JP6251012B2 - Pattern forming device - Google Patents

Description

  The present invention relates to a forming method and apparatus for forming a pattern by discharging a pattern forming material onto a pattern forming substrate through a pattern forming mask having a predetermined opening pattern with respect to the pattern forming substrate.

  Transparent conductive layer forming materials and transparent conductive layer films in which a transparent conductive layer is formed on a transparent substrate using a material to be formed are widely used as important functional members in electronic devices using light emitting and receiving functions. ing. In particular, a material obtained by patterning a transparent conductive layer to provide functions such as electrodes and switches is an indispensable member for reducing the thickness and size of the electronic device.

  Today, touch panel devices have been widely used as input means to mobile phones, game machines, tablet PCs, car navigation systems, automatic ticket vending machines, ATM devices, and the like. The touch panel device is incorporated on a display surface of a display device such as a liquid crystal display or a CRT, and an operator can perform input operations such as cursor movement and selection on the display surface using a finger or a touch pen. This touch panel device includes a touch panel sensor, a control circuit for detecting a contact position with the touch panel sensor, wiring, and the like.

  There are several types of touch panel devices including resistance type, capacitance type, infrared type, surface acoustic wave type, electromagnetic type, near field imaging type, etc. Capacitive touch panel devices are attracting attention as a method (multi-touch) that can detect the approach and contact of the touch panel.

  In the capacitive touch panel device, the position coordinates on the touch panel using the change in capacitance due to electrostatic coupling between the arranged transparent electrodes and the operator's finger, and the induced current generated thereby. Is detected.

  Typically, a capacitive touch panel sensor is composed of an X-axis transparent electrode and a Y-axis transparent electrode, and the X and Y-axis transparent electrodes are insulated from each other and installed in the touch panel sensor, and each is connected to a control circuit. The

  The X-axis transparent electrode and the Y-axis transparent electrode are formed of a transparent conductive material. As this transparent conductive material, an ITO film that is an indium oxide is mainly used because it has a high visible light transmittance, a low surface electrical resistance, and excellent environmental characteristics. The manufacturing method of the ITO film as the transparent conductive layer is usually that a polycrystalline ITO film is formed by sputtering using a mixed gas of argon and oxygen while heating the substrate, and a desired pattern is formed by photolithography. After formation, a method of etching unnecessary ITO with aqua regia is used. Here, it is described in JP-A-2001-311954 (Patent Document 1) that the substrate heating temperature is usually 200 to 250 ° C. for ITO crystallization. The sputtering method is excellent in that a transparent conductive layer having a low surface electrical resistance can be formed even with a certain large area. However, in order to form a conductive film with a uniform film quality at a low film formation speed, the inside of the apparatus is used. The accuracy of device control such as gas concentration and temperature must be increased, and for these reasons, there is a problem in increasing the size of the device.

  A pattern forming method using a screen mask is generally used as a pattern forming method on the substrate to be patterned. In particular, a screen mask is used as a mask for forming a complicated pattern such as a circuit pattern.

  In the pattern formation method using a screen mask, a scraper for coating a pattern forming mask with a viscous pattern forming material (paste), or a material for forming a viscous pattern into an opening pattern portion formed in the pattern forming mask In general, a squeegee intended to fill (paste) is used.

  Japanese Patent Laid-Open No. 11-268236 (Patent Document 2) discloses a method of using a forced pressurizing discharge mechanism as a method for filling a pattern forming mask with a viscous pattern forming material (paste). Hereinafter, this conventional example is referred to as pressure discharge means.

  According to this conventional example, the filling pressure can be controlled with high accuracy, the opening of the pattern forming mask can be filled with an appropriate filling pressure from the discharge port, and it is influenced by physical properties such as paste viscosity and viscoelasticity. It is described that it is difficult. In addition, since the paste is in the discharge mechanism sealed structure, changes in paste physical properties during pattern formation (increased viscosity due to solvent evaporation when the paste is left on the pattern formation mask, mixed with dry solids) This can prevent air and dust from getting into the paste.

JP 2001-311954 A JP-A-11-268236

  A characteristic necessary for a transparent electrode for a touch panel is to achieve both transparency and conductivity. In order to ensure transparency, it is conceivable to improve the transparency of the conductive material itself and to reduce the film thickness. However, there is a problem that the wiring resistance increases when the film thickness is reduced. On the other hand, in order to ensure conductivity, it can be considered that a material having excellent conductivity is mixed in the transparent electrode to increase the ratio, but there is a problem that transparency is impaired.

In addition, the transparent electrode pad of the touch panel has a diamond-shaped continuous structure such as ITO, and the resistance of the fine wiring connecting the pads is high, so that the response speed is slow in a display exceeding 20 inches.
In the current screen printing, the difference in the size of the emulsion opening causes a difference in paste dischargeability from the emulsion opening. If the wiring width to be formed (emulsion width) becomes narrow, the transferability of the paste deteriorates and the printed wiring The problem is that the thickness of the substrate becomes thinner.
In general, since paste has improved fluidity when shear (shearing force) is applied, rolling reduces viscosity and improves fluidity.

  In the pressure discharge means, the paste held in the hermetic pressure vessel has little flow and no shear (shearing force) is applied. Therefore, there is a possibility that the viscosity is improved and the fluidity is impaired. When the fluidity is poor, the filling property of the paste into the pattern forming mask is impaired, and there may be a problem that the amount of paste in the pattern forming mask is insufficient.

  At the same time as pattern formation using a squeegee or pressurizing and discharging means, the paste releasability from the tip of the discharge part of the squeegee or pressurizing and discharging means is improved, thereby improving the paste rolling property and the pattern formability (fillability)・ Improving transferability is also an issue.

  Furthermore, when patterning a paste using a squeegee, the paste rises along the side of the squeegee opposite to the pattern forming mask, so that the pattern forming mask is insufficiently filled with paste. .

  It is a problem to find a method of filling a paste into a pattern forming mask that has features that can solve such problems.

  Further, since the paste is filled into the opening pattern formed in the pattern forming mask by the tip of the discharge portion of the squeegee or the pressure discharge means, the shape of the discharge portion tip of the squeegee or the pressure discharge means is applied to the pattern formation mask. Since the paste filling property is affected, the structure and surface state of the discharge mechanism tip that can improve the filling property as compared to the discharge tip of the conventional squeegee or the pressure discharge means are problems. In particular, since the direction of the force applied to the paste changes depending on the attack angle between the tip of the discharge mechanism and the pattern forming surface of the pattern forming substrate, the paste can be filled from almost perpendicular to the opening pattern formed in the pattern forming mask. The challenge is to do so.

  On the other hand, in a general pattern formation method using a screen mask, a load due to printing pressure is applied to the discharge portion of the squeegee or the pressure discharge means, so that the tip portion is deformed. Since the flat squeegee made of urethane generally bends, the attack angle at the tip of the squeegee becomes very small, and the attack angle varies depending on the level difference of the pattern forming substrate. When the attack angle changes, the filling property of the opening of the pattern forming mask changes. Therefore, it is a problem to reduce the filling property variation of the paste pattern forming mask by finding the structure of the tip of the paste discharge mechanism.

  Depending on the pattern formation object, a metal mask, a mesh mask, or the like may be used for the pattern formation mask. The problem is to provide a discharge mechanism that can be applied to any pattern forming mask.

  In addition, with the miniaturization of the pattern formation, the size of the opening formed in the pattern forming mask has been reduced, and the transfer thickness of the paste onto the substrate to be patterned depends on the size of the opening. There is a concern that it will decrease. As a pattern formation mask, the amount of paste remaining on the mesh and emulsion of the opening pattern in the pattern formation mask after pattern formation is reduced as much as possible, and the desired amount of paste is stably applied to the substrate to be patterned. Transfer is a challenge.

  The present invention has been made in view of the above-described problems, and provides a pattern forming apparatus capable of forming a complex electrode pattern and a pattern capable of reducing connection resistance between pads without impairing transparency required as a touch panel. .

In order to solve the above-mentioned problems, in the present invention, the pattern forming apparatus includes a mask holding means for holding a pattern forming mask and a pattern forming substrate to be patterned, and the pattern forming substrate is A table means that is moved to a predetermined position of the pattern forming mask and placed at a predetermined distance, and a pattern of paste on the pattern forming substrate placed on the table means via the pattern forming mask A paste discharge means having a discharge mechanism for forming a paste, a paste pressurization mechanism for pressurizing and supplying paste to the discharge mechanism of the paste discharge means via a paste introduction path, and the discharge mechanism of the paste discharge means for forming the pattern a pattern forming apparatus provided with a discharge mechanism drive means for reciprocating along a use mask, the discharge mechanism of the paste discharging means, The cross-sectional shape in the reciprocating direction of the discharge mechanism driving means at the tip portion of the head is formed in a circular arc-shaped concave shape symmetrically across the paste flow path at the center, and the arc-shaped concave shape One end on the opposite side of the paste flow path is pressed against the pattern forming mask and reciprocated on the surface of the pattern forming mask, and the other end of the arcuate concave shape and the paste flow path are crossed. A corner is formed at a position where a gap is opened with respect to the upper surface of the pattern forming mask, and the paste is placed in a space formed by the arc-shaped concave surface and the pattern forming mask surface through the gap. The corner portion is formed so as to intersect the pattern forming mask at a point where the arc-shaped concave shape and the paste flow path are extended at the intersection of the arc-shaped concave shape and allowing the flow in and out. The , Liquid-repellent film was so formed on the arc-shaped concave surface symmetrical, and the paste flow path wall.

  According to the pattern forming apparatus equipped with the ejection mechanism of the present invention, it is possible to reduce the connection resistance between the electrode pattern and the pad having a complicated shape and stably form the pattern without impairing the transparency required for the touch panel. I can do it now.

