JP6592567B2 - Peeling device - Google Patents

Description

  The present invention relates to a peeling apparatus for peeling a support substrate from a wafer.

  Ultra-thin wafers with a thickness of several tens of μm have been adopted in the manufacture of semiconductor devices. Such an ultra-thin wafer is manufactured by polishing a wafer using a support substrate as a base in a state where a thick wafer is bonded to a support substrate having a certain degree of rigidity such as support glass.

  The support substrate can be peeled off from the wafer by laser irradiation, or the other side of the wafer with the support substrate bonded to one side is affixed to the dicing tape, and a blade or the like is inserted between the support substrate and the dicing tape. For example, a method in which a wafer sandwiched between the two is peeled off with a strong force so as to be attached to the dicing tape is used.

  The wafer remaining on the dicing tape is divided into a plurality of dies in a dicing process. Thereafter, the dicing tape is sucked and held on the peeling stage, and the die is isolated by moving the peeling stage sideways while sucking and holding a specific die from above with a suction pad (see Patent Document 1).

JP 2012-182330 A

  When the support substrate is peeled off from the wafer, there is a problem that the laser irradiation method damages the wafer. Also, the method of peeling with a blade makes it difficult to grasp the trigger of peeling between the wafer and the support substrate, and there is a possibility that the wafer may be broken without being able to withstand rapid bending.

  The method of Patent Document 1 is not a method of peeling the support substrate, but a complicated mechanism is required because the suction nozzle and the peeling stage are separate units.

  Accordingly, an object of the present invention is to provide a peeling apparatus that can reliably peel a support substrate from a wafer without damaging the wafer with a simple configuration.

  A peeling apparatus according to the present invention is an apparatus for peeling a support substrate from a wafer for a workpiece having a wafer bonded to the main surface of the support substrate, a stage having an adsorption surface for adsorbing the workpiece, a cleavage generating mechanism, . The cleavage generation mechanism is a mechanism that generates a cleavage at the interface between the wafer and the support substrate at one end that is a part of the outer peripheral edge of the workpiece.

  A specific configuration related to the peeling apparatus is as follows.

  The workpiece to be peeled by the peeling device has a structure in which a wafer is bonded to the main surface of the support substrate, and a dicing tape larger in size than the wafer is attached to one surface of the wafer. By attaching a large-sized dicing tape to the wafer, the pressure acting on the dicing tape can be applied to one end of the wafer in a concentrated manner, and it becomes easy to grasp the trigger for peeling.

  The peeling apparatus further includes a cleavage growth mechanism. The cleavage growth mechanism creates a pressure difference between the main surface side and the back surface side of the support substrate in the work held by suction on the stage so that the main surface side becomes a positive pressure from one end of the wafer to the other end on the main surface. Operate while gradually expanding the range. The cleavage that occurs between one end of the wafer and the support substrate gradually grows from one end of the wafer toward the other end.

  In this configuration, there is provided a processing chamber in which the stage is disposed and is hermetically sealed, and a cleavage growth mechanism is disposed opposite to the suction surface of the stage, and a suction cup for sucking the back surface of the support substrate, and the support substrate It is preferable to include a sealing member that seals between the back surface side of the substrate and the processing chamber, and a decompression device that generates a suction adsorption force on the suction surface of the suction cup. A difference in pressure between the main surface side and the back surface side of the support substrate in the work held by suction on the stage can be positively applied to the main surface side.

  Moreover, it is preferable that the cleavage growth mechanism further includes a pressure increasing device that pressurizes the processing chamber. A pressure difference between the main surface side and the back surface side of the support substrate in the work held by suction on the stage can be applied more reliably.

  The cleavage generating mechanism includes a contact member that is movable in a principal surface direction and a normal direction of the principal surface at a position facing one end on the side of the workpiece, and the contact member at one end portion of the principal surface of the support substrate. It is preferable to have a drive device that moves upward after abutting from below. According to the cleavage generation mechanism, it is possible to generate a cleavage that triggers peeling between one end of the wafer and the support substrate in the work that is sucked and held on the stage.

  The cleavage generation mechanism may be a mechanism in which a concave portion corresponding to one end of the wafer is formed on the suction surface of the stage, and the dicing tape and the wafer are sucked through the concave portion. In this case, by processing the end portion of the concave portion into the R-plane, it is possible to avoid a sudden bending stress from acting on the wafer at the time of the occurrence of the crack, and to contribute to the reduction of damage to the wafer.

  In this configuration, it is preferable that the peeling device further includes a cleavage support mechanism. The cleavage assist mechanism includes a pressing member that presses the dicing tape into the recess, and a lifting device that lifts and lowers the pressing member. According to this cleavage assist mechanism, an improvement in peeling performance can be expected. In addition, by providing the pressing member with a claw that engages with one end of the support substrate, the peeled support substrate can be engaged with the claw and lifted.

  According to the present invention, the support substrate can be reliably peeled from the wafer with a simple configuration without damaging the wafer.

