidic group is not particularly limited as long as the object of the present invention is not impaired. Examples of the cation include various metal ions, cations of nitrogen-containing compounds, ammonium ions and the like, and alkali metal ions such as sodium ion, potassium ion and lithium ion, and ammonium ions are preferable.

Among the carbon blacks that have been subjected to the treatment for introducing the acidic groups described above, carboxylic acid groups and carboxylic acids are used from the viewpoint of achieving high resistance of the light-shielding cured film formed by using the photosensitive resin composition. Carbon black having one or more functional groups selected from the group consisting of a base, a sulfonic acid group, and a sulfonic acid base is preferable.

The method for introducing an acidic group into carbon black is not particularly limited. Examples of the method for introducing an acidic group include the following methods.
1) A method of introducing a sulfonic acid group into carbon black by a direct substitution method using concentrated sulfuric acid, fuming sulfuric acid, chlorosulfonic acid, etc., or an indirect substitution method using sulfite, hydrogen sulfite, etc.
2) A method of diazo-coupling an organic compound having an amino group and an acidic group with carbon black.
3) A method in which an organic compound having a halogen atom and an acidic group and carbon black having a hydroxyl group are reacted by Williamson's etherification method.
4) A method of reacting an organic compound having a halocarbonyl group and an acidic group protected by a protecting group with carbon black having a hydroxyl group.
5) A method of deprotecting carbon black after conducting a Friedel-Crafts reaction using an organic compound having a halocarbonyl group and an acidic group protected by a protecting group.

Among these methods, method 2) is preferable because the process of introducing an acidic group is easy and safe. As the organic compound having an amino group and an acidic group used in the method 2), a compound in which an amino group and an acidic group are bonded to an aromatic group is preferable. Examples of such compounds include aminobenzenesulfonic acids such as sulfanilic acid and aminobenzoic acids such as 4-aminobenzoic acid.

The number of moles of acidic groups introduced into carbon black is not particularly limited as long as the object of the present invention is not impaired. The number of moles of acidic groups introduced into carbon black is preferably 1 to 200 mmol, more preferably 5 to 100 mmol, based on 100 g of carbon black.

The carbon black into which the acidic group has been introduced may be coated with a resin.
When a photosensitive resin composition containing carbon black coated with a resin is used, it is easy to form a light-shielding cured film having excellent light-shielding properties and insulating properties and low surface reflectance. The coating treatment with the resin does not cause any adverse effect on the dielectric constant of the light-shielding cured film formed by using the photosensitive resin composition. Examples of resins that can be used for coating carbon black include thermosetting resins such as phenol resin, melamine resin, xylene resin, diallyl phthalate resin, glyptal resin, epoxy resin, and alkylbenzene resin, and polystyrene, polycarbonate, polyethylene terephthalate, and poly. Examples thereof include thermoplastic resins such as butylene terephthalate, modified polyphenylene oxide, polysulphon, polyparaphenylene terephthalamide, polyamideimide, polyimide, polyaminobismaleimide, polyether sulfopolyphenylensulphon, polyarylate, and polyether ether ketone. The amount of the resin coated on the carbon black is preferably 1 to 30% by mass with respect to the total of the mass of the carbon black and the mass of the resin.

Further, as the black pigment, a perylene-based pigment can also be preferably used. Specific examples of the perylene-based pigment include a perylene-based pigment represented by the following formula (d-1), a perylene-based pigment represented by the following formula (d-2), and a perylene-based pigment represented by the following formula (d-3). Perylene-based pigments can be mentioned. As commercial products, product names K0084 and K0083 manufactured by BASF, Pigment Black 21, 30, 31, 32, 33, 34, and the like can be preferably used as perylene-based pigments.

式（ｄ−１）中、Ｒ^ｄ１及びＲ^ｄ２は、それぞれ独立に炭素原子数１〜３のアルキレン基を表し、Ｒ^ｄ３及びＲ^ｄ４は、それぞれ独立に、水素原子、水酸基、メトキシ基、又はアセチル基を表す。

In the formula (d-1), R ^d1 and R ^d2 independently represent an alkylene group having 1 to 3 carbon atoms, and R ^d3 and R ^d4 independently represent a hydrogen atom, a hydroxyl group, a methoxy group, or a hydrogen atom, respectively. Represents an acetyl group.