It is a block diagram which shows the schematic structure of the pattern formation apparatus which mounts the discharge mechanism part in Example 1 of this invention. It is a flowchart which shows the flow of the process which performs pattern formation with the pattern formation apparatus which mounts the discharge mechanism part in Example 1 of this invention. It is a process schematic diagram explaining the pattern formation condition of the electrode wiring in Example 1 of this invention. It is a front view of the discharge mechanism part front-end | tip part explaining the movement of the discharge mechanism part with respect to a mask when the pattern is formed with the discharge mechanism in Example 1 of this invention, and the state of the flow of the paste in a discharge mechanism part front-end | tip part. It is a front view of the discharge mechanism part front-end | tip part explaining the state of the flow of the paste in the discharge mechanism part front-end | tip part when patterning is carried out with the discharge mechanism in Example 1 of this invention. It is the top view expanded locally seen from the to-be-patterned base material side of the pattern formation mask used in order to pattern-form an electrode wiring with the discharge mechanism in Example 1 of this invention. It is sectional drawing expanded locally locally explaining the mask for pattern formation in Example 1 of this invention. It is the top view which expanded the X-axis transparent electrode formed in Example 1 of this invention locally. It is the top view which expanded locally the Y-axis transparent electrode formed in Example 1 of this invention. It is sectional drawing which expanded the cross section of the mask for pattern formation used for Example 2 of this invention locally. It is the top view which expanded locally the discharge mechanism part 1 side emulsion explaining the mask for pattern formation used in Example 4 of this invention. It is the top view expanded locally of the substrate surface side emulsion explaining the mask for pattern formation used in Example 4 of this invention. It is sectional drawing which expanded the cross section of the mask for pattern formation used in Example 4 of this invention locally. It is the top view which expanded locally the ejection mechanism part 1 side emulsion explaining the mask for pattern formation used in Example 5 of this invention. It is the top view which expanded locally the substrate surface side emulsion explaining the mask for pattern formation used in Example 5 of this invention. It is sectional drawing which expanded the cross section of the mask for pattern formation used in Example 5 of this invention locally. It is the top view which expanded locally the ejection mechanism part 1 side emulsion explaining the mask for pattern formation used in Example 6 of this invention. It is the top view which expanded locally the substrate surface side emulsion explaining the mask for pattern formation used in Example 6 of this invention. It is sectional drawing which expanded the cross section of the mask for pattern formation used in Example 6 of this invention locally. It is the top view which expanded locally the ejection mechanism part 1 side emulsion explaining the mask for pattern formation used in Example 7 of this invention. It is the top view which expanded locally the substrate surface side emulsion explaining the mask for pattern formation used in Example 7 of this invention. It is sectional drawing which expanded the cross section of the mask for pattern formation used in Example 7 of this invention locally.

  The present invention relates to a pattern forming apparatus for transferring a fine pattern from a pattern forming mask having an opening at a predetermined position to a predetermined position of a pattern forming substrate fixed to a table by using a discharge mechanism. In order to realize pattern formation that can form a pattern with high accuracy and stability, a portion that contacts the pattern forming mask at the tip portion of the discharge mechanism portion is formed in a concave shape, and the tip portion of the discharge mechanism portion that includes this concave portion is formed. When the surface is covered with a film having liquid repellency, and the paste is filled in a pattern forming mask having a desired pattern opening, the liquid repellency is transferred to a predetermined position on the substrate to be patterned. By promoting the rolling of the paste inside the region formed by the concave portion at the tip of the discharge mechanism covered with the film having the The a pattern is obtained by allowing high accuracy patterning.

  Of the inventions disclosed in the present application, the outline of typical ones will be briefly described as follows.

  In order to ensure the transparency of the transparent electrode for the touch panel, it is necessary to reduce the film thickness at the center of the diamond-shaped pad. However, since the wiring resistance increases, the film thickness around the diamond-shaped pad is increased. And lowering the wiring resistance. Therefore, since the conductivity around the diamond-shaped pad is ensured, only a part of the transparency is slightly impaired, but sufficient transmittance can be ensured with the transmittance of the entire surface.

In addition, the fine wiring that connects the diamond-shaped pads can be made thicker and the wiring resistance can be kept low as with the diamond-shaped pads, so the response speed is slow even for large displays over 20 inches. There is nothing.
In current screen printing, there is a difference in the paste dischargeability from the emulsion opening, and if the wiring width (emulsion width) to be formed becomes narrow, the transferability of the paste deteriorates and the printed wiring thickness decreases. However, by utilizing this, it is possible to form a transparent electrode pad having a film thickness distribution (resistance distribution) by forming a difference in discharge amount in a diamond-shaped pad.
Attachment of the discharge mechanism to the pattern forming apparatus is substantially vertical.
For pattern formation using a uniform pressure method in a pattern forming apparatus that uses a discharge mechanism to transfer paste from a pattern forming mask having an opening at a predetermined position to a predetermined position on a pattern forming substrate fixed to a table. In addition to the filling of the paste into the mask, the paste is filled into the pattern forming mask by the arc-shaped concave shape at the tip of the discharge mechanism. Further, the present invention is characterized in that the attack angle between the discharge mechanism portion and the pattern forming surface of the substrate to be patterned can be changed from the attachment angle of the tip portion having an arcuate concave shape to the discharge mechanism main body.

  As a result, the paste is confined in the arc-shaped concave portion at the tip of the discharge mechanism, and the paste is discharged in the process of sliding in the driving direction while closely contacting the discharge mechanism of the pattern forming mask. It is possible to roll along the arcuate concave shape at the tip.

  Furthermore, since the surface of the tip of the discharge mechanism that contacts at least the paste including the arc-shaped concave portion has liquid repellency, the frictional force between the paste and the surface of the discharge mechanism is reduced, and the rolling property is reduced. Will improve. When the rolling property is improved, the shear rate is increased, the viscosity of the paste is lowered, and the paste is more easily flowed.

  Here, as a method for quantifying the liquid repellency, a droplet angle (contact angle) at a point where the droplet is dropped on the surface of the substrate and is in contact with the substrate on the outer periphery of the droplet is used. If the contact angle is small, it indicates that the liquid droplets are wet and spread on the substrate surface. Conversely, if the contact angle is large, the liquid droplets are raised on the surface of the substrate and the droplets are repelling. Show.

  It is necessary to evaluate the liquid repellency of the surface of the discharge mechanism with the solvent contained in the paste. When the solvent contained in the paste is dropped on the surface of the discharge mechanism portion and the contact angle is smaller than 45 degrees, the paste rises along the surface of the discharge mechanism portion, and the rolling speed decreases. If the contact angle is 45 degrees or more, the liquid repellency on the surface of the discharge mechanism portion is improved, the paste is difficult to spread on the surface of the discharge mechanism portion, and the rolling property of the paste is improved. The larger the contact angle, the better.

As the film having liquid repellency, a film that dissolves in the solvent contained in the paste is not preferable. Examples of the material having resistance to the solvent contained in the paste and having liquid repellency include SiO ₂ , fluororesin, hydrocarbon, and fluorine-containing hydrocarbon.

  Further, in order to combine the shape retaining property and flexibility in the discharge mechanism portion, a core material is used in a part that contacts a shim (not shown) at the tip of the discharge mechanism portion. The core material should have conductivity, and a material made of stainless steel is particularly good. The core material can be used as an electrode for forming a liquid-repellent film by plasma treatment.

  It is considered that the amount of paste transferred to the substrate to be patterned becomes unstable if there is a mesh that remains exposed to the pattern formation mask opening after pattern formation and paste that remains on the wall surface of the emulsion. Therefore, as a method for solving this problem, liquid repellency is imparted to the mesh and emulsion wall surfaces exposed to the pattern forming mask opening considered to be attached with the paste and to the emulsion surface on the pattern forming substrate side. It is effective. The reason for imparting liquid repellency to the emulsion surface on the patterned substrate is that it is necessary to prevent bleeding of the patterned product formed on the patterned substrate.

  Further, the ejection mechanism portion mounted on the pattern forming apparatus of the present invention is characterized in that the pattern forming area is composed of an emulsion composed of at least a metal mesh and an organic substance as a pattern forming mask, and the emulsion has a predetermined opening. A pattern forming mask (mesh mask) can be used. When a metal mesh is used as a mask for pattern formation, the opening pattern is formed with a flexible emulsion made of organic matter, so that the metal mesh can be lifted from the substrate to be patterned by the emulsion, and the ejection mechanism It is possible to reduce damage to the surface of the substrate on which the pattern is formed by the portion and to form a stable pattern forming film thickness.

  Further, as the pattern forming mask used here, it is necessary to efficiently transfer the paste onto the substrate to be patterned, and it is possible to impart liquid repellency as in the case of the ejection mechanism section. The paste filled in the opening pattern portion of the pattern forming mask has a high viscosity because it does not have fluidity, and the adhesiveness to the opening pattern portion of the pattern forming mask is improved. Therefore, when liquid repellency is imparted to the opening pattern portion of the pattern forming mask, the paste filled in the opening pattern portion of the pattern forming mask is reduced from remaining in the opening pattern portion of the pattern forming mask, The transfer amount can be improved.

  In this case, since most of the paste filled in the opening pattern portion of the pattern forming mask is transferred to the pattern forming substrate, the width of the opening pattern portion made of emulsion is narrowed and transferred to the pattern forming substrate. It is necessary to control the amount of paste that is applied. In order to form a diamond-shaped transparent electrode pad, a rectangular opening pattern part is formed by a plurality of lines, the line width of the rectangular opening pattern part is changed, the pad outer peripheral part is widened, and the pad central part is narrowed. Thus, the amount of paste discharged can be changed to provide a distribution of wiring resistance within the pad.

  Further, in order to obtain a diamond-shaped transparent electrode pad, since the paste discharged from the rectangular opening pattern portion becomes a plurality of lines, it is necessary to form a pad shape that is connected by a drying process and has no gap. Therefore, a gap can be eliminated by forming a line connecting the lines of the rectangular opening pattern portion.

  That is, the present invention provides a fine pattern forming apparatus for transferring a paste from a pattern forming mask having an opening at a predetermined position to a predetermined position on a pattern forming substrate fixed to a table using an ejection mechanism. In order to realize pattern formation with high accuracy and stability, the corner of the discharge mechanism portion that contacts the pattern forming mask is formed in a concave shape, and the surface of the tip portion of the discharge mechanism portion including the concave portion is formed. Covered with a film having liquid repellency, and filling and transferring a paste to a pattern forming mask having a desired pattern opening, a concave part at the tip of the discharge mechanism covered with a film having liquid repellency By promoting paste rolling inside the region formed by the pattern forming mask and the pattern forming mask, the fine pattern can be formed accurately. It is.