It is a perspective view which shows the peeling apparatus which concerns on the 1st Embodiment of this invention. It is a schematic block diagram of a peeling apparatus. It is xz sectional drawing which shows a peeling apparatus in the state which closed the upper and lower chambers. It is a top view which shows a lower chamber. It is a top view which shows an adsorption | suction stage. It is xz sectional drawing which shows an adsorption | suction stage. It is a top view which shows a workpiece | work. It is sectional drawing and a principal part enlarged view which show a workpiece | work. It is a top view which shows the adsorption | suction stage which mounted the workpiece | work. It is xz sectional drawing which shows the adsorption | suction stage which mounted the workpiece | work. It is a top view which shows a cleavage growth mechanism. It is a bottom view which shows a suction cup. It is a top view (bottom view) which shows a suction pad. It is a bottom view which shows the suction cup which attached the suction pad. It is a perspective view which shows a cleavage assistance mechanism. (A)-(B) are action process diagrams of a cleavage generation mechanism. (A)-(C) are action process diagrams of a cleavage growth mechanism. (A)-(D) are action process diagrams of a cleavage support mechanism. It is a flowchart which shows the flowchart which shows the flow of peeling operation | movement by the control part of a peeling apparatus. (A)-(C) is an operation process figure of a peeling device concerning a 2nd embodiment of the present invention (main part sectional view). (A)-(D) is a figure which shows the structure and operation | movement of a cleavage generation | occurrence | production mechanism in the peeling apparatus which concerns on another embodiment of this invention.

  Hereinafter, a peeling apparatus according to a first embodiment of the present invention will be described with reference to the drawings. In some drawings, a coordinate axis consisting of an x-axis and a y-axis as horizontal axes orthogonal to each other and a z-axis as a vertical axis orthogonal to the x-axis and y-axis is illustrated, and the coordinate axes are referred to as appropriate in the following description. To do. The origin of the xyz coordinates is set to an arbitrary point on the vertical axis passing through the center of the suction stage 14 described later. The same coordinate axes illustrated in different drawings are in a reference relationship with each other. Unless otherwise specified, the cross-sectional view is a vertical cross section along the x-axis. Moreover, the hatching which should be attached to a cross section may be omitted.

  As shown in FIGS. 1 and 2, the peeling apparatus 1 is roughly composed of a lower chamber 11, an upper chamber 12, and an elevating device 13. The lower chamber 11 and the upper chamber 12 are thick plates formed of a material having pressure resistance and rigidity.

  The lower chamber 11 includes a processing chamber 10 </ b> A formed as a circular hole opened on the upper surface of the lower chamber 11, and a mechanism chamber 10 </ b> B formed as a rectangular hole penetrating up and down the lower chamber 11. The opening on the bottom surface of the mechanism chamber 10B is closed by a bottom floor plate 20 projecting outward from one end (left end in the figure) of the lower chamber 11 in the x-axis direction.

  The processing chamber 10A and the mechanism chamber 10B communicate with each other at the side surface in the x-axis direction. The upper surface of the lower chamber 11 and the bottom surface of the upper chamber 12 are formed by sliding surfaces, and the chambers 10A and 10B are hermetically sealed by a seal member 15 disposed around the processing chamber 10A and the mechanism chamber 10B. The For example, an O-ring is preferably used as the seal member 15. The lower chamber 11 is movable and is configured to be movable up and down in the z-axis direction by a lifting device 13. An air cylinder is used as the lifting device 13 as an example. When the workpiece W is loaded and unloaded, the lower chamber 11 is moved up and down relative to the stationary upper chamber 12 to open and close the processing chamber 10A. The processing chamber 10A can be opened and closed by the upper chamber 12 moving up and down relative to the lower chamber 11, or other methods such as a hinged opening / closing structure can be employed.

  As shown in FIG. 2, the lower chamber 11 is provided with an adsorption stage 14, a cleavage generation mechanism 2, and a cleavage support mechanism 4. A cleavage growth mechanism 3 is disposed in the upper chamber 12. Hereinafter, each element will be described.

<Work>
The structure of the workpiece W will be described with reference to FIGS.

  The workpiece W is bonded to a main surface of a circular support substrate 103 having a certain degree of rigidity and poor flexibility, and a circular dilute tape 101 having flexibility is bonded to one surface of the wafer 101. 102 is affixed, and a donut-shaped tape frame 104 is affixed to the circumferential portion of the dicing tape 102. The tape frame 104 is attached to the same surface as the surface of the dicing tape 102 on which the wafer 101 is attached.

  The diameters of the support substrate 103 and the wafer 101 are substantially the same (strictly speaking, the diameter of the wafer 101 is slightly smaller than the support substrate 103), and the diameter of the dicing tape 102 is larger than the diameter of the support substrate 103 or the wafer 101. The inner diameter of the tape frame 104 is slightly smaller than the diameter of the dicing tape 102, and the outer diameter of the tape frame 104 is slightly larger than the diameter of the dicing tape 102. The workpiece W is obtained by concentrically integrating a wafer 101, a dicing tape 102, a support substrate 103, and a tape frame 104.

  As shown in the enlarged view of the main part of the workpiece W in FIG. 8, the support substrate 103 and the wafer 101 are bonded using an adhesive AD. The wafer 101 and the tape frame 104 are affixed to an adhesive surface formed on one entire surface of the dicing tape 102.