式（ｄ−２）中、Ｒ^ｄ５及びＲ^ｄ６は、それぞれ独立に、炭素原子数１〜７のアルキレン基を表す。

In formula (d-2), R ^d5 and R ^d6 each independently represent an alkylene group having 1 to 7 carbon atoms.

式（ｄ−３）中、Ｒ^ｄ７及びＲ^ｄ８は、それぞれ独立に、水素原子、炭素原子数１〜２２のアルキル基であり、Ｎ，Ｏ、Ｓ、又はＰのヘテロ原子を含んでいてもよい。Ｒ^ｄ７及びＲ^ｄ８がアルキル基である場合、当該アルキル基は、直鎖状であっても、分岐鎖状であってもよい。

In formula (d-3), R ^d7 and R ^d8 are independent alkyl groups having a hydrogen atom and 1 to 22 carbon atoms, and may contain a heteroatom of N, O, S, or P, respectively. Good. When R ^d7 and R ^d8 are alkyl groups, the alkyl groups may be linear or branched.

The compound represented by the above formula (d-1), the compound represented by the formula (d-2), and the compound represented by the formula (d-3) are, for example, JP-A-62-1753. , No. 63-26784 can be synthesized by using the method described in Japanese Patent Publication No. 63-26784. That is, a heating reaction is carried out in water or an organic solvent using perylene-3,5,9,10-tetracarboxylic acid or its dianhydride or amines as raw materials. Then, the desired product can be obtained by reprecipitating the obtained crude product in sulfuric acid or recrystallizing it in water, an organic solvent or a mixed solvent thereof.

In order to satisfactorily disperse the perylene-based pigment in the photosensitive resin composition, the average particle size of the perylene-based pigment is preferably 10 to 1000 nm.

Further, the light-shielding agent may contain a lactam pigment. Examples of the lactam pigment include compounds represented by the following formula (d-4).

In formula (d-4), X ^d represents a double bond and is independently an E-form or Z-form as a geometric isomer, and R ^d9 is independently a hydrogen atom, a methyl group, a nitro group, or a methoxy. Group, bromine atom, chlorine atom, fluorine atom, carboxy group, or sulfo group, R ^d10 independently represents hydrogen atom, methyl group, or phenyl group, and R ^d11 independently represents hydrogen atom. , Methyl group, or chlorine atom.
The compound represented by the formula (d-4) can be used alone or in combination of two or more.
R ^d9 is preferably bonded to the 6-position of the dihydroindron ring because the compound represented by the formula (d-4) can be easily produced, and R ^d11 is bonded to the 4-position of the dihydroindron ring. It is preferable to do so. From the same viewpoint, R ^d9 , R ^d10 , and R ^d11 are preferably hydrogen atoms.
The compound represented by the formula (d-4) has an EE form, a ZZ form, and an EZ form as geometric isomers, but may be a single compound of any one of these, or these geometric isomers. May be a mixture of.
The compound represented by the formula (d-4) can be produced, for example, by the methods described in International Publication No. 2000/24736 and International Publication No. 2010/081624.

In order to satisfactorily disperse the lactam pigment in the photosensitive resin composition, the average particle size of the lactam pigment is preferably 10 to 1000 nm.

Further, fine particles containing a silver-tin (AgSn) alloy as a main component (hereinafter, referred to as "AgSn alloy fine particles") are also preferably used as the black pigment. The AgSn alloy fine particles may be mainly composed of the AgSn alloy, and may contain, for example, Ni, Pd, Au, etc. as other metal components.
The average particle size of the AgSn alloy fine particles is preferably 1 to 300 nm.