  The pattern forming mask using the discharge mechanism portion mounted on the pattern forming apparatus of the present invention is not limited to the metal mask, mesh mask and the like described here.

  The present invention relates to a method of patterning a pattern by a pattern forming method, for example, an electronic device, pattern formation of an electrode wiring on the surface of a solar cell, pattern formation of an electrode wiring on a printed wiring board, liquid crystal display substrate Pattern formation of frame-shaped sealing material, formation of dielectric layer on plasma display substrate, filling pattern of pixel spacing wall and electrode wiring and fluorescent material, formation of filling pattern of conductor material in cell through hole for back contact type solar cell, In pattern formation in various fields such as filling pattern formation of insulating material in semiconductor recess opening, high aspect conductive pillar pattern formation on semiconductor pad, insulation layer pattern formation on semiconductor surface, rewiring pattern formation, etc. Fine patterns and patterns such as filling high-aperture openings, which were impossible with conventional technology Formation can be carried out.

Hereinafter, the present invention will be described with specific examples.
In the following embodiments, when it is necessary for the sake of convenience, the description will be divided into a plurality of sections or embodiments. However, unless otherwise specified, they are not irrelevant to each other. There are some or all of the modifications, details, supplementary explanations, and the like.

  Further, in the following embodiments, when referring to the number of elements (including the number, numerical value, quantity, range, etc.), especially when clearly indicated and when clearly limited to a specific number in principle, etc. Except, it is not limited to the specific number, and may be more or less than the specific number.

  Components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiments, and the repetitive description thereof is omitted in principle. Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  A configuration of the pattern forming apparatus 100 on which the ejection mechanism unit 1 according to the first embodiment is mounted will be described with reference to FIG. FIG. 1 is a front view of a pattern forming apparatus 100 on which the ejection mechanism unit 1 according to the first embodiment is mounted. In FIG. 1, for the sake of simplicity, the display of the discharge unit 101 at the tip of the discharge mechanism unit 1, the frame, side wall, column, support member, and the like of the apparatus, and the mechanism for transporting and transferring the pattern forming substrate are omitted. Yes.

  The pattern forming apparatus 100 includes a pattern forming mask portion 110, a pattern forming substrate support table portion 23, a discharge mechanism unit 120, a discharge mechanism portion drive mechanism portion 130, a paste pressurizing mechanism 2, a paste introduction path 3, and a paste storage tank. 4 and a control unit 21.

  The pattern forming mask portion 110 is a pattern forming mask 11 provided with a pattern opening portion designed to form a desired circuit pattern of a substrate to be patterned (for example, a glass substrate) 6 (actually described later). And a plate frame 22 having a rectangular shape in plan view that is held in tension by a tension mesh surrounding the pattern forming mask 11, and a support member 111 that supports the plate frame. Has been.

  The pattern forming substrate support table unit 23 drives the table 231 on which the pattern forming substrate 6 is placed, the chuck unit 232 that fixes the pattern forming substrate 6 placed on the table 231, and the table 231 up and down. The vertical drive unit 233 is provided.

  The discharge mechanism unit 120 includes a discharge mechanism section 1, a discharge mechanism section fixing jig 16, a discharge mechanism section head 15, and an air cylinder 24.

  The air cylinder 24 is fixed to the support member 25 and drives the discharge mechanism unit 120 connected to the air cylinder 24 up and down. The support member 25 is supported by a bearing portion 26 that is engaged with the drive shaft 27.

  The drive shaft 27 of the discharge mechanism drive mechanism 130 is constituted by a ball screw, and the bearing 26 engaged with the drive shaft 27 is moved in the left-right direction in the figure by being driven to rotate by the motor 30. The unit 120 moves along the guide shaft 28 in the left-right direction in the figure. The drive shaft 27 and the guide shaft 28 are supported by a fixed plate 29.

  The control unit 21 controls the operation of each unit of the pattern forming apparatus 100. First, the air cylinder 24 is driven by controlling the air cylinder driving unit 31 that drives the air cylinder 24 with a control signal from the control unit 21. Further, the control unit 21 controls the driver unit 32 of the motor 30 to rotate the motor 30 in the forward and reverse directions. Further, the pattern forming substrate 6 placed on the table 231 is fixed by controlling the chuck driving unit 34 that drives the chuck unit 232 of the pattern forming substrate support table unit 23 according to a control signal from the control unit 21. The opening / closing operation of the chuck portion 232 is performed. Furthermore, the table 231 is moved up and down by controlling the table drive unit 33 that drives the vertical drive unit 233 of the pattern forming substrate support table unit 23 according to a control signal from the control unit 21. Furthermore, the chuck 232 is opened and closed by controlling the drive unit 34 of the chuck 232 of the pattern forming substrate support table unit 23 by a control signal from the control unit 21.

The operation of the pattern forming apparatus having the above configuration will be described with reference to the flowchart of FIG.
First, the air cylinder 24 is driven by the air cylinder driving unit 31 to lower the discharge mechanism unit head 15 to bring the tip of the discharge mechanism unit 1 into contact with the upper surface of the pattern forming mask 11 (S201). The pattern forming substrate 6 is placed at a predetermined position on the pattern forming substrate support table 231 (S202), and the pattern forming substrate support table 231 is conveyed and arranged at a predetermined position on the pattern forming mask 11. Then, the pattern forming substrate 6 is fixed and held on the pattern forming substrate support table 23 by the chuck portion 232 (S203).

  Next, the table driving unit 32 drives the vertical driving unit 233 to raise the table 231 (S204), and the pattern forming substrate 6 is separated from the pattern forming mask 11 of the pattern forming mask unit 110 by a predetermined distance. To install. Next, the air cylinder drive unit 31 drives the air cylinder 24 to lower the ejection mechanism unit head 15 (S205), and the pattern forming mask 11 of the ejection unit 101 (not shown) at the tip of the ejection mechanism unit 1 is patterned. It is made to adhere to forming substrate 6 (S206). At this time, the discharge mechanism unit 120 is located at the left end portion of FIG.

  Next, the pattern forming mask 11 of the discharge portion 101 (not shown) at the tip of the discharge mechanism portion 1 is in close contact with the pattern forming substrate 6, along the pattern forming mask 11 from the left side to the right side in FIG. The movement is started toward (step S207). Immediately thereafter, the paste in the discharge mechanism section 1 is pressurized and supplied by a paste supply means (not shown) (S208).

  While the paste is pressurized and supplied, the driver 30 is controlled to drive the motor 30 and rotate the drive shaft 27 composed of a ball screw to rotate the discharge mechanism unit 120 and the discharge mechanism 1 attached to the tip thereof. 1 is moved from the left side to the right side of FIG. 1 along the pattern forming mask 11 in a state where the pattern is pressed against the pattern forming mask 11, whereby the pattern of the pattern forming mask 11 by the paste is placed on the pattern forming substrate 6. A pattern is formed, and pressurization and supply of the paste in the discharge mechanism unit 1 by the supply unit is stopped immediately before the discharge mechanism unit 1 moves a predetermined distance (S209). After the discharge mechanism unit 1 moves a predetermined distance, the driver unit 32 stops driving the motor 30 and stops the movement of the discharge mechanism unit 1.

  Next, the air cylinder drive unit 31 drives the air cylinder 24 to raise the ejection mechanism unit head 15L (S210), and the ejection mechanism unit 1 is returned to the installation position on the upper surface of the pattern forming mask 11. At this time, the tip of the discharge mechanism portion 1 is in contact with the pattern forming mask 11. Next, the table drive unit 33 controls the vertical drive unit 233 to lower the table 231 (S211). When the table 231 reaches the lower end, the vertical drive unit 233 stops the lowering of the table 231 and moves the table 231. (S212).

  The chuck drive unit 34 is controlled to open the chuck unit 232 holding the pattern forming substrate 6 and the pattern forming substrate 6 is removed from the table 231 by handling means (not shown) (S213). It is determined whether or not the extracted pattern forming substrate is the last pattern forming substrate to be processed. In the last case, the air cylinder 24 is driven by the air cylinder driving unit 31 in order to end the processing. Then, the ejection mechanism section head 15 is moved up and down, and the tip of the ejection mechanism section 1 is separated from the upper surface of the pattern forming mask 11.

  On the other hand, when there is a substrate to be processed next, since the tip of the ejection mechanism unit 1 and the upper surface of the pattern formation mask 11 are in contact (S201), the processing flow from here is executed again. However, pattern formation is performed by moving the ejection mechanism unit 1 in close contact with the pattern forming mask 11 from the right side to the left side in FIG.

  The configuration of the discharge unit 101 at the tip of the discharge mechanism unit 1 according to the first embodiment will be described with reference to FIG. FIG. 3 is a cross-sectional view simulating a situation in which a pattern is formed using the discharge unit 101 at the tip of the discharge mechanism unit 1 of the first embodiment. In FIG. 3, for the sake of simplicity, notations such as a holder for fixing the discharge mechanism 1 to the pattern forming apparatus are omitted. As the pattern forming mask 11, in the example shown in FIG. 3, a pattern forming mask 40 in which a transfer pattern is formed with an emulsion 41 on a metal mesh 42 and a pattern opening 43 is provided is used.

  The discharge part 101 at the tip of the discharge mechanism part 1 is made of polyurethane resin 102, and a liquid-repellent film 103 is formed on the surface thereof. Further, the discharge portion 101 is formed with an arc-shaped concave portion 8. The discharge part 101 is fixed to the discharge mechanism part 1 by a claw part 124 and held. When the pattern is formed, a printing pressure is applied by the air cylinder 24 to bring the pattern forming mask 11 (40) and the discharge portion 101 at the tip of the discharge mechanism portion 1 into close contact, and the pattern formation mask 11 (40) is applied. Pressed.

  In this state, the paste 9 stored in the paste storage tank 4 and pressurized by the paste pressurizing mechanism 2 passes through the paste introduction path 3 from the paste flow path 10 built in the discharge mechanism section 1 to the discharge mechanism section 1. It is supplied to the discharge unit 101 at the tip. By moving the ejection mechanism section 1 in the pattern forming direction 200 while the paste 9 is supplied, the paste 9 is filled in the emulsion opening pattern section 43 of the pattern forming mask 11 (40), and the substrate 6 to be patterned 6 A pattern can be formed.