<Suction stage>
The configuration of the suction stage 14 will be described with reference to FIGS. 2, 5, 6, 9, and 10.

  As shown in FIGS. 2 and 4, the adsorption stage 14 is installed in the processing chamber 10 </ b> A of the lower chamber 11. If the suction stage 14 can generate suction force on the suction surface 140, it is not necessary to be formed of a single component, and a part of the porous material (for example, a part of the suction surface 140) is replaced. It is also possible to configure a combination of a plurality of parts such as a thing.

  The upper surface of the suction stage 14 is set as a suction surface 140 for sucking the workpiece W. In the present embodiment, the step-shaped suction surface 140 whose peripheral portion is lowered with respect to the central portion by interposing a taper therebetween is shown, but the suction surface 140 may be configured only by a horizontal plane. As shown in FIGS. 9 and 10, the workpiece W is placed on the suction surface 140 with the center position coincident with the dicing tape 102 facing down.

  A seal member 16 that comes into contact with the lower surface of the tape frame 104 is attached to the outer periphery of the suction stage 14 so that the space between the workpiece W and the suction surface 140 of the suction stage 14 is hermetically sealed. For example, a V-ring is preferably used as the seal member 16.

  A suction groove 144 is formed on the suction surface 140. A ventilation hole 145 passes through the suction groove 144 in the z-axis direction at the center of the suction groove 144. The lower end of the vent hole 145 is connected to the vent hole 111 that penetrates the floor of the processing chamber 10A. A joint 17 is attached to the lower end of the vent hole 111, and the decompression device 60 is connected to the joint 17. The decompression device 60 includes a suction source such as a vacuum pump, piping, an on-off valve, and the like. When the work W is attracted to the suction surface 140, the suction pressure is generated on the suction surface 140 by sucking the air in the suction groove 144 by the decompression device, and the work W is brought into close contact with the suction surface 140. In the present embodiment, the suction stage 14 is a suction suction type, but other suction methods, for example, an electrostatic suction type may be employed.

<Cleavage mechanism>
The structure of the cleavage generating mechanism 2 will be described with reference to FIGS. 2, 5, 6, 9, 10, and 18.

  On the suction surface 140 of the suction stage 14, a recess 146 extending in the y-axis direction is formed at a position corresponding to one end (see FIGS. 9 and 10, the left end in FIG. 9) of the wafer 101 of the workpiece W. Is done. The end of the recess 146 in the x-axis direction is processed into an R surface. In a state where the workpiece W is attracted to the suction surface 140 of the suction stage 14, one end in the x-axis direction of the portion of the dicing tape 102 where the wafer 101 (and the support substrate 103) is disposed and its periphery are positioned on the recess 146. ing.

  A ventilation hole 147 passes through the center of the recess 146 in the z-axis direction of the suction stage 14. The lower end of the vent hole 147 is connected to the vent hole 112 that penetrates the bottom floor of the processing chamber 10A. A joint 17 is attached to the lower end of the ventilation hole 112, and the decompression device 70 is connected to the joint 17. The decompression device 70 includes a suction source such as a vacuum pump, piping, an on-off valve, and the like.

  The operation of the cleavage generating mechanism 2 configured as described above will be described with reference to FIGS. 16 (A) and 16 (B). As shown in FIG. 16 (A), when the work W is attracted to the suction surface 140 of the suction stage 14 and the air in the recess 146 is sucked by the decompression device 70, a suction force is generated in the recess 146. The dicing tape 102 is closely attached to the recess 146.

  Usually, the adhesive force between the dicing tape 102 and the wafer 101 is stronger than the adhesive force between the wafer 101 and the support substrate 103. Accordingly, a portion of the wafer 101 located above the recess 146 is sucked into the recess 146 following the dicing tape 102 with the support substrate 103 left behind. As a result, as shown in FIG. 16B, at one end in the x-axis direction of the wafer 101, a tear (gap) occurs between the wafer 101 and the support substrate 103. Since the end portion in the x-axis direction of the concave portion 146 is processed into the R surface 1461, a sudden bending stress is avoided from acting on the wafer 101, which contributes to the reduction of damage to the wafer 101. In the figure, the adhesive AD is attached to the wafer 101 along with the cleavage. Whether the adhesive AD is attached to the support substrate 103 or the wafer 101 depends on the type of the adhesive.

  As shown in FIG. 21A, a cleavage generation mechanism 301 can be used instead of the cleavage generation mechanism 2. The cleavage generating mechanism 301 includes a contact member 310 and a driving device 320. The contact member 310 is supported so as to be movable in the principal surface direction and the normal direction of the principal surface at a position facing one end on the side of the workpiece W. The contact member 310 is formed with a claw portion 312 protruding below the side surface 311 facing the workpiece W.