When the AgSn alloy is represented by the chemical formula AgxSn, the range of x in which a chemically stable AgSn alloy can be obtained is 1 ≦ x ≦ 10, and the range of x in which both chemical stability and blackness can be obtained at the same time is. 3 ≦ x ≦ 4.
Here, when the mass ratio of Ag in the AgSn alloy is obtained in the range of x above,
When x = 1, Ag / AgSn = 0.4762
When x = 3, 3.Ag / Ag3Sn = 0.7317
When x = 4, 4. Ag / Ag4Sn = 0.7843
When x = 10, 10 · Ag / Ag10Sn = 0.9008
Will be.
Therefore, this AgSn alloy becomes chemically stable when it contains 47.6 to 90% by mass of Ag, and is effective with respect to the amount of Ag when it contains 73.17 to 78.43% by weight of Ag. Chemical stability and blackness can be obtained.

The AgSn alloy fine particles can be produced by using a usual fine particle synthesis method. Examples of the fine particle synthesis method include a gas phase reaction method, a spray pyrolysis method, an atomizing method, a liquid phase reaction method, a freeze-drying method, and a hydrothermal synthesis method.

The AgSn alloy fine particles have high insulating properties, but depending on the application of the photosensitive resin composition, the surface may be covered with an insulating film in order to further improve the insulating properties. As a material for such an insulating film, a metal oxide or an organic polymer compound is suitable.
As the metal oxide, insulating metal oxides such as silicon oxide (silica), aluminum oxide (alumina), zirconium oxide (zirconia), ittrium oxide (itria), titanium oxide (titania) and the like are preferably used. Be done.
Further, as the organic polymer compound, a resin having an insulating property, for example, a polyimide, a polyether, a polyacrylate, a polyamine compound or the like is preferably used.

The thickness of the insulating film is preferably 1 to 100 nm, more preferably 5 to 50 nm in order to sufficiently enhance the insulating property of the surface of the AgSn alloy fine particles.
The insulating film can be easily formed by a surface modification technique or a surface coating technique. In particular, it is preferable to use an alkoxide such as tetraethoxysilane or aluminum triethoxyde because an insulating film having a uniform film thickness can be formed at a relatively low temperature.

As the black pigment, the above-mentioned perylene-based pigment, lactam-based pigment, and AgSn alloy fine particles may be used alone, or these may be used in combination.
In addition, the black pigment may contain a pigment having a hue such as red, blue, green, or yellow for the purpose of adjusting the color tone. The dye having another hue of the black pigment can be appropriately selected from known dyes. For example, as the pigment having another hue of the black pigment, the above-mentioned various pigments can be used. The amount of the black pigment used in other hues is preferably 15% by mass or less, more preferably 10% by mass or less, based on the total mass of the black pigment.

In order to uniformly disperse the pigment (D) described above in the photosensitive resin composition, a dispersant may be further used. As such a dispersant, it is preferable to use a polyethyleneimine-based, urethane resin-based, or acrylic resin-based polymer dispersant. In particular, when carbon black is used as the (D) pigment, it is preferable to use an acrylic resin-based dispersant as the dispersant.
In addition, corrosive gas due to the dispersant may be generated from the cured film. Therefore, it is also preferable that the pigment (D) is dispersed without using a dispersant.

Further, the inorganic pigment and the organic pigment may be used alone or in combination of two or more, but when they are used in combination, 10 to 80 parts by mass of the organic pigment is used with respect to 100 parts by mass of the total amount of the inorganic pigment and the organic pigment. It is preferable to use it in the range of 20 to 40 parts by mass, and it is more preferable to use it in the range of 20 to 40 parts by mass.

In the photosensitive resin composition, the pigment (D) may be used in combination with the dye. This dye may be appropriately selected from known materials.
Examples of dyes applicable to the photosensitive resin composition include azo dyes, metal complex salt azo dyes, anthraquinone dyes, triphenylmethane dyes, xanthene dyes, cyanine dyes, naphthoquinone dyes, quinoneimine dyes, methine dyes, phthalocyanine dyes and the like. Can be mentioned.
Further, these dyes can be raked (chlorinated) to be dispersed in an organic solvent or the like, and this can be used as the (D) pigment.
In addition to these dyes, for example, Japanese Patent Application Laid-Open No. 2013-225132, Japanese Patent Application Laid-Open No. 2014-178477, Japanese Patent Application Laid-Open No. 2013-137543, Japanese Patent Application Laid-Open No. 2011-38085, Japanese Patent Application Laid-Open No. 2014-197206, etc. The dyes and the like described can also be preferably used.