An example of a manufacturing method of the discharge unit 101 at the tip of the discharge mechanism unit 1 according to the first embodiment will be described.
First, as a pre-process, a structure serving as a base of the discharge unit 101 at the tip of the discharge mechanism unit 1 is created.
Using a mold processed to a predetermined size, a solution as a raw material of the polyurethane resin 102 is poured into the mold. Heat is applied with an appropriate temperature profile to cure the polyurethane resin 102. When the temperature was lowered, the discharge mechanism unit 1 was taken out of the mold, thereby producing a structure of the discharge unit 101 at the tip of the discharge mechanism unit 1 in which the polyurethane resin 102 was formed around the core material 104.

  In this way, the polyurethane resin 102 having a hardness of 80 degrees or more is formed. As an example, the tip of the discharge mechanism is processed by a polishing machine so as to have a predetermined shape (arc-shaped concave portion 8). A pair of polishing processes for forming the discharge part 101 at the tip of the discharge mechanism part 1 into a predetermined shape (arc-shaped concave part 8) are provided on both sides of the discharge part 101 at the tip of the discharge mechanism part 1, Are formed at the same time.

A method for forming a hydrocarbon film will be described as an example of the liquid repellent treatment on the surface of the discharge unit 101 at the tip of the discharge mechanism unit 1.
The hydrocarbon film is formed by plasma treatment. First, the discharge portion 101 manufactured in the previous step is masked at portions where film formation is unnecessary, and only the portions where the hydrocarbon film is formed are exposed.

  A power connection terminal (not shown) is attached to the discharge unit 101, and a high frequency power is applied through the power connection terminal in a state where a carbon-containing compound gas is introduced as a material gas in a film forming apparatus chamber (not shown). . As a result, plasma is generated in the chamber of the film forming apparatus, and a diamond-like hydrocarbon film (diamond-like carbon film) is formed on the surface of the place where the film is formed.

  In this manner, diamond-like carbon, which is a liquid repellent film 103, was formed on the surface of the polyurethane resin 102 of the discharge unit 101.

  The structure of the discharge mechanism 1 is basically the same on the left and right with the paste flow path 10 shown in FIG. The discharge portion 101 at the tip of the discharge mechanism portion 1 has a circular arc-shaped concave portion 8 that is symmetrical with respect to the paste flow path 10.

  When the pattern is formed, the paste 9 passes through the paste flow path 10 in the discharge mechanism unit 1 and paste contact surfaces 10L and 10R of the polyurethane resin 102 forming the discharge unit 101 at the tip of the discharge mechanism unit 1 (see FIG. 4B). The paste 9 is inserted and filled in the emulsion opening pattern portion 43 formed in the pattern forming mask 11 (40). Further, the paste 9 rolls at the arc-shaped concave portion 8 at the tip of the discharge mechanism portion, and is covered through the pattern opening 43 of the pattern forming mask 11 (40) formed on the pattern forming mask 11 (40). The paste 9 is filled until it reaches the pattern forming substrate 6.

  The paste 9 rolls in the arc-shaped concave portion 8 in which the liquid-repellent film 103 is formed on the surface of the polyurethane resin 102 that forms the discharge portion 101 at the tip of the discharge mechanism portion 1 to roll the pattern forming mask 11 (40). The emulsion opening pattern portion 43 is filled and reaches the pattern forming substrate 6 through the pattern forming mask 11 (40). Actually, the paste 9 pressurized through the paste flow path 10 is filled in the discharge unit 101 at the tip of the discharge mechanism unit 1, but only a part of the paste 9 is shown for easy explanation. . Moreover, although the rhombus-shaped transparent conductive pad is formed, only a part thereof is shown for the sake of explanation.

  FIG. 3A shows a situation in which the paste 9 is transferred from the discharge portion 101 at the tip of the discharge mechanism portion 1 to the pattern forming substrate 6 from the pattern opening 43 of the pattern formation mask 11 (40). Yes. Here, the pattern forming mask 11 (40) and the patterned substrate 6 are provided with a gap for separating the plates. FIG. 3B shows a state immediately after the formation of the paste pattern 9A by the paste 9 on the substrate 6 to be patterned is completed, and the pattern forming mask 11 (40) has a gap for separating the plate. It is away from the pattern forming substrate 6. The transfer amount of the paste 9 varies depending on the width of the pattern opening 43 of the pattern forming mask 11 (40), and the amount of the conductive material contained in the paste pattern 9 formed on the pattern forming substrate 6 also varies. Yes. Thereafter, a state in the middle of drying the solvent contained in the paste pattern 9A is shown in FIG.

  The paste pattern 9A transferred as shown in FIG. 3B has fluidity due to the solvent immediately after the formation, and spreads on the substrate 6 to be patterned, like the paste pattern 9B in FIG. become. Even in the drying stage, the spread of the paste pattern 9B proceeds, and finally the isolated paste pattern is integrated. FIG. 3D shows a state where the drying is finished and a transparent electrode is formed by an integrated paste pattern. The transparent electrode thus formed shows that the thickness is different between the end portion 9C formed by a relatively large opening pattern and the other portion 9D.

  The paste 9 rolls in the arc-shaped concave portion 8 of the polyurethane resin 102 forming the discharge portion 101 at the tip of the discharge mechanism portion 1 and fills the pattern opening 12 of the pattern forming mask 11 with reference to FIG. 4A. And it demonstrates in detail using FIG. 4B. Actually, the paste 9 pressurized through the paste flow path 10 is filled in the discharge unit 101 at the tip of the discharge mechanism unit 1, but for ease of explanation, only a part of the paste 9 is shown. Yes. In FIG. 4A, the situation on the left side of the discharge part 101 at the tip of the discharge mechanism part 1 shown in FIG. The same applies to the right side. In the present embodiment, a pattern forming mask 40 as will be described later is actually used as the pattern forming mask 11, but here, in order to simplify the description, the pattern forming mask 13 employing a metal plate. The case where is used will be described.

  First, referring to FIG. 4A, when the discharge unit 101 at the tip of the discharge mechanism unit 1 is moved in the direction of the arrow 200 while being pressed against the pattern forming mask 13, the surface of the tip of the discharge unit 101 </ b> L of the discharge mechanism unit 1 is used. The paste 9 is filled into the pattern opening 12 (corresponding to the opening 43 in FIG. 3) formed in the pattern formation mask 13 from the arc-shaped concave portion 8L in which the liquid-repellent film 103L is formed. (A) to (e) will be schematically described in time series. Reference numeral 6 denotes a pattern forming object. In FIG. 4A, the flow of the paste 9 is indicated by arrows (A), (C), (G), and the display of the paste 9 itself is omitted.

  4A, the arc-shaped concave portion 8L in which a liquid-repellent film 103L is formed on the surface of the polyurethane resin 102L of the discharge portion 101L at the tip of the discharge mechanism portion 1 is formed on the pattern forming mask 13. FIG. The state before reaching the pattern opening 12 is shown. The discharge portion 101L has the other corner portion 82L of the arc-shaped concave shape portion 8L with respect to the pattern formation mask 13 in a state where the corner portion 81L of the arc-shaped concave shape portion 8L is pressed against the pattern formation mask 13. A state in which the gap is empty and the tangential direction of the arc-shaped concave portion 8L in the vicinity of the corner portion 82L is right-down in the state of FIG. 4A (in the arc-shaped concave portion 8L, the corner portion 82L is the pattern forming mask 13). In a state of projecting to the side of the arc, or in a state where the apex of the arc-shaped concave shape portion 8L is between the corner portion 81L and the corner portion 82L, or the corner portion 82L of the arc-shaped concave shape portion 8L is arc-shaped In a state of being lower than the vertex of the concave shape portion 8L).

  As a result, the space formed by the arc-shaped concave portion 8L and the pattern formation mask 13 has an inner interval than the interval between the inlets (outlets) of the paste 9 formed by the corner portions 82L and the pattern formation mask 13. The space is larger, that is, a space in which the interval between the corner portion 82L of the inlet (exit) of the paste 9 and the pattern forming mask 13 is narrow and the inside is swollen is formed.

  When the corner portion 81L of the discharge portion 101L as shown in FIG. 4A is pressed against the pattern forming mask 13 and moves in the direction of the arrow 200, the paste supplied to the front surface of the discharge portion 101L in the traveling direction. 9 is pushed by the paste contact surface 10L of the discharge unit 101L and moves in the same direction as the discharge unit 101L. A part of the paste moving in the same direction as the discharge part 101L is below the tip of the arcuate concave part 8L in which the liquid repellent film 103L is formed on the surface of the discharge part 101L (on the side of the pattern forming mask 13). ) Enters the inside of the space formed by the arc-shaped concave portion 8L and the pattern forming mask 13 from the gap G (see FIG. 4B) between the corner portion 82L protruding to the pattern forming mask 13 (see FIG. 4A). (A) (i)).

  The paste 9 that has entered the space formed by the arc-shaped concave portion 8L and the pattern formation mask 13 hits the corner portion 81L of the discharge portion 101L pressed against the pattern formation mask 13 and escapes upward. ((C) of FIG. 4A (a)). The paste 9 escaping upward moves toward the corner 82L along the surface of the arc-shaped concave portion 8L having the liquid-repellent film 103 formed on the surface, and the corner 82L and the pattern forming mask 13 are moved. From the narrow gap G (see FIG. 4B) to the paste contact surface 10L side of the discharge unit 101L (FIG. 4A (a) (G)).

  The angle at which the discharge portion 101L further proceeds in the direction of the arrow 200 and protrudes below the tip of the arcuate concave portion 8L of the discharge portion 101L (on the pattern forming mask 13 side) as shown in FIG. 4A (b). The portion 82L reaches above the pattern opening 12 formed in the pattern formation mask 13.

  Here, the gap G between the corner portion 82L and the pattern forming mask 13 enters the space formed by the arc-shaped concave portion 8L and the pattern forming mask 13 ((A) in FIG. 4A (b)). ), The paste 9 ((c) in FIG. 4A (b)) that hit the corner 81L of the discharge part 101L and escaped upward is an arc-shaped concave part 8L having a liquid-repellent film 103L formed on the surface. A portion of the paste 9 that has been pushed to the paste contact surface 10L side of the discharge portion 101L from the narrowed gap G between the corner portion 82L and the pattern forming mask 13 by moving along the surface of The paste 9 is applied to the pattern opening 12 by receiving downward pressure (from the corner 82L side toward the pattern formation mask 13) at the narrowed gap G between 82L and the pattern formation mask 13. Pushed in (in FIG. 4A (b) (G)).