  The driving device 320 includes a horizontal driving unit 321, a vertical driving unit 322, a load cell 323, a load cell 324, and a control unit 325. The horizontal drive unit 321 reciprocates the contact member 310 in the x-axis direction. The vertical drive unit 322 moves the contact member 310 up and down in the z-axis direction. The load cell 323 detects the load of the horizontal drive unit 321. The load cell 324 detects the load of the vertical drive unit 322. The control unit 325 operates the horizontal driving unit 321 and the vertical driving unit 322 based on the detection data of the load cells 323 and 324.

  As shown in FIG. 21A, the control unit 325 operates the horizontal driving unit 321 to approach the one end side of the wafer 101 in the workpiece W in which the abutting member 310 is adsorbed to the adsorption stage 14 on the dicing tape 102 side. To move in the direction of arrow x1. At this time, the claw portion 312 is located below the main surface of the support substrate 103.

  As illustrated in FIG. 21B, when the control unit 325 detects that the side surface 311 of the contact member 310 is in contact with the support substrate 103 based on the detection data of the load cell 323, the control unit 325 reverses the horizontal drive unit 321. The contact member 310 is moved in the direction of the arrow x2 by a predetermined amount to form a gap between the side surface 311 and the support substrate 103.

  From this state, the contact member 310 is raised in the direction of the arrow z1 by the operation of the vertical drive unit 322, and the claw portion 312 becomes the end portion of the support substrate 103 based on the detection data of the load cell 324 as shown in FIG. As shown in FIG. 21D, the contact member 310 continues to rise in the direction of the arrow z1 by a predetermined amount.

  Through the above operation, the cleavage can be generated between the adhesive AD applied to the main surface of the support substrate 103 and the wafer 101 using the cleavage generation mechanism 301.

<Cleavage mechanism>
The structure of the cleavage growth mechanism 3 is demonstrated with reference to FIG.2, FIG.11, FIG.12, FIG.13, FIG.14 and FIG.

  A suction cup 50 is attached to the upper chamber 12. The suction cup 50 is a disk body having a flange portion as an example, and is disposed to face the suction surface 140 of the suction stage 14 installed in the processing chamber 10A. The suction cup 50 is fixed to the upper surface of the upper chamber 12 by a flange portion, and the bottom surface (suction surface) penetrating the upper chamber 12 faces the processing chamber 10A.

  The flange portion of the suction cup 50 has a linear cavity (cylinder chamber) 501 extending in the x-axis direction. The piston 54 is reciprocated in the cylinder chamber 501. The shaft 53 is inserted through the wall of one end of the cylinder chamber 501 in the x-axis direction (piston left dead center in FIG. 2). A piston 54 is attached to the tip of the shaft 53. The hole in the cylinder chamber 501 through which the shaft 53 passes is hermetically sealed by a seal member (not shown). The rear end of the shaft 53 is fixed to the slider 52 of the actuator 51 disposed on the upper surface of the upper chamber 12.

  A vent hole 504 and a vent hole 505 pass through the ceiling of one end and the other end of the cylinder chamber 501 in the x-axis direction, respectively. A joint 17 is attached to each of the air holes 504 and 505. A pressure reducing device 80 is connected to the joint 17 of one vent hole 504. The decompression device 80 includes a suction source such as a vacuum pump, piping, an on-off valve, and the like. Nothing is connected to the joint of the other vent hole 505, but it is possible to connect a pressure booster if necessary.

  A plurality of vent holes 502 arranged in the x-axis direction pass through the bottom floor portion of the cylinder chamber 501. As shown in FIG. 12, a plurality of slit grooves 503 extending in the y-axis direction are formed on the bottom surface of the suction cup 50 corresponding to the plurality of vent holes 502. The lower end of the vent hole 502 opens at the center of each slit groove 503.

  A suction pad 55 having the same size as the diameter of the suction cup 50 is attached to the bottom surface of the suction cup 50 using an adhesive or the like. The suction pad 55 is made of a nonporous sponge having elasticity in the thickness direction. The suction pad 55 is always in close contact with the back surface (upper surface) of the uppermost support substrate 103 of the work W sucked on the suction surface 140 of the suction stage 14 in a slightly elastically compressed state (see FIG. 17). The suction pad 55 also serves as a seal member that seals between the back surface side of the support substrate 103 and the processing chamber 10A.

  As shown in FIG. 13, the suction pad 55 has a large number of vent holes 551 that are opened as a whole. When the suction pad 55 is attached to the suction cup 50, a large number of vent holes 551 are positioned inside the plurality of slit grooves 503 as shown in FIG.

  In the suction pad 55, the number of the vent holes 551 is not necessarily large, and may be omitted. When the suction pad 55 is deformed, the vent hole 551 may be deformed or displaced in plan view, and may be disengaged from each slit groove 503 or may be positioned across a plurality of slit grooves 503. For this purpose, a flat suction pad 55 having no vent hole 551 should be used.

  A joint 17 is attached to the vent hole 121 that penetrates the ceiling of the processing chamber 10A. A pressure increasing device 90 is connected to the joint 17. The pressure increasing device 90 is configured by a pressurizing source such as a compressor, piping, an on-off valve, and the like.