The amount of the pigment (D) used in the photosensitive resin composition can be appropriately selected within a range that does not impair the object of the present invention, and is typically 2 to 2 with respect to the total mass of the solid content of the photosensitive resin composition. It is preferably 75% by mass, more preferably 3 to 70% by mass.

The pigment (D) is preferably a dispersion liquid dispersed in the presence or absence of a dispersant at an appropriate concentration, and then added to the photosensitive resin composition.
In this specification, the amount of the pigment (D) used may be defined as a value including the present dispersant.

<(S) Organic solvent>
The photosensitive resin composition preferably contains (S) an organic solvent in order to improve the coatability and adjust the viscosity.

Specifically, the organic solvent (S) includes ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol mono. -N-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono- n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. (Poly) alkylene glycol monoalkyl ethers; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, etc. (Poly) alkylene glycol monoalkyl ether acetates; other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; 2- Lactate alkyl esters such as methyl hydroxypropionate and ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, Ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl -3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-butyl acetate, n-pentyl formate, i-pentyl acetate, benzyl acetate, n-butyl propionate , Ethyl butyrate, n-propyl butyrate, i-propyl butyrate, n-butyl butylate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl 2-oxobutanoate and the like. Esters; Aromatic hydrocarbons such as toluene and xylene; N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylisobutylamide, N, N-diethylacetamide , N, N-diethylformamide, N-methylcaprolactam, 1,3-dimethyl-2-imidazolidinone, pyridine, and nitrogen-containing polar organic solvents such as N, N, N', N'-tetramethylurea; etc. Can be mentioned.

Among these, alkylene glycol monoalkyl ethers, alkylene glycol monoalkyl ether acetates, the above-mentioned other ethers, lactic acid alkyl esters, and the above-mentioned other esters are preferable, and alkylene glycol monoalkyl ether acetates, the above-mentioned. Other ethers, other esters described above such as benzyl acetate are more preferred.
Further, it is also preferable that the (S) organic solvent contains a nitrogen-containing polar organic solvent in terms of the solubility of each component, the dispersibility of the (D) pigment, and the like. As the nitrogen-containing polar organic solvent, N, N, N', N'-tetramethylurea and the like can be used.
These solvents can be used alone or in combination of two or more.

The content of the organic solvent (S) is not particularly limited, and is a concentration that can be applied to a substrate or the like, and is appropriately set according to the coating film thickness. The viscosity of the photosensitive resin composition is preferably 5 to 500 cp, more preferably 10 to 50 cp, and even more preferably 20 to 30 cp. The solid content concentration is preferably 5 to 100% by mass, more preferably 15 to 50% by mass.

<Other ingredients>
The photosensitive resin composition may contain additives such as a surfactant, an adhesion improver, a thermal polymerization inhibitor, an antifoaming agent, and a silane coupling agent, if necessary. As any of the additives, conventionally known ones can be used.
The photosensitive resin composition preferably contains a silane coupling agent because it has a good shape and easily forms a cured film having excellent adhesion to a substrate. As the silane coupling agent, conventionally known ones can be used without particular limitation.
Examples of the surfactant include anionic, cationic and nonionic compounds, examples of the thermal polymerization inhibitor include hydroquinone and hydroquinone monoethyl ether, and examples of the defoaming agent include silicone and fluorine. Examples include compounds.

<Method of preparing photosensitive resin composition>
The photosensitive resin composition described above can be obtained by mixing each of the above components in a predetermined amount and then uniformly mixing them with a stirrer. In addition, you may filter using a filter so that the obtained mixture becomes more uniform.

≪Manufacturing method of cured film≫
As a method for producing a cured film, a conventionally known method for producing a cured film using (B) a photosensitive resin composition containing a photopolymerizable compound can be adopted without particular limitation.

A suitable method for producing the cured film is
The process of forming a coating film by applying the above-mentioned photosensitive resin composition, and
The process of regioselectively exposing the coating film and
The process of developing the exposed coating film to form a patterned cured film,
Examples thereof include a step of baking a patterned cured film and a method including.