  When the discharge mechanism section 1 further advances in the direction of the arrow, as shown in FIG. 4A (c), the corner 82L at the tip of the discharge section 101L passes above the pattern opening 12, and the arc-shaped concave section 8L is formed. It reaches above the pattern opening 12. In this state, the force for pushing the paste 9 into the pattern opening 12 does not act, and the corner 82L at the tip of the arcuate concave portion 8L of the discharge portion 101L and the pattern are the same as in the state of FIG. 4A (a). The paste 9 ((A) in FIG. 4A (c)) that enters the space formed by the arc-shaped concave shape portion 8L and the pattern formation mask 13 from the gap G between the formation mask 13 and the corner portion It advances to the corner 82L side along the surface of the arc-shaped concave portion 8L on which the liquid-repellent film 103 is formed on the surface by striking 81L (FIG. 4A (c) (C)), and from the gap G It is extruded to the paste contact surface 10L side of the discharge part 101 ((G) of FIG. 4A (c)).

  The corner portion 81L of the arc-shaped concave portion 8L of the discharge portion 101L that the discharge mechanism portion 1 further advances in the direction of the arrow and is pressed against the pattern formation mask 13 as shown in FIG. 4A (d) is a pattern formation mask. 13 pattern openings 12 are reached.

  Here, from the gap G between the corner portion 82L and the pattern forming mask 13, the paste 9 (see FIG. 4A (d)) that enters the space formed by the arc-shaped concave portion 8L and the pattern forming mask 13 is formed. (A)) shows that the paste 9 hits the corner 81L inside the arc-shaped concave portion 8L having the liquid-repellent film 103 formed on the surface, and a part of the paste 9 is pushed into the pattern opening 12 of the pattern forming mask. The remainder escapes upward ((c) in FIG. 4A (d)) and is pushed out from the gap G along the upper surface of the arc-shaped concave portion 8L to the paste contact surface 10L side of the discharge portion 101 ( FIG. 4A (d) (G)).

  The ejection mechanism portion 1 further advances in the direction of the arrow, and the corner portion 81L of the arc-shaped concave portion 8L of the ejection portion 101L passes through the pattern opening portion 12 of the pattern forming mask 13 as shown in FIG. 4A (e). Then, the paste 9 moves in the order of (A), (C), and (G), and the pattern formation by the pattern opening 12 is completed.

  In this way, by using the discharge portion 101L in which the arcuate concave portion 8L that forms the gap G narrowed between the corner portion 82L of the tip and the pattern forming mask 13 is formed by projecting downward, Since the paste 9 is pushed into the pattern opening 12 of the pattern forming mask 13 twice in the state of (b) and (d) of FIG. 4A, the paste 9 is surely filled into the pattern opening 12. be able to.

  Here, in FIG. 4A (b), the paste 9 rolls inside the arc-shaped concave portion 8L having the liquid-repellent film 103 formed on the surface thereof, and a part of the paste 9 is a pattern opening of the pattern forming mask 13. The state of being pushed into the portion 12 will be described in more detail with reference to FIG. 4B.

  In FIG. 4B, a change in the relative position of the discharge portion 101L of the paste 9 in the arc-shaped concave portion 8L in which the liquid repellent film 103L is formed on the surface of the discharge portion 101L at the tip of the discharge mechanism portion 1 Shown with an arrow. In FIG. 4B, (A), (C) and (G) attached to the arrow indicating the movement of the paste 9 correspond to (A), (C) and (G) described in FIG. 4A. 4B shows a polyurethane resin 102R that forms a discharge portion 101R that forms a pair with the discharge portion 101L, a paste contact surface 10R of the polyurethane resin 102R, a recess 8R formed in the polyurethane resin 102R, an end portion 82R, and a discharge portion. A liquid repellent film 103R is also shown on the surface of 101R.

  With the edge 81L at the lower end of the arc-shaped concave portion 8L formed in the discharge portion 101L being pressed against the pattern forming mask 13, the discharge portion 101L is driven in the direction of the arrow 200 by being driven by the discharge mechanism portion drive mechanism 130. , The paste 9 supplied between the paste contact surface 10L and the paste contact surface 10R is formed between the end 82L of the recess 8L formed in the discharge portion 101L and the pattern forming mask 13 from the position (a). The gap G enters the inside of the space formed by the concave portion 8L having the liquid-repellent film 103 formed on the surface and the pattern formation mask 13 (b).

  At this time, the paste 9 already present at the position (b) is pushed out toward the end 81L of the recess 8L. Since the end portion 81L is pressed against the pattern forming mask 13, the paste 9 that has reached the end portion 81L is pushed upward (C), and then the end portion in the direction opposite to the arrow direction in (B). It is pushed back to the 82L side (d).

  As a result, the paste 9 already present at the positions (c) and (d) is pushed back in the opposite direction from the position (d) along the liquid repellent film 103 formed on the wall surface of the recess 8L. In response to the downward force along the tangential direction in the vicinity of the end 82L of the recess 8L, it is pushed out (e). The paste 9 is pushed by the downward force at the end 82L whose tangent direction is lowered to the right in FIG. 4B, and a part of the paste 9 is pushed into the opening 12 formed in the pattern forming mask 13. (F) The inside of the opening 12 is filled with the paste 9.

  The paste 9 that could not enter the opening portion 12 is discharged from the gap G between the end portion 82L and the pattern forming mask 13 to the paste contact surface 10L side of the discharge portion 101L (G). That is, the force that the paste 9 that has entered the recess 8L rolls in a region (space) formed by the recess 8L and the pattern formation mask 13 and presses it toward the pattern formation mask 13 at the end 82L and its vicinity. It is discharged to the outside of the recess 8L again.

  In this way, when the discharge unit 101L advances in the direction of the arrow 200, the gap 82L enters the inside of the recess 8L from the gap G between the end 82L of the recess 8L formed in the discharge unit 101L and the surface of the pattern formation mask 13. The paste 9 rolls inside the recess 8L having the liquid-repellent film 103 formed on the surface, and is discharged to the outside of the recess 8L from the gap G between the end 82L and the surface of the pattern formation mask 13. Sometimes, a part thereof is pushed into the opening 12 formed in the pattern forming mask 13, so that the paste is surely filled into the opening 12.

  On the other hand, when the discharge portion 101L advances in the direction opposite to the arrow 200, the end portion 82R of the recess portion 8R formed on the discharge portion 101R and having the liquid repellent film 103R formed on the surface is the end portion 82L described above. The paste 9 is formed in the pattern forming mask 13 by rolling the paste 9 inside the recess 8R and discharging it from the gap G between the end 82R and the surface of the pattern forming mask 13 to the outside of the recess 8R. The paste 9 can be reliably filled into the opening 12.

  By moving the ejection mechanism unit 1 by a predetermined distance to fill the opening 12 formed in the pattern forming mask 13 with the paste, and separating the pattern forming mask 13 and the pattern forming object 6, A pattern is formed on the surface of the pattern forming object 6 by a paste filled in the opening 12 of the pattern forming mask 13.

  In FIG. 4A and FIG. 4B described above, in order to simplify the explanation, the case where the pattern forming mask 13 employing a metal plate is used as the pattern forming mask 11, but the cross section is shown in FIG. A pattern forming mask 40 in which a transfer pattern is formed of an emulsion 41 on a metal mesh 42 and a pattern opening 43 is provided may be used as shown in FIG.

  As described above, the paste 9 is rolled inside the recess 8L having the liquid-repellent film 103 formed on the surface thereof and pushed into the opening 12 formed in the pattern forming mask 13, thereby opening the opening. The portion 12 can be reliably filled with paste. As a result, it is not necessary to move the discharge mechanism portion 1 a plurality of times, and a pattern made of the paste 9 can be formed on the pattern forming object 6 simply by moving the discharge mechanism portion 1 once in a predetermined distance. It became possible.

  In the first embodiment, a case where a rhombus-shaped transparent electrode pad pattern is formed on the surface of the pattern forming object 6 will be described. In the pattern forming mask 40 having a cross-sectional configuration as shown in FIG. 3 for forming a rhombus-shaped transparent electrode pad, a high-strength wire having a wire diameter of 19 μm and a thickness of 25 μm was used as the metal mesh 42. # 500 twill weave was used. The twill weave was used after being calendered so that the thickness after the mesh creation was twice or more the wire diameter, so that the thickness was about 1.3 times that of the wire. A pattern forming mask 40 in which a pattern opening 43 having a line width of 20 μm to 50 μm was formed on this metal mesh with an emulsion 41 having a thickness of 10 μm was used.

  In order to separate the plate between the pattern forming mask 40 and the pattern forming substrate 6 using mesh tension, the tension of the pattern forming mask 40 is 0.2 mm or less (with a tension gauge STG-80NA manufactured by Protech Co., Ltd.). Measurement).

  As the paste 9 used in the verification experiment of Example 1, a transparent conductive film forming paste having a viscosity of 10 Pa · s in which silver nanowires having a diameter of 20 nm are dispersed was used. The solid content of the paste 9 is 1%, and the paste transferred to a thickness of 10 μm is designed to be 0.1 μm or less after drying. Since the paste 9 is not transferred by the emulsion 41 except for the emulsion opening pattern portion 43 (corresponding to the pattern opening portion 12 in FIGS. 3, 4A, and 4B) formed in the pattern forming mask 40 as shown in FIG. After the forming mask 40 and the pattern forming substrate 6 are separated from each other, when the paste 9 transferred to the pattern forming substrate 6 spreads and is integrated, the thickness of the central portion of the rhombus-shaped transparent electrode pad The emulsion opening pattern portion 43 was designed so that the thickness was about 0.05 μm.

  Of the emulsion opening pattern portion 43 shown in FIG. 5, the rectangular emulsion opening pattern portion 44 is for forming a low resistance electrode portion around the rhombus-shaped transparent electrode pad. The pattern part 45 is for forming an electrode part with high transparency at the central part of the rhombus-shaped transparent electrode pad. Further, in FIG. 5, a linear emulsion opening pattern portion 46 formed vertically and horizontally inside the rectangular emulsion opening pattern portion 44 is integrated with a rectangular pattern paste 9 transferred to the pattern forming substrate 6. It is for making it.