  The operation of the cleavage growth mechanism 3 configured as described above will be described with reference to FIGS. When an actuator (not shown) is driven, the piston 54 slides from one end (left end in the figure) in the x-axis direction of the cylinder chamber 501 to the other end (right end in the figure). The timing for starting the sliding is preferably when the cleavage occurs at one end in the x-axis direction of the wafer 101 by the action of the cleavage generating mechanism 2. This timing determination is performed based on detection signals from load cells 181, 182, and 19 provided in the cleavage support mechanism 4 described later, for example.

  The inside of the cylinder chamber 501 is divided into an upstream negative pressure space 501A and a downstream normal pressure space 501B in the piston moving direction. A decompression device 80 (not shown) is connected to the negative pressure space 501A, and the normal pressure space 501B is open to atmospheric pressure. The volume of the negative pressure space 501A increases and the volume of the normal pressure space 501B decreases according to the moving distance of the piston 54.

  As shown in FIG. 17A, before the piston 54 starts to slide, the plurality of vent holes 502 arranged in the x-axis direction on the bottom floor portion of the cylinder chamber 501 communicate with only the atmospheric pressure space 501B.

  As shown in FIG. 17B, the negative pressure space 501A expands with the movement of the piston 54, whereby suction of the bottom surface (suction surface) of the suction cup 50 from one end to the other end in the x-axis direction of the wafer 101 is performed. The area gradually expands. The suction force of the suction cup 50 is transmitted to the suction pad 55 in close contact with the support substrate 103, and the back surface of the support substrate 103 becomes negative pressure corresponding to the suction area. Since the suction pad 55 also serves to seal between the back surface side of the support substrate 103 and the processing chamber 10 </ b> A, a large pressure is applied between the main surface side and the back surface side of the peeling portion of the support substrate 103 in the processing chamber 10. A difference (main surface side> back surface side) is formed. Due to this pressure difference, the suction pad 55 is compressed and deformed, and the dicing tape 102 and the wafer 101 are left on the suction stage 14 side, and only the support substrate 103 is lifted, so that the cleavage grows. Here, when the pressure increasing device 90 (see FIG. 2) is driven, the inside of the processing chamber 10A is pressurized, and the main surface side of the peeling portion of the support substrate 103 becomes a positive pressure, thereby increasing the pressure difference, Can promote the growth of cleavage.

  As shown in FIG. 17C, when the piston 54 has completely moved, the negative pressure space 501A becomes dominant, and the support substrate 103 is adsorbed to the suction pad 55 that is compressed and deformed as a whole, and the support substrate 103 is peeled off from the workpiece W. Is done.

  Depending on the type of workpiece, a pressure booster (not shown) is connected to the joint 17 provided in the vent hole 505 of the normal pressure space 501B of the cylinder chamber 501, and the workpiece W in the downstream side of the growth point of the cleavage is pneumatically connected. The accuracy of peeling is improved when suppressed by.

  Further, the inside of the processing chamber 10A is pressurized by the pressure booster 90 (second pressure booster), and the normal pressure space 501B of the cylinder chamber 501 is pressurized by the pressure booster (first pressure booster) not shown. Thus, the decompression of the negative pressure space 501A in the cylinder chamber 501 can be made unnecessary. This is because a pressure that presses the main surface of the support substrate 103 toward the wafer 101 can be applied while gradually decreasing the range from one end to the other end of the wafer 101 on the back surface of the support substrate 103. That is, the range in which the positive pressure in the processing chamber 10 </ b> A acts on one end of the wafer 101 is gradually reduced by gradually reducing the range in which the pressure that presses the main surface of the support substrate 103 toward the wafer 101 is applied to the back surface of the support substrate 103. It can be gradually expanded from the other end toward the other end, and the cleavage between the wafer 101 and the support substrate 103 can be grown.

<Cleavage support mechanism>
The structure of the cleavage support mechanism 4 will be described with reference to FIGS.

  The cleavage support mechanism 4 is disposed adjacent to one end side (left end side in FIG. 2) of the suction stage 14 of the lower chamber 11 in the x-axis direction.

  The cleavage assisting mechanism 4 is roughly connected to a moving part disposed inside the mechanism chamber 10B of the lower chamber 11, a driving part disposed outside the lower chamber 11 to operate the moving part, and connecting the moving part and the driving part. It is comprised from a connection part. A moving part, a drive part, and a connection part are equivalent to the drive device of this invention.

  The structure of the moving part of the cleavage support mechanism 4 will be described. The moving part includes a plate-like action piece 21 (contact member) located at the end of the cleavage assisting mechanism 4. A claw 211 projects from the bottom of the distal end surface of the action piece 21. The action piece 21 is swingably supported by a swing shaft provided at the center in the x-axis direction on the horizontal upper surface of the first block 27, and is further disposed on both sides in the x-axis direction with the swing shaft of the first block 27 interposed therebetween. By being supported by the pair of first load cells 181, 182, the horizontal state is maintained. The first load cells 181 and 182 detect the load in the vertical direction (z-axis direction) acting on the action piece 21, one first load cell 181 is a downward load, and the other first load cell 182 is an upward load. It corresponds.