In order to form a cured film using the photosensitive resin composition, first, the photosensitive resin composition is applied onto a substrate selected according to the use of the cured film to form a coating film. The method for forming the coating film is not particularly limited, but for example, a contact transfer type coating device such as a roll coater, a reverse coater, or a bar coater, or a non-contact type coating device such as a spinner (rotary coating device) or a curtain flow coater is used. It is said.

The coated photosensitive resin composition is dried, if necessary, to form a coating film. The drying method is not particularly limited, and for example, (1) a method of drying on a hot plate at a temperature of 80 to 120 ° C., preferably 90 to 100 ° C. for 60 to 120 seconds, and (2) a method of drying at room temperature for several hours to Examples include a method of leaving the solvent for several days, and (3) a method of removing the solvent by putting it in a warm air heater or an infrared heater for several tens of minutes to several hours.

Next, the coating film is exposed. The exposure is performed by irradiating with active energy rays such as ultraviolet rays and excimer laser light. The exposure is regioselective, for example, by a method of exposing through a negative mask. The energy dose to be irradiated varies depending on the composition of the photosensitive resin composition, but is preferably about ^{40 to 200 mJ / cm 2, for example.}
When the entire surface of the coating film is exposed, an unpatterned cured film having a shape corresponding to the shape of the coating film is formed.

When the coating film is exposed in a position-selective manner, the unexposed portion is dissolved in the developing solution and removed by developing the exposed film with a developing solution to form a patterned cured film. The developing method is not particularly limited, and for example, a dipping method, a spraying method, or the like can be used. The developer is appropriately selected according to the composition of the photosensitive resin composition. As the developing solution, for example, a basic aqueous solution such as sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, and a quaternary ammonium salt can be used.

The patterned cured film is then baked (post-baked). The bake temperature is not particularly limited, but is preferably 180 to 250 ° C, more preferably 220 to 230 ° C. The bake time is typically 10 to 90 minutes, preferably 20 to 60 minutes.
By baking as described above, a cured film of the photosensitive resin composition can be obtained.

The colored cured film containing the (D) pigment thus formed is suitably used as, for example, a black matrix in a color filter or a coloring film for RGB or the like, depending on the hue of the (D) pigment. obtain.

Hereinafter, the present invention will be described in more detail with reference to Examples, but the scope of the present invention is not limited to these Examples.

[Preparation Example 1]
First, in a 500 ml four-necked flask, 235 g of bisphenol fluoride type epoxy resin (epoxy equivalent 235), 110 mg of tetramethylammonium chloride, 100 mg of 2,6-di-tert-butyl-4-methylphenol, and 72.0 g of acrylic acid. Was charged, and the mixture was heated and dissolved at 90 to 100 ° C. while blowing air at a rate of 25 ml / min. Next, the temperature was gradually raised while the solution was cloudy, and the solution was heated to 120 ° C. to completely dissolve it. At this time, the solution gradually became transparent and viscous, but stirring was continued as it was. During this period, the acid value was measured, and heating and stirring were continued until the acid value became less than 1.0 mgKOH / g. It took 12 hours for the acid value to reach the target value. Then, it was cooled to room temperature to obtain a colorless transparent solid bisphenol fluorene type epoxy acrylate represented by the following formula.

Next, 600 g of 3-methoxybutyl acetate was added to 307.0 g of the above-mentioned bisphenol fluorene type epoxy acrylate thus obtained to dissolve it, and then 80.5 g of benzophenone tetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were added. The mixture was mixed, gradually heated, and reacted at 110 to 115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to obtain resin A-1. The disappearance of the acid anhydride group was confirmed by IR spectrum.