  Further, the emulsion opening pattern portion 47 extending from the rectangular emulsion opening pattern portion 44 to the left and right sides is for forming a connection electrode for connecting the adjacent rhombus-shaped transparent electrode pads. Here, the periphery of the rhombus-shaped transparent electrode pad transferred to the pattern-forming substrate 6 and the electrode portion for pad connection are arranged inside the transparent electrode pad where transparency is important in order to reduce resistance. The emulsion opening pattern portion 43 was designed so as to be thicker than this portion and to be about 1.0 μm after drying.

  FIG. 6 shows an outline of the emulsion opening pattern portion 43 of the pattern forming mask 40 used for forming the rhombus-shaped transparent electrode pad. As shown in FIG. 6, in order to change the transfer amount of the paste 9, the emulsion opening pattern portion is changed from 43A to 43D.

  Emulsion having a pattern forming mask 40 having different opening patterns 44 to 47 in the range of 20 μm to 50 μm as a rectangular line pattern as shown in FIG. Pattern formation was performed using the pattern formation mask 40 in which the opening pattern portion 43 was formed. The thickness of the emulsion 41 of the pattern forming mask 40 is 10 μm, and the transfer thickness of the paste 9 to the pattern forming substrate 6 is aimed at 10 μm.

  As the discharge part at the tip of the discharge mechanism part 1 used for the verification, the discharge part 101 having the same shape and having the liquid repellency film 103 formed on the surface produced in this example and imparting the liquid repellency, and the surface repellent. A comparative study was performed using a discharge portion in which a liquid film was not formed and liquid repellent treatment was not performed.

  In the case where the discharge mechanism 101 having the liquid repellency film 103 formed on the surface and imparting liquid repellency is used as the discharge portion 101 at the tip of the discharge mechanism portion 1 of the first embodiment, the arc shape at the tip of the discharge mechanism portion 1 is used. Thus, the rolling of the paste 9 occurred in the concave portion 8, and the viscosity of the paste 9 became low, and the emulsion opening pattern portion 43 formed in the pattern forming mask 40 could be completely filled.

  As a result, after the pattern forming mask 40 and the pattern forming substrate 6 are separated from each other, the paste 9 transferred to the pattern forming substrate 6 spreads to form a good rhombus-shaped transparent electrode. done. The outline of the result of forming the rhombus-shaped transparent electrode portions 700 and 710 is shown in FIGS. 7A and 7B.

  FIG. 7A is a locally enlarged plan view schematically showing individual X-axis transparent electrodes 701 and inter-electrode wirings 702 constituting the X-axis transparent electrode part 700 formed in this embodiment. The thick portion of the thick film is darkened and the thin portion of the thin film is thin, and the difference in thickness of the rhombus-shaped transparent electrode 701 is highlighted. FIG. 7B is a locally enlarged plan view schematically showing individual Y-axis transparent electrodes 711 and inter-electrode wirings 712 constituting the Y-axis transparent electrode part 710 formed in this embodiment.

  On the other hand, when a discharge part that has not been subjected to liquid repellent treatment is used instead of the discharge part 101 in the discharge mechanism part 1, rolling of the paste 9 is impaired in the arc-shaped concave part 8 at the tip of the discharge part, resulting in pattern formation. Depending on the size of the emulsion opening pattern portion 43 formed in the mask 40, the filling of the paste 9 into the emulsion opening pattern portion 43 was different. As a result, a void defect having no paste in a part of the rhombus-shaped transparent electrode occurred.

  As described above, by mounting the ejection mechanism section 1 including the ejection section 101 as described in the first embodiment on the pattern forming apparatus 100, the size of the opening area in the emulsion opening pattern section 43 of the pattern forming mask 40 is increased or decreased. Regardless, the paste 9 can be reliably filled in the emulsion opening pattern portion 43, and the pattern can be formed stably with high accuracy.

  For this purpose, the discharge portion 101 is processed into a special shape in which an end portion 82 projecting downward is formed by the arc-shaped concave portion 8 as shown in FIGS. 4A and 4B, and at least the paste 9 It is important to impart liquid repellency to the surface of the discharge unit 101 that comes into contact. Thus, when filling the paste 9 into the emulsion opening pattern portion 43 of the pattern forming mask 40 having a desired opening and transferring the paste 9 to the pattern forming substrate 6, the pattern forming mask 40 and the tip of the discharge 1 It is possible to promote the rolling of the paste 9 in the region formed by the arcuate concave portion 8.

  As a result, a force can be applied to the paste 9 to fill the emulsion opening pattern portion 43 of the pattern forming mask 40 in a substantially vertical direction, and the paste 9 is filled into the emulsion opening pattern portion 43 of the pattern forming mask 40. It became possible to promote sex.

  As a result, diamond-shaped transparent electrodes 701 and 711 and inter-electrode wirings 702 and 712 having both transparency and conductivity as shown in FIGS. 7A and 7B can be formed, and the resistance values of the transparent electrodes and the inter-electrode wirings can be formed. It was possible to keep the movement low as a touch panel on a 20-inch display.

The second embodiment is the same as the first embodiment except that SiO ₂ or a fluororesin is used as the liquid repellent film 103 formed on the surface of the discharge portion 101 at the tip of the discharge mechanism portion 1.

First, SiO ₂ was used as the liquid repellent film 103 formed on the surface of the discharge part 101 at the tip of the discharge mechanism part 1. An alkoxysilane-containing solution was applied by spraying to at least a portion of the discharge mechanism 1 where the paste 9 is in contact. By drying thereafter, SiO ₂ having liquid repellency could be formed on the surface of the discharge part 101 at the tip of the discharge mechanism part 1.

  The film | membrane produced | generated from the alkoxysilane used here was not contaminated with the various solvent contained in the paste 9, was stable, and was excellent in the liquid repellency with respect to water or a solvent.

  Here, the spray method is used as the film formation method, but it is possible to form the liquid-repellent film 103 by applying an alkoxysilane-containing solution by an aerosol deposition method or a dip method and drying. .

In this way, it was possible to produce the ejection mechanism section 1 used in Example 2 having the liquid-repellent film 103 made of SiO ₂ at least at the part where the paste 9 is in contact.

  Next, a fluororesin was used as the liquid repellent film 103 formed on the surface of the discharge mechanism section 1. A copolymer (PFA) of tetrafluoroethylene and perfluoroalkoxyethylene was mixed with a polyurethane resin and applied by a spray method to at least a portion of the discharge portion 101 at the tip of the discharge mechanism portion 1 that was in contact with the paste 9. Thereafter, the surface of the discharge part 101 at the tip of the discharge mechanism part 1 is cured by heat curing with the same temperature profile as that of the discharge mechanism part, whereby a copolymer (PFA) of tetrafluoroethylene and perfluoroalkoxyethylene having liquid repellency ) Was uniformly dispersed over the entire surface.

  In addition to PFA, fluororesins having liquid repellency include polytetrafluoroethylene (PTFE), a copolymer of tetrafluoroethylene and hexafluoropropylene (FEP), a copolymer of tetrafluoroethylene and ethylene (ETFE), and the like. However, a film made of a copolymer of tetrafluoroethylene and perfluoroalkoxyethylene (PFA) was the best as an organic solvent having excellent resistance to organic solvents, a large contact angle, and a small friction coefficient.

  Here, as a method of forming a film having a copolymer of tetrafluoroethylene and perfluoroalkoxyethylene, it was mixed with a polyurethane resin, applied by a spray method, and heated and cured to form a liquid repellent film 103. However, the liquid-repellent film 103 can be formed by applying and curing by a dip method.

  In this manner, the discharge mechanism unit 1 used in the second embodiment having the liquid-repellent film 103 in which the copolymer of tetrafluoroethylene and perfluoroalkoxyethylene is dispersed at least at the portion where the paste 9 contacts is prepared. I was able to do it.

  The result of verifying the pattern formation status in Example 2 was almost the same as the result of verifying the pattern formation status in Example 1.

  As described above, the pattern forming apparatus equipped with the ejection mechanism unit 1 used in the second embodiment stably and accurately pastes regardless of the size of the opening area of the emulsion opening pattern portion 43 of the pattern forming mask 11. A pattern can be formed. For that purpose, it is necessary to process the discharge part 101 at the tip of the discharge mechanism part 1 into a special shape and to impart liquid repellency to at least the discharge part 101 at the tip of the discharge mechanism part 1 with which the paste 9 contacts.

  As a result, as described in the first embodiment, when the paste is filled in the emulsion opening pattern portion 12 of the pattern forming mask 11 having a desired opening portion and the paste is transferred to the pattern forming substrate 6, the paste is transferred. Rolling is promoted. By rolling the paste, it is possible to apply a force for filling the opening in the emulsion opening pattern portion 43 of the pattern forming mask 40 in a substantially vertical direction. As a result, the filling property of the paste into the emulsion opening pattern portion 12 of the pattern forming mask 11 can be promoted.

  As in the case of the first embodiment, as the discharge portion 101 at the tip of the discharge mechanism portion 1 of the second embodiment, the discharge portion 101 having a liquid-repellent film 103 formed on the surface and imparting liquid repellency is used. Rolling of the paste 9 occurs in the arc-shaped concave shape portion 8 at the tip of the discharge portion 101, and the paste 9 is reduced in viscosity, so that the emulsion opening pattern portion 12 formed in the pattern forming mask 11 (40) is completely filled. It became possible. As a result, a rhombus-shaped transparent electrode having good transparency and a low-resistance wiring connecting the pads can be formed at the same time.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  Example 3 is the same as Examples 1 and 2 except that a pattern forming mask 50 having liquid repellency as shown in FIG. 8 is used. In the pattern forming mask 50 shown in FIG. 8, the pattern forming emulsion 51 has a laminated structure of an emulsion 51A having high hardness and excellent resolution and an emulsion 51B having excellent flexibility. A liquid repellent film 51C was formed on the exposed part of the liquid film 52C and the emulsion 51. By adding the flexible emulsion 51B, the adhesion to the surface of the pattern forming substrate 6 was improved.