  As shown in FIG. 2, the bottom surface of the first block 27, which is a member having a wedge shape in the xz section, is from one end (left end in the figure) to the other end (right end in the figure). ) Is set to a taper that descends toward). The second block 26 is a member whose xz cross section has a wedge shape, and its upper surface is set to a taper that slides on the bottom surface of the first block 27. The second block 26 is disposed below the first block 27. The second block 26 is disposed on the bottom floor plate 20.

  A linear guide 25 is provided between the first block 27 and the second block 26 so as to make the second block 26 slidable in the x-axis direction with respect to the first block 27. Between the second block 26 and the bottom floor plate 20, a linear guide 24 configured to make the second block 26 slidable in the x-axis direction with respect to the bottom floor plate 20 is provided.

  The structure of the drive part of the cleavage assistance mechanism 4 is demonstrated. The drive unit includes a first actuator 30 and a second actuator 40 that are independently driven as a power source of the cleavage support mechanism 4. Both actuators 30 and 40 reciprocate the respective shafts 31 and 41 in the x-axis direction.

  A fixed wall 22 and a movable wall 28, which are vertical walls having a yz plane, are disposed on a portion of the bottom floor plate 20 that protrudes outside the lower chamber 11. Between the movable wall 28 and the bottom floor plate 20, a linear guide 23 configured to make the movable wall 28 slidable with respect to the bottom floor plate 20 is provided.

  The first actuator 30 is fixed to the outer surface of the fixed wall 22 (one end surface in the x-axis direction; the left end surface in FIG. 2), and the second actuator 40 is fixed to the outer surface of the movable wall 28. The tip of the shaft 31 of the first actuator 30 is connected to the outer surface side of the movable wall 28.

  An L-shaped piece 281 is projected from the outer surface side of the movable wall 28. A sheath 32 is passed through the L-shaped piece 281. The tip of the shaft 31 of the first actuator 30 is fixed to one end surface (left end surface in FIG. 2) of the sheath 32 in the x-axis direction. The other end of the sheath 32 in the x-axis direction (the right end in FIG. 2) is opened, and the core 33 is slidably accommodated in the sheath 32. The core 33 is urged in a direction approaching the outer surface of the movable wall 28 by a compression spring 34 disposed in the hollow portion of the sheath 32. On the other hand, the sheath 32 is biased in a direction away from the outer surface of the movable wall 28 by the compression spring 34. The sheath 32 is provided with a flange-like stopper at the other end in the x-axis direction to prevent the sheath 32 from coming off from the L-shaped piece 281.

  The tip of the core 33 is in contact with the second load cell 19 installed on the outer surface of the movable wall 28. The second load cell 19 detects a load that acts on the action piece 21 in the x-axis direction by measuring a change in load caused by the compression spring 34 extending and contracting.

  The structure of the connection part of the cleavage support mechanism 4 will be described. A connecting rod 291 extending in the x-axis direction is provided between the inner surface of the movable wall 28 and one end surface (left end surface in FIG. 2) of the first block 27 in the x-axis direction. Both ends of the connecting rod 291 constitute a link mechanism by being rotatably supported by an axis extending in the y-axis direction. By this link mechanism, the position in the z direction of one end (left end in the figure) of the connecting rod 291 in the x-axis direction is unchanged, whereas the position in the z direction of the other end (right end in the figure) is the first. It is possible to follow the raising / lowering operation of one block 27. A connecting rod 292 extending in the x-axis direction is provided between the tip of the shaft 41 and one end surface (left end surface in FIG. 2) of the second block 26 in the x-axis direction.

  The operation of the cleavage support mechanism 4 configured as described above will be described with reference to FIG. FIG. 3 shows the operation of the first actuator 30 with a solid arrow. When the first actuator 30 is driven, the shaft 31 reciprocates in the x-axis direction. The movement of the shaft 31 acts on the movable wall 28. As the operation of the moving part, when the shaft 31 moves, the first block 27 and the second block 26 move together in the x-axis direction by the same distance. That is, the first actuator 30 is involved in the movement of the action piece 21 at the end of the moving part in the x-axis direction.

  FIG. 3 shows the operation of the second actuator 40 with a dotted arrow. When the second actuator 40 is driven with the first actuator 30 stopped, the shaft 41 reciprocates. The movement of the shaft 41 directly acts on the second block 26. Since the first actuator 30 is stopped, the first block 27 is stationary in the x-axis direction, while the second block 26 is displaced in the x-axis direction using the linear guides 24 and 25 arranged above and below. As an operation of the moving part, when the shaft 41 moves, the first block 27 moves by a predetermined distance in the z-axis direction. The amount of movement of the first block 27 in the z-axis direction is obtained by multiplying the amount of movement of the second block 26 in the x-axis direction (the same as the amount of movement of the shaft 41) by the tangent of the gradient of the linear guide 25. That is, the second actuator 40 is involved in the movement (lifting) of the action piece 21 at the end of the moving part of the mechanism part in the z-axis direction.

  The operation of the cleavage support mechanism 4 will be described with reference to FIGS. As shown in FIG. 18 (A), the action piece 21 waits in advance at a predetermined initial position in the x-axis direction and the z-axis direction. At this time, the tip of the action piece 21 is located above the recess 146 with the dicing tape 102 interposed therebetween.