[Example 1, Example 2, and Comparative Examples 1 to 3]
In Examples and Comparative Examples, a novolak resin, a cardo resin, and an acrylic resin were used as the (A) alkali-soluble resin.
As the novolak resin, TO-547 (trade name) manufactured by Sumitomo Bakelite Co., Ltd. was used. TO-547 is a cresol of Mw30000 obtained by adding oxalic acid and a concentration of 37% by mass formalin to a mixture of 90 mol% m-cresol and 10 mol% 2,3,5-trimethylphenol and conducting a condensation reaction by a conventional method. It is a novolak resin.
As the cardo resin, the resin A-1 obtained in Preparation Example 1 above was used.
As the acrylic resin, a resin containing 20 mol% of structural units derived from methacrylic acid and 80 mol% of structural units derived from styrene (manufactured by Shin-Nakamura Chemical Co., Ltd., NCF-3 (trade name), Mw = 10000) is used. Using.

In Examples and Comparative Examples, a dendritic polymer and a polyfunctional monomer other than the dendritic polymer were used as the (B) photopolymerizable compound.
As the dendritic polymer, SIRIUS 501 (trade name) manufactured by Osaka Organic Chemical Industry Co., Ltd. was used.
DPHA (dipentaerythritol hexaacrylate) was used as the polyfunctional monomer other than the dendritic polymer.

In Examples and Comparative Examples, as the (C) photopolymerization initiator, OXE-02 (trade name, manufactured by BASF, Inc., O-acetyl-1- [6- (2-methylbenzoyl) -9-ethyl-9H-carbazole) −3-Il] Etanone oxime) was used.

In Examples and Comparative Examples, carbon black was used as the pigment (D).
As carbon black, as DA, carbon black manufactured by Daido Kasei Kogyo Co., Ltd. (pigment A (dispersion liquid)) and carbon black manufactured by Mikuni Color Co., Ltd. (pigment B (dispersion liquid)) as DB. Using.
In Table 1 of this Example section, the total value of the solid content of the pigment and the dispersant is described.

The amounts of (A) alkali-soluble resin, (B) photopolymerizable compound, (C) photopolymerization initiator, and (D) pigment in the amounts shown in Table 1 are solidified in (S) organic solvent, respectively. The photosensitive resin compositions of Examples and Comparative Examples were obtained by dissolving and dispersing them so as to have a partial concentration of 15% by mass.
As the organic solvent (S), a mixed solvent of 3-methoxybutyl acetate: propylene glycol monomethyl ether acetate: cyclohexanone = 40: 35: 25 (mass ratio) was used.
Using the obtained photosensitive resin composition, the difficulty of flow by heating the cured film (flow resistance), the CD (Critical Dimensions) of the patterned cured film, and the cured film according to the following method. The fine line adhesion was evaluated.

<Flow resistance evaluation>
First, a 100 mm square glass substrate was washed with pure water and dried in an oven at 160 ° C. The photosensitive resin compositions obtained in Examples and Comparative Examples were applied to a dried glass substrate and heated on a hot plate at 100 ° C. for 2 minutes to volatilize the solvent. Subsequently, after exposure using a 5 μm line Mask, development was carried out with a 0.04% developer of KOH for 70 seconds.
The patterned substrate was split in half and half held in an oven heated to 230 ° C. for 20 minutes. The substrate heated in this way was taken out of the oven and cooled, and then the patterned portion was cracked and the cross section was observed by SEM.
As for this item, the substrate heated in the oven and the substrate not heated were compared, and the deformation (flow) due to heat was confirmed.
This item was evaluated based on the following criteria.
◯: When observing the rounding of the upper part of the pattern, the taper angle of the pattern, and the exudation from the hem of the pattern, the pattern retains a rectangular shape, or there is no significant difference between the heated substrate and the unheated substrate. It is in a state.
Δ: Although it is not a quality problem, when observing the rounding of the upper part of the pattern, the taper angle of the pattern, and the exudation from the hem of the pattern, there is a slight difference (shape collapse) between the heated substrate and the unheated substrate. ) Is observed.
X: When observing how the upper part of the pattern is rounded, the taper angle of the pattern, and the exudation from the hem of the pattern, a clear difference (shape collapse) is observed between the heated substrate and the unheated substrate.

<CD evaluation>
The development operation was carried out in the same manner as in the above-mentioned <Flow resistance evaluation>, and then the patterned substrate was divided in half and the half was held in an oven heated to 230 ° C. for 20 minutes.
Then, the patterned portion was confirmed with a microscope and evaluated based on the following criteria.
◯: The pattern is formed within ± 10% of the Mask width dimension.
X: The pattern is formed with a dimension of more than + 10% or less than -10% with respect to the dimension of the Mask width. Alternatively, the film is clearly reduced by the development.