  The application of liquid repellency is the same as the method formed in the arc-shaped concave shape portion 8 at the tip of the discharge portion 101 described in the first and second embodiments.

  By imparting liquid repellency to the pattern forming mask 50, the remaining amount of the paste 9 in the emulsion opening pattern portion 53 of the pattern forming mask 50 is reduced, and the pattern forming mask 50 of the paste 9 is used for pattern formation. The amount transferred to the substrate 6 increased. For this reason, since the paste 9 does not remain in the emulsion opening pattern portion 53, clogging due to drying of the paste can be prevented, and defects during mass production can be reduced.

  Compared to the case where the discharge unit 101 provided with liquid repellency produced in Examples 1 and 2 is used instead of the discharge unit 101, the transfer amount of the paste 9 is larger. Increased. As described in the first embodiment, since the discharge mechanism portion surface of the arc-shaped concave portion 8 formed in the discharge portion 101 at the tip of the discharge mechanism portion 1 has liquid repellency, the paste 9 It is considered that this is because the rolling property is not hindered and the viscosity of the paste 9 can be kept low.

  The result of verifying the pattern formation status in Example 3 was the same as the result of verifying the pattern formation status in Examples 1-2.

  As described above, by mounting the ejection mechanism section 1 of the first and second embodiments on the pattern forming apparatus 100, the paste 9 can be applied regardless of the size of the opening area in the emulsion opening pattern section 53 of the pattern forming mask 50. A pattern can be formed with high accuracy and stability.

  In order to realize this, it is necessary to process the discharge part 101 at the tip of the discharge mechanism part 1 into a special shape and to impart liquid repellency to at least the tip part 101 of the discharge mechanism part 1 with which the paste 9 contacts. is there. As a result, when the paste 9 is filled into the emulsion opening pattern portion 53 of the pattern forming mask 50 having a desired opening, and the paste 9 is transferred to the pattern forming substrate, the rolling of the paste 9 is promoted. On the other hand, it is possible to apply a force for filling the emulsion opening pattern portion 53 of the pattern forming mask 50 in a substantially vertical direction. As a result, the filling property of the paste 9 into the emulsion opening pattern portion 53 of the pattern forming mask 50 can be promoted.

  The result of verifying the pattern formation status in Example 3 was almost the same as the result of verifying the pattern formation status in Examples 1 and 2. As a result, it was possible to simultaneously form a low-resistance wiring connecting the diamond-shaped transparent electrode having good transparency and the pad in one stroke.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  The fourth embodiment is basically the same as the first to third embodiments except that a pattern forming mask 60 as shown in FIGS. 9 to 11 is used. As the metal mesh 62, # 360 plain weave using a high-strength wire having a wire diameter of 16 μm and a thickness of 20 μm was used. The mesh is made by knitting warp and weft wire, and the thickness of the mesh is about twice the diameter of the wire used. For this reason, the thickness of the mesh used was reduced to the limit by hard calendering, and the influence of foam biting by the wire crossing portion of the mesh was reduced. The thickness of the mesh used was within 1.3 times the wire diameter.

  FIG. 9 is a locally enlarged plan view schematically showing the emulsion opening pattern 63 of the pattern forming emulsion 61 as viewed from the ejection mechanism section 1 side. FIG. 10 is an enlarged schematic plan view of the local area of the emulsion opening pattern portion 67 as viewed from the substrate surface side. Further, FIG. 11 is a schematic enlarged local sectional view for explaining the pattern forming mask 60.

  The emulsion opening pattern portion 63 of FIG. 9 is an emulsion for forming an emulsion opening pattern portion 64 for forming a rhombus pattern portion corresponding to the transparent electrode 701 described in FIG. 7A and an inter-electrode wiring connecting the rhombus pattern portion. The opening pattern portion 65 is formed. The emulsion opening pattern portion 64 for forming the rhombus pattern portion corresponding to the transparent electrode 701 is an aggregate in which a plurality of cylindrical opening portions 641 are formed, and the shape, arrangement, etc. of the cylindrical opening portion 641 are designed. Thus, the desired transfer amount / distribution of the permeable paste 9 to the pattern-formed substrate 6 was defined.

  FIG. 10 is an enlarged schematic plan view of the local area of the emulsion opening pattern portion 67 as viewed from the pattern forming substrate 6 side opposite to that in FIG. The emulsion opening pattern portion 67 of the pattern forming emulsion 66 includes a diamond-shaped emulsion opening pattern portion 68 for forming a rhombus pattern portion corresponding to the transparent electrode 701, and a rhombus pattern corresponding to the transparent electrode 701. It is formed from an emulsion opening pattern portion 69 for forming an inter-electrode wiring connecting the portions. The emulsion opening pattern portion 68 for forming the rhombus pattern portion corresponding to the transparent electrode 701 is a solid pattern and takes into account the spread of the paste 9.

  As shown in FIG. 11, the emulsion opening pattern portion 64 for forming the rhombus pattern portion corresponding to the transparent electrode 701 of the emulsion opening pattern 63 viewed from the discharge mechanism portion 1 side is from the pattern forming substrate 6 side. The emulsion opening pattern portion 67 is formed inside the emulsion opening pattern portion 68 for forming a rhombus pattern portion corresponding to the transparent electrode 701.

  Although not shown, an emulsion opening pattern portion 69 for forming an inter-electrode wiring connecting the rhombus pattern portion corresponding to the transparent electrode 701 of the emulsion opening pattern portion 67 as viewed from the pattern forming substrate 6 side. Is formed in a desired wiring width, but the emulsion opening pattern portion 65 for connecting the diamond pattern portion corresponding to the transparent electrode 701 of the emulsion opening pattern 63 viewed from the ejection mechanism portion 1 side is an emulsion opening pattern portion 69. The wiring width is formed wider, the filling amount of the paste 9 is increased, and the transfer amount of the paste 9 to the pattern forming substrate 6 is increased to reduce the resistance.

  There is no mesh 62 at the top of the pattern forming mask 60 with which the discharge unit 101 comes into contact, and a pattern forming emulsion 61 is formed. Therefore, foaming of the paste 9 due to the unevenness of the mesh 62 can be reduced. In the pattern forming masks 40 and 50 according to the first to third embodiments, the tops of the pattern forming masks 40 and 50 with which the discharge unit 101 comes into contact have meshes 42 and 52, and the paste 9 is formed by the unevenness of the meshes 42 and 52. Since foaming occurs, foam biting may occur in the paste 9 transferred to the patterned substrate 6.

  Since the meshes 42 and 52 used for the pattern forming masks 40 and 50 are subjected to calendering treatment to reduce unevenness, a large amount of foam biting does not occur. It is conceivable that the solid matter is segregated. In this embodiment, such a problem can be solved by forming the pattern forming emulsion 61 on the uppermost portion of the pattern forming mask 60 with which the discharge section 101 comes into contact.

  Further, although not shown in the drawing, as in Example 3, as the pattern forming emulsion 61 of the pattern forming mask 60, as in the case described with reference to FIG. A layered structure of emulsion having excellent properties was formed, and a liquid repellent film was formed on the exposed portion of the mesh 62 and a liquid repellent film was formed on the exposed portion of the emulsion 61. By adding a flexible emulsion, adhesion to the surface of the pattern forming substrate 6 was improved.

  By imparting liquid repellency to the pattern forming mask 60, the remaining amount of the paste 9 in the emulsion opening pattern portion 63 on the discharge portion 101 side of the pattern forming mask 60 is reduced, and the pattern forming mask for the paste 9 is thus formed. The transfer amount from 60 to the substrate 6 for pattern formation increased. Thereby, since the paste 9 does not remain in the pattern opening portion emulsion opening pattern portion 63, clogging due to drying of the paste can be prevented, and defects during mass production can be reduced.

  The discharge unit 101 imparted with liquid repellency used in Examples 1 to 3 has a larger transfer amount than the case where a discharge unit not subjected to liquid repellency treatment is used instead of the discharge unit 101. . This is because the surface of the arc-shaped concave portion 8 formed in the discharge portion 101 has liquid repellency, so that the rolling property of the paste 9 is not hindered and the viscosity of the paste 9 is kept low. It is thought that this was a factor.

  The result of verifying the pattern formation status in Example 4 was the same as the result of verifying the pattern formation status in Examples 1-3.

  As described above, by mounting the ejection mechanism section 1 described in the first to fourth embodiments on the pattern forming apparatus 100, the opening area of the emulsion opening pattern section 63 on the ejection mechanism section 1 side of the pattern forming mask 60 is reduced. Regardless of the size, the paste 9 can be formed with high accuracy and stability. For that purpose, the discharge part 101 at the tip of the discharge mechanism part 1 is processed into a special shape, and at least the liquid discharge repellency to the discharge part 101 in contact with the paste 9 is given to form a pattern having a desired opening. When the paste 9 is filled in the emulsion pattern opening 63 on the ejection mechanism portion 1 side of the mask 60 and the paste 9 is transferred to the substrate 6 to be patterned, the rolling of the paste 9 is promoted and the pattern is formed on the paste 9. A force can be applied to the emulsion opening pattern portion 63 on the ejection portion 101 side of the mask 60 for filling in a substantially vertical direction, and the paste to the emulsion opening pattern portion 63 on the ejection mechanism portion 1 side of the pattern forming mask 60 can be applied. The filling ability of 9 could be promoted.

  The paste 9 filled in the emulsion opening pattern portion 63 on the ejection mechanism portion 1 side passes through the mesh 62 in the emulsion opening pattern portion 63 and is filled in the emulsion opening pattern portion 67 on the substrate surface side. The rhombus pattern portion 68 of the emulsion opening pattern portion 67 on the substrate surface side is a solid pattern, and the paste 9 filled in the emulsion opening pattern portion 63 on the ejection mechanism portion 1 side spreads in the shape of the rhombus pattern portion 68, A film having a pattern conforming to the shape of the pattern portion 68 is formed. As the solvent contained in the paste 9 was scattered, the film thickness of the paste 9 formed in the emulsion opening pattern portion 6 was reduced, and a predetermined film thickness distribution could be obtained.

  The transfer amount and film thickness distribution of the paste 9 to the substrate to be patterned are defined by the volume of the solvent contained in the paste 9 and the opening volume of the emulsion opening pattern portion 63 on the ejection mechanism portion 1 side of the pattern forming mask 60. Was made.