  And the action piece 21 descends from this position. Since the periphery of the suction surface 140 of the suction stage 14 is lowered by the taper, a place for the action piece 21 to escape is secured. As a result, as shown in FIG. 18B, the dicing tape 102 at a portion located above the recess 146 is pressed into the recess 146 by the bottom end of the action piece 21. The pressing can be detected by measuring a change in the load acting on the first load cell 182 by the repulsive force of the force in the z-axis direction that reaches the dicing tape 102.

  At this time, the cleavage generating mechanism 2 is operated, and the cleavage between the wafer 101 and the support substrate 103 is generated at one end in the x-axis direction of the wafer 101 by the action of the above-described cleavage generating mechanism 2. In this scene, the cleavage support mechanism 4 plays a role of supporting the occurrence of the cleavage by pressing the dicing tape 102 into the recess 146.

  Subsequently, the action piece 21 slightly rises and then moves forward in the x-axis direction, so that the claw 211 at the bottom of the tip surface of the action piece 21 becomes one end in the x-axis direction of the support substrate 103 as shown in FIG. Engage. This engagement can be detected by measuring a change in the load acting on the second load cell 19 by the repulsive force of the force in the x-axis direction that reaches the support substrate 103.

  As shown in FIG. 18D, the support piece 103 is lifted up by the claws 211 as the action piece 21 rises. This lift-up can be detected by measuring a change in the load acting on the first load cell 181 by the repulsive force of the force in the z-axis direction that reaches the support substrate 103.

  At this time, the cleavage growth mechanism 3 (not shown) is operated, and the cleavage grows from one end to the other end of the wafer 101 in the x-axis direction by the action of the cleavage growth mechanism 3 described above. In this scene, the cleavage support mechanism 4 is a growth engine for peeling by physically lifting the support substrate 103, and contributes to the expansion of the area that generates a pressure difference between the main surface side and the back surface side of the support substrate 103. Yes. In other words, it plays a role in supporting the growth of cleavage.

  Note that the cleavage assisting mechanism 4 may omit the operations of FIGS. 18A and 18B and perform only the operations of FIGS. 18C and 18D.

  In the peeling apparatus 1 described above, as shown in FIG. 2, the crack generation mechanism 2, the crack growth mechanism 3, and the cleavage support mechanism 4 are collected as a compact unit with the upper chamber 12 and the lower chamber 11 as a casing, and controlled. These mechanisms, the lifting device 13 and the like are comprehensively controlled by the unit 5.

  As shown in FIG. 19, the control of the peeling device 1 by the control unit 5 is executed in the order of the operation of the cleavage support mechanism 4, the operation of the cleavage generation mechanism 2, and the operation of the cleavage growth mechanism 3. The operation of the cleavage support mechanism 4 and the cleavage growth mechanism 3 incorporates detection results from the load cells 181, 182, and 19, thereby supporting the generation and growth of the cleavage that occurs in the processing chamber 10 A that is not visible from outside the chambers 11 and 12. It can be done reliably.

  Note that the cleavage assisting mechanism 4 can be omitted when the cleavage generating mechanism 2 can reliably generate the cleavage between the wafer 101 and the support substrate 103 at one end. Further, the cleavage support mechanism 4 can be used as the cleavage generation mechanism 301.

  Furthermore, instead of the cleavage generation mechanism 2 or the cleavage generation mechanism 301 and the cleavage support mechanism 4, for example, another cleavage generation mechanism including a blade inserted horizontally between the wafer 101 and the support substrate 103 can be used. .

  20A to 20C are cross-sectional views showing a main part of a peeling apparatus according to the second embodiment of the present invention. In these drawings, the same reference numerals are given to the common parts with the peeling apparatus according to the first embodiment.

  In this embodiment, the suction cup is formed integrally with the upper chamber 12, the suction stage is formed integrally with the lower chamber 11, and a simple structure in which the cleavage support mechanism in the first embodiment is omitted is adopted. ing. The seal member 56 provided in the upper chamber 12 has an annular shape and abuts on the circumferential portion of the back surface of the support substrate 103. A space sealed by a sealing member 56 is formed between the back surface of the support substrate 103 and the suction cup (integrated with the upper chamber 12). The operation principle of the peeling apparatus of this embodiment is the same as that of the first embodiment.

  The seal member 56 functions to maintain airtightness between the back surface of the support substrate 103 and the upper chamber 12 when a negative pressure is applied to the back surface (upper surface) side of the support substrate 103 through the air holes 502. To do. The space between the back surface of the support substrate 103 and the upper chamber 12 is hermetically sealed by the seal member 56 with respect to the back surface of the support substrate 103 positioned outside the seal member 56. As a result, a pressure difference for growing the cleavage between the support substrate 103 and the wafer 101 can be generated between the main surface and the back surface of the support substrate 103. In particular, by pressurizing the inside of the processing chamber 10 through the vent hole 121, the pressure difference between the main surface and the back surface of the support substrate 103 is increased, and the cleavage between the support substrate 103 and the wafer 101 is reliably grown. be able to.