<Evaluation of fine line adhesion>
The exposure operation was performed by the same method as the above-mentioned <Flow resistance evaluation> except that a Mask having a width of 3 to 20 μm was used on one surface. Then, it was developed with a 0.04% developer of KOH for 80 seconds, and it was confirmed with a microscope whether or not there was peeling of the patterned portion, and evaluation was performed based on the following criteria.
◯: No peeling is observed even in the pattern portion having a width of 3 μm.
X: Peeling is observed in the pattern portion having a width of 3 μm.

According to the examples, (A) an alkali-soluble resin, (B) a photopolymerizable compound, (C) a photopolymerization initiator, and (D) a pigment are contained, and (A) a novolak resin is used as the alkali-soluble resin. A photosensitive resin composition containing (B) a dendritic polymer having two or more ethylenically polymerizable groups at the ends as a photopolymerizable compound is unlikely to flow excessively by heating and has a predetermined size. It can be seen that a cured film patterned with can be formed.
On the other hand, according to Comparative Examples 1 and 3, it can be seen that when the photosensitive resin composition does not contain the novolak resin, it is difficult to form a cured film patterned with a predetermined dimension.
Further, according to Comparative Example 2, when the photosensitive resin composition does not contain a dendritic polymer having two or more ethylenic polymerizable groups at the ends, the cured film formed is likely to flow by heating. I understand.

Claims (10)

(A) Alkali-soluble resin and
(B) Photopolymerizable compound and
(C) Photoradical polymerization initiator and
(D) Pigment and
A photosensitive resin composition comprising
The alkali-soluble resin (A) contains a novolak resin and contains.
The photopolymerizable compound (B) contains a dendritic polymer having two or more ethylenically polymerizable groups at the ends.
The dendritic polymer comprises a core derived from dipentaerythritol, with acrylate groups at the ends, as a main component dipentaerythritol hexaacrylate linked hyperbranched polyacrylate, a photosensitive resin composition. The dendritic polymer has the following formula (1):

(In the formula (1), R ₁ is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R ² is n out of m hydroxy groups of the polyhydric alcohol R ³ (OH) _m. It is an n-valent residue in which a hydroxy group is subjected to an ester bond in the formula (1), and m and n are independently integers of 2 to 20 and m ≧ n.)
The polyfunctional (meth) acrylate compound represented by the following formula (2):
(HS-CH _2- ) _p- R ⁴ (2)
(In the formula (2), R ⁴ is a single bond or a hydrocarbon group-containing group having 2 to 6 valent carbon atoms 1 to 6, and p ^{is 2 when R 4} is a single bond, and R ⁴ Is an integer of 2 to 6 when is a 2 to 6 valent hydrocarbon group-containing group.)
The photosensitive resin composition according to claim 1, which is an adduct to the multivalent mercapto compound represented by. The photosensitive resin composition according to claim 1 or 2, wherein the alkali-soluble resin (A) further contains a resin having a cardo structure. The photosensitive resin composition according to any one of claims 1 to 3, wherein the novolak resin has a weight average molecular weight of 2000 or more and 50,000 or less. The photosensitive resin composition according to any one of claims 1 to 4, wherein the pigment (D) is a black pigment. The photosensitive resin composition according to claim 5, wherein the black pigment is carbon black. Claims 1 to 1, wherein the ratio (Wn: Wd) of the content Wn [g] of the novolak resin to the content Wd [g] of the dendritic polymer is in the range of 20: 1 to 1:20. The photosensitive resin composition according to any one of 6. A cured film obtained by curing the photosensitive resin composition according to any one of claims 1 to 7. A color filter comprising the cured film according to claim 8. A step of forming a coating film by applying the photosensitive resin composition according to any one of claims 1 to 7.
A step of regioselectively exposing the coating film and
A step of developing the exposed coating film to form a patterned cured film, and
A method for producing a cured film, which comprises a step of baking the patterned cured film.