  The result of verifying the pattern formation status in Example 4 was almost the same as the result of verifying the pattern formation status in Examples 1 to 3.

  As a result, it was possible to simultaneously form a low-resistance wiring connecting the diamond-shaped transparent electrode having good transparency and the pad in one stroke.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  Example 5 is the same as Example 4 except that a pattern forming mask 70 as shown in FIGS. 12 to 14 is used. FIG. 12 is an enlarged schematic plan view of the local area of the emulsion opening pattern 73 as seen from the ejection mechanism section 1 side. FIG. 13 is an enlarged schematic plan view of the local area of the emulsion opening pattern portion 77 as viewed from the pattern forming substrate 6 side opposite to that in FIG. Further, FIG. 14 is an enlarged schematic sectional view for explaining the pattern forming mask 70.

  In FIG. 12, an emulsion opening pattern portion 73 formed in the emulsion 71 coated on the metal mesh 72 connects the emulsion opening pattern portion 74 and the rhombus pattern portion for forming the rhombus pattern portion corresponding to the transparent electrode 701. For this purpose, an emulsion opening pattern portion 75 is formed. The emulsion opening pattern portion 74 for forming a rhombus pattern portion corresponding to the transparent electrode 701 is an aggregate in which a plurality of long cylindrical opening portions 741 are formed, and the shape, arrangement, etc. of the long cylindrical opening portions 741 are provided. By design, a desired transfer amount / distribution of the transparent paste 9 to the pattern-formed substrate 6 was defined.

  13 and 14 are the same as those described in the fourth embodiment with reference to FIGS. 10 and 11. FIG. 13 is a diagram of the emulsion opening pattern portion 77 viewed from the pattern forming substrate 6 side opposite to that in FIG. As the emulsion opening pattern portion 77, an emulsion opening pattern portion 78 for forming a rhombus pattern portion corresponding to the transparent electrode 701 in the emulsion 76 coated on the metal mesh 72 and an inter-electrode wiring connecting the rhombus pattern portion are formed. For this purpose, an emulsion opening pattern portion 79 is formed.

  The result of verifying the pattern formation status in Example 5 was almost the same as the result of verifying the pattern formation status in Example 4.

  As a result, it was possible to simultaneously form a low-resistance wiring connecting the diamond-shaped transparent electrode having good transparency and the pad in one stroke.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  Example 6 is the same as that described in Examples 4 and 5 except that a pattern forming mask 80 as shown in FIGS. 15 to 17 is used. The pattern forming mask 80 is a metal mask that does not use a mesh, and an emulsion 86 is formed on the pattern forming substrate 6 side. FIG. 15 is an enlarged schematic plan view of a local area of the opening pattern 83 formed in the metal 82 as viewed from the discharge mechanism section 1 side. FIG. 16 is a schematic enlarged plan view of a local area of the emulsion opening pattern portion 87 as seen from the pattern forming substrate 6 side. Further, FIG. 17 is an enlarged schematic sectional view for explaining a pattern forming mask 80.

  The opening pattern portion 83 formed in the metal 82 in FIG. 15 is an inter-electrode wiring that connects the opening pattern portion 84 for forming the rhombus pattern portion corresponding to the transparent electrode 701 and the rhombus pattern portion corresponding to the transparent electrode 701. It is formed from the opening pattern part 85 for forming. The emulsion metal opening pattern portion 84 for forming the rhombus pattern portion corresponding to the transparent electrode 701 is an aggregate in which a plurality of long cylindrical opening portions 841 are formed, and the shape, arrangement, etc. of the long cylindrical opening portions are provided. By design, a desired transfer amount / distribution of the transparent paste 9 to the pattern-formed substrate 6 was defined.

  16 and 17 are the same as those described in the fourth and fifth embodiments with reference to FIGS. 10, 11, 13 and 14. FIG. FIG. 16 is a diagram of the emulsion opening pattern portion 87 viewed from the pattern forming substrate 6 side opposite to the case of FIG. As the emulsion opening pattern portion 87, an emulsion opening pattern portion 88 for forming a rhombus pattern portion corresponding to the transparent electrode 701 in the emulsion 86 coated on the metal 82 and an inter-electrode wiring connecting the rhombus pattern portion are formed. The emulsion opening pattern portion 89 is formed.

  Although not shown in the figure, a liquid repellent treatment is applied to the front and back surfaces of the metal 82 and the surface of the emulsion 86.

  Unlike the pattern formation masks of the first to fifth embodiments, the pattern formation mask 80 uses a metal mask instead of a mesh. Since the mesh is a knitted wire, it is easy for bubbles to bite at the intersection of the wires.

  The result of verifying the pattern formation status in Example 6 was almost the same as the result of verifying the pattern formation status in Examples 4 and 5.

  As a result, it was possible to simultaneously form a low-resistance wiring connecting the diamond-shaped transparent electrode having good transparency and the pad in one stroke.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  Example 7 is the same as Example 6 except that a pattern formation mask 90 as shown in FIGS. 18 to 20 is used. The pattern forming mask 90 is a metal mask that does not use a mesh, and an emulsion 96 is formed on the metal 92 on the pattern forming substrate 6 side. FIG. 18 is a locally enlarged plan view schematically illustrating the metal opening pattern 93 viewed from the discharge mechanism section 1 side. FIG. 19 is a schematic enlarged plan view of a local area of the emulsion opening pattern portion 97 as viewed from the pattern forming substrate 6 side. Further, FIG. 20 is a schematic enlarged local sectional view for explaining the pattern forming mask 90.

  The metal opening pattern part 93 of FIG. 18 is for forming an inter-electrode wiring connecting the emulsion opening pattern part 94 for forming the rhombus pattern part corresponding to the transparent electrode 701 and the rhombus pattern part corresponding to the transparent electrode 701. The emulsion opening pattern portion 95 is formed. The emulsion metal opening pattern portion 94 for forming a rhombus pattern portion corresponding to the transparent electrode 701 is an aggregate in which a plurality of long cylindrical opening portions 941 are formed, and the shape and arrangement of the long cylindrical opening portions 941 are arranged. And the like, the desired transfer amount / distribution of the transparent paste 9 to the substrate 6 to be patterned is defined.

19 and 20 are the same as in the sixth embodiment.
19 and 20 are the same as those described in the sixth embodiment with reference to FIGS. 16 and 17. FIG. 19 is a view of the emulsion opening pattern portion 97 viewed from the pattern forming substrate 6 side opposite to that in FIG. As an emulsion opening pattern portion 97, an emulsion opening pattern portion 98 for forming a rhombus pattern portion corresponding to the transparent electrode 701 in the emulsion 96 applied to the metal 92 and an inter-electrode wiring connecting the rhombus pattern portion are formed. The emulsion opening pattern portion 99 is formed.
Although not shown, the surface of the metal 92 and the back surface of the metal 92 and the surface of the emulsion 96 are subjected to liquid repellent treatment.

  The result of verifying the pattern formation status in Example 7 was almost the same as the result of verifying the pattern formation status in Example 6.

  As a result, it was possible to simultaneously form a low-resistance wiring connecting the diamond-shaped transparent electrode having good transparency and the pad in one stroke.

  As a result, a rhombus-shaped transparent electrode having both transparency and conductivity could be formed, and quick movement as a touch panel could be achieved on a 20-inch display.

  Although the embodiments of the present invention have been described above, various alternatives, modifications, and variations can be made by those skilled in the art based on the above description, and the present invention is not limited to the various embodiments described above without departing from the spirit of the present invention. It encompasses alternatives, modifications or variations.

  DESCRIPTION OF SYMBOLS 1 ... Discharge mechanism part 2 ... Paste pressurization mechanism 3 ... Paste flow path 5 ... Pattern formation mask surface 6 ... Pattern formation base material 8 ... Circle at the tip of discharge mechanism part Arc-shaped concave part 9 ... Paste 11 ... Pattern for pattern formation 21 ... Control panel 22 ... Plate frame 23 ... Pattern forming substrate support table part 231 ... Table 100 ... Pattern forming apparatus 101: Discharge unit 102 ... Polyurethane resin 103 ... Liquid repellent film 110 ... Pattern forming mask unit 120 ... Discharge mechanism unit 130 ... Discharge mechanism unit drive mechanism Part 40, 50, 60, 70, 80, 90 ... Pattern forming mask 41, 51, 61, 66, 71, 76, 86, 96 ... Emulsion 4 2, 52, 62, 72 ... mesh 82, 92 ... metal 12, 53, 63, 67, 68, 73, 77, 78, 87, 88, 97, 98 ... emulsion openings.

Claims (1)

A mask holding means for holding a pattern forming mask;
A table means for placing a pattern-forming substrate to be patterned, moving the pattern-forming substrate to a predetermined position of the pattern-forming mask, and setting it at a predetermined distance ;
A paste discharge means provided with a discharge mechanism for forming a pattern of paste on a pattern forming substrate placed on the table means via the pattern forming mask;
A paste pressurizing mechanism that pressurizes and supplies the paste to the discharge mechanism of the paste discharge means via a paste introduction path;
A pattern forming apparatus provided with a discharge mechanism drive means for reciprocating along the discharge mechanism of the paste discharging means to the pattern forming mask,
The discharge mechanism of the paste discharge means has a circular arc-shaped concave shape with the cross-sectional shape in the reciprocating direction of the discharge mechanism drive means at the tip of the paste discharge means symmetrically across the paste flow path at the center. ,
One end of the arc-shaped concave shape opposite to the paste flow path is pressed against the pattern forming mask and reciprocated on the pattern forming mask surface,
A corner which is the intersection of the other end of the arc-shaped concave shape and the paste flow path is formed at a position where a gap is opened with respect to the upper surface of the pattern forming mask, and the arc-shaped concave shape is formed from the gap. The paste can flow in and out of the space formed by the surface of the pattern forming mask and the mask surface for pattern formation, and the arc-shaped concave tangent line is extended at the intersection of the arc-shaped concave shape and the paste flow path. The corner is formed so as to intersect with the pattern forming mask at the end,
A pattern forming apparatus , wherein a liquid repellent film is formed on the symmetrically arcuate concave surface and the inner wall surface of the paste flow path .

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