  In FIG. 20, the suction cup 50 and the suction pad 55 shown in FIGS. 12 to 14 can be interposed between the upper chamber 12 and the support substrate 103. Further, even when the suction pad 55 does not have a vent hole, a part of the slit groove 503 formed in the suction cup 50 is communicated with the outside of the peripheral surface of the suction pad 55, so that The space between the sealing member 56 and the seal member 56 is in a negative pressure state, and the support substrate 103 can be brought into close contact with the suction pad 55.

  In the above description, for the sake of convenience, the description has been made using a device that defines the top and bottom (upper chamber, lower chamber). However, the orientation of the peeling device may be reversed, or used in any orientation therebetween. Is also possible.

  Prior to the operation of the cleavage support mechanism 4 or the cleavage generation mechanism 301, the workpiece W can be immersed in a chemical, and a part of the adhesive AD between the wafer 101 and the support substrate 103 can be removed.

  The above description of the embodiment is to be considered in all respects as illustrative and not restrictive. The scope of the present invention is shown not by the above embodiments but by the claims. Further, the scope of the present invention is intended to include all modifications within the meaning and scope equivalent to the scope of the claims.

DESCRIPTION OF SYMBOLS 1 Separation apparatus 2 Cleavage generation mechanism 3 Cleavage growth mechanism 4 Cleavage support mechanism 5 Control part W Work 10, 10A Processing chamber 10B Mechanism chamber 11 Lower chamber 12 Upper chamber 13 Lifting device 14 Adsorption stage 15, 16 Seal member 17 Joint 19 Second Load cell 20 Bottom floor plate 21 Action piece 22 Fixed wall 23, 24, 25 Linear guide 26, 27 Block 28 Moving wall 30 First actuator 31 Shaft 32 Sheath 33 Core 34 Compression spring 40 Second actuator 41 Shaft 50 Suction cup 51 Actuator 52 Slider 53 Shaft 54 Piston 55 Suction pad (seal member)
56 Sealing members 60, 70, 80 Pressure reducing device 90 Pressure increasing device AD Adhesive 101 Wafer 102 Dicing tape 103 Support substrate 104 Tape frame 111, 112, 121 Vent hole 140 Adsorption surface 144 Adsorption groove 145 Ventilation hole 146 Recess 147 Ventilation hole 181 , 182 First load cell 211 Claw 281 Mold piece 291, 292 Connecting rod 301 Cleavage mechanism 310 Contact member 311 Side surface 312 Claw part 320 Drive device 321 Horizontal drive part 322 Vertical drive part 323, 324 Load cell 325 Control part 501 Cylinder chamber 501A Negative pressure space 501B Normal pressure space 502 Vent hole 503 Slit grooves 504, 505, 551 Vent hole 1461 R surface

Claims (3)

A peeling device for peeling the support substrate from the wafer for a workpiece having a wafer bonded to the main surface of the support substrate,
A stage having an adsorption surface for adsorbing the workpiece;
At one end that is a part of the outer peripheral edge of the workpiece, a cleavage generation mechanism that generates a cleavage at the interface between the wafer and the support substrate;
Equipped with a,
The cleavage generation mechanism is:
A first contact portion capable of contacting the main surface of the support substrate at the one end of the work; and a second contact portion contacting the outer peripheral surface of the support substrate at the one end of the work. A contact member;
A driving device for moving the contact member in a first direction along the main surface and a second direction perpendicular to the main surface;
Have
By controlling the driving device, the second contact portion of the contact member is brought into contact with the outer peripheral surface of the support substrate at the one end of the work, and then the contact member in the first direction. Is retracted from the outer peripheral surface to form a gap between the outer peripheral surface and the second contact portion, and then, at the one end of the workpiece, the main surface of the support substrate is in contact with the main surface of the support member. A peeling device that separates the contact member from the stage in the second direction in a state where the first contact portion is in contact . A peeling device for peeling the support substrate from the wafer for a workpiece having a wafer bonded to the main surface of the support substrate,
A stage having an adsorption surface for adsorbing the workpiece;
At one end that is a part of the outer peripheral edge of the wafer, a cleavage generation mechanism that generates a cleavage at the interface between the wafer and the support substrate;
With
Dicing tape with a size larger than the surface is affixed to the workpiece on the surface of the wafer opposite to the bonding surface with the support substrate,
The cleavage generation mechanism is:
A recess formed in the suction surface of the stage at a position near the one end of the wafer and overlapping the dicing tape;
A suction mechanism for adsorbing the dicing tape on the inner surface of the recess;
Including a peeling device. Further comprising a cleavage support mechanism for supporting the cleavage by the cleavage generation mechanism,
The cleavage support mechanism is:
A contact member capable of contacting the dicing tape at a position on the recess;
A driving device for moving the contact member in a first direction along the main surface and a second direction perpendicular to the main surface;
Have
The said abutting member is moved in the said recessed part in the said 2nd direction in the state which contacted the said dicing tape in the position on the said recessed part by controlling the said drive device. 2. The peeling apparatus according to 2 .

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